CN111172555B - Carbon anode plate for fluorine production - Google Patents
Carbon anode plate for fluorine production Download PDFInfo
- Publication number
- CN111172555B CN111172555B CN202010075403.8A CN202010075403A CN111172555B CN 111172555 B CN111172555 B CN 111172555B CN 202010075403 A CN202010075403 A CN 202010075403A CN 111172555 B CN111172555 B CN 111172555B
- Authority
- CN
- China
- Prior art keywords
- carbon
- plate
- silicon carbide
- carbon anode
- anode plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B1/00—Electrolytic production of inorganic compounds or non-metals
- C25B1/01—Products
- C25B1/24—Halogens or compounds thereof
- C25B1/245—Fluorine; Compounds thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
- C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
- C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
- C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
- C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
- C25B11/091—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of at least one catalytic element and at least one catalytic compound; consisting of two or more catalytic elements or catalytic compounds
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electrochemistry (AREA)
- Inorganic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
The invention relates to a carbon anode plate for preparing fluorine, which consists of a carbon plate and a carbon/silicon carbide doped coating deposited on the surface of the carbon plate. Compared with the prior art, the invention adopts a special treatment process to form the protective layer on the surface of the carbon anode plate, can improve the surface corrosion resistance, delays the formation of the passivation layer on the surface layer of the carbon anode and is beneficial to prolonging the service life of the carbon anode.
Description
Technical Field
The invention belongs to the technical field of carbon anode plates, and relates to a carbon anode plate for fluorine production.
Background
The elementary fluorine gas plays an important role in the nuclear industry and the integrated circuit industry, the intermediate temperature electrolysis fluorine preparation process is the only elementary fluorine gas preparation process for realizing the industrial production at present, and the process mainly takes an amorphous carbon material as an anode material.
The carbon anode is installed in the electrolytic cell in a clamping plate type and a screw type mode, wherein the screw type is mainly used for a 10KA electrolytic cell, at present, the service life of the domestic screw type carbon anode plate for installation is generally short, the stable operation life of most products under the working condition of 6-8 KA cannot reach 6 months, and the carbon anode becomes a bottleneck for restricting the development of the domestic fluorine preparation technology by electrolysis.
The main reasons for the failure of the carbon anode plate to operate continuously are cracking, and the cracking causes are many, and the carbon anode plate is typically corroded and polarized, so that the solution of the above problems can help to prolong the operating life of the carbon anode plate.
Disclosure of Invention
The invention aims to provide a carbon anode plate for fluorine preparation, which aims to overcome the defects in the prior art. The special treatment process is adopted to form the protective layer on the surface of the carbon anode plate, so that the surface corrosion resistance can be improved, the formation of a passivation layer on the surface layer of the carbon anode can be delayed, and the service life of the carbon anode can be prolonged.
The purpose of the invention can be realized by the following technical scheme:
a carbon anode plate for preparing fluorine consists of a carbon plate and a carbon/silicon carbide doped coating deposited on the surface of the carbon plate.
Further, in the carbon/silicon carbide doped coating, the content of silicon carbide in the coating is not more than 90%.
Furthermore, the thickness of the carbon/silicon carbide doped coating is not more than 10 μm.
Further, the carbon/silicon carbide doped coating is deposited by the following method:
placing the carbon plate in a vapor deposition furnace, and introducing CH 4 、SiCl 4 、H 2 And N 2 And (4) forming mixed gas, and depositing at high temperature to finish the process.
Further, in the mixed gas, CH 4 、SiCl 4 、H 2 And N 2 Are respectively 30%, 5% and 60%.
Furthermore, the flow rate of the mixed gas introduced into the vapor deposition furnace is 200L/h.
Furthermore, the process conditions of the high-temperature deposition are as follows: the pressure in the furnace was maintained at 10KPa, and the precipitate was deposited at 1200 ℃ for 30 hours.
The invention has the innovation that the silicon carbide is doped in the same conventional carbon coating, so that the hydrofluoric acid corrosion resistance of the product is improved, and meanwhile, the formation of a continuous graphite fluoride passivation layer is prevented due to the existence of the silicon carbide coating. In the component ratio, siCl 4 And H 2 The ratio of (b) should be properly controlled and should be maintained at a low level because, when the contents of the above two gases are too high, the formation of the silicon carbide coating is facilitated, and the formation of the carbon coating is not utilized, but the electrical conductivity of the silicon carbide is significantly inferior to that of carbon, so that when the content of the silicon carbide is too high, the electrical conductivity of the product is significantly reduced, and the adverse effect is generated.
Furthermore, before deposition, the carbon plate is subjected to surface polishing, ultrasonic cleaning and drying.
Compared with the prior art, the invention has the following advantages:
(1) The carbon/silicon carbide coating has better corrosion resistance than pure amorphous carbon;
(2) The continuous graphite fluoride passivation layer is more difficult to form, and the polarization resistance is better.
Detailed Description
The present invention will be described in detail with reference to specific examples. The present embodiment is implemented on the premise of the technical solution of the present invention, and a detailed implementation manner and a specific operation process are given, but the scope of the present invention is not limited to the following embodiments.
In the following examples, unless otherwise specified, all the materials or treatment techniques are conventional commercial products or conventional treatment techniques in the art.
Example 1:
taking the density of 1.75g/cm 3 The carbon plate with the graphitization degree of 0 and the size of 600mm, 300mm and 70mm is dried after surface polishing and ultrasonic cleaning, the dried carbon plate is placed in a vapor deposition furnace, and the volume ratio is as follows: 30% of CH 4 、5%SiCl 4 、5%H 2 And 60% of N 2 The mixed gas of (2) was introduced into a deposition furnace at a flow rate of 200L/h while maintaining a gas pressure in the furnace at 10KPa, and was deposited at 1200 ℃ for 30 hours. The coating thickness was tested to be about 4-5 μm.
Comparative example 1:
taking the density of 1.75g/cm 3 A carbon plate with graphitization degree of 0 and size of 600mm x 300mm x 70mm, the carbon plate is dried after surface polishing and ultrasonic cleaning, the dried carbon plate is placed in a vapor deposition furnace, and N is filled in the vapor deposition furnace 2 As a protective atmosphere, N 2 The mixture was introduced into a deposition furnace at a flow rate of 200L/h while maintaining the gas pressure in the furnace at 10KPa, and treated at 1200 ℃ for 30 hours.
The carbon anode plates in the comparative example 1 and the embodiment 1 are simultaneously placed in the same electrolytic tank to operate, the carbon anode plates are operated for 1 month under the working condition of 660A, taken out and soaked in KOH aqueous solution with the pH value of 11 and the temperature of 100 ℃ for a week, taken out and washed clean by pure water and then quickly dried, 4 samples with the diameter of 10mm and the thickness of 3mm are respectively prepared at the same positions of the surface, and XPS tests show that the content of unfluorinated carbon atoms in the example 1 is 50 percent and the content of unfluorinated carbon atoms in the comparative example 1 is 23.3 percent, and the test results show that the coating in the example 1 effectively prevents the formation of a fluorinated graphite layer and is beneficial to improving the corrosion resistance and the polarization resistance of the product.
In the above examples, the obtained carbon plate is preferably produced with an aggregate having a particle size of less than 20 μm. The concrete sources of the adopted aggregate are as follows: firstly, 300-mesh coke powder (namely petroleum coke powder) is purchased, and is reprocessed by using a superfine vertical mill grinding machine, and the final aggregate is obtained by screening through a 800-mesh standard sieve.
The embodiments described above are intended to facilitate a person of ordinary skill in the art in understanding and using the invention. It will be readily apparent to those skilled in the art that various modifications to these embodiments may be made, and the generic principles described herein may be applied to other embodiments without the use of the inventive faculty. Therefore, the present invention is not limited to the above embodiments, and those skilled in the art should make modifications and alterations without departing from the scope of the present invention.
Claims (2)
1. A carbon anode plate for fluorine production is characterized by consisting of a carbon plate and a carbon/silicon carbide doped coating deposited on the surface of the carbon plate;
in the carbon/silicon carbide doped coating, the silicon carbide content is not more than 90%;
the thickness of the carbon/silicon carbide doped coating is not more than 10 mu m;
the carbon/silicon carbide doped coating is obtained by deposition through the following method:
placing the carbon plate in a vapor deposition furnace, and introducing CH 4 、SiCl 4 、H 2 And N 2 The formed mixed gas is deposited at high temperature, and then the process is finished;
in a mixed gas of CH 4 、SiCl 4 、H 2 And N 2 The volume contents of (A) are respectively 30%, 5% and 60%;
the flow rate of the mixed gas introduced into the vapor deposition furnace is 200L/h;
the process conditions of high-temperature deposition are as follows: the pressure in the furnace was maintained at 10KPa, and the precipitate was deposited at 1200 ℃ for 30 hours.
2. The carbon anode plate for fluorine production according to claim 1, wherein the carbon plate is subjected to surface polishing, ultrasonic cleaning and drying before deposition.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010075403.8A CN111172555B (en) | 2020-01-22 | 2020-01-22 | Carbon anode plate for fluorine production |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202010075403.8A CN111172555B (en) | 2020-01-22 | 2020-01-22 | Carbon anode plate for fluorine production |
Publications (2)
Publication Number | Publication Date |
---|---|
CN111172555A CN111172555A (en) | 2020-05-19 |
CN111172555B true CN111172555B (en) | 2022-11-08 |
Family
ID=70648125
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN202010075403.8A Active CN111172555B (en) | 2020-01-22 | 2020-01-22 | Carbon anode plate for fluorine production |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN111172555B (en) |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3925577A (en) * | 1972-11-24 | 1975-12-09 | Westinghouse Electric Corp | Silicon carbide coated graphite members and process for producing the same |
US5364513A (en) * | 1992-06-12 | 1994-11-15 | Moltech Invent S.A. | Electrochemical cell component or other material having oxidation preventive coating |
CN101220485A (en) * | 2007-10-17 | 2008-07-16 | 中南大学 | Method for manufacturing fluorine carbon anode chemical vapor deposition pyrolytic carbon polarization resistant coating |
CN102277560A (en) * | 2011-08-23 | 2011-12-14 | 南京理工大学 | Method for improving oxidation resistance of graphite electrode by obtaining SiC/C gradient surface coating through chemical vapor deposition |
CN102515871A (en) * | 2011-11-23 | 2012-06-27 | 西安超码科技有限公司 | Preparation method of carbon/carbon heater anti-scour C/SiC coating |
CN104119108A (en) * | 2014-08-08 | 2014-10-29 | 苏州宏久航空防热材料科技有限公司 | Method for preparing composite ceramic graphite electrode |
CN105152687A (en) * | 2015-07-13 | 2015-12-16 | 清华大学 | Porous silicon carbide coating layer and production method thereof |
CN105732044A (en) * | 2016-02-03 | 2016-07-06 | 深圳市商德先进陶瓷有限公司 | High-purity silicon carbide ceramic manufacturing method and ceramic base material |
-
2020
- 2020-01-22 CN CN202010075403.8A patent/CN111172555B/en active Active
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3925577A (en) * | 1972-11-24 | 1975-12-09 | Westinghouse Electric Corp | Silicon carbide coated graphite members and process for producing the same |
US5364513A (en) * | 1992-06-12 | 1994-11-15 | Moltech Invent S.A. | Electrochemical cell component or other material having oxidation preventive coating |
CN101220485A (en) * | 2007-10-17 | 2008-07-16 | 中南大学 | Method for manufacturing fluorine carbon anode chemical vapor deposition pyrolytic carbon polarization resistant coating |
CN102277560A (en) * | 2011-08-23 | 2011-12-14 | 南京理工大学 | Method for improving oxidation resistance of graphite electrode by obtaining SiC/C gradient surface coating through chemical vapor deposition |
CN102515871A (en) * | 2011-11-23 | 2012-06-27 | 西安超码科技有限公司 | Preparation method of carbon/carbon heater anti-scour C/SiC coating |
CN104119108A (en) * | 2014-08-08 | 2014-10-29 | 苏州宏久航空防热材料科技有限公司 | Method for preparing composite ceramic graphite electrode |
CN105152687A (en) * | 2015-07-13 | 2015-12-16 | 清华大学 | Porous silicon carbide coating layer and production method thereof |
CN105732044A (en) * | 2016-02-03 | 2016-07-06 | 深圳市商德先进陶瓷有限公司 | High-purity silicon carbide ceramic manufacturing method and ceramic base material |
Also Published As
Publication number | Publication date |
---|---|
CN111172555A (en) | 2020-05-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2873988B2 (en) | Electrode plate for plasma etching | |
CN112430095A (en) | Method for preparing high-performance graphite from graphene oxide modified coal pitch | |
CN111172555B (en) | Carbon anode plate for fluorine production | |
CN105624642A (en) | Method for directly depositing diamond film on graphite substrate | |
Pearson et al. | The mechanism of electrolytic processes. Part V. The adsorption and desorption of hydrogen at platinum electrodes | |
CN101724864B (en) | Preparation method of non-graphitized conductive carbon anode material | |
CN110724840B (en) | Preparation method of polyaniline/N-doped graphitized carbon composite conductive membrane electrode | |
CN112851334A (en) | Heating body based on silicon nitride and preparation process thereof | |
CN100590229C (en) | Method for manufacturing fluorine carbon anode chemical vapor deposition pyrolytic carbon polarization resistant coating | |
CN107083559B (en) | The method of high-quality nickel is chemically electrolysed out in nickel-plating waste water | |
CN114695951B (en) | Preparation method of composite solid electrolyte | |
JPH02236292A (en) | Production of carbonaceous electrode plate for electrolytic production of fluorine | |
KR101200185B1 (en) | Method for regenerating nickel sludge occurred in production process of nitrogen trifluoride gas | |
CN115233197A (en) | Titanium nitride plated diamond and production process thereof | |
CN109853003B (en) | Microporous channel type molten salt corrosion resistant boride/diamond composite material and preparation method thereof | |
CN111234851A (en) | Method for improving oil shale cohesiveness for coal blending and coking | |
Zvyagintseva et al. | The problem of hydrogen permeation into the boron doped electrodeposited nickel films | |
CN1272253C (en) | Process for preparing lithium nickelate and process for preparing enamel using it as adherence promotor | |
CN118063199A (en) | Preparation and use method for producing dry type anti-seepage material by using bauxite clinker waste residues | |
CN115650205A (en) | Pretreatment method for sodium ion battery negative electrode material | |
CN117088375A (en) | Silicon-carbon composite material, preparation method thereof, negative electrode and battery | |
CN101705478B (en) | Method for improving strength of free-standing diamond film | |
CN114875425A (en) | Carbon-based electrode plate for hydrogen production by water electrolysis and preparation method thereof | |
JPH11330080A (en) | Hydrogen treatment method | |
Tian et al. | Adjustment of residual stress and intermediate layer to BDD/porous Ti composite membrane |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PB01 | Publication | ||
PB01 | Publication | ||
SE01 | Entry into force of request for substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
GR01 | Patent grant | ||
GR01 | Patent grant |