CN111646425B - Ion beam induced liquid film patterning printing method - Google Patents
Ion beam induced liquid film patterning printing method Download PDFInfo
- Publication number
- CN111646425B CN111646425B CN202010340913.3A CN202010340913A CN111646425B CN 111646425 B CN111646425 B CN 111646425B CN 202010340913 A CN202010340913 A CN 202010340913A CN 111646425 B CN111646425 B CN 111646425B
- Authority
- CN
- China
- Prior art keywords
- ion beam
- liquid
- solid substrate
- pattern
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00349—Creating layers of material on a substrate
- B81C1/00373—Selective deposition, e.g. printing or microcontact printing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00015—Manufacture or treatment of devices or systems in or on a substrate for manufacturing microsystems
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Sampling And Sample Adjustment (AREA)
Abstract
The application provides an ion beam induced liquid film patterning printing method, which specifically comprises the following steps: preparing a solid substrate and a liquid sample; a liquid drop forming liquid pool for dropping liquid sample on the surface of the solid substrate; creating a pattern on a pattern generator, setting geometric parameters of the pattern and parameters of the ion beam according to the created pattern; the liquid bath is irradiated with an ion beam that drives the liquid in the liquid bath to flow based on the interaction of the ion beam with liquid molecules in the liquid bath and the interaction between the ion beam and the solid substrate to print the created pattern on the solid substrate. The ion beam induced liquid film patterning printing method provided by the application does not need a micro-channel, is high in flexibility and simple in device, does not need to add complex electrodes and circuits on a solid substrate, does not need to do any pretreatment on the surface of the solid substrate, can achieve nano-scale precision, and can achieve the width of a formed liquid film of about 200 nanometers and the thickness of about 20 nanometers.
Description
Technical Field
The application relates to the technical field of nano pattern printing, in particular to an ion beam induced liquid film patterning printing method.
Background
The technology of driving liquid flow and forming patterned shapes on the micro-nano scale has very important applications in many fields of production and living, for example: printing and ink printing, microfluidic systems, lab-on-a-chip devices, which technology allows chemical reactions and biological analysis to be performed on a nano-scale. Some solutions have been used to drive and pattern liquids, such as traditional ink printing, printed circuits, microchannel flow, electrokinetic flow, electroosmotic flow, electrowetting, thermocapillary driving, etc.
However, the prior art has four problems:
(1) The flexibility is small. For example, based on the manner in which the micro-channels transport the liquid, the channel shape is fixed, only the path of the micro-channels designed before can be formed, the path cannot be temporarily changed, a new track cannot be formed, and the flexibility is too small.
(2) The device is complex. For example, based on electrically driven liquid flow, complex electrodes and circuitry are required to attach to a solid substrate, and high voltage power supplies of several thousand volts are required to drive the fluid, resulting in complex devices.
(3) It is necessary to perform a treatment of the surface structure or surface chemical property on the solid surface in advance. In the prior art, the step of selectively modifying the wettability of the solid surface in advance is needed, or the chemical treatment or the surface microstructure treatment is carried out, the process is complex, and the flexibility is poor.
(4) The precision is low. In the prior art, for example, the precision of the modes of ink jet printing, ink printing and liquid flow driven by thermal capillary is high, the width of a liquid film is more than tens of micrometers, the thickness is more than 1 micrometer, the precision is low, and the patterning of the nano-scale liquid film can not be realized. Complex patterns cannot be laid down on the micrometer scale and below.
Therefore, there is a need to develop a simple, flexible, highly accurate printing method that drives liquid flow and patterning.
Disclosure of Invention
The application provides an ion beam induced liquid film patterning printing method, which aims to solve the problems of small flexibility, complex device, need of pre-processing a solid substrate and low precision of driving liquid to flow and forming patterning shape in the micro-nano scale in the prior art.
An ion beam induced liquid film patterning printing method comprising:
preparing a solid substrate and a liquid sample;
a liquid drop forming liquid pool for dropping liquid sample on the surface of the solid substrate;
creating a pattern on a pattern generator, setting geometric parameters of the pattern and parameters of the ion beam according to the created pattern;
the liquid bath is irradiated with an ion beam that drives the liquid in the liquid bath to flow based on the interaction of the ion beam with liquid molecules in the liquid bath and the interaction between the ions and the solid substrate to print the created pattern on the solid substrate.
Further, the ion beam is one of a helium ion beam, a gallium ion beam or an electron beam.
Further, when the ion beam is a helium ion beam, the implantation dose of the ion beam is 0.3 pC/. Mu.m 2 The above.
Further, the liquid sample is: 1-ethyl-3-methylimidazole dicyandiamide salt or 1-ethyl-3-methylimidazole tetrafluoroborate salt.
Further, the solid substrate is: a silica solid substrate, a copper sheet or a gold sheet.
Further, when the solid substrate is a silica solid substrate, the preparing the solid substrate includes:
preparing a silica solid substrate;
sequentially cleaning the silicon dioxide solid substrate in an ultrasonic cleaner by using acetone, alcohol and deionized water for 10 minutes;
and blowing off the moisture on the surface of the silicon dioxide solid substrate by using nitrogen.
Further, the liquid drop forming liquid pool for dropping the liquid sample on the surface of the solid substrate comprises:
a microsyringe is used for dripping a drop of liquid sample on the surface of the solid substrate, and the drop is a liquid pool;
alternatively, a container is provided on the surface of the solid substrate, and a liquid sample is dropped into the container to form a liquid pool.
Further, the parameters of the ion beam include: the acceleration voltage of the ion beam, the beam current of the ion beam, the ion beam implantation duration, the number of beam spots of the ion beam, and the ion beam spot spacing.
Further, setting geometrical parameters of the pattern and parameters of the ion beam according to the created pattern includes:
setting geometric parameters of the pattern according to the created pattern, including one or more of length, width, height and radius;
setting an acceleration voltage of the ion beam and a beam current of the ion beam;
the implantation duration of the ion beam, the beam spot array of the ion beam, and the beam spot pitch of the ion beam are set according to the shape of the created pattern.
Further, irradiating the liquid bath with the ion beam includes: the ion beam irradiates perpendicular to the edges of the bath.
Compared with the prior art, the application has the following advantages:
(1) According to the ion beam induced liquid film patterning printing method, a micro-channel is not needed, flexibility is high, and needed patterns can be set randomly according to actual needs for printing;
(2) The ion beam induced liquid film patterning printing method provided by the embodiment of the application is simple in device, does not need to add complex electrodes and circuits on a solid substrate, and does not need to use high-voltage to drive liquid;
(3) According to the ion beam induced liquid film patterning printing method, no pretreatment is needed on the surface of the solid substrate, and pattern printing can be completed only by the clean and exposed surface of the solid substrate.
(4) According to the ion beam induced liquid film patterning printing method, nanometer precision can be achieved, the width of the formed liquid film can reach about 200 nanometers, the thickness can reach about 20 nanometers, and the liquid can be easily spread into a complex shape under the driving of an ion beam through controlling relevant parameters of the ion beam.
Drawings
FIG. 1 is a flow chart of an ion beam induced liquid film patterning printing method according to an embodiment of the present application;
FIG. 2 is a schematic view of the field of view under a helium ion microscope as used in the examples herein;
fig. 3 is a schematic diagram of a process of driving a liquid to flow by an ion beam according to an embodiment of the present application;
FIG. 4 is a schematic diagram of a patterning process for driving a liquid flow by an ion beam according to an embodiment of the present application;
FIG. 5 is a schematic illustration of another ion beam driven liquid flow patterning process provided in an embodiment of the present application;
FIG. 6 is a schematic illustration of another ion beam driven liquid flow patterning process provided in an embodiment of the present application;
fig. 7 is a schematic diagram of another patterning process for driving a liquid flow by an ion beam according to an embodiment of the present application.
Detailed Description
In order that the above-recited objects, features and advantages of the present application will become more readily apparent, a more particular description of the invention briefly described above will be rendered by reference to specific embodiments that are illustrated in the appended drawings.
A Focused Ion Beam (FIB) is a Beam of ions that is Focused and scanned over the surface of a sample. Bombardment of the surface by the ion beam will sputter out surface atoms. The ion beam is scanned in a specified pattern to imprint the desired pattern. If chemical gases are injected simultaneously, localized chemical deposition (CVD) may be performed to obtain the desired deposition pattern. For the last 20 years, focused ion beams have been increasingly used in the fields of material science, biology, semiconductor integrated circuits, data storage disks, and the like. The method plays an irreplaceable role in the scientific research of the material science and the biological field, the research and development of integrated circuits and magnetic discs and the improvement of production processes.
In the prior art, the functions of focusing an ion beam are mainly: imaging, dicing/etching, deposition/enhanced etching.
The ion beam cutting function is realized by sputtering out atoms on the surface of a sample through collision between the ion beam and the atoms on the surface, and the Ga ions can control the ion beam diameter to be in a nano scale through a lens system and a diaphragm, so that the scanning track of the ion beam can be controlled through a pattern generator to carry out fine micro-nano processing on the sample.
In the prior art, researchers use the cutting/etching function of a focused ion beam to process a printed circuit board, and the adopted technical concept is as follows: and covering a layer of dry film on the surface of the solid substrate, etching the dry film by utilizing an ion beam to obtain an etched solid substrate, and finally depositing wide-area energy metal ions on a preset circuit pattern of the etched substrate by utilizing a printing system to form a metal film matrix. And finally, stripping the dry film to obtain the printed circuit board. But is limited to the etching function of the ion beam. It can be seen that in this technical concept, the cutting/etching function of the ion beam is still utilized.
The ion beam induced liquid film patterning printing method provided by the embodiment of the application is not limited to the common functions of a Focused Ion Beam (FIB), and instead utilizes the interaction between an ion beam and liquid molecules and the interaction between ions and a solid substrate, so that the ion beam is adopted to drive liquid to flow to form a liquid film to finish pattern printing.
The implementation flow of the method according to the present invention will be described in detail with reference to fig. 1.
Referring to fig. 1, fig. 1 is a flow chart of an ion beam induced liquid film patterning printing method provided herein, the method having steps comprising:
s10: preparing a solid substrate and a liquid sample;
specifically, the solid substrate is: a silica solid substrate, a copper sheet or a gold sheet.
In practical application, the solid substrate can be any one clean and bare solid substrate as the printing substrate according to practical requirements.
The liquid sample is: 1-ethyl-3-methylimidazole dicyandiamide salt or 1-ethyl-3-methylimidazole tetrafluoroborate salt.
In practical application, any liquid can be selected according to practical requirements.
The ion beam induced liquid film patterning printing method provided by the embodiment of the application is applied to a scene of circuit board printing, and the liquid sample can be circuit board printing ink.
S11: a liquid drop forming liquid pool for dropping liquid sample on the surface of the solid substrate;
the method specifically comprises the following steps: and (3) dropping a drop of the liquid sample on the surface of the solid substrate by using the microsyringe, wherein the drop is a liquid pool.
In practical applications, a microsyringe may be used to drop a quantity of a liquid sample onto a solid substrate, thereby forming a large droplet on the solid sample. The large droplet is a liquid pool.
Alternatively, a container is provided on the surface of the solid substrate, and a liquid sample is dropped into the container to form a liquid pool.
In practical applications, some micro channels and liquid containers (i.e. liquid pools) may be disposed on the surface of the solid substrate, and a micro sample injector is used to take a certain amount of liquid sample, drop the liquid sample into the liquid container, flow to the channel outlet to be patterned through the micro channels, and then perform the next operation, so that a finer pattern may be formed.
S12: creating a pattern on a pattern generator, setting geometric parameters of the pattern and parameters of the ion beam according to the created pattern;
specifically, editable shapes such as rectangles, trapezoids, polygons, straight lines, broken lines, ellipses, and points are created on the graphics generator. And geometric parameters of the pattern, such as the shape of the pattern and the length, width, height, radius, etc. of the pattern are set. These shapes are then vector cut and fully process controlled by adjustments to the ion beam parameters.
The parameters of the ion beam include: the acceleration voltage of the ion beam, the beam current of the ion beam, the implantation duration of the ion beam, the beam spot array of the ion beam, the beam spot spacing of the ion beam.
In particular, geometric parameters of the pattern, including one or more of length, width, height, radius, may be set according to the created pattern;
setting an acceleration voltage of the ion beam and a beam current of the ion beam;
the implantation duration of the ion beam, the beam spot array of the ion beam, and the beam spot pitch of the ion beam are set according to the shape of the created pattern.
The ion beam may be any one of a helium ion beam, a gallium ion beam, or an electron beam.
When the ion beam is a helium ion beam, the implantation dose of the ion beam should be 0.3pC/μm or more 2 . Only when the implantation dose of the helium ion beam is satisfactory, the liquid sample in the liquid pool can flow channel and spread under the drive of the helium ion beam.
S13: the liquid bath is irradiated with an ion beam that drives the liquid in the liquid bath to flow based on the interaction of the ion beam with liquid molecules in the liquid bath and the interaction between the ions and the solid substrate to print the created pattern on the solid substrate.
Specifically, the irradiating the liquid bath with the ion beam includes: the ion beam irradiates perpendicular to the edges of the bath.
In practical applications, the irradiation of the ion beam perpendicular to the edge of the liquid pool may cause the liquid in the liquid pool to spread out from inside to outside, thereby spreading into a predetermined pattern.
The present application is described in further detail below with reference to the drawings and detailed description.
Example 1
In this example, a silica solid substrate, an ionic liquid 1-ethyl-3-methylimidazole dicyanoamine salt and a helium ion microscope were selected for the test.
The test steps are as follows:
(1) Preparing a solid sample: commercial silica solid substrates were one, 1cm long, 1cm wide and 1mm thick. Sequentially cleaning the silicon dioxide solid substrate with acetone, alcohol and deionized water in an ultrasonic cleaner for 10min, and removing the oxide on the surface. The moisture on the solid surface was then purged with nitrogen.
(2) Preparing a liquid sample: commercial ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt is selected. The purchased ionic liquid is firstly heated by a vacuum drying oven under the vacuum condition to remove the residual moisture. The parameters of vacuum heating are that the pressure is less than 133Pa, the temperature is set at 80 ℃, and the moisture in the ionic liquid is removed on the premise of ensuring that the property and the structure of the ionic liquid are not changed, so that the pollution to the vacuum cavity of the helium ion microscope is prevented.
(3) Sample preparation: and (3) dropwise adding a certain amount of ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt on the silica solid substrate by adopting a microsyringe, so as to form a large liquid drop on the solid sample.
(4) And (3) sample injection: the solid substrate on which the ionic liquid droplet has been dropped is stuck to a nail-shaped sample stage, placed in a sample chamber on a specific sample stage mounted to a helium ion microscope, and then transferred into a vacuum chamber of the helium ion microscope.
In helium ion microscopes, imaging parameters including contrast, focus, magnification, astigmatism, etc. are adjusted. So that imaging is also clear at window dimensions of 500 nm. The field of view is moved to the interface of the liquid and the solid, and the next driving and patterning work can be performed. The field of view region is explained below in conjunction with fig. 2.
Referring to fig. 2, in which dark gray portions are images of an ionic liquid in a helium ion microscope (i.e., "liquid" in fig. 2), light gray portions are images of a solid substrate (i.e., "solid" in fig. 2), and black frames are fields of view.
(5) Driving the liquid flow: first, under observation with a helium ion microscope, a button for adjusting magnification adjusts a field of view (field of view) to a range of 2 μm by 2 μm. It should be noted that: within this field of view, a small liquid region and a large solid region are to be included. Then based on the interaction of the ion beam with the liquid molecules in the liquid pool and the interaction between the ions and the solid substrate, the liquid gradually flows under the irradiation of helium ions and spreads out to form a liquid film.
Example 2
In this example, a silica solid substrate, an ionic liquid 1-ethyl-3-methylimidazole dicyanoamine salt and a helium ion microscope were selected for the test.
(1) Preparing a solid sample: commercial silica solid substrates were one, 1cm long, 1cm wide and 1mm thick. Sequentially cleaning the silicon dioxide solid substrate with acetone, alcohol and deionized water in an ultrasonic cleaner for 10min, and removing the oxide on the surface. The moisture on the solid surface was then purged with nitrogen. And (3) annealing the solid substrate to remove the oxide on the surface of the solid substrate, wherein the annealing condition is 320 ℃ under 200sccm argon atmosphere or 200sccm hydrogen atmosphere. And sealing and preserving the annealed solid substrate for standby.
(2) Preparing a liquid sample: commercial ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt is selected. The purchased ionic liquid is firstly heated by a vacuum drying oven under the vacuum condition to remove the residual moisture. The parameters of vacuum heating are that the pressure is less than 133Pa, the temperature is set at 80 ℃, and the moisture in the ionic liquid is removed on the premise of ensuring that the property and the structure of the ionic liquid are not changed, so that the pollution to the vacuum cavity of the helium ion microscope is prevented.
(3) Sample preparation: and (3) dropwise adding a certain amount of ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt on the silica solid substrate by adopting a microsyringe, so as to form a large liquid drop on the solid sample.
(4) And (3) sample injection: the solid substrate on which the ionic liquid droplet has been dropped is stuck to a nail-shaped sample stage, placed in a sample chamber on a specific sample stage mounted to a helium ion microscope, and then transferred into a vacuum chamber of the helium ion microscope.
(5) Liquid patterning: first, under observation with a helium ion microscope, a button for adjusting magnification adjusts a field of view (field of view) to a range of 2 μm by 2 μm. It should be noted that: within this field of view, a small liquid region and a large solid region are to be included.
Then, a square pattern is created on the pattern generator, and geometric parameters are set: side length 2 microns, set ion beam parameters: acceleration voltage: 30kV; beam current: 0.38pA; injection time: 2 microseconds; beam spot spacing: 1.96 nanometers; beam spot array (pixels): is automatically formed according to the size of the sample and the distance between the beam spots.
Finally, the liquid bath is irradiated with an ion beam, which drives the liquid in the liquid bath to flow based on the interaction of the ion beam with the liquid molecules in the liquid bath and the interaction between the ion beam and the solid substrate, so as to print the created pattern on the solid substrate. The process of driving the flow of liquid by the ion beam is explained below with reference to fig. 3.
Referring to fig. 3, wherein the right graph is a finally formed liquid film pattern, the left graph is a process graph of forming a square pattern within a dotted frame of the right graph, wherein the square pattern is gradually formed from left to right and from top to bottom.
Example 3
The test was performed using a silica solid substrate, an ionic liquid 1-ethyl-3-methylimidazole tetrafluoroborate and a helium ion microscope.
(1) Preparing a solid sample: commercial silica solid substrates were one, 1cm long, 1cm wide and 1mm thick. Sequentially cleaning the silicon dioxide solid substrate with acetone, alcohol and deionized water in an ultrasonic cleaner for 10min, and removing the oxide on the surface. The moisture on the solid surface was then purged with nitrogen.
A microchannel and a circular liquid pool are arranged on the surface of the solid sample.
(2) Preparing a liquid sample: the ionic liquid 1-ethyl-3-methylimidazole tetrafluoroborate is selected.
(3) Sample preparation: a small amount of liquid sample was added dropwise to the reservoir and a small amount of liquid appeared on the substrate surface through the micro-channel micro-sized circular outlet.
(4) And (3) sample injection: the solid substrate on which the ionic liquid droplet has been dropped is stuck to a nail-shaped sample stage, placed in a sample chamber on a specific sample stage mounted to a helium ion microscope, and then transferred into a vacuum chamber of the helium ion microscope.
(5) Liquid patterning: first, under observation with a helium ion microscope, a button for adjusting magnification adjusts a field of view (field of view) to a range of 2 μm by 2 μm. It should be noted that: within this field of view, a small liquid region and a large solid region are to be included.
Then, a PKU pattern is created on the pattern generator, setting geometrical parameters: the total length of the three letters PKU is 3 microns and the width is 1 micron. Setting ion beam parameters: acceleration voltage: 32kV; beam current: 1.01pA; injection time: 0.5 microseconds; beam spot spacing: 5 nanometers; beam spot arrays (pixels) are automatically formed based on sample size and beam spot spacing.
Finally, the liquid bath is irradiated with an ion beam, which drives the liquid in the liquid bath to flow based on the interaction of the ion beam with the liquid molecules in the liquid bath and the interaction between the ion beam and the solid substrate, so as to print the created pattern on the solid substrate. The patterning process of the present embodiment is explained below with reference to fig. 4.
Referring to FIG. 4, the middle circle is a liquid pool at the outlet of the micro channel, in this embodiment, a rectangular liquid film (the horizontal line below the letters in the figure) is formed by inducing the liquid sample with the ion beam with set parameters, then letters are formed by inducing along the land of the main channel (rectangular liquid film), and the liquid sample flows into the split stream of each letter along the main channel. Finally, a liquid film pattern as shown in fig. 4 is formed.
Example 4
In this example, a silica solid substrate, an ionic liquid 1-ethyl-3-methylimidazole dicyanoamine salt and a helium ion microscope were selected for the test.
(1) Preparing a solid sample: commercial silica solid substrates were one, 1cm long, 1cm wide and 1mm thick. Sequentially cleaning the silicon dioxide solid substrate with acetone, alcohol and deionized water in an ultrasonic cleaner for 10min, and removing the oxide on the surface. The moisture on the solid surface was then purged with nitrogen.
(2) Preparing a liquid sample: the ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt is selected.
(3) Sample preparation: and (3) dropwise adding a certain amount of ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt on the silica solid substrate by adopting a microsyringe, so as to form a large liquid drop on the solid sample.
(4) And (3) sample injection: the solid substrate on which the ionic liquid droplet has been dropped is stuck to a nail-shaped sample stage, placed in a sample chamber on a specific sample stage mounted to a helium ion microscope, and then transferred into a vacuum chamber of the helium ion microscope.
(5) Liquid patterning: first, under observation by a helium ion microscope, a button for adjusting magnification adjusts a field of view to a range slightly larger than a size of a design pattern. It should be noted that: within this field of view, a small liquid region and a large solid region are to be included.
Then, creating a rectangular pattern on the pattern generator, laying a Chinese 'Tian' character on the edge of the drop, which requires writing in one stroke, consisting of 6 rectangles, setting the geometric parameters: each rectangle is 4 microns long and 0.4 microns wide, and ion beam parameters are set: accelerating pressurization: 30kV; beam current: 0.801pA; injection time: 0.25 microseconds; beam spot spacing: 0.25 nm; beam spot array (pixels): is automatically formed according to the size of the sample and the distance between the beam spots.
Finally, the liquid bath is irradiated with an ion beam, which drives the liquid in the liquid bath to flow based on the interaction of the ion beam with the liquid molecules in the liquid bath and the interaction between the ion beam and the solid substrate, so as to print the created pattern on the solid substrate. The patterning process of the present embodiment is explained below with reference to fig. 5.
Referring to fig. 5, the gray part is formed by imaging liquid, the ionic liquid forms a strip under the driving of the ion beam with set parameters, the strip is used as a pen of a 'field' (for example, a pen shaped like a '-' or a pen shaped like a '|'), then the ionic liquid is continuously driven to flow, five other strips are formed, the strip is used as five other pens of a 'field' shape, and finally, a liquid film pattern shown in fig. 5 is formed.
Example 5
In this example, a monocrystalline silicon substrate, an ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt and a helium ion microscope were selected for the test.
(1) Preparing a solid sample: preparing a monocrystalline silicon substrate, sequentially cleaning the silicon dioxide solid substrate with acetone, alcohol and deionized water in an ultrasonic cleaner for 10min, and removing the oxide on the surface. The moisture on the solid surface was then purged with nitrogen.
(2) Preparing a liquid sample: the ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt is selected.
(3) Sample preparation: and (3) dropwise adding a certain amount of ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt on the monocrystalline silicon substrate by adopting a microsyringe, so as to form a large liquid drop on the solid sample.
(4) And (3) sample injection: the solid substrate on which the ionic liquid droplet has been dropped is stuck to a nail-shaped sample stage, placed in a sample chamber on a specific sample stage mounted to a helium ion microscope, and then transferred into a vacuum chamber of the helium ion microscope.
(5) Liquid patterning: first, under observation by a helium ion microscope, a button for adjusting magnification adjusts a field of view to a range slightly larger than a size of a design pattern. It should be noted that: within this field of view, a small liquid region and a large solid region are to be included.
Then, a rectangular pattern is created on the pattern generator, and geometric parameters are set: 1.5 microns long and 0.25 microns wide; setting ion beam parameters: acceleration voltage: 30kV; beam current: 1.49pA; injection time: 3 microseconds; beam spot spacing: 0.5 nm; beam spot array (pixels): is automatically formed according to the size of the sample and the distance between the beam spots.
Finally, the liquid bath is irradiated with an ion beam, which drives the liquid in the liquid bath to flow based on the interaction of the ion beam with the liquid molecules in the liquid bath and the interaction between the ion beam and the solid substrate, so as to print the created pattern on the solid substrate. The patterning process of the present embodiment is explained below with reference to fig. 6.
Referring to fig. 6, wherein the right half of fig. 6 is brighter from the right to the left, imaging the ionic liquid 1-ethyl-3-methylimidazole dicyandiamide salt, and the left half of fig. 6 is darker, imaging the single crystal silicon substrate, wherein the rectangular pattern of liquid edges (the middle portion of fig. 6, the portion with concave vision) is the pattern that the liquid is flowing and spreading under the drive of the ion beam.
Example 6
This example was tested using a fused silica substrate, ionic liquid 1-ethyl-3-methylimidazole dicyano amine salt and a helium ion microscope.
(1) Preparing a solid sample: preparing a fused silica substrate, sequentially cleaning the silica solid substrate with acetone, alcohol and deionized water in an ultrasonic cleaner for 10min, and removing the oxide on the surface. The moisture on the solid surface was then purged with nitrogen.
(2) Preparing a liquid sample: the ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt is selected.
(3) Sample preparation: a microsyringe is adopted, a certain amount of ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt is dripped on a fused silica substrate, so that a large droplet is formed on a solid sample.
(4) And (3) sample injection: the solid substrate on which the ionic liquid droplet has been dropped is stuck to a nail-shaped sample stage, placed in a sample chamber on a specific sample stage mounted to a helium ion microscope, and then transferred into a vacuum chamber of the helium ion microscope.
(5) Liquid patterning: first, under observation by a helium ion microscope, a button for adjusting magnification adjusts a field of view to a range slightly larger than a size of a design pattern. It should be noted that: within this field of view, a small liquid region and a large solid region are to be included.
Then, a dog-leg pattern is created on the pattern generator, setting geometrical parameters: a dogleg shape having a width of 1.6 microns; setting ion beam parameters: acceleration voltage: 27kV; beam current: 0.343pA; injection time: 3 microseconds; beam spot spacing: 0.5 nm; beam spot array (pixels): is automatically formed according to the size of the sample and the distance between the beam spots.
Finally, the liquid bath is irradiated with an ion beam, which drives the liquid in the liquid bath to flow based on the interaction of the ion beam with the liquid molecules in the liquid bath and the interaction between the ion beam and the solid substrate, so as to print the created pattern on the solid substrate. The patterning process of the present embodiment is explained below with reference to fig. 7.
Referring to fig. 7, where the gray portion is an image of the ionic liquid 1-ethyl-3-methylimidazole dicyan amine salt and the black portion is an image of the fused silica substrate, where the broken line pattern of the liquid edge is a pattern in which the liquid is spread by flowing under the drive of the ion beam.
The ion beam induced liquid film patterning printing method provided by the present application has been described in detail, and specific examples are applied herein to illustrate the principles and embodiments of the present application, and the above examples are only used to help understand the method and core ideas of the present application; meanwhile, as those skilled in the art will have modifications in the specific embodiments and application scope in accordance with the ideas of the present application, the present description should not be construed as limiting the present application in view of the above.
Claims (10)
1. A method of ion beam induced liquid film patterning printing, the method comprising:
preparing a solid substrate and a liquid sample;
a liquid drop forming liquid pool for dropping liquid sample on the surface of the solid substrate;
creating a pattern on a pattern generator, setting geometric parameters of the pattern and parameters of the ion beam according to the created pattern;
the liquid bath is irradiated with an ion beam that drives the liquid in the liquid bath to flow based on the interaction of the ion beam with liquid molecules in the liquid bath and the interaction between the ion beam and the solid substrate to print the created pattern on the solid substrate.
2. The method of claim 1, wherein the ion beam is one of a helium ion beam, a gallium ion beam, or an electron beam.
3. The method of claim 2, wherein when the ion beam is a helium ion beam, the implant dose of the ion beam is at 0.3pC/μm 2 The above.
4. The method of claim 1, wherein the liquid sample is: 1-ethyl-3-methylimidazole dicyandiamide salt or 1-ethyl-3-methylimidazole tetrafluoroborate salt.
5. The method of claim 1, wherein the solid substrate is: a silica solid substrate, a copper sheet or a gold sheet.
6. The method of claim 5, wherein when the solid substrate is a silica solid substrate, the preparing the solid substrate comprises:
preparing a silica solid substrate;
sequentially cleaning the silicon dioxide solid substrate in an ultrasonic cleaner by using acetone, alcohol and deionized water for 10 minutes;
and blowing off the moisture on the surface of the silicon dioxide solid substrate by using nitrogen.
7. The method of claim 1, wherein the dropping the liquid sample onto the surface of the solid substrate forms a liquid drop formation pool, comprising:
a microsyringe is used for dripping a drop of liquid sample on the surface of the solid substrate, and the drop is a liquid pool;
alternatively, a container is provided on the surface of the solid substrate, and a liquid sample is dropped into the container to form a liquid pool.
8. The method of claim 1, wherein the parameters of the ion beam comprise: the acceleration voltage of the ion beam, the beam current of the ion beam, the implantation duration of the ion beam, the beam spot array of the ion beam, the beam spot spacing of the ion beam.
9. The method of claim 1, wherein setting the geometric parameters of the pattern and the parameters of the ion beam according to the created pattern comprises:
setting geometric parameters of the pattern according to the created pattern, including one or more of length, width, height and radius;
setting an acceleration voltage of the ion beam and a beam current of the ion beam;
the implantation duration of the ion beam, the beam spot array of the ion beam, and the beam spot pitch of the ion beam are set according to the shape of the created pattern.
10. The method of claim 1, wherein irradiating the liquid bath with the ion beam comprises: the ion beam irradiates perpendicular to the edges of the bath.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010340913.3A CN111646425B (en) | 2020-04-26 | 2020-04-26 | Ion beam induced liquid film patterning printing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010340913.3A CN111646425B (en) | 2020-04-26 | 2020-04-26 | Ion beam induced liquid film patterning printing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN111646425A CN111646425A (en) | 2020-09-11 |
| CN111646425B true CN111646425B (en) | 2023-06-09 |
Family
ID=72341195
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010340913.3A Active CN111646425B (en) | 2020-04-26 | 2020-04-26 | Ion beam induced liquid film patterning printing method |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111646425B (en) |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104020715A (en) * | 2014-03-28 | 2014-09-03 | 天津大学 | Optimization processing method for preparation of SERS substrate based on FIB direct-writing processing |
| CN105347295A (en) * | 2015-09-11 | 2016-02-24 | 北京大学 | Adjustable and controllable metamaterial array design based on focused ion beam and MEMS (Micro-Electromechanical System) machining process |
| CN106653567A (en) * | 2016-12-01 | 2017-05-10 | 中国工程物理研究院电子工程研究所 | Focused ion beam induction based preparation method for ordinal gallium arsenide quantum dots |
| CN110711607A (en) * | 2019-09-17 | 2020-01-21 | 华南师范大学 | Method for manufacturing patterned surface charge, hydrophobic insulating film and application thereof |
| CN110923624A (en) * | 2019-12-13 | 2020-03-27 | 北京师范大学 | Ion beam printing method based on ion beam printing system |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080026329A1 (en) * | 2006-07-26 | 2008-01-31 | Ashkan Vaziri | Surface modification of polymer surface using ion beam irradiation |
-
2020
- 2020-04-26 CN CN202010340913.3A patent/CN111646425B/en active Active
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104020715A (en) * | 2014-03-28 | 2014-09-03 | 天津大学 | Optimization processing method for preparation of SERS substrate based on FIB direct-writing processing |
| CN105347295A (en) * | 2015-09-11 | 2016-02-24 | 北京大学 | Adjustable and controllable metamaterial array design based on focused ion beam and MEMS (Micro-Electromechanical System) machining process |
| CN106653567A (en) * | 2016-12-01 | 2017-05-10 | 中国工程物理研究院电子工程研究所 | Focused ion beam induction based preparation method for ordinal gallium arsenide quantum dots |
| CN110711607A (en) * | 2019-09-17 | 2020-01-21 | 华南师范大学 | Method for manufacturing patterned surface charge, hydrophobic insulating film and application thereof |
| CN110923624A (en) * | 2019-12-13 | 2020-03-27 | 北京师范大学 | Ion beam printing method based on ion beam printing system |
Also Published As
| Publication number | Publication date |
|---|---|
| CN111646425A (en) | 2020-09-11 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US7160475B2 (en) | Fabrication of three dimensional structures | |
| US8728589B2 (en) | Laser decal transfer of electronic materials | |
| TWI431380B (en) | Deposition repair apparatus and methods | |
| CN110565130A (en) | Laser-enhanced three-dimensional micro-area electrodeposition method and corresponding device | |
| CN107937915B (en) | Micro-droplet control method based on laser direct writing technology | |
| US7709291B2 (en) | Method of disposing selectively two types of substances on surface of substrate | |
| TWI343874B (en) | ||
| KR20140040177A (en) | Method for nano-dripping 1d, 2d or 3d structures on a substrate | |
| US20070160790A1 (en) | Liquid repellent structure, method of producing the same, liquid ejection head and protective film | |
| CN103855083B (en) | Miniflow body conveying system | |
| CN105036052B (en) | Micro needle tip with orientation structure and method thereof for continuously conveying liquid | |
| JP4096868B2 (en) | Film forming method, device manufacturing method, and electro-optical device | |
| EP1844935B1 (en) | Method for manufacturing a collective transfer ink jet nozzle plate | |
| US7399688B2 (en) | Identification code drawing method, substrate, display module, and electronic apparatus | |
| US20100038825A1 (en) | Methods of forming microchannels by ultrafast pulsed laser direct-write processing | |
| CN111646425B (en) | Ion beam induced liquid film patterning printing method | |
| US9425027B2 (en) | Methods of affecting material properties and applications therefor | |
| Kim et al. | Optimization of electrohydrodynamic writing technique to print collagen | |
| JP2010068755A (en) | Cell culture substrate, method for producing the same, and cell culture method | |
| JP2003114624A (en) | Flat panel display device, method for manufacturing the same and device for formation of spacer | |
| EP1399262B1 (en) | Pipetting device and method for producing the same | |
| US20220193718A1 (en) | Methods and systems for large area and low defect monolayer ordering of microspheres and nanospheres | |
| KR20180106634A (en) | Thermal cycler including microchamber integrated metal mesh film, polymerase chain reaction system including the same, and method for manufacturing the same | |
| WO2009006679A1 (en) | Pattern transferring by direct current plasma based ion implantation and deposition | |
| JP2885499B2 (en) | Information recording material |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant | ||
| GR01 | Patent grant |