CN111060295A - Beam splitting element and calibration device - Google Patents
Beam splitting element and calibration device Download PDFInfo
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- CN111060295A CN111060295A CN202010027632.2A CN202010027632A CN111060295A CN 111060295 A CN111060295 A CN 111060295A CN 202010027632 A CN202010027632 A CN 202010027632A CN 111060295 A CN111060295 A CN 111060295A
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- 239000010453 quartz Substances 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- 239000011521 glass Substances 0.000 claims description 3
- 230000001678 irradiating effect Effects 0.000 claims 1
- 230000035515 penetration Effects 0.000 abstract description 4
- 230000003760 hair shine Effects 0.000 abstract 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- 238000003745 diagnosis Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
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- MARDFMMXBWIRTK-UHFFFAOYSA-N [F].[Ar] Chemical compound [F].[Ar] MARDFMMXBWIRTK-UHFFFAOYSA-N 0.000 description 1
- VFQHLZMKZVVGFQ-UHFFFAOYSA-N [F].[Kr] Chemical compound [F].[Kr] VFQHLZMKZVVGFQ-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
- G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
- G01M11/02—Testing optical properties
- G01M11/0207—Details of measuring devices
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Abstract
The application provides a beam dividing element and calibration device, beam dividing element include shielding baffle and a plurality of independent off-axis cylindrical mirror, and each the thickness of off-axis cylindrical mirror is different, and a plurality of independent off-axis cylindrical mirror enclose and establish in the week side of shielding baffle, and the laser beam shines perpendicularly to each behind the off-axis cylindrical mirror, can be each focus on the focal plane of off-axis cylindrical mirror and form many light that have the time difference. The light beam splitting element is simple in structure and easy to adjust in light path, the off-axis cylindrical mirror can split a laser beam into a plurality of light beams with time difference, the shielding baffle can shield partial light beams, the light beams are prevented from being injected from the position where the shielding baffle is located, and interference of direct penetration light is reduced.
Description
Technical Field
The application relates to the technical field of optical elements, in particular to a light beam splitting element and a calibration device.
Background
In the prior art, with the development of the technological level, the time precision of many imaging diagnostic devices has been as high as billions of seconds, especially in the field of celestial body physics and laser fusion research, and the highest time resolution of imaging devices with time and space resolution capabilities, such as a visible light streak camera, an X-ray amplitude-division camera and the like, has been as high as 2-5 ps.
The diagnosis equipment with high index enables people to have a new step on the diagnosis capability of the space evolution under visible light and X-ray. However, to improve the precision of diagnosis, the time parameter index of these diagnostic devices must be precisely calibrated to accurately evaluate the uncertainty of the diagnostic data and other factors.
For a super-high-speed X-ray framing camera (DIXI) with picosecond-level time resolution, a Mach-Zehnder interferometer method is generally adopted, the method needs to accurately adjust the included angles of four mirror surfaces, the operation difficulty is high, and the requirements on mechanical adjustment precision and reset precision are extremely high. There is also calibration method using fiber bundle to split light and sequence delay laser, but because of fiber pair dispersion, it is only suitable for long wavelength laser, and for short wavelength such as deep ultraviolet laser, its broadening to laser pulse width results in low calibration precision.
Disclosure of Invention
In view of the above, the present application aims to provide a beam splitting element and a calibration apparatus.
In a first aspect, an embodiment provides a beam splitting element, including a shielding baffle and a plurality of independent off-axis cylindrical mirrors, where thicknesses of the off-axis cylindrical mirrors are different;
the plurality of independent off-axis cylindrical mirrors are arranged around the shielding baffle;
after the laser beam vertically irradiates each off-axis cylindrical mirror, a plurality of light rays with time difference can be formed by focusing on the focal plane of each off-axis cylindrical mirror.
In an alternative embodiment, each of the off-axis cylindrical mirrors is a transmissive cylindrical mirror, and the focal length of each of the off-axis cylindrical mirrors is equal.
In an optional embodiment, an antireflection film is further disposed on the off-axis cylindrical mirror.
In an optional embodiment, the off-axis cylindrical mirror is made of ultraviolet quartz and is used for transmitting ultraviolet laser.
In an alternative embodiment, the antireflective film is an ultraviolet light antireflective film.
In an alternative embodiment, the off-axis cylindrical mirror is made of glass and is used for transmitting visible laser light.
In an alternative embodiment, two opposing faces of each off-axis cylindrical mirror are curved faces.
In an alternative embodiment, the length, width and cylinder radius of each of the off-axis cylindrical mirrors are the same.
In a second aspect, an embodiment provides a calibration apparatus, including a laser emitter and the beam splitting element according to any one of the foregoing embodiments, where laser output by the laser emitter can be vertically irradiated onto the beam splitting element, and the laser can form a plurality of light beams with time difference after passing through the beam splitting element.
In an alternative embodiment, the laser emitter is an ultraviolet laser emitter or a visible light laser emitter.
The beneficial effect of this application:
according to the beam splitting element and the calibration device provided by the embodiment of the application, a plurality of independent off-axis cylindrical mirrors of the beam splitting element are arranged around the shielding baffle, and laser beams vertically irradiate on the off-axis cylindrical mirrors and then can be focused on focal planes of the off-axis cylindrical mirrors to form a plurality of light rays with time difference. The light beam splitting element is simple in structure and easy to adjust in light path, the off-axis cylindrical mirror can split a laser beam into a plurality of light beams with time difference, the shielding baffle can shield partial light beams, the light beams are prevented from being injected from the position where the shielding baffle is located, and interference of direct penetration light is reduced.
In order to make the aforementioned objects, features and advantages of the present application more comprehensible, preferred embodiments accompanied with figures are described in detail below.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings that are required to be used in the embodiments will be briefly described below, it should be understood that the following drawings only illustrate some embodiments of the present application and therefore should not be considered as limiting the scope, and for those skilled in the art, other related drawings can be obtained from the drawings without inventive effort.
Fig. 1 is a top view of a beam splitting element according to an embodiment of the present disclosure;
fig. 2 is a schematic structural diagram of an off-axis cylindrical mirror according to an embodiment of the present disclosure;
fig. 3 is a front view of an off-axis cylindrical mirror provided in an embodiment of the present application;
fig. 4 is a schematic view of a calibration apparatus provided in an embodiment of the present application.
Description of the main element symbols: 1-a calibration device; 10-a beam splitting element; 20-a laser emitter; 11-a shielding baffle; 12-off-axis cylindrical mirror; 121-a first arc surface; 122-second arc.
Detailed Description
In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application, and it is obvious that the described embodiments are only a part of the embodiments of the present application, and not all the embodiments. The components of the embodiments of the present application, generally described and illustrated in the figures herein, can be arranged and designed in a wide variety of different configurations. Thus, the following detailed description of the embodiments of the present application, presented in the accompanying drawings, is not intended to limit the scope of the claimed application, but is merely representative of selected embodiments of the application. All other embodiments, which can be derived by a person skilled in the art from the embodiments of the present application without making any creative effort, shall fall within the protection scope of the present application.
Referring to fig. 1, fig. 1 is a top view of a light beam splitting device 10 according to an embodiment of the present disclosure. The beam splitting element 10 includes a shielding baffle 11 and a plurality of independent off-axis cylindrical mirrors 12, and the thickness of each off-axis cylindrical mirror 12 is different.
As shown in fig. 1, a plurality of independent off-axis cylindrical mirrors 12 are arranged around the shielding baffle 11; after the laser beam vertically irradiates each off-axis cylindrical mirror 12, a plurality of light rays with time difference can be formed by focusing on the focal plane of each off-axis cylindrical mirror 12.
The beam splitting element 10 is simple in structure and easy in light path adjustment, the off-axis cylindrical mirror 12 can split a laser beam into a plurality of light beams with time difference, the shielding baffle 11 can shield part of the light beams, the light beams are prevented from being emitted from the position where the shielding baffle 11 is located, and interference of direct penetration light is reduced.
It is understood that fig. 1 is only an exemplary illustration of the number of off-axis cylindrical mirrors 12 provided in the embodiments of the present application, and in other embodiments of the present embodiment, the number of off-axis cylindrical mirrors 12 may also be other values, for example, 4 or 6 off-axis cylindrical mirrors 12.
Optionally, in this embodiment, the transmittance of the shielding baffle 11 to the laser is 0, and is used to shield the laser and reduce interference of the through light, so that the light finally formed by focusing is clear and distinguishable.
Optionally, in this embodiment, the off-axis cylindrical mirror 12 is a transmissive cylindrical mirror, and the laser beam can penetrate through the off-axis cylindrical mirror 12 and be focused on the focal plane of the off-axis cylindrical mirror 12 to form a light beam. Meanwhile, the focal lengths of the off-axis cylindrical mirrors 12 may be set to the same focal length, and when the focal lengths of the off-axis cylindrical mirrors 12 are the same, the light beams formed by the laser beams focused by the off-axis cylindrical mirrors 12 are located on the same plane, so that the thickness of the formed light beams is the same.
In fig. 1, the focal lengths of the off-axis cylindrical mirrors 12 are the same, that is, the focal planes are the same plane, and after the laser beams vertically irradiate the off-axis cylindrical mirrors 12, the pentagonal patterns with the same thickness and size are formed on the focal planes of the off-axis cylindrical mirrors 12.
Alternatively, in other embodiments of this embodiment, a five-pointed star pattern or other five-pointed star patterns with different line thicknesses can be formed by adjusting the position of the off-axis cylindrical mirror 12. Of course, if the number of off-axis cylindrical mirrors 12 is four or six, a four-or six-membered pattern should be formed.
Specifically, in this embodiment, the position of the off-axis cylindrical mirror 12 can be adjusted according to the requirement, so that the line formed after the beam is split meets the requirement.
Referring to fig. 2, fig. 2 is a schematic structural diagram of an off-axis cylindrical mirror 12 according to an embodiment of the present disclosure. In the present embodiment, two opposite surfaces of each off-axis cylindrical mirror 12 are arc surfaces, such as the first arc surface 121 and the second arc surface 122 shown in fig. 2. The first arc surface 121 of the off-axis cylindrical mirror 12 is an incident surface of a laser beam, and the laser beam is emitted from the second arc surface 122 after being incident from the first arc surface 121 of the off-axis cylindrical mirror 12, and is focused on the focal plane of the off-axis cylindrical mirror 12 to form a single light ray.
Specifically, please refer to fig. 2 and fig. 3 in combination, and fig. 3 is a front view of the off-axis cylindrical mirror 12 according to an embodiment of the present disclosure. In the present embodiment, the length a, the width b, and the cylinder radius r of each off-axis cylindrical mirror 12 are the same.
In one embodiment of this embodiment, each off-axis cylindrical mirror 12 may have a focal length of 1300mm, a width b of 6mm, a length a of 7mm, a cylindrical radius r of 660mm, and an off-axis amount of 7 mm.
It should be understood that the above values are merely an illustration of the present embodiment, and in other embodiments of the present embodiment, the length a, the width b, the cylinder radius r, the focal length, and the like of the off-axis cylindrical mirror 12 may also be other values, and are not limited in detail herein.
After the laser beam simultaneously irradiates each off-axis cylindrical mirror 12, the laser beam enters from the first arc surface 121 of each off-axis cylindrical mirror 12 and then exits from the second arc surface 122 of each off-axis cylindrical mirror 12, and is focused to form a plurality of light rays. Because the thickness d of each off-axis cylindrical mirror 12 is different, that is, the optical path difference is different, therefore, each light ray formed after each off-axis cylindrical mirror 12 is focused has a certain time difference, the specific numerical value of the time difference can be set as required, the thickness difference of each off-axis cylindrical mirror 12 can be calculated through the set time difference, a plurality of off-axis cylindrical mirrors 12 are designed through the calculated thickness difference, and therefore a plurality of light rays formed after focusing can meet the requirements.
Specifically, in the present embodiment, the formula can be passed
And (6) calculating. Wherein x is the thickness difference of the off-axis cylindrical mirror, t is the time difference, c is the propagation speed of light in vacuum, n is the refractive index of the off-axis cylindrical mirror 12, and the refractive indexes of the off-axis cylindrical mirrors 12 made of different materials are different.
For example, if the time difference of each light beam is required to be 5ps (picosecond) and the material of the off-axis cylindrical mirror 12 is ultraviolet quartz (refractive index is about 1.51), the thickness difference of each off-axis cylindrical mirror 12 is obtained
Wherein, 3 is multiplied by 108I.e. the propagation speed of light in vacuum, in m/s. Therefore, in the above example, the difference in thickness of each off-axis cylindrical mirror 12 is 2.94 mm. Assuming that the thickness of the first off-axis cylindrical mirror 12 is 3mm, the thicknesses of the second to fifth off-axis cylindrical mirrors 12 are 5.94mm, 8.88mm, 11.82mm, and 14.76mm, respectively.
Alternatively, in this embodiment, the time difference between the plurality of focused light rays may also be different values, and the thickness difference between the off-axis cylindrical mirrors 12 may be calculated according to the time difference.
For example, the time difference between the first light ray and the second light ray may be 5ps, the time difference between the second light ray and the third light ray may be 4ps, and the third light ray may beThe time difference between the first light ray and the fourth light ray may be 3ps, and the time difference between the fourth light ray and the fifth light ray may be 2 ps. According to the above formula
The thickness difference between the respective off-axis cylindrical mirrors 12 can be calculated.
When the refractive index of each off-axis cylindrical mirror 12 is 1.50, the thickness difference between the first off-axis cylindrical mirror 12 and the second off-axis cylindrical mirror 12
The thickness difference between the second off-axis cylindrical mirror 12 and the third off-axis cylindrical mirror 12
The difference in thickness between the third off-axis cylindrical mirror 12 and the fourth off-axis cylindrical mirror 12
The thickness difference between the fourth off-axis cylindrical mirror 12 and the fifth off-axis cylindrical mirror 12
Therefore, in this embodiment, the time difference of each light ray can be changed by changing the thickness of the off-axis cylindrical mirror 12, so as to meet the requirements of various scenes, and the off-axis cylindrical mirror has a simple structure and is easy to adjust.
Optionally, in this embodiment, an antireflection film is further disposed on each off-axis cylindrical mirror 12 for increasing the transmittance of the laser.
Laser light is a special light with the characteristics of light, but is purer in color and higher in energy than ordinary light. The wavelength of the laser light is the same as that of ordinary light, and the laser light exists in all of infrared rays to ultraviolet rays. According to the difference of the wavelength, the laser can include visible laser, infrared laser and ultraviolet laser, and the off-axis cylindrical mirror 12 made of different materials is required to be selected for the laser with different wavelength.
Optionally, in this embodiment, the material of the off-axis cylindrical mirror 12 may be ultraviolet quartz JGS1 for transmitting ultraviolet laser.
When the off-axis cylindrical mirror 12 is made of ultraviolet quartz, the antireflection film may be an ultraviolet antireflection film, which can increase the transmittance of ultraviolet laser. For example, after the ultraviolet antireflection film was used, the transmittance for incident laser light having a wavelength of 248.5nm was 98%.
Optionally, in this embodiment, the off-axis cylindrical mirror 12 may also be made of glass, and is used for transmitting visible laser light, such as red laser light, blue laser light, or green laser light.
Optionally, referring to fig. 4, fig. 4 is a side view of the calibration device 1 provided in the embodiment of the present application. The calibration device 1 comprises a laser emitter 20 and a beam splitting element 10, wherein laser output by the laser emitter 20 can vertically irradiate the beam splitting element 10, and the laser can form a plurality of light rays with time difference after passing through the beam splitting element 10.
Alternatively, in this embodiment, the laser emitter 20 may be an ultraviolet laser emitter or a visible light laser emitter, and is respectively configured to emit ultraviolet laser light and visible light laser light.
Specifically, in the present embodiment, the ultraviolet laser includes an argon fluorine laser having a wavelength of 193nm, a krypton fluorine laser having a wavelength of 248nm, or the like; the visible light laser includes argon laser (blue light) with wavelength 488, argon laser (green light) with wavelength 514nm, and helium neon laser (red light) with wavelength 633 nm.
To sum up, the beam dividing element and the calibration device provided by the embodiment of the present application, a plurality of independent off-axis cylindrical mirrors of the beam dividing element are surrounded on the periphery of the shielding baffle, and the laser beam is perpendicularly irradiated on each off-axis cylindrical mirror, and then can be focused on the focal plane of each off-axis cylindrical mirror to form a plurality of light rays with time difference. The light beam splitting element is simple in structure and easy to adjust in light path, the off-axis cylindrical mirror can split a laser beam into a plurality of light beams with time difference, the shielding baffle can shield partial light beams, the light beams are prevented from being injected from the position where the shielding baffle is located, and interference of direct penetration light is reduced.
Meanwhile, the light beam splitting element provided by the application can enable the time difference of light formed after focusing to reach picosecond level, namely the calibration precision of a calibration device formed by the light beam splitting element can also reach picosecond level, the precision is high, the light path structure is simple, and high-efficiency and high-precision calibration can be provided for precision instruments such as a pulse-width type X-ray diode, an optical fringe camera, an X-ray fringe camera and an X-ray amplitude division camera with time resolution smaller than 10ps under weak light source conditions.
It should be noted that: like reference numbers and letters refer to like items in the following figures, and thus, once an item is defined in one figure, it need not be further defined and explained in subsequent figures.
In the description of the present application, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings or orientations or positional relationships that the products of the present invention are conventionally placed in use, and are used only for convenience in describing the present application and simplifying the description, but do not indicate or imply that the devices or elements referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present application. Furthermore, the terms "first," "second," "third," and the like are used solely to distinguish one from another and are not to be construed as indicating or implying relative importance.
In the description of the present application, it is further noted that, unless expressly stated or limited otherwise, the terms "disposed," "mounted," "connected," and "connected" are to be construed broadly, e.g., as meaning either a fixed connection, a removable connection, or an integral connection; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present application can be understood in a specific case by those of ordinary skill in the art.
Finally, it should be noted that: the above-mentioned embodiments are only specific embodiments of the present application, and are used for illustrating the technical solutions of the present application, but not limiting the same, and the scope of the present application is not limited thereto, and although the present application is described in detail with reference to the foregoing embodiments, those skilled in the art should understand that: any person skilled in the art can modify or easily conceive the technical solutions described in the foregoing embodiments or equivalent substitutes for some technical features within the technical scope disclosed in the present application; such modifications, changes or substitutions do not depart from the spirit and scope of the present disclosure, which should be construed in light of the above teachings. Are intended to be covered by the scope of the present application. Therefore, the protection scope of the present application shall be subject to the protection scope of the claims.
Claims (10)
1. A beam splitting element is characterized by comprising a shielding baffle and a plurality of independent off-axis cylindrical mirrors, wherein the thicknesses of the off-axis cylindrical mirrors are different;
the plurality of independent off-axis cylindrical mirrors are arranged around the shielding baffle;
after the laser beam vertically irradiates each off-axis cylindrical mirror, a plurality of light rays with time difference can be formed by focusing on the focal plane of each off-axis cylindrical mirror.
2. The beam splitting element of claim 1, wherein each of the off-axis cylindrical mirrors is a transmissive cylindrical mirror, and the focal length of each of the off-axis cylindrical mirrors is equal.
3. The beam splitting element of claim 1 or 2, wherein an antireflection film is further disposed on the off-axis cylindrical mirror.
4. The beam splitting element of claim 3, wherein the off-axis cylindrical mirror is made of UV quartz for transmitting UV laser.
5. The light beam splitting element of claim 4, wherein the anti-reflection film is an ultraviolet light anti-reflection film.
6. The beam splitting element of claim 3, wherein the off-axis cylindrical mirror is made of glass and is configured to transmit visible laser light.
7. The beam splitting element of claim 2, wherein the two opposing faces of each off-axis cylindrical mirror are curved faces.
8. The beam splitting element of claim 7, wherein the length, width and cylinder radius of each of the off-axis cylindrical mirrors are the same.
9. A calibration device, comprising a laser emitter and the beam splitting element of any one of claims 1 to 8, wherein the laser emitter outputs laser light capable of perpendicularly irradiating the beam splitting element, and the laser light passes through the beam splitting element to form a plurality of light rays with time difference.
10. The apparatus of claim 9, wherein the laser emitter is an ultraviolet laser emitter or a visible light laser emitter.
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