CN111318194A - Electrodeposition solution preparation system - Google Patents
Electrodeposition solution preparation system Download PDFInfo
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- CN111318194A CN111318194A CN202010167750.3A CN202010167750A CN111318194A CN 111318194 A CN111318194 A CN 111318194A CN 202010167750 A CN202010167750 A CN 202010167750A CN 111318194 A CN111318194 A CN 111318194A
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- mixing tank
- pipe
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/50—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle
- B01F25/51—Circulation mixers, e.g. wherein at least part of the mixture is discharged from and reintroduced into a receptacle in which the mixture is circulated through a set of tubes, e.g. with gradual introduction of a component into the circulating flow
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/50—Mixing liquids with solids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F25/00—Flow mixers; Mixers for falling materials, e.g. solid particles
- B01F25/12—Interdigital mixers, i.e. the substances to be mixed are divided in sub-streams which are rearranged in an interdigital or interspersed manner
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F35/00—Accessories for mixers; Auxiliary operations or auxiliary devices; Parts or details of general application
- B01F35/20—Measuring; Control or regulation
- B01F35/22—Control or regulation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Dispersion Chemistry (AREA)
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Abstract
The invention relates to an electrodeposition solution preparation system, which comprises a mixing tank, a liquid inlet pipe and an output end which are arranged on the mixing tank, atomizing pipes which are uniformly distributed on the inner side of the top surface of the mixing tank, atomizing spray heads which are uniformly distributed on the atomizing pipes, a first circulating pipe which is connected with the bottom surface of the mixing tank, a second circulating pipe which is arranged on the outer wall of the mixing tank, circulating pumps of which two ends are respectively connected with the first circulating pipe and the second circulating pipe, a liquid feeding system which is connected with the liquid inlet pipe and is used for injecting liquid into the mixing tank, a powder feeding system which is connected with the atomizing pipes and is used for injecting powder into the mixing tank, and a control system which is used for controlling the circulating pumps, the liquid feeding system. The method is used for preparing the electrodeposition solution, and can improve the distribution uniformity of the nano particles in the liquid material, thereby improving the quality of the final electrodeposition layer.
Description
Technical Field
The invention relates to the technical field of electrodeposition, in particular to an electrodeposition solution preparation system.
Background
Electrodeposition refers to the process of electrochemical deposition of metals or alloys from aqueous solutions, non-aqueous solutions or molten salts of other compounds, and can be divided into pulse electrodeposition, spray electrodeposition, composite electrodeposition, brush plating composite electrodeposition, ultrasonic electrodeposition and the like.
The nano composite electrodeposition is one kind of composite electrodeposition, and is a process of embedding nano particles in a metal coating to enable the nano particles and metal ions to be co-deposited, the unique physical and chemical properties of the nano particles are utilized to endow the technical coating with more excellent performance, the uniformity of the distribution of the nano particles in a solution can directly influence the quality of a finally formed electrodeposition layer, and how to further improve the uniformity of the distribution of the nano particles is a development direction of the technology.
Disclosure of Invention
In view of the defects of the prior art, the invention aims to provide an electrodeposition solution preparation system, which can further improve the uniformity of nanoparticle distribution, thereby improving the quality of a final electrodeposition layer.
The above object of the present invention is achieved by the following technical solutions:
an electrodeposition solution preparation system comprising:
the mixing tank is provided with a liquid inlet pipe and an output end;
the atomizing pipes are uniformly distributed on the inner side of the top surface of the mixing tank;
the atomizing nozzles are uniformly distributed on the atomizing pipe;
the first circulating pipe is connected with the bottom surface of the mixing tank;
the second circulating pipe is arranged on the outer wall of the mixing tank, and the axis of the second circulating pipe is vertical to the axis of the mixing tank;
the two ends of the circulating pump are respectively connected with the first circulating pipe and the second circulating pipe;
the liquid feeding system is connected with the liquid inlet pipe and is used for injecting liquid into the mixing tank;
the powder feeding system is connected with the atomizing pipe and is used for injecting powder into the mixing tank; and
and the control system is used for controlling the circulating pump, the liquid feeding system and the powder feeding system to work so that the liquid and the powder alternately enter the mixing tank to be mixed.
In a preferred embodiment of the invention: the liquid feeding system comprises a liquid tank, a material pump connected with the liquid tank and a liquid material pipe connected with the material pump;
the liquid pipe is connected with the liquid inlet pipe;
and the control end of the material pump is connected with a control system.
In a preferred embodiment of the invention: the powder feeding system comprises a powder tank, a powder pneumatic diaphragm pump connected with the powder tank and a powder pipe connected with the powder pneumatic diaphragm pump;
the powder pipe is connected with the atomizing pipe;
and the control end of the powder pneumatic diaphragm pump is connected with a control system.
In a preferred embodiment of the invention: the number of the second circulating pipes is multiple, and the multiple groups of the second circulating pipes are uniformly arranged in the circumferential direction of the outer wall of the mixing tank.
In a preferred embodiment of the invention: the number of the second circulating pipes in each group is more than two, and any two second circulating pipes in the same group are parallel to each other.
In a preferred embodiment of the invention: the sum of the maximum radius of the second circulating pipe and the distance between the axis of the second circulating pipe and the axis of the mixing tank is equal to the maximum radius of the mixing tank.
In a preferred embodiment of the invention: the mixing tank is characterized by also comprising an annular pipe arranged on the inner side of the top surface of the mixing tank, a connecting pipe connected with the annular pipe and water spray holes uniformly distributed on the annular pipe;
the other end of the connecting pipe is connected with the liquid inlet pipe;
the water spray holes face the inner wall of the mixing tank.
In a preferred embodiment of the invention: the bottom of the mixing tank is conical or elliptical;
the joint of the first circulating pipe and the tank bottom of the mixing tank is positioned at the lowest position of the tank bottom of the mixing tank.
In conclusion, the beneficial technical effects of the invention are as follows:
the mode that utilizes spraying powder in turn and injecting into liquid material makes powder and liquid material preliminary mixing, and the powder converges the problem of gathering together when having avoided the single to add the powder on the one hand, and on the other hand also can make powder and liquid material preliminary mixing. And then, a circulating pump is used for driving the mixture of the liquid material and the powder material to fully flow in the mixing tank, and the powder material is uniformly distributed in the liquid material in a flowing mode in the mixing mode.
Drawings
Fig. 1 is a schematic structural diagram according to an embodiment of the present invention.
Fig. 2 is a schematic view of the mixing tank and its associated structure given in connection with fig. 1.
Fig. 3 is a schematic view of the internal structure of the stirring tank shown in fig. 2.
Fig. 4 is a partially enlarged schematic view of a portion a in fig. 3.
Fig. 5 is a block diagram of a junction control system according to an embodiment of the present invention.
In the figure, 11, a mixing tank, 111, a liquid inlet pipe, 112, an output end, 12, an atomizing pipe, 13, an atomizing nozzle, 14, a first circulating pipe, 15, a second circulating pipe, 16, a circulating pump, 17, a liquid feeding system, 18, a powder feeding system, 19, a control system, 171, a liquid tank, 172, a material pump, 173, a liquid pipe, 181, a powder tank, 182, a powder pneumatic diaphragm pump, 183, a powder pipe, 21, a ring pipe, 22, a connecting pipe, 23, a water spray hole, 31, a ring conduit, 32 and a liquid distribution pipe.
Detailed Description
The present invention will be described in further detail with reference to the accompanying drawings.
Referring to fig. 1, an electrodeposition solution preparation system disclosed in the embodiment of the present invention mainly includes a mixing tank 11, an atomizing pipe 12, an atomizing nozzle 13, a first circulating pipe 14, a second circulating pipe 15, a circulating pump 16, a liquid feeding system 17, a powder feeding system 18, a control system 19, and the like.
Referring to fig. 2 and 3, the main body of the working part of the system is a mixing tank 11, and the mixing tank 11 mainly consists of a tank bottom, a tank body and a tank top. The liquid inlet pipe 111 and the output end 112 are both installed on the mixing tank 11, the liquid inlet pipe 111 can be positioned on the tank body or the tank top, and the output end 112 is positioned at the tank bottom or the tank body close to the tank bottom. The liquid inlet pipe 111 is used for injecting liquid materials into the mixing tank 11, and the output end 112 is used for discharging the stirred electrodeposition solution.
The atomizing pipe 12 is installed inside the top surface of the mixing tank 11, that is, inside the tank top. The number of the atomizing pipes 12 is a plurality of pipes, and the pipes are arranged on the inner side of the tank top in parallel or are divided into two groups and then are arranged on the inner side of the tank top in a crossed manner.
Each atomizing pipe 12 is provided with a plurality of atomizing nozzles 13, and the atomizing nozzles 13 face the bottom of the tank and are used for uniformly spraying powder into the mixing tank 11.
One end of the first circulation pipe 14 is connected to the bottom surface of the mixing tank 11, that is, the tank bottom, and the other end is connected to the input end of the circulation pump 16, and one end of the second circulation pipe 15 is communicated with the outer wall of the mixing tank 11, that is, the tank body, and the other end is connected to the output end of the circulation pump 16. In operation, the mixed liquid in the mixing tank 11 flows out from the bottom, and flows back to the mixing tank 11 after sequentially flowing through the first circulation pipe 14, the circulation pump 16 and the second circulation pipe 15.
The axis of the second circulation pipe 15 is perpendicular to the axis of the mixing tank 11 so that the mixed liquid flowing out from the second circulation pipe 15 can flow into the mixing tank 11 in the horizontal direction and then flow downward, which can agitate the mixed liquid in the mixing tank 11 as much as possible and increase the ratio of the mixed liquid participating in the flow process to the total mixed liquid.
The liquid feeding system 17 is connected with the liquid inlet pipe 111 and used for injecting liquid into the mixing tank 11, and the powder feeding system 18 is connected with the atomizing pipe 12 and used for injecting powder into the mixing tank 11. The liquid feeding system 17 and the powder feeding system 18 are both located outside the mixing tank 11.
The control system 19 is connected with the circulating pump 16, the liquid feeding system 17 and the powder feeding system 18 and used for driving the three to work so as to complete the mixing work of powder and liquid.
In the working process, the liquid feeding system 17 and the powder feeding system 18 work alternately, and a certain amount of powder and liquid are input into the mixing tank 11. When inputting the liquid material, a certain amount of liquid material flows into the mixing tank 11 through the liquid feeding system 17 and the liquid inlet pipe 111, and when inputting the powder material, a certain amount of powder material is pressurized by the powder feeding system 18, then injected into the atomizing pipe 12 and then sprayed out from the atomizing nozzle 13, uniformly falls into the mixing tank 11, and then sinks into the liquid material in the mixing tank 11. By alternately injecting the powder and the liquid, the powder and the liquid can be mixed more sufficiently, and the problems of material blocks, slow dissolving speed, overlong stirring time and the like which are easy to appear when the powder is added at a single time are avoided.
After the addition of the powder and the liquid is completed, the circulation pump 16 is started to pump the mixed liquid in the mixing tank 11 through the first circulation pipe 14, and then the mixed liquid is returned to the mixing tank 11 through the second circulation pipe 15. In the continuous circulating flow process, the powder material is distributed in the liquid material evenly, and the preparation of the electro-deposition solution is finished.
Finally, the prepared electrodeposition solution is discharged from the mixing tank 11 through the output port 112.
Referring to fig. 1, in one embodiment, the liquid feed system 17 comprises a liquid tank 171, a pump 172, a liquid pipe 173, etc., and the liquid tank 171 is used for storing liquid materials required for preparing the electrodeposition solution and is disposed beside the mixing tank 11. The liquid pipe 173 is connected to the liquid inlet pipe 111, and the input end and the output end of the material pump 172 are respectively connected to the liquid tank 171 and the liquid pipe 173.
During operation, the material pump 172 pumps the liquid material in the liquid tank 171 and injects the pumped liquid material into the liquid material pipe 173, and then injects the pumped liquid material into the mixing tank 11 through the liquid inlet pipe 111.
Referring to fig. 1, in one embodiment, the powder feeding system 18 is mainly composed of a powder tank 181, a powder pneumatic diaphragm pump 182, a powder pipe 183, and the like, and the powder tank 181 is used for storing powder, i.e., nanoparticles, required for preparing an electrodeposition solution and is disposed beside the mixing tank 11. The powder pipe 183 is connected to the atomizing pipe 12, and the input end and the output end of the powder pneumatic diaphragm pump 182 are connected to the powder tank 181 and the powder pipe 183, respectively.
In the working process, the powder pneumatic diaphragm pump 182 extracts the nanoparticles in the powder tank 181, the nanoparticles are pressurized and then sent into the powder pipe 183, the nanoparticles entering the powder pipe 183 enter each atomizing pipe 12 respectively, and then are sprayed out from the atomizing nozzles 13 and fall into the mixing tank 11.
In order to avoid the situation that a part of the powder may be retained on the liquid surface after the powder falls on the liquid surface under the action of the liquid tension, in an embodiment, referring to fig. 3, a stirrer 33 is added on the mixing tank 11, and during the process of adding the powder and the liquid into the mixing tank 11, the stirrer 33 works accordingly to destroy the stable liquid level formed in the mixing tank 11.
Further, an agitator 33 is installed at the bottom of the mixing tank 11.
Referring to fig. 1 and 2, in one embodiment, the number of the second circulation pipes 15 is plural, and the second circulation pipes 15 are uniformly arranged on the outer wall of the mixing tank 11 around the axis of the mixing tank 11, and the included angle between any two adjacent second circulation pipes 15 is equal.
The mixed liquid thus discharged from the mixing tank 11 is returned to the mixing tank 11 through the plurality of second circulating pipes 15, whereby the ratio of the mixed liquid flowing in the mixing tank 11 to the whole mixed liquid can be further increased, and the uniformity of the distribution of the powder material in the liquid material can be further improved.
Further, the number of the second circulation pipes 15 in each group is two or more. The proportion of the mixed liquid flowing in the mixing tank 11 in the whole mixed liquid is further enlarged by increasing the number of the second circulating pipes 15, and the uniformity of the distribution of the powder material in the liquid material is further improved.
And any two second circulation pipes 15 in the same group are parallel to each other, that is, a plurality of second circulation pipes 15 in the same group are distributed on the tank body along the axis of the mixing tank 11. In the direction from top to bottom, the plurality of second circulating pipes 15 in the same group can simultaneously inject the mixed liquid into the mixing tank 11, so that the mixed liquid in the mixing tank 11 can flow as much as possible, and the mixing degree of the powder and the liquid is improved.
Meanwhile, the flow rates of the mixed liquid at the outlets of the plurality of second circulation pipes 15 in the same group tend to be consistent, so that the flow rates of the plurality of flow rate regions in adjacent regions tend to be consistent, the loss between the adjacent flow rate regions is reduced, and the mixed liquid in the mixing tank 11 can be kept in a faster flowing state under the condition that the output power of the circulating pump 16 is not changed.
Further, the sum of the maximum radius of the second circulation pipe 15 and the distance between the axis thereof and the axis of the mixing tank 11 is equal to the maximum radius of the mixing tank 11, and under the restriction, the mixed liquid flowing out of the second circulation pipe 15 can flow against the inner wall of the mixing tank 11, forming a vortex in the agitation tank 11. The mixed liquid at the center of the vortex flows out from the first circulation pipe 14.
The process is circulated, the liquid in the mixing tank 11 can be in a stable flowing state, and the powder can be uniformly dispersed into the liquid in the long-time flowing process.
As the optimization of the structure, an annular duct 31 and a plurality of liquid separating pipes 32 are added on the outer wall of the mixing tank 11, one end of the liquid separating pipe 32 is connected with the annular duct 31, the other end is a closed end, the annular duct 31 is connected with the output end of the circulating pump 16, the second circulating pipes 15 in the same group are connected with the same liquid separating pipe 32, that is, the number of the groups of the second circulating pipes 15 is the same as that of the liquid separating pipes 32.
Referring to fig. 3 and 4, a part of the powder sticks to the inner wall of the mixing tank 11 during the ejection of the powder from the atomizer 13, and thus in one embodiment, an annular tube 21 is additionally provided on the inner side of the top surface of the mixing tank 11, that is, the inner side of the ceiling of the mixing tank 11. The annular pipe 21 is fixed to the inside of the roof of the mixing tank 11, but may be fixed to the inner wall of the tank body of the mixing tank 11.
The annular pipe 21 is uniformly provided with water spray holes 23, and the water spray holes 23 face the inner wall of the mixing tank 11 and are used for washing off the powder stuck on the inner wall of the mixing tank 11. The ring pipe 21 is supplied with the liquid material injected into the mixing tank 11 through the connection pipe 22 during the flushing, both ends of the connection pipe 22 are connected to the liquid inlet pipe 111 and the ring pipe 21, respectively, and when the liquid material is injected into the mixing tank 11, a part of the liquid material flows into the ring pipe 21 through the connection pipe 22 and then is sprayed onto the inner wall of the mixing tank 11 through the water spray holes 23 to flush the powder adhered thereto.
In the process of the mixed liquid in the mixing tank 11 flowing out from the first circulation pipe 14, the flow rate of the mixed liquid near the connection of the first circulation pipe 14 and the mixing tank 11 is higher than that in other areas, and there is a problem that the mixed liquid stays at the bottom of the mixing tank near the tank wall, so that in one embodiment, the bottom of the mixing tank 11 is changed into a conical shape or an oval shape. Like this in the direction of the center department of being close to blending tank 11, the tank bottoms of blending tank 11 is lower and lower, and under the effect of gravity, the mixed liquid of tank bottoms and jar wall department can flow to the center department of tank bottoms, the condition that can not appear detaining.
Further, the connection of the first circulation pipe 14 to the bottom of the mixing tank 11 is located at the lowest position of the bottom of the mixing tank 11, so that the mixed liquid in the mixing tank 11 is totally involved in the circulation flow process.
Referring to fig. 5, in one embodiment, the control system 19 is comprised of a programmable controller, which may be a PLC or DCS, and necessary control circuitry, which is matched according to the type of appliance component.
The control circuits of the circulating pump 16, the material pump 172, the powder pneumatic diaphragm pump 182 and the like mainly comprise a contactor and a relay, current can be provided after the contactor is closed, the relay can control the opening and closing of the contactor, and the control current of the relay is given by PLC or DCS.
The control principle of the agitator 33 is the same as described above and will not be described here.
The embodiments of the present invention are preferred embodiments of the present invention, and the scope of the present invention is not limited by these embodiments, so: all equivalent changes made according to the structure, shape and principle of the invention are covered by the protection scope of the invention.
Claims (8)
1. An electrodeposition solution preparation system, comprising:
the mixing tank (11) is provided with a liquid inlet pipe (111) and an output end (112);
the atomizing pipes (12) are uniformly distributed on the inner side of the top surface of the mixing tank (11);
the atomizing nozzles (13) are uniformly distributed on the atomizing pipe (12);
a first circulation pipe (14) connected to the bottom surface of the mixing tank (11);
a second circulation pipe (15) arranged on the outer wall of the mixing tank (11), the axis of the second circulation pipe is vertical to the axis of the mixing tank (11);
a circulating pump (16) having both ends connected to the first circulating pipe (14) and the second circulating pipe (15), respectively;
the liquid feeding system (17) is connected with the liquid inlet pipe (111) and is used for injecting liquid into the mixing tank (11);
the powder feeding system (18) is connected with the atomizing pipe (12) and is used for injecting powder into the mixing tank (11); and
and the control system (19) is used for controlling the circulating pump (16), the liquid feeding system (17) and the powder feeding system (18) to work, so that the liquid and the powder alternately enter the mixing tank (11) to be mixed.
2. An electrodeposition solution preparation system according to claim 1, characterized in that: the liquid feeding system (17) comprises a liquid tank (171), a material pump (172) connected with the liquid tank (171) and a liquid pipe (173) connected with the material pump (172);
the liquid pipe (173) is connected with the liquid inlet pipe (111);
the control end of the material pump (172) is connected with a control system (19).
3. An electrodeposition solution preparation system according to claim 1, characterized in that: the powder feeding system (18) comprises a powder tank (181), a powder pneumatic diaphragm pump (182) connected with the powder tank (181), and a powder pipe (183) connected with the powder pneumatic diaphragm pump (182);
the powder pipe (183) is connected with the atomizing pipe (12);
and the control end of the powder pneumatic diaphragm pump (182) is connected with a control system (19).
4. An electrodeposition solution preparation system according to any one of claims 1 to 3, characterized in that: the number of the second circulating pipes (15) is multiple, and the multiple groups of the second circulating pipes (15) are uniformly arranged in the circumferential direction of the outer wall of the mixing tank (11).
5. An electrodeposition solution preparation system according to claim 4, characterized in that: the number of the second circulating pipes (15) in each group is more than two, and any two second circulating pipes (15) in the same group are parallel to each other.
6. An electrodeposition solution preparation system according to claim 4, characterized in that: the sum of the maximum radius of the second circulating pipe (15) and the distance between the axis of the second circulating pipe and the axis of the mixing tank (11) is equal to the maximum radius of the mixing tank (11).
7. An electrodeposition solution preparation system according to claim 1, characterized in that: the mixing tank also comprises an annular pipe (21) arranged on the inner side of the top surface of the mixing tank (11), a connecting pipe (22) connected with the annular pipe (21) and water spray holes (23) uniformly distributed on the annular pipe (21);
the other end of the connecting pipe (22) is connected with a liquid inlet pipe (111);
the water spray holes (23) face the inner wall of the mixing tank (11).
8. An electrodeposition solution preparation system according to claim 1, characterized in that: the bottom of the mixing tank (11) is conical or elliptical;
the connection position of the first circulating pipe (14) and the bottom of the mixing tank (11) is positioned at the lowest position of the bottom of the mixing tank (11).
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| CN202010167750.3A CN111318194A (en) | 2020-03-11 | 2020-03-11 | Electrodeposition solution preparation system |
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| CN202010167750.3A CN111318194A (en) | 2020-03-11 | 2020-03-11 | Electrodeposition solution preparation system |
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Application publication date: 20200623 |
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| RJ01 | Rejection of invention patent application after publication |