CN111830788A - Pumping clearance adjusting device, photoetching equipment and pumping clearance adjusting method - Google Patents
Pumping clearance adjusting device, photoetching equipment and pumping clearance adjusting method Download PDFInfo
- Publication number
- CN111830788A CN111830788A CN201910309629.7A CN201910309629A CN111830788A CN 111830788 A CN111830788 A CN 111830788A CN 201910309629 A CN201910309629 A CN 201910309629A CN 111830788 A CN111830788 A CN 111830788A
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- air outlet
- fixed frame
- pumping
- sealing member
- gap
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
- G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The invention relates to a pumping clearance adjusting device, a photoetching device and a pumping clearance adjusting method. The invention can dynamically seal the gap between the moving frame and the fixed frame, is beneficial to adjusting the gap between the moving frame and the fixed frame to the required minimum degree, and even can realize complete sealing, thereby greatly improving the heat pumping efficiency.
Description
Technical Field
The invention relates to the technical field of photoetching equipment, in particular to a pumping clearance adjusting device, photoetching equipment and a pumping clearance adjusting method.
Background
In the photoetching equipment, a balance mass body is arranged below an exposure platform, the balance mass body is supported above a fixed frame by an air floating cushion, and heat generated when the exposure platform moves is pumped and exhausted to the outside by a fan arranged in the fixed frame. The size of the gap between the balance mass body and the fixed frame can directly influence the heat pumping and exhausting effect, and the smaller the gap is, the more the heat is pumped and exhausted, and the better the pumping and exhausting effect is. However, in practical use of the exposure table, it is difficult to ensure that the gap between the balance mass body and the fixed frame is small, and the standard which can be achieved in practice is usually several millimeters, so that the pumping effect is affected.
It is therefore necessary to design a specific structure to reduce the gap between the balance mass and the fixed frame, thereby improving the heat pumping effect.
Disclosure of Invention
The invention aims to provide a pumping clearance adjusting device which is beneficial to reducing the clearance between a balance mass body and a fixed frame.
In order to achieve the above object, the present invention provides a pumping gap adjusting device, including a moving frame, a fixed frame and an adjusting unit, wherein the moving frame reciprocates relative to the fixed frame, a gap is formed between a bottom of the moving frame and a top of the fixed frame, and the adjusting unit is disposed between the moving frame and the fixed frame to adjust a sealing degree of the gap between the moving frame and the fixed frame.
Optionally, the moving frame includes a top plate, a side plate and a bottom plate, the side plate and the bottom plate form a pumping cavity, the bottom plate is provided with a first air outlet, the first air outlet is communicated with the pumping cavity, the fixed frame is provided with a second air outlet, and the second air outlet is communicated with the first air outlet.
Optionally, the adjusting unit includes a sealing ring and a protection plate, the protection plate is disposed on the fixed frame and located between the first air outlet and the second air outlet, the sealing ring is disposed on the bottom plate, and the sealing ring is compressed by the moving frame on the protection plate.
Optionally, one side of the bottom plate close to the fixed frame surrounds the first air outlet and is provided with a clamping groove, and the sealing ring is clamped in the clamping groove.
Optionally, a vent hole is formed in the center of the protection plate, and the vent hole is aligned with the first air outlet and the second air outlet.
Optionally, the adjusting unit includes a sealing member and a plurality of adjusting screws, the sealing member is disposed on the bottom plate, the plurality of adjusting screws are disposed on the sealing member, and the adjusting screws are rotated to move the sealing member along the axial direction of the first air outlet.
Optionally, the sealing element includes a first portion, a second portion, and a connecting portion connecting the first portion and the second portion, the connecting portion is disposed in the first air outlet, the first portion is located in the pumping cavity and is erected on the bottom plate, and the second portion is located between the first air outlet and the second air outlet.
Optionally, the adjusting unit further includes a plurality of locking screws, a plurality of through holes are circumferentially formed in the first portion of the sealing member, and the plurality of locking screws penetrate through the plurality of through holes and are screwed into the bottom plate to fix the position of the sealing member.
Optionally, the adjusting unit further includes a plurality of guide posts, a plurality of guide holes are circumferentially disposed on the first portion of the sealing member, and the plurality of guide posts are correspondingly disposed in the plurality of guide holes and connected to the bottom plate to limit the sealing member to move along the axial direction of the first air outlet.
Optionally, a distance between an inner wall of the first air outlet and an outer wall of the connecting portion is less than 0.5mm, so as to limit the movement of the sealing element along the axial direction of the first air outlet.
The invention also provides a photoetching device which comprises an exposure platform and the pumping clearance adjusting device, wherein the pumping clearance adjusting device adjusts the sealing degree of the clearance between the movable frame and the fixed frame so as to improve the efficiency of pumping the heat generated by the exposure platform during movement.
The invention also provides a pumping clearance adjusting method, which adopts the pumping clearance adjusting device to adjust the sealing degree of the clearance between the movable frame and the fixed frame.
Optionally, the adjusting unit includes a sealing ring and a protection plate, the sealing ring is pressed by the moving frame on the protection plate, and the moving frame and the fixed frame are sealed by the sealing ring.
Optionally, the adjusting unit includes a sealing member and a plurality of adjusting screws, and the sealing member is moved along the axial direction of the first air outlet by rotating the adjusting screws, so as to adjust the degree of sealing between the moving frame and the fixed frame.
According to the invention, the adjusting unit is arranged between the moving frame and the fixed frame, so that the gap between the moving frame and the fixed frame can be dynamically sealed, the gap between the moving frame and the fixed frame can be adjusted to the required minimum degree, and even can be reduced to zero, and the heat pumping and exhausting efficiency is improved.
Drawings
Fig. 1 is a schematic structural diagram of a pumping clearance adjustment device according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of another pumping clearance adjustment device according to an embodiment of the present invention;
FIG. 3 is a view from the A-A of the seal of FIG. 2;
fig. 4 is a schematic structural diagram of another pumping clearance adjustment device according to an embodiment of the present invention;
FIG. 5 is a view from the B-B side of the seal of FIG. 4;
in the figure:
10-a moving frame; 11-a top plate; 111-pumping holes; 12-side plates; 13-a base plate; 131-a first air outlet; 14-a pumping cavity;
20-a fixed frame; 21-a second air outlet;
30-an adjustment unit; 31-protective plate; 311-a vent; 32-sealing ring; 33-a seal; 331-a first portion; 332-a connecting part; 333-a second portion; 34-an adjusting screw; 35-a guide post; 36-a locking screw;
40-a fan.
Detailed Description
The following describes in more detail embodiments of the present invention with reference to the schematic drawings. The advantages and features of the present invention will become more apparent from the following description. It is to be noted that the drawings are in a very simplified form and are not to precise scale, which is merely for the purpose of facilitating and distinctly claiming the embodiments of the present invention.
Fig. 1 is a schematic structural diagram of a pumping clearance adjustment device according to an embodiment of the present invention. As shown in fig. 1, a drainage gap adjusting apparatus includes a moving frame 10, a fixed frame 20, and an adjusting unit 30, wherein the moving frame 10 can reciprocate relative to the fixed frame 20, that is, the fixed frame 20 is fixed, the moving frame 10 reciprocates along a length direction (a direction perpendicular to a paper surface in fig. 1) of the fixed frame 20, and the adjusting unit 30 is disposed between the moving frame 10 and the fixed frame 20 to adjust a sealing degree between the moving frame 10 and the fixed frame 20.
With reference to fig. 1, the moving frame 10 includes a top plate 11, a side plate 12 and a bottom plate 13, the side plate 12 and the bottom plate 13 form a pumping cavity 14, the bottom plate 13 is provided with a first air outlet 131, the first air outlet 131 is communicated with the pumping cavity 14, the fixed frame 20 is provided with a second air outlet 21, and the second air outlet 21 is communicated with the first air outlet 131.
Specifically, a plurality of exhaust holes 111 are formed in the top plate 11, the exhaust holes 111 are communicated with the exhaust cavity 14, the fan 40 is arranged in the fixed frame 20, and heat at the top plate 11 of the moving frame 10 passes through the exhaust holes 111, the exhaust cavity 14, the first air outlet 131 and the second air outlet 21 in sequence through the fan 40 and is exhausted to the outside. Therefore, the sealing degree between the moving frame 10 and the fixed frame 20 directly affects the sealing degree of the gap between the first outlet 131 and the second outlet 21. The first outlet 131 and the second outlet 21 are both circular, diameters of the first outlet 131 and the second outlet 21 are different (the diameter of the first outlet 131 may be larger than that of the second outlet 21, or the diameter of the second outlet 21 may be larger than that of the first outlet 131), and an end surface area of an outlet with a larger diameter covers an end surface area of an outlet with a smaller diameter.
As shown in fig. 1, the adjusting unit 30 includes a sealing ring 32 and a protection plate 31, the protection plate 31 is disposed on the fixed frame 20 and located between the first air outlet 131 and the second air outlet 21, the sealing ring 32 is disposed on the bottom plate 13, and the sealing ring 32 is pressed by the moving frame 10 on the protection plate 31. The shape of the guard plate 31 is not particularly limited, and it may be rectangular, circular, etc., and the guard plate 31 is preferably made of a low friction, self-lubricating, and wear-resistant material, such as teflon (polytetrafluoroethylene), nylon, PEEK (polyether ether ketone), POM (polyoxymethylene), etc. When the moving frame 10 moves relative to the fixed frame 20, the sealing ring 32 moves on the protection plate 31, the sealing ring 32 is not damaged, and the sealing ring 32 is pressed on the protection plate 31 by the gravity of the moving frame 10, so that the sealing ring 32 and the protection plate 31 form a sealed chamber.
A clamping groove is formed in one side, close to the fixed frame 20, of the bottom plate 13, is arc-shaped and surrounds the first air outlet 131, and the sealing ring 32 is clamped in the clamping groove. In this way, the sealing ring 32 is connected to the fixed frame 20, and when the moving frame 10 moves relative to the fixed frame 20, dynamic sealing between the moving frame 10 and the fixed frame 20 is achieved, so that an air gap between the first air outlet 131 of the moving frame 10 and the second air outlet 21 of the fixed frame 20 is reduced to zero, and complete sealing is achieved.
The center of guard plate 31 is provided with ventilation hole 311, ventilation hole 311 is aimed at first air outlet 131 reaches second air outlet 21, and is concrete, ventilation hole 311 is used for making the heat gas of first air outlet 131 pump drainage passes guard plate 31, and goes into second air outlet 21, and in preferred scheme, ventilation hole 311 is circular, ventilation hole 311's diameter is greater than first air outlet 131 reaches the diameter of second air outlet 21 to avoid reducing the area of passing through when wind and influence the pump drainage efficiency.
Fig. 2 is a schematic structural diagram of another pumping clearance adjustment device according to an embodiment of the present invention. As shown in fig. 2, the adjusting unit 30 includes a sealing member 33 and a plurality of adjusting screws 34, the sealing member 33 is disposed in the first air outlet 131, the plurality of adjusting screws 34 are disposed on the sealing member 33, and the sealing member 33 can move along the axial direction of the first air outlet 131 by rotating the adjusting screws 34.
Specifically, the sealing member 33 is circumferentially provided with a plurality of first screw holes for installing a plurality of adjusting screws 34, in this embodiment, 3 adjusting screws 34 are provided at intervals, the adjusting screws 34 abut against the bottom plate 13, and rotating the adjusting screws 34 can move the sealing member 33 along the axial direction of the first air outlet 131, so as to adjust the distance between the sealing member 33 and the fixing frame 20.
The sealing member 33 includes a first portion 331, a second portion 333, and a connecting portion 332 connecting the first portion 331 and the second portion 333, the connecting portion 332 is cylindrical and has a cavity, the connecting portion 332 is disposed in the first air outlet 131, the first portion 331 is located in the pumping cavity 14 and is erected on the bottom plate 13, and the second portion 333 is located between the first air outlet 131 and the second air outlet 21, in this embodiment, the first portion 331 and the second portion 333 are both circular. The size of the sealing gap between the first outlet 131 and the second outlet 21 can be adjusted by changing the moving position of the connecting portion 332 of the sealing member 33, and the sealing degree between the first outlet 131 and the second outlet 21 can be adjusted only by rotating the adjusting screw 34 to adjust the distance between the second portion 333 of the sealing member 33 and the fixed frame 20; if the air gap between the first air outlet 131 and the second air outlet 21 needs to be adjusted to zero, that is, complete sealing is achieved, only the adjusting screw 34 needs to be adjusted until the second portion 333 of the sealing member 33 is in complete contact with the fixing frame 20.
Fig. 3 is a view from a-a of the seal of fig. 2. As shown in fig. 2 and 3, the adjusting unit 30 further includes a plurality of locking screws 36, a plurality of through holes are circumferentially formed on the first portion 331 of the sealing member 33, and the plurality of locking screws 36 pass through the plurality of through holes and are screwed into the bottom plate 13 to define the position of the sealing member 33. Specifically, a plurality of second screw holes are formed in the bottom plate 13 of the moving frame 10 along the circumferential direction of the first air outlet 131, and are used for installing a plurality of locking screws 36. In this embodiment, as shown in fig. 3, 2 locking screws 36 are symmetrically disposed on the first portion 331, and the 2 locking screws 36 pass through the through holes of the sealing member 33 and are screwed into the second screw holes of the bottom plate 13. After the adjusting screw 34 adjusts the position of the sealing member 33, the sealing member 33 is fixed to the bottom plate 13 by the locking screw 36.
With continued reference to fig. 3, the adjusting unit 30 further includes a plurality of guiding pillars 35, a plurality of guiding holes are circumferentially disposed on the first portion 331 of the sealing member 33, and a plurality of guiding pillars 35 are correspondingly disposed in the plurality of guiding holes and connected to the bottom plate 13 to limit the sealing member 33 to move along the axial direction of the first air outlet 131. In this embodiment, 3 guiding holes are uniformly distributed along the circumferential direction on the first portion 331, correspondingly, 3 guiding pillars 35 are correspondingly disposed in the 3 guiding holes, and the guiding pillars 35 are in clearance fit with the guiding holes, so as to guide the movement of the sealing member 33 along the axial direction of the first air outlet 131.
Preferably, the distance between the inner wall of the first air outlet 131 and the outer wall of the connecting portion 332 is less than 0.5mm, so as to limit the movement of the sealing element 33 along the axial direction of the first air outlet 131.
Fig. 4 is a schematic structural diagram of another pumping gap adjustment device according to an embodiment of the present invention, and fig. 5 is a view of the sealing member in the direction B-B in fig. 4, different from fig. 2, in the pumping gap adjustment device, the guide post 35 is removed, only the adjustment screw 34 and the locking screw 36 are disposed on the sealing member 33, and the movement of the sealing member 33 along the axial direction of the first air outlet 131 is guided by a small clearance fit (less than 0.5mm) between the inner wall of the first air outlet 131 and the outer wall of the connecting portion 332.
The inventor adopts simulation software to perform simulation comparison, and finds that when the gap is reduced from 8mm to 3mm, the vacuum degrees in the first air outlet 131 and the second air outlet 21 are both significantly improved, and the hot air pumping effect is better.
The embodiment of the invention also provides the photoetching equipment, which comprises an exposure platform and the pumping clearance adjusting device, wherein the pumping clearance adjusting device adjusts the sealing degree of the clearance between the movable frame and the fixed frame so as to improve the efficiency of pumping the heat generated by the exposure platform during movement.
The movable frame is arranged below the exposure platform and supported above the fixed frame by an air floating cushion, the movable frame reciprocates relative to the fixed frame along with the exposure platform, and heat generated by the exposure platform during movement is pumped and exhausted to the outside by a fan arranged in the fixed frame.
The embodiment of the invention also provides a method for adjusting the pumping clearance, which adopts the pumping clearance adjusting device to adjust the sealing degree of the clearance between the moving frame and the fixed frame. In one scheme, the adjusting unit comprises a sealing ring and a protection plate, the sealing ring is pressed on the protection plate by the moving frame, and the moving frame and the fixed frame are sealed through the sealing ring. In another aspect, the adjusting unit includes a sealing member and a plurality of adjusting screws, and the sealing member is moved along an axial direction of the first air outlet by rotating the adjusting screws, so as to adjust a sealing degree between the moving frame and the fixed frame.
In summary, in the pumping gap adjustment device, the lithographic apparatus and the pumping gap adjustment method provided in the embodiments of the present invention, by disposing the adjustment unit between the moving frame and the fixed frame, the gap between the moving frame and the fixed frame can be dynamically sealed, which is beneficial to adjusting the gap between the moving frame and the fixed frame to a required minimum degree, and even can be reduced to zero, thereby improving the heat pumping efficiency.
It should be noted that, in the present specification, the embodiments are described in a progressive manner, each embodiment focuses on differences from other embodiments, and the same and similar parts among the embodiments may be referred to each other.
The above description is only a preferred embodiment of the present invention, and does not limit the present invention in any way. It will be understood by those skilled in the art that various changes, substitutions and alterations can be made herein without departing from the spirit and scope of the invention as defined by the appended claims.
Claims (14)
1. The pumping clearance adjusting device is characterized by comprising a moving frame, a fixed frame and an adjusting unit, wherein the moving frame reciprocates relative to the fixed frame, a clearance is reserved between the bottom of the moving frame and the top of the fixed frame, and the adjusting unit is arranged between the moving frame and the fixed frame so as to adjust the sealing degree of the clearance between the moving frame and the fixed frame.
2. The pumping gap adjustment device of claim 1, wherein the movable frame comprises a top plate, a side plate and a bottom plate, the side plate and the bottom plate form a pumping cavity, the bottom plate is provided with a first air outlet, the first air outlet is communicated with the pumping cavity, the fixed frame is provided with a second air outlet, and the second air outlet is communicated with the first air outlet.
3. The suction gap adjusting device of claim 2, wherein the adjusting unit includes a sealing ring and a protection plate, the protection plate is disposed on the fixed frame and between the first air outlet and the second air outlet, the sealing ring is disposed on the bottom plate, and the sealing ring is pressed against the protection plate by the moving frame.
4. The suction gap adjusting device according to claim 3, wherein a locking groove is formed around the first air outlet on a side of the bottom plate close to the fixing frame, and the sealing ring is locked in the locking groove.
5. The extraction gap adjustment apparatus according to claim 3, wherein the protection plate has a ventilation hole at a center thereof, and the ventilation hole is aligned with the first air outlet and the second air outlet.
6. The suction gap adjusting apparatus of claim 2, wherein the adjusting unit includes a sealing member disposed on the base plate and a plurality of adjusting screws disposed on the sealing member, and rotating the adjusting screws moves the sealing member in an axial direction of the first outlet port.
7. The suction gap adjustment device of claim 6, wherein the sealing member includes a first portion, a second portion, and a connecting portion connecting the first portion and the second portion, the connecting portion is disposed in the first air outlet, the first portion is disposed in the suction chamber and mounted on the bottom plate, and the second portion is disposed between the first air outlet and the second air outlet.
8. The suction gap adjusting device as claimed in claim 7, wherein the adjusting unit further includes a plurality of locking screws, the first portion of the sealing member is circumferentially provided with a plurality of through holes, and the plurality of locking screws pass through the plurality of through holes and are screwed into the base plate to fix the position of the sealing member.
9. The suction gap adjusting device according to claim 8, wherein the adjusting unit further includes a plurality of guide posts, the first portion of the sealing member is circumferentially provided with a plurality of guide holes, and the plurality of guide posts are correspondingly disposed in the plurality of guide holes and connected to the bottom plate to limit the sealing member to move in the axial direction of the first outlet.
10. The suction gap adjustment device according to claim 8, wherein a distance between an inner wall of the first outlet port and an outer wall of the connection portion is less than 0.5mm to limit the movement of the sealing member in an axial direction of the first outlet port.
11. A lithographic apparatus comprising an exposure stage and the evacuation gap adjusting device according to any one of claims 1 to 10, wherein the evacuation gap adjusting device adjusts a degree of sealing of a gap between the moving frame and the fixed frame to improve efficiency of evacuating heat generated by the exposure stage while moving.
12. A pumping gap adjusting method, characterized in that the degree of sealing of the gap between the moving frame and the fixed frame is adjusted using the pumping gap adjusting apparatus according to any one of claims 1 to 10.
13. The method of adjusting a pumping gap as set forth in claim 12, wherein the adjusting unit includes a packing and a shielding plate, the packing being pressed against the shielding plate by the moving frame, and a seal between the moving frame and the fixed frame being sealed by the packing.
14. The extraction gap adjustment method according to claim 12, wherein the adjustment unit includes a sealing member and a plurality of adjustment screws, and the sealing member is moved in an axial direction of the first air outlet by rotating the adjustment screws to adjust a degree of sealing between the moving frame and the fixed frame.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910309629.7A CN111830788B (en) | 2019-04-17 | 2019-04-17 | Pumping clearance adjusting device, photoetching equipment and pumping clearance adjusting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910309629.7A CN111830788B (en) | 2019-04-17 | 2019-04-17 | Pumping clearance adjusting device, photoetching equipment and pumping clearance adjusting method |
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| Publication Number | Publication Date |
|---|---|
| CN111830788A true CN111830788A (en) | 2020-10-27 |
| CN111830788B CN111830788B (en) | 2021-11-12 |
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| CN201910309629.7A Active CN111830788B (en) | 2019-04-17 | 2019-04-17 | Pumping clearance adjusting device, photoetching equipment and pumping clearance adjusting method |
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Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007017632A (en) * | 2005-07-06 | 2007-01-25 | Nikon Corp | Optical element holding apparatus, lens barrel, exposure device and method of manufacturing device |
| US20120320351A1 (en) * | 2006-11-03 | 2012-12-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion lithography system using a sealed wafer bath |
| CN104020643A (en) * | 2013-03-01 | 2014-09-03 | 上海微电子装备有限公司 | Large mask plate face type compensation device for photoetching equipment |
| CN104238277A (en) * | 2013-06-19 | 2014-12-24 | 上海微电子装备有限公司 | Immersion-type photoetching machine and flow field maintaining method |
| CN104793466A (en) * | 2014-01-20 | 2015-07-22 | 上海微电子装备有限公司 | Fluid restriction mechanism for immersion lithography machine |
-
2019
- 2019-04-17 CN CN201910309629.7A patent/CN111830788B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2007017632A (en) * | 2005-07-06 | 2007-01-25 | Nikon Corp | Optical element holding apparatus, lens barrel, exposure device and method of manufacturing device |
| US20120320351A1 (en) * | 2006-11-03 | 2012-12-20 | Taiwan Semiconductor Manufacturing Company, Ltd. | Immersion lithography system using a sealed wafer bath |
| CN104020643A (en) * | 2013-03-01 | 2014-09-03 | 上海微电子装备有限公司 | Large mask plate face type compensation device for photoetching equipment |
| CN104238277A (en) * | 2013-06-19 | 2014-12-24 | 上海微电子装备有限公司 | Immersion-type photoetching machine and flow field maintaining method |
| CN104793466A (en) * | 2014-01-20 | 2015-07-22 | 上海微电子装备有限公司 | Fluid restriction mechanism for immersion lithography machine |
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