CN111443482B - Image display device and system based on structural color and manufacturing method of device - Google Patents
Image display device and system based on structural color and manufacturing method of device Download PDFInfo
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Abstract
The invention discloses an image display device and system based on structural colors and a manufacturing method of the device. Wherein the image display device includes: the substrate is a double-layer substrate consisting of silicon and silicon dioxide; the silicon cylindrical nano structure is formed on the substrate and generates structural color through the Mie resonance effect on light; wherein, a plurality of silicon cylinder nanometer structures are arranged in an array to form a cylinder nanometer structure array. The image display device and system based on the structural color and the manufacturing method of the device provided by the invention adopt the periodic nano structure, are environment-friendly, are compatible with a semiconductor process, do not fade, and can change the structural color by changing the size of the nano structure and the gap of the nano structure array, so that the structural color is easy to observe.
Description
Technical Field
The invention relates to the technical field of structural color super surface technology and display, in particular to an image display device and system based on structural color and a manufacturing method of the device.
Background
The structural color is a color generated by physical actions such as reflection, diffraction, interference and the like on light due to the existence of the structure of an object. The structural color is a color which can be produced without coloring with dyes or pigments.
Compared with the traditional dyes, the structural color is valued by the advantages of high resolution, high information storage density, high integration, no fading and the like. In practice, a transition to a color display is unavoidable, but is also very necessary. Over the past few years, nanostructures have been able to achieve very bright, wide-gamut colors with greatly improved spatial resolution. Any image can be represented by properly arranging nanostructure arrays of different sizes and different periods or gaps, as long as the color of the individual pixels is known. Compared with other image displays, the structural color-based image display can realize the display of an image by arranging the colors of the individual pixels of the target image, and can obtain high-quality structural color image display as long as the pixels are sufficiently small. Therefore, the image display technology based on the super-surface structure color is green and environment-friendly and meets the trend and the requirement of future scientific and social development.
In view of this, how to implement image formation by structural color and the specific implementation manner of implementing the technology, such as material selection, space allocation, etc., all need a set of relatively complete solutions to achieve the green and environment-friendly image display technology.
Disclosure of Invention
In order to solve one or more of the above technical problems, the present invention provides an image display device and system based on structural color and a method for manufacturing the device, which are easy to integrate and manufacture, green and environment-friendly, and have high resolution.
According to an aspect of the present invention, there is provided a structural color based image display device including:
the substrate is a double-layer substrate consisting of silicon and silicon dioxide;
the silicon cylindrical nano structure is formed on the double-layer substrate and generates structural color through the Mie resonance effect on light;
wherein, a plurality of silicon cylinder nanometer structures are arranged in an array to form a cylinder nanometer structure array.
Further, wherein:
in some embodiments, the thickness of the silicon dioxide in the bilayer substrate is 1 micron.
In some embodiments, the silicon cylindrical nanostructures have a height between 100 nm and 200 nm.
In some embodiments, the silicon cylindrical nanostructures have a diameter between 70nm and 250 nm.
In some embodiments, the gap between adjacent silicon cylindrical nanostructures is between 70 nanometers and 250 nanometers.
In some embodiments, the face diameters and/or heights of different silicon cylindrical nanostructures are different.
In some embodiments, the array of cylindrical nanostructures is arranged periodically, and the period of arrangement of adjacent arrays of cylindrical nanostructures in both the x and y directions is between 100 nm and 500 nm.
According to another aspect of the present invention, there is provided a structural color based image display system including:
a light source that emits probe light;
the cylindrical nano-structure array receives the probe light and vertically emits the probe light to obtain emergent light;
the semi-reflecting and semi-transmitting film or the beam splitter is arranged on a light path of the emergent light and divides the emergent light into first emergent light and second emergent light;
the camera receives the first emergent light, and/or the camera is also connected with a display and realizes imaging based on the first emergent light;
the optical detector or the spectrometer receives the second emergent light to obtain a reflection spectrum of the second emergent light;
when the cylindrical nanostructure array receives the detection light and vertically emits the detection light, the detection light with partial wavelength generates Mie resonance.
According to still another aspect of the present invention, there is provided a method of manufacturing a structural color based image display device, including:
providing a substrate, wherein the substrate is a double-layer substrate consisting of silicon and silicon dioxide;
forming a silicon cylindrical nanostructure on the double-layer substrate;
manufacturing a plurality of silicon cylindrical nanostructures with different sizes to form a cylindrical nanostructure array;
wherein the silicon cylindrical nanostructure produces a structural color by mie resonance effects on light.
The image display device and system based on the structural color and the manufacturing method of the device have the following beneficial effects:
(1) the invention adopts the double-layer substrate of the dielectric material silicon and the silicon dioxide to form the high-refractive-index nano-structure device based on the Mie resonance, can generate stronger scattering than the silicon nano-structure of the traditional quartz substrate, can generate high-quality structural color at the same time, and can operate and show remarkable color adjustability in a reflection mode;
(2) the basic structural unit of image color development is made of silicon, compared with a metal super surface, the silicon is used as a dielectric material with high refractive index, the loss is less in the visible light range, and the silicon nanostructure can simultaneously support the Mie resonance of electric dipoles and magnetic dipoles;
(3) according to the invention, a cylindrical nanostructure array is designed, in the array, a single silicon cylindrical nanostructure can generate Mie resonance, the reflection spectrum characteristics of silicon cylindrical nanostructures with different heights and radiuses are different, and the Mie resonance can be tuned by changing the size (including height, diameter and the like) of the single silicon cylindrical nanostructure, so that the structural color is changed to obtain the color with wide color gamut; meanwhile, the cylindrical nanostructure arrays with different gaps and periods can be manufactured as required, and graphic display with different colors can be met. The structural color generated by the Mie resonance is excited by adopting the cylindrical nano-structure array, so that the method is green and environment-friendly, has high resolution, and can preliminarily observe the color change of the image through a microscope and a camera;
(4) the technology disclosed by the invention is compatible with the traditional semiconductor process, and the manufacturing process is simple.
Drawings
The various aspects of the invention are best understood from the following detailed description when read with the accompanying drawing figures. It should be noted that, in accordance with standard practice in the industry, various components are not drawn to scale. In fact, the dimensions of the various elements may be arbitrarily increased or reduced for clarity of discussion.
FIG. 1 is a schematic overall view of a cylindrical nanostructure array in an image display device according to an embodiment of the present invention;
FIG. 2 is a cross-sectional view of an array of cylindrical nanostructures in an image display device according to an embodiment of the present invention;
FIG. 3 is a top view of an array of cylindrical nanostructures in an image display device according to an embodiment of the invention;
FIG. 4 is a schematic diagram of an image display system based on structural colors according to an embodiment of the present invention;
FIG. 5 is a test reflectance spectrum resulting from a yellow structure color in the image display system according to an embodiment of the present invention;
FIG. 6 is a test reflectance spectrum generated by a red structure color in the image display system according to the embodiment of the present invention;
FIG. 7 is a flowchart illustrating a method for fabricating a structural color based image display device according to an embodiment of the present invention;
FIGS. 8-13 are schematic diagrams of a fabrication process corresponding to the flowchart of FIG. 7;
FIG. 14 is a photograph of a pattern of cylindrical nanostructure arrays prepared in accordance with one embodiment of the present invention;
fig. 15 is a photograph of a pattern of cylindrical nanostructure arrays prepared in accordance with another embodiment of the present invention.
In the figure:
silicon 1 silica 2 silicon cylindrical nanostructures 3
Detailed Description
The following disclosure provides many different embodiments, or examples, for implementing different features of the invention. Specific examples of components and arrangements are described below to simplify the present disclosure. These are, of course, merely examples and are not intended to limit the invention. For example, in the description that follows, forming a first feature over or on a second feature may include embodiments in which the first and second features are in direct contact, as well as embodiments in which additional features may be formed between the first and second features such that the first and second features are not in direct contact.
Furthermore, spatial relationship terms, such as "below", "lower", "above", "upper", and the like, may be used herein for ease of description to describe one element or component's relationship to another element or component as illustrated. Spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatial relationship descriptors used herein interpreted accordingly as such.
At present, the research of the structural color of all-electric media based on the mie resonance is focused and developed rapidly, and the mie resonance wavelength of the structure depends on the inherent material characteristics and the structure geometric shape, so that the defects of the traditional chemical coloring can be overcome, and the method is green and environment-friendly.
In view of this, in a first exemplary embodiment of the present invention, a structural color based image display device is disclosed. As shown in fig. 1, the structure of the apparatus includes:
a two-layer substrate of silicon (lower dark grey region in fig. 1) and silicon dioxide (light grey region) can enhance the backscattering well;
a silicon cylindrical nanostructure (upper dark gray area in fig. 1) formed on the double-layered substrate, the silicon cylindrical nanostructure generating a structural color by a mie resonance effect on light;
wherein, a plurality of silicon cylinder nanometer structures are arranged in an array to form a cylinder nanometer structure array.
Further, fig. 2 is a cross-sectional view of the cylindrical nanostructure array in the image display device of the present embodiment, which is shown as silicon 1, silicon dioxide 2 and silicon cylindrical nanostructure 3. Fig. 3 is a top view of the array of cylindrical nanostructures in the image display device of this embodiment. See, in combination, fig. 1-3, wherein:
preferably, the thickness of the silicon dioxide 2 in the bilayer substrate is 1 micron;
preferably, for a single silicon cylindrical nanostructure 3 in the array of cylindrical nanostructures, the height h (as shown in fig. 1) is between 100 nm and 200 nm, the diameter D (as shown in fig. 1 and 3) is between 70nm and 250 nm, and the gap g (as shown in fig. 1 and 3) between adjacent silicon cylindrical nanostructures 3 is between 70nm and 250 nm.
Preferably, the circular column nanostructure arrays are also arranged periodically, and the arrangement period of the adjacent circular column nanostructure arrays in the x and y directions is between 100 nanometers and 500 nanometers.
It should be noted that the high refractive index nanostructure can realize internal optical coupling in the visible wavelength range, which allows the mie resonator to be applied to the development of sub-wavelength resolution, thereby improving the resolution, and the change of structural color caused by changing the size and period of the nanostructure can simply play the role of image development, and further, a series of parameters of the nanostructure can be adjusted to realize better image display performance. Therefore, in other embodiments, the surface diameters and/or heights of different silicon cylindrical nanostructures may be different from each other, or the arrangement periods of the cylindrical nanostructure arrays may be different from each other, so as to achieve better technical effects.
In combination with the above-described image display apparatus, in a second exemplary embodiment of the present invention, a structural color based image display system is disclosed. Fig. 4 is a schematic diagram of a structural color based image display system of the present embodiment, generally, the system includes:
a light source that emits probe light;
the cylindrical nanostructure array in the embodiment receives the probe light and vertically emits the probe light to obtain emergent light;
the semi-reflecting and semi-transmitting film or the beam splitter is arranged on a light path of the emergent light and divides the emergent light into first emergent light and second emergent light;
the camera receives the first emergent light, and/or the camera is also connected with a display and realizes imaging based on the first emergent light;
the optical detector or the spectrometer receives the second emergent light to obtain a reflection spectrum of the second emergent light, so that spectral analysis is realized;
when the cylindrical nanostructure array receives the detection light and vertically emits the detection light, the detection light with partial wavelength generates Mie resonance.
In this embodiment, as shown in fig. 4, the detection light emitted by the light source 4 passes through the transflective film 5 and then is perpendicularly incident on the cylindrical nanostructure array. The cylinder nanostructure array is square check periodic distribution, and the probing light incides perpendicularly on the cylinder nanostructure array, can produce mie resonance at this moment at some wavelength, then the reverberation (promptly the emergent light) is followed the perpendicular outgoing of incident light path, through semi-reflecting semi-permeable membrane 5, through semi-reflecting semi-permeable membrane 6 again, and half reverberation (promptly first emergent light) is received by camera 8 and is imaged, and half reverberation (promptly the second emergent light) is received by light detector 7.
It should be noted that the structural color based image display system disclosed in the present invention is not limited to that shown in fig. 4, and in other embodiments, the transflective film may be replaced by a beam splitter, the optical detector may be replaced by a spectrometer, and the spectrometer is used to obtain the reflection spectrum of the structural color generated by the nano device, and the system may further include a display, and the reflection spectrum of the received light of the camera or the spectrometer is imaged through the display.
The principle and characteristics of the present invention for displaying a mie resonance image will be explained as follows:
FIG. 5 is a test reflectance spectrum generated by a yellow structure color in the image display system according to the embodiment of the present invention. The height of the silicon cylindrical nanostructures used was 136 nm, the diameter D was 170nm, and the gap between adjacent silicon cylindrical nanostructures was 110 nm. As can be seen from the reflection spectrum, the highest two peaks are in the yellow spectral range, and the peaks are formed by electromagnetic dipole excitation resonance, so that yellow is generated;
FIG. 6 is a test reflectance spectrum generated by a red structure color in the image display system according to the embodiment of the present invention. The height of the silicon cylindrical nanostructures used was 136 nm, the diameter D was 230nm, and the gap between adjacent silicon cylindrical nanostructures was 110 nm. As can be seen from the reflection spectrum, the highest peak is in the red spectral range and is formed by electromagnetic dipole excited resonance, so that a red color is produced.
In a third exemplary embodiment of the present invention, in conjunction with the above-described image display device again, there is provided a method of manufacturing the structural color-based image display device. The method comprises the following steps:
s1, providing a substrate, wherein the substrate is a double-layer substrate composed of silicon and silicon dioxide;
s2, forming a film structure on the substrate, wherein the film structure is a silicon cylinder nano structure;
s3, manufacturing a plurality of silicon cylindrical nanostructures with different sizes to form a cylindrical nanostructure array, detecting the reflectivity and color change of the cylindrical nanostructure array, and displaying an image by generating structural color through the refractive index change of light caused by Mie resonance in the cylindrical nanostructure array.
Fig. 7 is a flowchart of a method for forming a cylindrical nanostructure array according to the present embodiment, and fig. 8-13 are schematic diagrams of a manufacturing process corresponding to the flowchart of fig. 7, where the method includes the following steps:
step S602, spin-coating PMMA glue 10 on an SOI (silicon-silicon dioxide-silicon three-layer structure) sheet 9 (as shown in FIG. 8);
step S604, patterning (forming an array arrangement of cylindrical nanostructure arrays) on the PMMA resin 10 by using an electron beam lithography, exposing and developing (as shown in fig. 9);
step S606, depositing a metal mask chromium layer 11 by an electron beam evaporation method (as shown in FIG. 10);
step S608, stripping the metal mask chrome outside the pattern area by using a wet photoresist stripping method (as shown in fig. 11);
step S610, etching silicon to a silicon dioxide layer of the SOI sheet by using chromium as a mask by adopting an Inductively Coupled Plasma (ICP) etching method to form a cylindrical nanostructure array (as shown in figure 12);
step S612, removing the metal mask chrome 11 on the top layer of the cylindrical nanostructure array by wet dechroming (as shown in fig. 13).
The following is a detailed description with reference to specific examples.
Example one
The cylindrical nano periodic structure selects silicon and silicon dioxide as substrates. Specifically, the method comprises the following steps:
spin-coating 150nm thick electron beam sensitive resin PMMA on the surface of the SOI sheet;
exposing by electron beamLight, electron beam voltage 100Kv, current 200pA, electron dose 900. mu.C/cm2(ii) a Exposing an array of circular holes on the e-beam resist, the circular holes having a diameter of about 230nm and a gap of 110 nm;
depositing 30nm Cr on the PMMA photoresist by an electron beam evaporation method;
removing the electron beam photoresist by a wet photoresist removing method, stripping Cr outside a pattern area, sequentially using acetone, absolute ethyl alcohol and deionized water as a solution, and then drying by using N2;
etching silicon with a metal mask Cr by an inductively coupled plasma etching method, wherein the process gas used for etching is 2sccm oxygen, 92sccm hydrogen bromide, 6sccm sulfur hexafluoride, the working pressure is 800Pa, the power is 300W, and the etching time is 85 s;
and removing the chromium masking film on each silicon cylindrical nanostructure through chromium removing liquid.
Fig. 14 shows a cylindrical nanostructure array fabricated according to one embodiment.
Example two
The cylindrical nano periodic structure selects silicon and silicon dioxide as substrates. Specifically, the method comprises the following steps:
spin-coating 150nm thick electron beam sensitive resin PMMA on the surface of the SOI sheet;
electron beam exposure, electron beam voltage 100Kv, current 200pA, electron dose 800. mu.C/cm2(ii) a Exposing an array of circular holes on the e-beam resist, the circular holes having a diameter of about 170nm and a gap of 110 nm;
depositing 30nm Cr on the PMMA photoresist by an electron beam evaporation method;
removing the electron beam photoresist by a wet photoresist removing method, stripping Cr outside a pattern area, sequentially using acetone, absolute ethyl alcohol and deionized water as a solution, and then drying by using N2;
etching silicon with a metal mask Cr by an inductively coupled plasma etching method, wherein the process gas used for etching is 2sccm oxygen, 92sccm hydrogen bromide, 6sccm sulfur hexafluoride, the working pressure is 800Pa, the power is 300W, and the etching time is 85 s;
and removing the chromium masking film on each silicon cylindrical nanostructure through chromium removing liquid.
The cylindrical nanostructure array produced in the second embodiment is shown in fig. 15.
In summary, the image display device and system based on structural color and the manufacturing method thereof provided by the invention have the following beneficial effects:
(1) according to the image display device and the manufacturing method thereof, the cylindrical nanostructure array is formed by the electron beam lithography and the electron beam evaporation deposition method, the precision is high, the image display device is compatible with the traditional semiconductor process, and the integration is easy;
(2) the cylindrical nanostructure array is adopted to excite the Mie resonance, and the image display technology based on the structural color has the advantages of high color quality, high saturation, high information storage degree and environmental protection;
(3) in the image display device, the reflection spectrum characteristics of the cylindrical nanostructure arrays with different array periods or the silicon cylindrical nanostructure with different sizes are different, so that different silicon cylindrical nanostructures and/or cylindrical nanostructure arrays can be manufactured according to the requirements, and the measurement under the conditions of different wavelengths is met.
The components of several embodiments are discussed above so that those skilled in the art may better understand the various aspects of the present invention. Those skilled in the art should appreciate that they may readily use the present disclosure as a basis for designing or modifying other processes and structures for carrying out the same purposes and/or achieving the same advantages of the embodiments introduced herein. Those skilled in the art should also realize that such equivalent constructions do not depart from the spirit and scope of the present disclosure, and that they may make various changes, substitutions, and alterations herein without departing from the spirit and scope of the present disclosure.
Claims (10)
1. An image display device based on structural colors, comprising:
the substrate is a double-layer substrate consisting of silicon and silicon dioxide;
the silicon cylindrical nano structure is formed on the silicon dioxide in the double-layer substrate, and the silicon cylindrical nano structure generates structural color through the Mie's resonance effect on light;
and a plurality of silicon cylindrical nanostructures are arranged in an array to form a cylindrical nanostructure array.
2. The image display device according to claim 1, wherein the thickness of the silicon dioxide in the bilayer substrate is 1 micron.
3. The image display device of claim 1, wherein the silicon cylindrical nanostructures have a height of between 100 nm and 200 nm.
4. The image display device of claim 1, wherein the silicon cylindrical nanostructures have a diameter of between 70nm and 250 nm.
5. The image display device according to claim 1, wherein a gap between adjacent silicon cylindrical nanostructures is between 70nm and 250 nm.
6. An image display device as claimed in claim 1, characterized in that the area diameters and/or heights of the different silicon cylindrical nanostructures are different.
7. The image display device according to claim 1, wherein the cylindrical nanostructure arrays are arranged periodically, and the arrangement period of the adjacent cylindrical nanostructure arrays in the x and y directions is between 100 nm and 500 nm.
8. An image display system based on structural colors, comprising:
a light source that emits probe light;
the cylindrical nanostructure array of any one of claims 1 to 7, receiving the probe light and emitting it vertically to obtain an exit light;
the semi-reflecting and semi-transmitting film is arranged on a light path of the emergent light and divides the emergent light into first emergent light and second emergent light;
the camera receives the first emergent light, and/or the camera is also connected with a display, and imaging is realized based on the first emergent light;
the optical detector or the spectrometer receives the second emergent light to obtain a reflection spectrum of the second emergent light;
when the cylindrical nanostructure array receives the detection light and vertically emits the detection light, the detection light with partial wavelength generates Mie resonance.
9. The structural color based image display system of claim 8, wherein the transflective film is replaced with a beam splitter.
10. A method for manufacturing an image display device based on structural colors is characterized by comprising the following steps:
providing a substrate, wherein the substrate is a double-layer substrate consisting of silicon and silicon dioxide;
forming silicon cylindrical nanostructures on the silicon dioxide in the double-layer substrate;
manufacturing a plurality of silicon cylindrical nanostructures with different sizes to form a cylindrical nanostructure array;
wherein the silicon cylindrical nanostructure produces a structural color by mie resonance effects on light.
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| JP2006106623A (en) * | 2004-10-08 | 2006-04-20 | Dainippon Printing Co Ltd | Pattern formation body and its manufacturing method |
| CN103145095A (en) * | 2013-03-26 | 2013-06-12 | 吉林大学 | Preparation method of panchromatic structural color or color variation pattern array |
| WO2015028037A1 (en) * | 2013-09-02 | 2015-03-05 | Danmarks Tekniske Universitet | Nanostructures for structural colouring |
| CN106483594A (en) * | 2017-01-03 | 2017-03-08 | 济南大学 | Colored filter and application based on the super surface of silicon and nanostructured metal film |
| CN109696718A (en) * | 2019-03-12 | 2019-04-30 | 江南大学 | A kind of super structure surface texture chromatic filter of mechanical adjustable |
| CN110632063A (en) * | 2019-08-15 | 2019-12-31 | 中国科学院微电子研究所 | Colorimetric sensor and manufacturing method and test system thereof |
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| US20160131808A1 (en) * | 2013-06-04 | 2016-05-12 | Nil Technology Aps | An optical device capable of providing a structural color, and a corresponding method of manufacturing such a device |
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| JP2006106623A (en) * | 2004-10-08 | 2006-04-20 | Dainippon Printing Co Ltd | Pattern formation body and its manufacturing method |
| CN103145095A (en) * | 2013-03-26 | 2013-06-12 | 吉林大学 | Preparation method of panchromatic structural color or color variation pattern array |
| WO2015028037A1 (en) * | 2013-09-02 | 2015-03-05 | Danmarks Tekniske Universitet | Nanostructures for structural colouring |
| CN106483594A (en) * | 2017-01-03 | 2017-03-08 | 济南大学 | Colored filter and application based on the super surface of silicon and nanostructured metal film |
| CN109696718A (en) * | 2019-03-12 | 2019-04-30 | 江南大学 | A kind of super structure surface texture chromatic filter of mechanical adjustable |
| CN110632063A (en) * | 2019-08-15 | 2019-12-31 | 中国科学院微电子研究所 | Colorimetric sensor and manufacturing method and test system thereof |
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