CN111399090A - Optical lens, method for manufacturing optical lens, and optical imaging apparatus - Google Patents

Optical lens, method for manufacturing optical lens, and optical imaging apparatus Download PDF

Info

Publication number
CN111399090A
CN111399090A CN202010409597.0A CN202010409597A CN111399090A CN 111399090 A CN111399090 A CN 111399090A CN 202010409597 A CN202010409597 A CN 202010409597A CN 111399090 A CN111399090 A CN 111399090A
Authority
CN
China
Prior art keywords
optical lens
equal
less
refractive index
degrees
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN202010409597.0A
Other languages
Chinese (zh)
Inventor
蒯泽文
阮高梁
袁银潮
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Zhejiang Sunny Optics Co Ltd
Original Assignee
Zhejiang Sunny Optics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zhejiang Sunny Optics Co Ltd filed Critical Zhejiang Sunny Optics Co Ltd
Priority to CN202010409597.0A priority Critical patent/CN111399090A/en
Publication of CN111399090A publication Critical patent/CN111399090A/en
Pending legal-status Critical Current

Links

Images

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/081—Oxides of aluminium, magnesium or beryllium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/083—Oxides of refractory metals or yttrium
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/10—Glass or silica
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation

Abstract

The invention provides an optical lens, a method for manufacturing the optical lens and an optical imaging device. An optical lens, comprising: a lens substrate; the antireflection film system is arranged on at least one surface of the lens substrate and comprises a plurality of high-refractive-index film layers and a plurality of low-refractive-index film layers, the high-refractive-index film layers and the low-refractive-index film layers are alternately superposed, and the low-refractive-index film layers are in contact with air; the optical lens has a reflectivity of less than 2% for light with a wavelength of 600nm or more and 730nm or less. The invention solves the problem of poor antireflection effect of the optical lens in the prior art.

Description

Optical lens, method for manufacturing optical lens, and optical imaging apparatus
Technical Field
The invention relates to the technical field of optical imaging equipment, in particular to an optical lens, a manufacturing method of the optical lens and an optical imaging device.
Background
The brightness of the object or the illuminated surface illuminated by the light source is called illumination, and the relative illumination is the ratio of the peripheral illumination to the central illumination. The phenomenon that the center of the image is brighter and the periphery is darker due to too low relative illumination is known as vignetting phenomenon. Too low relative illumination can also cause color distortion, and in severe cases, the phenomenon of 'corner missing' of which four corners are completely black can occur. This is because the light flux of the lens gradually decreases from the center to the edge, that is, the light flux at the center of the lens is greater than that at the edge, so that the consistency between the center and the edge of the lens is poor, which is mainly related to the optical structure of the lens and the performance of the lens itself, such as reflection and absorption.
As shown in fig. 1, we assume that the center position and the edge position of the optical lens surface are consistent, however, when light enters the optical lens system, normal incidence occurs at the center position but oblique incidence occurs at the edge position. In practical production, the film system is designed according to the light ray (i.e. 0 ° vertical incidence) at the center of the lens. On the other hand, in the actual production process, due to the complexity of the lens surface type and the particularity of the coating equipment, the film layers at the central position and the edge position of the lens have consistency difference; if the difference between normal incidence and oblique incidence is added, the net result is a greater difference between the light rays at the center and edge of the lens. Although revolution and rotation planet coating equipment exists at present, the equipment is not generally used in production due to high cost and low efficiency.
When considering the antireflection coating, the incident film surface is assumed to be vertically incident (i.e. incident at 0 ° with respect to the normal), and the transmittance of the entire lens group is calculated according to the transmittance of the optical axis region of the lens, i.e. the incident angle from 0 °. In practical use, generally, the incident angle is in the range of 0 ° ± 15 ° and no big problem is considered according to 0 ° incidence, but because various digital image devices at present have strict requirements on imaging quality, the design of the lens is more and more elaborate, and more lenses with extremely concave or convex mirror surfaces are used, when the lenses are extremely concave or convex, the condition of large-angle incidence of light rays is inevitably generated, and at this time, a certain deviation is caused if the 0 ° incidence is considered. Due to the physical characteristics of the optical film, the coating curve can have a deviation phenomenon for the incident light rays with different angles, and the larger the incident angle is, the larger the deviation is. The optical and physical properties inherent in the coating film result in low transmittance at the edge position.
As can be seen from the graph of the change of the incident angle and the reflectivity of the antireflection film in the prior art as shown in fig. 2, when the incident angle is increased to 50 degrees, the reflectivity for long wave cannot meet the use requirement of the optical lens.
That is, the optical lens in the prior art has a problem of poor antireflection effect.
Disclosure of Invention
The invention mainly aims to provide an optical lens, a manufacturing method of the optical lens and an optical imaging device, and aims to solve the problem that the optical lens in the prior art is poor in antireflection effect.
In order to achieve the above object, according to one aspect of the present invention, there is provided an optical lens comprising: a lens substrate; the antireflection film system is arranged on at least one surface of the lens substrate and comprises a plurality of high-refractive-index film layers and a plurality of low-refractive-index film layers, the high-refractive-index film layers and the low-refractive-index film layers are alternately superposed, and the low-refractive-index film layers are in contact with air; the optical lens has a reflectivity of less than 2% for light with a wavelength of 600nm or more and 730nm or less.
Further, the incident angle θ of the optical lens is greater than 0 degree and equal to or less than 30 degrees; or the incidence angle theta of the optical lens is larger than 30 degrees and smaller than 40 degrees; or the incident angle theta of the optical lens is more than 40 degrees and less than 45 degrees; or the angle θ of the pair of optical lenses is greater than 45 degrees and equal to or less than 50 degrees.
Further, when the incident angle θ is greater than 0 degree and equal to or less than 30 degrees, the optical lens has a reflectivity of equal to or less than 0.5% for light with a wavelength of equal to or greater than 600nm and equal to or less than 730 nm; or when the incident angle theta is larger than 30 degrees and smaller than or equal to 40 degrees, the optical lens has a reflectivity of smaller than or equal to 1% for light with a wavelength of larger than or equal to 600 nanometers and smaller than or equal to 730 nanometers; or when the incident angle theta is larger than 40 degrees and smaller than 45 degrees, the optical lens has a reflectivity of less than or equal to 2% for light with a wavelength of more than or equal to 600 nanometers and less than or equal to 720 nanometers; or when the incident angle theta is greater than 45 degrees and less than or equal to 50 degrees, the optical lens has a reflectivity of less than or equal to 2% for light with a wavelength of greater than or equal to 600 nanometers and less than or equal to 720 nanometers.
Further, the refractive index of the lens substrate is 1.5 or more and 1.7 or less; and/or the lens substrate material comprises one or more of polymethylmethacrylate, epoxy resin, polyolefin, cyclic olefin copolymer, cyclic olefin, and ethylene copolymer.
Further, the refractive index of the high refractive index film layer is greater than or equal to 2.2 and less than or equal to 2.4; the refractive index of the low-refractive-index film layer is greater than or equal to 1.4 and less than or equal to 1.6.
Further, the material of the antireflection film system includes one or more of oxides, nitrides and oxynitrides of aluminum, titanium, silicon, tin, hafnium, tantalum, zirconium and niobium.
Further, the material of the high-refractive-index film layer is Ti3O5(ii) a The low refractive index film layer is made of Al2O3And SiO2A mixture of (a).
Further, the ratio of the total thickness of the high refractive index film layers to the total thickness of the low refractive index film layers is greater than or equal to 0.2 and less than or equal to 2.
According to another aspect of the present invention, there is provided a method for manufacturing an optical lens, the optical lens being manufactured by the method for manufacturing an optical lens, wherein the method for manufacturing an optical lens includes: putting a lens substrate of the optical lens into a coating cavity; and alternately depositing and evaporating a high-refractive-index material and a low-refractive-index material on at least one side surface of the lens substrate, introducing argon ions or oxygen ions into the coating cavity in the evaporation process, and impacting the high-refractive-index material and the low-refractive-index material to form a high-refractive-index film layer and a low-refractive-index film layer which are alternately stacked on the surface of the lens substrate.
According to another aspect of the present invention, an optical imaging device is provided, which includes the above optical lens, and the number of the optical lens is greater than or equal to 4.
By applying the technical scheme of the invention, the optical lens comprises a lens substrate and an antireflection film system, wherein the antireflection film system is arranged on at least one surface of the lens substrate and comprises a plurality of high-refractive-index film layers and a plurality of low-refractive-index film layers, the high-refractive-index film layers and the low-refractive-index film layers are alternately superposed, and the antireflection film system is in contact with air and is a low-refractive-index film layer; the optical lens has a reflectivity of less than 2% for light with a wavelength of 600nm or more and 730nm or less.
The reflection of light is reduced by arranging the antireflection film system on the lens substrate, so that the light transmittance of the optical lens is increased, and the imaging quality of the optical lens is improved. The antireflection film system is set to be in a mode of alternately superposing a plurality of high-refractive-index film layers and a plurality of low-refractive-index film layers, so that the reflectivity of the edge of the lens substrate to light rays can be reduced, the transmittance of the light rays is increased, the relative illumination is further increased, the vignetting phenomenon is reduced, and the imaging quality of the optical lens is improved. The relative illumination is reduced, the color distortion can be reduced, and the phenomenon of 'corner missing' that four corners of an image formed by the optical lens are completely black is avoided. The reflectivity of the optical lens to the light with the wavelength being more than or equal to 600 nanometers and less than or equal to 730 nanometers is less than 2 percent, the imaging quality of the optical lens can be improved, and the situation of color distortion can be reduced.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this application, illustrate embodiments of the invention and, together with the description, serve to explain the invention and not to limit the invention. In the drawings:
FIG. 1 is a schematic diagram showing the optical incidence angles at different positions of a high angle optical lens in the prior art; and
FIG. 2 shows a diagram of the reflectivity of an optical lens at different angles of incidence in the prior art;
fig. 3 is a schematic view showing the overall structure of an optical lens according to a first embodiment of the present invention;
FIG. 4 is a schematic diagram showing the reflectivity of the optical lens of FIG. 3 at different incident angles;
FIG. 5 is a schematic diagram showing the reflectivity of an optical lens according to a second embodiment of the present invention at different incident angles;
fig. 6 is a schematic diagram showing the reflectivity of an optical lens according to a third embodiment of the present invention at different incident angles;
fig. 7 shows a schematic diagram of the reflectivity of an optical lens according to a fourth embodiment of the present invention at different incident angles.
Wherein the figures include the following reference numerals:
10. a lens substrate; 20. an antireflection film system; 21. a high refractive index film layer; 22. a low refractive index film layer.
Detailed Description
It should be noted that the embodiments and features of the embodiments in the present application may be combined with each other without conflict. The present invention will be described in detail below with reference to the embodiments with reference to the attached drawings.
It is noted that, unless otherwise indicated, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this application belongs.
In the present invention, unless specified to the contrary, use of the terms of orientation such as "upper, lower, top, bottom" or the like, generally refer to the orientation as shown in the drawings, or to the component itself in a vertical, perpendicular, or gravitational orientation; likewise, for ease of understanding and description, "inner and outer" refer to the inner and outer relative to the profile of the components themselves, but the above directional words are not intended to limit the invention.
The invention provides an optical lens, a manufacturing method of the optical lens and an optical imaging device, aiming at solving the problem that the optical lens in the prior art is poor in antireflection effect.
As shown in fig. 3 to 7, the optical lens includes a lens substrate 10 and an antireflection film system 20, the antireflection film system 20 is disposed on at least one surface of the lens substrate 10, the antireflection film system 20 includes a plurality of high refractive index film layers 21 and a plurality of low refractive index film layers 22, the high refractive index film layers 21 and the low refractive index film layers 22 are alternately stacked, and the low refractive index film layers 22 are disposed on the antireflection film system 20 in contact with air; the optical lens has a reflectivity of less than 2% for light with a wavelength of 600nm or more and 730nm or less.
The antireflection film system 20 is disposed on the lens substrate 10 to reduce the reflection of light, so as to increase the transmittance of light of the optical lens and increase the imaging quality of the optical lens. The antireflection film system 20 is arranged in a manner that the plurality of high refractive index film layers 21 and the plurality of low refractive index film layers 22 are alternately stacked, so that the reflectivity of the edge of the lens substrate 10 to light can be reduced, the transmittance of the light can be increased, the relative illumination can be increased, the vignetting phenomenon can be reduced, and the imaging quality of the optical lens can be improved. The relative illumination is reduced, the color distortion can be reduced, and the phenomenon of 'corner missing' that four corners of an image formed by the optical lens are completely black is avoided. The reflectivity of the optical lens to the light with the wavelength being more than or equal to 600 nanometers and less than or equal to 730 nanometers is less than 2 percent, the imaging quality of the optical lens can be improved, and the situation of color distortion can be reduced.
Specifically, the incident angle θ of the optical lens is greater than 0 degree and equal to or less than 30 degrees; or the incidence angle theta of the optical lens is larger than 30 degrees and smaller than 40 degrees; or the incident angle theta of the optical lens is more than 40 degrees and less than 45 degrees; or the incident angle theta of the optical lens is greater than 45 degrees and equal to or less than 50 degrees. When the incidence angle theta of the optical lens is in the range of more than 0 degree and less than or equal to 30 degrees, more than 30 degrees and less than 40 degrees, more than 40 degrees and less than 45 degrees, more than 45 degrees and less than or equal to 50 degrees, the reflectivity of the optical lens to the light with the wavelength of more than or equal to 600 nanometers and less than or equal to 730 nanometers is less than 2 percent, so that the optical lens can reduce the reflectivity of the light incident at a large angle, the transmittance of the edge of the optical lens is increased, the relative illumination of the optical lens is increased, and the imaging quality of the optical lens is improved.
In this embodiment, when the incident angle θ is greater than 0 degrees and equal to or less than 30 degrees, the reflectivity of the optical lens to light with a wavelength greater than or equal to 600 nanometers and equal to or less than 730 nanometers is equal to or less than 0.5%; or when the incident angle theta is larger than 30 degrees and smaller than or equal to 40 degrees, the optical lens has a reflectivity of smaller than or equal to 1% for light with a wavelength of larger than or equal to 600 nanometers and smaller than or equal to 730 nanometers; or when the incident angle theta is larger than 40 degrees and smaller than 45 degrees, the optical lens has a reflectivity of less than or equal to 2% for light with a wavelength of more than or equal to 600 nanometers and less than or equal to 720 nanometers; or when the incident angle theta is greater than 45 degrees and less than or equal to 50 degrees, the optical lens has a reflectivity of less than or equal to 2% for light with a wavelength of greater than or equal to 600 nanometers and less than or equal to 720 nanometers.
In the present embodiment, the refractive index of the lens substrate 10 is 1.5 or more and 1.7 or less. The refractive index of the lens substrate 10 is limited to a range of 1.5 to 1.7 so that the thickness of the lens substrate 10 is not too thick to make the optical lens thinner.
The material of the lens substrate 10 includes one or more of polymethyl methacrylate, epoxy resin, polyolefin, cyclic olefin copolymer, cyclic olefin, and ethylene copolymer. The lens substrate 10 may be made of one material selected from the group consisting of methyl methacrylate, epoxy resin, polyolefin, cyclic olefin copolymer, cyclic olefin and ethylene copolymer, or may be formed by mixing several materials selected from the group consisting of methyl methacrylate, epoxy resin, polyolefin, cyclic olefin copolymer, cyclic olefin and ethylene copolymer. Here, mixing means physical mixing rather than chemical reaction to form a new substance.
When the lens substrate 10 is made of a plurality of materials, the plurality of materials are physically mixed without causing chemical reaction. Further, the lens substrate 10 herein is a resin material that is conventionally used in the art, not a glass material, and is not formed into a new material.
In the present embodiment, the refractive index of the high refractive index film layer 21 is 2.2 or more and 2.4 or less; the low refractive index film layer 22 has a refractive index of 1.4 or more and 1.6 or less. The high refractive index film layer 21 and the low refractive index film layer 22 are different from the refractive index of the lens substrate 10 by the arrangement, the antireflection film system 20 is arranged on the lens substrate 10, so that the conditions of reflection, refraction and absorption of the optical lens to light rays are different from the conditions of reflection, refraction and absorption of the lens substrate 10 to light rays, the light flux of the center and the edge of the optical lens is changed, the relative illumination of the optical lens is improved, the generation of stray light and ghost image is reduced, and the imaging quality of the optical lens is improved.
In the present embodiment, the material of the antireflection film system 20 includes one or more of oxides, nitrides, and oxynitrides of aluminum, titanium, silicon, tin, hafnium, tantalum, zirconium, and niobium. The antireflection film system 20 may be formed of one of the oxides, nitrides and oxynitrides of aluminum, titanium, silicon, tin, hafnium, tantalum, zirconium and niobium, or may be formed by mixing several of the oxides, nitrides and oxynitrides of aluminum, titanium, silicon, tin, hafnium, tantalum, zirconium and niobium. Here, mixing means physical mixing rather than chemical reaction to form a new substance.
When the material of the antireflection film system 20 is plural, the plural materials are physically mixed and do not react chemically. In addition, the antireflection film system 20 herein is a material of some antireflection film systems 20 commonly used in the industry, and is not a new material to be formed, nor a material to be formed by applying a new composition ratio.
Specifically, the material of the high refractive index film layer 21 is Ti3O5(ii) a The low refractive index film layer 22 is made of Al2O3And SiO2A mixture of (a).
When the material of the low refractive index film layer 22 is plural, the plural materials are physically mixed and do not chemically react. In addition, the low refractive index film layer 22 herein is some of the low refractive index film layer 22 materials commonly used in the industry, and is not a new material to be formed, nor a material to be formed by applying a new composition ratio.
In the present embodiment, the ratio of the total thickness of the high refractive index film layers 21 to the total thickness of the low refractive index film layers 22 is greater than or equal to 0.2 and less than or equal to 2. The arrangement can ensure that the light flux of the center and the edge of the lens substrate 10 can be changed after the antireflection film system 20 is coated on the lens substrate 10, so that the relative illumination of the optical lens is improved, the generation of stray light and ghost image is reduced, and the imaging quality of the optical lens is improved.
The structure of the optical lens in the present application can be expressed as Sub/(H L) ^ m/Air or Sub/L (H L) ^ m/Air, where Sub denotes the lens substrate 10, H denotes the high refractive index film layer 21, L denotes the low refractive index film layer 22, m denotes the number of times the high refractive index film layer 21 and the low refractive index film layer 22 are alternated, and m is 1 or more.
The optical lens in the application can meet the requirement that the optical lens still has lower reflectivity in a long wave range under the condition of large-angle incidence.
The light paths generated by the light rays are different due to the difference between the central position and the edge position of the optical lens, that is, the central position of the optical lens is vertical incidence, the edge position of the optical lens is oblique incidence, and when a film system is generally designed, only the vertical incidence condition is considered, but the antireflection film system 20 in the application is designed on the basis of considering large-angle oblique incidence. The antireflection film system 20 in the application solves the problem of high reflection caused by oblique incidence of light at the edge of the optical lens, thereby reducing ghost images and stray light generated by unnecessary light, reducing the peripheral illumination of the light source on the object image surface by reflection at the edge of the optical lens, namely reducing the difference value between the central illumination and the peripheral illumination, and further improving the relative illumination.
Table one: testing of relative illumination RI values for optical lenses of the prior art and optical lenses of the present application
Figure BDA0002492699180000061
As shown in table one, it can be seen from the comparison of the relative illuminance RI values of the optical lens in the prior art and the optical lens in the present application with the average value of the relative illuminance RI values in different fields (-1.0 field and 1.0 field), that the relative illuminance RI value is increased by almost 4 points by using the optical lens in the present application, which indicates that the difference between the central illuminance and the edge illuminance is reduced, so that the luminous flux of the optical lens is increased.
The optical lens is manufactured by a manufacturing method of the optical lens, wherein the manufacturing method of the optical lens comprises the following steps: putting a lens substrate 10 of an optical lens into a coating cavity; high refractive index materials and low refractive index materials are alternately deposited and evaporated on at least one side surface of the lens substrate 10, and argon ions or oxygen ions are introduced into the coating cavity and impact is carried out on the high refractive index materials and the low refractive index materials in the evaporation process, so that high refractive index film layers 21 and low refractive index film layers 22 which are alternately stacked are formed on the surface of the lens substrate 10. The high refractive index material and the low refractive index material are evaporated by alternate deposition on the lens substrate 10 to form the high refractive index film layer 21 and the low refractive index film layer 22 alternately stacked on the lens substrate 10.
The optical imaging device comprises the optical lenses, and the number of the optical lenses is more than or equal to 4. The arrangement can increase the imaging quality of the imaging device and reduce the color distortion.
Example one
In the embodiment shown in FIG. 3, the optical lens comprises a lens substrate 10 and an antireflection film system 20, and the structure of the optical lens is Sub/(H L) ^ m/Air, where m is 4, i.e. starting from the lens substrate 10, the first layer is a high refractive index film layer 21, the second layer is a low refractive index film layer 22, the third layer is a high refractive index film layer 21, and the fourth layer is a low refractive index film layer 22, which are repeated four times3O5The high refractive index film layer 21 is 2.26, and the low refractive index film layer 22 is made of Al2O3And SiO2And the low refractive index film layer 22 has a refractive index of 1.46. In the present embodiment, the thickness of each film layer from the direction close to the lens substrate 10 to the direction far from the lens substrate 10 is: 10.28nm, 57.22nm, 12.75nm, 164.24nm, 8.35nm, 44.98nm, 118.31nm and 94.87 nm.
As shown in fig. 4, the relationship between the incident angle and the reflectivity of the antireflection film of the present embodiment is schematically shown. As can be seen from the view of figure 4,
when the light is incident perpendicularly, i.e. the incident angle θ is 0 °, the reflectance of the antireflection film system 20 to the light with the wavelength of 600nm to 730nm is less than or equal to 0.2%.
When the incident angle θ is increased, i.e., when the incident angle θ is greater than 0 ° and equal to or less than 30 °, the reflectance of the antireflection film system 20 to light with a wavelength of 600nm to 730nm is equal to or less than 0.3%.
As the incident angle θ increases to 40 °, i.e., the incident angle θ is greater than 30 ° and less than 40 °, the reflectance of the antireflection film system 20 to light with a wavelength of 600nm to 730nm is less than or equal to 1%, which still meets the usage requirement of the optical lens and still has a wide bandwidth.
When the incident angle θ is further increased to 50 °, the reflectance of the antireflection film system 20 to light with a wavelength of 600nm to 730nm is less than or equal to 2%, which does not exceed the usage requirement of the optical lens.
The optical lens in the application can still keep low reflection performance in a wide spectral range even under the condition of large-angle incidence.
Example two
The difference from the first embodiment is that the specific structure of the antireflection film system 20 is different.
In the present embodiment, the optical lens includes a lens substrate 10 and an antireflection film system 20, and the structure of the optical lens is Sub/L (H L) ^ m/Air, where m is 4, i.e. starting from the lens substrate 10, the first layer is a low refractive index film layer 22, the second layer is a high refractive index film layer 21, the third layer is a low refractive index film layer 22, the fourth layer is a high refractive index film layer 21, the fifth layer is a low refractive index film layer 22, the sixth layer is a high refractive index film layer 21, the seventh layer is a low refractive index film layer 22, the eighth layer is a high refractive index film layer 21, and the ninth layer is a low refractive index film layer 22, so as to ensure that the low refractive index film layer 22 contacts with Air3O5The high refractive index film layer 21 is 2.26, and the low refractive index film layer 22 is made of Al2O3And SiO2And the low refractive index film layer 22 has a refractive index of 1.46. In the present embodiment, the thickness of each film layer from the direction close to the lens substrate 10 to the direction far from the lens substrate 10 is: 6nm, 11.27nm, 57.23nm, 12.73nm, 164.07nm, 8.36nm, 45.04nm, 118.33nm and 94.88 nm.
As can be seen from fig. 5, in the present embodiment, the reflectance of the antireflection film system 20 at different incident angles θ to light with a wavelength of 600nm to 730nm is not repeated here.
EXAMPLE III
The difference from the first embodiment is that the material of the antireflection film system 20 is different.
In the present embodiment, the optical lens comprises a lens substrate 10 and an antireflection film system 20, and the structure of the optical lens is Sub/(H L) ^ m/Air, where m is 4, i.e. from the lens substrate 10, the first layer is a high refractive index film layer 21, the second layer is a low refractive index film layer 22, the third layer is a high refractive index film layer 21, and the fourth layer is a low refractive index film layer 22, which are repeated four times2O5The high refractive index film layer 21 is 2.22, and the low refractive index film layer 22 is made of SiO2And the low refractive index film layer 22 has a refractive index of 1.48. In the present embodiment, the thickness of each film layer from the direction close to the lens substrate 10 to the direction far from the lens substrate 10 is: 14.59nm, 49.73nm, 32.11nm, 51.35nm, 37.61nm, 35.52nm, 141.17nm and 99.96 nm.
As can be seen from fig. 6, the reflectance of the antireflection film system 20 with respect to light with a wavelength of 600nm to 730nm under different incident angles θ in this embodiment is similar to that of the embodiment, and is not described in detail here.
Example four
The difference from the first embodiment is that the number of layers of the antireflection film system 20 is different.
In the present embodiment, the optical lens comprises a lens substrate 10 and an antireflection film system 20, and the structure of the optical lens is Sub/(H L) ^ m/Air, where m is 5, i.e. from the lens substrate 10, the first layer is a high refractive index film layer 21, the second layer is a low refractive index film layer 22, the third layer is a high refractive index film layer 21, and the fourth layer is a low refractive index film layer 22, which are repeated five times3O5The high refractive index film layer 21 is 2.26, and the low refractive index film layer 22 is made of Al2O3And SiO2And the low refractive index film layer 22 has a refractive index of 1.46. In the present embodiment, the thickness of each film layer from the direction close to the lens substrate 10 to the direction far from the lens substrate 10 is: 10.02nm, 53.96nm, 8nm, 10nm and 4.95nm、154.07nm、8.7nm、46.54nm、118.88nm、94.94nm。
As can be seen from fig. 7, in the present embodiment, the reflectance of the antireflection film system 20 at different incident angles θ to light with a wavelength of 600nm to 730nm is not repeated here.
It is to be understood that the above-described embodiments are only a few, but not all, embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of example embodiments according to the present application. As used herein, the singular is intended to include the plural unless the context clearly dictates otherwise, and it should be further understood that the terms "comprises" and/or "comprising," when used in this specification, specify the presence of features, steps, operations, devices, components, and/or combinations thereof.
It should be noted that the terms "first," "second," and the like in the description and claims of this application and in the drawings described above are used for distinguishing between similar elements and not necessarily for describing a particular sequential or chronological order. It is to be understood that the data so used is interchangeable under appropriate circumstances such that the embodiments of the application described herein are capable of operation in sequences other than those illustrated or described herein.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (10)

1. An optical lens, comprising:
a lens substrate (10);
an antireflection film system (20), the antireflection film system (20) being disposed on at least one surface of the lens substrate (10), the antireflection film system (20) including a plurality of high refractive index film layers (21) and a plurality of low refractive index film layers (22), the high refractive index film layers (21) and the low refractive index film layers (22) being alternately stacked, and the antireflection film system (20) being a low refractive index film layer (22) in contact with air;
wherein, the optical lens has a reflectivity of less than 2% for light with a wavelength of 600nm or more and 730nm or less.
2. The optical lens according to claim 1,
the incident angle theta of the optical lens is greater than 0 degree and less than or equal to 30 degrees; or
The incident angle theta of the optical lens is larger than 30 degrees and smaller than 40 degrees; or
The incident angle theta of the optical lens is larger than 40 degrees and smaller than 45 degrees; or
The incident angle theta of the optical lens is greater than 45 degrees and less than or equal to 50 degrees.
3. The optical lens according to claim 2,
when the incident angle theta is greater than 0 degree and less than or equal to 30 degrees, the reflectivity of the optical lens to light with the wavelength of greater than or equal to 600 nanometers and less than or equal to 730 nanometers is less than or equal to 0.5 percent; or
When the incidence angle theta is larger than 30 degrees and less than or equal to 40 degrees, the reflectivity of the optical lens to light with the wavelength of larger than or equal to 600 nanometers and less than or equal to 730 nanometers is less than or equal to 1%; or
When the incidence angle theta is larger than 40 degrees and smaller than 45 degrees, the reflectivity of the optical lens to light with the wavelength larger than or equal to 600 nanometers and smaller than or equal to 720 nanometers is smaller than or equal to 2%; or
When the incident angle theta is larger than 45 degrees and smaller than or equal to 50 degrees, the reflectivity of the optical lens to the light with the wavelength larger than or equal to 600 nanometers and smaller than or equal to 720 nanometers is smaller than or equal to 2%.
4. The optical lens according to claim 1,
the refractive index of the lens substrate (10) is 1.5 or more and 1.7 or less; and/or
The material of the lens substrate (10) comprises one or more of polymethyl methacrylate, epoxy resin, polyolefin, cyclic olefin copolymer, cyclic olefin and ethylene copolymer.
5. The optical lens according to claim 1,
the refractive index of the high-refractive-index film layer (21) is greater than or equal to 2.2 and less than or equal to 2.4;
the refractive index of the low-refractive-index film layer (22) is greater than or equal to 1.4 and less than or equal to 1.6.
6. The optical lens according to claim 5, wherein the material of the antireflection film system (20) comprises one or more of oxides, nitrides, oxynitrides of aluminum, titanium, silicon, tin, hafnium, tantalum, zirconium, niobium.
7. The optical lens according to claim 5,
the high-refractive-index film layer (21) is made of Ti3O5；
The low refractive index film layer (22) is made of Al2O3And SiO2A mixture of (a).
8. The optical lens according to any one of claims 1 to 7, wherein the ratio of the total thickness of the plurality of high refractive index film layers (21) to the total thickness of the plurality of low refractive index film layers (22) is 0.2 or more and 2 or less.
9. A method for manufacturing an optical lens, wherein the optical lens according to any one of claims 1 to 8 is manufactured by the method for manufacturing an optical lens, wherein the method for manufacturing an optical lens includes:
placing a lens substrate (10) of the optical lens into a coating cavity;
and alternately depositing and evaporating a high-refractive-index material and a low-refractive-index material on at least one side surface of the lens substrate (10), and introducing argon ions or oxygen ions into the coating cavity and impacting the high-refractive-index material and the low-refractive-index material in the evaporation process so as to form a high-refractive-index film layer (21) and a low-refractive-index film layer (22) which are alternately stacked on the surface of the lens substrate (10).
10. An optical imaging device, characterized in that the optical imaging device comprises the optical lens of any one of claims 1 to 8, and the number of the optical lens is equal to or greater than 4.
CN202010409597.0A 2020-05-14 2020-05-14 Optical lens, method for manufacturing optical lens, and optical imaging apparatus Pending CN111399090A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN202010409597.0A CN111399090A (en) 2020-05-14 2020-05-14 Optical lens, method for manufacturing optical lens, and optical imaging apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN202010409597.0A CN111399090A (en) 2020-05-14 2020-05-14 Optical lens, method for manufacturing optical lens, and optical imaging apparatus

Publications (1)

Publication Number Publication Date
CN111399090A true CN111399090A (en) 2020-07-10

Family

ID=71437578

Family Applications (1)

Application Number Title Priority Date Filing Date
CN202010409597.0A Pending CN111399090A (en) 2020-05-14 2020-05-14 Optical lens, method for manufacturing optical lens, and optical imaging apparatus

Country Status (1)

Country Link
CN (1) CN111399090A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112785926A (en) * 2020-12-31 2021-05-11 上海天马微电子有限公司 Cover plate, display panel and manufacturing method of cover plate
CN113031119A (en) * 2020-09-21 2021-06-25 威海世高光电子有限公司 Optical lens, manufacturing method of optical lens and micro projection system

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113031119A (en) * 2020-09-21 2021-06-25 威海世高光电子有限公司 Optical lens, manufacturing method of optical lens and micro projection system
CN112785926A (en) * 2020-12-31 2021-05-11 上海天马微电子有限公司 Cover plate, display panel and manufacturing method of cover plate

Similar Documents

Publication Publication Date Title
TWI432770B (en) Optical system
US9423530B2 (en) Optical element, and optical system and optical apparatus using same
US20080013178A1 (en) Dielectric multilayer filter
CN212623161U (en) Optical lens and optical imaging device
US9513417B2 (en) Optical filter and optical apparatus
WO2016104590A1 (en) Optical filter and image pickup device
CN111399090A (en) Optical lens, method for manufacturing optical lens, and optical imaging apparatus
JP6362105B2 (en) Optical element, optical system, and optical device having antireflection film
JP2015094885A (en) Optical element, optical system and optical device
WO2019230758A1 (en) Fine pattern film and head-up display device
TW201504033A (en) Infrared filter
US20060227267A1 (en) Substrate for semi-transmitting type liquid crystal display element and semi-transmitting type liquid crystal display element including the substrate
CN112764135A (en) Narrow-band antireflection film with extremely low residual reflection
JP2002014203A (en) Antireflection film and optical member using the same
CN216526487U (en) Optical lens, image capturing device and electronic device
CN206872679U (en) A kind of visible ray wide band antireflective glass
TW202225734A (en) Optical lens assembly, imaging apparatus and electronic device
JP2001100002A (en) Antireflection film and optical member using same
CN212031777U (en) Optical element and optical lens
CN1885065A (en) Film layer structure of optical lens
TWI629516B (en) Anti-halo low warpage optical low pass filter
TWM525452U (en) Cover lens
CN110716257A (en) Method for manufacturing phase difference element, and projection type image display device
CN215449654U (en) Optical lens
TWI761774B (en) Optical film, optical lens, lens module and electronic devices

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination