CN111470479A - Purification method of crude sulfur hexafluoride - Google Patents
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Abstract
The invention provides a purification method of crude sulfur hexafluoride, which comprises the following steps: cracking and removing impurities; washing with water to remove impurities; removing impurities by alkali washing; low-pressure adsorption; high-pressure adsorption; and (5) rectifying to remove impurities. According to the invention, the first-to-sixth-stage water washing tower is arranged, so that fluorine gas, low-sulfur fluoride and thionyl fluoride in the crude sulfur hexafluoride are effectively removed through multiple water washing, the purity of the sulfur hexafluoride is improved, meanwhile, hydrofluoric acid which is a byproduct in the water washing process is recovered, the generation of waste water is reduced, and the waste is changed into valuable; the invention effectively removes HF and CO in the sulfur hexafluoride through multiple alkali washing by arranging the first-to-sixth-stage alkali washing tower2、SO2Gas improves its purity, and the waste liquid that the caustic wash tower produced utilizes lime to handle back reuse through utilizing in the alkali lye collecting vat, avoids the production of waste liquid, and the reduction pollutes, practices thrift the cost.
Description
Technical Field
The invention relates to the technical field of chemical production, in particular to a method for purifying crude sulfur hexafluoride.
Background
Sulfur hexafluoride is colorless, odorless, nontoxic, noncorrosive, noncombustible, nonexplosive gas at normal temperature and pressure, has a molecular weight of 146.06, a density of 6.139 g/L, which is about 5 times that of air, is stable in chemical composition, is one of the known gaseous substances with the best chemical stability, has inertness similar to that of nitrogen, has excellent thermal stability, and does not decompose even at high temperatures above 500 ℃ in a pure state6The corona voltage of (a) is 2 times that of the gas.
The sulfur hexafluoride has excellent chemical properties such as electrical insulation and arc extinguishing property, and is widely used in the aspects of circuit breakers, combiners, transformers, large-container cables, lightning arresters, x-ray machines, ion accelerators, tracing analysis, nonferrous smelting and the like of electrical equipment. Sulfur hexafluoride may also be used as fluorine source for producing fluorine doped glass in optical fiber preparation, as dopant for isolating layer in making low loss high quality single mode fiber, and as additive gas for nitrogen excimer laser. High purity sulfur hexafluoride is also used as a plasma etchant in the semiconductor manufacturing industry.
At present, fluorine gas and sulfur are generally adopted for preparing sulfur hexafluoride, and crude sulfur hexafluoride gas generated by reaction is subjected to continuous purification to obtain a product meeting the requirements of industrial production. The chinese patent application publication No. CN103848402A discloses a preparation method of sulfur hexafluoride, which comprises the following steps: reacting fluorine gas with gaseous sulfur to generate crude sulfur hexafluoride gas, carrying out pyrolysis, washing, dewatering, deacidification and rectification on the crude sulfur hexafluoride gas to obtain sulfur hexafluoride products, detecting the products, carrying out relevant processing on the sulfur hexafluoride products which are not detected until qualified products are obtained, and recovering tail gas separated by rectification. The method adopts fluorine gas prepared by an electrolytic method and high-quality sulfur as raw materials to react, so that the generated crude sulfur hexafluoride gas has less impurities, the purification process is saved, and the energy consumption is reduced. The process has the following defects: a large amount of waste water is generated in the water washing and alkali washing processes, and how to treat the waste water is not known, so that the environment pollution is easily caused.
Disclosure of Invention
The invention aims to provide a preparation method of crude sulfur hexafluoride.
In order to achieve the purpose, the invention provides a method for purifying crude sulfur hexafluoride, which comprises the following steps: cracking and impurity removal: introducing the crude sulfur hexafluoride into a cracking tower for pyrolysis treatment, and introducing S in the crude sulfur hexafluoride2F10Decomposition of gas to SF6And SF4(ii) a Washing with water to remove impurities: introducing the mixed gas treated by the cracking impurity removal step into a water washing tower for washing to remove fluorine gas, low-sulfur fluoride and thionyl fluoride in the mixed gas to obtain first-stage purified sulfur hexafluoride gas, wherein the water washing tower comprises a first-stage water washing tower, a second-stage water washing tower, a third-stage water washing tower, a fourth-stage water washing tower, a fifth-stage water washing tower and a sixth-stage water washing tower which are sequentially connected, the mixed gas treated by the step S3 sequentially passes through the first-stage water washing tower, the second-stage water washing tower, the third-stage water washing tower, the fourth-stage water washing tower, the fifth-stage water washing tower and the sixth-stage water washing tower for washing, sampling analysis is carried out on the various stages of water washing towers every day, when the mass concentration of hydrofluoric acid in the first-stage water washing tower is larger than or equal to 50%, hydrofluoric acid in time is poured into an acid storage tank, then the hydrofluoric acid in the second-stage water washing tower is sequentially poured into the first-stage water washing tower, and the third-stage water, by analogy, clear water is injected into the final 1-stage, namely the six-stage water washing tower; alkali washing for removing impurities: introducing the primary purified sulfur hexafluoride gas obtained in the step of water washing impurity removal into an alkaline washing tower for alkaline washing to remove HF and CO in the primary purified sulfur hexafluoride gas2、SO2Gas to obtain second-stage purified sulfur hexafluoride gas; low-pressure adsorption: introducing the second-stage purified sulfur hexafluoride gas obtained in the step of alkali washing and impurity removal into a low-pressure adsorption tower for adsorption, and removing trace water and acidA third-stage purified sulfur hexafluoride gas is obtained; high-pressure adsorption: introducing the three-stage purified sulfur hexafluoride gas obtained in the low-pressure adsorption step into a high-pressure adsorption tower for adsorption, and adsorbing trace S in the sulfur hexafluoride gas2OF10、SO2F2、SOF2、SOF4Low sulfur oxyfluoride and trace amounts of HF and H2O, obtaining four-stage purified sulfur hexafluoride gas; and (3) rectification and impurity removal: and introducing the four-stage purified sulfur hexafluoride gas into a rectification system to obtain the high-purity sulfur hexafluoride.
The method comprises the following steps of firstly, sequentially purifying sulfur hexafluoride gas from a first-grade water scrubber, then, sequentially entering a second-grade alkaline scrubber, a third-grade alkaline scrubber, a fourth-grade alkaline scrubber, a fifth-grade alkaline scrubber and a sixth-grade alkaline scrubber, carrying out alkaline cleaning and impurity removal on the purified sulfur hexafluoride gas, wherein the first-grade purified sulfur hexafluoride gas enters the first-grade alkaline scrubber, then, sequentially enters the second-grade alkaline scrubber, the third-grade alkaline scrubber, the fourth-grade alkaline scrubber, the fifth-grade alkaline scrubber and the sixth-grade alkaline scrubber, potassium hydroxide solution is filled in each alkaline scrubber as an elution medium, sampling analysis is carried out on each alkaline scrubber every day, when the concentration of potassium hydroxide in the first-grade alkaline scrubber is smaller than or equal to 49 mg/L as a detection result, waste alkaline liquid in the first-grade alkaline scrubber is timely transferred to an alkaline collecting tank, the waste alkaline liquid is treated by low-cost quicklime for recycling, then, sequentially pouring alkali in the second-grade alkaline scrubber into the first-grade alkaline scrubber, pouring acid in the third-grade alkaline scrubber into the second-grade alkaline scrubber, and analogizing, and finally, namely injecting the potassium hydroxide solution with the concentration which is.
The further proposal is that a gas cabinet or a gas bag is arranged between the low-pressure adsorption tower and the high-pressure adsorption tower, and the gas pressurized in the gas cabinet or the gas bag enters the high-pressure adsorption tower.
Preferably, the pressure in the low-pressure adsorption tower is controlled within 20KPa, and the adsorbent of the low-pressure adsorption tower is activated carbon.
Preferably, the pressure of the high-pressure adsorption tower is controlled to be 1.4MPa to 1.8MPa, and the adsorbent of the high-pressure adsorption tower is activated carbon and molecular sieve.
The rectification system comprises a high-boiling rectification tower, a first-stage low-boiling rectification tower, a second-stage low-boiling rectification tower, a high-boiling recovery rectification tower and a low-boiling recovery rectification tower, wherein the high-boiling rectification tower is connected with the high-boiling recovery rectification tower, and the first-stage low-boiling rectification tower and the second-stage low-boiling rectification tower are both connected with the low-boiling recovery rectification tower.
The method comprises the following steps of pre-cooling four-stage purified sulfur hexafluoride gas from a high-pressure adsorption tower in a pre-cooler, then feeding the pre-cooled sulfur hexafluoride gas into a high-boiling rectifying tower, feeding high-boiling-point impurities containing sulfur hexafluoride discharged from a reboiler of the high-boiling rectifying tower into a high-boiling recovery rectifying tower to recover the sulfur hexafluoride therein, feeding the sulfur hexafluoride produced by a condenser of the high-boiling rectifying tower into a first-stage low-boiling rectifying tower and a second-stage low-boiling rectifying tower in sequence to carry out rectification and impurity removal, feeding low-boiling-point impurities discharged from the condenser of the first-stage low-boiling rectifying tower and the condenser of the second-stage low-boiling rectifying tower to contain a small amount of sulfur hexafluoride, and feeding the low-boiling-point impurities containing a small amount of sulfur hexafluoride into a.
The further proposal is that the tower pressure of the high-boiling rectifying tower is 0.9MPa to 1.6MPa, the condenser temperature of the high-boiling rectifying tower is-35 ℃ to-10 ℃, and the reboiler temperature of the high-boiling rectifying tower is-13 ℃ to 10 ℃;
preferably, the tower pressure of the high-boiling recovery rectifying tower is 0.6MPa to 1.3MPa, the condenser temperature of the high-boiling recovery rectifying tower is-32 ℃ to-25 ℃, and the reboiler temperature of the high-boiling recovery rectifying tower is-12 ℃ to 6 ℃.
The further proposal is that the tower pressure of the first-level low-boiling rectifying tower is 0.8MPa to 1.5MPa, the condenser temperature of the first-level low-boiling rectifying tower is-37 ℃ to-15 ℃, and the reboiler temperature of the first-level low-boiling rectifying tower is-18 ℃ to 15 ℃;
preferably, the tower pressure of the secondary low-boiling rectifying tower is 0.3MPa to 0.9MPa, the condenser temperature of the secondary low-boiling rectifying tower is-40 ℃ to-18 ℃, and the reboiler temperature of the secondary low-boiling rectifying tower is-22 ℃ to-20 ℃;
preferably, the tower pressure of the low-boiling recovery rectifying tower is 0.25MPa to 0.55MPa, the condenser temperature of the low-boiling recovery rectifying tower is-42 ℃ to-20 ℃, and the reboiler temperature of the low-boiling recovery rectifying tower is-19 ℃ to 12 ℃.
The invention has the beneficial effects that:
1. according to the invention, the first-to-sixth-stage water washing tower is arranged, so that fluorine gas, low-sulfur fluoride and thionyl fluoride in the crude sulfur hexafluoride are effectively removed through multiple water washing, the purity of the sulfur hexafluoride is improved, meanwhile, hydrofluoric acid which is a byproduct in the water washing process is recovered, the generation of waste water is reduced, and the waste is changed into valuable;
2. the invention effectively removes HF and CO in the sulfur hexafluoride through multiple alkali washing by arranging the first-to-sixth-stage alkali washing tower2、SO2Gas improves its purity, and the waste liquid that the caustic wash tower produced utilizes lime to handle back reuse through utilizing in the alkali lye collecting vat, avoids the production of waste liquid, and the reduction pollutes, practices thrift the cost.
Drawings
Fig. 1 is a process flow diagram of an embodiment of the process for preparing high purity sulfur hexafluoride in accordance with the present invention.
FIG. 2 is a schematic structural diagram of an embodiment of the on-line analysis system of the present invention.
FIG. 3 is a schematic structural view of an embodiment of the water scrubber of the present invention.
FIG. 4 is a schematic diagram of the structure of an embodiment of the caustic tower of the present invention.
FIG. 5 is a schematic diagram of the configuration of an embodiment of the adsorption system of the present invention.
FIG. 6 is a schematic diagram of a rectification system in accordance with an embodiment of the present invention.
The invention is further explained with reference to the drawings and the embodiments.
Detailed Description
The invention provides a preparation method of high-purity sulfur hexafluoride, which mainly comprises the preparation of crude sulfur hexafluoride and the impurity removal and purification process of the crude sulfur hexafluoride, the purity of the obtained high-purity sulfur hexafluoride can reach more than 99.9995 percent and is far higher than 99.999 percent of the national standard, and the impurity control items are added compared with the national standard: h2、C2F6、C3F8These impurities can affect the etching or cleaning of the wafer.
Referring to fig. 1, fig. 1 is a process flow diagram of an embodiment of a method for preparing high purity sulfur hexafluoride in accordance with the present invention, the method comprising the steps of:
s1, electrolytic preparation of fluorine: electrolyzing anhydrous hydrogen fluoride to prepare fluorine gas;
s2, fluorine-sulfur reaction: introducing the fluorine gas prepared in the step S1 into a reactor to react with sulfur vapor to prepare crude sulfur hexafluoride;
s3, cracking and removing impurities: introducing the crude sulfur hexafluoride into a cracking tower for pyrolysis treatment, and introducing S in the crude sulfur hexafluoride2F10Decomposition of gas to SF6And SF4；
S4, washing with water to remove impurities: introducing the mixed gas treated in the step S3 into a water washing tower for water washing, and removing fluorine gas, low-sulfur fluoride and thionyl fluoride in the mixed gas to obtain primary purified sulfur hexafluoride gas;
s5, alkali washing and impurity removal: introducing the primary purified sulfur hexafluoride gas obtained in the step S4 into an alkaline washing tower for alkaline washing to remove HF and CO in the primary purified sulfur hexafluoride gas2、SO2Gas to obtain second-stage purified sulfur hexafluoride gas;
s6, low-pressure adsorption: introducing the second-stage purified sulfur hexafluoride gas obtained in the step S5 into a low-pressure adsorption tower for adsorption, and removing trace moisture and acidic substances to obtain third-stage purified sulfur hexafluoride gas;
s7, high-pressure adsorption: introducing the three-stage purified sulfur hexafluoride gas obtained in the step S6 into a high-pressure adsorption tower for adsorption, and adsorbing trace S in the sulfur hexafluoride gas2OF10、SO2F2、SOF2、SOF4Low sulfur oxyfluoride and trace amounts of HF and H2O, obtaining four-stage purified sulfur hexafluoride gas;
s8, rectifying to remove impurities: and introducing the four-stage purified sulfur hexafluoride gas into a rectification system for rectification and impurity removal to obtain the high-purity sulfur hexafluoride.
In order to reduce the generation of impurities, the quality index of the anhydrous hydrogen fluoride as the raw material is strictly controlled in step S1, and the quality standard of the anhydrous hydrogen fluoride adopted in the present invention is shown in table 1.
| Serial number | Composition of | Content (mass fraction) |
| 1 | Hydrogen fluoride | ≥99.96％ |
| 2 | Moisture content | ≤0.005％ |
| 3 | Fluosilicic acid | ≤0.005％ |
| 4 | Sulfur dioxide | ≤0.003％ |
| 5 | Does not volatilize acid (H)2SO4) | ≤0.005％ |
| 6 | Oils, their preparation and their use | Is free of |
TABLE 1
Wherein the water content in the raw material anhydrous hydrogen fluoride is less than or equal to 0.005 percent, thereby avoiding polarization and oxygen and OF caused by electrolytic water2And impurities such as oxides and oxyfluorides. Other components of the starting anhydrous hydrogen fluoride, e.g. SO2The content is less than or equal to 0.003 percent, and the fluorination of by-products is reducedProduction of sulfuryl, thionyl fluoride, etc.
In addition, the inventors found that hexafluoroethane, which is an impurity difficult to remove, is easily generated in the process of preparing high-purity sulfur hexafluoride (the boiling point of hexafluoroethane is-78.2 ℃ close to the boiling point of sulfur hexafluoride is-63.9 ℃, the relative volatility is low, and the hexafluoroethane gas in sulfur hexafluoride is difficult to remove by the conventional rectification method), and further research revealed that, in the electrolysis process, when a carbon anode generating fluorine gas is exposed from an electrolyte, the content of hexafluoroethane, which is an impurity in fluorine gas, is significantly increased, and when the carbon anode is completely immersed in the electrolyte, the content of hexafluoroethane, which is an impurity in fluorine gas, is greatly reduced, and the analysis reason may be that the carbon anode is gradually aged along with the production running time, and under the condition of high current heating, fluorine gas generated by electrolysis reacts with the carbon anode to generate fluorocarbon compounds including hexafluoroethane, and therefore, in order to reduce the content of hexafluoroethane impurities in the electrolysis process, the carbon anode is completely soaked in the electrolyte in step S1, and the electrolyte used in the invention is molten KF (1.8-2.0) HF (the mass ratio of KF to HF is 1: 1.8-2). The carbon anode is completely soaked in CF in fluorine gas prepared in electrolyte4The content can be controlled below 0.01% for a long time, C2F6The content can be controlled below 0.001% for a long time, the carbon anode is not completely soaked in the electrolyte, and CF in the prepared fluorine gas can appear within 1-3 months4Content increased from 0.01% to 10%, C2F6The content increased from 0.001% to 1%.
Attention is also paid to the electrolytic fluorine production process of step S1: controlling the interelectrode voltage of the electrolytic cell to be between 7 and 9.3V, controlling the temperature of the electrolytic cell to be uniform and in a range of 85 to 103 ℃, and reducing the generation of byproducts due to high voltage and high temperature; the pressure of the cathode gas and the anode gas is controlled to be stable within the range of +/-800 Pa (based on standard atmospheric pressure), and the pressure difference is not more than 800Pa, so that the phenomenon that the flow speed of the gas is too high, the reaction contact time is influenced, and the reaction conversion rate is reduced is avoided; meanwhile, the pressure difference is prevented from being overlarge, and the dangerous accident that the fluorine gas is mixed into the hydrogen gas or the hydrogen gas is mixed into the fluorine gas to cause explosion is avoided.
In step S2, the quality index of sulfur is strictly controlled to reduce the generation of impurities, and the quality standard of sulfur used in the present invention is shown in table 2.
TABLE 2
Controlling the temperature of the reaction zone to be 210-230 ℃, wherein the reaction mechanism of the fluorine gas and the sulfur is as follows: s +3F2＝SF6The reaction is a violent combustion reaction, the reaction speed is high, a large amount of heat is released, and some side reactions possibly accompanied are as follows:
2S+2F2＝SF4
2S+5F2＝S2F10
2S+F2＝S2F2
S+F2＝SF2
in order to monitor the quality of the crude sulfur hexafluoride in real time, the embodiment further includes an online analysis step, in which the crude sulfur hexafluoride obtained in step S2 is analyzed online: referring to fig. 2, fig. 2 is a schematic structural diagram of an on-line analysis system embodiment of the present invention, a needle-shaped stop valve 5 is installed at the gas outlet end of the reactor 1 as a sampling port, and the crude sulfur hexafluoride gas from the sampling port contains air and CF4Introducing crude sulfur hexafluoride gas into a buffer bottle 2 filled with alkali liquor (such as NaOH, KOH and the like) through a polytetrafluoroethylene tube, removing fluorine gas, HF and the like corroded for analysis equipment, observing bubbles in the buffer bottle 2 to ensure that the sulfur hexafluoride gas is injected at the normal pressure, then introducing the sulfur hexafluoride gas into a water removal device 3 filled with a water removal adsorbent, then introducing the sulfur hexafluoride gas into an online chromatographic gas analyzer 4 for analysis, and measuring air, CF and other impurities in the sulfur hexafluoride gas4、C2F6And the like, so as to monitor whether the abnormality occurs in the steps S1 and S2 in real time. If CF is found therein4Content of more than 0.1%, C2F6When the content exceeds 0.01%, the carbon anode for preparing fluorine gas by electrolysis is abnormal or a used tetrafluoroethylene gasket is burnt, and the carbon anode or the tetrafluoroethylene gasket needs to be overhauled and replaced by stopping machine for inspection.
Introducing the qualified crude sulfur hexafluoride gas into a cracking tower for cracking and impurity removal in the step S3, wherein the cracking temperature in the cracking tower is more than 365 ℃, and toxic S in the crude sulfur hexafluoride gas is removed2F10Gas decomposition with a pyrolysis mechanism of S2F10＝SF6+SF4After the cracking in step S3, S in the crude sulfur hexafluoride gas is detected2F10The gas content is reduced to below 0.01 ppm.
Then, the mixed gas is washed with water to remove impurities S4 to remove fluorine gas, low-sulfur fluoride and thionyl fluoride in the mixed gas, so as to obtain a first-stage purified sulfur hexafluoride gas, where the chemical reaction equation is as follows:
2SF2+H2O＝SOF2+2HF+S
SF4+H2O＝SOF2+2HF
2S2F2+H2O＝SOF2+2HF+3S
SOF4+H2O＝SO2F2+2HF
SOF2+H2O＝SO2+2HF
2F2+2H2O＝O2+4HF
referring to fig. 3, fig. 3 is a schematic structural diagram of an embodiment of a water scrubber of the present invention, in this embodiment, the water scrubber includes a first-stage water scrubber 11, a second-stage water scrubber 12, a third-stage water scrubber 13, a fourth-stage water scrubber 14, a fifth-stage water scrubber 15, and a sixth-stage water scrubber 16, which are connected in sequence, the first-stage water scrubber 11, the second-stage water scrubber 12, the third-stage water scrubber 13, the fourth-stage water scrubber 14, the fifth-stage water scrubber 15, and the sixth-stage water scrubber 16 have the same structure, the mixed gas processed in step S3 sequentially passes through the first-stage water scrubber 11, the second-stage water scrubber 12, the third-stage water scrubber 13, the fourth-stage water scrubber 14, the fifth-stage water scrubber 15, and the sixth-stage water scrubber 16 for water scrubbing, water in each stage of the water scrubber after the above reaction is converted into hydrofluoric acid, and the concentration of hydrofluoric acid with water in each stage of the water scrubber is controlled: the method comprises the following steps that 40-50% of a first-stage washing tower, 22-30% of a second-stage washing tower, 6-12% of a third-stage washing tower, 2-7% of a fourth-stage washing tower, 1-4% of a fifth-stage washing tower and less than 1% of a sixth-stage washing tower are adopted, each stage of washing towers are sampled and analyzed every day, when the concentration of hydrofluoric acid with water in the first-stage washing tower is larger than or equal to 50% according to a detection result, hydrofluoric acid in the first-stage washing tower 11 is poured into an acid storage tank in time, then hydrofluoric acid in the second-stage washing tower is poured into the first-stage washing tower in sequence, hydrofluoric acid in the third-stage washing tower is poured into the second-stage washing tower, and so on, and clear water is injected into the last. The hydrofluoric acid in the acid storage tank is filtered to remove solid impurities, and the hydrofluoric acid can be sold after being qualified according to the final detection result, so that a byproduct hydrofluoric acid can be obtained in the washing process, and waste is changed into valuable.
Introducing the first-stage purified sulfur hexafluoride gas obtained by water washing into an alkaline washing tower for alkaline washing to remove HF and CO in the first-stage purified sulfur hexafluoride gas2、SO2And (3) gas to obtain secondary purified sulfur hexafluoride gas, wherein the related chemical reaction equation is as follows:
SO2+2KOH＝K2SO3+H2O
CO2+KOH＝K2CO3
HF+KOH＝KF+H2O
referring to fig. 4, fig. 4 is a schematic diagram of an embodiment of the alkaline washing tower of the present invention, in this embodiment, the alkaline washing tower includes a first-stage alkaline washing tower 21, a second-stage alkaline washing tower 22, a third-stage alkaline washing tower 23, a fourth-stage alkaline washing tower 24, a fifth-stage alkaline washing tower 25 and a sixth-stage alkaline washing tower 26 which are connected in sequence, and the first-stage purified sulfur hexafluoride gas from the sixth-stage water washing tower 16 enters the first-stage alkaline washing tower 21, and then enters the second-stage alkaline washing tower 22, the third-stage alkaline washing tower 23, the fourth-stage alkaline washing tower 24, the fifth-stage alkaline washing tower 25 and the sixth-stage alkaline washing tower 26 in sequence to perform alkaline washing and impurity removal. The selection of a proper alkali solution medium has great influence on the stable operation of a production system, the removal of impurities and the improvement of the purity of the sulfur hexafluoride, and the potassium fluoride has higher solubility in water (91.5 g/100g of water at 18 ℃) and is far more than fluorineThe method comprises the following steps of dissolving the solubility of sodium in water (4.1 g/100g of water at 18 ℃), selecting potassium hydroxide as a medium for leaching alkali liquor in an alkali wash tower although the cost of potassium hydroxide is higher than that of sodium hydroxide, sampling and analyzing each stage of alkali wash tower every day, timely transferring waste alkali liquor in the first stage of alkali wash tower to an alkali liquor collecting tank when the concentration of potassium hydroxide in the first stage of alkali wash tower is less than or equal to 49 mg/L according to a detection result, treating the waste alkali liquor in the alkali liquor collecting tank by using low-cost quicklime for recycling, then sequentially pouring alkali liquor in the second stage of alkali wash tower into the first stage of alkali wash tower, pouring alkali liquor in the third stage of alkali wash tower into the second stage of alkali wash tower, and so on, pouring prepared potassium hydroxide solution with corresponding concentration into the last 1 stage of six stage of alkali wash tower, preferably, pouring the concentration of potassium hydroxide solution into the six stage of alkali wash tower into 350 mg/L, and removing SF through absorption of the multistage alkali wash tower2、SF4、S2F2、SOF4、SOF2、HF、F2、CO2And hydrolyzing and alkaline hydrolyzing the fluoride to enable the content of the fluoride in the sulfur hexafluoride product to be lower than a control index.
The sulfur hexafluoride gas after alkali washing enters a refining system after being dewatered, and the refining system comprises an adsorption system and a rectification system.
Referring to fig. 5, fig. 5 is a schematic structural diagram of an embodiment of the adsorption system of the present invention, in this embodiment, the adsorption system includes a low pressure adsorption column 31, a high pressure adsorption column 32, and a gas holder or gas bag 30.
And controlling the pressure in the low-pressure adsorption tower within 20KPa, wherein the adsorbent of the low-pressure adsorption tower is activated carbon, and removing water, low-sulfur fluoride and trace acidic substances in the secondary purified sulfur hexafluoride gas in the low-pressure adsorption tower to obtain the tertiary purified sulfur hexafluoride gas.
In order to stabilize the gas flow entering the high-pressure adsorption tower, a gas cabinet or an air bag is further arranged between the low-pressure adsorption tower and the high-pressure adsorption tower in the embodiment, the three-stage purified sulfur hexafluoride gas is pressurized by a compressor in the gas cabinet or the air bag, and a dust removal filter device is arranged at the inlet of the compressor to prevent solid particles carried in the sulfur hexafluoride gas from damaging the compressor. The pressurized sulfur hexafluoride gas passes through an oil remover and an oil removal buffer tank and then enters the high-pressure adsorption tower after detection to meet the control requirement.
The pressure in the high-pressure adsorption tower is controlled to be 1.4MPa to 1.8MPa, the adsorbent of the high-pressure adsorption tower is activated carbon and molecular sieve, and trace S in the three-stage purified sulfur hexafluoride gas is removed in the high-pressure adsorption tower2OF10、SO2F2、SOF2、SOF4Low sulfur fluoride and trace amounts of HF and H2And O, obtaining four-stage purified sulfur hexafluoride gas.
Referring to fig. 6, fig. 6 is a schematic structural diagram of an embodiment of the rectification system of the present invention. In this embodiment, the rectifying system includes a high-boiling rectifying column 41, a first-stage low-boiling rectifying column 42, a second-stage low-boiling rectifying column 43, a high-boiling recovery rectifying column 44, and a low-boiling recovery rectifying column 45, in which the high-boiling rectifying column 41 is connected to the high-boiling recovery rectifying column 44, and the first-stage low-boiling rectifying column 42 and the second-stage low-boiling rectifying column 43 are both connected to the low-boiling recovery rectifying column 45.
Precooling the four-stage purified sulfur hexafluoride gas from the high-pressure adsorption tower 32 in a precooler, then feeding the gas into a high-boiling rectifying tower 41, discharging high-boiling impurities containing octafluoropropane, carbon dioxide, trace low-sulfur fluoride and the like in a reboiler of the high-boiling rectifying tower 41, wherein the high-boiling impurities containing sulfur hexafluoride contain sulfur hexafluoride, and feeding the high-boiling impurities containing sulfur hexafluoride into a high-boiling recovery rectifying tower to recover the sulfur hexafluoride therein; sulfur hexafluoride produced by a condenser of the high-boiling rectifying tower 41 contains low-boiling point impurities, the sulfur hexafluoride containing the low-boiling point impurities enters the primary low-boiling rectifying tower 42, the low-boiling point impurities discharged from the condenser of the primary low-boiling rectifying tower 42 contain the sulfur hexafluoride, such as oxygen, nitrogen, methane, carbon monoxide, hexafluoroethane and the like, and the low-boiling point impurities containing the sulfur hexafluoride enter the low-boiling recovery rectifying tower to recover the sulfur hexafluoride therein; the sulfur hexafluoride produced from the reboiler of the tower kettle of the first-stage low-boiling rectifying tower 42 also contains a small amount of low-boiling-point impurities, the sulfur hexafluoride enters the second-stage low-boiling rectifying tower 43 again to be further rectified and decontaminated, the low-boiling-point impurities discharged from the condenser of the second-stage low-boiling rectifying tower 43 contain a small amount of sulfur hexafluoride, the sulfur hexafluoride enters the low-boiling recovery rectifying tower to be recovered, the qualified high-purity sulfur hexafluoride produced from the reboiler of the tower kettle of the second-stage low-boiling rectifying tower 43 enters a product tank to be stored and batched, and the sulfur hexafluoride is filled after being analyzed and detected.
The control parameters of the high-boiling rectifying column 41, the first-stage low-boiling rectifying column 42, the second-stage low-boiling rectifying column 43, the high-boiling recovery rectifying column 44 and the low-boiling recovery rectifying column 45 are shown in table 3.
TABLE 3
Removing high-boiling-point impurities in the sulfur hexafluoride through a high-boiling rectifying tower 41: octafluoropropane, carbon dioxide, a trace amount of low-sulfur fluoride, and the like.
The low-boiling impurities in the sulfur hexafluoride are fully removed through a first-stage low-boiling rectifying tower 42 and a second-stage low-boiling rectifying tower 43: oxygen, nitrogen, methane, carbon monoxide, hexafluoroethane, and the like.
The sulfur hexafluoride mixed in the high-boiling point impurities and the low-boiling point impurities is recovered by the high-boiling point recovery rectifying tower and the low-boiling point recovery rectifying tower, so that the purposes of increasing the yield, reducing the emission and improving the recovery rate are achieved.
And finally, filling the obtained high-purity sulfur hexafluoride, wherein the high-purity sulfur hexafluoride filling containers comprise high-pressure seamless gas cylinders (small steel cylinders and Y cylinders), packaging grids, tube bundle containers and the like, and in order to ensure that the high-purity sulfur hexafluoride is qualified in quality, the high-purity sulfur hexafluoride filling containers comprise steel cylinders and internal treatment of the steel cylinders besides steel cylinder valves which are configured with special materials and sealing structures. The cleaning treatment process comprises the following steps: the method comprises the steps of water cleaning, acid cleaning and rust removing, alkali cleaning and neutralization, passivation, slag removal and timing internal polishing, and pollution of a filling container to high-purity sulfur hexafluoride is reduced.
The purity and impurity content of the high-purity sulfur hexafluoride obtained by the method are shown in table 4, and as can be seen from table 4, the purity of the high-purity sulfur hexafluoride is up to more than 99.9995%, the content of the impurity hexafluoroethane is basically controlled below 1ppm, and the content of the impurity octafluoropropane is controlled below 0.4 ppm.
TABLE 4
When the method is used for preparing fluorine by electrolysis, the fluorine-preparing anode-carbon plate is completely soaked in the electrolyte, so that the opportunity of reaction between fluorine gas and carbon element in the carbon plate is greatly reduced, the generation of hexafluoroethane can be effectively avoided, and the content of hexafluoroethane in crude gas of a produced sulfur hexafluoride product is lower than 1 ppm.
The purification and refining system can efficiently remove harmful impurities and pollutants of sulfur hexafluoride gas, and acidic substances and moisture which affect the product quality, so that the sulfur hexafluoride control index content passing through the purification and refining system is far lower than the national standard and exceeds the index control value of high-purity sulfur hexafluoride, and the high-purity product with continuous and stable quality can be produced.
The on-line analysis system can realize multi-point control analysis of one instrument, can avoid environmental pollution, has the advantages of more timely analysis, more reliable data, low failure rate of the chromatographic analysis system and the like, and can guide process operators to make production adjustment in time.
Finally, it should be emphasized that the above-described preferred embodiments of the present invention are merely examples of implementations, rather than limitations, and that many variations and modifications of the invention are possible to those skilled in the art, without departing from the spirit and scope of the invention.
Claims (10)
1. A method for purifying crude sulfur hexafluoride is characterized by comprising the following steps:
cracking and impurity removal: introducing the crude sulfur hexafluoride into a cracking tower for pyrolysis treatment, and introducing S in the crude sulfur hexafluoride2F10Decomposition of gas to SF6And SF4；
Washing with water to remove impurities: introducing the mixed gas subjected to the cracking impurity removal step into a water washing tower for washing, removing fluorine gas, low-sulfur fluoride and thionyl fluoride in the mixed gas to obtain first-stage purified sulfur hexafluoride gas, wherein the water washing tower comprises a first-stage water washing tower, a second-stage water washing tower, a third-stage water washing tower, a fourth-stage water washing tower, a fifth-stage water washing tower and a sixth-stage water washing tower which are sequentially connected, the mixed gas subjected to the step S3 is sequentially subjected to water washing by the first-stage water washing tower, the second-stage water washing tower, the third-stage water washing tower, the fourth-stage water washing tower, the fifth-stage water washing tower and the sixth-stage water washing tower, sampling analysis is performed on the water washing towers every day, when the mass concentration of hydrofluoric acid in the first-stage water washing tower is larger than or equal to 50%, the hydrofluoric acid in time is poured into an acid storage tank, then the hydrofluoric acid in the second-stage water washing tower is sequentially poured into the first-stage water washing tower, and the third-stage water washing tower is, by analogy, clear water is injected into the final 1-stage, namely the six-stage water washing tower;
alkali washing for removing impurities: introducing the primary purified sulfur hexafluoride gas obtained in the step of water washing impurity removal into an alkaline washing tower for alkaline washing to remove HF and CO in the primary purified sulfur hexafluoride gas2、SO2Gas to obtain second-stage purified sulfur hexafluoride gas;
low-pressure adsorption: introducing the second-stage purified sulfur hexafluoride gas obtained in the step of alkali washing and impurity removal into a low-pressure adsorption tower for adsorption, and removing trace moisture and acidic substances to obtain third-stage purified sulfur hexafluoride gas;
high-pressure adsorption: introducing the three-stage purified sulfur hexafluoride gas obtained in the low-pressure adsorption step into a high-pressure adsorption tower for adsorption, and adsorbing trace S in the sulfur hexafluoride gas2OF10、SO2F2、SOF2、SOF4Low sulfur oxyfluoride and trace amounts of HF and H2O, obtaining four-stage purified sulfur hexafluoride gas;
and (3) rectification and impurity removal: and introducing the four-stage purified sulfur hexafluoride gas into a rectification system to obtain the high-purity sulfur hexafluoride.
2. The method of claim 1, wherein:
the method comprises the steps that an alkaline tower in the alkaline cleaning and impurity removing step comprises a first-stage alkaline tower, a second-stage alkaline tower, a third-stage alkaline tower, a fourth-stage alkaline tower, a fifth-stage alkaline tower and a sixth-stage alkaline tower which are connected in sequence, first-stage purified sulfur hexafluoride gas discharged from the sixth-stage water scrubber enters the first-stage alkaline tower, then sequentially enters the second-stage alkaline tower, the third-stage alkaline tower, the fourth-stage alkaline tower, the fifth-stage alkaline tower and the sixth-stage alkaline tower for alkaline cleaning and impurity removing, potassium hydroxide solution is filled in each stage of alkaline tower to serve as a leaching medium, sampling analysis is carried out on each stage of alkaline tower every day, when the concentration of potassium hydroxide in the first-stage alkaline tower is detected to be smaller than or equal to 49 mg/L, waste alkaline liquor in the first-stage alkaline tower is timely transferred to an alkaline collecting tank, the waste alkaline liquor is treated by low-cost quicklime for recycling, then alkali in the second-stage alkaline tower is sequentially poured into the first-stage alkaline tower, acid in the third-stage alkaline tower is poured into the second-stage alkaline tower, and the same in analogy, and potassium hydroxide solution with the concentration of.
3. The method of claim 2, wherein:
the concentration of the potassium hydroxide solution injected into the six-stage caustic tower was 350 mg/L.
4. The method of claim 1, wherein:
a gas cabinet or a gas bag is also arranged between the low-pressure adsorption tower and the high-pressure adsorption tower, and gas pressurized in the gas cabinet or the gas bag enters the high-pressure adsorption tower.
5. The method of claim 1, wherein:
the pressure in the low-pressure adsorption tower is controlled within 20KPa, and the adsorbent of the low-pressure adsorption tower is activated carbon.
6. The method of claim 1, wherein:
the pressure of the high-pressure adsorption tower is controlled to be 1.4MPa to 1.8MPa, and the adsorbent of the high-pressure adsorption tower is activated carbon and a molecular sieve.
7. The production method according to any one of claims 1 to 6, characterized in that:
the rectifying system comprises a high-boiling rectifying tower, a first-stage low-boiling rectifying tower, a second-stage low-boiling rectifying tower, a high-boiling recovery rectifying tower and a low-boiling recovery rectifying tower, wherein the high-boiling rectifying tower is connected with the high-boiling recovery rectifying tower, and the first-stage low-boiling rectifying tower and the second-stage low-boiling rectifying tower are both connected with the low-boiling recovery rectifying tower.
8. The method of claim 7, wherein:
the four-stage purified sulfur hexafluoride gas from the high-pressure adsorption tower is precooled in a precooler and then enters the high-boiling rectifying tower, high-boiling-point impurities containing sulfur hexafluoride discharged from a reboiler of the high-boiling rectifying tower enter the high-boiling recovering rectifying tower to recover the sulfur hexafluoride therein, the sulfur hexafluoride produced by a condenser of the high-boiling rectifying tower sequentially enters the primary low-boiling rectifying tower and the secondary low-boiling rectifying tower to be rectified and purified, low-boiling-point impurities discharged from the condenser of the primary low-boiling rectifying tower and the condenser of the secondary low-boiling rectifying tower contain a small amount of sulfur hexafluoride, and the low-boiling-point impurities containing a small amount of sulfur hexafluoride enter the low-boiling recovering rectifying tower to recover the sulfur hexafluoride therein.
9. The method of claim 8, wherein:
the tower pressure of the high-boiling rectifying tower is 0.9MPa to 1.6MPa, the condenser temperature of the high-boiling rectifying tower is-35 ℃ to-10 ℃, and the reboiler temperature of the high-boiling rectifying tower is-13 ℃ to 10 ℃;
preferably, the tower pressure of the high-boiling recovery rectifying tower is 0.6MPa to 1.3MPa, the condenser temperature of the high-boiling recovery rectifying tower is-32 ℃ to-25 ℃, and the reboiler temperature of the high-boiling recovery rectifying tower is-12 ℃ to 6 ℃.
10. The method of claim 1, wherein:
the tower pressure of the primary low-boiling rectifying tower is 0.8MPa to 1.5MPa, the condenser temperature of the primary low-boiling rectifying tower is-37 ℃ to-15 ℃, and the reboiler temperature of the primary low-boiling rectifying tower is-18 ℃ to 15 ℃;
preferably, the tower pressure of the secondary low-boiling rectification tower is 0.3MPa to 0.9MPa, the condenser temperature of the secondary low-boiling rectification tower is-40 ℃ to-18 ℃, and the reboiler temperature of the secondary low-boiling rectification tower is-22 ℃ to-20 ℃;
preferably, the tower pressure of the low-boiling recovery rectifying tower is 0.25MPa to 0.55MPa, the condenser temperature of the low-boiling recovery rectifying tower is-42 ℃ to-20 ℃, and the reboiler temperature of the low-boiling recovery rectifying tower is-19 ℃ to 12 ℃.
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