CN111318194A - Electrodeposition solution preparation system - Google Patents

Abstract

The invention relates to an electrodeposition solution preparation system, which comprises a mixing tank, a liquid inlet pipe and an output end which are arranged on the mixing tank, atomizing pipes which are uniformly distributed on the inner side of the top surface of the mixing tank, atomizing spray heads which are uniformly distributed on the atomizing pipes, a first circulating pipe which is connected with the bottom surface of the mixing tank, a second circulating pipe which is arranged on the outer wall of the mixing tank, circulating pumps of which two ends are respectively connected with the first circulating pipe and the second circulating pipe, a liquid feeding system which is connected with the liquid inlet pipe and is used for injecting liquid into the mixing tank, a powder feeding system which is connected with the atomizing pipes and is used for injecting powder into the mixing tank, and a control system which is used for controlling the circulating pumps, the liquid feeding system. The method is used for preparing the electrodeposition solution, and can improve the distribution uniformity of the nano particles in the liquid material, thereby improving the quality of the final electrodeposition layer.

Description

An electrodeposition solution preparation system

technical field

The present invention relates to the technical field of electrodeposition, in particular to a system for preparing electrodeposition solution.

Background technique

Electrodeposition refers to the process of electrochemical deposition of metals or alloys from other compound aqueous solutions, non-aqueous solutions or molten salts. It can be divided into pulse electrodeposition, spray electrodeposition, composite electrodeposition, brush plating composite electrodeposition and ultrasonic electrodeposition, etc. several.

Nano-composite electrodeposition is a kind of composite electrodeposition. It is the process of embedding nanoparticles in metal coating and co-depositing nanoparticles and metal ions. The unique physical and chemical properties of nanoparticles are used to endow the technical coating with better performance. The uniformity of nanoparticle distribution in solution can directly affect the quality of the final electrodeposited layer. How to further improve the uniformity of nanoparticle distribution is a development direction of this technology.

SUMMARY OF THE INVENTION

In view of the deficiencies in the prior art, the purpose of the present invention is to provide an electrodeposition solution preparation system, which can further improve the uniformity of nanoparticle distribution, thereby improving the final electrodeposition layer quality.

The above-mentioned purpose of the present invention is achieved through the following technical solutions:

An electrodeposition solution preparation system, comprising:

The mixing tank is provided with a liquid inlet pipe and an output end;

The atomizing tubes are evenly distributed on the inner side of the top surface of the mixing tank;

The atomizing nozzles are evenly distributed on the atomizing tube;

The first circulation pipe is connected with the bottom surface of the mixing tank;

The second circulation pipe is arranged on the outer wall of the mixing tank, and its axis is perpendicular to the axis of the mixing tank;

a circulating pump, the two ends are respectively connected with the first circulating pipe and the second circulating pipe;

Liquid feeding system, connected with the liquid inlet pipe, used to inject liquid into the mixing tank;

A powder feeding system, connected to the atomizing tube, for injecting powder into the mixing tank; and

The control system is used to control the circulation pump, the liquid feeding system and the powder feeding system, so that the liquid and the powder enter the mixing tank alternately to complete the mixing.

In a preferred embodiment of the present invention: the liquid feeding system includes a liquid tank, a material pump connected with the liquid tank, and a liquid material pipe connected with the material pump;

The liquid material pipe is connected with the liquid inlet pipe;

The control end of the material pump is connected with the control system.

In a preferred embodiment of the present invention: the powder feeding system includes a powder tank, a powder pneumatic diaphragm pump connected with the powder tank, and a powder pipe connected with the powder pneumatic diaphragm pump;

The powder pipe is connected with the atomizing pipe;

The control end of the powder pneumatic diaphragm pump is connected with the control system.

In a preferred embodiment of the present invention: the number of the second circulation pipes is a plurality of groups, and the plurality of groups of the second circulation pipes are uniformly arranged in the circumferential direction of the outer wall of the mixing tank.

In a preferred embodiment of the present invention, the number of the second circulation pipes in each group is two or more, and any two second circulation pipes in the same group are parallel to each other.

In a preferred embodiment of the present invention: the sum of the maximum radius of the second circulation pipe and the distance between its axis and the axis of the mixing tank is equal to the maximum radius of the mixing tank.

In a preferred embodiment of the present invention: it also includes an annular pipe arranged on the inner side of the top surface of the mixing tank, a connecting pipe connected with the annular pipe, and spray holes evenly distributed on the annular pipe;

The other end of the connecting pipe is connected with the liquid inlet pipe;

The water spray holes face the inner wall of the mixing tank.

In a preferred embodiment of the present invention: the bottom of the mixing tank is conical or oval;

The connection between the first circulation pipe and the tank bottom of the mixing tank is located at the lowest position of the tank bottom of the mixing tank.

To sum up, the beneficial technical effects of the present invention are:

The powder and liquid materials are initially mixed by alternately spraying powder materials and injecting liquid materials. Initial mixing. Then, the circulating pump is used to drive the mixture of liquid and powder to flow fully in the mixing tank. This mixing method uses the flow method to make the powder evenly distributed in the liquid material. Compared with the stirring method, it avoids the need for stirring. The layering phenomenon and the uneven local distribution caused by the generated shear stress can further improve the mixing uniformity of the liquid material and the powder material and the consistency of the final product.

Description of drawings

FIG. 1 is a schematic structural diagram of an embodiment of the present invention.

FIG. 2 is a schematic diagram of the stirring tank and its related structures based on FIG. 1 .

FIG. 3 is a schematic diagram of the internal structure of the stirring tank based on FIG. 2 .

FIG. 4 is a partial enlarged schematic view of part A in FIG. 3 .

FIG. 5 is a structural block diagram of a junction control system according to an embodiment of the present invention.

In the figure, 11, mixing tank, 111, liquid inlet pipe, 112, output end, 12, atomizing pipe, 13, atomizing nozzle, 14, first circulation pipe, 15, second circulation pipe, 16, circulation pump, 17, liquid feeding system, 18, powder feeding system, 19, control system, 171, liquid tank, 172, material pump, 173, liquid material pipe, 181, powder material tank, 182, powder pneumatic diaphragm pump, 183, powder pipe, 21, annular pipe, 22, connecting pipe, 23, water spray hole, 31, annular conduit, 32, liquid separator.

Detailed ways

The present invention will be further described in detail below with reference to the accompanying drawings.

Referring to FIG. 1 , an electrodeposition solution preparation system disclosed in an embodiment of the present invention is mainly composed of a mixing tank 11 , an atomization tube 12 , an atomization nozzle 13 , a first circulation pipe 14 , a second circulation pipe 15 , and a circulation pump 16 , liquid feeding system 17, powder feeding system 18 and control system 19 and other components.

Referring to Figures 2 and 3, the main body of the working part of the system is a mixing tank 11, which is mainly composed of three parts: the tank bottom, the tank body and the tank top. Both the liquid inlet pipe 111 and the output end 112 are installed on the mixing tank 11, the position of the liquid inlet pipe 111 may be on the tank body or the top of the tank, and the position of the output end 112 is at the bottom of the tank or the position of the tank body close to the bottom of the tank. The function of the liquid inlet pipe 111 is to inject liquid material into the mixing tank 11, and the function of the output end 112 is to discharge the stirred electrodeposition solution.

The atomizing pipe 12 is installed on the inner side of the top surface of the mixing tank 11, that is, the inner side of the tank top. The number of atomizing tubes 12 is multiple, which are installed on the inner side of the tank top in parallel with each other, or are divided into two groups and then installed on the inner side of the tank top in a cross manner.

A plurality of atomizing nozzles 13 are installed on each atomizing pipe 12 , and the atomizing nozzles 13 are facing the bottom of the tank, and the function is to spray the powder into the mixing tank 11 evenly.

One end of the first circulation pipe 14 is connected with the bottom surface of the mixing tank 11, that is, the tank bottom, the other end is connected with the input end of the circulation pump 16, one end of the second circulation pipe 15 is connected with the outer wall of the mixing tank 11, that is, the tank body, and the other end is connected with the outer wall of the mixing tank 11. One end is connected to the output end of the circulation pump 16 . During operation, the mixed liquid in the mixing tank 11 flows out from the bottom, flows through the first circulation pipe 14 , the circulation pump 16 and the second circulation pipe 15 in sequence, and then flows back to the mixing tank 11 .

The axis of the second circulation pipe 15 is perpendicular to the axis of the mixing tank 11, so that the mixed liquid flowing out from the second circulation pipe 15 can flow into the mixing tank 11 in a horizontal direction, and then flow downward, so as to stir and mix as much as possible The mixed liquid in the tank 11 increases the proportion of the mixed liquid participating in the flow process in the total mixed liquid.

The liquid feeding system 17 is connected to the liquid inlet pipe 111 for injecting liquid into the mixing tank 11 , and the powder feeding system 18 is connected to the atomizing pipe 12 for injecting powder into the mixing tank 11 . Both the liquid feeding system 17 and the powder feeding system 18 are located outside the mixing tank 11 .

The control system 19 is connected with the circulating pump 16, the liquid feeding system 17 and the powder feeding system 18, and is used to drive the three to work and complete the mixing work of powder and liquid.

During the working process, the liquid feeding system 17 and the powder feeding system 18 work alternately to input a certain amount of powder material and liquid material into the mixing tank 11 . When inputting liquid material, a certain amount of liquid material flows into the mixing tank 11 through the liquid feeding system 17 and the liquid inlet pipe 111. When inputting powder material, a certain amount of powder material is pressurized through the powder feeding system 18 and then injected into the mixing tank 11. The inside of the atomizing tube 12 is then sprayed out from the atomizing nozzle 13 , falls evenly into the mixing tank 11 , and then sinks into the liquid material in the mixing tank 11 . By alternately injecting powder and liquid, the two can be mixed more fully, avoiding the problems of lumps, slow dissolution and long stirring time that are prone to occur when powder is added at a time.

After the powder and liquid materials are added, the circulating pump 16 is started, and the mixed liquid in the mixing tank 11 is pumped out through the first circulation pipe 14 , and then returned to the mixing tank 11 through the second circulation pipe 15 . In the process of continuous circulating flow, the distribution of powder in the liquid material tends to be uniform, and the preparation of the electrodeposition solution is completed.

Finally, the prepared electrodeposition solution is discharged from the mixing tank 11 through the output terminal 112 .

1, in one embodiment, the liquid feeding system 17 is composed of a liquid tank 171, a material pump 172, a liquid material pipe 173, etc. The function of the liquid tank 171 is to store the liquid material required for preparing the electrodeposition solution, which is placed in the mixing tank next to 11. The liquid material pipe 173 is connected to the liquid inlet pipe 111 , and the input end and the output end of the material pump 172 are respectively connected to the liquid tank 171 and the liquid material pipe 173 .

During the working process, the material pump 172 draws out the liquid material in the liquid tank 171 and then injects it into the liquid material pipe 173 , and then injects it into the mixing tank 11 through the liquid inlet pipe 111 .

Referring to FIG. 1, in one embodiment, the powder feeding system 18 is mainly composed of a powder tank 181, a powder pneumatic diaphragm pump 182 and a powder pipe 183, etc. The function of the powder tank 181 is to store the necessary materials for preparing the electrodeposition solution. Powder, ie nanoparticles, is placed beside the mixing tank 11 . The powder pipe 183 is connected with the atomizing pipe 12 , and the input end and the output end of the powder pneumatic diaphragm pump 182 are respectively connected with the powder tank 181 and the powder pipe 183 .

During the working process, the powder pneumatic diaphragm pump 182 pulls out the nanoparticles in the powder tank 181, and sends them into the powder pipe 183 after being pressurized, and the nanoparticles entering the powder pipe 183 enter into each into the atomizing tube 12 , and then sprayed from the atomizing nozzle 13 and falling into the mixing tank 11 .

Under the action of the liquid tension, after the powder falls on the surface of the liquid material, part of the powder may stay on the surface of the liquid material. In order to avoid this situation, in one embodiment, referring to FIG. An agitator 33 is added. During the process of adding powder and liquid materials into the mixing tank 11 , the agitator 33 works accordingly, destroying the stable liquid level formed in the mixing tank 11 .

Further, the agitator 33 is installed at the bottom of the mixing tank 11 .

1 and 2 , in one embodiment, the number of the second circulation pipes 15 is multiple, and these second circulation pipes 15 are evenly arranged on the outer wall of the mixing tank 11 around the axis of the mixing tank 11 . The included angles between the second circulation pipes 15 are equal.

In this way, the mixed liquid flowing out of the mixing tank 11 is returned to the mixing tank 11 through the plurality of second circulation pipes 15, which can further expand the proportion of the mixed liquid flowing in the mixing tank 11 in the total mixed liquid, and further improve the powder in the liquid. uniformity of distribution in the material.

Further, the number of the second circulation pipes 15 in each group is two or more. By increasing the number of the second circulation pipes 15, the proportion of the mixed liquid flowing in the mixing tank 11 in the total mixed liquid is further enlarged, and the uniformity of the powder distribution in the liquid material is further improved.

And any two second circulation pipes 15 in the same group are parallel to each other, that is, multiple second circulation pipes 15 in the same group are distributed on the tank body along the axis of the mixing tank 11 . In the top-down direction, multiple second circulation pipes 15 in the same group can inject mixed liquid into the mixing tank 11 at the same time, so that the mixed liquid in the mixing tank 11 can flow as much as possible, and improve the flow of powder and liquid. the degree of mixing of the ingredients.

At the same time, the flow rates of the mixed liquids at the outlets of the plurality of second circulation pipes 15 in the same group tend to be consistent, so that the flow rates of the multiple flow velocity regions in adjacent regions tend to be consistent, and the loss between adjacent flow velocity regions is reduced. , under the condition that the output power of the circulating pump 16 remains unchanged, the mixed liquid in the mixing tank 11 can be kept in a relatively fast flow state.

Further, the sum of the maximum radius of the second circulation pipe 15 and the distance between its axis and the axis of the mixing tank 11 is equal to the maximum radius of the mixing tank 11. Under this limitation, the mixed liquid flowing out of the second circulation pipe 15 It can flow against the inner wall of the mixing tank 11 to form a vortex in the mixing tank 11 . The mixed liquid at the center of the whirlpool flows out from the first circulation pipe 14 .

This process is carried out cyclically, so that the liquid in the mixing tank 11 can be in a stable flow state, and the powder material can be uniformly dispersed into the liquid material in the long-term flow process.

As a structural optimization, an annular conduit 31 and a plurality of liquid distribution pipes 32 are added to the outer wall of the mixing tank 11. One end of the liquid distribution pipe 32 is connected to the annular conduit 31, and the other end is a closed end. The annular conduit 31 is connected to the circulating pump. The output end of 16 is connected, and the second circulation pipes 15 in the same group are connected to the same liquid distribution pipe 32 , that is, the number of groups of the second circulation pipes 15 is the same as the number of the liquid distribution pipes 32 .

Referring to FIGS. 3 and 4 , in the process of spraying the powder from the atomizing nozzle 13, part of the powder will stick to the inner wall of the mixing tank 11. Therefore, in one embodiment, on the inner side of the top surface of the mixing tank 11, That is, an annular pipe 21 is added to the inner side of the tank top of the mixing tank 11 . The annular pipe 21 is fixed on the inner side of the tank top of the mixing tank 11 , and of course can also be fixed on the inner wall of the tank body of the mixing tank 11 .

The annular pipe 21 is evenly provided with water spray holes 23 , and the water spray holes 23 face the inner wall of the mixing tank 11 , and are used to flush the powder adhering to the inner wall of the mixing tank 11 . The annular pipe 21 uses the liquid material injected into the mixing tank 11 to be supplied through the connecting pipe 22 during flushing, and the two ends of the connecting pipe 22 are respectively connected with the liquid inlet pipe 111 and the annular pipe 21. , a part of the liquid material will flow into the annular pipe 21 through the connecting pipe 22, and then sprayed onto the inner wall of the mixing tank 11 through the water spray hole 23, and the powder adhering to it will be washed down.

During the process of the mixed liquid in the mixing tank 11 flowing out from the first circulation pipe 14, the flow rate of the mixed liquid near the connection between the first circulation pipe 14 and the mixing tank 11 will be higher than that in other areas, at the bottom of the tank close to the tank wall. In some places, there is also the problem that the mixed liquid remains, so in one embodiment, the bottom of the mixing tank 11 is changed to a conical or elliptical shape. In this way, in the direction close to the center of the mixing tank 11, the tank bottom of the mixing tank 11 is lower and lower, and under the action of gravity, the mixed liquid at the tank bottom and the tank wall will flow to the center of the tank bottom, There will be no holdovers.

Further, the connection between the first circulation pipe 14 and the tank bottom of the mixing tank 11 is located at the lowest position of the tank bottom of the mixing tank 11, so that the mixed liquid in the mixing tank 11 can all participate in the process of circulating flow.

5, in one embodiment, the control system 19 is composed of a programmable controller and necessary control circuits. The programmable controller may be a PLC or a DCS, and the control circuits are matched according to the types of electrical components.

The control circuits of the circulating pump 16, the material pump 172 and the powder pneumatic diaphragm pump 182 are mainly composed of a contactor and a relay. After the contactor is closed, it can provide current, and the relay can control the opening and closing of the contactor. The control current of the relay is controlled by the PLC. Or given by DCS.

The control principle of the agitator 33 is the same as the above, and will not be repeated here.

The embodiments of this specific embodiment are all preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention. Therefore: all equivalent changes made according to the structure, shape and principle of the present invention should be covered in within the protection scope of the present invention.

Claims (8)

1. an electrodeposition solution preparation system, is characterized in that, comprises: a mixing tank (11), which is provided with a liquid inlet pipe (111) and an output end (112); The atomizing pipes (12) are evenly distributed on the inner side of the top surface of the mixing tank (11); The atomizing nozzles (13) are evenly distributed on the atomizing pipe (12); The first circulation pipe (14) is connected with the bottom surface of the mixing tank (11); The second circulation pipe (15) is arranged on the outer wall of the mixing tank (11), the axis of which is perpendicular to the axis of the mixing tank (11); a circulation pump (16), the two ends are respectively connected with the first circulation pipe (14) and the second circulation pipe (15); a liquid feeding system (17), connected with the liquid inlet pipe (111), for injecting liquid into the mixing tank (11); a powder feeding system (18), connected with the atomizing pipe (12), for injecting powder into the mixing tank (11); and The control system (19) is used to control the operation of the circulating pump (16), the liquid feeding system (17) and the powder feeding system (18), so that the liquid and the powder alternately enter the mixing tank (11) to complete the mixing. 2. An electrodeposition solution preparation system according to claim 1, characterized in that: the liquid feeding system (17) comprises a liquid tank (171) and a material pump (172) connected to the liquid tank (171) And the liquid material pipe (173) connected with the material pump (172); The liquid material pipe (173) is connected with the liquid inlet pipe (111); The control end of the material pump (172) is connected with the control system (19). 3. An electrodeposition solution preparation system according to claim 1, characterized in that: the powder feeding system (18) comprises a powder tank (181), a powder connected to the powder tank (181) a pneumatic diaphragm pump (182) and a powder pipe (183) connected to the powder pneumatic diaphragm pump (182); The powder pipe (183) is connected with the atomization pipe (12); The control end of the powder pneumatic diaphragm pump (182) is connected with the control system (19). 4. An electrodeposition solution preparation system according to any one of claims 1-3, characterized in that: the number of the second circulation pipes (15) is a plurality of groups, and the plurality of groups of the second circulation pipes (15) ) are evenly arranged in the circumferential direction of the outer wall of the mixing tank (11). 5. An electrodeposition solution preparation system according to claim 4, characterized in that: the number of the second circulation pipes (15) in each group is two or more, and any two pipes in the same group are secondly circulated The tubes (15) are parallel to each other. 6. An electrodeposition solution preparation system according to claim 4, characterized in that: the sum of the maximum radius of the second circulation pipe (15) and the distance between its axis and the axis of the mixing tank (11) and the mixing The maximum radii of the tanks (11) are equal. 7. An electrodeposition solution preparation system according to claim 1, characterized in that it further comprises an annular pipe (21) arranged on the inner side of the top surface of the mixing tank (11), and a connecting pipe connected to the annular pipe (21). (22) and spray holes (23) evenly distributed on the annular pipe (21); The other end of the connecting pipe (22) is connected with the liquid inlet pipe (111); The water spray holes (23) face the inner wall of the mixing tank (11). 8. An electrodeposition solution preparation system according to claim 1, characterized in that: the bottom of the mixing tank (11) is conical or elliptical; The connection between the first circulation pipe (14) and the tank bottom of the mixing tank (11) is located at the lowest position of the tank bottom of the mixing tank (11).

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