CN111423100B - Method for carrying out rapid heating and imprinting on surface of micro-nano structure by using tantalum coating - Google Patents
Method for carrying out rapid heating and imprinting on surface of micro-nano structure by using tantalum coating Download PDFInfo
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- CN111423100B CN111423100B CN202010248319.1A CN202010248319A CN111423100B CN 111423100 B CN111423100 B CN 111423100B CN 202010248319 A CN202010248319 A CN 202010248319A CN 111423100 B CN111423100 B CN 111423100B
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B11/00—Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
- C03B11/06—Construction of plunger or mould
- C03B11/08—Construction of plunger or mould for making solid articles, e.g. lenses
- C03B11/084—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
- C03B11/086—Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
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Abstract
The invention discloses a method for carrying out rapid heating and imprinting on a micro-nano structure surface by utilizing a tantalum coating, and relates to the technical field of micro-nano array optical components. The invention can realize the processing of the high-precision micro-nano array optical structure, has high processing efficiency, low manufacturing cost and long service life of the die and has extremely high application value.
Description
Technical Field
The invention relates to the technical field of micro-nano array optical components, in particular to a method for carrying out rapid heating and imprinting on the surface of a micro-nano structure by using a tantalum coating.
Background
The micro-nano array refers to a micro-nano structure surface with a micro geometric topological shape and a specific function in regular array distribution. The micro-nano structure made of different materials, unit shapes and periodic sizes has various optical characteristics, and can realize functions of permeability increasing, polarization splitting, optical waveguide coupling, beam combination transformation, beam shaping and the like by utilizing the imaging characteristics and the diffraction characteristics of the micro-nano structure, so that the micro-nano optical element has important functions and wide application in various fields such as optical imaging display, communication interconnection, position detection, precision manufacturing equipment and the like.
In recent years, with the wide application of micro-electromechanical systems in the fields of aerospace, information communication, biomedical, automatic control, consumer electronics, weapons and the like, how to process high-precision micro-nano array optical structures with various complex shapes is focused on improving the manufacturing precision of the micro-electromechanical systems in the field of micro-electromechanical systems. The glass material has the characteristics of high refractive index, high deformation resistance, low expansion, high imaging quality and the like, and is an ideal material for processing micro-nano array optical elements.
In order to meet the application requirements of micro-nano optical elements, various micro-nano array processing technologies are developed. The focused ion beam processing and the laser processing based on the energy-assisted processing can directly process the surface micro-nano array on the optical element, but the two methods have complex technical process and higher cost, and the processed micro-nano array has poor uniformity. The glass micro-nano array can also be processed by a photoetching technology, but the shape of the micro-nano array is limited. By adopting single-point diamond ultra-precision cutting machining or numerical control grinding and polishing, the complex micro-nano array can be manufactured, the shape precision is high, but the problems of high cost, incapability of mass production and the like exist, and the market demand cannot be met.
Other methods such as micro-grinding and micro-cutting, or the methods are limited by abrasion of a grinding wheel or edge breakage of a cutter, the form and position precision and the surface quality of the processed micro-nano array optical structure cannot meet the precision requirement of ultra-precision machining, and on the other hand, for hard and brittle materials such as glass, the surface after the material is removed is far from meeting the requirement of optical application, and cannot be used in increasingly precise optical systems naturally. However, in the processing technology such as injection molding, the material needs to be liquefied by heating the workpiece to an extremely high temperature, which may damage the internal structure of the material greatly, change the optical characteristics of the material, and cannot be applied to the optical system of the electromechanical system.
At present, a common micro-nano array optical component adopts an ultra-precision die forming technology, a die with nano-scale surface quality is obtained by carrying out ultra-precision processing on a free-cutting material, then a layer of film is additionally plated on the surface of the die for protecting the die and prolonging the service life, and die plating materials include but are not limited to a rhenium iridium plating layer, a diamond DLC plating layer and a graphite plating layer.
The rhenium-iridium coating is a rare metal coating and has good affinity with a mold base material, and can effectively isolate the chemical reaction between the mold and glass at high temperature, but the thickness of the coating is not lower than the standard thickness for technical reasons, and reaches tens of micrometers, so that the shape precision of the microstructure on the surface of the mold is reduced, and for some nano-scale microstructures, the coating can even directly cover the nano-scale microstructures; the diamond DLC coating is mature at present, is mainly applied to a hard alloy die coating, can effectively protect a die and allow secondary die repair, but electrons or ions which can move freely do not exist in a diamond crystal, so that the coating is not conductive and can not be electrified for auxiliary heating; the graphite coating is a novel coating, the thickness of the coating is hundreds of nanometers, the micro-nano structure of the surface of the die is effectively reserved, meanwhile, the graphite coating can be electrified to carry out local rapid auxiliary heating, but the surface of the graphite coating is rough, and the surface smoothness of the processed die is poor.
In the traditional micro-nano structure array die forming process, the heating mode is mainly infrared lamp radiation or thermal resistance heating, the whole processed workpiece is heated to extremely high temperature, and after cooling, the inside of the whole micro-nano structure array lens can generate larger residual stress, so that the optical characteristics of the material are changed, and the application of the optical characteristics is limited. As the whole workpiece to be processed is heated to the mould pressing temperature, the required heating time is longer, the processing period is prolonged, and the processing efficiency needs to be further improved so as to meet the market demand.
Therefore, it is desirable to provide a new method for performing high-precision press molding of auxiliary heating glass by using a tantalum plating layer to solve the above-mentioned problems in the prior art.
Disclosure of Invention
The invention aims to provide a method for rapidly heating and imprinting the surface of a micro-nano structure by using a tantalum coating, so as to solve the problems in the prior art, realize the processing of a high-precision micro-nano array optical structure, and have the advantages of high processing efficiency, low manufacturing cost, long service life of a mold and extremely high application value.
In order to achieve the purpose, the invention provides the following scheme: the invention provides a method for carrying out rapid heating and imprinting on a micro-nano structure surface by using a tantalum coating, which comprises the following steps:
firstly, processing a micro-nano optical structure on the surface of a mould;
step two, additionally plating a layer of graphene on the surface of the die;
thirdly, additionally plating a layer of metal tantalum, and combining the graphene and the tantalum at a high temperature to generate a tantalum carbide film;
and step four, electrifying the tantalum carbide film to finish the manufacture and use of the auxiliary heating coating in the glass mould pressing process.
Preferably, the micro-nano optical structure in the first step is hemispherical.
Preferably, in the fourth step, the mold is heated by changing the intensity of the current applied thereto, and the high-temperature molding is performed.
Compared with the prior art, the invention has the following technical effects:
the method has the characteristics of high processing precision, high efficiency and good finished product consistency, solves the problems of poor shape precision of a micro structure on the surface of the die, non-conductivity, incapability of being electrified for auxiliary heating, rough surface, poor surface smoothness of the processed die and the like compared with other processing methods, is more suitable for processing the glass micro-nano array, and is a high-efficiency and low-cost processing method.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings needed in the embodiments will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings without creative efforts.
FIG. 1 is a process flow diagram of a method for rapid heating and imprinting of a micro-nano structure surface by using a tantalum plating layer according to the present invention;
FIG. 2 is a schematic diagram of a micro-nano structure processed in the invention;
FIG. 3 is a schematic view of a graphene interlayer in the present invention;
FIG. 4 is a schematic view of an enhanced tantalum metal film plating process according to the present invention;
FIG. 5 is a schematic view of the present invention illustrating the auxiliary heating by energization;
in the figure, 1 is a mold substrate, 2 is a nickel phosphide film, 3 is graphene, and 4 is a tantalum carbide film.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
In order to make the aforementioned objects, features and advantages of the present invention comprehensible, embodiments accompanied with figures are described in further detail below.
Example one
As shown in fig. 1, the embodiment provides a method for performing rapid heating and imprinting on a micro-nano structure surface by using a tantalum plating layer, which includes the following steps:
firstly, processing a micro-nano optical structure on the surface of a mould;
specifically, the mold is placed on a mold substrate 1, the mold substrate 1 is made of heat-resistant stainless steel, the price is low, and the physical properties meet the basic mold pressing requirements; firstly plating a nickel phosphide film 2 on the surface of a die to process a surface structure, and then additionally plating a tantalum plating layer and the like, wherein the nickel phosphide has good cutting performance and can be processed into various complex shapes;
step two, additionally plating a layer of graphene 3 on the surface of the die;
thirdly, additionally plating a layer of metal tantalum, and combining the graphene and the tantalum at a high temperature to generate a tantalum carbide film 4; the tantalum carbide coating has thermal shock resistance and extremely stable chemical property, can protect the original structure, prevents the microstructure from being bonded with glass and other reactions during mould pressing, well considers the relationship between the surface quality of a mould and the service life of the mould, and has the advantages of high processing efficiency, low manufacturing cost, long service life of the mould and extremely high application value; the tantalum carbide film 4 is a good electric conductor, and current only passes through the tantalum carbide film 4 when the tantalum carbide film is electrified;
and step four, electrifying the tantalum carbide film 4 to finish the manufacturing and the use of the ultraprecise auxiliary heating coating in the glass mould pressing process.
According to the formula of U2t/R, when the voltage is constant, the tantalum carbide film 4 can generate a large amount of heat in a short time, and meanwhile, the tantalum carbide film 4 has good heat conductivity and heat dissipation, after the power supply is cut off, the heat of the coating material can be quickly released to the air, and the processed material is cooled. The tantalum carbide film 4 can generate heat/release heat rapidly under the power-on/power-off condition to complete softening and copying of the optical material in contact with the surface of the coating.
In this embodiment, the micro-nano optical structure in the first step is a hemisphere, but is not limited to a hemisphere, and other shapes meeting the working requirement, such as a rectangular parallelepiped, a cone, an arc, etc., may be used.
In the fourth step, the mold can be heated by changing the intensity of the current for power supply, and the high-temperature molding can be carried out.
The embodiment adopts the ultra-thin coating of hundred nanometers level, so that the shape precision of the microstructure on the surface of the die can be prevented from being reduced and even disappeared when the film is coated, the relation between the deformation quantity and the film thickness is well considered, and the processing precision of the glass micro-nano structure is ensured. The electrical conductivity of tantalum metal is similar to that of graphite, so that electric auxiliary heating can be performed, the temperature limit of traditional processing is broken through, and the processing temperature range is wider.
The tantalum metal coating technology adopted by the embodiment is mature and inert to the chemical property of glass, so that the surface of the die can keep high smoothness for a long time, and the service life of the die is greatly prolonged.
In conclusion, the method for carrying out rapid heating and imprinting on the surface of the micro-nano structure by utilizing the tantalum plating layer has the characteristics of high processing precision, high efficiency and good consistency of finished products, solves the problems of poor shape precision of the micro-structure on the surface of the mold, non-conductivity, incapability of carrying out auxiliary heating by electrifying, rough surface, poor surface smoothness of the processed mold and the like compared with other processing methods, is more suitable for processing the glass micro-nano array, and is a high-efficiency and low-cost processing method.
The invention has wider range of processable glass materials and can process glass materials which cannot be processed originally; the processing material is not limited, the processing efficiency of the glass micro-nano structure can be greatly improved, and the manufacturing cost is reduced.
The principle and the implementation mode of the invention are explained by applying a specific example, and the description of the embodiment is only used for helping to understand the method and the core idea of the invention; meanwhile, for a person skilled in the art, according to the idea of the present invention, the specific embodiments and the application range may be changed. In view of the above, the present disclosure should not be construed as limiting the invention.
Claims (3)
1. A method for carrying out rapid heating and imprinting on the surface of a micro-nano structure by using a tantalum coating is characterized by comprising the following steps: the method comprises the following steps:
firstly, processing a micro-nano optical structure on the surface of a mould;
the mold is placed on a mold substrate, and the surface of the mold is plated with a nickel phosphide film to process a surface micro-nano optical structure;
step two, additionally plating a layer of graphene on the surface of the die;
thirdly, additionally plating a layer of metal tantalum, and combining the graphene and the tantalum at a high temperature to generate a tantalum carbide film;
and step four, electrifying the tantalum carbide film to finish the manufacture and use of the auxiliary heating coating in the glass mould pressing process.
2. The method for carrying out micro-nano structure surface rapid heating imprinting by using the tantalum coating according to claim 1, which is characterized in that: the micro-nano optical structure in the first step is hemispherical.
3. The method for carrying out micro-nano structure surface rapid heating imprinting by using the tantalum coating according to claim 2, characterized in that: and in the fourth step, the mold is heated in an auxiliary way by changing the intensity of the electrified current, and high-temperature forming is carried out.
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| CN202010248319.1A CN111423100B (en) | 2020-04-01 | 2020-04-01 | Method for carrying out rapid heating and imprinting on surface of micro-nano structure by using tantalum coating |
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| CN112811795A (en) * | 2021-01-07 | 2021-05-18 | 长春理工大学 | Laser heating micro-nano photonics device mould pressing processing device and method |
| CN114956520B (en) * | 2022-04-12 | 2023-09-22 | 深圳技术大学 | Non-isothermal heated molding process |
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| JPH0725559B2 (en) * | 1988-06-10 | 1995-03-22 | キヤノン株式会社 | Mold for optical element molding |
| CN103286919A (en) * | 2013-05-20 | 2013-09-11 | 东莞劲胜精密组件股份有限公司 | Mold with the surface treated by graphene and manufacturing method of mold |
| CN103482625A (en) * | 2012-06-14 | 2014-01-01 | 中国人民解放军63971部队 | Niobium carbide and tantalum carbide electrode preparation method |
| CN103601188A (en) * | 2013-11-30 | 2014-02-26 | 吉林大学 | Preparation method for high-melting point conductive hard ceramic material carbide of tantalum |
| CN110304816A (en) * | 2019-01-25 | 2019-10-08 | 北京理工大学 | A kind of glass lens manufacturing method that array formation is cut one by one |
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Patent Citations (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0725559B2 (en) * | 1988-06-10 | 1995-03-22 | キヤノン株式会社 | Mold for optical element molding |
| CN103482625A (en) * | 2012-06-14 | 2014-01-01 | 中国人民解放军63971部队 | Niobium carbide and tantalum carbide electrode preparation method |
| CN103286919A (en) * | 2013-05-20 | 2013-09-11 | 东莞劲胜精密组件股份有限公司 | Mold with the surface treated by graphene and manufacturing method of mold |
| CN103601188A (en) * | 2013-11-30 | 2014-02-26 | 吉林大学 | Preparation method for high-melting point conductive hard ceramic material carbide of tantalum |
| CN110304816A (en) * | 2019-01-25 | 2019-10-08 | 北京理工大学 | A kind of glass lens manufacturing method that array formation is cut one by one |
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