CN111189536A - Space extreme ultraviolet photometer - Google Patents
Space extreme ultraviolet photometer Download PDFInfo
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- CN111189536A CN111189536A CN201911387552.1A CN201911387552A CN111189536A CN 111189536 A CN111189536 A CN 111189536A CN 201911387552 A CN201911387552 A CN 201911387552A CN 111189536 A CN111189536 A CN 111189536A
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
- G01J1/429—Photometry, e.g. photographic exposure meter using electric radiation detectors applied to measurement of ultraviolet light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/0214—Constructional arrangements for removing stray light
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/02—Details
- G01J1/04—Optical or mechanical part supplementary adjustable parts
- G01J1/0488—Optical or mechanical part supplementary adjustable parts with spectral filtering
- G01J1/0492—Optical or mechanical part supplementary adjustable parts with spectral filtering using at least two different filters
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- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Abstract
The invention relates to a space extreme ultraviolet photometer, and relates to the technical field of extreme ultraviolet optical devices. The invention solves the technical problem of the band-free high-rejection-ratio pass filter in the extreme ultraviolet band. The space extreme ultraviolet photometer consists of an optical system consisting of a thin film absorption filter, an extreme ultraviolet narrow band multilayer film reflector, a heavy metal baffle plate at the back of the reflector and a photodiode detector. The invention combines an optical system consisting of an extreme ultraviolet narrow-band multilayer film reflector, a thin film absorption filter, a heavy metal baffle plate at the back of the reflector and a high-sensitivity photodiode detector into an extreme ultraviolet photometer, and can realize high-precision quantitative detection of space target extreme ultraviolet radiation through high-precision calibration on the ground. The space extreme ultraviolet photometer has the characteristics of simple structure, small volume, light weight and high reliability, can detect the radiant brightness of a space target in a specific extreme ultraviolet band, and can be widely applied to on-orbit calibration of space load of the band.
Description
Technical Field
The invention relates to the technical field of extreme ultraviolet optical devices, in particular to a space extreme ultraviolet photometer which is used for filtering high-energy radiation and external radiation of extreme ultraviolet by utilizing an extreme ultraviolet narrow-band multilayer film mirror optical system, filtering long-wave-band light radiation by utilizing a thin-film absorption optical filter and detecting the extreme ultraviolet radiation of a specific wave band.
Background
In the field of extreme ultraviolet optics, especially when carrying out extreme ultraviolet monitoring on a space target, quantitative measurement needs to be carried out on the absolute intensity of extreme ultraviolet radiation of a target source. For this reason, it is required to design a small-sized, highly reliable euv photometer suitable for space applications. In a space environment, because the atmosphere and the ozone layer do not exist, light radiation of various wave bands from a target and particle radiation of different energies from a cosmic background can be irradiated into a measuring instrument, but an available band-pass extreme ultraviolet transmission filter with a high suppression ratio does not exist at present, the brightness of extreme ultraviolet radiation of a specific wave band cannot be accurately measured, and a large number of extreme ultraviolet targets with research values cannot be detected.
Disclosure of Invention
The invention provides a space extreme ultraviolet photometer, which aims to solve the technical problems in the prior art. The space extreme ultraviolet photometer of the invention utilizes an extreme ultraviolet narrow-band multilayer film reflector optical system to filter out X-ray radiation and working waveband external extreme ultraviolet radiation, utilizes a thin film absorption filter to filter out far ultraviolet, visible and infrared part radiation in a long wave direction, and realizes high response detection of specific extreme ultraviolet wavelength radiation with higher out-of-band inhibition capability.
In order to solve the technical problems, the technical scheme of the invention is as follows:
the invention provides a space extreme ultraviolet photometer, which comprises:
the thin film absorption filter is arranged at the light inlet and can filter and remove long-wave radiation with far ultraviolet, visible and infrared wavelength;
the optical system consists of an extreme ultraviolet narrow-band multilayer film reflecting mirror, and can filter X-ray radiation and extreme ultraviolet radiation outside a working waveband, so that band-pass filtering of a specific extreme ultraviolet waveband is realized;
the heavy metal shielding plate at the back of the reflector prevents high-energy shielding particles from penetrating and being received by the detector;
the photodiode detector receives the radiation of the target extreme ultraviolet band filtered by the optical system;
the space extreme ultraviolet photometer formed by the components can be used for high-precision quantitative detection of space extreme ultraviolet target radiation through ground radiometric calibration.
In the technical scheme, the thin film absorption filter is obtained by plating one or more of Al, Ti and C thin films on the filter.
In the above technical solution, the optical system is composed of two EUV narrow band multilayer film mirrors.
In the technical scheme, the heavy metal shielding plate on the back of the reflector is made of high atomic number materials such as copper, lead or tungsten, and the thickness of the shielding plate is 3-5 mm.
In the technical scheme, the surface of the photodiode detector is plated with an Al, Ti or C film.
According to the space extreme ultraviolet photometer, after passing through a thin film absorption optical filter, an extreme ultraviolet narrow-band multilayer film reflector and a heavy metal baffle plate at the back of the reflector, only extreme ultraviolet radiation in a specific wavelength range reaches a photodiode detector, photoelectric conversion is carried out to obtain photocurrent in a specific proportional relation, and a signal acquisition system acquires the signal. The radiation response of the extreme ultraviolet photometer can be calibrated by calibrating the reflectivity of the extreme ultraviolet optical system, the transmittance of the thin film absorption filter and the photoelectric conversion efficiency of the photodiode detector, so that the high-precision quantitative measurement of the absolute radiation brightness of a target can be realized on track.
The invention has the following beneficial effects:
the invention solves the technical problem that a band-pass filter with no high rejection ratio is arranged in an extreme ultraviolet band, combines an extreme ultraviolet narrow-band multilayer film reflector system, a thin film absorption filter, a heavy metal baffle plate at the back of the reflector and a high-sensitivity photodiode detector into an extreme ultraviolet photometer, and can realize high-precision quantitative detection of space target extreme ultraviolet radiation through high-precision calibration on the ground.
The space extreme ultraviolet photometer of the invention realizes the band-pass filtering effect on a specific extreme ultraviolet band by utilizing an extreme ultraviolet multilayer film reflection optical system, and then realizes the high out-of-band rejection ratio measurement of the absolute brightness of the extreme ultraviolet radiation of the specific band by utilizing a thin film absorption filter to absorb light radiation in a long wave direction. The design is innovative, and the developed space extreme ultraviolet photometer has the characteristics of simple structure, small volume, light weight and high reliability, can detect the radiation brightness of a space target in a specific extreme ultraviolet band, and can be widely applied to on-orbit calibration of space load in the band. Therefore, the method can be widely applied to the extreme ultraviolet radiation calibration of space astronomical targets.
The space extreme ultraviolet photometer can also plate Al, Ti, C or other films on the surface of the photodiode, and further filter extreme ultraviolet, far ultraviolet, visible light and infrared radiation outside a working waveband; meanwhile, the backup function of the front-end film absorption filter of the light inlet can be achieved, and once the front-end film absorption filter leaks light, the photometer can still work normally.
Drawings
The present invention will be described in further detail with reference to the accompanying drawings and specific embodiments.
Fig. 1 is a schematic diagram of the optical path of the space extreme ultraviolet photometer of the present invention.
FIG. 2 is a graph showing transmittance of a light-entrance thin film filter (150nm Al film).
Fig. 3 is a graph of the EUV narrow band multilayer film mirror reflectance distribution (center wavelength 19.5nm), the left graph is a graph of the EUV narrow band multilayer film mirror 1 reflectance distribution, and the right graph is a graph of the EUV narrow band multilayer film mirror 2 reflectance distribution.
FIG. 4 is a graph of the integrated reflectivity profile of an EUV narrow band multilayer film optical system.
Detailed Description
In order to calibrate the extreme ultraviolet radiation of a specific waveband, the invention adopts an optical system consisting of an extreme ultraviolet multilayer film reflecting mirror, a thin film absorption filter and a photodiode detector coated with a thin film to be matched for use, thereby realizing the high-precision quantitative detection of the extreme ultraviolet waveband radiation.
The specific implementation scheme of the space extreme ultraviolet photometer provided by the invention is as follows:
the invention provides a space extreme ultraviolet photometer, which comprises: the device comprises a light inlet thin film filter (a filter plated with a 150nm Al film), an optical system consisting of two EUV narrow-band multilayer film reflectors 1 and 2, a heavy metal baffle plate at the back of the reflector, and a photodiode detector plated with a thin film; the schematic optical path is shown in fig. 1.
The light inlet thin film optical filter can preliminarily filter far ultraviolet, ultraviolet and visible light signals outside a working waveband, and simultaneously plays a role in reducing the temperature of the inner part.
FIG. 2 is a graph showing transmittance of a metal thin film filter at a light inlet (150nm Al film). From the figure, it can be known that the filter is used for filtering partial X-ray radiation in the short wave direction and partial extreme ultraviolet, far ultraviolet, ultraviolet and visible infrared radiation in the long wave direction.
The optical system consists of two reflectors (an EUV narrow-band multilayer film reflector 1 and an EUV narrow-band multilayer film reflector 2) plated with extreme ultraviolet narrow-band multilayer films, and X-ray radiation from a target or a cosmic background and extreme ultraviolet radiation of a non-working waveband are filtered;
fig. 3 is a graph of the EUV narrow band multilayer film mirror reflectance distribution (center wavelength 19.5nm), the left graph is a graph of the EUV narrow band multilayer film mirror 1 reflectance distribution, and the right graph is a graph of the EUV narrow band multilayer film mirror 2 reflectance distribution. From this figure it can be seen that the EUV narrow band multilayer mirror 1, 2 reflects only optical radiation in the operating band.
FIG. 4 is a graph of the integrated reflectivity profile of an EUV narrow band multilayer film optical system. From this figure, it can be seen that the combined reflectance of the EUV narrow-band multilayer film mirrors 1, 2 can suppress light radiation outside the operating band even better.
The heavy metal shielding plate on the back of the reflector is made of a high-density copper metal material with the thickness of about 3-5 nm, and the high-energy particles partially penetrating through the reflector are ensured to be absorbed.
The extreme ultraviolet radiation in a specific wavelength range after passing through an optical system consisting of a light inlet thin film optical filter and an extreme ultraviolet narrow-band multilayer film reflecting mirror irradiates a high-sensitivity and high-stability photodiode detector, and the detector responds and outputs an electric signal which is acquired by a subsequent acquisition system.
The surface of the photodiode detector is plated with an Al metal film, so that far ultraviolet, visible light and infrared radiation of non-target wave bands are further filtered; meanwhile, the backup function of the front thin film optical filter can be achieved, and once the light leakage of the front optical filter occurs, the photometer can still work normally.
In the above specific embodiment, the thin film absorption filter can also be obtained by coating one or more of Ti and C thin films on the filter; the heavy metal shielding plate on the back of the reflector can also be made of lead or tungsten with other thicknesses and high atomic number, and the thickness is about 3-5 mm; the surface of the photodiode detector can be plated with films such as Ti, C and the like; this is not intended to be an example.
It should be understood that the above examples are only for clarity of illustration and are not intended to limit the embodiments. Other variations and modifications will be apparent to persons skilled in the art in light of the above description. And are neither required nor exhaustive of all embodiments. And obvious variations or modifications therefrom are within the scope of the invention.
Claims (5)
1. A spatial extreme ultraviolet photometer comprising:
the thin film absorption filter is arranged at the light inlet and can filter and remove long-wave radiation with far ultraviolet, visible and infrared wavelength;
the optical system consists of an extreme ultraviolet narrow-band multilayer film reflecting mirror, and can filter X-ray radiation and extreme ultraviolet radiation outside a working waveband, so that band-pass filtering of a specific extreme ultraviolet waveband is realized;
the heavy metal shielding plate at the back of the reflector prevents high-energy shielding particles from penetrating and being received by the detector;
the photodiode detector receives the radiation of the target extreme ultraviolet band filtered by the optical system;
the space extreme ultraviolet photometer formed by the components can be used for high-precision quantitative detection of space extreme ultraviolet target radiation through ground radiometric calibration.
2. The spatial euv spectrometer of claim 1, wherein the thin film absorption filter is formed by coating the filter with one or more of Al, Ti, and C thin films.
3. The spatial EUV photometer of claim 1, wherein the optical system is comprised of two pieces of EUV narrow band multilayer film mirrors.
4. The space extreme ultraviolet photometer of claim 1, wherein the back heavy metal shielding plate of the reflector is made of high atomic number material copper, lead or tungsten, and the thickness is 3-5 mm.
5. The spatial extreme ultraviolet spectrometer of any of claims 1-4, wherein the photodiode detector is coated with an Al, Ti, or C thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911387552.1A CN111189536A (en) | 2019-12-30 | 2019-12-30 | Space extreme ultraviolet photometer |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911387552.1A CN111189536A (en) | 2019-12-30 | 2019-12-30 | Space extreme ultraviolet photometer |
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| Publication Number | Publication Date |
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| CN111189536A true CN111189536A (en) | 2020-05-22 |
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| CN201911387552.1A Pending CN111189536A (en) | 2019-12-30 | 2019-12-30 | Space extreme ultraviolet photometer |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111765971A (en) * | 2020-07-07 | 2020-10-13 | 北京卫星环境工程研究所 | Interference light eliminating structure for ionosphere photometer and control method |
| CN113820009A (en) * | 2021-09-22 | 2021-12-21 | 中国科学院长春光学精密机械与物理研究所 | On-orbit radiation calibration method for space extreme ultraviolet solar telescope |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030058429A1 (en) * | 2001-08-13 | 2003-03-27 | Lambda Physik Ag | Stable energy detector for extreme ultraviolet radiation detection |
| CN201203477Y (en) * | 2008-05-04 | 2009-03-04 | 中国科学院空间科学与应用研究中心 | Laboratory 19.5 nm pole ultraviolet light source system for satisfying space pole ultraviolet instrument scaling test |
| CN108072445A (en) * | 2017-12-07 | 2018-05-25 | 山东航天电子技术研究所 | A kind of deep space extreme ultraviolet/soft X-ray monochromatic instrument |
-
2019
- 2019-12-30 CN CN201911387552.1A patent/CN111189536A/en active Pending
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20030058429A1 (en) * | 2001-08-13 | 2003-03-27 | Lambda Physik Ag | Stable energy detector for extreme ultraviolet radiation detection |
| CN201203477Y (en) * | 2008-05-04 | 2009-03-04 | 中国科学院空间科学与应用研究中心 | Laboratory 19.5 nm pole ultraviolet light source system for satisfying space pole ultraviolet instrument scaling test |
| CN108072445A (en) * | 2017-12-07 | 2018-05-25 | 山东航天电子技术研究所 | A kind of deep space extreme ultraviolet/soft X-ray monochromatic instrument |
Non-Patent Citations (1)
| Title |
|---|
| I. YOSHIKAWA 等: "Development of a compact EUV photometer for imaging the planetary magnetosphere", 《JOURNAL OF GEOPHYSICAL RESEARCH》 * |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111765971A (en) * | 2020-07-07 | 2020-10-13 | 北京卫星环境工程研究所 | Interference light eliminating structure for ionosphere photometer and control method |
| CN111765971B (en) * | 2020-07-07 | 2022-11-22 | 北京卫星环境工程研究所 | Interference light eliminating structure for ionosphere photometer and control method |
| CN113820009A (en) * | 2021-09-22 | 2021-12-21 | 中国科学院长春光学精密机械与物理研究所 | On-orbit radiation calibration method for space extreme ultraviolet solar telescope |
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Application publication date: 20200522 |