CN111207294A - Gas pressurization filling system and pressurization filling method - Google Patents

Gas pressurization filling system and pressurization filling method Download PDF

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Publication number
CN111207294A
CN111207294A CN202010017614.6A CN202010017614A CN111207294A CN 111207294 A CN111207294 A CN 111207294A CN 202010017614 A CN202010017614 A CN 202010017614A CN 111207294 A CN111207294 A CN 111207294A
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gas
pressurized
auxiliary
liquid
chamber
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CN111207294B (en
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李东升
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SHANGHAI GENTECH CO Ltd
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SHANGHAI GENTECH CO Ltd
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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C5/00—Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures
    • F17C5/06—Methods or apparatus for filling containers with liquefied, solidified, or compressed gases under pressures for filling with compressed gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
    • F17C13/025—Special adaptations of indicating, measuring, or monitoring equipment having the pressure as the parameter
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
    • F17C13/026—Special adaptations of indicating, measuring, or monitoring equipment having the temperature as the parameter
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
    • F17C13/028—Special adaptations of indicating, measuring, or monitoring equipment having the volume as the parameter
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00—Details of vessels or of the filling or discharging of vessels
    • F17C13/04—Arrangement or mounting of valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C7/00—Methods or apparatus for discharging liquefied, solidified, or compressed gases from pressure vessels, not covered by another subclass
    • F17C7/02—Discharging liquefied gases
    • F17C7/04—Discharging liquefied gases with change of state, e.g. vaporisation
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323—Valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323—Valves
    • F17C2205/0332—Safety valves or pressure relief valves
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2221/00—Handled fluid, in particular type of fluid
    • F17C2221/01—Pure fluids
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
    • F17C2223/0107—Single phase
    • F17C2223/013—Single phase liquid
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
    • F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
    • F17C2223/035—High pressure (>10 bar)
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2227/00—Transfer of fluids, i.e. method or means for transferring the fluid; Heat exchange with the fluid
    • F17C2227/04—Methods for emptying or filling
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/03—Control means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/0408—Level of content in the vessel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/0421—Mass or weight of the content of the vessel
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/0426—Volume
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/043—Pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
    • F17C2250/04—Indicating or measuring of parameters as input values
    • F17C2250/0404—Parameters indicated or measured
    • F17C2250/0439—Temperature

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Abstract

The invention provides a gas pressurization filling system and a pressurization filling method, wherein the gas pressurization filling system comprises a gas source to be pressurized, an auxiliary pressurized gas source, a gas heating device and at least one collecting and evaporating device; the collecting and evaporating device comprises a gas collecting chamber and an auxiliary pressurizing chamber which are sequentially nested from inside to outside, a gas source to be pressurized is connected with the gas collecting chamber, a gas outlet of the auxiliary pressurizing gas source is divided into two paths, one path of gas source is directly connected with the auxiliary pressurizing chamber, and the other path of gas source is connected with the auxiliary pressurizing chamber through a gas heating device. The invention adopts low-temperature liquid nitrogen cooling, and firstly collects the gas to be pressurized into a gas collecting chamber for liquefaction or solidification. After the mixture was collected, it was gasified by heating with hot nitrogen. The filling pressure of the gas to be pressurized is controlled by controlling the heating temperature of the nitrogen. The pressurization process of the gas is realized by utilizing the volume expansion caused by phase change.

Description

Gas pressurization filling system and pressurization filling method
Technical Field
The invention belongs to the technical field of gas pressurization, relates to a gas pressurization filling system and a pressurization filling method, and particularly relates to a rare gas pressurization filling system and a pressurization filling method by using rare gas phase change.
Background
In the technical field of chemical gas separation, gas filling is required to be involved, namely, after target gas in a gas storage tank is pressurized to a certain filling pressure, a molding press is started to fill high-pressure gas into a gas cylinder on the premise of ensuring the purity.
CN109185695A discloses a high-pressure gas charging system, comprising: the inlet of the first pressurizing assembly is communicated with the outlet pipeline of the gas source; the gas volume of the capacity expansion assembly is greater than or equal to the single target filling amount of the high-pressure gas filling system, and the outlet of the first pressurization assembly is communicated with the inlet of the capacity expansion assembly through a pressurization outlet pipeline; and the outlet of the expansion assembly is communicated with the inlet of the buffer assembly, and the outlet of the buffer assembly is communicated with the inlet of the container to be filled through a system outlet pipeline.
CN209484265U discloses a gas filling system, which comprises a storage tank, a pressurization unit, a vaporization unit, a buffer unit and a pressure regulating unit, the storage tank, the pressurization unit, the vaporization unit, the buffer unit and the pressure regulating unit are connected in sequence, the booster unit comprises at least one booster pump, the input end of the booster pump is connected with the lower end of the storage tank through a pipeline, the vaporizing unit comprises at least one vaporizer, the output end of the booster pump is connected with the input end of the lower end of the vaporizer through a pipeline, the buffer unit comprises a buffer tank, the output end of the vaporizer is connected with the input end of the lower end of the buffer tank through a pipeline, the pressure regulating unit comprises a pressure regulating valve group, the output end of the upper end of the buffer tank is connected with the input end of the pressure regulating valve group through a pipeline, and the output end of the pressure regulating valve group is connected with a gas cylinder to be inflated.
CN208474935U discloses high pure oxygen fills system of filling, including high pure liquid oxygen storage tank, cryogenic liquids pump, vaporizer, busbar and the dress device that fills that connects gradually, fill the device and include a plurality of fill branch pipelines, fill the branch pipeline and be connected with the steel bottle, high pure oxygen fills system of filling still includes cooling device, booster pump and the spray set who connects gradually, spray set includes a plurality of nozzle, the nozzle orientation the steel bottle in order to the steel bottle sprays cryogenic gas.
The charging of high-purity gas is generally carried out by adopting a compressor or a booster pump, but the compressor and the booster pump comprise a plurality of moving parts, and have the defects of complex structure, high investment cost, high failure rate, high pollution risk, heavy system quality and the like.
Disclosure of Invention
Aiming at the defects in the prior art, the invention aims to provide a gas pressurizing and filling system and a pressurizing and filling method. After the mixture was collected, it was gasified by heating with hot nitrogen. The filling pressure of the gas to be pressurized is controlled by controlling the heating temperature of the nitrogen. The pressurization process of the gas is realized by utilizing the volume expansion caused by phase change.
In order to achieve the purpose, the invention adopts the following technical scheme:
in a first aspect, the present invention provides a gas pressurized charging system, which includes a gas source to be pressurized, an auxiliary pressurized gas source, a gas heating device, and at least one collecting and evaporating device.
The collecting and evaporating device comprises a gas collecting chamber and an auxiliary pressurizing chamber which are sequentially nested from inside to outside, a gas source to be pressurized is connected with the gas collecting chamber, a gas outlet of the auxiliary pressurizing gas source is divided into two paths, one path of gas source is directly connected with the auxiliary pressurizing chamber, and the other path of gas source is connected with the auxiliary pressurizing chamber through a gas heating device.
The invention realizes the pressurization filling process of the gas by utilizing the volume expansion generated by the gas phase change. The equipment such as a compressor or a booster pump used in the pressurizing process is omitted, and the investment cost of the equipment is reduced.
In a preferred embodiment of the present invention, the pressurized charging system includes a first collecting and evaporating device and a second collecting and evaporating device that are independent of each other.
As a preferable technical scheme of the invention, the gas source to be pressurized is stored with gaseous gas to be pressurized.
Preferably, the gas to be pressurized is a rare gas.
Preferably, the gas to be pressurized is xenon, krypton or radon.
Preferably, the gas source to be pressurized is a steel cylinder or a steel cylinder group.
It should be noted that, in the present invention, the cylinder or the cylinder group is only one storage medium of the gas to be pressurized, the present invention only limits the type of the gas to be pressurized, and the storage container or the storage medium thereof is not particularly required or limited.
As a preferable technical scheme of the invention, the top of the gas collecting chamber is provided with a gas inlet to be pressurized.
Preferably, the gas source to be pressurized is respectively and independently connected with the gas inlets to be pressurized of different gas collecting chambers through gas inlet pipelines.
Preferably, the air inlet pipeline is provided with an inlet valve.
Preferably, the inlet valve is close to the inlet of the gas to be pressurized.
As a preferable technical scheme of the invention, the top of the gas collecting chamber is also provided with a gas outlet to be pressurized.
Preferably, the gas outlet to be pressurized is connected with a high-pressure gas storage tank through a gas outlet pipeline.
Preferably, the air outlet pipeline is provided with an outlet valve.
Preferably, the outlet valve is close to the outlet of the gas to be pressurized.
As a preferred technical solution of the present invention, the auxiliary pressurized gas source stores a liquid auxiliary gas.
Preferably, the temperature of the liquid auxiliary gas is higher than the boiling point of the gas to be pressurized.
Preferably, the liquid auxiliary gas is liquid nitrogen.
Preferably, the auxiliary pressurized gas source is a liquid nitrogen tank car.
As a preferable technical scheme of the invention, the top of the auxiliary pressurizing chamber is provided with a liquid inlet and a gas inlet.
Preferably, the gas outlet of the auxiliary pressurized gas source is divided into a first liquid pipeline and a second liquid pipeline which are independent of each other, the outlet end of the first liquid pipeline is respectively connected with the liquid inlets of different auxiliary pressurized chambers, and the outlet end of the second liquid pipeline is connected to the gas heating device.
Preferably, a first liquid valve is arranged on the first liquid pipeline.
Preferably, the first liquid valve is close to a liquid inlet at the top of the auxiliary pressurizing chamber.
Preferably, a second liquid valve is arranged on the second liquid pipeline.
Preferably, the gas outlets of the gas heating devices are respectively connected with the gas inlets of different auxiliary pressurizing chambers through gas pipelines.
Preferably, the gas pipeline is provided with a gas valve.
Preferably, the gas valve is close to the gas inlet at the top of the auxiliary plenum chamber.
As a preferable technical solution of the present invention, the collecting and evaporating device further includes an external circulation pipeline circularly connected to the auxiliary pressurizing chamber, and the liquid auxiliary gas injected into the auxiliary pressurizing chamber circularly flows through the external circulation pipeline.
Preferably, the external circulation pipeline is connected with an exhaust pipeline.
Preferably, the collecting and evaporating device further comprises a heat preservation chamber positioned at the outer layer of the auxiliary pressurizing chamber.
Preferably, the heat preservation chamber is filled with heat preservation materials.
Preferably, the thermal insulation material comprises one or a combination of at least two of perlite, glass fiber, mineral wool or polyester film.
Preferably, the heat preservation chamber is in a vacuum environment.
In a second aspect, the present invention provides a gas pressurized-charging method, in which gas is pressurized and charged by using the gas pressurized-charging system of the first aspect, the gas pressurized-charging method includes:
the auxiliary pressurizing gas source injects low-temperature liquid auxiliary gas into the auxiliary pressurizing chamber, the gas source to be pressurized injects gas to be pressurized into the gas collecting chamber, and the gas to be pressurized is liquefied or solidified at low temperature; the auxiliary gas supplied by the auxiliary pressurizing gas source is heated by the gas heating device and then injected into the auxiliary pressurizing chamber, and the liquefied or solidified gas to be pressurized expands due to the phase change volume, so that the gas is pressurized.
As a preferable technical scheme of the invention, the gas pressurization filling method specifically comprises the following steps:
gas collection: the auxiliary pressurizing gas source injects low-temperature liquid auxiliary gas into the auxiliary pressurizing chamber through the first liquid pipeline, the liquid auxiliary gas circularly flows through the external circulating pipeline to maintain the low temperature of the auxiliary pressurizing chamber, the gas to be pressurized is injected into the gas collecting chamber by the gas source to be pressurized, and the gas to be pressurized enters the gas collecting chamber and is cooled to be liquid or solid by the low-temperature liquid auxiliary gas;
(II) gas pressurization: the liquid auxiliary gas in the auxiliary pressurizing chamber is exhausted by the exhaust pipeline, the auxiliary pressurizing gas source feeds the liquid auxiliary gas into the gas heating device through a second liquid pipeline, the auxiliary gas heated and gasified by the gas heating device enters the auxiliary pressurizing chamber, and the liquid or solid gas to be pressurized is filled into the high-pressure gas storage tank by the high-temperature auxiliary gas due to the expansion and pressurization of the phase-change volume;
(III) the first collecting and evaporating device or the second collecting and evaporating device sequentially and continuously collects gas and pressurizes the gas; when the first collecting and evaporating device collects gas, the second collecting and evaporating device pressurizes the gas; when the first collecting and evaporating device is used for gas pressurization, the second collecting and evaporating device is used for gas collection.
Preferably, the liquid auxiliary gas is liquid nitrogen.
Preferably, the boiling point of the gas to be pressurized is lower than the temperature of the liquid auxiliary gas.
Preferably, the gas to be pressurized is a rare gas.
Preferably, the gas to be pressurized is xenon, krypton or radon.
Preferably, in step (i), the pressure of the outlet gas of the pressurized gas source is 5 to 8bar, such as 5.0bar, 5.2bar, 5.4bar, 5.6bar, 5.8bar, 6.0bar, 6.2bar, 6.4bar, 6.6bar, 6.8bar, 7.0bar, 7.2bar, 7.4bar, 7.6bar, 7.8bar or 8.0bar, but not limited to the values listed, and other values not listed in the range of values are equally applicable; further preferably, the outlet pressure of the gas source to be pressurized is 7 bar.
Preferably, the gas source to be pressurized injects the gas to be pressurized into the gas collection chamber at a flow rate of 100-1000L/min, such as 100L/min, 200L/min, 300L/min, 400L/min, 500L/min, 600L/min, 700L/min, 800L/min, 900L/min or 1000L/min, but not limited to the values listed, and other values not listed in the range of values are equally applicable.
Preferably, in step (II), the heating temperature of the gas heating device is 20 to 40 ℃, for example, 20 ℃, 21 ℃, 22 ℃, 23 ℃, 24 ℃, 25 ℃, 26 ℃, 27 ℃, 28 ℃, 29 ℃, 30 ℃, 31 ℃, 32 ℃, 33 ℃, 34 ℃, 35 ℃, 36 ℃, 37 ℃, 38 ℃, 39 ℃ or 40 ℃, but is not limited to the recited values, and other values not recited in the range of the values are also applicable.
Preferably, the heated and gasified auxiliary gas enters the auxiliary pressure chamber at a flow rate of 600-1000L/min, such as 600L/min, 650L/min, 700L/min, 750L/min, 800L/min, 850L/min, 900L/min, 950L/min or 1000L/min, but not limited to the values listed, and other values not listed in the range of the values are also applicable.
Preferably, the gas to be pressurized is heated to gasify the volume expansion pressurization to 150-300 bar, for example 150bar, 160bar, 170bar, 180bar, 190bar, 200bar, 210bar, 220bar, 230bar, 240bar, 250bar, 260bar, 270bar, 280bar, 290bar or 300bar, but not limited to the enumerated values, and other non-enumerated values in the numerical range are also applicable; further preferably, the gas to be pressurized is expanded by the heated gasification volume to 200 bar.
Preferably, the pressurized gas to be pressurized is filled into the high pressure gas storage tank at a rate of 8-15 g/min, such as 8.0g/min, 8.5g/min, 9.0g/min, 9.5g/min, 10.0g/min, 10.5g/min, 11.0g/min, 11.5g/min, 12.0g/min, 12.5g/min, 13.0g/min, 13.5g/min, 14.0g/min, 14.5g/min, or 15.0g/min, but not limited to the values listed, and other values not listed in this range are equally applicable.
The system refers to an equipment system, or a production equipment.
Compared with the prior art, the invention has the beneficial effects that:
(1) the invention adopts low-temperature liquid nitrogen cooling, and firstly collects the gas to be pressurized into a gas collecting chamber for liquefaction or solidification. After the mixture was collected, it was gasified by heating with hot nitrogen. The filling pressure of the gas to be pressurized is controlled by controlling the heating temperature of the nitrogen. The pressurization process of the gas is realized by utilizing the volume expansion caused by phase change.
(2) The gas pressurizing and filling system provided by the invention adopts two collecting and evaporating devices, and when one device is used for collecting and liquefying, the other device is used for gasifying and pressurizing, so that the continuous filling of the gas to be pressurized is realized.
Drawings
FIG. 1 is a schematic diagram of a gas-filled plenum system according to one embodiment of the present invention;
FIG. 2 is a schematic structural diagram of a collecting and evaporating device according to an embodiment of the present invention;
wherein, 1-a gas source to be pressurized; 2-an air inlet pipeline; 3-auxiliary pressurized gas source; 4-a gas heating device; 5-a first liquid line; 6-a second liquid line; 7-a gaseous line; 8-a first collecting and evaporating device; 9-a first gas collection chamber; 10-a first auxiliary plenum; 11-a second collecting and evaporating device; 12-a second gas collection chamber; 13-a second auxiliary plenum chamber; 14-high pressure gas storage tank; 15-insulation chamber.
Detailed Description
It is to be understood that in the description of the present invention, the terms "center", "longitudinal", "lateral", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer", etc., indicate orientations or positional relationships based on those shown in the drawings, and are used only for convenience in describing the present invention and for simplicity in description, and do not indicate or imply that the device or element being referred to must have a particular orientation, be constructed and operated in a particular orientation, and thus, should not be taken as limiting the present invention. Furthermore, the terms "first", "second", etc. are used for descriptive purposes only and are not to be construed as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Thus, a feature defined as "first," "second," etc. may explicitly or implicitly include one or more of that feature. In the description of the present invention, "a plurality" means two or more unless otherwise specified.
It should be noted that, in the description of the present invention, unless otherwise explicitly specified or limited, the terms "disposed," "connected" and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood by those of ordinary skill in the art through specific situations.
The technical scheme of the invention is further explained by the specific implementation mode in combination with the attached drawings.
In one embodiment, the present invention provides a gas pressurized charging system comprising a gas source 1 to be pressurized, an auxiliary pressurized gas source 3, a gas heating device 4, and at least one collecting and evaporating device. The collecting and evaporating device comprises a gas collecting chamber and an auxiliary pressurizing chamber which are sequentially nested from inside to outside, a gas source 1 to be pressurized is connected with the gas collecting chamber, a gas outlet of the auxiliary pressurizing gas source is divided into two paths, one path is directly connected with the auxiliary pressurizing chamber, and the other path is connected with the auxiliary pressurizing chamber through a gas heating device 4.
Specifically, the pressurized charging system includes a first collecting and evaporating device 8 and a second collecting and evaporating device 11 that are independent of each other. The first collecting and evaporating device 8 comprises a first gas collecting chamber 9 and a first auxiliary pressurizing chamber 10 which are nested from inside to outside in sequence, and the second collecting and evaporating device 11 comprises a second gas collecting chamber 12 and a second auxiliary pressurizing chamber 13 which are nested from inside to outside in sequence.
The gas source 1 to be pressurized stores gaseous gas to be pressurized, the gas to be pressurized can be rare gas, and further, the gas to be pressurized is xenon, krypton or radon. An alternative source 1 of gas to be pressurized is in the form of a cylinder or cylinder bank.
The top parts of the first gas collection chamber 9 and the second gas collection chamber 12 are provided with gas inlets to be pressurized, and the gas source 1 to be pressurized is respectively and independently connected with the gas inlet to be pressurized of the first gas collection chamber 9 and the gas inlet to be pressurized of the second gas collection chamber 12 through the gas inlet pipeline 2. The inlet pipeline 2 is provided with an inlet valve which is close to an inlet of the gas to be pressurized. The top parts of the first gas collecting chamber 9 and the second gas collecting chamber 12 are also provided with gas outlets to be pressurized, and the gas outlets to be pressurized are connected with a high-pressure gas storage tank 14 through gas outlet pipelines. An outlet valve is arranged on the gas outlet pipeline and is close to the gas outlet to be pressurized.
The auxiliary pressurizing gas source 3 is internally stored with liquid auxiliary gas, the temperature of the liquid auxiliary gas is higher than the boiling point of the gas to be pressurized, the liquid auxiliary gas can be selected from liquid nitrogen, and the optional auxiliary pressurizing gas source 3 is in the form of a liquid nitrogen tank car.
The top of the first auxiliary plenum chamber 10 and the second auxiliary plenum chamber 13 are both provided with a liquid inlet and a gas inlet. The gas outlet of the auxiliary pressurized gas source 3 is divided into a first liquid pipeline 5 and a second liquid pipeline 6 which are independent of each other, the outlet end of the first liquid pipeline 5 is respectively and independently connected with the liquid inlet of the first auxiliary pressurizing chamber 10 and the liquid inlet of the second auxiliary pressurizing chamber 13, and the outlet end of the second liquid pipeline 6 is connected with the gas heating device 4. The first liquid pipeline 5 is provided with a first liquid valve, the first liquid valve is close to a liquid inlet at the top of the auxiliary pressurizing chamber, and the second liquid pipeline 6 is provided with a second liquid valve.
The gas outlet of the gas heating device 4 is respectively connected with the gas inlet of the first auxiliary pressurizing chamber 10 and the gas inlet of the second auxiliary pressurizing chamber 13 through the gas pipeline 7, and the gas pipeline 7 is provided with a gas valve which is close to the gas inlet at the top of the auxiliary pressurizing chamber.
The collecting and evaporating device also comprises an external circulation pipeline which is circularly connected with the auxiliary pressurizing chamber, and the liquid auxiliary gas injected into the auxiliary pressurizing chamber circularly flows through the external circulation pipeline. An exhaust pipeline is connected to the external circulation pipeline.
As shown in fig. 2, the first collecting and evaporating device 8 further includes a heat-preserving chamber 15 sleeved outside the first auxiliary pressure-charging chamber 10, and similarly, a heat-preserving chamber 15 is also sleeved outside the second auxiliary pressure-charging chamber 13. The interior of the insulated chamber 15 is evacuated and filled with an insulating material, optionally one or a combination of at least two of perlite, fiberglass, mineral wool, or mylar.
In another embodiment, the present invention provides a gas pressurized-charging method, in which gas is pressurized and charged by using the gas pressurized-charging system provided in the embodiment, the gas pressurized-charging method specifically includes the following steps:
(1) gas collection in the first gas collection chamber 9: the auxiliary pressurized gas source 3 fills low-temperature liquid auxiliary gas into the first auxiliary pressurizing chamber 10 through the first liquid pipeline 5, the auxiliary pressurized gas circularly flows through the external circulation pipeline to maintain a low-temperature environment in the first auxiliary pressurizing chamber 10, the gas source to be pressurized 1 injects gas to be pressurized into the first gas collecting chamber 9, and the gas to be pressurized is cooled to be liquid or solid by the low-temperature liquid auxiliary gas in the first gas collecting chamber 9;
(2) gas charging in the first gas collection chamber 9: after the gas to be pressurized in the first gas collection chamber 9 is completely cooled to be in a liquid state or a solid state by the liquid auxiliary gas, the liquid auxiliary gas in the first auxiliary pressurizing chamber 10 is exhausted through the exhaust pipeline, the auxiliary pressurizing gas source 3 feeds the liquid auxiliary gas into the gas heating device 4 through the second liquid pipeline 6, the auxiliary pressurizing gas heated and gasified by the gas heating device 4 enters the first auxiliary pressurizing chamber 10, the liquid or solid gas to be pressurized is heated by the auxiliary pressurizing gas, and the liquid or solid gas to be pressurized expands in volume due to phase change and is pressurized and charged into the high-pressure gas storage tank 14;
(3) gas collection in the second gas collection chamber 12: the auxiliary pressurized gas source 3 injects low-temperature liquid auxiliary gas into the second auxiliary pressurized chamber 13 through the first liquid pipeline 5, the liquid auxiliary gas circularly flows through the external circulation pipeline to maintain the low-temperature environment in the second auxiliary pressurized chamber 13, the gas source to be pressurized 1 injects gas to be pressurized into the second gas collecting chamber 12, and the gas to be pressurized is cooled to be liquid or solid by the low-temperature liquid auxiliary gas in the second gas collecting chamber 12;
(4) gas charging in the second gas collection chamber 12: after the gas to be pressurized in the second gas collection chamber 12 is completely cooled to be in a liquid state or a solid state by the liquid auxiliary pressurizing gas, the liquid auxiliary gas in the second auxiliary pressurizing chamber 13 is exhausted through the exhaust pipeline, the auxiliary pressurizing gas source 3 feeds the liquid auxiliary gas into the gas heating device 4 through the second liquid pipeline 6, the auxiliary pressurizing gas heated and gasified by the gas heating device 4 enters the second auxiliary pressurizing chamber 13, the liquid or solid gas to be pressurized is heated by the auxiliary pressurizing gas, the liquid or solid gas to be pressurized causes volume expansion due to phase change, and the gas to be pressurized enters the high-pressure gas storage tank 14;
(5) when the first collection and evaporation device 8 performs the step (1), the second collection and evaporation device 11 performs the step (4); when the first collection and evaporation device 8 performs the step (2), the second collection and evaporation device 11 performs the step (3); the first collecting and evaporating device 8 successively performs the step (1) and the step (2) in this order, and the second collecting and evaporating device 11 successively performs the step (3) and the step (4) in this order.
Example 1
The method for pressurizing and filling xenon by using the gas pressurizing and filling system provided by the specific embodiment specifically comprises the following steps:
(1) gas collection in the first gas collection chamber 9: the liquid nitrogen tank wagon pours liquid nitrogen into the first auxiliary pressurizing chamber 10 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain the low-temperature environment (-196 ℃) in the first auxiliary pressurizing chamber 10, the xenon steel cylinder pours xenon into the first gas collecting chamber 9 at the flow rate of 100L/min, the gas outlet pressure of the xenon steel cylinder is 5bar, and the xenon is cooled to be in a liquid state by the low-temperature liquid nitrogen in the first gas collecting chamber 9;
(2) gas charging in the first gas collection chamber 9: after the xenon in the first gas collection chamber 9 is completely cooled to a liquid state by liquid nitrogen, the liquid nitrogen in the first auxiliary pressurizing chamber 10 is emptied through an exhaust pipeline, a liquid nitrogen tank car introduces the liquid nitrogen to the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen which is heated and gasified to 20 ℃ by the gas heating device 4 enters the first auxiliary pressurizing chamber 10 at the flow rate of 600L/min, the liquid xenon is heated by the hot nitrogen, the liquid xenon expands in volume due to phase change, and the xenon is pressurized to 150bar and then is filled into the high-pressure gas storage tank 14 at the flow rate of 8 g/min;
(3) gas collection in the second gas collection chamber 12: the liquid nitrogen tank wagon fills liquid nitrogen into the second auxiliary pressurizing chamber 13 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain a low-temperature environment (-196 ℃) in the second auxiliary pressurizing chamber 13, the xenon steel cylinder fills xenon into the second gas collecting chamber 12 at the flow rate of 100L/min, the gas outlet pressure of the xenon steel cylinder is 5bar, and the xenon is cooled to be in a liquid state by the low-temperature liquid nitrogen in the second gas collecting chamber 12;
(4) gas charging in the second gas collection chamber 12: after the xenon in the second gas collecting chamber 12 is completely cooled to a liquid state by liquid nitrogen, the liquid nitrogen in the second auxiliary pressurizing chamber 13 is exhausted through an exhaust pipeline, a liquid nitrogen tank car introduces the liquid nitrogen to the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen which is heated and gasified to 20 ℃ by the gas heating device 4 enters the second auxiliary pressurizing chamber 13 at the flow rate of 600L/min, the liquid xenon is heated by the hot nitrogen, the liquid xenon expands in volume due to phase change, and the xenon is pressurized to 150bar and then is filled into the high-pressure gas storage tank 14 at the flow rate of 8 g/min;
(5) when the first collection and evaporation device 8 performs the step (1), the second collection and evaporation device 11 performs the step (4); when the first collection and evaporation device 8 performs the step (2), the second collection and evaporation device 11 performs the step (3); the first collecting and evaporating device 8 successively performs the step (1) and the step (2) in this order, and the second collecting and evaporating device 11 successively performs the step (3) and the step (4) in this order.
Example 2
The method for pressurized filling of krypton by using the gas pressurized filling system provided by the specific embodiment specifically comprises the following steps:
(1) gas collection in the first gas collection chamber 9: the liquid nitrogen tank wagon fills liquid nitrogen into the first auxiliary pressurizing chamber 10 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain a low-temperature environment (-196 ℃) in the first auxiliary pressurizing chamber 10, the krypton gas steel cylinder injects krypton into the first gas collecting chamber 9 at the flow rate of 2000L/min, the gas outlet pressure of the krypton gas steel cylinder is 5.6bar, and the krypton gas is cooled to be in a liquid state by the low-temperature liquid nitrogen in the first gas collecting chamber 9;
(2) gas charging in the first gas collection chamber 9: after krypton in the first gas collection chamber 9 is completely cooled to be in a liquid state by liquid nitrogen, the liquid nitrogen in the first auxiliary pressurizing chamber 10 is emptied through an exhaust pipeline, liquid nitrogen is introduced into the gas heating device 4 through the second liquid pipeline 6 by the liquid nitrogen tanker, hot nitrogen heated and gasified to 24 ℃ by the gas heating device 4 enters the first auxiliary pressurizing chamber 10 at the flow rate of 680L/min, the liquid krypton is heated by the hot nitrogen, the liquid krypton expands in volume due to phase change, and the krypton is pressurized to 180bar and then is filled into the high-pressure gas storage tank 14 at the flow rate of 9.5 g/min;
(3) gas collection in the second gas collection chamber 12: the liquid nitrogen tank wagon fills liquid nitrogen into the second auxiliary pressurizing chamber 13 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain a low-temperature environment (-196 ℃) in the second auxiliary pressurizing chamber 13, the krypton cylinder fills krypton into the second gas collecting chamber 12 at the flow rate of 2000L/min, the gas outlet pressure of the krypton cylinder is 5.6bar, and the krypton is cooled to be in a liquid state by the low-temperature liquid nitrogen in the second gas collecting chamber 12;
(4) gas charging in the second gas collection chamber 12: after the krypton in the second gas collection chamber 12 is completely cooled to be in a liquid state by the liquid nitrogen, the liquid nitrogen in the second auxiliary pressurizing chamber 13 is exhausted through an exhaust pipeline, the liquid nitrogen tank car introduces the liquid nitrogen into the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen heated and gasified to 24 ℃ by the gas heating device 4 enters the second auxiliary pressurizing chamber 13 at the flow rate of 680L/min, the liquid krypton is heated by the hot nitrogen, the volume of the liquid krypton expands due to phase change, and the liquid krypton is pressurized to 180bar and then is filled into the high-pressure gas storage tank 14 at the flow rate of 9.5 g/min;
(5) when the first collection and evaporation device 8 performs the step (1), the second collection and evaporation device 11 performs the step (4); when the first collection and evaporation device 8 performs the step (2), the second collection and evaporation device 11 performs the step (3); the first collecting and evaporating device 8 successively performs the step (1) and the step (2) in this order, and the second collecting and evaporating device 11 successively performs the step (3) and the step (4) in this order.
Example 3
The method for pressurizing and filling radon gas by using the gas pressurizing and filling system provided by the specific embodiment specifically comprises the following steps:
(1) gas collection in the first gas collection chamber 9: the liquid nitrogen tank wagon pours liquid nitrogen into the first auxiliary pressurizing chamber 10 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain the low-temperature environment (-196 ℃) in the first auxiliary pressurizing chamber 10, the radon gas steel cylinder pours radon gas into the first gas collecting chamber 9 at the flow rate of 4000L/min, the gas outlet pressure of the radon gas steel cylinder is 6bar, and the radon gas is cooled to be in a liquid state by the low-temperature liquid nitrogen in the first gas collecting chamber 9;
(2) gas charging in the first gas collection chamber 9: after the radon gas in the first gas collecting chamber 9 is completely cooled to liquid state by liquid nitrogen, the liquid nitrogen in the first auxiliary pressurizing chamber 10 is exhausted through an exhaust pipeline, a liquid nitrogen tanker introduces the liquid nitrogen to the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen which is heated and gasified to 28 ℃ by the gas heating device 4 enters the first auxiliary pressurizing chamber 10 at the flow rate of 760L/min, the liquid radon gas is heated by the hot nitrogen, the liquid radon gas expands in volume due to phase change, and the liquid radon gas is charged into the high-pressure gas storage tank 14 at the flow rate of 11g/min after being pressurized to 210 bar;
(3) gas collection in the second gas collection chamber 12: the liquid nitrogen tank wagon pours liquid nitrogen into the second auxiliary pressurizing chamber 13 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain the low-temperature environment (-196 ℃) in the second auxiliary pressurizing chamber 13, the radon gas steel cylinder pours radon gas into the second gas collecting chamber 12 at the flow rate of 4000L/min, the gas outlet pressure of the radon gas steel cylinder is 6bar, and the radon gas is cooled to be in a liquid state by the low-temperature liquid nitrogen in the second gas collecting chamber 12;
(4) gas charging in the second gas collection chamber 12: after the radon gas in the second gas collecting chamber 12 is completely cooled to liquid state by the liquid nitrogen, the liquid nitrogen in the second auxiliary pressurizing chamber 13 is exhausted through an exhaust pipeline, a liquid nitrogen tanker introduces the liquid nitrogen to the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen which is heated and gasified to 28 ℃ by the gas heating device 4 enters the second auxiliary pressurizing chamber 13 at the flow rate of 760L/min, the liquid radon gas is heated by the hot nitrogen, the liquid radon gas expands in volume due to phase change, and the radon gas is charged into the high-pressure gas storage tank 14 at the flow rate of 11g/min after being pressurized to 210 bar;
(5) when the first collection and evaporation device 8 performs the step (1), the second collection and evaporation device 11 performs the step (4); when the first collection and evaporation device 8 performs the step (2), the second collection and evaporation device 11 performs the step (3); the first collecting and evaporating device 8 successively performs the step (1) and the step (2) in this order, and the second collecting and evaporating device 11 successively performs the step (3) and the step (4) in this order.
Example 4
The method for pressurizing and filling xenon by using the gas pressurizing and filling system provided by the specific embodiment specifically comprises the following steps:
(1) gas collection in the first gas collection chamber 9: the liquid nitrogen tank wagon pours liquid nitrogen into the first auxiliary pressurizing chamber 10 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain the low-temperature environment (-196 ℃) in the first auxiliary pressurizing chamber 10, the xenon steel cylinder pours xenon into the first gas collecting chamber 9 at the flow rate of 6000L/min, the gas outlet pressure of the xenon steel cylinder is 6.6bar, and the xenon is cooled to be in a liquid state by the low-temperature liquid nitrogen in the first gas collecting chamber 9;
(2) gas charging in the first gas collection chamber 9: after the xenon in the first gas collecting chamber 9 is completely cooled to a liquid state by liquid nitrogen, the liquid nitrogen in the first auxiliary pressurizing chamber 10 is emptied through an exhaust pipeline, a liquid nitrogen tank car introduces the liquid nitrogen to the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen which is heated and gasified to 30 ℃ by the gas heating device 4 enters the first auxiliary pressurizing chamber 10 at the flow rate of 840L/min, the liquid xenon is heated by the hot nitrogen, the liquid xenon expands in volume due to phase change, and the xenon is pressurized to 240bar and then is filled into the high-pressure gas storage tank 14 at the flow rate of 12.5 g/min;
(3) gas collection in the second gas collection chamber 12: the liquid nitrogen tank wagon pours liquid nitrogen into the second auxiliary pressurizing chamber 13 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain the low-temperature environment (-196 ℃) in the second auxiliary pressurizing chamber 13, the xenon steel cylinder pours xenon into the second gas collecting chamber 12 at the flow rate of 6000L/min, the gas outlet pressure of the xenon steel cylinder is 6.6bar, and the xenon is cooled to be in a liquid state by the low-temperature liquid nitrogen in the second gas collecting chamber 12;
(4) gas charging in the second gas collection chamber 12: after the xenon in the second gas collecting chamber 12 is completely cooled to a liquid state by liquid nitrogen, the liquid nitrogen in the second auxiliary pressurizing chamber 13 is emptied through an exhaust pipeline, a liquid nitrogen tank car introduces the liquid nitrogen to the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen which is heated and gasified to 30 ℃ by the gas heating device 4 enters the second auxiliary pressurizing chamber 13 at the flow rate of 840L/min, the liquid xenon is heated by the hot nitrogen, the liquid xenon expands in volume due to phase change, and the xenon is pressurized to 240bar and then is filled into the high-pressure gas storage tank 14 at the flow rate of 12.5 g/min;
(5) when the first collection and evaporation device 8 performs the step (1), the second collection and evaporation device 11 performs the step (4); when the first collection and evaporation device 8 performs the step (2), the second collection and evaporation device 11 performs the step (3); the first collecting and evaporating device 8 successively performs the step (1) and the step (2) in this order, and the second collecting and evaporating device 11 successively performs the step (3) and the step (4) in this order.
Example 5
The method for pressurized filling of krypton by using the gas pressurized filling system provided by the specific embodiment specifically comprises the following steps:
(1) gas collection in the first gas collection chamber 9: the liquid nitrogen tank wagon fills liquid nitrogen into the first auxiliary pressurizing chamber 10 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain a low-temperature environment (-196 ℃) in the first auxiliary pressurizing chamber 10, the krypton gas steel cylinder injects krypton into the first gas collecting chamber 9 at a flow rate of 8000L/min, the gas outlet pressure of the krypton gas steel cylinder is 7.5bar, and the krypton gas is cooled to be solid by the low-temperature liquid nitrogen in the first gas collecting chamber 9;
(2) gas charging in the first gas collection chamber 9: after krypton in the first gas collection chamber 9 is completely cooled to be solid through liquid nitrogen, liquid nitrogen in the first auxiliary pressurizing chamber 10 is exhausted through an exhaust pipeline, liquid nitrogen is introduced into the gas heating device 4 through the second liquid pipeline 6 by the liquid nitrogen tanker, hot nitrogen heated and gasified to 35 ℃ by the gas heating device 4 enters the first auxiliary pressurizing chamber 10 at a flow rate of 920L/min, the solid krypton is heated by the hot nitrogen, the solid krypton expands in volume due to phase change, and the krypton is pressurized to 270bar and then is filled into the high-pressure gas storage tank 14 at a flow rate of 13.6 g/min;
(3) gas collection in the second gas collection chamber 12: the liquid nitrogen tank wagon fills liquid nitrogen into the second auxiliary pressurizing chamber 13 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain a low-temperature environment (-196 ℃) in the second auxiliary pressurizing chamber 13, the krypton steel cylinder injects krypton into the second gas collecting chamber 12 at the flow rate of 8000L/min, the gas outlet pressure of the krypton steel cylinder is 7.5bar, and the krypton is cooled to be solid by the low-temperature liquid nitrogen in the second gas collecting chamber 12;
(4) gas charging in the second gas collection chamber 12: after krypton in the second gas collection chamber 12 is completely cooled to be solid through liquid nitrogen, liquid nitrogen in the second auxiliary pressurizing chamber 13 is exhausted through an exhaust pipeline, liquid nitrogen is introduced into the gas heating device 4 through the second liquid pipeline 6 by the liquid nitrogen tanker, hot nitrogen heated and gasified to 35 ℃ by the gas heating device 4 enters the second auxiliary pressurizing chamber 13 at a flow rate of 920L/min, the solid krypton is heated by the hot nitrogen, the solid krypton expands in volume due to phase change, and the krypton is pressurized to 270bar and then is filled into the high-pressure gas storage tank 14 at a flow rate of 13.6 g/min;
(5) when the first collection and evaporation device 8 performs the step (1), the second collection and evaporation device 11 performs the step (4); when the first collection and evaporation device 8 performs the step (2), the second collection and evaporation device 11 performs the step (3); the first collecting and evaporating device 8 successively performs the step (1) and the step (2) in this order, and the second collecting and evaporating device 11 successively performs the step (3) and the step (4) in this order.
Example 6
The method for pressurizing and filling radon gas by using the gas pressurizing and filling system provided by the specific embodiment specifically comprises the following steps:
(1) gas collection in the first gas collection chamber 9: the liquid nitrogen tank wagon pours liquid nitrogen into the first auxiliary pressurizing chamber 10 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain the low-temperature environment (-196 ℃) in the first auxiliary pressurizing chamber 10, the radon gas steel cylinder pours radon gas into the first gas collecting chamber 9 at the flow rate of 10000L/min, the gas outlet pressure of the radon gas steel cylinder is 8bar, and the radon gas is cooled to be solid by the low-temperature liquid nitrogen in the first gas collecting chamber 9;
(2) gas charging in the first gas collection chamber 9: after the radon gas in the first gas collecting chamber 9 is completely cooled to be solid by liquid nitrogen, the liquid nitrogen in the first auxiliary pressurizing chamber 10 is exhausted through an exhaust pipeline, liquid nitrogen is introduced into the gas heating device 4 through the second liquid pipeline 6 by a liquid nitrogen tank car, hot nitrogen which is heated and gasified to 40 ℃ by the gas heating device 4 enters the first auxiliary pressurizing chamber 10 at the flow rate of 1000L/min, the solid radon gas is heated by the hot nitrogen, the solid radon gas expands in volume due to phase change, and the radon gas is charged into the high-pressure gas storage tank 14 at the flow rate of 15g/min after being pressurized to 300 bar;
(3) gas collection in the second gas collection chamber 12: the liquid nitrogen tank wagon pours liquid nitrogen into the second auxiliary pressurizing chamber 13 through the first liquid pipeline 5, the liquid nitrogen circularly flows through the external circulation pipeline to maintain the low-temperature environment (-196 ℃) in the second auxiliary pressurizing chamber 13, the radon gas steel cylinder pours radon gas into the second gas collecting chamber 12 at the flow rate of 10000L/min, the gas outlet pressure of the radon gas steel cylinder is 8bar, and the radon gas is cooled to be solid by the low-temperature liquid nitrogen in the second gas collecting chamber 12;
(4) gas charging in the second gas collection chamber 12: after the radon gas in the second gas collecting chamber 12 is completely cooled to be solid by the liquid nitrogen, the liquid nitrogen in the second auxiliary pressurizing chamber 13 is exhausted through an exhaust pipeline, a liquid nitrogen tank car introduces the liquid nitrogen to the gas heating device 4 through the second liquid pipeline 6, the hot nitrogen which is heated and gasified to 40 ℃ by the gas heating device 4 enters the second auxiliary pressurizing chamber 13 at the flow rate of 1000L/min, the solid radon gas is heated by the hot nitrogen, the solid radon gas expands in volume due to phase change, and the radon gas is charged into the high-pressure gas storage tank 14 at the flow rate of 15g/min after being pressurized to 300 bar;
(5) when the first collection and evaporation device 8 performs the step (1), the second collection and evaporation device 11 performs the step (4); when the first collection and evaporation device 8 performs the step (2), the second collection and evaporation device 11 performs the step (3); the first collecting and evaporating device 8 successively performs the step (1) and the step (2) in this order, and the second collecting and evaporating device 11 successively performs the step (3) and the step (4) in this order.
The applicant declares that the above description is only a specific embodiment of the present invention, but the scope of the present invention is not limited thereto, and it should be understood by those skilled in the art that any changes or substitutions that can be easily conceived by those skilled in the art within the technical scope of the present invention are within the scope and disclosure of the present invention.

Claims (10)

1. The gas pressurizing and filling system is characterized by comprising a gas source to be pressurized, an auxiliary pressurizing gas source, a gas heating device and at least one collecting and evaporating device;
the collecting and evaporating device comprises a gas collecting chamber and an auxiliary pressurizing chamber which are sequentially nested from inside to outside, a gas source to be pressurized is connected with the gas collecting chamber, a gas outlet of the auxiliary pressurizing gas source is divided into two paths, one path of gas source is directly connected with the auxiliary pressurizing chamber, and the other path of gas source is connected with the auxiliary pressurizing chamber through a gas heating device.
2. The gas plenum charging system of claim 1, wherein the plenum charging system comprises a first collection and vaporization device and a second collection and vaporization device that are independent of each other.
3. The gas pressurized charging system according to claim 1 or 2, wherein the gas source to be pressurized stores gaseous gas to be pressurized;
preferably, the gas to be pressurized is a rare gas;
preferably, the gas to be pressurized is xenon, krypton or radon;
preferably, the gas source to be pressurized is a steel cylinder or a steel cylinder group.
4. The gas pressurized charging system according to any one of claims 1-3, wherein the top of the gas collecting chamber is provided with a gas inlet to be pressurized;
preferably, the gas source to be pressurized is respectively and independently connected with the gas inlets to be pressurized of different gas collecting chambers through gas inlet pipelines;
preferably, an inlet valve is arranged on the air inlet pipeline;
preferably, the inlet valve is close to the inlet of the gas to be pressurized.
5. The gas pressurized charging system according to any one of claims 1-4, wherein the top of the gas collecting chamber is further provided with an outlet for gas to be pressurized;
preferably, the gas outlet to be pressurized is connected with a high-pressure gas storage tank through a gas outlet pipeline;
preferably, an outlet valve is arranged on the air outlet pipeline;
preferably, the outlet valve is close to the outlet of the gas to be pressurized.
6. The gas pressurized charging system according to any one of claims 1-5, wherein said auxiliary pressurized gas source stores a liquid auxiliary gas;
preferably, the temperature of the liquid auxiliary gas is higher than the boiling point of the gas to be pressurized;
preferably, the liquid auxiliary gas is liquid nitrogen;
preferably, the auxiliary pressurized gas source is a liquid nitrogen tank car.
7. A gas pressurized charging system according to any one of claims 1-6, characterized in that a liquid inlet and a gaseous inlet are opened at the top of said auxiliary charging chamber;
preferably, the gas outlet of the auxiliary pressurized gas source is divided into a first liquid pipeline and a second liquid pipeline which are independent of each other, the outlet end of the first liquid pipeline is respectively connected with the liquid inlets of different auxiliary pressurized chambers, and the outlet end of the second liquid pipeline is connected to a gas heating device;
preferably, a first liquid valve is arranged on the first liquid pipeline;
preferably, the first liquid valve is close to a liquid inlet at the top of the auxiliary pressurizing chamber;
preferably, a second liquid valve is arranged on the second liquid pipeline;
preferably, the gas outlet of the gas heating device is respectively connected with the gas inlets of different auxiliary pressurizing chambers through gas pipelines;
preferably, a gas valve is arranged on the gas pipeline;
preferably, the gas valve is close to the gas inlet at the top of the auxiliary plenum chamber.
8. The gas pressurized charging system according to any one of claims 1-7, wherein said collecting and evaporating device further comprises an external circulation pipeline circularly connected with the auxiliary pressurizing chamber, and the liquid auxiliary gas injected into the auxiliary pressurizing chamber circularly flows through the external circulation pipeline;
preferably, the external circulation pipeline is connected with an exhaust pipeline;
preferably, the collecting and evaporating device further comprises a heat preservation chamber positioned at the outer layer of the auxiliary pressurizing chamber;
preferably, the heat preservation chamber is filled with heat preservation materials;
preferably, the heat insulating material comprises one or a combination of at least two of perlite, glass fiber, mineral wool or polyester film;
preferably, the heat preservation chamber is in a vacuum environment.
9. A gas pressurized-charging method for pressurized-charging gas by using the gas pressurized-charging system according to any one of claims 1 to 8, the gas pressurized-charging method comprising:
the auxiliary pressurizing gas source injects low-temperature liquid auxiliary gas into the auxiliary pressurizing chamber, the gas source to be pressurized injects gas to be pressurized into the gas collecting chamber, and the gas to be pressurized is liquefied or solidified at low temperature; the auxiliary gas supplied by the auxiliary pressurizing gas source is heated by the gas heating device and then injected into the auxiliary pressurizing chamber, and the liquefied or solidified gas to be pressurized expands due to the phase change volume, so that the gas is pressurized.
10. The gas pressurized filling method according to claim 9, characterized in that it comprises in particular the steps of:
gas collection: the auxiliary pressurizing gas source injects low-temperature liquid auxiliary gas into the auxiliary pressurizing chamber through the first liquid pipeline, the liquid auxiliary gas circularly flows through the external circulating pipeline to maintain the low temperature of the auxiliary pressurizing chamber, the gas to be pressurized is injected into the gas collecting chamber by the gas source to be pressurized, and the gas to be pressurized enters the gas collecting chamber and is cooled to be liquid or solid by the low-temperature liquid auxiliary gas;
(II) gas pressurization: the liquid auxiliary gas in the auxiliary pressurizing chamber is exhausted by the exhaust pipeline, the auxiliary pressurizing gas source feeds the liquid auxiliary gas into the gas heating device through a second liquid pipeline, the auxiliary gas heated and gasified by the gas heating device enters the auxiliary pressurizing chamber, and the liquid or solid gas to be pressurized is filled into the high-pressure gas storage tank by the high-temperature auxiliary gas due to the expansion and pressurization of the phase-change volume;
(III) the first collecting and evaporating device or the second collecting and evaporating device sequentially and continuously collects gas and pressurizes the gas; when the first collecting and evaporating device collects gas, the second collecting and evaporating device pressurizes the gas; when the first collecting and evaporating device is used for pressurizing gas, the second collecting and evaporating device is used for collecting gas;
preferably, the liquid auxiliary gas is liquid nitrogen;
preferably, the boiling point of the gas to be pressurized is lower than the temperature of the liquid auxiliary gas;
preferably, the gas to be pressurized is a rare gas;
preferably, the gas to be pressurized is xenon, krypton or radon;
preferably, in the step (I), the outlet pressure of the gas source to be pressurized is 5-8 bar, and further preferably, the outlet pressure of the gas source to be pressurized is 7 bar;
preferably, the gas source to be pressurized injects gas to be pressurized into the gas collecting chamber at a flow rate of 100-1000L/min;
preferably, in the step (II), the heating temperature of the gas heating device is 20-40 ℃;
preferably, the auxiliary gas after heating and gasification enters an auxiliary pressurizing chamber at the flow rate of 600-1000L/min;
preferably, the gas to be pressurized is heated, gasified and expanded in volume and pressurized to 150-300 bar; further preferably, the gas to be pressurized is expanded and pressurized to 200bar by the heating gasification volume;
preferably, the pressurized gas to be pressurized enters the high-pressure gas storage tank at a speed of 8-15 g/min.
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