CN111552154A - Electrophotographic member - Google Patents
Electrophotographic member Download PDFInfo
- Publication number
- CN111552154A CN111552154A CN202010359532.XA CN202010359532A CN111552154A CN 111552154 A CN111552154 A CN 111552154A CN 202010359532 A CN202010359532 A CN 202010359532A CN 111552154 A CN111552154 A CN 111552154A
- Authority
- CN
- China
- Prior art keywords
- hole blocking
- layer
- parts
- blocking layer
- electrophotographic member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000000903 blocking effect Effects 0.000 claims abstract description 67
- 229920002554 vinyl polymer Polymers 0.000 claims abstract description 21
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 claims abstract description 18
- 239000011230 binding agent Substances 0.000 claims abstract description 18
- 239000000758 substrate Substances 0.000 claims abstract description 18
- 239000011354 acetal resin Substances 0.000 claims abstract description 17
- 229920006324 polyoxymethylene Polymers 0.000 claims abstract description 17
- 229920006122 polyamide resin Polymers 0.000 claims abstract description 15
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 11
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 11
- 230000005540 biological transmission Effects 0.000 claims abstract description 6
- 239000000203 mixture Substances 0.000 claims abstract description 6
- 239000010410 layer Substances 0.000 claims description 163
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 38
- 229920002037 poly(vinyl butyral) polymer Polymers 0.000 claims description 24
- 239000004408 titanium dioxide Substances 0.000 claims description 19
- 229920002292 Nylon 6 Polymers 0.000 claims description 17
- 229920005989 resin Polymers 0.000 claims description 15
- 239000011347 resin Substances 0.000 claims description 15
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 14
- 239000012790 adhesive layer Substances 0.000 claims description 7
- 239000011787 zinc oxide Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 6
- 239000004952 Polyamide Substances 0.000 claims description 4
- 239000003054 catalyst Substances 0.000 claims description 4
- 229920002647 polyamide Polymers 0.000 claims description 4
- 239000011241 protective layer Substances 0.000 claims description 4
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 claims description 2
- ZTQSAGDEMFDKMZ-UHFFFAOYSA-N Butyraldehyde Chemical compound CCCC=O ZTQSAGDEMFDKMZ-UHFFFAOYSA-N 0.000 claims description 2
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 2
- BUUPQKDIAURBJP-UHFFFAOYSA-N sulfinic acid Chemical compound OS=O BUUPQKDIAURBJP-UHFFFAOYSA-N 0.000 claims description 2
- 150000003566 thiocarboxylic acids Chemical class 0.000 claims description 2
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 claims description 2
- 229910001887 tin oxide Inorganic materials 0.000 claims description 2
- 238000004519 manufacturing process Methods 0.000 abstract description 14
- 238000010438 heat treatment Methods 0.000 abstract description 9
- 239000006185 dispersion Substances 0.000 description 35
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 27
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 24
- 230000005611 electricity Effects 0.000 description 24
- 229910052757 nitrogen Inorganic materials 0.000 description 21
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 18
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 17
- 239000011324 bead Substances 0.000 description 16
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 14
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 14
- 229920000515 polycarbonate Polymers 0.000 description 12
- 239000004417 polycarbonate Substances 0.000 description 12
- 239000000243 solution Substances 0.000 description 12
- 108091008695 photoreceptors Proteins 0.000 description 11
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 11
- 229910000838 Al alloy Inorganic materials 0.000 description 10
- CWNIBKBOXQUALV-UHFFFAOYSA-N CC1=CC=C(C=C1)C1=C(C=CC(C1)(N)N)C1=CC=CC=C1 Chemical compound CC1=CC=C(C=C1)C1=C(C=CC(C1)(N)N)C1=CC=CC=C1 CWNIBKBOXQUALV-UHFFFAOYSA-N 0.000 description 10
- 239000011248 coating agent Substances 0.000 description 10
- 238000000576 coating method Methods 0.000 description 10
- 230000000052 comparative effect Effects 0.000 description 10
- 239000004744 fabric Substances 0.000 description 9
- 239000011521 glass Substances 0.000 description 9
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 9
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 8
- 239000004677 Nylon Substances 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 238000000227 grinding Methods 0.000 description 8
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 8
- 239000000463 material Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 239000012046 mixed solvent Substances 0.000 description 8
- 229920001778 nylon Polymers 0.000 description 8
- 229920000642 polymer Polymers 0.000 description 8
- 239000011148 porous material Substances 0.000 description 8
- 239000000843 powder Substances 0.000 description 8
- 230000035945 sensitivity Effects 0.000 description 8
- 230000007547 defect Effects 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000001723 curing Methods 0.000 description 4
- 239000011120 plywood Substances 0.000 description 4
- 150000003384 small molecules Chemical class 0.000 description 4
- 239000002904 solvent Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- 229920000571 Nylon 11 Polymers 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- 238000007334 copolymerization reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 150000002576 ketones Chemical class 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229920002635 polyurethane Polymers 0.000 description 3
- 239000004814 polyurethane Substances 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 125000000217 alkyl group Chemical group 0.000 description 2
- 150000004982 aromatic amines Chemical class 0.000 description 2
- 125000004432 carbon atom Chemical group C* 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 239000002305 electric material Substances 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical group 0.000 description 2
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 2
- 238000005667 methoxymethylation reaction Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 125000002080 perylenyl group Chemical class C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- -1 polysiloxane Polymers 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000007639 printing Methods 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- BTEAMLUWLVUBFF-UHFFFAOYSA-N 5-(3-methylphenyl)-4-phenylcyclohexa-2,4-diene-1,1-diamine Chemical compound CC=1C=C(C=CC1)C1=C(C=CC(C1)(N)N)C1=CC=CC=C1 BTEAMLUWLVUBFF-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- 229910001369 Brass Inorganic materials 0.000 description 1
- FBEBRAFAJBYJFZ-UHFFFAOYSA-N COC1=CC=C(C=C1)C2=C(C=CC(C2)(N)N)C3=CC=CC=C3 Chemical compound COC1=CC=C(C=C1)C2=C(C=CC(C2)(N)N)C3=CC=CC=C3 FBEBRAFAJBYJFZ-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical class O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 206010027146 Melanoderma Diseases 0.000 description 1
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 229920000305 Nylon 6,10 Polymers 0.000 description 1
- 239000004687 Nylon copolymer Substances 0.000 description 1
- 229910001069 Ti alloy Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 description 1
- BZHJMEDXRYGGRV-UHFFFAOYSA-N Vinyl chloride Chemical compound ClC=C BZHJMEDXRYGGRV-UHFFFAOYSA-N 0.000 description 1
- 229910001093 Zr alloy Inorganic materials 0.000 description 1
- 150000001241 acetals Chemical class 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000003213 activating effect Effects 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical compound [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 239000010951 brass Substances 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000003153 chemical reaction reagent Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 230000005670 electromagnetic radiation Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000012948 isocyanate Substances 0.000 description 1
- 150000002513 isocyanates Chemical class 0.000 description 1
- 239000002346 layers by function Substances 0.000 description 1
- 238000013035 low temperature curing Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- PRMHOXAMWFXGCO-UHFFFAOYSA-M molport-000-691-708 Chemical compound N1=C(C2=CC=CC=C2C2=NC=3C4=CC=CC=C4C(=N4)N=3)N2[Ga](Cl)N2C4=C(C=CC=C3)C3=C2N=C2C3=CC=CC=C3C1=N2 PRMHOXAMWFXGCO-UHFFFAOYSA-M 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/14—Inert intermediate or cover layers for charge-receiving layers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
Abstract
The invention discloses an electrophotographic member. The electrophotographic member includes a conductive substrate, a hole blocking layer, a charge generating layer, and a charge transporting layer, wherein the hole blocking layer is formed from a composition including a binary binder and a metal oxide, and the binary binder includes an N-oxyalkylated polyamide resin and a polyvinyl acetal resin. The hole blocking layer of the electronic photographic element has excellent hole blocking and electron transmission performances, and only needs to be cured at room temperature or low temperature without high-temperature heating and curing, so that the manufacturing process of the electronic photographic element is simplified and energy is saved.
Description
Technical Field
The present invention relates to the field of electrophotographic imaging member technology, and in particular to an electrophotographic member having a dual resin undercoat.
Background
In the field of electrophotography, an electrophotographic negative containing a conductive layer and a photoconductive insulating layer is first imaged by uniformly electrostatically charging the imaging surface of the photoconductive insulating layer; then exposing the negative to activating electromagnetic radiation that selectively dissipates the charge in the irradiated areas of the photoconductive insulating layer while leaving a latent electrostatic image in the non-irradiated areas; the resulting latent electrostatic image is developed to form a visible image by depositing finely divided electroscope toner particles on the surface of the photoconductive insulating layer, and the resulting visible image can be transferred to a suitable receiving member. This imaging process can be repeated many times with reusable electrophotographic imaging members.
The electrophotographic imaging member can be in the form of a negative, a rotating drum, or a flexible belt. These electrophotographic members are typically multilayer photoreceptors comprising an optional substrate, an optional conductive layer, an undercoat layer (hole blocking layer), an optional adhesive layer, a charge generating layer, a charge transport layer, and an optional protective layer, and in some flexible belt photoreceptors also an anti-curl back layer.
The undercoat layer in a multilayer photoreceptor, also commonly referred to as a hole blocking layer, functions to block the injection of holes from the conductive layer into the charge generating layer, while also transporting electrons generated in the charge generating layer to the conductive layer. Typical hole blocking layers include polymers and metal oxides, such as titanium dioxide, zinc oxide, aluminum oxide, zirconium oxide, indium tin oxide, and the like, uniformly dispersed in the polymer. Suitable polymers include phenolic, polyamide, polyurethane, melamine, benzoguanamine, epoxy, polyvinyl alcohol, cellulose, nitrocellulose, and the like or similar systems. The thickness of the hole blocking layer is generally from about 0.1 μm to about 30 μm, or from about 0.5 μm to about 10 μm. For example, U.S. patent US4921769A illustrates photoconductive imaging members with certain polyurethane hole blocking layers; further, for example, chinese patent CN1749864A discloses a hole blocking layer in which titanium dioxide is dispersed in a phenolic resin; further, as disclosed in chinese patent CN1637628A, a hole blocking layer with a binary binder of isocyanate and phenolic resin is disclosed. In the current multilayer photoreceptor fabrication process, the hole blocking layer is typically cured by high temperature heating to achieve satisfactory performance, such as long cycle life, minimized black dot print defects, and the like. The heating temperature is generally from about 100 degrees celsius to 180 degrees celsius and the heating time is generally from about 20 minutes to about 60 minutes. This process is both time and energy consuming and the industry needs to find a hole blocking layer that cures without high temperature heating (e.g., heating temperatures greater than 80 degrees celsius).
Disclosure of Invention
The invention aims to overcome the defects of the prior art and provide an electrophotographic element, wherein a hole blocking layer of the electrophotographic element has excellent hole blocking and electron transmission performances, and only needs to be cured at room temperature or low temperature (less than or equal to 80 ℃) without high-temperature heating (more than 80 ℃) for curing, so that the manufacturing process of the electrophotographic element is simplified and energy is saved.
In order to achieve the purpose, the technical scheme adopted by the invention is as follows:
an electrophotographic member comprising
A conductive substrate;
a hole blocking layer;
a charge generating layer; and
a power transmission layer;
wherein the hole blocking layer is formed of a composition including a binary binder and a metal oxide, and the binary binder includes an N-oxyalkylated polyamide resin and a polyvinyl acetal resin. The hole blocking layer can be cured only at room temperature or low temperature (less than or equal to 80 ℃) without high temperature heating (more than 80 ℃) and the formed electrophotographic element still has good performance, such as long cycle life, minimized black spot printing defects and the like.
Preferably, the binary binder is used in an amount of 10% to 80%, preferably 30% to 70%, by weight of the hole blocking layer; the weight ratio of the N-oxyalkylated polyamide resin to the polyvinyl acetal resin in the binary binder is 99:1 to 50:50, preferably 95:5 to 70:30, and the hole blocking layer is ensured to have appropriate resistance, good bonding force and environmental suitability by preferably selecting the ratio of the N-oxyalkylated polyamide resin to the polyvinyl acetal resin.
Preferably, the N-oxyalkylated polyamide resin is a polyamide prepared by oxyalkylation such as N-oxyalkylated nylon 6, N-oxyalkylated nylon 11, N-oxyalkylated nylon 12, N-oxyalkylated nylon 6, N-oxyalkylated nylon 6,10, N-oxyalkylated nylon copolymers, and blends or the like thereof, the N-oxyalkylated polyamide resin is more preferably N-methoxymethylated nylon 6, and N-methoxymethylated nylon 6 is an alcohol-soluble resin and is less likely to absorb water than other kinds of polyamide resins. The N-methoxy methylated nylon 6 is obtained by methoxy methylation of nylon 6, and the synthetic route is as follows, wherein m and N are mole percentages of each monomer component:
commercial N-methoxymethylated Nylon 6 selected from FINE
FR101 (about 30% methoxymethylation, n-30 mol%; weight average molecular weight about 20,000, available from Namariichi co., ltd., japan), FINE
FR104 (available from Namariichi co., ltd.);
F30K (weight average molecular weight of about 25,000, available from Nagase Chemtex Corp. Japan),
EF30T (weight average molecular weight about 60000, obtained from Nagase ChemTex corp.); and
CM8000 (available from eastern corporation of japan), and the like.
Preferably, the polyvinyl acetal resin includes at least one of polyvinyl formal resin, polyvinyl acetal resin, and polyvinyl butyral resin.
Preferably, the polyvinyl acetal resin is polyvinyl butyral resin, which is a condensate of polyvinyl alcohol and butyl aldehyde, and the synthetic route of the polyvinyl butyral resin is as follows, wherein x, y and z are mole percentages of each monomer component:
preferably, the polyvinyl butyral resin has a degree of butyralization (y) of from 63 mol% to 75 mol%, preferably from 63 mol% to 68 mol%; the weight-average molecular weight is 14000-. Commercial polyvinyl butyral resins are available from SEKISUI Chemical, Inc., such as S-LEC BL-1, BL-2, BX-L, BM-1, and BM-5, among others.
Preferably, the binary binder further comprises a catalyst comprising at least one of a carboxylic acid, a sulfonic acid, a sulfinic acid, a thiocarboxylic acid, said catalyst being used in an amount of 0.1% to 5%, preferably 0.5% to 3% by weight of the binary binder, to accelerate the self-polymerization of the N-oxyalkylated polyamide resin and its copolymerization with the polyvinyl acetal resin.
Preferably, the metal oxide is used in an amount of 20% to 90%, preferably 30% to 70%, by weight of the hole blocking layer; the metal oxide comprises at least one of titanium dioxide, zinc oxide and tin oxide, and is preferably titanium dioxide or zinc oxide. The titanium dioxide can be selected from titanium dioxide MT-150W, MT-150AW from the Japan Imperial chemical industry; titanium dioxide STR-60N from Sakai chemical company. The zinc oxide can be selected from zinc oxide SMZ-017N of Japan empire chemical industry, etc.
The composition of the binary binder and the metal oxide for forming the hole-blocking layer according to the present invention is generally dispersed in a solvent to form a hole-blocking layer dispersion, and then the dispersion is coated on the conductive substrate. The amount of the solvent is 30-90%, preferably 50-85% of the total weight of the dispersion. The solvent comprises at least one of alcohol, ketone and ether, and the alcohol can be selected from at least one of methanol, ethanol, propanol and butanol; the ketone can be at least one selected from acetone, methyl ethyl ketone, methyl isobutyl ketone and cyclohexanone; the ether can be at least one of tetrahydrofuran and dioxane.
Any suitable technique may be used to disperse the metal oxide in the binary binder solution to form the hole blocking layer dispersion. These techniques include mills, ball mills, dynamull ball mills, paint shaker screens, homogenizers, ultrasonics, microfluidizers, mechanical agitation, mixers, and other suitable milling techniques. The dispersion may be applied to a selected conductive substrate by a spray coater, dip coater, extrusion coater, roll coater, wire bar coater, slot coater, knife coater, gravure coater, etc., and then dried and cured at 80 degrees celsius or less for 5 minutes to 120 minutes, with a final coating thickness of 1 to 30 μm, preferably 2 to 15 μm.
Preferably, the hole blocking layer further contains insulating particles in an amount of 1% to 15% by weight of the hole blocking layer. The present invention may use insulating particles such as silica spheres or polysiloxane spheres to suppress an effect called "plywood". The plywood effect refers to the generation of an undesirable image in the latent electrostatic image caused by multiple reflections from the charged imaging member during exposure. When developed, these patterns look like the grain of plywood. Silica spheres (e.g., SiO manufactured by Esprit, USA)2P-100) or silicone spheres (e.g., polymethylsilsesquioxane tosearl 130 manufactured by meiji corporation, usa)) have a diameter size of 0.5 to 10 μm, preferably 1 to 5 μm. These particles can disperse light, thereby minimizing the plywood effect.
Preferably, the electrophotographic member further includes any one of the following (a) to (b):
(a) an adhesive layer;
(b) and a protective layer.
The electrophotographic member of the present invention generally comprises a conductive substrate, a hole blocking layer, an optional adhesive layer, a charge generating layer, a charge transport layer, and an optional protective layer structurally.
The conductive substrate of the invention may be chosen from polyesters coated with a thin layer of titanium/zirconium alloy, for example from DuPont
Aluminum/chromium/nickel/brass/stainless steel and their alloy pipes; plastics, cloth, glass and paper coated with a thin layer of a conductive metal oxide such as indium tin oxide, indium oxide, and metal drums and the like which have been subjected to metal oxidation treatment by electrode oxidation or the like.
The hole blocking layer may be coated with an adhesive layer having a thickness of 0.001 to 1 μm, preferably 0.01 to 0.2 μm. The adhesive layer is composed of a polymer comprising at least one of polyester, polyamide, polyvinyl butyral, polyurethane, polyvinyl alcohol.
The charge generation layer is composed of a resin base material and 5 wt% -95 wt% of photogenerated electric material, the photogenerated electric material is dispersed in the resin base material, wherein the resin comprises polyvinyl acetal, polycarbonate, copolymer of vinyl chloride and vinyl acetate and the like. The photogenerating material may be selected from metal phthalocyanines (e.g., hydroxygallium phthalocyanine, oxytitanium phthalocyanine, chlorogallium phthalocyanine, etc.), non-metal phthalocyanines, perylenes [ e.g., bis (benzimidazole) perylene ], selenium (e.g., trigonal selenium), and other suitable photogenerating materials disclosed in the related art, such as those disclosed in japanese patent application laid-open No. 11-172003. The thickness of the charge generating layer is generally 0.05 to 15 μm, preferably 0.25 to 2 μm. The solvent used to prepare the charge generating layer dispersion can be selected from ketones, alcohols, aromatic hydrocarbons, halogenated aliphatic hydrocarbons, ethers, amines, amides, esters, and the like.
A charge transport layer may also be coated on the charge generating layer. The charge transport layer is typically formed by uniformly dispersing a charge transport material, such as a hole transporting small molecule, in an inactive polymer. Non-living polymers include polycarbonates, such as polycarbonate Z, A, C and AP, having a weight average molecular weight of from 20000-. In addition, aromatic polyesters are also suitable for use as the dead polymer in the charge transport layer. Aromatic amines disclosed in U.S. Pat. No.4,265,990 may also be used as suitable hole transporting small molecules in the charge transport layer of the present invention. In practice, the chemical structure of the aromatic amine is shown below:
wherein X is alkyl, halogen, alkoxy or a mixture thereof. Typically halogen is chlorine and typically alkyl has from 1 to 10 carbon atoms, preferably 1 to 5 carbon atoms. Commonly used hole transporting small molecules include N, N-diphenyl-N, N-bis (3-methylphenyl) -1, 1-biphenyl-4, 4-diamine (mTBD), N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD), N-tetrakis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine, and N, N-diphenyl-N, N-bis (4-methoxyphenyl) -1, 1-biphenyl-4, 4-diamine.
In addition, other suitable power transmission materials are specifically described in Japanese patent laid-open No. 11-172003.
The weight ratio of the polymer to the hole transporting small molecule in the charge transport layer is from 80:20 to 30:70, preferably from 40:60 to 75: 25. The thickness of the charge transport layer is generally from 2 to 50 μm, preferably from 15 to 35 μm. The thickness ratio of the charge transport layer to the charge generating layer is generally from 2:1 to 200:1, and in some cases can be as high as 400: 1.
When the charge generating layer is part of an electrophotographic member, the charge generating layer dispersion may be coated on the adhesive layer, the conductive layer, or the charge transport layer. When a charge generating layer and a charge transport layer are present together, the charge generating layer may be sandwiched between the surface of the conductive layer and the charge transport layer, or the charge transport layer may be sandwiched between the surface of the conductive layer and the charge generating layer.
In a multilayer photoreceptor, the charge generating layer, the charge transport layer, and other functional layers can be arranged in a suitable order to produce a positively or negatively charged multilayer photoreceptor either with the charge generating layer applied first and the charge transport layer applied second, or with the charge transport layer applied first and the charge generating layer applied second.
Compared with the prior art, the invention has the beneficial effects that:
the hole blocking layer of the electrophotographic element has excellent hole blocking and electron transmission performances, and only needs to be cured at room temperature or low temperature (less than or equal to 80 ℃) without being cured by high-temperature heating (more than 80 ℃), so that the manufacturing process is simplified and energy is saved.
Detailed Description
To better illustrate the objects, aspects and advantages of the present invention, the present invention will be further described with reference to specific examples. It will be understood by those skilled in the art that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.
In the examples, the experimental methods used were all conventional methods unless otherwise specified, and the materials, reagents and the like used were commercially available without otherwise specified.
The raw materials used in the examples and comparative examples are now described below, but are not limited to these materials: titanium dioxide: MT-150W, Japan Imperial chemical;
methoxymethylated polyamide 6:
FR101, Namariichi co., japan, ltd;
polyvinyl butyral: S-LEC BX-L, Sekisui Chemical, Japan;
oxytitanium phthalocyanine: korea IT CHEM Co;
polycarbonate Z: PCZ-500, Mw 50,000, mitsubishi gas chemistry, japan.
The parts of examples and comparative examples refer to parts by weight.
Preparation of hole-blocking layer coating dispersion
Example 1:
7.94 parts of titanium dioxide powder, 6.95 parts of methoxymethylated polyamide 6, 0.62 part of polyvinyl butyral, 0.07 part of p-toluenesulfonic acid, 56.28 parts of methanol and 28.14 parts of n-butanol were ball-milled with 400 parts of 1.0 to 1.25 mm zirconia beads for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
Example 2:
7.94 parts of titanium dioxide powder, 7.19 parts of methoxymethylated polyamide 6, 0.38 part of polyvinyl butyral, 0.07 part of p-toluenesulfonic acid, 56.28 parts of methanol, 28.14 parts of n-butanol and 400 parts of 1.0 to 1.25 mm zirconia beads were ball-milled for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
Example 3:
7.94 parts of titanium dioxide powder, 5.30 parts of methoxymethylated polyamide 6, 2.27 parts of polyvinyl butyral, 0.07 part of p-toluenesulfonic acid, 56.28 parts of methanol, 28.14 parts of n-butanol and 400 parts of 1.0 to 1.25 mm zirconia beads were ball-milled for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
Example 4:
7.94 parts of titanium dioxide powder, 7.49 parts of methoxymethylated polyamide 6, 0.08 part of polyvinyl butyral, 0.07 part of p-toluenesulfonic acid, 56.28 parts of methanol, 28.14 parts of n-butanol and 400 parts of 1.0 to 1.25 mm zirconia beads were ball-milled for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
Example 5:
7.94 parts of titanium dioxide powder, 3.785 parts of methoxymethylated polyamide 6, 3.785 parts of polyvinyl butyral, 0.07 part of p-toluenesulfonic acid, 56.28 parts of methanol, 28.14 parts of n-butanol and 400 parts of 1.0 to 1.25 mm zirconia beads were ball-milled together for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
Example 6:
7.94 parts of titanium dioxide powder, 6.95 parts of N-oxyalkylated nylon 11, 0.62 part of polyvinyl butyral, 0.07 part of p-toluenesulfonic acid, 56.28 parts of methanol, 28.14 parts of N-butanol and 400 parts of 1.0 to 1.25 mm zirconium oxide beads were ball-milled for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
Example 7:
7.94 parts of titanium dioxide powder, 6.95 parts of methoxymethylated polyamide 6, 0.62 part of polyvinyl formal, 0.07 part of p-toluenesulfonic acid, 56.28 parts of methanol, 28.14 parts of n-butanol and 400 parts of 1.0 to 1.25 mm zirconia beads were ball-milled together for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
Comparative example 1:
7.94 parts of titanium dioxide powder, 7.64 parts of methoxymethylated polyamide 6, 56.28 parts of methanol, 28.14 parts of n-butanol and 400 parts of 1.0 to 1.25 mm zirconia beads were ball-milled for 4 hours. The resulting dispersion was filtered through a nylon cloth with a pore size of 20 μm.
In examples 1 to 7, all the hole-blocking layers included N-oxyalkylated polyamide resin and polyvinyl acetal resin. During the curing process, the self-polymerization of the N-oxyalkylated polyamide resin and its copolymerization with the polyvinyl acetal resin take place simultaneously. The copolymerization of the N-oxyalkylated polyamide resin and the polyvinyl acetal resin accelerates the curing of the entire hole blocking layer at low temperature curing (less than or equal to 80 degrees celsius), especially under acid catalyzed conditions.
Compared with example 4, the hole blocking layers finally formed by the dispersions of examples 1 to 3 and example 5 have appropriate resistance, good bonding force and environmental adaptability.
The dispersion of example 6 was relatively slow to self-polymerize N-oxyalkylated nylon 11 compared to example 1.
The hole blocking layer finally formed from the dispersion of example 7 has a lower bonding force with the charge generating layer than that of example 1.
In comparative example 1, the hole blocking layer comprises only methoxymethylated polyamide 6, which self-polymerizes relatively slowly under low temperature conditions.
Manufacture of electrophotographic members
The configuration of the electrophotographic members of the following examples and comparative examples was: the hole blocking layer is arranged on the aluminum alloy tube substrate.
The aluminum alloy tube substrate, the charge generating layer and the charge transport layer of the electrophotographic members of examples 8 to 14 and comparative example 2 were the same except that they used different hole blocking layers.
Example 8:
the method for producing the electrophotographic member of the present example includes the steps of:
the hole blocking layer dispersion of example 1 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dried and cured at 80 degrees celsius for about 6 minutes to obtain a hole blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z (dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene.) the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes, to obtain an electricity transporting layer having a thickness of about 21 μm.
Example 9:
the method for producing the electrophotographic member of the present example includes the steps of:
the hole blocking layer dispersion of example 2 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dried and cured at 80 degrees celsius for about 6 minutes to obtain a hole blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z (dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene.) the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes, to obtain an electricity transporting layer having a thickness of about 21 μm.
Example 10:
the method for producing the electrophotographic member of the present example includes the steps of:
the hole blocking layer dispersion of example 3 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dried and cured at 80 degrees celsius for about 6 minutes to obtain a hole blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z (dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene.) the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes, to obtain an electricity transporting layer having a thickness of about 21 μm.
Example 11:
the method for producing the electrophotographic member of the present example includes the steps of:
the hole blocking layer dispersion of example 4 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dried and cured at 80 degrees celsius for about 6 minutes to obtain a hole blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z (dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene.) the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes, to obtain an electricity transporting layer having a thickness of about 21 μm.
Example 12:
the method for producing the electrophotographic member of the present example includes the steps of:
the hole blocking layer dispersion of example 5 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dried and cured at 80 degrees celsius for about 6 minutes to obtain a hole blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z (dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene.) the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes, to obtain an electricity transporting layer having a thickness of about 21 μm.
Example 13:
the method for producing the electrophotographic member of the present example includes the steps of:
the hole blocking layer dispersion of example 6 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dried and cured at 80 degrees celsius for about 6 minutes to obtain a hole blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z (dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene.) the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes, to obtain an electricity transporting layer having a thickness of about 21 μm.
Example 14:
the method for producing the electrophotographic member of the present example includes the steps of:
the hole blocking layer dispersion of example 7 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dry-cured at 80 degrees celsius for about 6 minutes to obtain a hole blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z (dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene.) the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes, to obtain an electricity transporting layer having a thickness of about 21 μm.
Comparative example 2:
the method for producing the electrophotographic member of this comparative example included the steps of:
the hole-blocking layer dispersion of comparative example 1 was coated on an aluminum alloy pipe substrate having a diameter of 30 mm, and dried and cured at 80 degrees celsius for about 6 minutes to obtain a hole-blocking layer having a thickness of about 2 μm;
grinding 3 parts of commercially higher sensitivity oxytitanium phthalocyanine, 1 part of polyvinyl butyral and 96 parts of butyl acetate with 400 parts of 1.0-1.25 mm glass beads for 2 hours, coating the resulting charge generating layer dispersion on the hole blocking layer, and drying at room temperature for about 2 minutes to obtain a charge generating layer about 0.2 μm thick;
8 parts of N, N-diphenyl-N, N-bis (4-methylphenyl) -1, 1-biphenyl-4, 4-diamine (pTBD) and 10 parts of polycarbonate Z were dissolved in a mixed solvent of 57.4 parts of tetrahydrofuran and 24.6 parts of toluene, and the resultant electricity transporting layer solution was coated on the electricity generating layer and dried at 135 ℃ for 45 minutes to obtain an electricity transporting layer having a thickness of about 21 μm.
The electrophotographic members of the examples were subjected to electrical property tests.
Because the titanium dioxide hole blocking layer photoreceptor is sensitive to high temperature and high humidity environment, 1000 sheets of the photoreceptor are continuously printed by a Hewlett packard 1020PLUS printer under the condition of 35 ℃ and 85% humidity to evaluate the electrical performance, samples are reserved every 100 sheets, and the printing defects are observed.
Compared with other examples, the photoreceptor (binary binder hole blocking layer) of example 8 printed very consistently from sheet 1 to sheet 1000, with almost no visible print defects and the best print results. In contrast, in the photoreceptor of comparative example 2 (unitary adhesive hole blocking layer), the 1 st printed mottling defect was severe, and the mottling increased rapidly with increasing number of prints and then gradually decreased. The print pattern from the 1 st to the 1000 th sheets varies greatly, and the pock defect is serious.
Therefore, the N-alkoxy alkylated polyamide resin and polyvinyl acetal resin binary adhesive disclosed by the invention realizes that the hole blocking layer still has good performance under low-temperature (less than or equal to 80 ℃) curing, and provides a simple and energy-saving method for manufacturing the multilayer photoreceptor for the industry.
Finally, it should be noted that the above embodiments are only used for illustrating the technical solutions of the present invention and not for limiting the protection scope of the present invention, and although the present invention is described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions can be made on the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention.
Claims (10)
1. An electrophotographic member, comprising
A conductive substrate;
a hole blocking layer;
a charge generating layer; and
a power transmission layer;
wherein the hole blocking layer is formed of a composition including a binary binder and a metal oxide, and the binary binder includes an N-oxyalkylated polyamide resin and a polyvinyl acetal resin.
2. The electrophotographic member according to claim 1, wherein the binary binder is used in an amount of 10% to 80%, preferably 30% to 70%, by weight of the hole blocking layer; the weight ratio of the N-oxyalkylated polyamide resin to the polyvinyl acetal resin in the binary binder is 99:1 to 50:50, preferably 95:5 to 70: 30.
3. Electrophotographic member according to claim 2, wherein the N-oxyalkylated polyamide resin is a polyamide prepared by oxyalkylation, preferably N-methoxy methylated nylon 6.
4. The electrophotographic member according to claim 2, wherein the polyvinyl acetal resin comprises at least one of a polyvinyl formal resin, a polyvinyl acetal resin, and a polyvinyl butyral resin.
5. The electrophotographic member according to claim 4, wherein the polyvinyl acetal resin is a polyvinyl butyral resin having a butyral degree of 63 mol% to 75 mol%, preferably 63 mol% to 68 mol%; the weight-average molecular weight of the polyvinyl butyral resin is 14000-80000, preferably 14000-50000.
6. The electrophotographic member according to claim 1 or 2, wherein the binary binder further comprises a catalyst comprising at least one of a carboxylic acid, a sulfonic acid, a sulfinic acid, a thiocarboxylic acid, the catalyst being used in an amount of 0.1% to 5%, preferably 0.5% to 3%, by weight of the binary binder.
7. The electrophotographic member according to claim 1, wherein the metal oxide is used in an amount of 20% to 90%, preferably 30% to 70% by weight of the hole blocking layer; the metal oxide comprises at least one of titanium dioxide, zinc oxide and tin oxide, and is preferably titanium dioxide or zinc oxide.
8. The electrophotographic member according to claim 1 or 7, wherein the hole blocking layer further contains insulating particles, and the amount of the insulating particles is 1% to 15% by weight of the hole blocking layer.
9. Electrophotographic element according to claim 1, wherein the thickness of the hole blocking layer is 1-30 μm, preferably 2-15 μm.
10. The electrophotographic member according to claim 1, further comprising any one of the following (a) to (b):
(a) an adhesive layer;
(b) and a protective layer.
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| JP2000221719A (en) * | 1999-01-29 | 2000-08-11 | Fuji Electric Co Ltd | Electrophotographic photoreceptor |
| CN101449209A (en) * | 2006-05-18 | 2009-06-03 | 三菱化学株式会社 | Electrophotographic photosensitive body, image forming device, and electrophotographic cartridge |
| US20090186287A1 (en) * | 2008-01-23 | 2009-07-23 | Xerox Corporation | Photoreceptor and method of making same |
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Application publication date: 20200818 |