CN111670135B

CN111670135B - Cleaning apparatus, compressed air system, and cleaning method

Info

Publication number: CN111670135B
Application number: CN201880071147.6A
Authority: CN
Inventors: 扬·菲布兰特; 黑尔格·韦斯特坎普
Original assignee: ZF CV Systems Europe BV
Current assignee: ZF CV Systems Europe BV
Priority date: 2017-11-06
Filing date: 2018-09-06
Publication date: 2023-06-30
Anticipated expiration: 2038-09-06
Also published as: US20200282416A1; WO2019086158A1; EP3707035A1; EP3707035B1; DE102017010254A1; US10888890B2; CN111670135A; EP3707035B8

Abstract

The invention relates to a cleaning device (100, 100A-D, 100', 100") for selectively applying a medium sequence (MS, MS 1-5) to a surface (O), which medium sequence is formed by at least one first medium (M1), in particular gaseous, and a second medium (M2), in particular liquid, having: -a nozzle (180) configured for loading the surface (O) with a second medium (M2), -a cleaning valve (120, 120', 120 ") having a holding port (122), a pressure port (124, 124 '), a plunger (128, 128 ') and a pressure outlet (126).

Description

Cleaning apparatus, compressed air system, and cleaning method

Technical Field

The present invention relates to a cleaning device for selectively loading a sequence of media onto a surface. The invention also relates to a compressed air system and a cleaning method.

Background

Cleaning devices, in particular for cleaning sensors in vehicles, are well known.

The cleaning device mentioned at the outset is disclosed in DE10 2015,013 a 1. It describes a cleaning unit for an image acquisition unit of a vehicle, which is arranged for ambient acquisition, with at least one cleaning water nozzle arranged for spraying cleaning water onto a transparent cover surface of the image acquisition unit, with at least one wiper arranged for mechanically drying the cover surface of the image acquisition unit, and with at least one compressed air nozzle arranged for loading the cover surface of the image acquisition unit with compressed air.

The concept still needs improvement, especially in terms of dependency on mechanical cleaning by mechanical wipers.

US 9,707,896 B2 describes a vision system for a vehicle comprising a camera with an image converter and an objective lens. The camera is located outside the vehicle and has a field of view outside the vehicle. The air flow element has an inlet opening and an outlet opening, wherein the outlet opening is configured such that it diverts the air flow in front of the lens in order to guide dirt away from the lens. The outlet opening is configured such that it diverts the air flow at a speed greater than the air flow rate into the inlet interface. The inlet opening may have an inlet area substantially larger than an outlet area of the outlet interface. The system may comprise a gas flow generating device for generating or enhancing a gas flow through the gas flow device. Thus, this concept achieves an air curtain for protecting the sensor from external influences, and thus improvements are still needed, especially in terms of cleaning the sensor.

It is desirable to ensure reliable and thorough cleaning, especially at relatively low costs, especially in terms of facilities. Furthermore, low consumption of energy and cleaning media is desirable, as well as a robust, in particular as low maintenance, construction is desirable.

Disclosure of Invention

The object of the invention is to provide a cleaning device which at least partially obviates the above-mentioned problems.

In particular, a high degree of reliability and thoroughness in cleaning should be achieved, and costs in terms of facilities and maintenance of cleaning equipment should be reduced. A relatively low energy and cleaning medium consumption should also be achieved.

This object is achieved by a cleaning device according to the invention for selectively loading a medium sequence onto a surface. The invention is based on a cleaning device for applying a medium sequence of at least one first medium and a second medium to a surface, comprising a nozzle configured for applying the second medium to the surface and a cleaning valve having a holding connection, a pressure connection, a plunger and a pressure outlet.

According to the invention, it is provided in the cleaning device that a pressure outlet is provided for pulsed application of the first medium to the surface, that a high-pressure accumulator is provided for storing the first medium, in particular at a storage pressure, and that a switching valve is provided for selectively establishing a connection between the first medium feed line and a holding line connected to the holding interface.

In particular, in the cleaning device, the pressure outlet and the nozzle are configured to pulse the medium sequence onto the surface.

The invention is based on the insight that it is generally advantageous to keep the costs, especially the costs in terms of facilities and the consumption of energy and cleaning medium when cleaning surfaces as low as possible, without restricting the cleaning effect. This relates in particular to the cleaning of the surface of the sensor or of the sensor cover, for which purpose a clean surface is a prerequisite for a defined and reliable functioning of the sensor.

The invention is based on the recognition that the surface to be cleaned is subjected to a sequence of media, in particular to a sequence of at least two media which are controlled, in particular intermittently and/or alternately, and are each directed onto the surface in the form of a beam, in particular in the form of one or more pulses which lead to a relatively high cleaning effect. In particular, the present invention recognizes that the sequence of loading the cleaning agent followed by one or more pulses of compressed air results in a better cleaning effect than cleaning methods based on compressed air alone or liquid alone. Compared to continuously loaded systems, there is also the advantage that energy and cleaning media can be saved.

In the context of the present invention, the term "pulsed" is understood to mean that a surface is suddenly and violently loaded with a medium whose pulse is particularly suitable for loosening and/or removing particles, in particular dirt particles, located on the surface. In general, the cleaning effect of the pulse is advantageously increased here, in particular by a relatively high medium mass, a relatively high impact speed of the medium onto the surface and a relatively rapid loading trigger. A relatively fast loading trigger (especially as opposed to a slow, continuously lifting flow of medium) results in a limited air mass stored in the reservoir impinging on the surface in a relatively short period of time. Thus advantageously achieving high pulses.

The invention further recognizes that the cleaning effect (even better than other cleaning methods, in particular based on compressed air alone or liquid alone) can be at least sufficient when such a medium sequence is applied, so that in particular the dependence on mechanical cleaning appliances, such as, for example, wipers or the like having an appliance in contact with the surface to be cleaned, can be reduced or even completely dispensed with. The number of moving and wearing parts is thereby advantageously reduced, and thus robustness is provided, as well as manufacturing costs and susceptibility to failure of the cleaning device. In the context of the present invention, a medium sequence is understood as a sequence of one or more loads within the scope of the cleaning process. Particularly preferably, the medium sequence has one or more, in particular pulsed, applications of a first medium, in particular compressed air, and one or more applications of a second medium, in particular water.

In order to solve this object, the invention also relates to a compressed air system having at least one sensor, wherein the sensor or in particular the transparent cover of the sensor has a surface, and having at least one cleaning device according to the inventive concept, wherein a first medium source of the compressed air system can be connected to the at least one cleaning device via a first medium feed line and a second medium source can be connected to the at least one cleaning device via a second medium feed line.

To solve this task, the invention also relates to a cleaning method for cleaning a surface, having the following steps: charging a high-pressure accumulator with a first medium, in particular air; the storage pressure in the high-pressure reservoir is held, in particular by the holding pressure at the holding connection of the cleaning valve, in particular by switching the switching valve into the holding position; loading a second medium, in particular water or a cleaning agent, onto the surface; in particular, the surface is acted upon by the first medium by releasing the holding pressure at the holding connection, in particular by switching the switching valve into the release position.

In a development of the cleaning method, it is provided that the application of the second medium to the surface and the application of the first medium to the surface are controlled in time, in particular alternately and/or intermittently. In particular, this may include in particular that the individual loads of the medium sequence may be repeated or combined with one another as desired and in particular as desired. For example, alternating loading of the first medium and the second medium, in particular alternating loading of compressed air and cleaning liquid, may be advantageous for achieving a desired or required cleaning effect. It is also possible, for example, for the number of repetitions of the respective loading or media sequence to be determined as three or five repetitions. It is also possible to carry out the loading with only one medium, for example with compressed air only or with water or cleaning liquid only, in terms of loading or medium sequence.

In a development, it is advantageously possible for the respective application or media sequence to be repeated as a function of the cleaning effect achieved and/or the particles remaining on the surface. The measured value of the sensor associated with the surface can thus be used, for example, as a repeated interruption criterion. For this purpose, for example, the brightness value of the optical sensor may be considered, which increases with an increase in the removal of particles from the surface, or a reference image may be considered, which has an increased consistency with the camera image taken by the optical sensor with an increase in the removal of particles from the surface.

The advantages of the device are advantageously utilized in the compressed air system according to the invention. In particular, fewer costs in terms of facilities and fewer dependencies on mechanically moving parts, such as, for example, wipers, are advantageous for use in vehicles and the like, in particular in mobile machines. The use of the compressed air system according to the invention in a vehicle also results in a lower consumption of energy and cleaning medium, since energy and cleaning medium are only present to a limited extent in vehicles and similar mobile systems. The aspect of reliable cleaning is also important in vehicles, since the sensors to be cleaned generally assume critical and safety-relevant tasks.

In the cleaning method according to the invention, the advantages of the device are also advantageously utilized, similar to the cleaning device and the compressed air system.

In particular, it is provided that the cleaning device is configured, in particular by means of the control module, for selectively, in particular individually, simultaneously or alternately applying the first medium and/or the second medium to the surface. In particular, this may involve that the switching valve or switching valves can be actuated in such a way that the medium sequence is produced in a controllable manner, in particular by a time-coordinated actuation of the switching valve or switching valves. For this purpose, the loading or media sequence may be repeated (as pre-adjusted and/or required) each time and/or different loading or media sequences may be combined. In particular, it is also possible to promote a loading or a sequence of media with only one medium, for example with compressed air only or with water or cleaning liquid only. The control module can be embodied here as part of the cleaning device or else as part of a higher-level control, in particular as part of a control bus or similar electronic control system.

In particular, it is provided that the cleaning device is designed to control the composition and the sequence of the medium sequence in time, in particular alternately and/or intermittently. In particular, this can be achieved in particular by actuating the first and second switching valves. The time-controlled application of the load advantageously allows optimum cleaning of the surface to be achieved, depending on the degree of contamination, the ambient conditions and the operating parameters. Alternating means, in particular, that only one medium is always applied to the surface at a time. In particular, this means that the loading of one, for example a first medium, is completely interrupted and then the loading of the other, for example a second medium, is started, and conversely the loading through the first medium is continued again only after the interruption of the loading of the second medium. During loading, in particular also within the media sequence, there may be defined pauses, for example, in order to soak the dust particles.

Intermittent means in particular that the respective medium flows, in particular the flow of the first medium and the flow of the second medium, are triggered and interrupted, respectively. In this case, both media can also be loaded onto the surface at the same time. For example, water, the second medium, may be continuously loaded onto the surface during a sequence of media, during which one or more pulses of compressed air (i.e., loading the first medium) are triggered.

Advantageously, the cleaning valve is configured as a quick-action exhaust valve. By using a quick-action exhaust valve, in particular, a pulsed application of the first medium, in particular compressed air, to the surface can be achieved in a relatively simple design. A relatively high cleaning performance is advantageously achieved by pulsed loading. The use of a quick exhaust valve (in the sense of a pre-control) also advantageously makes it possible to switch relatively large mass flows, in particular air mass flows, with relatively low holding pressures. In the synergistic interaction of the quick-action exhaust valve with the high-pressure reservoir, the high-pressure reservoir can be filled with a relatively low air mass flow over a longer period of time and subsequently emptied over a relatively short period of time by the large air mass flow being led through the pressure outlet of the quick-action exhaust valve. A high cleaning performance is achieved in that a short, in particular abrupt, but large air mass flow generates a high pulse which occurs upon impact with the surface.

In particular, it is provided that the cleaning valve has a movable plunger, in particular for triggering a pulsed flow of the first medium, wherein the plunger can be controlled via a holding pressure applied at the holding connection. In this case, similarly to the above-described modification (in the sense of pre-control), a relatively large mass flow, in particular an air mass flow, can advantageously also be switched with a relatively low holding pressure by means of the quick-action exhaust valve. Due to the fact that the area on the holding chamber side to which the holding pressure is applied is larger than the area on the inlet chamber side to which the holding pressure is applied, the plunger can be closed at a lower holding pressure and still a relatively large mass flow is pulsed via the pressure outlet onto the surface when the plunger is opened.

Within the scope of a preferred embodiment, it is provided that the plunger can be formed in a single-sided manner, in particular to allow the first medium to flow from the holding connection to the pressure connection and to be blocked in the opposite direction. In particular, this means that the plunger can advantageously act as a check valve and that the flow of the first medium is allowed, in particular in the case of a pressure prevailing at the holding connection being higher than the pressure at the pressure connection. For this purpose, the plunger may have an annular recess on the side facing the inlet chamber and/or a sealing lip extending substantially over the outer circumference of the plunger. By this feature, a flexibility of the plunger is advantageously achieved, which allows the medium to flow in one direction and to be blocked in the opposite direction.

In this context, the term "one-sided passable" does not necessarily mean that the plunger itself is passable, but is allowed to flow past itself, i.e. by the plunger, in one direction, but is blocked in the opposite direction, for example, due to its deformability. Such trafficability is thus not caused by the trafficable material, but by deformability and the gaps that occur between the plunger and the member adjoining the plunger, for example the inner wall of the cleaning valve and/or in particular the inner wall of the holding chamber.

In this development with a single-sided plunger, the plunger can advantageously take on the function of the reservoir line and the function of the high-pressure storage and holding valve functioning as a check valve. The cleaning device is advantageously more compact, in particular due to the fact that these components can be saved. In such a development, the compressed air losses can also be advantageously reduced.

Within the scope of a preferred development, it is provided that the high-pressure accumulator is connected to the holding line, in particular via the accumulator branch and the accumulator line. In particular, this means that the high-pressure reservoir can be filled via the holding line. Thus, the dependency on further wiring may be reduced and the complexity of the cleaning device may advantageously be reduced. This development advantageously makes use of the fact that the holding line must be held at a holding pressure for closing the cleaning valve and for filling the high-pressure reservoir with the available pressure.

In the context of a preferred development, it is provided that a high-pressure reservoir holding valve is arranged in the reservoir line, wherein the high-pressure reservoir holding valve is in particular designed as a check valve that is closed against the filling direction of the high-pressure reservoir. In particular, it is advantageously achieved by such a high-pressure accumulator holding valve that, when the first switching valve is switched into the release position, the first medium stored in the high-pressure accumulator does not escape via the accumulator line, but flows into the pressure connection of the cleaning valve.

Advantageously, the pressure outlet is configured such that the first medium is actually guided along the first beam axis onto the surface. In particular, this means that the first medium is guided in a reproducible manner onto the location or area of the surface that should be cleaned. For this purpose, the pressure outlet is formed and oriented symmetrically about the first jet axis, in particular in the sense of a nozzle.

In particular, it is provided that the nozzle is configured such that the second medium is actually guided onto the surface along the second beam axis. In particular, this means that the second medium is guided in a reproducible manner onto the location or area of the surface to be cleaned. For this purpose, the nozzle is designed and oriented in particular symmetrically about the second beam axis.

Within the scope of a preferred development, it is provided that the first beam axis and the second beam axis intersect at the surface in the target region. In particular, this means that the first medium and the second medium impinge on a common location or area on the surface, and that these media can thus interact for achieving an advantageous cleaning effect according to the inventive concept. It is however also possible that the two beam axes are oriented in such a way that they intersect the surface at a defined distance. Thus, possible ambient conditions, in particular the oncoming wind acting on the vehicle and thus on the sensor and/or the inertia of the respective medium, can be taken into account in order to still ensure a substantially local convergence of the two media on the surface within the target area.

In particular, it is provided that the high-pressure accumulator has a capacity of 0 to 20cl, preferably 1 to 10cl, particularly preferably 3 to 7 cl. The duration and the intensity of the cleaning pulse of the first medium are determined by the capacity of the high-pressure accumulator, in particular such that (together with the pressure, in particular the holding pressure, of the first medium stored in the high-pressure accumulator).

Within the scope of a preferred development, it is provided that the cleaning device is configured as a structural unit in the form of a cleaning module, in particular the high-pressure reservoir is arranged in or directly on the cleaning valve. In this way, a compact and robust construction of the cleaning device can be achieved, and thus the cleaning device can be positioned as close as possible to the surface to be cleaned particularly advantageously. This embodiment also advantageously makes it possible for the medium to be stored to have to travel a short distance, and thus to reduce the pressure loss and to increase the pulses generated by the medium to be loaded. In particular, in this development, it is achieved that the ratio of the available volume to the lost volume is advantageously increased. The storage volume of the high-pressure reservoir is understood here to be the usable volume, and the volume of the line between the high-pressure reservoir and the purge valve is understood to be the lost volume. The modular nature of the cleaning module also simplifies the replacement of the cleaning module and thus the maintenance.

In particular, it is provided that the nozzles are supplied via a supply line, wherein the supply line is connected to the second medium feed line via a second switching valve. In particular, this means that the loading of the surface with the second medium can be controlled in such a way that the supply of the second medium to the nozzle can be influenced by means of the second switching valve. In particular, the second switching valve may be configured as a solenoid valve.

In a development of the compressed air system, it is provided that the first medium source serves other main purposes, in particular for supplying air suspension systems or similar pneumatic systems. In this development, the cleaning device can advantageously be supplied with an already existing medium source, in particular a compressed air source. This is particularly advantageous when used in a vehicle or similar mobile system, as the number of parts required is reduced and thus weight, cost and energy can be saved.

In a development of the compressed air system, it is provided that the second medium source serves a further main purpose, in particular for supplying a glass cleaning installation or similar cleaning installation. In this development, the cleaning device can advantageously be supplied with an already existing medium source, in particular a liquid and/or cleaning agent source. This is particularly advantageous when used in a vehicle or similar mobile system, as the number of parts required is reduced and thus weight, cost and energy can be saved.

In a development of the compressed air system, it is provided that the sensor is an optical sensor, in particular an ambient sensor. In this development, the cleaning device according to the inventive concept is particularly advantageous, since periodic cleaning of the sensor surface will improve the function of the sensor, in particular because the optical properties of the sensor are related to the transparency and/or translucency of the sensor surface.

In a development of the compressed air system, it is provided that the first medium source has a compressor device and/or a compressed air store, in particular in which the compressor device is arranged. In this way, a compact design of the compressed air system is particularly advantageously achieved.

In a development of the compressed air system, it is provided that the compressed air system has at least one feed line check valve, in particular in the first medium feed line and/or the first source line. In this way, the compressed air produced by the compressor device does not escape via the unsealing means in the event of leaks or similar unsealing leading to a pressure loss in front of the valve in the transport direction. This is so because the at least one feed line check valve is blocked in the flow direction opposite the conveying direction and thus in particular the holding pressure in the part of the compressed air system located behind the valve in the conveying direction can be held.

Embodiments of the present invention will now be described below with reference to the accompanying drawings. The figures are not necessarily to scale, illustrating embodiments, but rather the figures are discussed for illustration in a schematic and/or slightly distorted manner. For additional aspects of the teachings that can be seen directly from the drawings, reference is made to the related art. It is contemplated herein that various modifications and changes may be made in the form and details of the embodiments without departing from the general inventive concept. The features of the invention disclosed in the description, in the drawings and in the claims may be essential for the development of the invention not only individually but also in any combination. Furthermore, all combinations of at least two of the features disclosed in the description, in the drawings and/or in the claims fall within the scope of the invention. The general inventive concept is not limited to the exact forms or details of the preferred implementations illustrated and described below, or to subject matter which will be limited in comparison with the claimed subject matter. In the case of the specified size ranges, values lying within the limits set forth are also to be disclosed as limiting values and can be used arbitrarily and can be protected. For simplicity, the same reference numbers are used below for the same or similar parts or parts having the same or similar functions.

Drawings

Further advantages, features and details of the invention result from the following description of preferred embodiments and the accompanying drawings. Wherein:

fig. 1 shows a schematic view of an embodiment of a cleaning device according to the concepts of the present invention;

FIGS. 2A-D illustrate a sequence of cleaning processes according to the concepts of the present invention;

fig. 3 shows a modification of the compressed air system according to the concept of the invention;

fig. 4 shows a further preferred development of the cleaning device according to the concept of the invention;

fig. 5 shows a further preferred development of the cleaning device according to the concept of the invention;

FIGS. 6A, 6B, 6C, 6D and 6E illustrate five possible media sequences by way of example and in a highly simplified manner; and

fig. 7 shows a schematic view of a vehicle with a cleaning device according to the inventive concept.

Detailed Description

Fig. 1 shows a schematic view of an embodiment of a cleaning device 100 according to the inventive concept, which is currently formed in the form of a cleaning module 101 as a structural unit. A cleaning valve 120, which is currently configured as a quick-action exhaust valve 121, is arranged in the cleaning module 101. The cleaning valve 120 has a holding connection 122 which is connected via a holding line 172 to the first switching valve connection X1 of the switching valve 160. Furthermore, the cleaning valve 120 has a pressure connection 124, which is connected to the high-pressure reservoir 140 via a reservoir connection 142 and leads to the inlet chamber 127 of the cleaning valve 120. Furthermore, the cleaning valve 120 has a pressure outlet 126 which is designed in such a way that it can guide the exiting fluid, in particular the first medium M1, along the first beam axis A1 into the target region OZ of the surface O. The surface O may in particular be the surface O of the sensor 300 or the surface O of the cover 310 of the sensor 300 (not shown here). In particular, the sensor 300 may be an optical sensor 302, not shown here, and in particular an ambient acquisition sensor 304 (also not shown here).

The purge valve 120 has an additional outlet in the form of a nozzle 180. The nozzle 180 is designed in such a way that it can direct a fluid, in particular a second medium M2, along a second beam axis A2 onto a target region OZ of the surface O. Thus, the pressure outlet 126 and the nozzle 180 are oriented in such a way that their beam axes A1, A2 actually intersect at a location on the surface O, i.e. in the target zone OZ. The nozzles 180 are connected by means of a feed line 192. The conveying line 192 is also connected in a detachable manner via a second switching valve 190 to a second medium feed line 220 for conveying the second medium M2. It is of course also conceivable that the first beam axis A1 and the second beam axis A2 do not intersect, but impinge on the surface O at respective different locations, for example in order to take into account different inertial properties of the first medium M1 and the second medium M2, especially when the area between the cleaning device 100 and the surface 300 is exposed to accelerations, oncoming wind and/or similar ambient influences.

At the present time, the switching valve 160, which is configured as a solenoid valve, is located in the first holding position 160.1. In this holding position 160.1, a connection exists between the first switching valve connection X1 and the second switching valve connection X2. The second switching valve interface X2 is connected with the first medium feed line 210 such that the first medium M1 is fed to the cleaning apparatus 100 via the first medium feed line.

In the present case, a memory branch 173 is arranged in the holding line 172, from which memory branch 174 is arranged, which connects the memory branch 173 with the charging branch 144. The first medium M1 can flow via the reservoir line 174 in the direction of the filling branch 144 from the filling direction BS of the holding line 172 and can also flow via the reservoir interface 142 into the high-pressure reservoir 140, where the first medium M1 is stored with a storage pressure PS, which in particular corresponds substantially to the holding pressure PH. The storage pressure PS is derived in particular from the pressure supplied by the first medium M1 at the holding line 172, in particular from the holding pressure PH, if appropriate minus the pressure loss accumulated along the storage line 174. Here, the first medium M1 likewise flowing from the reservoir branch 173 in the direction of the holding connection 122 causes a holding pressure PH to be present in the holding chamber 123 of the cleaning valve 120. This holding pressure PH results in the plunger 128 being pressed against the outlet stop 129 by the holding force FH and thus closing the pressure outlet 126.

As a result, the plunger 128 is pressed against the outlet stop 192 by the holding force FH, so that the first medium M1 cannot continue to flow from the filling branch 144 in the direction of the pressure connection 124, but only into the high-pressure reservoir 140. This is so because the flow path behind the inlet chamber 127 is blocked by the plunger 128. Although the first medium M1 led into the inlet chamber 127 of the cleaning valve 120 exerts an opening force FO opposite to the holding force FH. However, this opening force FO is smaller than the holding force FH (due to the small loaded area of the plunger 128 and, in addition, in particular, due to the pressure loss caused by the reservoir line 174).

A high-pressure reservoir holding valve 170, which is currently configured as a check valve 170' that opens spontaneously against spring force in the filling direction BS, is also arranged in the reservoir line 174. The high-pressure accumulator retaining valve 170 is configured to allow the first medium M1 to flow in the filling direction BS and to shut off the flow in the opposite direction. It is thus possible for the high-pressure reservoir 140 to be filled, in particular, when the holding line 172 is loaded to hold the pressure PH, but conversely, when the switching valve 160 is switched into the release position 160.2, the first medium M1 stored in the high-pressure reservoir 140 cannot escape via the reservoir line 174.

If the switching valve 160 is switched from the holding position 160.1 into the release position 160.2, the second switching valve connection X2 is closed and a connection is established between the first switching valve connection X1 and the third switching valve connection X3. The third switching valve port X3 is connected to the delivery line 192 leading to the nozzle 180 via an exhaust branch 194.

Thus, in the release position 160.2, the first medium M1 held in the holding chamber 123 can escape via the holding line 172, the exhaust branch 194, the conveying line 192 and finally via the nozzle 180. Thus, the holding force FH acting on the plunger 128 is reduced and lower than the amount of opening force FO acting in opposition. As a result, the plunger 128 is not pressed against the outlet stop 129 for a long time, but is moved into the holding chamber 123, so that the first medium M1 stored under pressure in the high-pressure reservoir 140 can flow via the reservoir interface 144 and the pressure interface 124 and the inlet chamber 127 to the pressure outlet 126 and from there be guided along the first beam axis A1 onto the target region OZ of the surface O. The return movement of the plunger 128 takes place relatively rapidly, in particular hard and with a relatively large mass flow, so that the first medium M1 impinges on the surface O with a relatively high pulse.

It is particularly preferred that the first medium M1 is air. Air may be drawn from the atmosphere, compressed in a compressor 402, not shown herein, into compressed air, and stored in the high pressure reservoir 140. The application of compressed air, in particular pulsed, to the surface O via the cleaning valve 120, in particular in combination with the additional alternating or simultaneous intermittent application of the second medium M2 to the surface O via the nozzle 180 of the cleaning valve 120, results in an advantageous cleaning effect. For this purpose, the loading of the second medium M2 can be controlled via the second switching valve 190.

The switching valve 160 and the second switching valve 190 can be opened or closed by a control module 350, which is shown here by way of example, in particular in order to load the surface O in a controllable manner and/or to generate a medium sequence, which is connected in a signal-conducting manner not only via a first switching valve control line 352 to the switching valve 160, but also via a second switching valve control line 354 to the second switching valve 190.

It is particularly preferred that the second medium M2 is formed by water M2.1 or a cleaning agent M2.2 or by a mixture of water M2.1 and cleaning agent M2.2. The second medium M2 can also advantageously be taken from a medium source already present in the system, in particular in the vehicle. Such a medium source may for example be a tank with a cleaning liquid for a glass cleaning installation.

Improved cleaning may advantageously be achieved by alternately loading the first medium M1 and the second medium M2 to the surface O, or by intermittently loading the first medium M1 and the second medium M2 to the surface O simultaneously but independently of each other. The improved cleaning effect occurs in particular because the second medium M2, in particular in the liquid state, leads to a softening of the dirt particles 320 on the surface O and also undesirable particles, and the subsequent, in particular pulsed, loading of the first medium, in particular in the gaseous state, leads to a reliable removal of the softened dirt particles 320.

Fig. 2A to 2D basically show the improvement of fig. 1 during the cleaning method according to the concept of the invention. In fig. 2A, a second medium M2 is loaded to the surface O through the nozzle 180. For this purpose, the second medium M2 flows via the second medium feed line 220 and the transport line 192 to the nozzle 180. Possible dirt particles 320 located on the surface O are loaded with the second medium M2 in liquid form and softened. It is also possible that at least a part of the dirt particles 320 have been removed by loading the second medium M2.

At the same time, the switching valve 160 is in the holding position 160.1. By means of the holding position 160.1, a connection is made between the first medium feed line 210 and the holding line 172, by means of which connection the first medium M1 loaded with the holding pressure PH reaches the holding connection 122 of the cleaning valve 120. As a result, plunger 128 is pressed against retaining stop 129 by retaining force FH, and pressure connection 124 is thus blocked.

In fig. 2B, the loading of the surface O with the second medium M2 is interrupted and the switching valve 160 is in the release position 160.2. As a result, the first medium M1 escapes from the holding line 172 and further via the exhaust branch 194 and the nozzle 180 into the surroundings U. The amount of holding force FH here drops below the amount of opening force FO acting in opposition. Thus, the plunger 128 is moved back into the holding chamber 123 from the holding stop 129 by the opening force FO. The first medium M1 can thus flow from the high-pressure reservoir 140 via the reservoir connection 142 to the pressure connection 124 and further via the purge valve 120 to the pressure outlet 126. The relatively rapid opening of the cleaning valve 120, which is configured as a rapid exhaust valve 121, thus results in a pulsed loading of the first medium M1 onto the surface O. By pulsed application, in particular, dirt particles 320 which were at least partially softened in the preceding step are removed. The action of the pulsed loading can be similar to that of a mechanical cleaning device (e.g., a glass wiper). However, in order to achieve this cleaning effect, according to the inventive concept, no such mechanically moving parts, which are worn and in contact with the surface O, such as wipers, are required.

In fig. 2C, the cleaning apparatus 100 is shown in a state in which loading of the first medium M1 to the surface O is ended. In particular, the high-pressure reservoir 140 is emptied and the switching valve 160 is again in the holding position 160.1. The holding position 160.1 results in that the first medium M1 can flow again via the first medium feed line 210 into the holding line 172, and thus a holding pressure PH is present at the holding connection 122. As a result of the holding pressure PH at the holding interface 122 and thus also the holding pressure P prevailing in the holding chamber 123, the plunger 128 is pressed against the holding stop 129 again by the resultant holding force FH. Thus, the pressure connection 124 of the cleaning valve 120 is again blocked.

The final state is shown in fig. 2D, in which the high pressure memory 140 is refilled. As a result of the pressure connection 124 being blocked, the first medium M1 flows not only via the holding line 172 to the holding connection 122, but also via the reservoir branch 173 and the reservoir line 174 to the high-pressure reservoir 140, as a result of which the latter is filled. After the high pressure reservoir 140 is filled, the cleaning device 120 is ready to continue loading the first medium M1 to the surface O.

The steps shown in fig. 2A to 2D do not necessarily have to be performed one after the other. It is thus for example possible to perform the steps shown in fig. 2A in parallel with the steps shown in fig. 2D. Thus, loading the second medium M2 to the surface O may be performed in parallel with the charging of the high pressure memory 140. Loading the second medium M2 to the surface O may also be performed in parallel with loading the first medium M1 to the surface O.

Fig. 3 shows a modification of the compressed air system 1000 according to the concept of the invention. The compressed air system 1000 has four

cleaning apparatuses

100A, 100B, 100C and 100D, which substantially correspond to the cleaning apparatus 100 shown in fig. 1, respectively. Here, only the cleaning apparatus 100A is shown in detail, and only the remaining three cleaning

apparatuses

100B, 100C, and 100D are indicated for clarity.

The compressed air system 1000 has a first medium source MQ1 for providing a first medium M1. At the present time, the first media source MQ1 is formed by a compressor device 400, wherein the compressor device 400 has a compressor 402, an air dryer 404 and a compressed air store 440. By providing the compressed air reservoir 440, a faster supply of the compressed air system 1000 can advantageously be achieved, and the generation of compressed air is decoupled in time from the consumption of compressed air. In the present case, the compressor device 400 is arranged within the compressed air reservoir 440 within the scope of the development, which results in an advantageous compact design in particular. The first medium M1, in particular air M1.1, is sucked from the surroundings U by the compressor 402 via the compressor feed 442 and compressed, is subsequently dried in the air dryer 404 and is led via the compressor outlet 444 into the compressed air store 440. The first compressed medium M1 is supplied from the compressed air store 440 via a storage outlet 446 and further via a first source line 408 to the first supply interface 410.

By means of the compressor device 400 in combination with the compressed air reservoir 440 as the first medium source MQ1, in particular as a device with the compressor device 400 inside the compressed air reservoir 440, the

cleaning apparatuses

100A, 100B, 100C and 100D can be relatively quickly supplied with compressed air, and furthermore, a constant pressure in the pressure line connected to the first medium source MQ1 is ensured, in particular without the compressor device 400 being rendered active for this purpose.

The first medium M1 arrives from the first supply interface 410 at the first feed line 210, from where the first medium M1 is supplied to the cleaning device 100A at the second switching valve interface X2, and similarly supplied to the remaining three cleaning devices 100B-D. At the present time, a feed line check valve 164A is arranged in the flow direction before the second switching valve interface X2 of the cleaning device 100A. In addition, similarly, a feed line check valve 164B-D is arranged in front of a second switching valve interface, not shown here, of the remaining three cleaning devices 100B-D, respectively, i.e. in the branching of the first medium feed line 210 to the respective cleaning device 100B-D. Feed line check valves 164A-D in front of the respective cleaning apparatuses 100A-D may advantageously prevent the holding pressure PH and thus the holding force FH from decreasing. The decrease in the holding pressure PH may be caused, inter alia, by leakage occurring in the source and the media feed lines, in particular in the first source line 408 and/or the first media feed line 210, or when the air pressure from the first media source MQ1 cannot be kept constant.

Alternatively or additionally to the feed line check valves 164A-D, the compressed air system 1000 may have further feed line check valves 164' in the first source line 408, especially as shown in dashed lines in fig. 3. It is thereby advantageously achieved that in the event of a pressure drop in the first medium source MQ1, in particular in the compressed air store 440, the first medium which is produced by the first medium source MQ1 and in particular compressed does not flow back, which would lead to a pressure drop in the first medium feed line 210. Instead, the feed line check valve 164' which is blocked against the feed direction of the first medium source causes the first medium not to flow back in the direction of the first medium source MQ1 and thus, in particular, the holding pressure PH is maintained in the first medium feed line 210.

Alternatively or additionally to the compressed air reservoir 440, the compressed air system 1000 may have a further compressed air reservoir 440' in the first medium feed line 210, as is shown in particular by the dashed line in fig. 3. The further compressed air reservoir is currently coupled to the medium feed line 210 via a reservoir outlet 446'. It is also possible to arrange the storage outlet 446' at other suitable locations on the compressed air system 1000, for example in the first source line 408.

Alternatively or additionally (in a modification not shown here) a first medium M1, in particular compressed air, can also be used in relation to a further medium source MQ1', in particular a medium source MQ1' serving as a further main purpose. Such additional media source MQ1' may be, for example, a compressed air supply facility 900 for an air suspension facility 901 or similar pneumatic facility 910 of the vehicle 800.

The compressed air system 1000 also has a second medium source MQ2 for providing a second medium M2, in particular in liquid form. At the present time, the second media source MQ2 is formed by a tank 420 and a pump 422 coupled to the tank. The second medium M2 may be transported from the tank 420 to the second supply interface 430 by means of a pump. The second medium M2 reaches the second medium feed line 220 via the second supply interface 430. The second medium feed line 220 is connected to the second switching valve 190A of the cleaning device 100A and furthermore to the second switching valves 190B-D of the respective further cleaning devices 100B-D. Accordingly, the supply of the second medium M2 to the respective cleaning apparatuses 100A-D may be individually controlled via the second switching valves 190A-D.

Alternatively or additionally (in a modification not shown here) a second medium M2 can also be used which is related to a further medium source MQ2', in particular a medium source MQ2' for another main purpose. Such additional media source MQ2' may be, for example, a glass cleaning facility 922 or similar cleaning facility 920 for the vehicle 800.

Fig. 4 shows a further preferred development of the cleaning device 100' according to the concept of the invention. The modification shown here differs from the modification shown above in particular in that the cleaning device 100' has no memory branches 173 and no memory lines 174. Thus, the holding line 172 leads only from the first switching valve port X1 to the holding port 122 of the cleaning valve 120'. The special plunger 128' is designed in such a way that when the holding connection 122 is loaded (as in the other illustrated variants too), the plunger is first pressed onto the holding stop 129 by the holding force FH. At the present time, the plunger 128 'has an annular recess 131 on the side B facing the inlet chamber 127 and thus has a sealing lip 130 extending essentially over the outer circumference of the plunger 128'. By this configuration of the plunger 128', the first medium M1 at the holding pressure PH and located in the holding chamber 123 is caused to move the sealing lip 130 radially inwards and thus the first medium M1 flows past the plunger 128' into the inlet chamber 127 of the cleaning valve 120 '. In this way, the first medium M1 is brought to the high-pressure store 140 via the pressure interface 124 and further via the store interface 142. When the high-pressure reservoir 140 is fully charged, in particular when a holding pressure PH is present in the high-pressure reservoir 140, the sealing lip 130 is closed again, and then the holding pressure PH, which is now likewise stored in the inlet chamber 127, will result in an opening force acting on the plunger 128' and in particular on the annular recess 131, which opening force again moves the sealing lip 130 radially outwards and thus blocks the flow of the first medium M1 from the holding chamber 123 into the inlet chamber 120. When the control valve 160 is switched from the holding position 160.1 into the release position 160.2 and thus the holding force FH suddenly drops, the plunger 128 moves back into the holding chamber 123. By flowing from the high-pressure reservoir 140 via the pressure connection 124 to the medium M1 in the inlet chamber 127, the opening force FO acts on the side facing the inlet chamber 127 and thus also on the annular recess 131. Therefore, even when the cleaning valve 120' is opened, the radial sealing effect of the sealing lip 130 can be maintained.

In this variant, the plunger 128' therefore assumes not only the function of the reservoir line 174, but also the function of the high-pressure reservoir holding valve 170, which functions as a check valve, and advantageously simplifies the construction of the cleaning device.

Fig. 5 shows a further preferred development of a cleaning device 100 "with a cleaning valve 120" according to the concept of the invention. In this variant, the high-pressure reservoir 140 "and the cleaning valve 120" form a structural unit, in particular, the high-pressure reservoir 140 "is arranged directly on the cleaning valve 120". In particular, the high-pressure reservoir 140″ can be integrally formed to the housing of the cleaning valve 120″ or can be connected to the housing of the cleaning valve 120″ or the cleaning valve 120″ in a separate manner, for example via a screw connection and/or a flange connection. In this variant, a compact design is advantageously achieved, in particular if the high-pressure reservoir 140 "is integrated into the cleaning valve 120" or forms a structural unit therewith. Furthermore, the proximity between the high-pressure reservoir 140 "and the cleaning valve 120" advantageously reduces the pressure loss, since it is achieved that the medium must travel a short path. The pulse of medium from high-pressure reservoir 140 "led through cleaning valve 120" onto surface 300 can thus also be advantageously increased.

It is also advantageously possible to combine the modification shown in fig. 4 with the modification shown in fig. 5 in order to synergistically combine the features of the plunger 128' that can be passed on one side with the features of the high-pressure reservoir 140 "that is directly connected to the cleaning valve 120". In particular, because in this way it is made possible to further reduce the path that the first medium has to travel.

Fig. 6A to 6E show, by way of example and in a highly simplified manner, five possible media sequences MS1 to MS5. The switching of the media streams, i.e. the respective loading with the first medium M1 and the second medium M2, is here represented in simplified form in binary form with values of zero and one. It is of course also possible to continuously control or regulate the respective medium flows M1 and M2 by continuously actuating the first switching valve 160 and the second switching valve 190.

In fig. 6A first medium sequence MS1 is shown. In this case, in particular by opening the second switching valve 190, the second medium M2 is first guided onto the surface O. After the second loading period TM2, the conveyance of the second medium M2 is ended, and the first medium M1 is loaded to the surface O after the waiting time TW. The loading passes through a first loading period TM1. The first supply period TM1 is determined in this case in particular by the capacity of the high-pressure accumulator 140 and by the flow rate of the first medium M1 of the purge valve 120.

In fig. 6B a second medium sequence MS2 is shown. In the case of the second medium sequence MS2, the first medium M1 and the second medium M2 are loaded to the surface O substantially in parallel. The first medium M1 is applied to the surface O intermittently in a plurality of pulses each having a duration TM1, i.e. four successive pulses. The individual pulses are interrupted for a waiting time TW'. During this time, the second medium M2 is loaded to the surface O for a period TM 2'. Of course, the duration and number of loads can also be adapted here (depending on the requirements and the surrounding conditions), in particular to the pulses of the first medium M1.

In fig. 6C a third medium sequence MS3 is shown. Here, the order of loading thereof is substantially opposite to that of the medium sequence MS1 shown in fig. 6A. In particular, it means that the first medium M1 is loaded first for a first duration TM1 ' "and, after this loading and a subsequent waiting time TW '", the second medium M2 is loaded for a second duration TM2' ". By means of such a medium sequence MS3, dirt and particles can thus be loosened, in particular from the surface, firstly by pulsed application of the first medium M1, in particular in the gaseous state, and subsequently cleaned by application of the second medium M2, in particular in the liquid state.

A fourth media sequence MS4 is shown in fig. 6D. In this medium sequence MS4, only the first medium M1 is loaded to the surface O. In particular, this may mean that the surface O is only pulsed with a gaseous medium, in particular air, in particular with compressed air pulses. This may be the case, for example, when the surface O is already wet, for example, when it is raining. At the present time, the sequence of three loads is exemplarily shown, each having a first duration TM1"", between which a waiting time TW "", respectively, exists.

A fifth media sequence MS5 is shown in fig. 6E. In this medium sequence MS5, only the second medium M2 is loaded to the surface O. In particular, this may mean that the surface O is only loaded with a liquid medium, in particular water or a cleaning liquid. The sequence of three loads is shown in the present example, each having a second duration TM2 '"with a respective waiting time TW'" in between.

Of course, the processes shown in fig. 6A to 6E may be repeated or combined with one another as desired and in particular. For this purpose, a control module 350 or similar control device, which is not shown here, may be used in particular. In particular, it may be advantageously provided to carry out an alternating loading of the first medium M1 and the second medium M2, in particular of compressed air and cleaning liquid, for achieving the desired or necessary cleaning effect.

It is furthermore possible to confirm the number of repetitions of the respective loading or media sequence, for example three or five times.

In a development, it is also advantageously possible for the respective application or media sequence to be repeated as a function of the cleaning effect achieved and/or the particles 320 remaining on the surface O. Thus, for example, the measured value of the sensor 300 associated with the surface O can be used as an interruption criterion for repetition. For this purpose, for example, consider the use of a luminance value of the optical sensor that increases with an increase in the removal of particles from the surface, or the use of a reference image that has an increased consistency with the camera image taken by the optical sensor 300 with an increase in the removal of particles from the surface.

Fig. 7 shows a schematic view of a vehicle 800 (in the present form of a passenger vehicle) with the cleaning device 100 for the surroundings collection sensor 304. In the present case, the first medium source MQ1 is formed by a compressed air supply 900 which is also provided for supplying pneumatic means 910 in the form of air spring means 901. It is of course also possible that the first medium source MQ1 is formed by a separate compressor or a similar compressed air source. To transport the first medium M1, a first medium source MQ1 is connected with the cleaning device 100 via a first medium feed line 210. At the present time, the second media source MQ2 has a tank 420 which is likewise used to supply cleaning liquid to a cleaning facility 920 in the form of a glass cleaning facility 922. The tank 420 is connected to the cleaning device 100 via a second medium feed line 220. In this way, the second medium M2 of the cleaning device 100 is made available via a pump 422 (not shown here for the sake of clarity). Of course, it is equally possible in the second media source MQ2 for this second media source to be formed by its own separate media source, in particular independent of other systems.

List of reference numerals (constituent parts of the description)

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Claims

1. A cleaning device (100, 100A-D, 100', 100 ") for selectively loading a surface (O) with a medium sequence (MS, MS 1-5) consisting of at least one gaseous first medium (M1) and of a second medium (M2), the cleaning device having:

-a nozzle (180) configured for loading the surface (O) with the second medium (M2),

a cleaning valve (120, 120 ') having a holding connection (122), a pressure connection (124, 124 '), a plunger (128, 128 ') and a pressure outlet (126),

the method is characterized in that:

having a high-pressure accumulator (140, 140') which is designed to store a first medium (M1) which is loaded with a storage Pressure (PS),

a switching valve (160) for selectively establishing a connection between a first medium feed line (210) and a holding line (172, 172') connected to the holding interface (122), wherein,

-the pressure outlet (126) is configured for pulsed loading of the first medium (M1) to the surface (O).

2. The cleaning device (100, 100A-D, 100', 100 ") according to claim 1, characterized in that the cleaning device (100, 100A-D, 100', 100") is configured for selectively loading the surface (O) with the first medium (M1) and/or the second medium (M2).

3. The cleaning device (100, 100A-D,100',100 ") according to claim 1 or 2, characterized in that the cleaning device (100, 100A-D,100', 100") is configured for controlling the composition and order of the medium sequence (MS, MS 1-5) in time.

4. The cleaning device (100, 100A-D,100',100 ") according to claim 1 or 2, characterized in that the cleaning valve (120, 120', 120") is configured as a quick exhaust valve (121).

5. The cleaning apparatus (100, 100A-D,100',100 ") according to claim 1 or 2, characterized in that the cleaning valve (120, 120', 120") has a movable plunger (128, 128 '), wherein the plunger (128, 128') is controllable via a holding Pressure (PH) present on a holding interface (122).

6. The cleaning apparatus (100, 100A-D,100',100 ") according to claim 4, characterized in that the plunger (128') is configured to pass through on one side.

7. Cleaning device (100, 100A-D,100',100 ") according to claim 1 or 2, characterized in that the high-pressure reservoir (140, 140") is connected to the holding line (172, 172').

8. Cleaning device (100, 100A-D,100',100 ") according to claim 7, characterized in that a high-pressure reservoir holding valve (170) is arranged in the reservoir line (174).

9. The cleaning device (100, 100A-D, 100', 100 ") according to claim 1 or 2, characterized in that the pressure outlet (126) is configured such that the first medium (M1) is directed onto the surface (O) substantially along a first beam axis (A1).

10. The cleaning device (100, 100A-D, 100', 100 ") according to claim 1 or 2, characterized in that the nozzle (180) is configured such that the second medium (M2) is directed onto the surface (O) substantially along a second beam axis (A2).

11. The cleaning apparatus (100, 100A-D, 100', 100 ") according to claim 10, characterized in that a first beam axis (A1) and the second beam axis (A2) intersect in a target zone (OZ) on the surface (O).

12. The cleaning device (100, 100A-D, 100', 100 ") according to claim 1 or 2, characterized in that the high pressure reservoir (140, 140") has a capacity of 0 to 20 cl.

13. The cleaning device (100, 100A-D, 100', 100 ") according to claim 1 or 2, characterized in that the cleaning device (100, 100A-D, 100', 100") is provided as a structural unit in the form of a cleaning module (101).

14. Cleaning device (100, 100A-D,100',100 ") according to claim 1 or 2, characterized in that the nozzle (180) is fed via a conveying line (192), wherein the conveying line (192) is connected with a second medium feed line (220) via a second switching valve (190).

15. The cleaning device (100, 100A-D,100',100 ") according to claim 1, characterized in that the second medium (M2) is a liquid medium.

16. The cleaning device (100, 100A-D,100',100 ") according to claim 2, characterized in that the cleaning device (100, 100A-D,100', 100") is configured by a control module (350) for selectively loading the first medium (M1) and/or the second medium (M2) to the surface (O).

17. The cleaning device (100, 100A-D,100',100 ") according to claim 2, characterized in that the cleaning device (100, 100A-D,100', 100") is configured for loading the surface (O) with the first medium (M1) and/or the second medium (M2) individually, simultaneously or alternately.

18. A cleaning device (100, 100A-D,100',100 ") according to claim 3, characterized in that the cleaning device (100, 100A-D,100', 100") is configured for alternately and/or intermittently controlling the composition and order of the medium sequence (MS, MS 1-5).

19. The cleaning device (100, 100A-D, 100', 100 ") according to claim 5, characterized in that the plunger is used to trigger a pulsed flow of the first medium (M1).

20. The cleaning device (100, 100A-D, 100', 100 ") according to claim 6, characterized in that the plunger (128 ') is configured to allow a flow of the first medium (M1) from the holding port (122) to the pressure port (124, 124 ') and to be blocked in the opposite direction.

21. The cleaning device (100, 100A-D, 100', 100 ") according to claim 7, characterized in that the high-pressure reservoir (140, 140") is connected with the holding line (172, 172') via a reservoir branch (173) and a reservoir line (174).

22. The cleaning device (100, 100A-D, 100', 100 ") according to claim 8, characterized in that the high-pressure reservoir holding valve (170) is configured as a check valve (170') that closes against the filling direction (BS) of the high-pressure reservoir (140, 140").

23. The cleaning device (100, 100A-D, 100', 100 ") according to claim 12, characterized in that the high pressure reservoir (140, 140") has a capacity of 1 to 10 cl.

24. The cleaning device (100, 100A-D, 100', 100 ") according to claim 12, characterized in that the high pressure reservoir (140, 140") has a capacity of 3 to 7 cl.

25. The cleaning device (100, 100A-D, 100', 100 ") according to claim 13, characterized in that the cleaning device (100, 100A-D, 100', 100") is arranged in the form of the high-pressure reservoir (140, 140 ") in the cleaning valve (120, 120', 120") or directly on the cleaning valve.

26. A compressed air system (1000) having:

at least one sensor (300), wherein the sensor (300) or a cover (310) of the sensor (300) has a surface (O),

-at least one cleaning device (100, 100A-D, 100', 100 ") according to any one of claims 1 to 25, wherein,

-a first media source (MQ 1) of the compressed air system (1000) is connectable with the at least one cleaning device (100, 100A-D, 100', 100 ") via a first media feed line (210), and

-a second media source (MQ 2) connectable with the at least one cleaning device (100, 100A-D, 100', 100 ") via a second media feed line (220).

27. The compressed air system (1000) according to claim 26, wherein the first media source (MQ 1) is used for another primary purpose.

28. Compressed air system (1000) according to claim 26 or 27, characterized in that the second medium source (MQ 2) is used for another main purpose.

29. Compressed air system (1000) according to claim 26 or 27, characterized in that the sensor (300) is an optical sensor (302).

30. Compressed air system (1000) according to claim 26 or 27, characterized in that the first medium source (MQ 1) has a compressor device (400) and/or a compressed air storage (440).

31. The compressed air system (1000) according to claim 26 or 27, wherein the compressed air system (1000) has at least one feed line check valve (164, 164', 164A-D).

32. The compressed air system (1000) according to claim 26, wherein the cover (310) of the sensor (300) is transparent.

33. The compressed air system (1000) according to claim 27, wherein the first medium source (MQ 1) is adapted to feed an air suspension arrangement (901) or a similar pneumatic arrangement (910)

34. The compressed air system (1000) according to claim 28, wherein the second medium source (MQ 2) is for feeding a glass cleaning plant (922) or a similar cleaning plant (920).

35. The compressed air system (1000) according to claim 33, wherein the second medium source (MQ 2) is for feeding a glass cleaning plant (922) or a similar cleaning plant (920).

36. The compressed air system (1000) according to claim 29, wherein the sensor (300) is an ambient acquisition sensor (304).

37. Compressed air system (1000) according to claim 30, characterized in that a compressor device (400) is arranged in the compressed air storage (440).

38. The compressed air system (1000) according to claim 31, wherein the compressed air system (1000) has at least one feed line check valve (164, 164', 164A-D) in the first medium feed line (210) and/or in the first source line (408).

39. Cleaning method for cleaning a surface (O), with a cleaning device (100, 100A-D, 100', 100 ") according to any one of claims 1 to 25 for selectively loading a surface (O) with a medium sequence (MS, MS 1-5) consisting of at least one gaseous first medium (M1) and of a second medium (M2), the cleaning method having the following steps:

-charging the high-pressure reservoir (140, 140') with a first medium (M1);

-maintaining a storage Pressure (PS) in the high pressure storage (140, 140 ");

-loading the surface (O) with a second medium (M2); and/or

-loading the surface (O) with the first medium (M1, M1.1).

40. Cleaning method according to claim 39, characterized in that the loading of the surface (O) with the second medium (M2, M2.1, M2.2) and the loading of the surface (O) with the first medium (M1, M1.1) is performed alternately and/or intermittently.

41. The cleaning method according to claim 39, characterized in that the second medium (M2) is a liquid medium.

42. The cleaning method according to claim 39, characterized in that the first medium (M1) is air (M1.1).

43. The cleaning method according to claim 39, characterized in that the storage Pressure (PS) in the high-pressure store (140, 140 ") is maintained by a holding Pressure (PH) on a holding connection (122) holding the cleaning valve (120, 120', 120").

44. The cleaning method according to claim 39, characterized in that the storage Pressure (PS) in the high-pressure store (140, 140 ") is maintained by switching the switching valve (160) into the holding position (160.1).

45. The cleaning method according to claim 39, characterized in that the second medium (M2) is water (M2.1) or a cleaning agent (M2.2).

46. The cleaning method according to claim 39, characterized in that the first medium is loaded onto the surface (O) by releasing the holding Pressure (PH) on the holding interface (122).

47. Cleaning method according to claim 39, characterized in that the surface (O) is loaded with the first medium by switching the switching valve (160) into a release position (160.2).

48. The cleaning method according to claim 40, characterized in that the loading of the surface (O) with the second medium (M2, M2.1, M2.2) and the loading of the surface (O) with the first medium (M1, M1.1) are performed alternately and/or intermittently.