CN111944414A - Optical structure film for patterning electrode of nano silver wire transparent conductive film and patterning method thereof - Google Patents
Optical structure film for patterning electrode of nano silver wire transparent conductive film and patterning method thereof Download PDFInfo
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- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
- C09D175/04—Polyurethanes
- C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
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- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The invention discloses an optical structure film for patterning an electrode of a nano silver wire transparent conductive film and a patterning method thereof. The invention can effectively improve the problems of silver migration and etching marks of the transparent conductive film of the nano silver wire, and has simple method and high reliability.
Description
Technical Field
The invention belongs to the field of nano silver wire transparent conductive films, and particularly relates to an optical structure film for patterning an electrode of a nano silver wire transparent conductive film and a patterning method thereof.
Background
The application of the nano silver wire transparent conductive film in the field of touch control is mature day by day, and the nano silver wire transparent conductive film is required to be subjected to electrode patterning treatment during application, then is bonded with an optical transparent adhesive to form a composite film, and then is bonded with a liquid crystal display module or an OLED display module to form a touch screen. The electrode patterning mode is mainly laser etching, namely, laser is used for removing part of the conductive film between the electrode area and the non-electrode area, so that the electrode area and the non-electrode area are separated, and the diameter of a laser beam is 25-35 mu m. Therefore, the line spacing of the electrode patterns obtained by laser etching is usually 25-35 μm, and the optical properties such as haze, transmittance and chromaticity in the part of the area are obviously different from those in other areas due to the loss of the nano silver lines, so that etching marks which can be obviously identified by human eyes are caused. If the transparent conductive film is directly applied to a touch screen, the visual effect of the touch screen is reduced.
At present, the method for improving the etching mark is mainly to fill a vanishing liquid containing metal oxide nano particles in an etched non-electrode area after laser etching, so that the refractive index, haze and transmittance of the non-electrode area and the electrode area are similar to improve the etching mark, but the method has limited effect, and the metal oxide nano particles are left in the non-electrode area, which affects the reliability.
In addition, after patterning is performed by laser etching, silver migration between the electrode region and the non-electrode region may cause problems such as electrode short-circuiting, and the reliability of the conductive film may also be affected.
Therefore, aiming at the problems of serious etching mark and silver migration of the existing nano silver wire transparent conductive film, a method which has low cost and high reliability and is suitable for industrial production is urgently needed to be developed.
Disclosure of Invention
Aiming at the problems in the prior art, the invention provides an optical structure film for patterning an electrode of a nano silver wire transparent conductive film and a patterning method thereof, so as to effectively solve the problems of serious etching marks and silver migration of the nano silver wire transparent conductive film.
The invention solves the technical problem and adopts the following technical scheme:
an optical structure film
The invention firstly discloses an optical structure film for patterning an electrode of a nano silver wire transparent conductive film, which is characterized in that: the optical structure film is characterized in that a plurality of positioning insertion structures are arranged on the lower surface of a flexible substrate; when the electrode patterning is carried out on the nano silver wire transparent conductive film, the positioning insertion structure is directly inserted into the junction of the electrode area and the non-electrode area of the conductive film, so that the electrode area and the non-electrode area are separated, and the electrode patterning of the nano silver wire transparent conductive film is realized.
Further, the flexible substrate may be PET, COP or CPI.
Furthermore, the longitudinal section of the positioning insertion structure is in an inverted triangle shape, and the inverted triangle structure is more beneficial to the positioning insertion structure to cut off and insert the conductive film.
Furthermore, the height of the positioning insertion structure is greater than the thickness of the nano silver wire transparent conductive film to be patterned, so that the positioning insertion structure can completely separate the electrode area from the non-electrode area, and short circuit is avoided. The thickness of the conductive film does not contain the thickness of the substrate, and is only the thickness of the nano silver wire conductive layer and the protective layer. According to the common thickness of the conductive film on the market at present, the thickness of the positioning insertion structure is preferably 0.5-10 μm.
Furthermore, the maximum width of the cross section of the positioning insertion structure is 10 nm-1 μm, and when the longitudinal section of the positioning insertion structure is arranged in an inverted triangle, the maximum width of the cross section is the width of the bottom surface of the positioning insertion structure. This size is significantly reduced compared to the laser beam diameter of laser etching, to the nanometer scale.
Further, the spacing between each adjacent positioning insert structure matches the dimensions of each electrode region and non-electrode region in the desired electrode pattern.
Furthermore, the positioning insertion structure is formed by coating a layer of UV hardening liquid on the surface of the flexible substrate, manufacturing the hardening liquid into a required shape by a nano-imprinting technology, and then carrying out UV curing. The UV hardening liquid comprises the following components in parts by weight:
further: the light-cured resin is at least one of polyurethane acrylate of sartomer CN8885NS, polyurethane acrylate of sartomer CN9013NS, polyurethane acrylate of sartomer CN9010NS and polyurethane acrylate of sartomer CN9110 NS; the reactive diluent is at least one of pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate; the photoinitiator is at least one of a photoinitiator 173, a photoinitiator 1173 and a photoinitiator 754; the silver stabilizer is at least one of dodecyl mercaptan, hexadecyl mercaptan and octadecyl mercaptan; the light stabilizer is at least one of light stabilizer 292, light stabilizer 622, light stabilizer 770 and light stabilizer 944; the leveling agent is a leveling agent BYK-333.
The preparation method of the UV hardening liquid comprises the following steps: weighing the raw materials according to the proportion, firstly adding the active diluent into the photocuring resin, stirring at the speed of 500r/min for 20-30 min, then adding the silver stabilizer, the light stabilizer, the flatting agent and the photoinitiator while stirring, and continuously stirring for 20min to obtain the UV hardening liquid.
The manufacturing method of the optical structure film comprises the following steps: firstly, coating UV hardening liquid on the surface of a flexible substrate by a micro-concave coating process or a slit type extrusion coating process; then, stamping the UV hardening liquid on the surface of the flexible substrate by using a mould roller with a required pattern so as to form a positioning insertion structure with the required pattern; and finally, carrying out UV curing on the positioning insertion structure to form a high-hardness structure, namely obtaining the required optical structure film.
In the above-described manufacturing method, the mold roll can be manufactured by a well-established electron beam lithography process on the market at present, and the pattern thereon is set according to the pattern of the desired positioning insertion structure. The mold roller formed by electron beam etching has high precision and can be made into a structure with nano-scale size.
Second, electrode patterning method
The invention also discloses a method for patterning the electrode of the nano silver wire transparent conductive film, which is characterized by comprising the following steps:
transferring the nano silver wire transparent conductive film to the surface of the OCA optical adhesive to form the nano silver wire transparent conductive film taking the OCA optical adhesive as a substrate;
by a roll-to-roll method, carrying out hot pressing on the optical structure film and the nano silver wire transparent conductive film taking the OCA optical adhesive as the substrate, inserting the positioning insertion structure of the optical structure film into the conductive film to cut off an electrode region and a non-electrode region of the conductive film and extend into the OCA optical adhesive; when the positioning insertion structure is used, the adhesive force between the positioning insertion structure and the flexible substrate is far smaller than the adhesive force between the positioning insertion structure and the OCA optical cement, so that the flexible substrate of the optical structure film is directly stripped, namely the positioning insertion structure is remained in the conductive film, and the patterning of the nano silver wire transparent conductive film is realized.
Further, after insertion, the bottom surface of the positioning insertion structure (i.e., the contact surface of the positioning insertion structure and the flexible substrate) is flush with the upper surface of the conductive film.
Further, the temperature of the hot pressing is 60-90 ℃, and the pressure is 0.1-0.8 MPa.
Further, the electrode patterns of the nano silver wire transparent conductive film can be arranged as required, and matched positioning insertion structures are arranged according to the required electrode patterns.
Further, a specific method for forming the nano silver wire transparent conductive film taking the OCA optical cement as the substrate is as follows: arranging a base film with a buffer coating; coating nano silver wire conductive ink on the base film with the buffer coating and drying to form a nano silver wire conductive layer; then coating OC solution on the nano silver wire conducting layer, drying and carrying out UV curing to protect the nano silver wire conducting layer so as to obtain a nano silver wire transparent conducting film to be transferred; and attaching OCA optical cement to the surface of the to-be-transferred nano silver wire transparent conductive film, and tearing off the base film with the buffer coating, namely transferring the nano silver wire transparent conductive film to the surface of the OCA optical cement. Specifically, the formula of the buffer coating, the preparation method of the base film with the buffer coating, the formula of the OCA optical cement and a specific transfer method are disclosed in the patent application filed by the applicant:
1. the application number is 2019111361542, the invention name is "flexible transparent optical adhesive special for a nano silver wire transparent conductive film and a preparation method thereof", and the flexible transparent optical adhesive special for the nano silver wire transparent conductive film in the patent is the OCA optical adhesive.
2. The invention is a buffer coating for transferring a nano silver wire conductive layer and a transfer method thereof, and has the application number of 2019111485051.
Compared with the prior art, the invention has the beneficial effects that:
the invention provides an optical structure film made of UV hardening liquid, which is thermally pressed with a nano silver wire transparent conductive film which is transferred to OCA optical adhesive in advance, so that a high-hardness positioning insertion structure is embedded into the nano silver wire conductive film, the electrode patterning of the conductive film is realized, and a required conductive electrode pattern is prepared. The preparation method has the following advantages:
1. the electrode area and the non-electrode area are separated by a nano insulating resin layer, so that the problem of silver migration of the electrode area and the non-electrode area is solved.
2. The width of the positioning insertion structure is very small, and can be in a nanometer level, and the integrity of the transparent conductive film of the nano silver wire is basically kept visually, so that the problem of etching marks of the conductive film of the nano silver wire is greatly improved.
3. Optical parameters such as transmittance, refractive index and chromaticity of the used UV hardening liquid are completely consistent with those of the OCA optical adhesive, and the OCA optical adhesive is heated in the pressing process to enhance the partial fluidity in the OCA optical adhesive, so that stress generated when the positioning insertion structure is embedded into the OCA is quickly released, the situation of resilience of the positioning insertion structure can not occur after cooling, and the obtained electrode patterned nano silver wire transparent conductive film has very good optical performance and stability.
4. The method is simple, low in cost, high in reliability and suitable for industrial production.
Drawings
FIG. 1 is a schematic flow chart of the fabrication of an optical structured film;
FIG. 2 is a top view of a resulting optical structured film of an embodiment;
FIG. 3 is a schematic diagram of electrode patterning of a silver nanowire transparent conductive film by using an optical structure film in an embodiment;
fig. 4 is a schematic diagram of the silver nanowire transparent conductive film after electrode patterning in the embodiment.
Detailed Description
The present invention is described in detail below with reference to examples, which are carried out on the premise of the technical solution of the present invention, and detailed embodiments and specific procedures are given, but the scope of the present invention is not limited to the following examples.
The flexible substrate of the optical structure film made in the following examples and comparative examples was a PET film.
The preparation method of the nano silver wire transparent conductive film using the OCA optical cement as the substrate used in the following examples and comparative examples is as follows:
1. the formula of the nano silver wire conductive ink is as follows:
the preparation method comprises the following steps:
a. adding graphene oxide XF004L (with the thickness of 0.8-1.2nm and the sheet diameter of 0.5-5 mu m, and the thickness of the first-order Feng nanometer) into water, performing ultrasonic dispersion uniformly to obtain a graphene oxide aqueous solution with the concentration of 10mg/mL, pouring the graphene oxide aqueous solution into a closed flask, treating the graphene oxide aqueous solution for 15 hours at 210 ℃ by using an oven, then cooling and centrifuging, and drying the obtained precipitate to obtain the graphene quantum dots with the thickness of less than or equal to 1nm and the sheet diameter of less than or equal to 10 nm.
b. Sequentially adding deionized water, graphene quantum dots and nano silver wires WJAG1 (wire diameter is 20nm, length-diameter ratio is 1000-minus-one 2000, fertilizer-combining microcrystalline material science and technology limited) into a dispersion cylinder, and stirring at the speed of 500r/min for 30min to ensure that the surfaces of the nano silver wires and the graphene quantum dots are fully combined through coordination;
c. and adding hydroxyethyl cellulose into the solution, and stirring at the speed of 500r/min for 30min to obtain the nano silver wire conductive ink.
2. The formulation of the OC solution is as follows:
the preparation method comprises the following steps: under yellow light and dust-free environment, sequentially adding the solvent, the resin, the photoinitiator and the flatting agent into a dispersion cylinder, and mechanically stirring at the speed of 1000r/min for 30min to prepare an OC solution which is uniformly mixed.
3. The preparation method of the OCA optical cement comprises the following steps:
firstly, synthesizing a polyurethane acrylic prepolymer, specifically comprising the following steps:
(a) dehydrating raw materials: performing high-temperature vacuum-pumping dehydration treatment on PEG-1000, polyether triol polyoxypropylene triol-600, 1, 6-hexamethylene diisocyanate and hydroxyethyl acrylate under the following treatment conditions: the temperature is 100 ℃, the vacuum degree is 0.1MPa, and the time is 2 h.
(b) Polyol and isocyanate reaction: in N2Under the protection environment, adding 5.5mol of dehydrated 1, 6-hexamethylene diisocyanate into a flask, mechanically stirring at the speed of 500r/min, slowly heating to 60 ℃, then dropwise adding a mixed solution of 3.64mol of PEG-1000 and 0.91mol of polyether triol polyoxypropylene triol-600 into the flask at a constant speed for 2 hours after dehydration treatment; after the dropwise addition is finished, continuously preserving heat, stirring and reacting, titrating the-NCO value once every 0.5h until the-NCO content reaches a theoretical value and keeps unchanged, and stopping the reaction to obtain a first-step product;
(c) double bond reaction: keeping the original mechanical stirring speed of the product in the first step, raising the reaction temperature to 80 ℃, adding 10g of p-hydroxyanisole, dropwise adding 1.1mol of dehydrated hydroxyethyl acrylate into a flask at a constant speed, and dropwise adding for 1 h; and after the dropwise addition is finished, continuously keeping the temperature and stirring for reaction, then titrating the-NCO value once every 0.5h until the-NCO content is 0, finishing the reaction, cooling to room temperature and discharging to obtain the polyurethane acrylic prepolymer.
Secondly, preparing the flexible transparent optical adhesive specifically comprises the following steps:
(1) yellow light, dust free Environment, 90g HDDA, 10g TMP (EO)9DA. Adding 750g of polyurethane acrylic prepolymer and 90g of Piccotac1095-N into a dispersion cylinder in sequence, mechanically stirring and uniformly dispersing; then, sequentially adding 5g of light stabilizer 292, 5g of antioxidant 1024, 2.5g of UV-328, 2.5g of UV-531, 5g of IRA HSYP 03 and 40g of photoinitiator 754, and continuously stirring uniformly to obtain a glue solution;
(2) the resulting dope was coated to form a film and UV-cured (2000 mJ/cm)2And 10s), attaching a release film, and finally rolling to obtain the flexible transparent optical adhesive with the thickness of 125 mu m.
The prepared optical adhesive has no obvious defects of dirt, impurities, gel, bubbles or damage and the like in appearance, the light transmittance is 99.6%, the haze is 0.2%, and the stripping force between the optical adhesive and the nano silver wire conducting layer is more than 20N/2.5 cm; after reliability tests such as xenon lamp aging, UV aging, high temperature and high humidity and the like are carried out, the performance of the material is not obviously reduced.
4. The buffer coating comprises the following components in percentage by mass:
specifically, the high acid number acrylate used in this example is a Doublemer270 (acid number 200-250, double bond chemical industry), the fluorine-containing assistant used is FB9474 (Shanghai Biaogao chemical technology Co., Ltd.), the active monomer used is propylene glycol diglycidyl ether, the basic catalyst used is triphenylphosphine, the photoinitiator used is a photoinitiator BDK, and the solvent used is composed of ethyl acetate, isobutyl alcohol and cyclohexanol in a mass ratio of 1:1: 1.
5. Based on the buffer coating, the base film with the buffer coating is manufactured, and the method comprises the following steps:
(1) sequentially adding a solvent, high-acid-value acrylate, a fluorine-containing auxiliary agent, an active monomer, an alkaline catalyst and a photoinitiator into a dispersion cylinder, mechanically stirring at the speed of 1000r/min for 30min, and uniformly mixing to prepare a coating liquid for the buffer coating;
(2) subjecting PET base film to N2Atmosphere plasma treatment, and the specific conditions are：N2The flow rate is 100sccm, the negative pressure is 20Pa, the power is 400W, and the processing time is 15 s;
(3) uniformly coating the surface of the treated base film with the coating liquid for the buffer coating, and then performing thermal curing (baking at 140 ℃ for 4min) and UV curing (1000 mJ/cm)2And curing for 5s) to obtain the base film with the buffer coating.
6. Based on the base film with the buffer coating, the method for transferring the nano silver wire transparent conductive film comprises the following steps:
(1) coating nano silver wire conductive ink on the base film with the buffer coating and drying for 2min at 130 ℃ to form a nano silver wire conductive layer; then coating OC solution on the nano silver wire conductive layer, drying at 120 ℃ for 1min, and then coating OC solution on the nano silver wire conductive layer at a concentration of 500mJ/cm2Performing energy UV curing for 10s to perform protection, and obtaining a nano silver wire transparent conductive film (a conductive layer containing an OC protective layer and with the thickness of 200nm) to be transferred;
(2) attaching OCA optical cement on the surface of the nano silver wire transparent conductive film to be transferred, and tearing off the base film with the buffer coating, namely transferring the nano silver wire conductive film to the surface of the OCA optical cement to prepare the flexible nano silver wire transparent conductive film taking the OCA optical cement as the substrate.
The performance parameters of the silver nanowire transparent conductive film with the OCA optical cement as the substrate in this embodiment are as follows: square resistance 28 omega/□; the light transmittance is 96%; haze 0.8%; the bending resistance radius (100 k of bending, the resistance change rate is less than 5 percent) is less than 0.5 mm; xenon lamp aging (290-2The resistance change rate is less than or equal to 10 percent and is more than 960 h; UV ageing (3W/m)2The resistance change rate is less than or equal to 10 percent and is more than 960 h; high temperature and high humidity (85 ℃/85% RH, resistance change rate is less than or equal to 10%) is more than 720 h.
Comparative example 1
In the comparative example, electrode patterning is carried out on the obtained nano silver wire transparent conductive film taking the OCA optical cement as the substrate by a laser etching method, wherein the diameter of a laser beam is 25 mu m, and the laser energy is 10 KW. The electrode area is in a strip shape.
Example 1
The formulation of the UV curing fluid used in this example is as follows:
the preparation method comprises the following steps: weighing the raw materials according to the proportion, firstly adding pentaerythritol tetraacrylate into CN8885NS resin, stirring at the speed of 500r/min for 25min, then adding dodecyl mercaptan, light stabilizer 292, BYK-333 and photoinitiator 754 while stirring, and continuously stirring for 20min to obtain the UV hardening liquid.
As shown in fig. 1, based on the UV hardening liquid, the present example produced an optical structure film:
firstly, coating UV hardening liquid on the surface of a flexible substrate PET through a micro-concave coating process;
then, stamping the UV hardening liquid on the surface of the flexible substrate by using a mold roller (which is made by an electron beam etching process in advance) with a required pattern so as to form a positioning insertion structure with the required pattern;
finally, the positioning insertion structure is subjected to UV curing (the UV dominant wavelength is 365nm, and the energy is 200 mJ/cm)2Time 40s) to obtain the desired optical structured film, a top view of which is shown in fig. 2.
In this embodiment, the longitudinal section of the positioning insertion structure is an inverted triangle, the height of which is 1 μm, and the width of the bottom surface of which is 0.5 μm. The bottom surface is in a strip shape and is matched with the edge of the required strip-shaped electrode pattern. The spacing between each adjacent positioning insert structure matches the width of each electrode region and non-electrode region in the desired electrode pattern.
In this embodiment, the method for patterning the electrode of the silver nanowire transparent conductive film using OCA optical cement as the substrate includes:
as shown in fig. 3, the optical structure film of this embodiment is thermally pressed with the above-mentioned nano silver wire transparent conductive film using the optical OCA glue as the substrate by a roll-to-roll method (the pressing temperature is 80 ℃, and the pressure is 0.2MPa), so that the positioning insertion structure of the optical structure film is inserted into the conductive film to cut off the electrode region and the non-electrode region of the conductive film and extend into the OCA optical glue; then, because the adhesive force between the positioning insertion structure and the transparent substrate is far smaller than the adhesive force between the positioning insertion structure and the OCA optical adhesive, the flexible substrate of the optical structure film is directly stripped, namely, the positioning insertion structure is remained in the conductive film, and the patterning of the nano silver wire transparent conductive film is realized.
The effect diagram of the patterned transparent conductive film of the nano silver wire is shown in figure 4,
example 2
This example is identical to example 1, except that the UV-hardening liquid formulation used is as follows:
example 3
This example is identical to example 2, except that the UV-hardening liquid formulation used is as follows:
the comparison result of the performances of the electrode-patterned transparent conductive film of the silver nanowires obtained in the above examples and comparative examples is shown in table 1.
Table 1: comparison of Performance of the patterned conductive films obtained in the comparative example and each example
As can be seen from table 1, the optical structure layer in the flexible transparent conductive film for silver nanowires of the present invention does not affect the performance of the conductive film, and the etching trace of the conductive film for silver nanowires of the embodiments is significantly improved.
The present invention is not limited to the above exemplary embodiments, and any modifications, equivalent replacements, and improvements made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (10)
1. An optical structure film for electrode patterning of a silver nanowire transparent conductive film, characterized in that: the optical structure film is characterized in that a plurality of positioning insertion structures are arranged on the lower surface of a flexible substrate; when the electrode patterning is carried out on the nano silver wire transparent conductive film, the positioning insertion structure is directly inserted into the junction of the electrode area and the non-electrode area of the conductive film, so that the electrode area and the non-electrode area are separated, and the electrode patterning of the nano silver wire transparent conductive film is realized.
2. The optical structured film of claim 1, wherein: the longitudinal section of the positioning insertion structure is in an inverted triangle shape.
3. The optical structured film of claim 1 or 2, wherein: the height of the positioning insertion structure is larger than the thickness of the nano silver wire transparent conductive film to be patterned, the maximum width of the cross section of the positioning insertion structure is 10 nm-1 mu m, and the space between every two adjacent positioning insertion structures is matched with the size of each electrode area and each non-electrode area in the needed electrode pattern.
4. The optical structured film of claim 1, wherein: the positioning insertion structure is formed by coating a layer of UV hardening liquid on the surface of a flexible substrate, manufacturing the hardening liquid into a required shape by a nano-imprinting technology, and then carrying out UV curing.
5. The optical structured film of claim 4, wherein: the UV hardening liquid comprises the following components in parts by weight:
6. the optical structured film of claim 5, wherein:
the light-cured resin is at least one of sartomer CN8885NS polyurethane acrylate, sartomer CN9013NS polyurethane acrylate, sartomer CN9010NS polyurethane acrylate and sartomer CN9110NS polyurethane acrylate;
the reactive diluent is at least one of pentaerythritol tetraacrylate, dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate;
the photoinitiator is at least one of a photoinitiator 173, a photoinitiator 1173 and a photoinitiator 754;
the silver stabilizer is at least one of dodecyl mercaptan, hexadecyl mercaptan and octadecyl mercaptan;
the light stabilizer is at least one of light stabilizer 292, light stabilizer 622, light stabilizer 770 and light stabilizer 944;
the leveling agent is a leveling agent BYK-333.
7. A method of making an optical structured film as described in any one of claims 1 to 6, comprising:
firstly, coating UV hardening liquid on the surface of a flexible substrate by a micro-concave coating process or a slit type extrusion coating process;
then, stamping the UV hardening liquid on the surface of the flexible substrate by using a mould roller with a required pattern so as to form a positioning insertion structure with the required pattern;
and finally, carrying out UV curing on the positioning insertion structure to obtain the required optical structure film.
8. A method for patterning electrodes of a nano silver wire transparent conductive film is characterized by comprising the following steps:
transferring the nano silver wire transparent conductive film to the surface of the OCA optical adhesive to form the nano silver wire transparent conductive film taking the OCA optical adhesive as a substrate;
performing hot-pressing on the optical structure film of any one of claims 1 to 6 and the nano silver wire transparent conductive film taking the OCA as the substrate by a roll-to-roll method, so that the positioning insertion structure of the optical structure film is inserted into the conductive film to cut off the electrode area and the non-electrode area of the conductive film and extend into the OCA; when the nano silver wire transparent conductive film is used, the flexible substrate of the optical structure film is directly peeled off, namely, the positioning insertion structure is remained in the conductive film, and the patterning of the nano silver wire transparent conductive film is realized.
9. The method of claim 8, wherein: after insertion, the bottom surface of the positioning insertion structure is flush with the upper surface of the conductive film.
10. The method of claim 8, wherein: the temperature of the hot pressing is 60-90 ℃, and the pressure is 0.1-0.8 MPa.
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| KR20140015092A (en) * | 2012-07-27 | 2014-02-06 | 엘지이노텍 주식회사 | Cover window, toouch window with the cover window and manufacturing method thereof |
| WO2015182235A1 (en) * | 2014-05-27 | 2015-12-03 | ブラザー工業株式会社 | Adhesive tape printing device, adhesive tape printing method, adhesive tape roll, and ink ribbon |
| CN108987473A (en) * | 2017-05-31 | 2018-12-11 | 台湾积体电路制造股份有限公司 | Semiconductor structure and forming method thereof |
| CN108384439A (en) * | 2018-03-15 | 2018-08-10 | 合肥微晶材料科技有限公司 | A kind of UV light-cured resins and preparation method thereof applied to nano silver wire conductive film |
| CN110109572A (en) * | 2019-05-10 | 2019-08-09 | 京东方科技集团股份有限公司 | Touch display substrate and preparation method thereof, display device |
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