CN111777727A - High-performance photosensitive acrylic resin composition and preparation method thereof - Google Patents
High-performance photosensitive acrylic resin composition and preparation method thereof Download PDFInfo
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- CN111777727A CN111777727A CN202010672437.5A CN202010672437A CN111777727A CN 111777727 A CN111777727 A CN 111777727A CN 202010672437 A CN202010672437 A CN 202010672437A CN 111777727 A CN111777727 A CN 111777727A
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F285/00—Macromolecular compounds obtained by polymerising monomers on to preformed graft polymers
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F283/00—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
- C08F283/06—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals
- C08F283/065—Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polyethers, polyoxymethylenes or polyacetals on to unsaturated polyethers, polyoxymethylenes or polyacetals
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/29—Compounds containing one or more carbon-to-nitrogen double bonds
Abstract
The invention discloses a high-performance photosensitive acrylic resin composition and a preparation method thereof, wherein the high-performance photosensitive acrylic resin composition comprises the following raw materials in parts by mass: 10-20 parts of modified natural rubber, 60-80 parts of polyether polyol methacrylate, 5-10 parts of 1, 5-naphthalene diisocyanate, 10-40 parts of diluent, 1-2 parts of initiator and 1-2 parts of accelerator; the modified natural rubber is prepared by mixing natural rubber emulsion with polyethyleneimine solution, adding hydroxyethyl methacrylate and triethylene diamine as initiator, reacting at 80-90 deg.C, drying, freeze-grinding to 300 mesh.
Description
Technical Field
The invention belongs to the field of resin production processes, and particularly relates to a high-performance photosensitive acrylic resin composition and a preparation method thereof.
Background
The 3D printing is a rapid prototyping technology that has been rapidly developed in recent years, and has over ten different technology types, wherein the photocuring technology is most widely used, and is a technology in which photosensitive resin is used as a prototyping material, the photosensitive resin is cured in a certain shape to form a sheet with a certain thickness by controlling the scanning of ultraviolet light by a computer, and a new layer of liquid photosensitive resin is coated on the basis of the original cured sheet to continue the next scanning and curing. The new layer is cured and bonded to the previous layer, and the process is repeated to obtain a complete part. Compared with other types of 3D printing technologies, the photocuring 3D printing technology has the advantages of high printing precision, high surface smoothness, high forming speed and the like.
The photosensitive resin used at present has the defects of high decomposition temperature, long operation time and the like, and the reduction of the decomposition temperature is beneficial to reducing the cracking of the shell and the operation time.
Disclosure of Invention
The invention aims to provide a high-performance photosensitive acrylic resin composition and a preparation method thereof, and the high-performance photosensitive acrylic resin composition has high mechanical property and good elasticity and toughness.
A high-performance photosensitive acrylic resin composition comprises the following raw materials in parts by mass: 10-20 parts of modified natural rubber, 60-80 parts of polyether polyol methacrylate, 5-10 parts of 1, 5-naphthalene diisocyanate, 10-40 parts of diluent, 1-2 parts of initiator and 1-2 parts of accelerator; the modified natural rubber is prepared by mixing natural rubber emulsion with polyethyleneimine solution, adding hydroxyethyl methacrylate and triethylene diamine as initiator, reacting at 80-90 deg.C, drying, freeze-grinding to 300 mesh.
Further, the concentration of the polyethyleneimine is 50% aqueous solution, and the polymerization degree is 1200-1300.
Further, the polyether polyol methacrylate is obtained by carrying out ester exchange reaction on polyether polyol and methacrylate, the functionality of the polyether polyol is 2, and the relative molecular mass is 200-5000.
Further, the polyether polyol is polyethylene glycol.
Further, the natural rubber emulsion is high-ammonia concentrated natural latex, and the solid content is more than or equal to 61.5%.
Further, the initiator is UV-184, UV-369, UV-1173, UV-651 or UV-819.
Further, the diluent is any one of trihydroxy acrylate, 1, 6-hexanediol diacrylate and styrene.
Further, the accelerator is methacrylic acid phosphate.
A preparation method of a high-performance photosensitive acrylic resin composition comprises the following steps: (1) mixing the natural rubber emulsion and the polyethyleneimine solution according to the proportion of 5: 1, adding hydroxyethyl methacrylate accounting for 20% of the total mass of the natural rubber emulsion, adding triethylene diamine as an initiator, reacting for 4 hours at the temperature of 80-90 ℃, drying, freezing and grinding to 300 meshes; (2) 10-20 parts of modified natural rubber, 60-80 parts of polyether polyol methacrylate, 5-10 parts of 1, 5-naphthalene diisocyanate, 10-40 parts of diluent, 1-2 parts of initiator and 1-2 parts of accelerator are mixed in a stirrer at a rotating speed of 300r/min for 10-20min to obtain a high-performance photosensitive acrylic resin composition; (3) and (3) standing the high-performance photosensitive acrylic resin composition obtained in the step (2) for 15min, coating the composition on the iron sheet subjected to surface treatment, and placing the iron sheet in a photocuring machine for curing.
The invention has the following beneficial effects:
the advantages are that:
1. compared with the prior art, the preparation method of the CN105175651B solid rubber is too complicated, and the modified rubber prepared by the invention directly utilizes the rubber latex for modification has better mechanical improvement effect in the system of the invention;
2. polyether glycol methacrylate is adopted to replace hydroxyl acrylic resin, polyurethane acrylate resin and epoxy acrylate resin systems in the prior art, so that the complexity and instability of the components are greatly reduced, and the mechanical property can be better realized through single polyether glycol methacrylate and the special modified rubber;
3. the addition of 1, 5-naphthalene diisocyanate can further improve the mechanical property and elasticity of the system after photocuring.
Detailed Description
In order to facilitate a better understanding of the invention, the following examples are given to illustrate, but not to limit the scope of the invention.
Example 1
A preparation method of a high-performance photosensitive acrylic resin composition comprises the following steps: (1) mixing the natural rubber emulsion with a polyethyleneimine solution according to the weight ratio of 5: 1, adding hydroxyethyl methacrylate accounting for 20 percent of the total mass of the natural rubber emulsion, adding triethylene diamine as an initiator, reacting for 4 hours at 85 ℃, drying, freezing and grinding to 300 meshes; (2) 15 parts of modified natural rubber, 70 parts of polyether polyol methacrylate, 7.5 parts of 1, 5-naphthalene diisocyanate, 25 parts of diluent, 1.5 parts of initiator and 1.5 parts of accelerant are mixed in a stirrer, and are mixed and stirred for 15min at the rotating speed of 300r/min to obtain the high-performance photosensitive acrylic resin composition; (3) and (3) standing the high-performance photosensitive acrylic resin composition obtained in the step (2) for 15min, coating the composition on the iron sheet subjected to surface treatment, and placing the iron sheet in a photocuring machine for curing.
The concentration of the polyethyleneimine is 50% aqueous solution, and the polymerization degree is 1200-1300.
The polyether polyol methacrylate is obtained by carrying out ester exchange reaction on polyether polyol and methacrylate, the functionality of the polyether polyol is 2, and the relative molecular mass is 2000. The polyether polyol is polyethylene glycol. The natural rubber emulsion is high-ammonia concentrated natural latex, and the solid content is more than or equal to 61.5 percent. The initiator is UV-184. The diluent is trihydroxy acrylate.
Example 2
A preparation method of a high-performance photosensitive acrylic resin composition comprises the following steps: (1) mixing the natural rubber emulsion and the polyethyleneimine solution according to the proportion of 5: 1, adding hydroxyethyl methacrylate accounting for 20% of the total mass of the natural rubber emulsion, adding triethylene diamine as an initiator, reacting for 4 hours at the temperature of 90 ℃, drying, freezing and grinding to 300 meshes; (2) mixing 10 parts of modified natural rubber, 80 parts of polyether polyol methacrylate, 5 parts of 1, 5-naphthalene diisocyanate, 40 parts of diluent, 1 part of initiator and 2 parts of accelerator in a mixer, and mixing and stirring at the rotating speed of 300r/min for 10min to obtain a high-performance photosensitive acrylic resin composition; (3) and (3) standing the high-performance photosensitive acrylic resin composition obtained in the step (2) for 15min, coating the composition on the iron sheet subjected to surface treatment, and placing the iron sheet in a photocuring machine for curing.
The concentration of the polyethyleneimine is 50% aqueous solution, and the polymerization degree is 1200-1300.
The polyether polyol methacrylate is obtained by carrying out ester exchange reaction on polyether polyol and methacrylate, the functionality of the polyether polyol is 2, and the relative molecular mass is 2000. The polyether polyol is polyethylene glycol. The natural rubber emulsion is high-ammonia concentrated natural latex, and the solid content is more than or equal to 61.5 percent. The initiator is UV-184. The diluent is trihydroxy acrylate.
Example 3
A preparation method of a high-performance photosensitive acrylic resin composition comprises the following steps: (1) mixing the natural rubber emulsion and the polyethyleneimine solution according to the proportion of 5: 1, adding hydroxyethyl methacrylate accounting for 20% of the total mass of the natural rubber emulsion, adding triethylene diamine as an initiator, reacting for 4 hours at the temperature of 80 ℃, drying, freezing and grinding to 300 meshes; (2) 20 parts of modified natural rubber, 60 parts of polyether polyol methacrylate, 10 parts of 1, 5-naphthalene diisocyanate, 10 parts of diluent, 2 parts of initiator and 1 part of accelerator are mixed in a stirrer, and are mixed and stirred for 20min at the rotating speed of 300r/min to obtain the high-performance photosensitive acrylic resin composition; (3) and (3) standing the high-performance photosensitive acrylic resin composition obtained in the step (2) for 15min, coating the composition on the iron sheet subjected to surface treatment, and placing the iron sheet in a photocuring machine for curing.
The concentration of the polyethyleneimine is 50% aqueous solution, and the polymerization degree is 1200-1300.
The polyether polyol methacrylate is obtained by carrying out ester exchange reaction on polyether polyol and methacrylate, the functionality of the polyether polyol is 2, and the relative molecular mass is 2000. The polyether polyol is polyethylene glycol. The natural rubber emulsion is high-ammonia concentrated natural latex, and the solid content is more than or equal to 61.5 percent. The initiator is UV-184. The diluent is trihydroxy acrylate.
Comparative example 1
The preparation method of CN105199178B was used to prepare a modified butadiene rubber in place of the modified natural rubber in example 1, and the rest was the same as in example 1.
Comparative example 2
The preparation method of CN105175651B was used to prepare a solid rubber which was used in place of the modified natural rubber in example 1, and the rest was the same as in example 1.
Comparative example 3
Same as example 1 except that 1, 5-naphthalene diisocyanate was not added.
Comparative example 4
According to CN105199178B, polyether glycol methacrylate and the like are replaced by acrylic resin, polyurethane acrylate resin and epoxy acrylate resin according to the proportion of 1: 1.
Comparative example 5
According to CN105175651B, polyether polyol methacrylate and the like are replaced by hydroxyl acrylic resin, polyurethane acrylic resin and epoxy acrylate resin according to the proportion of 2: 5: 1.
And (3) standing the products obtained in the comparative examples and the examples for 15min, coating the products on the iron sheet subjected to surface treatment, and placing the iron sheet in a photocuring machine for curing, wherein the photocuring wavelength is 380nm, the speed of a conveyor belt of the photocuring machine is 1.5cm/s, and the curing time is 28 s.
According to the data, the modified rubber prepared by directly utilizing the rubber latex is modified, so that the modified rubber has a better mechanical improvement effect in the system; polyether glycol methacrylate is adopted to replace hydroxyl acrylic resin, polyurethane acrylate resin and epoxy acrylate resin systems in the prior art, so that the complexity and instability of the components are greatly reduced, and the mechanical property can be better realized through single polyether glycol methacrylate and the special modified rubber; the addition of 1, 5-naphthalene diisocyanate can further improve the mechanical property and elasticity of the system after photocuring.
The above description should not be taken as limiting the invention to the embodiments, but rather, as will be apparent to those skilled in the art to which the invention pertains, numerous simplifications or substitutions may be made without departing from the spirit of the invention, which shall be deemed to fall within the scope of the invention as defined by the claims appended hereto.
Claims (9)
1. A high-performance photosensitive acrylic resin composition is characterized by comprising the following raw materials in parts by mass: 10-20 parts of modified natural rubber, 60-80 parts of polyether polyol methacrylate, 5-10 parts of 1, 5-naphthalene diisocyanate, 10-40 parts of diluent, 1-2 parts of initiator and 1-2 parts of accelerator; the modified natural rubber is prepared by mixing natural rubber emulsion with polyethyleneimine solution, adding hydroxyethyl methacrylate and triethylene diamine as initiator, reacting at 80-90 deg.C, drying, freeze-grinding to 300 mesh.
2. The photosensitive acrylic resin composition as claimed in claim 1, wherein the concentration of the polyethyleneimine is 50% aqueous solution, and the degree of polymerization is 1200-1300.
3. The high performance photosensitive acrylic resin composition as claimed in claim 1, wherein said polyether polyol methacrylate is obtained by transesterification of polyether polyol having a functionality of 2 and a relative molecular mass of 200-5000 with methacrylate.
4. The high-performance photosensitive acrylic resin composition according to claim 3, wherein said polyether polyol is polyethylene glycol.
5. The high-performance photosensitive acrylic resin composition as claimed in claim 1, wherein the natural rubber emulsion is a high ammonia concentrated natural latex having a solid content of not less than 61.5%.
6. The high-performance photosensitive acrylic resin composition according to claim 1, wherein said initiator is UV-184, UV-369, UV-1173, UV-651 or UV-819.
7. The high-performance photosensitive acrylic resin composition according to claim 1, wherein the diluent is any one of trihydroxy acrylate, 1, 6-hexanediol diacrylate and styrene.
8. The high performance photosensitive acrylic resin composition according to claim 1, wherein said accelerator is methacrylic acid phosphate.
9. A preparation method of a high-performance photosensitive acrylic resin composition is characterized by comprising the following steps: (1) mixing the natural rubber emulsion and the polyethyleneimine solution according to the proportion of 5: 1, adding hydroxyethyl methacrylate accounting for 20% of the total mass of the natural rubber emulsion, adding triethylene diamine as an initiator, reacting for 4 hours at the temperature of 80-90 ℃, drying, freezing and grinding to 300 meshes; (2) 10-20 parts of modified natural rubber, 60-80 parts of polyether polyol methacrylate, 5-10 parts of 1, 5-naphthalene diisocyanate, 10-40 parts of diluent, 1-2 parts of initiator and 1-2 parts of accelerator are mixed in a stirrer at a rotating speed of 300r/min for 10-20min to obtain a high-performance photosensitive acrylic resin composition; (3) and (3) standing the high-performance photosensitive acrylic resin composition obtained in the step (2) for 15min, coating the composition on the iron sheet subjected to surface treatment, and placing the iron sheet in a photocuring machine for curing.
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Effective date of registration: 20220119 Address after: 518103 820, block a, building b5-1, Junfeng industrial complex, Heping community, Fuhai street, Bao'an District, Shenzhen City, Guangdong Province Patentee after: Shenzhen debell photoelectric material Co.,Ltd. Patentee after: Lianyungang bailihe new material development Co., Ltd Address before: 820, block a, building b5-1, Junfeng Industrial Zone, Heping community, Fuhai street, Bao'an District, Shenzhen City, Guangdong Province Patentee before: Shenzhen debell photoelectric material Co.,Ltd. |