CN111474608A - Far infrared optical antireflection hard film for mould pressing aspheric lens - Google Patents
Far infrared optical antireflection hard film for mould pressing aspheric lens Download PDFInfo
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- CN111474608A CN111474608A CN202010339975.2A CN202010339975A CN111474608A CN 111474608 A CN111474608 A CN 111474608A CN 202010339975 A CN202010339975 A CN 202010339975A CN 111474608 A CN111474608 A CN 111474608A
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- infrared optical
- film
- far infrared
- hard film
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Links
- 230000003287 optical effect Effects 0.000 title claims abstract description 34
- 238000003825 pressing Methods 0.000 title claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 24
- 238000007723 die pressing method Methods 0.000 claims abstract description 17
- 239000011248 coating agent Substances 0.000 claims abstract description 13
- 238000000576 coating method Methods 0.000 claims abstract description 13
- 239000005083 Zinc sulfide Substances 0.000 claims abstract description 12
- 239000007888 film coating Substances 0.000 claims abstract description 12
- 238000009501 film coating Methods 0.000 claims abstract description 12
- 229910052732 germanium Inorganic materials 0.000 claims abstract description 12
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims abstract description 12
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims abstract description 12
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 12
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 12
- XASAPYQVQBKMIN-UHFFFAOYSA-K ytterbium(iii) fluoride Chemical compound F[Yb](F)F XASAPYQVQBKMIN-UHFFFAOYSA-K 0.000 claims abstract description 12
- 229910052984 zinc sulfide Inorganic materials 0.000 claims abstract description 12
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 claims abstract description 12
- 239000000463 material Substances 0.000 claims abstract description 8
- 238000000034 method Methods 0.000 claims abstract description 7
- 230000004888 barrier function Effects 0.000 claims abstract description 6
- 150000002500 ions Chemical class 0.000 claims abstract description 6
- 238000004519 manufacturing process Methods 0.000 claims abstract description 6
- 238000002360 preparation method Methods 0.000 claims abstract description 6
- 238000001771 vacuum deposition Methods 0.000 claims abstract description 6
- 238000012360 testing method Methods 0.000 abstract description 5
- 238000002834 transmittance Methods 0.000 abstract description 4
- 239000000853 adhesive Substances 0.000 abstract description 2
- 230000001070 adhesive effect Effects 0.000 abstract description 2
- 239000005387 chalcogenide glass Substances 0.000 description 3
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009529 body temperature measurement Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000004297 night vision Effects 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
- G02B1/115—Multilayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0623—Sulfides, selenides or tellurides
- C23C14/0629—Sulfides, selenides or tellurides of zinc, cadmium or mercury
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0694—Halides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Inorganic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Abstract
The invention relates to a far infrared optical antireflection hard film for a die pressing aspheric lens, which comprises the following components in parts by weight: 1-3 parts of yttrium oxide; 50-60 parts of ytterbium fluoride; 30-40 parts of zinc sulfide; 0.3-2 parts of silicon dioxide; 3-6 parts of germanium. The production process is characterized by comprising the following steps: s1, coating the film by an infrared optical coating machine by adopting a vacuum evaporation method; s2, completing film preparation through a layered film coating method and a film coating mode of alternately using an electron gun and vapor barrier, and simultaneously using an ion source for assistance; and S3, combining the materials of the layers to obtain the far infrared optical antireflection hard film for the die pressing aspheric lens. The invention has high transmittance (8-14um), excellent adhesive force and can bear high-strength friction test.
Description
Technical Field
The invention relates to the technical field of lenses, in particular to a far infrared optical antireflection hard film for a mould pressing aspheric lens.
Background
The infrared lens is mainly applied to monitoring lenses, temperature measurement products, night vision products and other products, is mainly used in a far infrared wavelength range, and is coated on the surface of the lens to obtain better performance. The main processing methods of the infrared lens comprise cold processing and die pressing, and the die pressing processing of the lens with smaller size by using chalcogenide glass has greater advantages. And because the optical surface which needs to be contacted with air has certain required friction resistance and moisture resistance according to the requirements of the use environment of part of infrared products, the outer layer of the common reflecting film is made of an infrared coating material, the material is soft, and the performance cannot be met, so that a hard film needs to be plated on the surface of the optical reflecting film to meet the performance requirement.
But chalcogenide glass has the characteristics of small hardness, low melting point and easy influence by environmental conditions, so that the chalcogenide glass has greater difficulty in realizing hard films and is easy to demould. And the conventional far infrared antireflection film cannot bear multiple friction resistance tests, and the general protective film can greatly reduce the optical transmittance.
Disclosure of Invention
The invention aims to provide a far infrared optical antireflection hard film for a die-pressing aspheric lens.
The invention realizes the purpose through the following technical scheme: a far infrared optical antireflection hard film for a die pressing aspheric lens comprises the following components in parts by weight:
1-3 parts of yttrium oxide;
50-60 parts of ytterbium fluoride;
30-40 parts of zinc sulfide;
0.3-2 parts of silicon dioxide;
3-6 parts of germanium.
Further, the component of the weight portion is 1 portion of yttrium oxide; 50 parts of ytterbium fluoride; 40 parts of zinc sulfide; 2 parts of silicon dioxide; and 6 parts of germanium.
Further, the component of the weight portion is 3 portions of yttrium oxide; 60 parts of ytterbium fluoride; 30 parts of zinc sulfide; 0.3 part of silicon dioxide; and 3 parts of germanium.
Further, 2 parts of yttrium oxide; 55 parts of ytterbium fluoride; 35 parts of zinc sulfide; 1 part of silicon dioxide; and 5 parts of germanium.
A production process of a far infrared optical antireflection hard film for a die-pressed aspheric lens comprises the following steps:
s1, coating the film by an infrared optical coating machine by adopting a vacuum evaporation method;
s2, completing film preparation through a layered film coating method and a film coating mode of alternately using an electron gun and vapor barrier, and simultaneously using an ion source for assistance;
and S3, combining the materials of the layers to obtain the far infrared optical antireflection hard film for the die pressing aspheric lens.
Compared with the prior art, the far infrared optical antireflection hard film for the die pressing aspheric lens has the beneficial effects that: has high transmittance and excellent adhesive force and can bear high-strength friction test.
Detailed Description
The invention is further described with reference to specific examples.
Example 1
A far infrared optical antireflection hard film for a die pressing aspheric lens comprises the following components in parts by weight:
1 part of yttrium oxide;
50 parts of ytterbium fluoride;
40 parts of zinc sulfide;
2 parts of silicon dioxide;
and 6 parts of germanium.
A production process of a far infrared optical antireflection hard film for a die-pressed aspheric lens comprises the following steps: s1, coating the film by an infrared optical coating machine by adopting a vacuum evaporation method; s2, completing film preparation through a layered film coating method and a film coating mode of alternately using an electron gun and vapor barrier, and simultaneously using an ion source for assistance; and S3, combining the materials of the layers to obtain the far infrared optical antireflection hard film for the die pressing aspheric lens.
Example 2
A far infrared optical antireflection hard film for a die pressing aspheric lens comprises the following components in parts by weight:
3 parts of yttrium oxide;
60 parts of ytterbium fluoride;
30 parts of zinc sulfide;
0.3 part of silicon dioxide;
and 3 parts of germanium.
A production process of a far infrared optical antireflection hard film for a die-pressed aspheric lens comprises the following steps: s1, coating the film by an infrared optical coating machine by adopting a vacuum evaporation method; s2, completing film preparation through a layered film coating method and a film coating mode of alternately using an electron gun and vapor barrier, and simultaneously using an ion source for assistance; and S3, combining the materials of the layers to obtain the far infrared optical antireflection hard film for the die pressing aspheric lens.
Example 3
A far infrared optical antireflection hard film for a die pressing aspheric lens comprises the following components in parts by weight:
2 parts of yttrium oxide;
55 parts of ytterbium fluoride;
35 parts of zinc sulfide;
1 part of silicon dioxide;
and 5 parts of germanium.
A production process of a far infrared optical antireflection hard film for a die-pressed aspheric lens comprises the following steps: s1, coating the film by an infrared optical coating machine by adopting a vacuum evaporation method; s2, completing film preparation through a layered film coating method and a film coating mode of alternately using an electron gun and vapor barrier, and simultaneously using an ion source for assistance; and S3, combining the materials of the layers to obtain the far infrared optical antireflection hard film for the die pressing aspheric lens.
Examples 1-3 of the invention have the following test properties:
the test results show that the high-transmittance high-adhesion-strength.
The foregoing examples are provided to facilitate an understanding of the principles of the invention and their core concepts, including the best mode, and also to enable any person skilled in the art to practice the invention, including making and using any devices or systems and performing any incorporated methods. It should be noted that, for those skilled in the art, it is possible to make various improvements and modifications to the present invention without departing from the principle of the present invention, and those improvements and modifications also fall within the scope of the claims of the present invention. The scope of the invention is defined by the claims and may include other embodiments that occur to those skilled in the art. Such other embodiments are intended to be within the scope of the claims if they have structural elements that approximate the literal language of the claims, or if they include equivalent structural elements with insubstantial differences from the literal languages of the claims.
Claims (5)
1. A far infrared optical antireflection hard film for a die pressing aspheric lens is characterized by comprising the following components in parts by weight:
1-3 parts of yttrium oxide;
50-60 parts of ytterbium fluoride;
30-40 parts of zinc sulfide;
0.3-2 parts of silicon dioxide;
3-6 parts of germanium.
2. The far infrared optical antireflection hard film for a mold pressing aspherical lens as defined in claim 1, wherein: the component of the weight portion is 1 portion of yttrium oxide; 50 parts of ytterbium fluoride; 40 parts of zinc sulfide; 2 parts of silicon dioxide; and 6 parts of germanium.
3. The far infrared optical antireflection hard film for a mold pressing aspherical lens as defined in claim 1, wherein: the component of the weight portion is 3 portions of yttrium oxide; 60 parts of ytterbium fluoride; 30 parts of zinc sulfide; 0.3 part of silicon dioxide; and 3 parts of germanium.
4. The far infrared optical antireflection hard film for a mold pressing aspherical lens as defined in claim 1, wherein: 2 parts of yttrium oxide; 55 parts of ytterbium fluoride; 35 parts of zinc sulfide; 1 part of silicon dioxide; and 5 parts of germanium.
5. A production process of a far infrared optical antireflection hard film for a die-pressing aspheric lens is characterized by comprising the following steps of:
s1, coating the film by an infrared optical coating machine by adopting a vacuum evaporation method;
s2, completing film preparation through a layered film coating method and a film coating mode of alternately using an electron gun and vapor barrier, and simultaneously using an ion source for assistance;
and S3, combining the materials of the layers to obtain the far infrared optical antireflection hard film for the die pressing aspheric lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010339975.2A CN111474608A (en) | 2020-04-26 | 2020-04-26 | Far infrared optical antireflection hard film for mould pressing aspheric lens |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202010339975.2A CN111474608A (en) | 2020-04-26 | 2020-04-26 | Far infrared optical antireflection hard film for mould pressing aspheric lens |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN111474608A true CN111474608A (en) | 2020-07-31 |
Family
ID=71755885
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202010339975.2A Pending CN111474608A (en) | 2020-04-26 | 2020-04-26 | Far infrared optical antireflection hard film for mould pressing aspheric lens |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN111474608A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112592165A (en) * | 2020-12-14 | 2021-04-02 | 苏州晶生新材料有限公司 | Novel optical coating material with antifogging property and preparation method thereof |
| CN114153011A (en) * | 2022-01-20 | 2022-03-08 | 光皓光学(江苏)有限公司 | Near ultraviolet and visible light broadband-reducing antireflection film for mould pressing aspheric lens |
| EP4119528A1 (en) * | 2021-07-15 | 2023-01-18 | Safran Electronics & Defense | Optical component resistant to rainfall erosion |
Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1661820A (en) * | 2004-02-26 | 2005-08-31 | 元砷光电科技股份有限公司 | Light emitting diode |
| CN103499852A (en) * | 2013-10-10 | 2014-01-08 | 中国科学院上海技术物理研究所 | Blue light filter film for visible light communication |
| CN204389718U (en) * | 2015-01-27 | 2015-06-10 | 孟繁有 | The superhard waterproof antireflective film of a kind of 420nm-700nm wave band |
| CN108766629A (en) * | 2018-05-29 | 2018-11-06 | 成都莫比斯科技有限公司 | A method of improving flexible transparent conductive film adherence |
| CN108802864A (en) * | 2018-06-07 | 2018-11-13 | 云南北方驰宏光电有限公司 | A kind of silicon base high-efficiency anti-reflection film being applicable in 3.7-4.8 mu m wavebands |
-
2020
- 2020-04-26 CN CN202010339975.2A patent/CN111474608A/en active Pending
Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1661820A (en) * | 2004-02-26 | 2005-08-31 | 元砷光电科技股份有限公司 | Light emitting diode |
| CN103499852A (en) * | 2013-10-10 | 2014-01-08 | 中国科学院上海技术物理研究所 | Blue light filter film for visible light communication |
| CN204389718U (en) * | 2015-01-27 | 2015-06-10 | 孟繁有 | The superhard waterproof antireflective film of a kind of 420nm-700nm wave band |
| CN108766629A (en) * | 2018-05-29 | 2018-11-06 | 成都莫比斯科技有限公司 | A method of improving flexible transparent conductive film adherence |
| CN108802864A (en) * | 2018-06-07 | 2018-11-13 | 云南北方驰宏光电有限公司 | A kind of silicon base high-efficiency anti-reflection film being applicable in 3.7-4.8 mu m wavebands |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112592165A (en) * | 2020-12-14 | 2021-04-02 | 苏州晶生新材料有限公司 | Novel optical coating material with antifogging property and preparation method thereof |
| EP4119528A1 (en) * | 2021-07-15 | 2023-01-18 | Safran Electronics & Defense | Optical component resistant to rainfall erosion |
| CN114153011A (en) * | 2022-01-20 | 2022-03-08 | 光皓光学(江苏)有限公司 | Near ultraviolet and visible light broadband-reducing antireflection film for mould pressing aspheric lens |
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Application publication date: 20200731 |