CN111058017B - Graphene metal composite wire and low-temperature continuous preparation method thereof - Google Patents
Graphene metal composite wire and low-temperature continuous preparation method thereof Download PDFInfo
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- CN111058017B CN111058017B CN201911157000.1A CN201911157000A CN111058017B CN 111058017 B CN111058017 B CN 111058017B CN 201911157000 A CN201911157000 A CN 201911157000A CN 111058017 B CN111058017 B CN 111058017B
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- graphene
- wire
- metal wire
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- metal
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Inorganic Chemistry (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
Claims (11)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201911157000.1A CN111058017B (en) | 2019-11-22 | 2019-11-22 | Graphene metal composite wire and low-temperature continuous preparation method thereof |
Applications Claiming Priority (1)
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CN201911157000.1A CN111058017B (en) | 2019-11-22 | 2019-11-22 | Graphene metal composite wire and low-temperature continuous preparation method thereof |
Publications (2)
Publication Number | Publication Date |
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CN111058017A CN111058017A (en) | 2020-04-24 |
CN111058017B true CN111058017B (en) | 2021-03-30 |
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CN201911157000.1A Active CN111058017B (en) | 2019-11-22 | 2019-11-22 | Graphene metal composite wire and low-temperature continuous preparation method thereof |
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CN (1) | CN111058017B (en) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
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CN111899911A (en) * | 2020-07-01 | 2020-11-06 | 上海交通大学 | Graphene/metal composite conductor, preparation method thereof and transmission line |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102828161A (en) * | 2012-08-21 | 2012-12-19 | 许子寒 | Graphene production method and continuous production device of graphene |
CN203096170U (en) * | 2012-11-07 | 2013-07-31 | 山东鑫汇铜材有限公司 | Graphene copper wire production device |
CN105483641A (en) * | 2015-12-28 | 2016-04-13 | 哈尔滨工业大学 | Preparing method of copper-base electric contact material enhanced by in-situ grown graphene |
WO2017204408A1 (en) * | 2016-05-24 | 2017-11-30 | 해성디에스 주식회사 | Electric wire structure and manufacturing method therefor |
CN108866507A (en) * | 2018-07-19 | 2018-11-23 | 河北环亚线缆有限公司 | A kind of method that chemical vapour deposition technique prepares cable copper conductor plating packet graphene film |
CN109785996A (en) * | 2017-11-14 | 2019-05-21 | 中国科学院过程工程研究所 | A kind of metal compound wire and preparation method thereof |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20130140058A1 (en) * | 2011-12-05 | 2013-06-06 | Ki II Kim | Graphene electrical wire and a method for manufacturing thereof |
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2019
- 2019-11-22 CN CN201911157000.1A patent/CN111058017B/en active Active
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102828161A (en) * | 2012-08-21 | 2012-12-19 | 许子寒 | Graphene production method and continuous production device of graphene |
CN203096170U (en) * | 2012-11-07 | 2013-07-31 | 山东鑫汇铜材有限公司 | Graphene copper wire production device |
CN105483641A (en) * | 2015-12-28 | 2016-04-13 | 哈尔滨工业大学 | Preparing method of copper-base electric contact material enhanced by in-situ grown graphene |
WO2017204408A1 (en) * | 2016-05-24 | 2017-11-30 | 해성디에스 주식회사 | Electric wire structure and manufacturing method therefor |
CN109785996A (en) * | 2017-11-14 | 2019-05-21 | 中国科学院过程工程研究所 | A kind of metal compound wire and preparation method thereof |
CN108866507A (en) * | 2018-07-19 | 2018-11-23 | 河北环亚线缆有限公司 | A kind of method that chemical vapour deposition technique prepares cable copper conductor plating packet graphene film |
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CN111058017A (en) | 2020-04-24 |
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Effective date of registration: 20221215 Address after: 201109 room 110 and 111, building 3, No. 600, Jianchuan Road, Minhang District, Shanghai Patentee after: Shanghai Jiaotong University Intellectual Property Management Co.,Ltd. Patentee after: Liu Yue Address before: 200030 No. 1954, Huashan Road, Shanghai, Xuhui District Patentee before: SHANGHAI JIAO TONG University |
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Effective date of registration: 20230803 Address after: 201109 Building 1, No. 600, Jianchuan Road, Minhang District, Shanghai Patentee after: Chuanlan Technology (Shanghai) Co.,Ltd. Address before: 201109 room 110 and 111, building 3, No. 600, Jianchuan Road, Minhang District, Shanghai Patentee before: Shanghai Jiaotong University Intellectual Property Management Co.,Ltd. Patentee before: Liu Yue |