CN111334209A - High-strength photoelectric protective film for identifying fingerprints under screen and preparation method thereof - Google Patents
High-strength photoelectric protective film for identifying fingerprints under screen and preparation method thereof Download PDFInfo
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- CN111334209A CN111334209A CN201811558964.2A CN201811558964A CN111334209A CN 111334209 A CN111334209 A CN 111334209A CN 201811558964 A CN201811558964 A CN 201811558964A CN 111334209 A CN111334209 A CN 111334209A
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Abstract
The invention provides a high-strength photoelectric protective film for identifying fingerprints under a screen, which is sequentially provided with a special resin protective film layer, a first silica gel layer, a hardening layer, a PC (polycarbonate) base film layer, a second silica gel layer and a special resin release film layer from top to bottom, wherein the PC base film layer is a low-phase difference film, and the phase difference of the low-phase difference film in the Re direction and the Rth direction is less than 30 nm; the preparation method comprises the steps of firstly coating the anti-corrosion easy-to-adhere layer on the PC material base layer film, and then sequentially laminating the layers to obtain the PC material base layer film; according to the photoelectric protective film provided by the technical scheme, the PC material base film layer is a low-phase difference film, so that a large phase difference does not exist, and the fingerprint identification degree and response speed of the photoelectric protective film can be effectively improved; and after the mobile phone is pasted with the protective film, a user can normally watch the screen by wearing polarized glasses or sunglasses, the problem of color ghost distortion of the screen cannot be caused, and the fidelity is ensured.
Description
Technical Field
The invention belongs to the technical field of screen protective films, and particularly relates to a high-strength photoelectric protective film for identifying fingerprints under a screen and a preparation method thereof.
Background
With the rapid development of the mobile internet era, information interaction between mobile terminal users is also multiplied.
The biometric identification technology in the interactive unlocking scheme of the mobile smart phone is an emerging interactive technology which is gradually accepted by the public under the introduction of the era, wherein the fingerprint identification unlocking technology is a very convenient and fast unlocking scheme. Along with the continuous innovation of the mobile phone technology, the technology of invisible fingerprint black under the mobile phone screen is about to become the mainstream, and the PC product is used for the protective film of the mobile phone screen unlocked by the more popular fingerprint under the screen in the current market, so that the protective film not only can protect the mobile phone screen, but also can effectively improve the recognition rate of the fingerprint and the response speed of fingerprint recognition, wherein the recognition rate is more than twice of that of the protective film made of common optical materials, the recognition rate can reach 99.99%, and the response speed of the recognition can be improved to be within 0.2 ms.
Based on the method, the screen protection film which can protect the screen of the mobile phone, can be applied to fingerprint identification and has high identification success rate and high speed is researched and manufactured to be very important.
Disclosure of Invention
The invention provides a high-strength photoelectric protective film for fingerprint identification under a screen and a preparation method thereof, wherein the photoelectric protective film can ensure fingerprint identification and speed, protect a mobile phone screen and ensure the fidelity of a screen image.
In order to solve the technical problems, the invention provides a high-strength photoelectric protective film for identifying fingerprints under a screen and a preparation method thereof, wherein the photoelectric protective film comprises a special material resin protective film layer, a first silica gel layer, a hardening layer, a PC material base film layer, a second silica gel layer and a special material resin release film layer which are sequentially arranged from top to bottom, the PC material base film layer is a low-phase difference film, and the phase difference of the low-phase difference film in the Re direction and the Rth direction is less than 30 nm.
In a first possible implementation manner, at least one surface of the upper surface and the lower surface of the PC base film layer is coated with an anti-corrosion easy-adhesion layer.
In combination with the first possible implementation manner, in the second possible implementation manner, the thicknesses of the special material resin protection film layer and the special material resin release film layer are both 25 to 360 μm, and the materials are all made of one of PC materials and general optical plastic films with the thermal shrinkage rate of less than 0.3% in an environment of 150 ℃.
With reference to the first possible implementation manner, in a third possible implementation manner, the thickness of the first silica gel layer is 4 to 30 μm, the peeling force is 1 to 30g, the tearing force is 0.5 to 10g, the light transmittance is 87 to 96%, and the haze range is 0.2 to 3.5%.
With reference to the first possible implementation manner, in a fourth possible implementation manner, the thickness of the hardened layer is 1 to 10 μm, the hardness is 1H to 9H, and the hardening liquid of the hardened layer is one of a solvent type hardening liquid and a water-based UV hardening liquid.
With reference to the first possible implementation manner, in a fifth possible implementation manner, the thickness of the PC material base film is 25 to 360 μm, and the PC material base film is one of a single-layer PC material base film and a double-layer PC material base film.
With reference to the first possible implementation manner, in a sixth possible implementation manner, the thickness of the second silica gel layer is 8 to 80 μm, the tearing force is greater than 15g, the peeling force is 2 to 800g, the light transmittance is 88 to 96%, and the haze is 0.2 to 2.5%.
In combination with the first possible implementation manner, in a seventh possible implementation manner, the material of the corrosion-prevention easy adhesion layer is a composite of one or more of polyester, polyurethane, acrylic and silicone coatings.
The invention also provides a preparation method of the high-strength photoelectric protective film for identifying the fingerprints under the screen, which comprises the specific steps of firstly coating the anti-corrosion easy-to-adhere layer on the PC material base layer film, and then sequentially overlapping other layers on the upper surface and the lower surface of the PC material base layer film to obtain the high-strength photoelectric protective film for identifying the fingerprints under the screen.
The invention has the beneficial effects that:
1) the PC material base film layer is a low-phase difference film, so that the phase difference in the Re direction and the Rth direction is less than 30nm, a large phase difference does not exist, and the fingerprint identification degree and the response speed of the photoelectric protective film can be effectively improved; and after the mobile phone is pasted with the protective film, a user can normally watch the screen by wearing polarized glasses or sunglasses, the problem of color ghost distortion of the screen cannot be caused, and the fidelity is ensured.
2) The special material resin protection film layer, the PC material base film layer and the special material resin release film layer of the photoelectric protection film all adopt PC materials as base films, the problem of warping of products after large-radian hot press forming can be effectively solved, and the film sticking yield is effectively improved.
Drawings
In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required to be used in the embodiments of the present invention will be briefly described below, and it is obvious that the drawings described below are only some embodiments of the present invention, and for those skilled in the art, other drawings can be obtained according to the following drawings without any inventive work.
Fig. 1 is a schematic structural diagram of a high-strength photoelectric protective film for identifying fingerprints under a screen according to a first embodiment of the present invention.
Fig. 2 is a schematic structural diagram of a high-strength photoelectric protective film for identifying fingerprints under a screen according to a second embodiment of the present invention.
Fig. 3 is a schematic structural diagram of a high-strength photoelectric protective film for identifying fingerprints under a screen according to a third embodiment of the present invention.
Fig. 4 is a schematic structural diagram of a high-strength photoelectric protective film for finger mark recognition under a screen according to a fourth embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the specific embodiments given herein without any inventive step, are within the scope of protection of the present invention.
The first embodiment is as follows:
the photoelectric protection film that this embodiment provided, as shown in fig. 1, including special material resin protective layer 1, first silica gel layer 2, sclerosis layer 3, PC material base film layer 4, second silica gel layer 5 and the special material resin that from top to bottom sets gradually from type rete 6, it easily follows layer 7 to coat on the upper surface of PC material base film layer 4 the anticorrosion.
The thickness of the special material resin protection layer 1 is 25-360 mu m, the preferable thickness is 36-100 mu m, the material is preferably a PC material, or the general optical plastic film has a material thermal shrinkage rate of less than 0.3% in an environment of 150 ℃ as the PC material.
The thickness of the special material resin protection layer 1 in this embodiment is 50 μm, and a PC material is selected as the material.
The thickness of the first silica gel layer 2 is 4-30 mu m, preferably 8-15 mu m, the peeling force is 1-30g, preferably 1.5-20g, the tearing force is 0.5-10g, preferably 0.5-4g, the light transmittance is 87% -96%, preferably 88.5% -92.5%, and the haze range is 0.2% -3.5%, preferably 0.5% -2.5%.
In this embodiment, the thickness of the first silica gel layer 2 is 10 μm, the peeling force is 6g, the tearing force is 3g, the light transmittance is 90%, and the haze is 1.5%.
The thickness of the hardened layer 3 is 1-10 mu m, preferably 2-5.5 mu m, and the hardness of the surface of the hardened layer 3 is 1H-9H (the test weight is 500 g), preferably 1H-3H; and the rainbow texture characteristics of the hardened layer 3 observed under a TL84 light source are low rainbow appearance; the abrasion resistance range of the hardening layer 3 is 10000 times (1000 g-0000# steel wool), preferably 5000 times; the water drop angle on the surface of the hardened layer 3 is 75-115 degrees, preferably 95-103 degrees, and the water drop angle after the wear resistance test is still larger than 70 degrees; the oil drop angle on the surface of the hardened layer 3 is more than 45 degrees, preferably more than 55 degrees; the adhesive force of the hardened layer 3 is greater than 4B, preferably 5B in a Baige adhesive force test, and the hardened layer can not fall off after being boiled for 1 h; the surface impedance of the hardened layer 3 is more than 1.0 x 107, and the friction voltage of the hardened layer (100% cotton cloth is used for rubbing for 20 times in one direction at the speed of 2 times/s on the surface of the hardened layer with 2kg force) is less than 400V; the surface friction coefficient of the hardened layer 3 is less than 0.2, preferably less than 0.1; the hardening liquid of the hardening layer 3 is one of a solvent type and a water-based UV hardening liquid, preferably a solvent type UV hardening liquid, and the solvent type UV hardening liquid can be a high-definition type or a frosted type, preferably a low-absorption high-definition type UV hardening liquid.
The thickness of sclerosis layer 3 in this embodiment is 4.5 mu m, and surface hardness is 2H, and wear-resisting 2500 times, surface water droplet angle 100, and the water droplet angle after wear-resisting test is greater than 70, and surface oil droplet angle is greater than 55, and surface hardening layer friction voltage 250V, surface friction coefficient 0.05, the solution that hardens on sclerosis layer 3 is the solvent type high definition UV hardening liquid of low absorption rate.
The thickness of the PC material base film layer 4 is 25-360 mu m, preferably 50-188 mu m, the PC material base film layer 4 is a low-phase difference film, the phase difference of the Re and Rth directions of the low-phase difference film is less than 30nm, and the PC material base film layer is one of a single-layer PC material base film and a double-layer PC material base film.
The PC base film layer 4 in the embodiment is a single-layer PC base film with the thickness of 75 mu m and a low-phase difference film; the PC material base film layer 4 is a low-phase difference film, and the phase difference in the Re direction and the Rth direction is less than 30nm, so that large phase difference does not exist, and the fingerprint identification degree and the response speed of the photoelectric protective film can be effectively improved; and after the mobile phone is pasted with the protective film, a user can normally watch the screen by wearing polarized glasses or sunglasses, the problem of color ghost distortion of the screen cannot be caused, and the fidelity is ensured.
Since the layer substrate is preferably a PC substrate, but the PC substrate is easily corroded to a certain extent by almost all organic solvents on the market, when the hardened layer 3 is coated on the PC base film layer 4 or the second silica gel layer 5 is mounted, the PC film is easily corroded, and the strength of the PC film itself is reduced, so that in order to improve the tensile strength of the PC material, the anti-corrosion easy-adhesion layer 7 is coated on the PC base film layer 4 in advance, the anti-corrosion easy-adhesion layer 7 is made of a composite material of one or more of polyester, polyurethane, acrylic and silicone coatings, and is a special water-based or solvent-based system, and the anti-corrosion easy-adhesion layer 7 is coated on at least one of the upper surface and the lower surface of the PC base film layer 4.
In this embodiment, the corrosion-resistant easy adhesion layer 7 is a solvent-based acrylic material and is coated on the upper surface of the PC base film 4. After the PC base film layer 4 behind the anti-corrosion easy-to-adhere layer 7 is coated, the hardened layer 3 and the second silica gel layer 5 are coated, the Young modulus of the base material is still smaller than 2300MPa, the tensile strength is larger than 60MPa, the elongation at break is larger than 80%, the Tg is larger than 145 ℃, the light transmittance is larger than 90%, the haze is smaller than 1%, the coating of the anti-corrosion easy-to-adhere layer 7 does not influence the using heat forming effect, and on the premise that the tearing strength deterioration after the PC base film is coated is not considered, the adhesive force of glue solution after coating can be enhanced through corona treatment before the PC base film is coated.
The thickness of the second silica gel layer 5 is 8-80 mu m, preferably 15-45 mu m, the attaching and tearing force of the second silica gel layer to a liquid crystal screen with a 115-degree water drop angle is larger than 15g, preferably larger than 20g, the peeling force is 2-800g, preferably 50-300g, the light transmittance is 88% -96%, preferably 89.5% -92.5%, and the haze is 0.2% -2.5%, preferably 0.5% -1.5%.
In this embodiment, the thickness of the second silica gel layer 5 is 30 μm, the attaching and tearing force with the liquid crystal screen with a 115-degree water drop angle is greater than 20g, the peeling force is 150g, the light transmittance is 90%, and the haze is 1%.
The thickness of the special material resin release film layer 6 is 25-360 mu m, preferably 50-188 mu m, the material is preferably a PC material, and the special material resin release film layer can also be various general optical plastic films with the material thermal shrinkage rate of less than 0.3% in the environment of 150 ℃ as the PC material.
The thickness of the special material resin release film layer 6 in this embodiment is 100 μm, and the special material resin release film layer is made of a PC material.
The special material resin protection film layer 1, the PC material base film layer 4 and the special material resin release film layer 6 of the photoelectric protection film all adopt PC materials as base films, the problem of warping of products after large-radian hot press molding can be effectively solved, and the film sticking yield is effectively improved.
It can be understood that, in this embodiment, the material of the special material resin protection layer 1 may also be a general optical plastic film having a material thermal shrinkage rate of less than 0.3% at 150 degrees celsius, specifically including ABS, PMMA, COP, PP, SRF and a PET material with low absorption rate.
It can be understood that the PC material base film layer 4 can also be a general optical plastic film with a low phase difference as the PC material, specifically including ABS, PMMA, COP, PP, SRF, TPU and TAC.
It can be understood that the material of the special material resin release film layer 6 can also be a general optical plastic film with a material thermal shrinkage rate of less than 0.3% at 150 ℃, specifically including ABS, PMMA, COP, PP, SRF and PET material with low absorption rate.
The embodiment also provides a preparation method of the photoelectric protective film, and specifically, the method comprises the steps of coating the upper surface of the PC base layer film 4 with the corrosion-resistant easy-to-adhere layer 7, and then sequentially laminating the other layers on the upper surface and the lower surface of the PC base layer film 4 to obtain the high-strength fingerprint identification photoelectric protective film under the screen.
The second embodiment is as follows:
the embodiment provides a photoelectric protection film, as shown in fig. 2 specifically, including special material resin protective layer 1, first silica gel layer 2, sclerosis layer 3, PC material basement membrane layer 4, second silica gel layer 5 and the special material resin that from top to bottom sets gradually from type rete 6, it is easy to follow layer 7 to coat on the lower surface of PC material basement membrane layer 4 to have the anticorrosion.
The thickness of the special material resin protection layer 1 in the implementation is 36 mu m, and the material is optical plastic film ABS with the thermal shrinkage rate of less than 0.3% in the environment of 150 ℃.
The thickness of the first silica gel layer 2 is 8 mu m, the peeling force is 1.5g, the tearing force is 0.5g, the light transmittance is 88.5%, and the haze is 0.5%.
The thickness on sclerosis layer 3 is 2 mu m, and surface hardness is 1H, and is wear-resisting 500 times, surface water droplet angle 95, and the water droplet angle after wear-resisting test is greater than 70, and surface oil droplet angle is greater than 55, surface hardening layer friction voltage 300V, surface friction coefficient 0.02, the hardening solution on sclerosis layer 3 is the waterborne of low absorption rate and grinds sand mould UV hardening liquid.
The PC material base film layer 4 is a single-layer PC material base film, the thickness of the single-layer PC material base film is 50 mu m, and the single-layer PC material base film is a low-phase difference film.
The anti-corrosion easy-adhesion layer 7 is an organic silicon coating and is coated on the lower surface of the PC material base layer film 4.
The thickness of the second silica gel layer 5 is 15 mu m, the attaching and tearing force of the second silica gel layer 5 and the liquid crystal screen with a 115-degree water drop angle is greater than 20g, the peeling force is 50g, the light transmittance is 89.5%, and the haze is 0.5%.
The thickness of the special material resin release film layer 6 is 50 mu m, and the material is optical plastic film PMMA with the thermal shrinkage rate of less than 0.3% under the environment of 150 ℃.
The third concrete embodiment:
the embodiment provides a photoelectric protection film, as shown in fig. 3 specifically, including special material resin protective layer 1, first silica gel layer 2, sclerosis layer 3, PC material base film layer 4, second silica gel layer 5 and the special material resin that from top to bottom sets gradually from type rete 6, all coat with the easy layer 7 of following of anticorrosion on the upper and lower surface of PC material base film layer 4.
The thickness of the special material resin protection layer 1 in the implementation is 100 mu m, and the material is selected from a PC material.
The thickness of the first silica gel layer 2 is 15 mu m, the peeling force is 20g, the tearing force is 4g, the light transmittance is 92.5%, and the haze is 2.5%.
The thickness of sclerosis layer 3 is 5.5 mu m, and surface hardness is 3H, and is wear-resisting 5000 times, surface water droplet angle 103, and the water droplet angle after wear-resisting test is greater than 70, and surface oil droplet angle is greater than 55, and surface hardening layer friction voltage is 50V, and coefficient of surface friction is 0.07, the solution that hardens on sclerosis layer 3 is the solvent type high definition UV hardening liquid of low absorption.
The PC material base film layer 4 is a single-layer PC material base film, the thickness of the single-layer PC material base film is 188 mu m, and the thickness of the single-layer PC material base film is a low-phase difference film.
The anti-corrosion easy-adhesion layer 7 is a polyurethane coating and is coated on the upper surface and the lower surface of the PC material base layer film 4.
The thickness of the second silica gel layer 5 is 45 [ mu ] m, the attaching and tearing force of the second silica gel layer 5 and the liquid crystal screen with a 115-degree water drop angle is greater than 20g, the peeling force is 300g, the light transmittance is 92.5%, and the haze is 1.5%.
The thickness of the special material resin release film layer 6 is 188 mu m, and the special material resin release film layer is made of PC.
The fourth concrete embodiment:
the embodiment provides a photoelectric protection film, as shown in fig. 4 specifically, including special material resin protective layer 1, first silica gel layer 2, sclerosis layer 3, PC material base film layer 4, second silica gel layer 5 and the special material resin that from top to bottom sets gradually from type rete 6, all coat with the easy layer 7 of following of anticorrosion on the upper and lower surface of PC material base film layer 4.
The difference between the present embodiment and the third embodiment is that the PC-based film layer 4 in the present embodiment is a double-layer PC-based film, specifically, as shown in fig. 4, the double-layer PC-based film is bonded together by an optical-grade OCA glue layer 41; the peeling force range of the OCA adhesive layer 41 is 500-3000g, preferably 1000-2000g, the light transmittance of the OCA adhesive layer 41 is 88% -96%, preferably 91.5% -95.5%, the haze range of the OCA adhesive layer 41 is 0.1% -2.5%, preferably 0.15% -0.5%, the OCA composite adhesive can also be replaced by one or more of common acrylic pressure-sensitive adhesive, polyurethane adhesive, polyester adhesive and the like, and the composite adhesive force is 500-5000 g.
In this example, the peeling force of the OCA adhesive layer 41 was 1500g, the light transmittance was 94.5%, and the haze was 0.25%.
The embodiment also provides a preparation method of the photoelectric protective film, which specifically comprises the steps of firstly bonding two base films of the PC base film layer 4 by using the OCA glue layer 41, then coating the anti-corrosion easy-to-adhere layer 7 on the upper surface and the lower surface of the PC base film layer 4, and finally sequentially laminating other layers on the upper surface and the lower surface of the PC base film layer 4 to obtain the photoelectric protective film provided by the embodiment.
According to the specific technical scheme provided by the embodiment of the invention, the PC material base film layer 4 is a low-phase difference film, so that the phase difference in the Re direction and the Rth direction is less than 30nm, a large phase difference does not exist, and the identification degree and the response speed of the photoelectric protective film to fingerprints can be effectively improved; and after the mobile phone is pasted with the protective film, a user can normally watch the screen by wearing polarized glasses or sunglasses, the problem of color ghost distortion of the screen cannot be caused, and the fidelity is ensured.
In addition, the special material resin protection film layer, the PC material base film layer and the special material resin release film layer of the photoelectric protection film are made of PC materials or universal optical plastic films with performance similar to that of the PC materials are used as base films, so that the problem of warping of products formed by large-radian hot press forming can be effectively solved, and the film sticking yield is effectively improved.
The present invention provides a high-strength photoelectric protective film for fingerprint identification under screen and a method for manufacturing the same, which are described in detail above, and the technical solutions provided by the present invention are described in detail herein by using specific examples, and the above examples are only preferred embodiments of the present invention, and are not intended to limit the scope of the present invention, and it should be understood that variations or modifications within the technical scope of the present invention that are conceivable by those skilled in the art should be covered by the scope of the present invention.
Claims (9)
1. The utility model provides a fingerprint discernment photoelectricity protection film under high strength screen which characterized in that, photoelectricity protection film from top to bottom has set gradually special material resin protection rete, first silica gel layer, sclerosis layer, PC material base film layer, second silica gel layer and special material resin from the type rete, PC material base film layer is low phase difference film, the phase difference of two directions of Re and Rth of low phase difference film is less than 30 nm.
2. The high-strength photoelectric protective film for identifying fingerprints under screen of claim 1, wherein at least one of the upper and lower surfaces of the PC material base film layer is coated with an anti-corrosion easy-to-adhere layer.
3. The high-strength photoelectric protective film for identifying the fingerprints under the screen according to claim 1, wherein the thicknesses of the special material resin protective film layer and the special material resin release film layer are both 25-360 μm, and the materials are both made of one of PC materials and general optical plastic films with the thermal shrinkage rate of less than 0.3% at 150 ℃.
4. The high-strength photoelectric protective film for fingerprint identification under a screen according to claim 1, wherein the thickness of the first silica gel layer is 4-30 μm, the peeling force is 1-30g, the tearing force is 0.5-10g, the light transmittance is 87% -96%, and the haze range is 0.2% -3.5%.
5. The high-strength photoelectric protective film for fingerprint identification under a screen according to claim 1, wherein the thickness of the hardened layer is 1-10 μm, the hardness is 1H-9H, and the hardening liquid of the hardened layer is one of a solvent type UV hardening liquid and a water-based UV hardening liquid.
6. The high-strength underscreen fingerprint identification photoelectric protection film according to claim 1, wherein the thickness of the PC material base film is 25-360 μm, and the PC material base film is one of a single-layer PC material base film and a double-layer PC material base film.
7. The high-strength photoelectric protective film for fingerprint identification under a screen according to claim 1, wherein the thickness of the second silica gel layer is 8-80 μm, the tearing force is greater than 15g, the peeling force is 2-800g, the light transmittance is 88% -96%, and the haze is 0.2% -2.5%.
8. The high-strength photoelectric protective film for identifying fingerprints under a screen is characterized in that the material of the anti-corrosion easy-adhesion layer is a composite of one or more of polyester, polyurethane, acrylic and organic silicon coatings.
9. A preparation method of a high-strength photoelectric protective film for identifying fingerprints under a screen is characterized in that a corrosion-resistant easy-to-adhere layer is coated on a PC material base layer film, and then other layers on the upper surface and the lower surface of the PC material base layer film are sequentially overlapped to obtain the high-strength photoelectric protective film for identifying fingerprints under the screen.
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| CN201811558964.2A CN111334209A (en) | 2018-12-19 | 2018-12-19 | High-strength photoelectric protective film for identifying fingerprints under screen and preparation method thereof |
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| CN201811558964.2A CN111334209A (en) | 2018-12-19 | 2018-12-19 | High-strength photoelectric protective film for identifying fingerprints under screen and preparation method thereof |
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| CN117535017A (en) * | 2023-11-09 | 2024-02-09 | 东莞市溢彩科技有限公司 | Vehicle-mounted explosion-proof membrane with optical phase difference and preparation method thereof |
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