CN111290319B - Water vapor preparation measuring device and system - Google Patents
Water vapor preparation measuring device and system Download PDFInfo
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- CN111290319B CN111290319B CN202010121945.4A CN202010121945A CN111290319B CN 111290319 B CN111290319 B CN 111290319B CN 202010121945 A CN202010121945 A CN 202010121945A CN 111290319 B CN111290319 B CN 111290319B
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- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/04—Programme control other than numerical control, i.e. in sequence controllers or logic controllers
- G05B19/042—Programme control other than numerical control, i.e. in sequence controllers or logic controllers using digital processors
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01K—MEASURING TEMPERATURE; MEASURING QUANTITY OF HEAT; THERMALLY-SENSITIVE ELEMENTS NOT OTHERWISE PROVIDED FOR
- G01K13/00—Thermometers specially adapted for specific purposes
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L21/00—Vacuum gauges
Abstract
The invention provides a device and a system for preparing and measuring water vapor, which relate to the technical field of water vapor preparation, and set a target temperature through a controller according to a prestored water saturated vapor characteristic list; then the temperature measurement module is used for sending the collected water body temperature and the collected tank body temperature to the controller; when the controller monitors that the water body temperature and the tank body temperature reach the set target temperature, the first valve is opened, so that the water body in the water storage tank is vaporized into the gas buffer tank, and the water vapor with specific pressure at the set temperature is effectively prepared; the device further comprises a pressure measurement module which is a common vacuum gauge, in the embodiment, the gas pressure measurement value acquired by the pressure measurement module is accurately calibrated and measured based on the water body temperature and the water saturation steam characteristic list, the problem that the water vapor pressure of the common vacuum gauge is deviated is solved, and therefore the use experience of a user is improved.
Description
Technical Field
The invention relates to the technical field of water vapor preparation, in particular to a water vapor preparation measuring device and system applied to a laboratory.
Background
Water vapor, as the main plume component of a two-component attitude control engine, is often taken as a typical object for experimental study when exploring the deposition characteristics of plume gas-phase pollutants. In order to simulate the action state of plume gas-phase pollutants in vacuum and the surface of an aerospace material, the water vapor pressure in an experiment is extremely low, and is usually below 1000 Pa. Therefore, it is necessary to realize the preparation and supply of high-purity steam under the corresponding conditions in the experimental process, and simultaneously control or measure the corresponding physical parameters such as pressure, temperature and mass flow.
The existing water vapor generator is mostly manufactured in a heating and vaporizing mode, the pressure and the temperature of the obtained water vapor are both at a higher level, the water vapor generator cannot be directly applied to relevant experiments for researching the deposition characteristics of plume gas-phase pollutants, and the conventional vacuum gauge usually equipped in the existing laboratory cannot realize accurate measurement of the water vapor pressure due to the fact that the measurement principle is closely related to the gas type, so that the use experience of a user is reduced.
Disclosure of Invention
In view of the above, the present invention provides a water vapor generation measuring device and system for use in a laboratory to alleviate the above technical problems.
In a first aspect, an embodiment of the present invention provides a water vapor production measurement device, where the water vapor production measurement device includes: the water storage tank is connected with the gas buffer tank through a first valve, and the temperature measurement module and the first valve are both connected with the controller; the controller is used for setting a target temperature according to a pre-stored water saturated steam characteristic list; the temperature measuring module comprises a first temperature control element and a second temperature control element, wherein the first temperature control element is arranged on the water storage tank and used for collecting the temperature of the water body in the water storage tank and sending the temperature of the water body to the controller; the second temperature control element is arranged on the gas buffer tank and used for collecting the tank body temperature of the gas buffer tank and sending the tank body temperature to the controller; the controller is further used for acquiring the water body temperature and the tank body temperature, and when the water body temperature and the tank body temperature reach the target temperature, the first valve is opened, so that the water body in the water storage tank is vaporized into the gas buffer tank.
With reference to the first aspect, an embodiment of the present invention provides a first possible implementation manner of the first aspect, where the water vapor preparation and measurement device further includes a pressure measurement module, the pressure measurement module is connected to the gas buffer tank through a second valve, the gas buffer tank is further connected to the external vacuum chamber through a third valve, and the pressure measurement module, the second valve, and the third valve are all connected to the controller; the pressure measurement module is used for collecting a gas pressure measurement value of a water body in the water storage tank vaporized into the gas buffer tank when the controller controls to open the second valve, and sending the gas pressure measurement value to the controller; the controller is also used for receiving the water body temperature acquired by the first temperature control element when the second valve is opened, searching a saturated steam pressure value corresponding to the water body temperature in a saturated steam characteristic list for the water body in a saturated state, and constructing a steam pressure conversion coefficient table according to the saturated steam pressure value and the gas pressure measurement value to finish the calibration of the pressure measurement module, so that the actual pressure corresponding to the gas pressure measurement value is calculated based on the steam pressure conversion coefficient table in the subsequent measurement; the controller is also used for opening the third valve when the actual pressure or the measured value of the gas pressure is monitored to be unchanged, so that the gas in the gas buffer tank enters the external vacuum chamber.
With reference to the first possible implementation manner of the first aspect, an embodiment of the present invention provides a second possible implementation manner of the first aspect, wherein the water vapor preparation and measurement apparatus further includes a flow meter connected to the controller, and the flow meter is installed on a pipeline between the first valve and the gas buffer tank; the controller is further used for opening the third valve when the opening of the flowmeter is monitored, so that the gas in the gas buffer tank enters the external vacuum chamber.
With reference to the second possible implementation manner of the first aspect, the embodiment of the present invention provides a third possible implementation manner of the first aspect, wherein the water vapor production measurement device further includes a vacuum flange, and the vacuum flange is installed at a position of the air exhaust port of the external vacuum chamber.
With reference to the first possible implementation manner of the first aspect, an embodiment of the present invention provides a fourth possible implementation manner of the first aspect, where the pressure measurement module includes a vacuum gauge and a vacuum gauge connected to the vacuum gauge; the vacuum gauge pipe is used for collecting an electric signal of the gas pressure in the gas buffer tank and sending the electric signal to the vacuum gauge; the vacuum gauge is connected with the controller and used for converting the electric signal into a pressure numerical value signal and sending the pressure numerical value signal to the controller.
With reference to the fourth possible implementation manner of the first aspect, the present invention provides a fifth possible implementation manner of the first aspect, wherein the vacuum gauge includes a first display unit; the first display unit is used for displaying the pressure numerical value signal.
With reference to the first aspect, an embodiment of the present invention provides a sixth possible implementation manner of the first aspect, where the water vapor production measuring device further includes a sealable joint, and the sealable joint is connected to the gas buffer tank; the sealable joint is also connected with an external gas supply pipeline and is used for enabling gas in the external gas supply pipeline to enter the gas buffer tank.
With reference to the first aspect, an embodiment of the present invention provides a seventh possible implementation manner of the first aspect, where the controller includes an input unit; the input unit is used for inputting a target temperature.
With reference to the seventh possible implementation manner of the first aspect, an embodiment of the present invention provides an eighth possible implementation manner of the first aspect, wherein the controller further includes a second display unit; the second display unit is connected with the input unit and used for displaying the information input by the input unit.
In a second aspect, embodiments of the present invention further provide a water vapor production measurement system, where the water vapor production measurement system is configured with the above water vapor production measurement device.
The embodiment of the invention has the following beneficial effects:
according to the device and the system for preparing and measuring the water vapor, provided by the embodiment of the invention, the target temperature is set by the controller according to the pre-stored water saturated vapor characteristic list; then the temperature measurement module is used for sending the collected water body temperature and the collected tank body temperature to the controller; when the controller monitors that the water body temperature and the tank body temperature reach the set target temperature, the first valve is opened, so that the water body in the water storage tank is vaporized into the gas buffer tank, and the water vapor at the set temperature is effectively prepared; the device further comprises a pressure measurement module which is a common vacuum gauge, in the embodiment, the gas pressure measurement value acquired by the pressure measurement module is accurately calibrated and measured based on the water body temperature and the water saturation steam characteristic list, the problem that the water vapor pressure of the common vacuum gauge is deviated is solved, and therefore the use experience of a user is improved.
Additional features and advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objectives and other advantages of the invention will be realized and attained by the structure particularly pointed out in the written description and drawings.
In order to make the aforementioned and other objects, features and advantages of the present invention comprehensible, preferred embodiments accompanied with figures are described in detail below.
Drawings
In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.
FIG. 1 is a schematic structural diagram of a water vapor production and measurement device according to an embodiment of the present invention;
fig. 2 is a schematic structural diagram of a list of characteristics of water-saturated vapor according to an embodiment of the present invention;
FIG. 3 is a schematic structural diagram of another steam generation measuring device provided in the embodiment of the present invention;
FIG. 4 is a schematic structural diagram of another steam generation measuring device provided in the embodiment of the present invention;
fig. 5 is a schematic structural diagram of a water vapor production measurement system according to an embodiment of the present invention.
Icon:
100-a water storage tank; 101-gas buffer tank; 102-a temperature measurement module; 103-a controller; 104-a first valve; 105-a first temperature control element; 106-a second temperature control element; 200-a pressure measurement module; 201-a second valve; 202-a third valve; 203-external vacuum chamber; 204-a flow meter; 205-vacuum gauge tube; 206-a vacuum gauge; 400-vacuum flange; 401-sealable joints; 402-a fourth valve; 500-steam preparation measurement system; 501-water vapor preparation measuring device.
Detailed Description
To make the objects, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings, and it is apparent that the described embodiments are some, but not all embodiments of the present invention. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Water vapor is the main plume component of the two-component attitude control engine, so the water vapor is often taken as a typical object for experimental research when the deposition characteristics of plume gas-phase pollutants are researched.
At present, most of the existing water vapor generators are manufactured in a heating and vaporizing mode, the pressure and the temperature of the obtained water vapor are both in a higher level, and the water vapor generators cannot be directly applied to relevant experiments for researching the deposition characteristics of plume gas-phase pollutants. If reduce the temperature and decompress high temperature and high pressure vapor, not only need extra purchase, processing corresponding equipment, can consume certain time moreover, and can lead to the vapor liquefaction to condense among the cooling process, be difficult to guarantee the quality of vapor.
The existing rarefied gas pressure measurement mostly adopts a vacuum gauge and a vacuum gauge controller matched mode is realized. Most of vacuum gauges used in laboratories at present are resistance gauges or thermocouple gauges which measure based on aerodynamic effect, and the main principle is that the change of thermocouple voltage is caused by the temperature change generated when gas particles collide with a resistance wire, so that the real-time pressure is reflected, and the measurement result has a certain proportional relation with the gas concentration and the gas type. Therefore, the vacuum gauge results in different component gases at the same pressure with differences.
Although there are special water vapor pressure gauges on the market, they are mostly used for high pressure measurement above 0.1MPa, and are not suitable for studying the deposition characteristics of plume pollutants. If additionally purchase the special pressure gauge of vapor, not only can cause the experiment cost to rise, and the dismouting leak hunting in the experimentation can greatly reduced work efficiency, and the working property of special vapor pressure gauge under the low pressure condition is not verified temporarily.
Based on this, the embodiment of the present invention provides a water vapor production measurement apparatus and system, which can alleviate the above technical problems.
For the understanding of the present embodiment, a detailed description will be given of a water vapor generation measuring device disclosed in the present embodiment.
The first embodiment is as follows:
the embodiment of the invention provides a water vapor preparation and measurement device, which is shown in a schematic structural diagram of the water vapor preparation and measurement device shown in fig. 1 and comprises the following components: the water storage tank 100 is connected with the gas buffer tank 101 through a first valve 104, and the temperature measurement module and the first valve are both connected with the controller.
Specifically, the controller is used for setting a target temperature according to a pre-stored water saturated steam characteristic list; the temperature measuring module comprises a first temperature control element 105 and a second temperature control element 106, wherein the first temperature control element is installed on the water storage tank and used for collecting the temperature of the water body in the water storage tank and sending the temperature of the water body to the controller; the second temperature control element is arranged on the gas buffer tank and used for collecting the tank body temperature of the gas buffer tank and sending the tank body temperature to the controller; the controller is further used for acquiring the water body temperature and the tank body temperature, and when the water body temperature and the tank body temperature reach the target temperature, the first valve is opened, so that the water body in the water storage tank is vaporized into the gas buffer tank.
In the specific implementation, the vaporization and condensation are carried out simultaneously in the vaporization process of a closed water container. At a certain temperature, the vaporization process initially prevails, and to a certain extent the number of vaporized molecules is in dynamic equilibrium with the number of condensed molecules, and the vaporization phenomenon stops macroscopically, this state being referred to as the saturation state. The pressure in the container in the saturated state is determined to be constant and is called the saturation pressure, i.e., the saturation vapor pressure, and the temperature in this state is called the saturation temperature. The saturation pressure and the saturation temperature are in one-to-one correspondence. Therefore, the relation between the saturation pressure and the saturation temperature is stored in the water saturated vapor characteristic list, for convenience of understanding, fig. 2 shows a schematic structural diagram of the water saturated vapor characteristic list, only the saturation pressure corresponding to the saturation temperature of-20 to 19 degrees celsius is shown in fig. 2, when in actual application, the required saturation pressure P is estimated according to experimental requirements, the saturation temperature T corresponding to the saturation pressure of water determined as the atmospheric pressure P in the table by querying the water saturated vapor characteristic list is found, the found saturation temperature T is the target temperature required to be set in the embodiment, generally, the controller includes an input unit, a user can send the target temperature to the controller through the input unit, when the controller monitors that the temperature of the water body in the water storage tank and the temperature of the tank body of the gas buffer tank both reach the target temperature, the controller controls the first valve to be opened, so that the water in the water storage tank is vaporized into the gas buffer tank to complete the preparation of water vapor.
According to the water vapor preparation and measurement device provided by the embodiment of the invention, the target temperature can be set through the controller according to the pre-stored water saturated vapor characteristic list; acquiring the temperature of the water body in the water storage tank by using a first temperature control element arranged on the water storage tank, and sending the temperature of the water body to a controller; collecting the tank body temperature of the gas buffer tank by using a second temperature control element arranged on the gas buffer tank, and sending the tank body temperature to a controller; when the controller monitors that the temperature of the water body and the temperature of the tank body reach the set target temperature, the first valve is opened, so that the water body in the water storage tank is vaporized into the gas buffer tank. The water vapor preparation and measurement device and the water vapor preparation and measurement system provided by the invention can effectively prepare water vapor with a set temperature, so that the prepared water vapor can be directly applied to relevant experiments for researching the deposition characteristics of plume gas-phase pollutants without cooling, and the use experience of users is further improved.
Generally, the controller is a Central Processing Unit (CPU) of the whole steam preparation and measurement device, and may be configured with a corresponding operating system, a control interface, and the like, and specifically, may be a Digital logic controller that can be used for automatic control, such as a single chip, a DSP (Digital Signal Processing), an ARM (Advanced RISC machine, ARM processor, and the like, and may load a control instruction into a memory at any time for storage and execution, and meanwhile, may have a CPU instruction and a data memory, an input/output Unit, a power module, a Digital analog Unit, and the like built in, and may be specifically set according to an actual use situation, which is not limited in this embodiment of the present invention.
Further, fig. 3 shows a schematic structural diagram of another water vapor preparation and measurement device, as shown in fig. 3, the water vapor preparation and measurement device further includes a pressure measurement module 200, the pressure measurement module is connected to the gas buffer tank 101 through a second valve 201, the gas buffer tank is further connected to an external vacuum chamber 203 through a third valve 202, and the pressure measurement module, the second valve and the third valve are all connected to the controller; the pressure measurement module is used for collecting a gas pressure measurement value of a water body in the water storage tank vaporized into the gas buffer tank when the controller controls to open the second valve, and sending the gas pressure measurement value to the controller; the controller is also used for receiving the water body temperature acquired by the first temperature control element when the second valve is opened, searching a saturated steam pressure value corresponding to the water body temperature in a saturated steam characteristic list for the water body in a saturated state, and constructing a steam pressure conversion coefficient table according to the saturated steam pressure value and the gas pressure measurement value to finish the calibration of the pressure measurement module, so that the actual pressure corresponding to the gas pressure measurement value is calculated based on the steam pressure conversion coefficient table in the subsequent measurement; the controller is also used for opening the third valve when the actual pressure or the measured value of the gas pressure is monitored to be unchanged, so that the gas in the gas buffer tank enters the external vacuum chamber.
Generally, the pressure measurement module is composed of a vacuum gauge and a vacuum gauge, and since the measurement results of the conventional vacuum gauge and the vacuum gauge are closely related to gas components and have a certain proportional deviation from the actual pressure when the pressure measurement module is used for measuring the pressure of the water vapor, the pressure measurement module in the conventional vacuum gauge and the vacuum gauge process is not suitable for measuring the pressure of the water vapor, and therefore, the constructed water vapor pressure conversion coefficient table is used for correcting the gas pressure measurement value collected by the pressure measurement module to obtain the actual pressure of the water vapor in the water storage tank in the embodiment.
In the concrete implementation, the construction process of the water vapor pressure conversion coefficient table is as follows: when the controller controls to open the second valve, the pressure measurement module can collect a gas pressure measurement value P 'of a water body in the water storage tank vaporized into the gas buffer tank, at this time, the temperature measurement module collects the temperature of the water body in a saturated state in the water storage tank, then a saturated steam pressure value P corresponding to the water body temperature is searched in a water saturated steam characteristic list, a ratio c between the saturated steam pressure value P and the gas pressure measurement value P' is calculated, the ratio c is a steam pressure conversion coefficient corresponding to the gas pressure measurement value P ', and finally, the plurality of gas pressure measurement values P' are in one-to-one correspondence with the corresponding steam pressure conversion coefficients to construct the steam pressure conversion coefficient table.
In this embodiment, the function of correcting the gas pressure measurement value collected by the pressure measurement module by using the constructed water vapor pressure conversion coefficient table is as follows:
1. the method can be specially used for calibrating and calibrating a common vacuum gauge in a laboratory, so that the vacuum gauge has the function of measuring the water vapor pressure, and no additional water vapor pressure measuring equipment is required to be purchased;
2. the equipment required by the system is both basic pipelines and measuring equipment for experiments, the calibration process is easy, the matched instruments are simple, the calibration can be carried out under the existing conditions of a laboratory, and the method is convenient, easy, simple, convenient and quick and does not need to seek a special calibration mechanism;
3. the pre-calibration enables the experiment pressure measurement to be carried out independently based on a vacuum gauge without depending on temperature measurement equipment.
Further, if the gas supply requirement is that a low-pressure gas environment is rapidly obtained, when the controller controls to open the second valve, the pressure measurement module collects a gas pressure measurement value of the water body in the water storage tank vaporized into the gas buffer tank; and when the controller monitors that the actual pressure of the steam is not changed, the third valve is opened, so that the gas in the gas buffer tank enters the external vacuum chamber.
During specific implementation, when the controller monitors that the water body temperature and the tank body temperature reach the target temperature, a second valve arranged between the pressure measurement module and the gas buffer tank is opened, so that the pressure measurement module can measure a gas pressure measurement value in the gas buffer tank and send the gas pressure measurement value to the controller; if the controller monitors that the gas pressure measured value uploaded by the pressure measuring module is kept unchanged within a certain time period, the fact that the gas pressure in the gas buffer tank reaches the saturation pressure P is proved, at the moment, the controller controls the third valve to start, the gas in the gas buffer tank enters the external vacuum chamber, and therefore the external vacuum chamber can rapidly establish a low-pressure gas environment based on a partial pressure method.
In practical use, as shown in fig. 3, the water vapor preparation and measurement device further comprises a flow meter 204 connected to the controller, the flow meter being installed on the pipeline between the first valve and the gas buffer tank; the controller is further used for opening the third valve when the opening of the flowmeter is monitored, so that the gas in the gas buffer tank enters the external vacuum chamber.
In specific application, if the air supply demand is constant flow and continuous supply, a flowmeter is required to be installed on the water vapor preparation measuring device. For convenience of illustration, fig. 4 shows a schematic structural diagram of another water vapor preparation and measurement device, as shown in fig. 4, a flow meter 204 is installed between the first valve and the gas buffer tank, in a specific implementation, a required flow value can be set on the flow meter according to an actual requirement, and the flow meter is turned on to operate, and when the controller monitors that the flow meter is turned on, the controller controls the third valve to be opened, so that the gas in the gas buffer tank stably enters the external vacuum chamber. The system adopts a C50 gas mass flow controller, and can realize stable flow control of gas flow within 0-20SCCM (Standard client center per Minute) except for closed and fully opened states.
In practical use, as shown in fig. 4, the water vapor production measuring device further includes a vacuum flange 400 installed at the position of the suction port of the external vacuum chamber.
Specifically, in order to connect the external vacuum chamber with the water vapor production measurement device, in this embodiment, a vacuum flange is installed at a position of an extraction opening for connecting the external vacuum chamber with the water vapor production measurement device, and the external vacuum chamber and the water vapor production measurement device are fixed, so that the water vapor in the water vapor production measurement device enters the external vacuum chamber.
As shown in FIG. 3, the pressure measurement module includes a vacuum gauge 205, and a vacuum gauge 206 connected to the vacuum gauge; the vacuum gauge pipe is connected with the controller and used for collecting electric signals of gas pressure in the gas buffer tank and sending the electric signals to the vacuum gauge, a common resistance gauge or a thermocouple gauge can be selected, and the ZJ-51 vacuum gauge pipe is selected and used in the system; the vacuum gauge is connected with the controller and used for converting the electric signal into a pressure value signal and sending the pressure value signal to the controller, and the system selects a DL-3 type vacuum gauge and belongs to a gas heat conduction vacuum gauge; further, the vacuum gauge includes a first display unit; the first display unit is used for displaying the pressure numerical value signal.
In specific implementation, as shown in fig. 4, the vacuum gauge is connected with the second valve, when the water temperature and the tank temperature reach the target temperature, the second valve is opened, the vacuum gauge can collect an electric signal of the gas pressure in the gas buffer tank, the vacuum gauge converts the electric signal collected by the vacuum gauge into a pressure value signal and sends the pressure value signal to the controller, the controller monitors the change of the gas pressure in the gas buffer tank according to the obtained pressure value signal, and when the pressure value signal is stable and unchanged, the third valve is controlled to be opened, so that the gas in the gas buffer tank enters the external vacuum chamber; further, the user can know the specific gas pressure condition in the gas buffer tank in detail through the first display unit.
As shown in fig. 4, the water vapor production measuring device further comprises a sealable joint 401, and the sealable joint is connected with the gas buffer tank; the sealable joint is also connected with an external gas supply pipeline and is used for enabling gas in the external gas supply pipeline to enter the gas buffer tank.
In concrete implementation, a fourth valve 402 is further arranged between the sealable joint and the gas buffer tank, when gas in an external gas supply pipeline is not required to enter the gas buffer tank, the fourth valve is closed, when gas in the external gas supply pipeline is required to enter the gas buffer tank, the fourth valve is opened, so that gas in the external gas supply pipeline can enter the gas buffer tank, and specifically, if stable flow of gas in the external gas supply pipeline is required to be continuously supplied, the flow meter needs to be set and started; if the air supply requirement is to rapidly obtain a low-pressure gas environment, the setting and starting of the flowmeter are not needed.
Generally, before steam generation and gas supply, the gas in the pipeline of the steam generation measuring device needs to be purified, and the specific steps of gas purification in the pipeline of the steam generation measuring device will be described by taking gas supply by using a water storage tank as an example:
1. adding enough distilled water into a water storage tank in advance; 2. ensuring that the first valve and the fourth valve are in a closed state, and the second valve and the third valve are in an open state; 3. starting a vacuum pump of an external vacuum chamber to carry out vacuum pumping operation; 4. observing the reading of the vacuum gauge, and when the vacuum degree in the pipeline reaches the requirement, performing a third valve; 5. opening a first valve to promote the distilled water in the water storage tank to be vaporized, and increasing the reading of the vacuum gauge at the moment; 6. when the water vapor in the pipeline reaches a saturated state, namely the reading of the vacuum meter is stable, closing the first valve; 7. repeating the steps 2-6 for a certain number of times in sequence; 8. and closing the first valve after the impurity removal requirement is met, opening the third valve, and closing the third valve after the gas in the pipeline is exhausted by utilizing a vacuum pump.
Specifically, taking the example of gas supply by using an external gas supply pipeline as an example, the specific steps of gas impurity removal in the pipeline of the water vapor preparation and measurement device are as follows:
1. connecting the sealable joint with an external air supply pipeline, and then keeping the external air supply pipeline in an air supply opening state; 2. ensuring that the first valve and the fourth valve are in a closed state, and the second valve and the third valve are in an open state; 3. starting a vacuum pump of an external vacuum chamber to carry out vacuum pumping operation; 4. observing the readings of the vacuum gauge, and closing the third valve when the vacuum degree in the pipeline meets the requirement; 5. opening a fourth valve to enable an external air supply pipeline to start air supply, and increasing the reading of the vacuum gauge at the moment; 6. when the gas in the pipeline reaches the required state, namely the reading of the vacuum gauge reaches the required pressure, the fourth valve is closed; 7. repeating the steps 2-6 for a certain number of times in sequence; 8. and after the impurity removal requirement is met, the fourth valve is closed, the third valve is opened, and the third valve is used for exhausting gas in the pipeline by using a vacuum pump.
Generally, the judgment of whether the impurity removal requirement is met can be determined according to the impurity removal frequency, the impurity removal requirement is generally met after 3 times of impurity removal, the impurity removal frequency can be set according to actual needs, and in the embodiment, the impurity removal frequency is not limited.
Example two:
on the basis of the above embodiments, the embodiment of the present invention further provides a water vapor production measurement system, such as a schematic structural diagram of the water vapor production measurement system shown in fig. 5, and as shown in fig. 5, the water vapor production measurement system 500 is configured with the water vapor production measurement device 501.
The steam preparing and measuring system provided by the embodiment of the invention has the same technical characteristics as the steam preparing and measuring device provided by the embodiment, so that the same technical problems can be solved, and the same technical effects can be achieved.
It is clear to those skilled in the art that, for convenience and brevity of description, the specific working process of the system described above may refer to the corresponding process in the foregoing embodiment of the apparatus, and is not described herein again.
In addition, in the description of the embodiments of the present invention, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases for those skilled in the art.
In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplicity of description, but do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.
Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art will understand that the following embodiments are merely illustrative of the present invention, and not restrictive, and the scope of the present invention is not limited thereto: any person skilled in the art can modify or easily conceive the technical solutions described in the foregoing embodiments or equivalent substitutes for some technical features within the technical scope of the present disclosure; such modifications, changes or substitutions do not depart from the spirit and scope of the embodiments of the present invention, and they should be construed as being included therein. Therefore, the protection scope of the present invention shall be subject to the protection scope of the claims.
Claims (9)
1. A water vapor production measuring device, comprising: the water storage tank is connected with the gas buffer tank through a first valve, and the temperature measurement module and the first valve are both connected with the controller;
the controller is used for setting a target temperature according to a pre-stored water saturated steam characteristic list;
the temperature measuring module comprises a first temperature control element and a second temperature control element, wherein the first temperature control element is installed on the water storage tank and used for collecting the temperature of the water body in the water storage tank and sending the temperature of the water body to the controller;
the second temperature control element is arranged on the gas buffer tank and used for collecting the tank body temperature of the gas buffer tank and sending the tank body temperature to the controller;
the controller is further configured to obtain the water temperature and the tank body temperature, and when the water temperature and the tank body temperature reach the target temperatures, open the first valve so that the water in the water storage tank is vaporized into the gas buffer tank;
the water vapor preparation and measurement device further comprises a pressure measurement module, the pressure measurement module is connected with the gas buffer tank through a second valve, the gas buffer tank is further connected with an external vacuum chamber through a third valve, and the pressure measurement module, the second valve and the third valve are all connected with the controller;
the pressure measurement module is used for collecting a gas pressure measurement value of a water body in the water storage tank vaporized into the gas buffer tank when the controller controls to open the second valve, and sending the gas pressure measurement value to the controller;
the controller is further configured to receive the water body temperature acquired by the first temperature control element when the second valve is opened, search a saturated vapor pressure value corresponding to the water body temperature in the water saturated vapor characteristic list for a water body in a saturated state, construct a vapor pressure conversion coefficient table according to the saturated vapor pressure value and the gas pressure measurement value to complete calibration of the pressure measurement module, and calculate an actual pressure corresponding to the gas pressure measurement value in subsequent measurements based on the vapor pressure conversion coefficient table;
and the controller is also used for opening a third valve when the actual pressure or the gas pressure measured value is monitored to be unchanged, so that the gas in the gas buffer tank enters the external vacuum chamber.
2. The apparatus of claim 1, wherein the water vapor production measurement device further comprises a flow meter connected to the controller, the flow meter being mounted on a conduit between the first valve and the gas buffer tank;
the controller is further configured to open the third valve when it is monitored that the flow meter is open, so that the gas in the gas buffer tank enters the external vacuum chamber.
3. The apparatus of claim 2, wherein the water vapor production measurement device further comprises a vacuum flange mounted at the external vacuum chamber extraction port location.
4. The apparatus of claim 1, wherein the pressure measurement module comprises a vacuum gauge and a vacuum gauge connected to the vacuum gauge;
the vacuum gauge pipe is used for collecting an electric signal of the gas pressure in the gas buffer tank and sending the electric signal to the vacuum gauge;
the vacuum gauge is connected with the controller and used for converting the electric signal into a pressure value signal and sending the pressure value signal to the controller.
5. The apparatus of claim 4, wherein the vacuum gauge comprises a first display unit;
the first display unit is used for displaying the pressure value signal.
6. The apparatus of claim 1, wherein the water vapor production measurement device further comprises a sealable connection to the gas buffer tank;
the sealable joint is also connected with an external gas supply pipeline and used for enabling gas in the external gas supply pipeline to enter the gas buffer tank.
7. The apparatus of claim 1, wherein the controller comprises an input unit;
the input unit is used for inputting the target temperature.
8. The apparatus of claim 7, wherein the controller further comprises a second display unit;
the second display unit is connected with the input unit and used for displaying the information input by the input unit.
9. A water vapor preparation and measurement system, which is provided with the water vapor preparation and measurement device as claimed in any one of claims 1 to 8.
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| CN102466220A (en) * | 2010-11-05 | 2012-05-23 | 西安扩力机电科技有限公司 | Industrial constant temperature control system |
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