CN111518472A - Antistatic agent, antistatic release film and preparation method thereof - Google Patents
Antistatic agent, antistatic release film and preparation method thereof Download PDFInfo
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- CN111518472A CN111518472A CN202010312748.0A CN202010312748A CN111518472A CN 111518472 A CN111518472 A CN 111518472A CN 202010312748 A CN202010312748 A CN 202010312748A CN 111518472 A CN111518472 A CN 111518472A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/04—Polysiloxanes
- C09D183/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/0427—Coating with only one layer of a composition containing a polymer binder
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/044—Forming conductive coatings; Forming coatings having anti-static properties
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/20—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes for coatings strippable as coherent films, e.g. temporary coatings strippable as coherent films
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/24—Electrically-conducting paints
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2367/00—Characterised by the use of polyesters obtained by reactions forming a carboxylic ester link in the main chain; Derivatives of such polymers
- C08J2367/02—Polyesters derived from dicarboxylic acids and dihydroxy compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2483/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
- C08J2483/04—Polysiloxanes
- C08J2483/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/04—Antistatic
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
Abstract
The invention relates to the technical field of thin film material preparation, in particular to an antistatic agent, an antistatic release film and a preparation method thereof. The antistatic release film comprises a base film layer and a functional layer, wherein the functional layer is prepared from an antistatic agent. The antistatic agent comprises the following components in parts by weight: 0.05-0.5 part of conductive monomer, 20-40 parts of light-cured organic siloxane resin, 60-80 parts of light-cured organic silicon release agent and 0.05-0.5 part of photoinitiator. The antistatic release film has stable characteristics, adopts a photocuring curing mode, is cured thoroughly to form a polymer film, and has stable chemical and physical properties, stable stripping force and antistatic capacity, good adhesive force and less silicon transfer; the invention has simple process, high production efficiency, low cost and less waste in production, and is finished by one-time operation.
Description
Technical Field
The invention relates to the technical field of thin film material preparation, in particular to an antistatic agent, an antistatic release film and a preparation method thereof.
Background
In the release material in the current market, due to mutual friction, stripping, extrusion and the like between the material and a machine guide roller and between the material and the material, charges with different properties are accumulated on the surface of the material, and when the charges are accumulated to a certain degree, a discharge phenomenon can be generated. The discharge of static electricity can cause great influence on production, such as dust adsorption of materials, breakdown of material coatings, electric shock of human bodies, fire hazard and the like.
Polyolefins represented by Polyethylene (PE) and polypropylene (PP) are the most widely used general-purpose plastics, and have the advantages of low price, water resistance, good chemical stability, and easy molding and processing. However, the polyolefin has strong electrical insulation and the volume resistivity is 1016-1020 omega cm. At present, the addition of antistatic agents is the most common practice for eliminating polyolefin static electricity.
By antistatic agent is meant an agent applied to the surface of the material or incorporated within the material to reduce the build up of static electricity. They are classified into an additive type antistatic agent and a kneading type antistatic agent according to the use method. The main external antistatic agent is surfactant. Before use, the polymer is first prepared into 0.5-2.0% concentration solution with proper solvent and then coated, sprayed, soaked and other steps to adhere to the surface of polymer product. The kneading type antistatic agent is added to a resin during the processing of a polymer, and exhibits good antistatic properties after molding. Meanwhile, a small part of antistatic release film with conductive surface is available, but the antistatic release film has the problems of complex manufacturing process, high cost, low production efficiency, poor antistatic effect of the product, unstable release effect, easy transfer of silicone oil, poor appearance and the like.
In addition, some release films are formed by coating in a heat curing mode, the high curing temperature can cause the deformation of the film such as stretching and wrinkling due to the high temperature, and the film becomes hard and brittle due to the high temperature, so that the texture of the film is seriously influenced. If the curing temperature is lowered, the curing is not complete, which may affect the quality of the product.
Disclosure of Invention
The invention aims to provide an antistatic agent, an antistatic release film and a preparation method thereof, the antistatic release film is completely cured, has stable chemical and physical properties, stable stripping force and antistatic capacity, good adhesive force and less silicon transfer, and can well avoid the discharge phenomenon in the use process of the release film.
In order to achieve the above object, the present invention provides the following technical solutions:
the invention provides an antistatic agent, which comprises the following components in parts by weight: 0.05-0.5 part of conductive monomer, 20-40 parts of light-cured organic siloxane resin, 60-80 parts of light-cured organic silicon release agent and 0.05-0.5 part of photoinitiator.
Preferably, the conductive monomer is vinylmethyloxazolidinone.
Preferably, the photocurable organosiloxane resin is TEGO RC711 or TEGO RC 722.
Preferably, the photo-curable silicone release agent is TEGO RC902 or TEGO RC 922.
Preferably, the PHOTOINITIATOR is TEGO PHOTOITIATOR A18.
The invention also provides an antistatic release film, which comprises a base film layer and a functional layer, wherein the functional layer is prepared from the antistatic agent.
Preferably, the base film layer is any one of a PET film, a PP film and a PE film.
The invention also provides a preparation method of the antistatic release film, which comprises the following steps:
mixing a conductive monomer, a light-cured organic siloxane resin, a light-cured organic silicon release agent and a photoinitiator according to a weight ratio to obtain a mixture, and arranging the mixture on the surface of a base film layer;
and carrying out photocuring treatment on the set base film layer to obtain the antistatic release film.
Preferably, the thickness of the mixture arranged on the surface of the base film layer is 0.4-0.6 μm.
Preferably, the light curing treatment is ultraviolet light curing, the irradiation intensity of the ultraviolet light is 80-120W/cm, and the irradiation dose is 100-400J/cm2The irradiation time is 3 to 20 seconds.
The invention has the beneficial effects that: the antistatic release film has stable characteristics, adopts a photocuring curing mode, is cured thoroughly to form a polymer film, and has stable chemical and physical properties, stable stripping force and antistatic capacity, good adhesive force and less silicon transfer; the antistatic release film disclosed by the invention is cured by ultraviolet light, cannot be subjected to deformation such as pulling-up and wrinkles due to overhigh temperature, and cannot be hardened and embrittled to influence texture; the invention has simple process, high production efficiency, low cost and less waste in production, and is finished by one-time operation.
Detailed Description
The invention provides an antistatic agent, which comprises the following components in parts by weight: 0.05-0.5 part of conductive monomer, 20-40 parts of light-cured organic siloxane resin, 60-80 parts of light-cured organic silicon release agent and 0.05-0.5 part of photoinitiator.
The antistatic agent provided by the invention comprises 0.05-0.5 part of conductive monomer, preferably 0.1-0.4 part, and more preferably 0.2-0.3 part.
In the present invention, the conductive monomer is preferably vinylmethyloxazolidinone.
In the present invention, the vinylmethyloxazolidinones are available from BASF corporation and have the chemical formula:
the conductive monomer is also called as conductive micromolecule, the conductivity is in the range of semiconductors and conductors through means of doping and the like, usually, the main chain of the conductive monomer contains alternate single bonds and double bonds, so that a large conjugated system is formed, and the possibility of conductivity is generated by the flow of electrons. The conductive monomer has the characteristics of doping and de-doping, higher room-temperature conductivity, larger specific surface area, light specific gravity and the like, has the characteristic of static resistance, and has various structures, stability in air and excellent physical and chemical properties.
The antistatic agent provided by the invention comprises 20-40 parts of light-cured organic siloxane resin, preferably 25-35 parts of light-cured organic siloxane resin, and more preferably 28-32 parts of light-cured organic siloxane resin.
In the present invention, the photocurable organosiloxane resin is preferably TEGO RC711 or TEGO RC 722.
In the present invention, the photocurable organosiloxane resin is available fromEvonik, having the chemical formula:
the antistatic agent provided by the invention comprises 60-80 parts of a photo-curing organic silicon release agent, preferably 65-75 parts, and further preferably 68-70 parts.
In the present invention, the photo-curable silicone release agent is preferably TEGO RC902 or TEGO RC 922.
In the invention, the light-cured organic silicon release agent is modified dimeticone resin which is purchased from Evonik company and has a chemical structural formula as follows:
n and m are integers more than 0 and less than 3.
The photocuring organic silicon parting agent contains acrylic groups and C ═ C groups, has good adhesion, and the groups can be continuous or alternate and can be arranged at any position of the resin.
The antistatic agent provided by the invention comprises 0.05-0.5 part of photoinitiator, preferably 0.1-0.4 part, and more preferably 0.2-0.3 part.
In the present invention, the PHOTOINITIATOR is preferably TEGO PHOTOITIATOR A18.
The invention also provides an antistatic release film, which comprises a base film layer and a functional layer, wherein the functional layer is prepared from the antistatic agent.
In the present invention, the base film layer is preferably any one of a PET film, a PP film, and a PE film.
The invention also provides a preparation method of the antistatic release film, which comprises the following steps:
mixing a conductive monomer, a light-cured organic siloxane resin, a light-cured organic silicon release agent and a photoinitiator according to a weight ratio to obtain a mixture, and arranging the mixture on the surface of a base film layer;
and carrying out photocuring treatment on the set base film layer to obtain the antistatic release film.
In the invention, the thickness of the mixture arranged on the surface of the base film layer is preferably 0.4-0.6 μm, and more preferably 0.45-0.5 μm.
In the invention, the light curing treatment is preferably ultraviolet light curing, and the irradiation intensity of the ultraviolet light is preferably 80-120W/cm, and more preferably 90-110W/cm; the irradiation dose is preferably 100-400J/cm2More preferably 200 to 300J/cm2(ii) a The irradiation time is preferably 3 to 20 seconds, and more preferably 8 to 15 seconds.
The photoinitiator receives light energy under illumination, changes from a ground state into an excited state and then decomposes into free radicals, the free radicals are combined with monomer double bonds and chain growth is carried out on the basis of the combination, so that carbon-carbon double bonds are polymerized, and the transfer and termination of the free radicals on a growing chain are accompanied. The photo-initiated free radical polymerization reaction comprises the processes of initiation, chain growth, chain transfer and chain termination, and finally molecules form stable macromolecular compounds through termination modes such as coupling, disproportionation and the like.
The following examples are provided to illustrate the antistatic agent and the antistatic release film and the preparation method thereof in detail, but they should not be construed as limiting the scope of the present invention.
Example 1
Taking 100 g of vinyl methyl oxazolidinone, 100 g of light-cured organic siloxane resin TEGO RC711, 800 g of light-cured organic siloxane parting agent TEGO RC902 and 20 g of light initiator TEGO PHOTOITIATOR A18; mixing the raw materials in sequence and stirring for 30min to obtain a mixture; arranging the mixture on the surface of a PET film, wherein the coating thickness is 0.5 mu m; then ultraviolet light curing is carried out, the irradiation intensity of the ultraviolet light is 120W/cm, and the irradiation dose is 300J/cm2And the irradiation time is 3s, thus obtaining the antistatic release film sample 1.
Example 2
Taking 100 g of vinyl methyl oxazolidinone, 100 g of light-cured organic siloxane resin TEGO RC722, 800 g of light-cured organic siloxane parting agent TEGO RC902 and 20 g of light initiator TEGO PHOTOITIATOR A18; mixing the raw materials in sequence and stirring for 30min to obtain a mixture; the mixed material is arranged on the surface of the PET film,the coating thickness is 0.5 mu m; then ultraviolet light curing is carried out, the irradiation intensity of the ultraviolet light is 120W/cm, and the irradiation dose is 300J/cm2And the irradiation time is 3s, and then the antistatic release film sample 2 is obtained.
Example 3
Taking 100 g of vinyl methyl oxazolidinone, 100 g of light-cured organic siloxane resin TEGO RC711, 800 g of light-cured organic siloxane parting agent TEGO RC922, and 20 g of light initiator TEGO PHOTOITIATOR A18; mixing the raw materials in sequence and stirring for 30min to obtain a mixture; arranging the mixture on the surface of a PET film, wherein the coating thickness is 0.5 mu m; then ultraviolet light curing is carried out, the irradiation intensity of the ultraviolet light is 120W/cm, and the irradiation dose is 300J/cm2And the irradiation time is 3s, and then the antistatic release film sample 3 is obtained.
Example 4
Taking 100 g of vinyl methyl oxazolidinone, 100 g of light-cured organic siloxane resin TEGO RC722, 800 g of light-cured organic siloxane parting agent TEGO RC922, and 20 g of light initiator TEGO PHOTOITIATOR A18; mixing the raw materials in sequence and stirring for 30min to obtain a mixture; arranging the mixture on the surface of a PET film, wherein the coating thickness is 0.5 mu m; then ultraviolet light curing is carried out, the irradiation intensity of the ultraviolet light is 120W/cm, and the irradiation dose is 300J/cm2And the irradiation time is 3s, and then the antistatic release film sample 4 is obtained.
Example 5
Taking 100 g of light-cured organic siloxane resin TEGO RC711, 800 g of light-cured organic silicon parting agent TEGORC902 and 20 g of PHOTOINITIATOR TEGO PHOTOINITIATOR A18; mixing the raw materials in sequence and stirring for 30min to obtain a mixture; arranging the mixture on the surface of a PET film, wherein the coating thickness is 0.5 mu m; then ultraviolet light curing is carried out, the irradiation intensity of the ultraviolet light is 120W/cm, and the irradiation dose is 300J/cm2And the irradiation time is 3s, and then the antistatic release film sample 5 is obtained.
Experimental example 1
Antistatic Release film samples 1 to 5 obtained in examples 1 to 5 were used for antistatic test
The detection device comprises: surface resistance tester
Temperature: 22 +/-5 deg.C
Humidity: 30 to 80 percent
The method comprises the following steps: and (5) attaching the tester to the surface of the film to be tested, and reading data.
By adopting the test method, one group of data is measured every 24 hours, each group of data is measured for 5 times, and an average value is taken.
Experimental example 2
Peeling force test was performed on the antistatic release film samples 1 to 5 obtained in examples 1 to 5
Test conditions JIS Z02378 Standard (Japanese Industrial Standard, test method for pressure-sensitive adhesive tape and film)
Temperature: 22 +/-5 deg.C
Humidity: 30 to 80 percent
Specification: 25mm × 300mm
The method comprises the following steps: a25 mm wide standard adhesive tape (TESA7475-v02) is pressed in the middle of the film to be tested, the sample is fixed on a test steel plate, and then a stripping force test is carried out, wherein the stripping force is 300mm/min at an angle of 180 degrees by an instrument.
By adopting the test method, one group of data is measured every 24 hours, each group of data is measured for 5 times, and an average value is taken.
Table 1 peel force and surface resistance value of antistatic release film sample 1
| Time (sky) | 1 | 7 | 14 | 28 | 72 | 144 |
| Peel force (g/inch) | 6.4 | 6.5 | 6.8 | 6.5 | 6.9 | 7.1 |
| Surface resistance value (omega) | 109 | 109 | 109 | 109 | 109 | 109 |
The test data in table 1 show that the peeling force and the antistatic force of the antistatic release film sample 1 are stable, do not fluctuate obviously with the change of time, and are superior to the antistatic release film in the current market.
Table 2 release force and surface resistance value of antistatic release film
Through comparison in table 2, the performance of the antistatic release film of the invention is not obviously changed due to the addition of the antistatic agent, the release force is very stable, and the antistatic effect is very good.
The embodiment of the invention provides the antistatic agent, the antistatic release film and the preparation method thereof, the antistatic release film has stable characteristics, adopts a photocuring curing mode, is cured thoroughly to form a polymer film, and has stable chemical and physical properties, stable stripping force and antistatic capacity, good adhesive force and less silicon transfer; the antistatic release film disclosed by the invention is cured by ultraviolet light, cannot be subjected to deformation such as pulling-up and wrinkles due to overhigh temperature, and cannot be hardened and embrittled to influence texture.
The foregoing is only a preferred embodiment of the present invention, and it should be noted that, for those skilled in the art, various modifications and decorations can be made without departing from the principle of the present invention, and these modifications and decorations should also be regarded as the protection scope of the present invention.
Claims (10)
1. The antistatic agent is characterized by comprising the following components in parts by weight: 0.05-0.5 part of conductive monomer, 20-40 parts of light-cured organic siloxane resin, 60-80 parts of light-cured organic silicon release agent and 0.05-0.5 part of photoinitiator.
2. The antistatic agent of claim 1 wherein the conductive monomer is vinylmethyloxazolidinone.
3. Antistatic agent according to claim 1 or 2, characterized in that the photocurable organosiloxane resin is TEGO RC711 or TEGO RC 722.
4. The antistatic agent of claim 1 wherein the photocurable silicone release agent is TEGORC902 or TEGO RC 922.
5. Antistatic agent according to claim 1 or 4, characterized in that the photoinitiator is TEGOPHOTOOINITIATORA 18.
6. An antistatic release film characterized by comprising a base film layer and a functional layer, the functional layer being obtained from the antistatic agent according to claim 1.
7. The antistatic release film according to claim 6, wherein the base film layer is any one of a PET film, a PP film and a PE film.
8. The method for preparing the antistatic release film according to claim 6 or 7, characterized by comprising the steps of:
mixing a conductive monomer, a light-cured organic siloxane resin, a light-cured organic silicon release agent and a photoinitiator according to a weight ratio to obtain a mixture, and arranging the mixture on the surface of a base film layer;
and carrying out photocuring treatment on the set base film layer to obtain the antistatic release film.
9. The preparation method according to claim 8, wherein the thickness of the mixture arranged on the surface of the base film layer is 0.4-0.6 μm.
10. The method according to claim 8, wherein the photo-curing treatment is UV-curing, and the UV-curing is performed at an irradiation intensity of 80 to 120W/cm and an irradiation dose of 100 to 400J/cm2The irradiation time is 3 to 20 seconds.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113201295A (en) * | 2021-03-17 | 2021-08-03 | 佛山华韩卫生材料有限公司 | Release film with high residual adhesion rate and preparation method thereof |
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|---|---|---|---|---|
| US6509077B1 (en) * | 1995-11-01 | 2003-01-21 | Moore Business Forms, Inc. | Release coating for linerless labels, method of making a release coating and method of applying a release coating |
| US20040019126A1 (en) * | 2002-07-19 | 2004-01-29 | Mike Brand | Use of antioxidants in radiation-curable coating compositions for producing abhesive coatings |
| CN101024753A (en) * | 2006-02-21 | 2007-08-29 | 戈尔德施米特有限公司 | Process for producing siloxane-containing release coatings |
| CN102794960A (en) * | 2012-07-10 | 2012-11-28 | 苏州市星辰科技有限公司 | Anti-static release liner as well as preparation method and equipment thereof |
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2020
- 2020-04-20 CN CN202010312748.0A patent/CN111518472A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6509077B1 (en) * | 1995-11-01 | 2003-01-21 | Moore Business Forms, Inc. | Release coating for linerless labels, method of making a release coating and method of applying a release coating |
| US20040019126A1 (en) * | 2002-07-19 | 2004-01-29 | Mike Brand | Use of antioxidants in radiation-curable coating compositions for producing abhesive coatings |
| CN101024753A (en) * | 2006-02-21 | 2007-08-29 | 戈尔德施米特有限公司 | Process for producing siloxane-containing release coatings |
| CN102794960A (en) * | 2012-07-10 | 2012-11-28 | 苏州市星辰科技有限公司 | Anti-static release liner as well as preparation method and equipment thereof |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113201295A (en) * | 2021-03-17 | 2021-08-03 | 佛山华韩卫生材料有限公司 | Release film with high residual adhesion rate and preparation method thereof |
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Application publication date: 20200811 |