CN111821854A - Plasma cooperation photocatalysis loading and unloading mechanism that organic waste gas reaction unit used - Google Patents
Plasma cooperation photocatalysis loading and unloading mechanism that organic waste gas reaction unit used Download PDFInfo
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- CN111821854A CN111821854A CN202010801670.9A CN202010801670A CN111821854A CN 111821854 A CN111821854 A CN 111821854A CN 202010801670 A CN202010801670 A CN 202010801670A CN 111821854 A CN111821854 A CN 111821854A
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- plasma
- waste gas
- photocatalytic
- organic waste
- unloading mechanism
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/8668—Removing organic compounds not provided for in B01D53/8603 - B01D53/8665
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/80—Type of catalytic reaction
- B01D2255/802—Photocatalytic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/70—Organic compounds not provided for in groups B01D2257/00 - B01D2257/602
- B01D2257/708—Volatile organic compounds V.O.C.'s
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2259/00—Type of treatment
- B01D2259/80—Employing electric, magnetic, electromagnetic or wave energy, or particle radiation
- B01D2259/818—Employing electrical discharges or the generation of a plasma
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- Environmental & Geological Engineering (AREA)
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- Health & Medical Sciences (AREA)
- Biomedical Technology (AREA)
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- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Processing Of Solid Wastes (AREA)
Abstract
The invention relates to the technical field of waste gas treatment, and discloses a plasma synergistic photocatalytic loading and unloading mechanism for an organic waste gas reaction device. According to the invention, through the arrangement of the mounting hole, the first bolt, the second nut, the threaded pull rod, the first nut, the sliding chute, the threaded rod, the sliding block, the third nut, the fixed rod, the low-temperature plasma wire holder and the photocatalytic treatment device wire holder, the low-temperature plasma and photocatalytic treatment devices with different sizes can be conveniently assembled and disassembled, the support does not need to be replaced, and the low-temperature plasma and photocatalytic treatment devices can be conveniently and quickly assembled.
Description
Technical Field
The invention relates to the technical field of waste gas treatment, in particular to a plasma synergistic photocatalytic loading and unloading mechanism for an organic waste gas reaction device.
Background
In recent years, the rapidly developing modern industry has led to a dramatic increase in toxic and harmful exhaust gases, and the amount of Volatile Organic Compounds (VOCs) produced thereby has increased dramatically, and VOCs have become one of the major gaseous pollutants afflicting countries around the world. With the increasing requirements of people on the environment and the quality of life, the discharge standard of VOCs is more and more strict. The conventional VOCs end treatment technology comprises the following steps: absorption, combustion, condensation, biological, and adsorption. In recent years, the development of low-temperature plasma and photocatalysis in the field of VOCs degradation is receiving general attention. However, the types of processing devices applied to low-temperature plasma and photocatalysis in the market at present are too many, and different low-temperature plasma and photocatalysis processing devices need different supports to be installed, so that the loading, unloading, replacement, use and power supply are inconvenient, and the low-temperature plasma and photocatalysis processing devices can generate a large amount of heat and cannot dissipate heat in time, and further the service lives of the low-temperature plasma and photocatalysis processing devices are influenced, so that a plasma cooperating photocatalysis loading and unloading mechanism for an organic waste gas reaction device is provided.
Disclosure of Invention
The invention aims to provide a plasma cooperating photocatalytic loading and unloading mechanism for an organic waste gas reaction device, which solves the problems in the background art.
In order to achieve the purpose, the invention provides the following technical scheme: a plasma cooperating photocatalysis loading and unloading mechanism for an organic waste gas reaction device, which comprises a supporting plate, supporting legs are welded at four corners of the lower end of the supporting plate, four through holes with the same specification are arranged on the supporting plate, the lower side of the supporting plate is provided with a mounting plate, four corners of the upper end of the mounting plate are fixedly provided with threaded pull rods, the four threaded pull rods are respectively arranged in four through holes with the same specification, the outer sides of four same threaded pull rods on the upper side of the supporting plate are all spirally connected with first nuts, the middle part of the upper end of the mounting plate is fixedly connected with a partition plate, the mounting plate is divided into a low-temperature plasma bin and a photocatalytic treatment device bin by the partition plate, six rectangular mounting holes which are parallel to each other are formed in the low-temperature plasma bin and the photocatalytic treatment device bin, a first bolt is arranged in the mounting hole, and a second nut is spirally connected to the outer side of the first bolt;
the viewing aperture has been seted up at the middle part of backup pad, the spout, two have all been seted up at both ends around the inner chamber of viewing aperture fixedly connected with threaded rod in the spout, two all cup jointed the slider on the threaded rod, and two fixedly connected with dead lever between the slider on the threaded rod, threaded connection has the third nut on the threaded rod of the left and right sides of slider, two have cup jointed low temperature plasma connection terminal and photocatalytic treatment device connection terminal on the dead lever respectively.
As a preferred embodiment of the present invention, the low-temperature plasma chamber and the photocatalytic treatment device chamber are both provided with air vents, fans are respectively disposed in the two air vents, the two fans are both fixedly connected with mounting rods, and the two fans are both connected in the air vents through the mounting rods.
As a preferred embodiment of the present invention, a first pull ring is fixedly connected to the middle of the lower end of the support plate, a second pull ring is fixedly connected to the middle of the upper end of the mounting plate, and a steel wire rope is fixedly connected between the first pull ring and the second pull ring.
In a preferred embodiment of the present invention, the second bolt is screwed to the upper ends of the low-temperature plasma wire holder and the photocatalytic treatment device wire holder.
As a preferred embodiment of the present invention, a protective net is disposed at the upper end of each of the two air holes.
In a preferred embodiment of the present invention, the mounting plate has label slots formed on both left and right sides of a front end thereof.
In a preferred embodiment of the present invention, a third bolt penetrates through both the two protective nets, and both the two protective nets are screwed to the mounting plate through the third bolt.
In a preferred embodiment of the present invention, the mounting plate is a copper plate.
In a preferred embodiment of the present invention, rubber seal rings are fixedly mounted on the inner sides of the four through holes.
Compared with the prior art, the invention has the following beneficial effects:
1. according to the invention, through the arrangement of the mounting hole, the first bolt, the second nut, the threaded pull rod, the first nut, the sliding chute, the threaded rod, the sliding block, the third nut, the fixed rod, the low-temperature plasma wire holder and the photocatalytic treatment device wire holder, the low-temperature plasma and photocatalytic treatment devices with different sizes can be conveniently assembled and disassembled, the support does not need to be replaced, and the low-temperature plasma and photocatalytic treatment devices can be conveniently and quickly assembled.
2. According to the invention, the fan is arranged to accelerate the air flow speed outside the low-temperature plasma and photocatalytic treatment device, so that the low-temperature plasma and photocatalytic treatment device can be radiated in time, and further the damage to the low-temperature plasma and photocatalytic treatment device caused by heat accumulation is avoided.
3. According to the invention, through the arrangement of the first pull ring, the steel wire rope and the second pull ring, the damage to the low-temperature plasma and photocatalytic treatment device caused by the falling of the thread pull rod and the sliding wire mounting plate can be effectively avoided.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic diagram of the overall structure of a plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to the present invention;
FIG. 2 is a top view of a mounting plate of a plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to the present invention;
FIG. 3 is a top view of a plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to the present invention;
FIG. 4 is a top view of a support plate of a plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to the present invention;
FIG. 5 is a front view of a chute of a plasma-assisted photocatalytic loading/unloading mechanism for an organic waste gas reaction device according to the present invention.
In the figure: 1. a support plate; 2. a through hole; 3. a first nut; 4. a chute; 5. fixing the rod; 6. a viewing port; 7. air holes are formed; 8. mounting holes; 9. a label slot; 10. mounting a plate; 11. a threaded pull rod; 12. a partition plate; 13. a low-temperature plasma bin; 14. a photocatalytic treatment device bin; 15. mounting a rod; 16. a fan; 17. a protective net; 18. a second bolt; 19. supporting legs; 20. a slider; 21. a third bolt; 22. a threaded rod; 23. a third nut; 24. a rubber seal ring; 25. a first bolt; 26. a second nut; 27. a photocatalytic treatment device wire holder; 28. a first pull ring; 29. a wire rope; 30. a second pull ring: 31. a low temperature plasma wire holder.
Detailed Description
In order to make the technical means, the creation characteristics, the achievement purposes and the effects of the invention easy to understand, the invention is further described with the specific embodiments.
In the description of the present invention, it is to be understood that the terms "upper", "lower", "front", "rear", "left", "right", "top", "bottom", "inner", "outer", and the like, indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, are only for convenience in describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, should not be construed as limiting the present invention; in the description of the present invention, it should be noted that unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "disposed" are to be construed broadly and can, for example, be fixedly connected, disposed, detachably connected, disposed, or integrally connected and disposed. The specific meanings of the above terms in the present invention can be understood in specific cases to those skilled in the art.
Referring to fig. 1-5, the present invention provides a technical solution: the utility model provides a plasma cooperation photocatalysis loading and unloading mechanism that organic waste gas reaction unit used, includes backup pad 1, its characterized in that: supporting legs 19 are welded at four corners of the lower end of the supporting plate 1, four through holes 2 with the same specification are arranged on the supporting plate 1, a mounting plate 10 is arranged on the lower side of the supporting plate 1, threaded pull rods 11 are fixedly mounted at four corners of the upper end of the mounting plate 10, the four threaded pull rods 11 are respectively arranged in four through holes 2 with the same specification, the outer sides of four same threaded pull rods 11 on the upper side of the supporting plate 1 are all in threaded connection with first nuts 3, the middle part of the upper end of the mounting plate 10 is fixedly connected with a clapboard 12, the mounting plate 10 is divided into a low-temperature plasma chamber 13 and a photocatalytic treatment device chamber 14 by the clapboard 12, six parallel rectangular mounting holes 8 are respectively arranged on the low-temperature plasma bin 13 and the photocatalytic treatment device bin 14, a first bolt 25 is arranged in the mounting hole 8, and a second nut 26 is spirally connected to the outer side of the first bolt 25;
an observation port 6 is arranged in the middle of the supporting plate 1, sliding grooves 4 are arranged at the front end and the rear end of an inner cavity of the observation port 6, threaded rods 22 are fixedly connected in the two sliding grooves 4, sliders 20 are sleeved on the two threaded rods 22, a fixing rod 5 is fixedly connected between the two sliders 20 on the two threaded rods 22, third nuts 23 are spirally connected on the threaded rods 22 at the left side and the right side of each slider 20, a low-temperature plasma wiring seat 31 and a photocatalytic treatment device wiring seat 27 are respectively sleeved on the two fixing rods 5, and the low-temperature plasma wiring seat 31, the sliding grooves 4, the threaded rods 22, the sliders 20, the third nuts 23, the fixing rods 5, the low-temperature plasma wiring seat 31 and the photocatalytic treatment device wiring seat 27 are arranged through mounting holes 8, the support does not need to be replaced, so that the low-temperature plasma and photocatalytic treatment device is convenient and quick to install.
In this embodiment (please refer to fig. 2), the low-temperature plasma chamber 13 and the photocatalytic treatment device chamber 14 are both provided with air vents 7, two air vents 7 are respectively provided with a fan 16, two fans 16 are respectively and fixedly connected with an installation rod 15, the two fans 16 are respectively connected in the air vents 7 through the installation rods 15, and the setting of the fans 16 can accelerate the air flow speed outside the low-temperature plasma and photocatalytic treatment device, so that the low-temperature plasma and photocatalytic treatment device can be timely cooled, and further, the heat accumulation is prevented from damaging the low-temperature plasma and photocatalytic treatment device.
In this embodiment (see fig. 1), the middle of the lower end of the supporting plate 1 is fixedly connected with a first pull ring 28, the middle of the upper end of the mounting plate 10 is fixedly connected with a second pull ring 30, and a steel wire rope 29 is fixedly connected between the first pull ring 28 and the second pull ring 30, so that the threaded pull rod 11 and the sliding wire mounting plate 10 can be effectively prevented from dropping to damage the low-temperature plasma and photocatalytic processing device due to the arrangement of the first pull ring 28, the steel wire rope 29 and the second pull ring 30.
In this embodiment (see fig. 4), the second bolts 18 are screwed on the upper ends of the low-temperature plasma wire holder 31 and the photocatalytic treatment device wire holder 27, and the stability of the low-temperature plasma wire holder 31 and the photocatalytic treatment device wire holder 27 on the fixing rod 5 can be effectively increased by the arrangement of the second bolts 18.
In this embodiment (see fig. 3), protective nets 17 are disposed at the upper ends of the two air holes 7, so that the parts can be effectively prevented from falling onto the fan 16 and damaging the blades of the fan 16 due to the protective nets 17.
In this embodiment (please refer to fig. 1), the label slots 9 are formed on both the left and right sides of the front end of the mounting plate 10, and the label slots 9 can be used to conveniently mark the low-temperature plasma and the photocatalytic processing device, thereby further facilitating an operator to quickly find the corresponding device.
In this embodiment (please refer to fig. 3), third bolts 21 penetrate through the two protective nets 17, the two protective nets 17 are screwed on the mounting plate 10 through the third bolts 21, and the protective nets 17 can be conveniently disassembled by the third bolts 21, so that the protective nets 17 are further conveniently cleaned.
In this embodiment (see fig. 1), the mounting plate 10 is a copper plate, and the heat conductivity of the copper plate is better, so that the heat dissipation effect of the low-temperature plasma and the photocatalytic processing device can be improved.
In this embodiment (see fig. 4), rubber seal rings 24 are fixedly mounted on inner sides of the four through holes 2, and the arrangement of the rubber seal rings 24 can effectively reduce gaps of the threaded pull rod 11 in the through holes 2, thereby further increasing the stability of the threaded pull rod 11 in the through holes 2.
When the plasma cooperating with the photocatalytic loading and unloading mechanism for the organic waste gas reaction device is used, it should be noted that the present invention is a plasma cooperating with the photocatalytic loading and unloading mechanism for the organic waste gas reaction device, which comprises a supporting plate 1, a through hole 2, a first nut 3, a chute 4, a fixing rod 5, an observation opening 6, an air vent 7, a mounting hole 8, a label slot 9, a mounting plate 10, a threaded pull rod 11, a partition plate 12, a low temperature plasma chamber 13, a photocatalytic treatment device chamber 14, a mounting rod 15, a fan 16, a protective screen 17, a second bolt 18, a supporting leg 19, a sliding block 20, a third bolt 21, a threaded rod 22, a third nut 23, a rubber seal ring 24, a first bolt 25, a second nut 26, a photocatalytic treatment device wiring seat 27, a first pull ring 28, a steel wire rope 29, a second pull ring 30, and a low temperature plasma wiring seat 31, all of which are common standard parts or parts known by those skilled in the art, the structure and principle are known to the skilled person through technical manuals or through routine experimentation.
When in use, the low-temperature plasma and the photocatalytic treatment device are respectively arranged in the low-temperature plasma chamber 13 and the photocatalytic treatment device chamber 14, then the low-temperature plasma and the photocatalytic treatment device with different sizes can be arranged on the mounting plate 10 through the first bolt 25 and the second nut 26 by matching with the plurality of parallel mounting holes 8, then the third nut 23 and the second bolt 18 are screwed so as to enable the wiring seat 27 and the low-temperature plasma wiring seat 31 of the photocatalytic treatment device to correspond to the plug of the photocatalytic treatment device and the low-temperature plasma, then the first nut 3 is screwed so as to enable the plug of the photocatalytic treatment device and the low-temperature plasma to be electrically connected with the wiring seat of the photocatalytic treatment device and the low-temperature plasma wiring seat, further, the power supply is convenient for the photocatalytic treatment device and the low-temperature plasma, and the air flow speed outside the low-temperature plasma and the photocatalytic treatment device can be accelerated by starting the fan 16, therefore, the low-temperature plasma and photocatalytic treatment device can be timely cooled, and further damage to the low-temperature plasma and photocatalytic treatment device caused by heat accumulation is avoided.
While there have been shown and described what are at present considered the fundamental principles and essential features of the invention and its advantages, it will be apparent to those skilled in the art that the invention is not limited to the details of the foregoing exemplary embodiments, but is capable of other specific forms without departing from the spirit or essential characteristics thereof. The present embodiments are therefore to be considered in all respects as illustrative and not restrictive, the scope of the invention being indicated by the appended claims rather than by the foregoing description, and all changes which come within the meaning and range of equivalency of the claims are therefore intended to be embraced therein. Any reference sign in a claim should not be construed as limiting the claim concerned.
Furthermore, it should be understood that although the present description refers to embodiments, not every embodiment may contain only a single embodiment, and such description is for clarity only, and those skilled in the art should integrate the description, and the embodiments may be combined as appropriate to form other embodiments understood by those skilled in the art.
Claims (9)
1. The utility model provides a plasma cooperation photocatalysis loading and unloading mechanism that organic waste gas reaction unit used, includes backup pad (1), its characterized in that: the support legs (19) are welded at four corners of the lower end of the support plate (1), four through holes (2) with the same specification are formed in the support plate (1), a mounting plate (10) is arranged on the lower side of the support plate (1), threaded pull rods (11) are fixedly mounted at four corners of the upper end of the mounting plate (10), the threaded pull rods (11) are respectively arranged in the four through holes (2) with the same specification, first nuts (3) are spirally connected to the outer sides of the four same threaded pull rods (11) on the upper side of the support plate (1), a partition plate (12) is fixedly connected to the middle of the upper end of the mounting plate (10), the partition plate (12) divides the mounting plate (10) into a low-temperature plasma bin (13) and a photocatalytic treatment device bin (14), six rectangular mounting holes (8) which are parallel to each other are formed in the low-temperature plasma bin (13) and the photocatalytic treatment device bin (14, a first bolt (25) is arranged in the mounting hole (8), and a second nut (26) is spirally connected to the outer side of the first bolt (25);
viewing aperture (6) have been seted up at the middle part of backup pad (1), spout (4), two have all been seted up at both ends around the inner chamber of viewing aperture (6) fixedly connected with threaded rod (22), two in spout (4) all cup jointed slider (20) on threaded rod (22), and two fixedly connected with dead lever (5) between slider (20) on threaded rod (22), threaded rod (22) of the left and right sides of slider (20) go up threaded connection has third nut (23), two low temperature plasma connection terminal (31) and photocatalytic treatment device connection terminal (27) have been cup jointed on dead lever (5) respectively.
2. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 1, characterized in that: air holes (7) are formed in the low-temperature plasma bin (13) and the photocatalytic treatment device bin (14), two air fans (16) are arranged in the air holes (7), two air fans (16) are fixedly connected to installation rods (15) on the air fans (16), and two air fans (16) are connected into the air holes (7) through the installation rods (15).
3. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 1, characterized in that: the lower end middle part of the supporting plate (1) is fixedly connected with a first pull ring (28), the upper end middle part of the mounting plate (10) is fixedly connected with a second pull ring (30), and a steel wire rope (29) is fixedly connected between the first pull ring (28) and the second pull ring (30).
4. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 1, characterized in that: and second bolts (18) are screwed at the upper ends of the low-temperature plasma wire holder (31) and the photocatalytic treatment device wire holder (27).
5. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 2, characterized in that: the upper ends of the two air holes (7) are provided with protective nets (17).
6. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 1, characterized in that: the left side and the right side of the front end of the mounting plate (10) are provided with label grooves (9).
7. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 5, characterized in that: and third bolts (21) penetrate through the two protective nets (17), and the two protective nets (17) are screwed on the mounting plate (10) through the third bolts (21).
8. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 1, characterized in that: the mounting plate (10) is a copper plate.
9. The plasma-assisted photocatalytic loading and unloading mechanism for an organic waste gas reaction device according to claim 1, characterized in that: and rubber sealing rings (24) are fixedly arranged on the inner sides of the four through holes (2).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010801670.9A CN111821854A (en) | 2020-08-11 | 2020-08-11 | Plasma cooperation photocatalysis loading and unloading mechanism that organic waste gas reaction unit used |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010801670.9A CN111821854A (en) | 2020-08-11 | 2020-08-11 | Plasma cooperation photocatalysis loading and unloading mechanism that organic waste gas reaction unit used |
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| Publication Number | Publication Date |
|---|---|
| CN111821854A true CN111821854A (en) | 2020-10-27 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010801670.9A Pending CN111821854A (en) | 2020-08-11 | 2020-08-11 | Plasma cooperation photocatalysis loading and unloading mechanism that organic waste gas reaction unit used |
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| CN (1) | CN111821854A (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09270975A (en) * | 1996-03-29 | 1997-10-14 | Fujitsu General Ltd | Mount structure of cooling fan |
| CN104057116A (en) * | 2014-06-25 | 2014-09-24 | 苏州创维晟自动化科技有限公司 | High-precision drilling machine |
| CN104300270A (en) * | 2014-09-26 | 2015-01-21 | 张晶 | Wall socket moving transversely and socket system |
| CN207570787U (en) * | 2017-12-18 | 2018-07-03 | 山东科技大学 | A kind of reverse mounted device of jack |
| CN108322987A (en) * | 2018-04-08 | 2018-07-24 | 合肥诺为智能科技有限公司 | A kind of electrode confinement formula plasma producing apparatus |
-
2020
- 2020-08-11 CN CN202010801670.9A patent/CN111821854A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09270975A (en) * | 1996-03-29 | 1997-10-14 | Fujitsu General Ltd | Mount structure of cooling fan |
| CN104057116A (en) * | 2014-06-25 | 2014-09-24 | 苏州创维晟自动化科技有限公司 | High-precision drilling machine |
| CN104300270A (en) * | 2014-09-26 | 2015-01-21 | 张晶 | Wall socket moving transversely and socket system |
| CN207570787U (en) * | 2017-12-18 | 2018-07-03 | 山东科技大学 | A kind of reverse mounted device of jack |
| CN108322987A (en) * | 2018-04-08 | 2018-07-24 | 合肥诺为智能科技有限公司 | A kind of electrode confinement formula plasma producing apparatus |
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Application publication date: 20201027 |