CN1115656C - Method for mfg. of nuclear track microhole comprehensive anti-fake mark and product - Google Patents
Method for mfg. of nuclear track microhole comprehensive anti-fake mark and product Download PDFInfo
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- CN1115656C CN1115656C CN 99119551 CN99119551A CN1115656C CN 1115656 C CN1115656 C CN 1115656C CN 99119551 CN99119551 CN 99119551 CN 99119551 A CN99119551 A CN 99119551A CN 1115656 C CN1115656 C CN 1115656C
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Abstract
The present invention belongs to a manufacture method in the technical field of counterfeiting prevention, which comprises the following steps of irradiating a transparent high molecular polymer film by heavy ions with certain energy and mass, manufacturing a laser rainbow moulding holographic image on the irradiated film, printing nuclear micropore anti-counterfeiting mark patterns and characters on the irradiated film, compounding or coating a fluorescent protective layer on the laser rainbow holographic image, and etching the film by chemical etchant to form holes to be washed and dried. The present invention integrates the multiplex anti-counterfeiting performance, the aesthetic performance and the practicability, and meets the high requirements for anti-counterfeiting technologies in the commodity market.
Description
Technical field
The invention belongs to field of anti-counterfeit technology, the manufacture method and the goods thereof that relate to nuclear micropore track comprehensive anti-fake mark, particularly based on nuclear micropore anti-counterfeiting technology, be the method for the comprehensive means manufacturing anti-counterfeiting mark of assisting with laser rainbow hologram image anti-counterfeiting technology and nuclear micropore vacuum evaporation anti-counterfeiting technology.
Background technology
Integrated anti-counterfeit is a direction of anti-counterfeiting technology development.China has introduced from the eighties since the laser hologram image production line, and the laser anti-fake figure mark of being produced once once played a significant role in the false proof struggle of cracking down on counterfeit goods.Like the bees rising in swarms owing to various places later on, the producer that can produce this type of single anti-counterfeiting mark at present reaches hundreds of, and also have problems in technical and the management, it is not easy to identify to make some really identify, some emulation signs can be mixed the spurious with the genuine again, have greatly reduced laser holographic anti counterfeiting label in the in the eyes of status of people.
The nuclear micropore of high molecular polymer on film produces through heavy ion irradiation and chemical etching step.The nuclear micropore has highly homogeneous aperture.The invisible nuclear micropore of naked eyes as the carrier of nuclear encrypted message, can be brought into play the vital role aspect two in false proof.On the one hand, be used to be provided with and store heavy ion radiation and bring out micro-parameter and statistical parameter generation, that can't copy, cause unbridgeable at all obstacle to the imitator; On the other hand, nuclear pore membrane has optical transparence and hydraulic permeability, make the anti-counterfeiting mark of forming by 1,000,000 magnitudes nuclear micropore colony demonstrate macroscopic Antiforge image, after the crayon print through, just can on counterdie, obtain Antiforge, discern the false from the genuine for masses, allow the consumer control oneself and participate in the identification anti-counterfeiting technology.What is more important, the heavy ion irradiation step in the nuclear micropore anti-counterfeiting mark manufacture process must rely on heavy ion accelerator or nuclear reactor.Accelerator and reactor all are the quantity large-scale nuclear facilities seldom that the country of high-tech, high investment is specially controlled, and have the monopoly and the uniqueness of height, thereby have strengthened the dynamics of false proof control, the scope that having dwindled cracks down on counterfeit goods traces.Therefore, nuclear micropore anti-counterfeiting mark has unique antiforge function, will take the course of its own in false proof field.But the aesthetic property of nuclear micropore anti-counterfeiting mark is not so good as laser holographic anti counterfeiting label, thereby its range of application is affected.
Summary of the invention
The objective of the invention is for overcoming the weak point of prior art, research and develop a kind of nuclear microhole comprehensive anti-fake mark, optical characteristics with the aesthetic property and the vacuum steaming degree nuclear pore membrane of laser holographic anti counterfeiting label, combine with nuclear micropore anti-counterfeiting technology dexterously, create a kind of brand-new, incorporate comprehensive anti-fake mark, integrate multiple anti-fake, aesthetic property, practicality, to satisfy the commodity market requirement more and more higher to anti-counterfeiting technology.
Nuclear microhole comprehensive anti-fake mark manufacture method of the present invention may further comprise the steps:
1), transparent high molecular polymer film is carried out irradiation with heavy ion with certain energy and quality;
2), on said irradiated transparent polymer thin polymer film, make the laser rainbow die pressed holographic image;
3), on the transparent polymer thin polymer film that shone, printing nuclear micropore anti-counterfeiting mark pattern and literal;
4), compound or the alkaline-resisting or sour protective seam of coating one deck on said laser rainbow hologram image;
5), the transparent polymer thin polymer film of handling through above-mentioned steps is carried out to pitting quarter, after the chemical etching film is cleaned and dried, obtain binary whole synthetic nucleus micropore anti-counterfeiting mark with chemical etchant.
On the basis of above-mentioned steps, also comprise: the aluminium film with vacuum vapour deposition plating one deck light on nuclear pore membrane surface and micropore inwall obtains three-in-one synthetic nucleus micropore anti-counterfeiting mark.
Above step, 1,2 can successively carry out arbitrarily, and 3,4 also can successively carry out arbitrarily.
Anti-counterfeiting mark through the above-mentioned steps manufacturing, examine microhole comprehensive anti-fake mark exactly, it is based on nuclear micropore anti-counterfeiting technology, the set laser rainbow holography is false proof and examine the micropore vacuum evaporation technology in one, not only have the security feature of nuclear micropore sign, and possess the aesthetic property of laser holographic anti counterfeiting label.
In the method for manufacturing comprehensive anti-fake mark of the present invention, used heavy ion is the heavy ion beam with certain energy and quality, and energy range is more than 50Mev.
Make in the method for comprehensive anti-fake mark in the present invention, the thickness range of used transparent polymer thin polymer film between 5 μ m and 40 μ m, is preferably between 10～30 μ m, is complementary with the energy of heavy ion.
In the method for manufacturing comprehensive anti-fake mark of the present invention, desired nuclear pore density is 10
4～10
8/ cm
2Between, used exposure time will be complementary according to the transmission speed of density size with film
In the method for manufacturing comprehensive anti-fake mark of the present invention, used laser holographic mark adopts multiple image laser mold pressing and stealthy contour forging anti-counterfeiting mark.
In the method for manufacturing comprehensive anti-fake mark of the present invention, used protective seam is alkaline-resisting or sour hot melt adhesive layer or pre-coating film.
In the method for manufacturing comprehensive anti-fake mark of the present invention, the used etchant of chemical etching process is an alkalescence or acid, and principal ingredient is NaOH, KOH or H altogether
2SO
4, the concentration of etching solution is between 4M and 8M, and the working temperature of chemical etching is between 50 ℃ and 100 ℃.
In the method for manufacturing comprehensive anti-fake mark of the present invention, the used metal of vacuum evaporation is the technical pure aluminium wire, and its temperature of fusion is at 660 ℃.Will carry out water-cooled in the film vacuum evaporating plating process handles.
Use the comprehensive anti-fake mark that the present invention makes; not only kept nuclear micropore anti-counterfeiting mark and the laser holographic anti counterfeiting label cost is low; the throughput rate height; be convenient to the advantage of robotization; also has a kind of distinct advantages that can not obtain with additive method; this distinct advantages is exactly: organically combine three kinds of false proof key elements on a slice plastic sheeting sign; has independently research and production step separately; thereby be convenient to restriction and management; make the product of manufacturing of the present invention can not utilize single method to come puppet to emit; the authenticity that can show item to be protected is better safeguarded the reputation of famous-brand and high-quality goods and enterprise thereof better.
Description of drawings
Fig. 1 is the article construction synoptic diagram of the embodiment of the invention one.
Fig. 2 is the article construction synoptic diagram of the embodiment of the invention two.
Fig. 3 is the article construction synoptic diagram of the embodiment of the invention three.
Embodiment
Introduce embodiments of the invention below.
The manufacture method of embodiment 1 three-in-one type nuclear microhole comprehensive anti-fake mark
The method of the manufacturing three-in-one type nuclear microhole comprehensive anti-fake mark of present embodiment can be divided into five relatively independent steps basically:
1, heavy ion irradiation utilizes the S-32 heavy ion that gross energy produces for 120Mev, by heavy ion accelerator, at the irradiation vacuum chamber internal radiation thick transparent polyethylene terephthalates of 28 μ m (PET) film.Heavy ion beam intensity of flow 100nA, electromagnetic scanning width 40cm, film travelling speed 25m/min.The heavy ion irradiation process is a kind of unordered stochastic process, thereby forms the latent mark of the nuclear of obeying the statistical law distribution in being subjected to according to the PET film.
2, it is independent fully with above-mentioned steps 1 that the laser rainbow die pressed holographic image is made this step, just with restriction and management.Use laser rainbow hologram plate-making technology and moulding replication technology, on the clear PET film that was shone, make a kind of visual or not visible image, and press the antiforge laser holographic technology secrecy.
3, the identification pattern that will draw by computer design of antiforge sign is made the printing mother matrix.On printing machine, evenly and clearly identification pattern is printed onto the PET film that was shone.Sometimes can be as requested with the random fashion identification pattern of arranging.
4, the chemical etching of nuclear micropore is before chemical etching, and elder generation is entirely compound with the PET film surface with laser rainbow mould hologram image with the hot melt adhesive pre-coating film on coating machine.Working temperature when answering film is 85 ℃.Then, composite membrane is carried out chemical etching in the nucleopore membranes etching machine.Etching condition is 6N NaOH, 85 ℃.The size of nuclear micropore depends on the length of etching period, and the diameter of nuclear micropore is elected 0.5～16 μ m usually as.
5, this step of nuclear micropore vacuum evaporation is relatively independent with above-mentioned 4 steps.Have the PET film of nuclear micropore picture and text and laser rainbow die pressed holographic image, plate the layer of aluminum film by evaporation in vacuum coating equipment, the inwall of nuclear micropore also plates the layer of aluminum film simultaneously.The thickness of aluminium coated by the transmission speed modulation of PET film, is examined the print through characteristic of micropore and the high reflectance of aluminium coated with assurance under the certain prerequisite of melting aluminum amount.
The three-in-one type that the present embodiment method is made is examined the microhole comprehensive anti-fake mark structure as shown in Figure 1, and among the figure, each layer structure is from top to bottom: have the nuclear-track porous anti-counterfeiting mark 11 of laser hologram image, aluminium coated 12, non-drying glue layer 13, silicone oil paper 14.
Comprehensive anti-fake mark after the vacuum evaporation has very strong outward appearance artistic visual effect, moreover, because a large amount of identical micropore that sign coker micropore is random distribution, be orientated by same mode, thereby generation Fu Nan and fraunhofer-diffraction effect, when under optical microscope, observing, in the dark field that aluminium coated causes, Guang Liang nuclear micropore one by one, just like an array of stars in the night sky, also than being easier to observation and password being set.This is the big characteristics that the nuclear microhole comprehensive anti-fake mark is different from common nuclear micropore sign.
Three-in-one type nuclear microhole comprehensive anti-fake mark integrates the characteristics of nuclear micropore anti-counterfeiting mark, laser rainbow mould pressing holographic anti-counterfeiting logo and vacuum evaporation nuclear micropore, is that any single method can not be copied.
Embodiment two
The manufacture method of binary whole type nuclear microhole comprehensive anti-fake mark
Binary whole type nuclear microhole comprehensive anti-fake mark be derivative by the three-in-one type, technical feature is identical but mutually different anti-fake product.The method of manufacturing binary whole type nuclear microhole comprehensive anti-fake mark of the present invention can be divided into 5 relatively independent steps basically:
1, heavy ion irradiation; This step is identical with the step 1 of embodiment 1
2, the laser rainbow die pressed holographic image is made; This step is identical with the step 2 of embodiment 1.
3, antiforge sign; This step is basic identical with the step 3 of embodiment 1.Different is that nuclear micropore pattern and literal distribute by certain sequence, to guarantee all have a complete nuclear micropore security pattern on each laser holographic anti counterfeiting label at least.
4, the chemical etching of nuclear micropore; This step is identical with the step 4 of embodiment 1.
5, multiple this step of film is independent fully with above-mentioned four steps.After the chemical etching, will have nuclear micropore picture and text and laser rainbow hologram image and comprehensive anti-fake mark film on the coating machine with the plastics aluminizer multiple after, to increase reflectivity.Cut into the sign product by laser image at last.
The binary whole type that the present embodiment method is made is examined the microhole comprehensive anti-fake mark structure as shown in Figure 2, and among the figure, each layer structure is from top to bottom: the nuclear-track porous anti-counterfeiting mark 21 that has the laser hologram image, hot melt adhesive layer 22, common aluminizer 23, non-drying glue layer 24, silicone oil paper 25.
The manufacture method of embodiment three compound nuclear micropore anti-counterfeiting marks
Compound nuclear micropore anti-counterfeiting mark is the anti-fake product derivative by binary whole type nuclear micropore anti-counterfeiting mark, that technical feature is identical but inequality.Basically can be divided into 5 relatively independent steps:
1, this step of heavy ion irradiation is identical with the step 1 of embodiment.
2, recessed this step of printing nuclear micropore anti-counterfeiting mark is identical with the step 3 of embodiment 2.
3, this step of chemical etching of nuclear micropore is identical with the step 4 of embodiment 1.
4, laser rainbow mould holographic anti-counterfeiting label is made and is used laser rainbow hologram plate-making technology and moulding replication technology, makes laser rainbow embossed holographic image anti-counterfeiting mark on the common PET metallized film.
5, be compounded in and examine the micropore anti-counterfeiting mark on the coating machine and laser holographic anti counterfeiting label is combined with each other.The size that is embossed in holographic anti-counterfeiting label by laser rainbow cuts into compound nuclear micropore anti-counterfeiting mark at last.
The compound nuclear microhole comprehensive anti-fake mark structure that the present embodiment method is made as shown in Figure 3, among the figure, each layer structure is from top to bottom: nuclear-track porous anti-counterfeiting mark 31, hot melt adhesive layer 32, laser holographic anti counterfeiting label film 33, non-drying glue layer 34, silicone oil paper 35.
Utilize the three-in-one that the present invention makes and the two types of nuclear microhole comprehensive anti-fake marks and the compound nuclear micropore anti-counterfeiting mark of binary whole, integrate multiple anti-fake, aesthetic property and practicality, have very strong antiforge function and artistic visual effect, not only anti-counterfeiting performance is reliable, and realize popular identification easily, use supporting microscope can also carry out real and fake discrimination like clockwork.
Claims (13)
1, a kind of nuclear microhole comprehensive anti-fake mark manufacture method is characterized in that, may further comprise the steps:
1), transparent high molecular polymer film is carried out irradiation with heavy ion with certain energy and quality;
2), on said irradiated transparent polymer thin polymer film, make the laser rainbow die pressed holographic image;
3), on the transparent polymer thin polymer film that shone, printing nuclear micropore anti-counterfeiting mark pattern and literal;
4), compound or the alkaline-resisting or sour protective seam of coating one deck on said laser rainbow hologram image;
5), the transparent polymer thin polymer film of handling through above-mentioned steps is carried out to pitting quarter, after the chemical etching film is cleaned and dried, obtain binary whole synthetic nucleus micropore anti-counterfeiting mark with chemical etchant.
2, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that, also comprises: the aluminium film with vacuum vapour deposition plating one deck light on nuclear pore membrane surface and micropore inwall obtains three-in-one synthetic nucleus micropore anti-counterfeiting mark.
3, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that said heavy ion is the heavy ion beam with certain energy and quality, and energy range is more than 50Mev.
4, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that, the thickness range of said transparent polymer thin polymer film between 5 μ m and 40 μ m, is complementary with the energy of heavy ion.
5, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that, said nuclear pore density is 10
4～10
8/ cm
2Between, used exposure time will be complementary according to the movement velocity of density size with film.
6, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that, said laser holographic mark adopts multiple image laser mold pressing and stealthy contour forging anti-counterfeiting mark.
7, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that, said protective seam is alkaline-resisting or sour hot melt adhesive layer or pre-coating film.
8, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that, the used etchant of said chemical etching process is an alkalescence or acid, and its principal ingredient is NaOH, KOH or H
2SO
4, the concentration of etching solution is between 4M and 8M, and the working temperature of chemical etching is between 50 ℃ and 100 ℃.
9, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 2 is characterized in that, the used metal of said vacuum evaporation is the technical pure aluminium wire, and its temperature of fusion will be carried out water-cooled and handle about 660 ℃ in the film vacuum evaporating plating process.
10, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 7 is characterized in that, said alkaline-resisting protective seam is polypropylene, polyester or polycarbonate high molecular polymer pre-coating film.
11, nuclear microhole comprehensive anti-fake mark manufacture method as claimed in claim 1 is characterized in that, said heavy ion irradiation is the irradiation of the fission fragment of the vertical irradiation of accelerator scan-type or reactor.
12, a kind of nuclear microhole comprehensive anti-fake mark goods is characterized in that, by the nuclear-track porous anti-counterfeiting mark that has the laser hologram image, and aluminium coated, non-drying glue layer and silicone oil paper be combined into.
13, a kind of nuclear microhole comprehensive anti-fake mark goods is characterized in that, by the nuclear-track porous anti-counterfeiting mark that has the laser hologram image, and hot melt adhesive layer, common aluminizer, non-drying glue layer and silicone oil paper be combined into.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99119551 CN1115656C (en) | 1999-09-03 | 1999-09-03 | Method for mfg. of nuclear track microhole comprehensive anti-fake mark and product |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 99119551 CN1115656C (en) | 1999-09-03 | 1999-09-03 | Method for mfg. of nuclear track microhole comprehensive anti-fake mark and product |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1243300A CN1243300A (en) | 2000-02-02 |
| CN1115656C true CN1115656C (en) | 2003-07-23 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 99119551 Expired - Fee Related CN1115656C (en) | 1999-09-03 | 1999-09-03 | Method for mfg. of nuclear track microhole comprehensive anti-fake mark and product |
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| Country | Link |
|---|---|
| CN (1) | CN1115656C (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TW201225026A (en) * | 2010-12-09 | 2012-06-16 | Printing Plant Ministry Of Finance | Easily recognizable anti-forgery tag and recognition method hereof |
| CN103065546A (en) * | 2012-12-29 | 2013-04-24 | 中山国安火炬科技发展有限公司 | Medium holographic micropore anti-counterfeiting film |
| CN106742677A (en) * | 2016-12-22 | 2017-05-31 | 炬众钛合（天津）科技发展有限公司 | A kind of environmental protection package thing with optical tag |
| CN113050564B (en) * | 2021-03-12 | 2022-04-26 | 中国科学院近代物理研究所 | Nuclear track membrane etching line self-feedback linkage production control device |
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1999
- 1999-09-03 CN CN 99119551 patent/CN1115656C/en not_active Expired - Fee Related
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| Publication number | Publication date |
|---|---|
| CN1243300A (en) | 2000-02-02 |
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