CN111534232A - Grinding and polishing slurry and mirror panel preparation method - Google Patents
Grinding and polishing slurry and mirror panel preparation method Download PDFInfo
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- CN111534232A CN111534232A CN202010263410.0A CN202010263410A CN111534232A CN 111534232 A CN111534232 A CN 111534232A CN 202010263410 A CN202010263410 A CN 202010263410A CN 111534232 A CN111534232 A CN 111534232A
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- Prior art keywords
- slurry
- grinding
- acid
- polishing slurry
- silicon dioxide
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F3/00—Brightening metals by chemical means
- C23F3/04—Heavy metals
- C23F3/06—Heavy metals with acidic solutions
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Detergent Compositions (AREA)
Abstract
The invention discloses a grinding and polishing slurry and a preparation method of a mirror panel, wherein the mirror polishing is carried out on a stainless steel panel through a grinding and polishing machine, the grinding and polishing machine adopts the following slurry, the slurry comprises organic acid and silicon dioxide, and the mass ratio of the silicon dioxide is 2.2 +/-0.2%; the pH value of the slurry is 5.5-6.3, and the fineness of the slurry is more than 1500 meshes. The invention can avoid the corrosion damage of strong nitric acid, and is environment-friendly and low in cost.
Description
Technical Field
The invention relates to grinding and polishing slurry and a processing and production method of a stainless steel mirror panel, belonging to the technical field of metal plate processing.
Background
The traditional process for processing and producing the stainless steel mirror panel comprises the following steps: the material is produced by selecting a high-quality stainless steel 2B or BA surface cold-rolled sheet with the roughness not higher than Ra0.15 mu m and Ra0.07 mu m, using a multi-grinding head polishing grinder and adding an alumina micropowder nitric acid solution for grinding. The stainless steel mirror panel produced by the processing technology is polished by utilizing a plurality of procedures of primary grinding, semi-fine grinding, fine grinding and the like, so that the roughness of the stainless steel surface is below 0.01 mu m, the reflectivity is above 64 percent, and the technical index requirement of the mirror surface is met. The traditional grinding liquid process that 2% nitric acid and 3% alumina are prepared is used in the fine grinding and semi-fine grinding sections of the original polishing and grinding machine, and since the nitric acid is strong acid, acid mist in the production process has strong corrosion to the grinding equipment and has certain harm to the respiratory tract of a human body, and moreover, heavy metal chromium and nickel ions in production waste liquid can reach the standard and be discharged after being subjected to high-cost treatment by a sewage treatment station.
Disclosure of Invention
The purpose of the invention is as follows: in order to overcome the defects in the prior art, the invention provides the grinding and polishing slurry and the mirror panel preparation method which can avoid the corrosion damage of strong nitric acid and are environment-friendly.
The technical scheme is as follows: in order to achieve the purpose, the invention adopts the technical scheme that:
a mirror panel preparation method, carry on the mirror polishing to the stainless steel panel, the grinding polisher adopts the following grinding polishing slurry, the fineness of the slurry is more than 1500 meshes; organic acid (including one or a mixture of more than two of citric acid, acetic acid, oxalic acid, benzoic acid, malic acid, ascorbic acid, tartaric acid and the like) is used for replacing inorganic strong acid nitric acid, the organic acid is added to ensure that the pH value of the slurry is 5.5-6.3, and the slurry contains 2.2 +/-0.2 mass percent of silicon dioxide.
The citric acid is an important organic acid, is used for food additives, has a cleaning effect on metal surfaces, and can be used as a metal cleaning agent; the silicon dioxide is an atomic crystal of a spherical structure formed by silicon atoms and (four) oxygen atoms, the whole crystal can be regarded as a giant molecule, the silicon dioxide is a hard and insoluble spherical solid and is an acid oxide, and the silicon dioxide as an intermediate carrier can remove the convex part on the surface of the stainless steel (namely the uneven position of the surface of the grinding plate) by grinding and then is ground and polished, so that the surface of the stainless steel can be completely in a mirror surface state. The fineness of the fine grinding pulp is more than 2500 meshes.
Organic acid and weak acid are used for replacing inorganic strong acid nitric acid, the pH value of the grinding material is adjusted to about 6, the grinding material is biased to be neutral, the generation amount of metal chromium and nickel ions is controlled as much as possible, and the environmental pollution is light.
The invention adopts the technical problem that 0.05 percent of Tween and 0.2 percent of polyethylene glycol are mixed to disperse and slightly dissolve silicon dioxide, and the high-fineness slurry with 1500 meshes and 3000 meshes is prepared. The heavy metal trapping agent can be used for gelling and adsorbing heavy metal ions.
The pH value of the grinding fluid is adjusted to influence metal chromium and nickel ions, and meanwhile, a heavy metal trapping agent is added to enable the grinding fluid to meet the requirement of environmental protection and discharge. Adding heavy metal trapping agent in the amount of 0.5-2 wt%. Such as xanthates and dithiocarbamate Derivatives (DTCs) or gels thereof.
The silicon dioxide micro powder is dispersed and slightly dissolved in water to prepare 20 percent silicon dioxide slurry, and the citric acid is added by 10 percent, so that the dispersion and slightly dissolution of the silicon dioxide micro powder can be promoted, and the silicon dioxide micro powder is not precipitated. Finally preparing the mixture into the set concentration. Then preparing silicon dioxide slurry with the mass of 2.2 +/-0.2%.
The sodium gluconate is added into the grinding material, the mass ratio of the sodium gluconate is 1.5-2.5%, and the sodium gluconate can be used as a high-efficiency chelating agent in industries such as metal surface treatment, water treatment and the like, and a steel surface cleaning agent has excellent corrosion and scale inhibition effects, so the sodium gluconate is widely used as a water quality stabilizer, even has an effect in a full PH range, can be used as a food additive, can remove white spots on the surface of a mirror panel and enhance the brightness, and achieves a perfect mirror state.
The center feeding (the circle center position of the grinding medium grinding and polishing machine (grinding head) flows grinding slurry) has better effect.
The invention basically does not use acid or alumina micropowder abrasive, and the wool felt grinding head of the alumina micropowder grinding and polishing machine rapidly rotates to cause the phenomenon that the joint surface of the grinding head is scorched and hardened, thereby causing the defect that the surface of a stainless steel plate has unqualified grade such as grinding head print (hula hoop).
The probability of the hair of the wool felt grinding head is greatly reduced, the grinding and cutting efficiency is greatly improved, and the roughness of the stainless steel after grinding and polishing meets the technical requirements of a mirror panel.
With the new method and the new process, the optimal mixture ratio of the 3 percent citric acid and the 2.2 percent silicon dioxide is determined to prepare the grinding and polishing slurry after dozens of times of grinding comparison. The citric acid is an important organic acid, is used for food additives, has a cleaning effect on metal surfaces, and can be used as a metal cleaning agent; the silicon dioxide is an atomic crystal of a spherical structure formed by silicon atoms and four oxygen atoms, the whole crystal can be regarded as a giant molecule, the silicon dioxide is a hard and indissolvable spherical solid and is an acid oxide, and the silicon dioxide as an intermediate carrier can remove high points (namely grinding force) on the surface of the stainless steel, and then is ground and polished, so that the surface of the stainless steel can completely reach a mirror surface state.
Compared with the prior art, the invention has the following beneficial effects:
1. the mirror finished products of the invention have consistent color and no difference visible to the naked eye. The surface of the product should be smooth and have no defects such as scratches, creases, pits, oil stains and the like. The roughness of the surface is 0.01 μm or less. The reflectance is 64% or more. Overcomes the defect of overhigh chromium ions and nickel ions in the grinding fluid.
2. According to the production process, after the silicon dioxide organic acid citric acid slurry grinding fluid is used for replacing aluminum oxide nitric acid grinding fluid, the cost of the grinding fluid can be saved by 65 yuan for each ton of mirror surface plate processing, the wool felt loss of the grinding head can be reduced, and 70 yuan and the auxiliary material cost can be saved.
3. The production process of the invention completely eliminates the corrosion damage of the strong nitric acid to production equipment and workshop steel structures, and greatly reduces the failure frequency and the maintenance cost.
3. The process adopted by the invention meets the national industrial policy and the environmental protection treatment requirement, and fills the gap of the environmental protection type production of the stainless steel mirror panel in the stainless steel decoration industry. The production process of the stainless steel acid-free mirror panel is a subversive revolution in the field of mirror panel production, not only saves the production cost and the maintenance cost, but also eliminates the damage of the inhalation of volatile nitric acid by workers to the respiratory tract of the human body, and has great social benefit.
Detailed Description
The invention is further illustrated by the following examples in connection with specific embodiments thereof, it is to be understood that these examples are intended in an illustrative rather than in a limiting sense and that various equivalent modifications of the invention as described herein will occur to those skilled in the art upon reading the present disclosure and are intended to be covered by the appended claims.
Examples 1,
A mirror panel preparation method, the grinding polisher adopts the following grinding polishing slurry, the fineness of slurry is more than 1500 meshes; in another embodiment of the invention, the refined pulp has a fineness of 3000 mesh. The fine grinding is carried out after 1500 meshes of grinding, and the fineness of the fine ground slurry is 3000 meshes. The addition of citric acid makes the pH value of the slurry 6, and the pH value of the abrasive is adjusted to about 6, so that the slurry has good effect, the generation amount of metal chromium and nickel ions is small, and the environmental pollution is light. In another embodiment of the invention, the pH is 5.5, in yet another embodiment of the invention, the pH is 6.3, and the mass ratio of the silica in the slurry is 2.2%, and in another embodiment of the invention, the mass ratio of the silica in the slurry is 2%. In yet another embodiment of the present invention, the mass ratio of silica in the slurry is 2.4%. Adding heavy metal trapping agent in the amount of 0.5-2 wt%. Such as xanthates and dithiocarbamate Derivatives (DTCs) or gels thereof, allow the slurry to be recovered and conditioned for reuse.
Example 2
The difference between this example and example 1 is that the silica micro powder is dispersed and slightly soluble in water, and 20% silica slurry is prepared first, and 10% citric acid is added to promote dispersion and slight solubility of the silica micro powder without precipitation. Finally preparing the mixture into the set concentration. The silicon dioxide is extremely difficult to dissolve in water, the technical problem of dispersing and slightly dissolving the silicon dioxide is solved by adopting the technical problem that 0.05 percent of surfactant Tween (multi-specification Tween can be used) and 0.2 percent of polyethylene glycol are adopted to prepare two kinds of slurry of coarse 1500 meshes and fine 3000 meshes.
The sodium gluconate with the mass ratio of 2% is added into the grinding material, and can be used as a high-efficiency chelating agent in the industries of metal surface treatment, water treatment and the like, and a steel surface cleaning agent has excellent corrosion and scale inhibition effects, so the sodium gluconate is widely used as a water quality stabilizer, even has an effect in the full pH range, can be used as a food additive, can remove white spots on the surface of a mirror panel and enhance the brightness, and achieves a perfect mirror state.
And the slurry grinding fluid prepared from citric acid and silicon dioxide has unexpected effect after the test grinding tool.
Example 3
The grinding material has better feeding effect in the center of the grinding medium grinding and polishing machine (grinding head).
The above description is only of the preferred embodiments of the present invention, and it should be noted that: it will be apparent to those skilled in the art that various modifications and adaptations can be made without departing from the principles of the invention and these are intended to be within the scope of the invention.
Claims (10)
1. An abrasive polishing slurry, characterized in that: comprises organic acid and silicon dioxide, wherein the mass ratio of the silicon dioxide is 2.2 +/-0.2%; the pH value of the slurry is 5.5-6.3, and the fineness of the slurry is more than 1500 meshes.
2. The abrasive polishing slurry according to claim 1, wherein: the heavy metal scavenger also comprises a heavy metal scavenger, and the mass ratio of the heavy metal scavenger is 0.5-2%.
3. The abrasive polishing slurry according to claim 1, wherein: the sodium gluconate wine also comprises sodium gluconate, wherein the mass ratio of the sodium gluconate is 1.5-2.5%.
4. The abrasive polishing slurry according to claim 2, wherein: the organic acid comprises one or more of citric acid, acetic acid, oxalic acid, benzoic acid, malic acid, ascorbic acid, and tartaric acid.
5. The abrasive polishing slurry according to claim 1, wherein: the heavy metal trapping agent is xanthate, dithiocarbamate derivatives or gel thereof.
6. The abrasive polishing slurry according to claim 1, wherein: the fineness of the slurry is more than 2500 meshes.
7. The abrasive polishing slurry according to claim 1, wherein: the mixture of Tween 0.05% and polyethylene glycol 0.2% is mixed with water to disperse and slightly dissolve silicon dioxide to form slurry.
8. The abrasive polishing slurry according to claim 1, wherein: firstly, preparing silica micro powder which is dispersed and slightly dissolved in water to prepare slurry with the mass ratio of 20 percent of silica; then preparing silicon dioxide slurry with the mass of 2.2 +/-0.2%.
9. A method for preparing a mirror panel is characterized by comprising the following steps: a polishing machine for mirror polishing a stainless steel panel by using the polishing slurry according to any one of claims 1 to 8.
10. The method of manufacturing a mirror plate according to claim 9, wherein: the grinding and polishing slurry is fed from the center of the grinding head of the grinding and polishing machine.
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CN202010263410.0A CN111534232A (en) | 2020-04-07 | 2020-04-07 | Grinding and polishing slurry and mirror panel preparation method |
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CN202010263410.0A CN111534232A (en) | 2020-04-07 | 2020-04-07 | Grinding and polishing slurry and mirror panel preparation method |
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN114350317A (en) * | 2021-12-28 | 2022-04-15 | 广东红日星实业有限公司 | Grinding fluid and preparation method and application thereof |
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CN1865386A (en) * | 2005-05-17 | 2006-11-22 | 安集微电子(上海)有限公司 | Buffing slurry |
CN101271869A (en) * | 2007-03-22 | 2008-09-24 | 株式会社半导体能源研究所 | Method for manufacturing light-emitting device |
CN103422092A (en) * | 2013-07-19 | 2013-12-04 | 吴江龙硕金属制品有限公司 | Polishing solution and polishing method thereof |
CN104471016A (en) * | 2012-07-17 | 2015-03-25 | 福吉米株式会社 | Composition for polishing alloy material and method for producing alloy material using same |
CN109943237A (en) * | 2019-04-16 | 2019-06-28 | 江苏艾佳达新材料有限公司 | A kind of polishing fluid |
-
2020
- 2020-04-07 CN CN202010263410.0A patent/CN111534232A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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CN1865386A (en) * | 2005-05-17 | 2006-11-22 | 安集微电子(上海)有限公司 | Buffing slurry |
CN101271869A (en) * | 2007-03-22 | 2008-09-24 | 株式会社半导体能源研究所 | Method for manufacturing light-emitting device |
CN104471016A (en) * | 2012-07-17 | 2015-03-25 | 福吉米株式会社 | Composition for polishing alloy material and method for producing alloy material using same |
CN103422092A (en) * | 2013-07-19 | 2013-12-04 | 吴江龙硕金属制品有限公司 | Polishing solution and polishing method thereof |
CN109943237A (en) * | 2019-04-16 | 2019-06-28 | 江苏艾佳达新材料有限公司 | A kind of polishing fluid |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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CN114350317A (en) * | 2021-12-28 | 2022-04-15 | 广东红日星实业有限公司 | Grinding fluid and preparation method and application thereof |
CN114350317B (en) * | 2021-12-28 | 2023-08-15 | 广东红日星实业有限公司 | Grinding fluid and preparation method and application thereof |
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