CN111793243B - Photo-thermal evaporation material and preparation method thereof - Google Patents
Photo-thermal evaporation material and preparation method thereof Download PDFInfo
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- CN111793243B CN111793243B CN202010674316.4A CN202010674316A CN111793243B CN 111793243 B CN111793243 B CN 111793243B CN 202010674316 A CN202010674316 A CN 202010674316A CN 111793243 B CN111793243 B CN 111793243B
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- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J9/00—Working-up of macromolecular substances to porous or cellular articles or materials; After-treatment thereof
- C08J9/36—After-treatment
- C08J9/40—Impregnation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2375/00—Characterised by the use of polyureas or polyurethanes; Derivatives of such polymers
- C08J2375/04—Polyurethanes
Abstract
The invention provides a photo-thermal evaporation material and a preparation method thereof, belonging to the technical field of photo-thermal material engineering. The preparation method comprises the following steps: pretreating a substrate with a three-dimensional pore structure; forming a bonding layer in the pretreated three-dimensional pore structure; and coating a light absorption material on the bonding layer to form a nano-structure evaporation interface in the three-dimensional pore structure of the substrate, and performing curing treatment to obtain the photo-thermal evaporation material. The preparation method provided by the invention has the advantages of simple process and low cost, and can be used for preparing the photothermal evaporation material in a large scale, and the photothermal evaporation material obtained by the invention has a three-dimensional pore structure, and nano protrusions are formed on the surface of the three-dimensional pore structure to be used as a nano structure evaporation interface, so that the photothermal evaporation material formed by the invention has excellent light absorption performance and higher photothermal conversion efficiency.
Description
Technical Field
The invention belongs to the technical field of photo-thermal material engineering, and particularly relates to a photo-thermal evaporation material and a preparation method of the photo-thermal evaporation material.
Background
The current energy crisis and the environmental pollution problem are increasingly serious, and solar energy is widely applied to the fields of seawater desalination, sterilization, wastewater treatment, liquid separation, power generation and the like as a clean energy source capable of being continuously utilized. The photo-thermal material can convert light energy into heat energy, is applied to the evaporation field, can locally heat a water-air interface, reduces heat loss and improves the utilization efficiency of solar energy.
At present, materials such as graphene and carbon nanotubes are widely used as photothermal evaporation materials, and although the materials have the characteristic of efficient photothermal evaporation, the raw materials such as graphene and carbon nanotubes are relatively expensive and difficult to obtain, and the preparation process of the photothermal materials is relatively complex, so that the large-scale preparation and application of the photothermal materials are limited. Therefore, it is urgently needed to develop a photothermal evaporation material with low cost, simple process and high efficiency.
Disclosure of Invention
The present invention is directed to at least one of the problems of the prior art, and provides a photothermal evaporation material and a method for preparing the photothermal evaporation material.
One aspect of the invention provides a preparation method of a photothermal evaporation material, which comprises the following specific steps: pretreating a substrate with a three-dimensional pore structure;
forming a bonding layer in the pretreated three-dimensional pore structure;
and coating a light absorption material on the bonding layer to form a nano-structure evaporation interface in the three-dimensional pore structure of the substrate, and performing curing treatment to obtain the photo-thermal evaporation material.
Optionally, the pre-treating the substrate with the three-dimensional pore structure includes:
soaking the substrate in 5-15% concentration sodium hydroxide solution at 50-85 deg.c for 3-8 hr, and drying.
Optionally, the substrate is made of polyurethane sponge;
wherein the specification range of the polyurethane sponge is 20-100 ppi.
Optionally, the forming a bonding layer in the pretreated three-dimensional pore structure includes:
and coating an adhesive on the pretreated matrix, drying for 3-5 h at 60-90 ℃, and repeating for 2-5 times to form the adhesive layer in the three-dimensional pore structure of the matrix.
Optionally, coating a light absorbing material on the bonding layer to form a nanostructure evaporation interface in the three-dimensional pore structure of the substrate, and performing a curing process to obtain the photothermal evaporation material, including:
forming a mixture of a light absorbing material and a binder, coating the mixture on the bonding layer, and repeating for 2-5 times to form a nanostructure evaporation interface in the three-dimensional pore structure of the substrate;
and curing the matrix with the nanostructure evaporation interface at 80-150 ℃ for 10-20 h to obtain the photo-thermal evaporation material.
Optionally, the light absorbing material is CuCr2O4Particles.
Optionally, the CuCr2O4The particle size range of the particles is 1000 meshes-50000 meshes; and/or the presence of a gas in the gas,
the CuCr2O4The mass fraction of the particles ranges from 0wt.% to 20 wt.%.
Optionally, the binder is silica sol.
Optionally, the solid content of the silica sol ranges from 5wt.% to 30 wt.%.
In another aspect of the present invention, a photothermal evaporation material is provided, which is prepared by the above-mentioned preparation method.
The invention provides a preparation method of a photo-thermal evaporation material, which comprises the following specific steps: the method comprises the steps of pretreating a substrate with a three-dimensional pore structure, forming a bonding layer in the pretreated three-dimensional pore structure, coating a light absorption material on the bonding layer to form a nanostructure evaporation interface in the three-dimensional pore structure of the substrate, and carrying out curing treatment to obtain the photothermal evaporation material. The preparation method provided by the invention has the advantages of simple process and low cost, and can be used for preparing and forming the photo-thermal evaporation material in a large scale. In addition, the photo-thermal evaporation material obtained by the method has a three-dimensional through hole structure, excellent light absorption performance and high-efficiency photo-thermal evaporation performance.
Drawings
FIG. 1 is a block flow diagram of a method for preparing a photothermal evaporation material according to an embodiment of the invention;
FIG. 2 is a scanning electron microscope image of a photothermal evaporation material according to another embodiment of the present invention;
FIG. 3 is a scanning electron microscope image of the surface of a three-dimensional pore structure of a photothermal evaporation material according to another embodiment of the present invention;
FIG. 4 is a graph of infrared thermal images of a dry surface of a photothermal evaporation material of another embodiment of the present invention at 1 sun illumination for different periods of time;
FIG. 5 is a graph of infrared thermal images of a water-absorbing surface of a photothermal evaporation material of another embodiment of the present invention at 1 sun illumination for different time periods;
FIG. 6 is a graph of infrared thermal images of a dry surface of a photothermal evaporation material of another embodiment of the present invention at 1 sun illumination for different periods of time;
FIG. 7 is a graph of infrared thermal images of a water-absorbing surface of a photothermal evaporation material of another embodiment of the present invention at 1 sun illumination for different periods of time.
Detailed Description
In order to make the technical solutions of the present invention better understood, the present invention will be described in further detail with reference to the accompanying drawings and specific embodiments. It is to be understood that the embodiments described are only a few embodiments of the present invention, and not all embodiments. All other embodiments, which can be derived by a person skilled in the art from the described embodiments of the invention without any inventive step, are within the scope of protection of the invention.
As shown in fig. 1, in one aspect of the present invention, a method S100 for preparing a photothermal evaporation material is provided, which specifically includes steps S110 to S130:
and S110, preprocessing the substrate with the three-dimensional pore structure.
It should be noted that, in order to improve the hydrophilicity of the substrate, the substrate is pretreated in this embodiment, specifically, step S110 includes: the matrix is soaked in 5-15% sodium hydroxide aqueous solution at 50-85 ℃ for 3-8 h, and then is dried, which is equivalent to the modification treatment of the matrix, so that the hydrophilicity of the matrix is improved, and the binding force of the matrix and a binder in subsequent steps is further improved.
It should be further noted that, in order to make the photothermal evaporation material of this embodiment have a larger specific surface area to increase the evaporation effect, specifically, the substrate material of this embodiment selects a substrate having a three-dimensional pore structure, that is, the substrate includes a three-dimensional through-hole skeleton structure, such as a sponge, which has both the three-dimensional through-hole skeleton structure and the advantage of low cost, and of course, for those skilled in the art, other substrates having a three-dimensional pore structure may be selected according to actual needs, which is not limited specifically.
For example, in the present embodiment, a polyurethane sponge is selected as the base, and the specification range of the polyurethane sponge is set to be 20ppi to 100ppi, but it is needless to say that a person skilled in the art may select a sponge of other material, and this is not particularly limited.
S120, forming a bonding layer in the pretreated three-dimensional pore structure;
specifically, a binding agent is coated on the pretreated matrix, and the matrix is dried at 60-90 ℃ for 3-5 h, and is repeated for 2-5 times to form a binding layer in the three-dimensional pore structure of the matrix.
It should be noted that the thickness of the adhesive layer formed in this step may be set according to actual needs, and it should be understood that since the adhesive forms the adhesive layer in the three-dimensional pore structure of the substrate, the adhesive layer is generally thin as long as it can function as an adhesive.
It should be further noted that, in the present embodiment, the type of the binder is not particularly limited, for example, a silica sol binder may be selected, and since the silica sol has a particle size in the range of 10nm to 20nm and a large specific surface area, when the moisture of the silica sol evaporates, the colloidal particles adhere to the substrate, and silica-silica bonds are formed between the particles, so that the silica sol binder has an excellent binding effect. In addition, the range of the silica sol solid content is set to 5wt.% to 30wt.% in the present embodiment.
And S130, coating a light absorption material on the bonding layer to form a nanostructure evaporation interface in the three-dimensional pore structure of the substrate, and performing curing treatment to obtain the photothermal evaporation material.
Specifically, a mixture of a light absorbing material and a binder is formed, the mixture is coated on a bonding layer for 2 to 5 times to form a nanostructure evaporation interface in a three-dimensional pore structure of a substrate, and then the substrate with the nanostructure evaporation interface formed thereon is cured at 80 to 150 ℃ for 10 to 20 hours to obtain the photothermal evaporation material. That is, in order to further increase the bonding force between the light absorbing material and the substrate, the light absorbing material and the adhesive are mixed and then coated on the substrate, so that the mixture is bonded to the bonding layer formed in step S120, and has a stronger bonding force.
In addition, the adhesive of the present embodiment may also be selected from silica sol, so that a silica bond may be formed with the silica sol adhesive in step S120 to bond the light absorbing material to the substrate.
Further, the light absorbing material of the present example uses copper chromium black (CuCr)2O4) The copper chromium black particles can absorb ultraviolet light to carry out self-heating, and have excellent light absorption performance, heat resistance, acid resistance, alkali resistance, weather resistance and environmental protection. Therefore, the water evaporation rate can be effectively improved by using the light absorption material as a light absorption material, and the light absorption material is not influenced by temperature and has long service life.
Exemplary, CuCr in the present embodiment2O4The particle size of the particles is in the range of 1000 mesh to 50000 mesh, and CuCr2O4The mass fraction of the particles ranges from 0wt.% to 20 wt.%.
By the preparation method, the copper chromium black particles can be uniformly distributed on the three-dimensional through hole skeleton structure of the sponge, a layer of silica sol nano particles is coated outside the copper chromium black particles, the copper chromium black particles and the silica sol nano particles form tiny protrusions to jointly form a nano structure evaporation interface, and the formed photo-thermal evaporation material has a three-dimensional hole structure. As shown in fig. 2 and fig. 3, the solar evaporation material having a three-dimensional pore structure (see fig. 2) is obtained in this embodiment, nano-protrusions are formed on the surface of the three-dimensional pore structure (see fig. 3), and the nano-protrusions formed in the three-dimensional pore structure serve as a nano-structure evaporation interface. In addition, since the silica sol has a large specific surface area and a large amount of copper chromium black particles are correspondingly attached, a large amount of nanostructure evaporation interfaces are formed in the three-dimensional through hole structure, which is equivalent to a large evaporation area, and the excellent light absorption performance of the light absorption material (copper chromium black particles) is combined, the light absorption material is converted into heat energy through lattice vibration, and water is transported through the capillary action of the three-dimensional hole structure in the polyurethane sponge to realize evaporation, so that the photothermal evaporation material formed in the embodiment has a high evaporation rate.
The preparation of the photothermal evaporation material will be further described with reference to several specific examples below:
example 1
The preparation method of the photothermal evaporation material in the present example includes the following steps:
s1, soaking 60ppi polyurethane sponge in 10% sodium hydroxide aqueous solution for 5 hours at 85 ℃, and drying the soaked polyurethane sponge.
S2, coating silica sol on the dried polyurethane sponge, drying at 85 ℃ for 3h, repeating 3 times, it should be understood that the silica sol is coated in the three-dimensional pore structure of the polyurethane sponge.
S3, mixing CuCr2O4Mixture of particles and silica sol, wherein, CuCr2O4Was 10 wt.%, and the mixture was coated 3 times on a silica sol coated polyurethane sponge. Thereafter, will be coated with CuCr2O4The coated sponge was fabricated to form a solar evaporator sample and the evaporation was carried outThe sample was cured at 150 ℃ for 12 h.
As shown in fig. 2 and fig. 3, the solar evaporation material having a three-dimensional pore structure (see fig. 2) is obtained in this embodiment, nano-protrusions are formed on the surface of the three-dimensional pore structure (see fig. 3), and the nano-protrusions formed in the three-dimensional pore structure serve as a nano-structure evaporation interface.
Further, as shown in fig. 4 and 5, in order to illustrate the photothermal evaporation efficiency of the photothermal evaporation material formed in the present embodiment, the evaporation rate was further analyzed, specifically, under 1 sun illumination, the dry surface temperature could be raised from room temperature to 140 ℃ or higher within 5 minutes (as shown in fig. 4), the water-absorbing surface temperature could be raised from room temperature to 60 ℃ or higher within 5 minutes (as shown in fig. 5), and the water evaporation rate could be 3.7kg m/m-2 h-1As can be seen, the photothermal evaporation material formed in this embodiment has high photothermal conversion efficiency.
Example 2
The preparation method of the photothermal evaporation material in the present example includes the following steps:
s1, soaking 40ppi polyurethane sponge in 10% sodium hydroxide aqueous solution for 5 hours at 85 ℃, and carrying out soaking on the soaked polyurethane sponge.
S2, coating the dried polyurethane sponge with silica sol, drying at 85 ℃ for 3h, repeating 3 times, it should be understood that the silica sol is coated in the three-dimensional pore structure of the polyurethane sponge.
S3, mixing CuCr2O4Mixture of particles and silica sol, wherein, CuCr2O4Was 10 wt.%, and the mixture was coated 3 times on a silica sol coated polyurethane sponge. Thereafter, will be coated with CuCr2O4The coated sponge was made to form a solar evaporator sample and the evaporator sample was cured at 150 ℃ for 12 h.
The solar evaporating material with the three-dimensional through hole structure is obtained by the embodiment, and the water evaporation rate of the solar evaporating material is 1.9kg m-2h-1。
Example 3
The preparation method of the photothermal evaporation material in the present example includes the following steps:
s1, soaking 50ppi of polyurethane sponge in 10% sodium hydroxide aqueous solution for 5 hours at 85 ℃, and carrying out soaking on the soaked polyurethane sponge.
S2, coating the dried polyurethane sponge with silica sol, drying at 85 ℃ for 3h, repeating 3 times, it should be understood that the silica sol is coated in the three-dimensional pore structure of the polyurethane sponge.
S3, mixing CuCr2O4Mixture of particles and silica sol, wherein, CuCr2O4Was 10 wt.%, and the mixture was coated 3 times on a silica sol coated polyurethane sponge. Thereafter, will be coated with CuCr2O4The coated sponge was made to form a solar evaporator sample and the evaporator sample was cured at 150 ℃ for 12 h.
The solar evaporation material having a three-dimensional pore structure, which had a water evaporation rate of 2.5kg m, was obtained by this example-2h-1。
Example 4
The preparation method of the photothermal evaporation material in the present example includes the following steps:
s1, soaking 60ppi polyurethane sponge in 10% sodium hydroxide aqueous solution for 5 hours at 85 ℃, and carrying out soaking on the soaked polyurethane sponge.
And S2, coating silica sol on the dried polyurethane sponge, drying for 3 hours at 85 ℃, and repeating for 3 times to obtain a silica sol coated sponge sample.
In order to illustrate the effect of the present invention using copper chrome black as the light absorbing material, in this example, no copper chrome black was coated on the polyurethane sponge, that is, uncoated CuCr was obtained2O4The sponge silica sol modified material of (1) and the photothermal conversion effect thereof was further analyzed, as shown in fig. 6 and 7, the results were as follows: under 1 solar illumination: the surface temperature of the dried water was raised from room temperature to 60 deg.C after 6 minutes (see FIG. 6), and the surface temperature of the water-absorbed water was raised from room temperature to 44 deg.C after 8 minutes (see FIG. 7), and it can be seen that the water evaporation rate of this example was only 0.2kgm-2 h-1。
Compared with the embodiments, the photo-thermal evaporation material has the advantages that the photo-thermal conversion efficiency of the photo-thermal evaporation material can be effectively improved by coating the copper-chromium black light absorption material on the polyurethane sponge matrix, the water evaporation rates of the obtained photo-thermal evaporation materials are different by selecting different polyurethane specifications, and the photo-thermal evaporation material formed by adopting large-size polyurethane has higher water evaporation rate.
In another aspect of the present invention, a photothermal evaporation material is provided, which is prepared by the preparation method described above.
Specifically, as shown in fig. 2 and fig. 3, the photothermal evaporation material provided in this embodiment has a three-dimensional pore structure, and nano protrusions are formed on the surface of the three-dimensional pore structure skeleton to serve as a nanostructure evaporation interface, so that the photothermal evaporation material has a large specific surface area, excellent light absorption performance, and high-efficiency photothermal evaporation performance.
The photo-thermal evaporation material obtained by the invention has high photo-thermal conversion efficiency and high photo-thermal evaporation rate, and can be applied to the fields of seawater desalination, sterilization, wastewater treatment, liquid separation, power generation and the like.
The invention provides a preparation method of a photo-thermal evaporation material and the photo-thermal evaporation material. The preparation method provided by the invention has the advantages of simple process and low cost, can be used for preparing and forming the photo-thermal evaporation material in a large scale, and the photo-thermal evaporation material obtained by the invention has a three-dimensional pore structure, and nano protrusions are formed on the surface of the three-dimensional pore structure to be used as a nano-structure evaporation interface.
It will be understood that the above embodiments are merely exemplary embodiments taken to illustrate the principles of the present invention, which is not limited thereto. It will be apparent to those skilled in the art that various modifications and improvements can be made without departing from the spirit and scope of the invention, and such modifications and improvements are also considered to be within the scope of the invention.
Claims (7)
1. The preparation method of the photo-thermal evaporation material is characterized by comprising the following specific steps: pretreating a substrate having a three-dimensional pore structure, comprising:
soaking the substrate in an aqueous solution of sodium hydroxide with the concentration range of 5-15%, soaking for 3-8 h at the temperature range of 50-85 ℃, and then drying the substrate;
forming a bonding layer in the pre-treated three-dimensional pore structure, comprising:
coating an adhesive on the pretreated matrix, drying at 60-90 ℃ for 3-5 h, and repeating for 2-5 times to form an adhesive layer in the three-dimensional pore structure of the matrix;
coating a light absorption material on the bonding layer to form a nanostructure evaporation interface in the three-dimensional pore structure of the substrate, and performing curing treatment to obtain the photothermal evaporation material; wherein the light absorption material adopts CuCr2O4And (3) particles.
2. The preparation method according to claim 1, wherein the substrate is polyurethane sponge;
wherein the specification range of the polyurethane sponge is 20-100 ppi.
3. The method for preparing the photo-thermal evaporation material according to claim 1, wherein the step of coating a light absorbing material on the bonding layer to form a nanostructure evaporation interface in the three-dimensional pore structure of the substrate and performing a curing process to obtain the photo-thermal evaporation material comprises:
forming a mixture of a light absorbing material and a binder, coating the mixture on the bonding layer, and repeating for 2-5 times to form a nanostructure evaporation interface in the three-dimensional pore structure of the substrate;
and curing the matrix with the nanostructure evaporation interface at the temperature of 80-150 ℃ for 10-20 h to obtain the photo-thermal evaporation material.
4. The production process according to claim 1, wherein,characterized in that the CuCr2O4The particle size range of the particles is 1000 meshes-50000 meshes; and/or the presence of a gas in the gas,
the CuCr2O4The mass fraction of the particles ranges from 0wt.% to 20 wt.%.
5. The production method according to any one of claims 1 to 4, wherein the binder is silica sol.
6. The method of claim 5, wherein the silica sol has a solid content ranging from 5wt.% to 30 wt.%.
7. A photothermal evaporation material, which is obtained by the production method according to any one of claims 1 to 6.
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| US20150353385A1 (en) * | 2014-06-09 | 2015-12-10 | King Abdullah University Of Science And Technology | Hydrophobic photothermal membranes, devices including the hydrophobic photothermal membranes, and methods for solar desalination |
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| CN108929114A (en) * | 2017-05-23 | 2018-12-04 | 中国石油天然气股份有限公司 | A kind of geopolymer coating and its preparation method and application |
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