CN111673621A - Pneumatic automatic supply device for high-viscosity polishing solution - Google Patents

Pneumatic automatic supply device for high-viscosity polishing solution Download PDF

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Publication number
CN111673621A
CN111673621A CN202010354120.7A CN202010354120A CN111673621A CN 111673621 A CN111673621 A CN 111673621A CN 202010354120 A CN202010354120 A CN 202010354120A CN 111673621 A CN111673621 A CN 111673621A
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CN
China
Prior art keywords
polishing solution
air pressure
liquid level
polishing
air
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Pending
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CN202010354120.7A
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Chinese (zh)
Inventor
吕冰海
李晓琪
柯明峰
邵琦
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Zhejiang University of Technology ZJUT
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Zhejiang University of Technology ZJUT
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Priority to CN202010354120.7A priority Critical patent/CN111673621A/en
Publication of CN111673621A publication Critical patent/CN111673621A/en
Pending legal-status Critical Current

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B57/00Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
    • B24B57/02Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)

Abstract

An air pressure type automatic supply device for high-viscosity polishing solution comprises a material cylinder, an air pressure system, a safety system, an alarm system, a fixing device and a polishing solution timing and quantitative adjusting and controlling device, wherein the material cylinder is used for containing the polishing solution to be added and is hung on a polishing machine through the fixing device; the air pressure system comprises an air source, an air filter, an air pressure regulator and an air pressure meter, wherein the air source filters impurities through the air filter, the air source is connected with the air pressure regulator, the air pressure regulator regulates pressure, and the air pressure meter displays the air pressure value in the charging barrel; the safety system comprises a gas pressure meter and a safety valve, and when the gas pressure value is greater than a threshold value, the safety valve can be opened to adjust the gas pressure in the charging barrel; the alarm system comprises a floating plate liquid level meter, an alarm lamp and a liquid level upper and lower limit sensor; the polishing solution timing and quantitative regulation and control device is electrically connected with the flow regulating valve by adopting a time relay for timing and quantitative control of the polishing solution. The invention can realize automatic, quantitative, long-time and controllable adding of the grinding material.

Description

Pneumatic automatic supply device for high-viscosity polishing solution
Technical Field
The invention relates to an auxiliary device used in a polishing process of high-viscosity polishing solution, in particular to a pneumatic automatic supply device of the polishing solution.
Background
With the increasing demand for ultra-precise workpieces and the increasing demands on performance and processingThe method has the advantages that scientific researchers continuously explore efficient and high-quality novel polishing methods, workpiece materials can be efficiently removed, the surface shape adaptability is good, and the flexible polishing technology which is integrated with the environmental protection concept has great development potential. The polishing solution is one of the key elements for carrying out ultra-precision machining on a workpiece, and the performance of the polishing solution directly influences the quality of the polished surface. The polishing slurry is typically composed of an ultra-fine solid particle abrasive (e.g., nano-SiO)2、Al2O3Particles, etc.), surfactant, stabilizer, oxidant, chelating agent, deionized water, solid particles for grinding, and chemical oxidant for corrosion and dissolution.
In the polishing process, the polishing solution is one of the important process factors affecting the efficiency and quality of the polishing process. The traditional polishing solution is usually supplied by a pump, but because the polishing solution has high abrasive concentration and high viscosity in some polishing processes, the pump often causes the blockage of the polishing solution and the damage of internal elements of a pump body. Therefore, the polishing liquid is added into the polishing disc regularly in the manual filling mode mainly adopted in the polishing process of the high-viscosity polishing liquid at present. According to different procedures and process requirements, the additive is generally added once every 10 minutes to 30 minutes. The polishing solution filling method has the following main problems: 1) a large amount of manpower is consumed, and the efficiency is low; 2) the addition amount of the polishing solution is difficult to control; 3) the polishing solution has poor suspension performance and is easy to precipitate after being placed for a period of time; 4) real-time charging cannot be realized.
Disclosure of Invention
In order to overcome the defects in the prior art, the invention provides the pneumatic automatic supply device for the high-viscosity polishing solution, which can realize automatic, quantitative, long-time and controllable addition of the grinding materials.
The technical scheme adopted by the invention for solving the technical problems is as follows:
the pneumatic high-viscosity polishing liquid automatic supply device is used for automatically adding materials to a polishing machine adopting high-viscosity polishing liquid, and comprises a charging barrel, a pneumatic system, a safety system, an alarm system, a fixing device and a polishing liquid timing and quantitative adjusting and controlling device, wherein the charging barrel is used for containing the polishing liquid to be added, and the charging barrel is hung on the polishing machine through the fixing device; the air pressure system comprises an air source, an air filter, an air pressure regulator and an air pressure meter, wherein the air source filters impurities through the air filter, is connected with the air pressure regulator, regulates pressure through the air pressure regulator, and displays the air pressure value in the charging barrel; the safety system comprises a gas pressure meter and a safety valve, and when the gas pressure value is greater than a threshold value, the safety valve can be opened to adjust the gas pressure in the charging barrel; the alarm system comprises a floating plate liquid level meter, an alarm lamp and a liquid level upper and lower limit sensor; the polishing solution timing and quantitative regulation and control device is electrically connected with the flow regulating valve by adopting a time relay for timing and quantitative control of the polishing solution.
Further, the polishing solution automatic supply device further comprises a polishing solution shortage alarm device, the polishing solution shortage alarm device comprises the alarm device and an alarm lamp, and the alarm switch is a power switch of the alarm lamp.
Further, automatic polishing solution supply device still includes the not enough alarm device of abradant, the not enough alarm device of abradant includes kickboard level gauge and upper and lower limit sensor of liquid level, upper limit sensor of liquid level and lower limit sensor of liquid level respectively with time relay electric connection, flow control valve also with time relay electric connection.
Further, a control circuit of the liquid level lower limit sensor is provided with 1 second anti-shaking timing, and when the liquid level lower limit sensor senses the floating plate liquid level meter for one second, an alarm lamp is turned on; and 5-second anti-shaking timing is arranged on a control circuit of the upper limit liquid level sensor, and when the upper limit liquid level sensor senses the floating plate liquid level meter for five seconds, the alarm lamp is turned on.
And furthermore, an arc angle is led out from the bottom surface in the charging barrel, an observation window is arranged on the side edge of the charging barrel, and a material supplementing port is arranged at the side end of the charging barrel.
The polishing solution timing and quantitative regulation and control device adopts a time relay to control the polishing solution in a timing and quantitative mode, and the flow regulating valve is electrically connected with the time relay.
The polishing device has the advantages that 1, the polishing device is simple in structure and convenient to operate, polishing liquid can be automatically added in a timed and quantitative mode, labor is saved, and repeatability in a grinding process is improved. 2. The polishing liquid is supplied by air pressure, so that the blockage of the polishing liquid and the damage to the pump blade can be avoided. 3. When the polishing solution in the charging barrel is less than a certain amount, the adding device can automatically alarm to inform an operator to add the polishing solution, so that the workpiece is prevented from being damaged, and the polishing device is safe and reliable. 4. In addition, the floating ball liquid level sensor measures the change of the liquid level through the lifting of the floating ball, is mechanical detection, has poor repeatability precision, is not suitable for viscous or impurity-containing liquid, and is easy to cause floating ball blockage, so the floating plate type liquid level sensor is safer and more convenient to use.
Drawings
FIG. 1 is a schematic diagram of an automatic pneumatic high-viscosity polishing liquid supply apparatus.
Wherein, 1-a floating plate chain; 2-liquid level display meter; 3-an exhaust valve; 4-upper cover of the charging barrel; 5-upper limit liquid level sensor; 6-floating plate; 7-feeding port; 8-a fixation device; 9-liquid level lower limit sensor; 10-polishing solution; 11-a flow regulating valve; 12-a discharge hole; 13-a blow-down valve 2; 14-a time relay; 15-a barrel; 16-an alarm lamp; 17-a viewing window; 18-a gas source; 19-an air filter; 20-a gas pressure regulator; 21-barometer; 22-safety valve.
Detailed Description
The invention is further described below with reference to the accompanying drawings.
Throughout the specification and claims, unless explicitly stated otherwise, the word "comprise", or variations such as "comprises" or "comprising", will be understood to imply the inclusion of a stated element or component but not the exclusion of any other element or component.
Referring to fig. 1, the automatic pneumatic high-viscosity polishing solution supply device comprises a floating plate chain 1, a liquid level display meter 2, an exhaust valve 3, a charging barrel upper cover 4, a liquid level upper limit sensor 5, a floating plate 6, a material supplementing opening 7, a fixing device 8, a liquid level lower limit sensor 9, polishing solution 10, a flow regulating valve 11, a discharging opening 12, a blow-off valve 13, a time relay 14, a charging barrel 15, an alarm lamp 16, an observation window 17, an air source 18, an air filter 19, an air pressure regulator 20, an air pressure meter 21 and a safety valve 22. The pneumatic high-viscosity polishing liquid automatic supply device comprises a charging barrel, a pneumatic system, a safety system, an alarm system, a polishing liquid timing and quantitative adjusting and controlling device and a charging barrel fixing device, wherein the charging barrel is used for containing polishing liquid to be added and is fixed on a polishing machine through the fixing device; the air pressure system comprises an air source, an air filter, an air pressure regulator and an air pressure meter, wherein the air source filters impurities through the air filter, is connected with the air pressure regulator, regulates pressure through the air pressure regulator, and displays the air pressure value in the charging barrel; the safety system comprises a gas pressure meter and a safety valve, and when the gas pressure value is greater than a threshold value, the safety valve can be opened to adjust the gas pressure in the charging barrel; the alarm system comprises a clapboard liquid level meter, an alarm lamp and a liquid level upper and lower sensor; the polishing solution timing and quantitative regulation and control device adopts a time relay to control the polishing solution in a timing and quantitative mode.
Before the feeder works, the floating plate is lifted to the highest position by the floating plate chain 1 and fixed, and a proper amount of polishing solution 10 is added through the material supplementing opening 7 and sent into the charging barrel 15. When the polishing solution continuously enters the charging barrel, air in the barrel is discharged through the exhaust valve 3, and when the charging barrel 15 is filled with the polishing solution 10, a small amount of residual air can be compressed to the exhaust convex opening at the bottom of the exhaust valve 3, so that smooth high-pressure air charging in the barrel can be ensured. When the feeder is in operation, the gas source 18 is turned on, the gas passes through the air filter 19 and the pressure regulator 20 to adjust the pressure to a suitable value, and the valve is opened to charge the charging barrel 15 with high pressure gas. Meanwhile, the valve of the discharge port 11 is opened, and the polishing solution 10 is further conveyed into the polishing machine through a pipeline under the action of air pressure and gravity to polish the workpiece. In addition, when used for a while, the blowdown valve 13 at the bottom of the cartridge may be opened to discharge the residue accumulated at the bottom. After the processing operation, the cartridge cover 4 can be opened to clean the cartridge 15.
The invention can be applied to polishing machines which use high-viscosity polishing solution for polishing, can also be applied to other various grinding machines and polishing machines, can automatically and accurately control the flow of the grinding agent (solution) and the polishing solution, has good grinding (polishing) effect, can save manpower, has strong practicability, is safe and reliable, and has great popularization and application values.

Claims (5)

1. The utility model provides a vapour-pressure type high viscosity polishing solution automatic feeding device which characterized in that: the pneumatic automatic supply device for the high-viscosity polishing solution comprises a charging barrel, a pneumatic system, a safety system, an alarm system, a fixing device and a polishing solution timing and quantitative adjusting and controlling device, wherein,
the charging barrel is used for containing polishing solution to be added, and is hung on the polishing machine through a fixing device;
the air pressure system comprises an air source, an air filter, an air pressure regulator and an air pressure meter, wherein the air source filters impurities through the air filter, is connected with the air pressure regulator, regulates pressure through the air pressure regulator, and displays the air pressure value in the charging barrel; the safety system comprises a gas pressure meter and a safety valve, and when the gas pressure value is greater than a threshold value, the safety valve can be opened to adjust the gas pressure in the charging barrel; the alarm system comprises a floating plate liquid level meter, an alarm lamp and a liquid level up-down sensor;
the polishing solution timing and quantitative regulation and control device adopts a time relay to connect with a flow regulating valve to realize the timing and quantitative control of the polishing solution.
2. The automatic pneumatic high-viscosity polishing solution supply device according to claim 1, wherein: the automatic polishing solution supply device further comprises a polishing solution shortage alarm device, the polishing solution shortage alarm device comprises an alarm lamp, and the alarm switch is a power switch of the alarm lamp.
3. The pneumatic automatic supply device for high viscosity polishing slurry according to claim 1 or 2, wherein: the polishing solution automatic supply device also comprises an abrasive shortage alarm device, the abrasive shortage alarm device comprises a floating plate liquid level meter and a liquid level upper and lower limit sensor, a control circuit of the liquid level lower limit sensor is provided with 1 second anti-shaking timing, and when the liquid level lower limit sensor senses the floating plate liquid level meter for one second, an alarm lamp is turned on; the control circuit of the upper limit liquid level sensor is provided with a 5-second anti-shaking timer, and when the upper limit liquid level sensor senses the floating plate liquid level meter for 5 seconds, the alarm lamp is turned on.
4. The pneumatic automatic supply device for high viscosity polishing slurry according to claim 1 or 2, wherein: the inside bottom surface of feed cylinder derive the arc angle, the side of feed cylinder is equipped with the observation window, the feed cylinder upper end begins to be equipped with the feed supplement mouth.
5. The pneumatic automatic supply device for high viscosity polishing slurry according to claim 1 or 2, wherein: the polishing solution timing and quantitative regulation and control device adopts a time relay to control the polishing solution in a timing and quantitative mode, and the flow regulating valve is electrically connected with the time relay.
CN202010354120.7A 2020-04-29 2020-04-29 Pneumatic automatic supply device for high-viscosity polishing solution Pending CN111673621A (en)

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CN202010354120.7A CN111673621A (en) 2020-04-29 2020-04-29 Pneumatic automatic supply device for high-viscosity polishing solution

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115533758A (en) * 2022-11-28 2022-12-30 江苏海漩液压泵业有限公司 Polishing agent self-adjusting supply device for polishing machine

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005052952A (en) * 2003-08-07 2005-03-03 Matsushita Electric Ind Co Ltd Slurry feeder and the slurry feeding method
CN101648365A (en) * 2009-09-14 2010-02-17 中国电子科技集团公司第四十五研究所 CMP polishing solution supplying system
CN102554795A (en) * 2012-01-18 2012-07-11 江苏智邦精工科技有限公司 Automatically controlled ceramic ball abrasive material adding device
CN206780194U (en) * 2017-06-08 2017-12-22 安徽格楠机械有限公司 A kind of lapping liquid automatic feeding
CN208088426U (en) * 2018-03-24 2018-11-13 北京利华消防工程有限公司 A kind of fire pump room gas top-pressure device
CN109366273A (en) * 2018-11-30 2019-02-22 象山维治模具有限公司 Plate grinding device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005052952A (en) * 2003-08-07 2005-03-03 Matsushita Electric Ind Co Ltd Slurry feeder and the slurry feeding method
CN101648365A (en) * 2009-09-14 2010-02-17 中国电子科技集团公司第四十五研究所 CMP polishing solution supplying system
CN102554795A (en) * 2012-01-18 2012-07-11 江苏智邦精工科技有限公司 Automatically controlled ceramic ball abrasive material adding device
CN206780194U (en) * 2017-06-08 2017-12-22 安徽格楠机械有限公司 A kind of lapping liquid automatic feeding
CN208088426U (en) * 2018-03-24 2018-11-13 北京利华消防工程有限公司 A kind of fire pump room gas top-pressure device
CN109366273A (en) * 2018-11-30 2019-02-22 象山维治模具有限公司 Plate grinding device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115533758A (en) * 2022-11-28 2022-12-30 江苏海漩液压泵业有限公司 Polishing agent self-adjusting supply device for polishing machine
CN115533758B (en) * 2022-11-28 2023-08-08 江苏海漩液压泵业有限公司 Polishing agent self-adjusting supply device for polishing machine

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Application publication date: 20200918

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