CN111033862A - Method for inhibiting decomposition of silyl ester compound - Google Patents
Method for inhibiting decomposition of silyl ester compound Download PDFInfo
- Publication number
- CN111033862A CN111033862A CN201880051367.2A CN201880051367A CN111033862A CN 111033862 A CN111033862 A CN 111033862A CN 201880051367 A CN201880051367 A CN 201880051367A CN 111033862 A CN111033862 A CN 111033862A
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- CN
- China
- Prior art keywords
- group
- carbon atoms
- silyl ester
- ester compound
- compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- -1 silyl ester compound Chemical class 0.000 title claims abstract description 185
- 238000000354 decomposition reaction Methods 0.000 title claims abstract description 33
- 238000000034 method Methods 0.000 title claims abstract description 30
- 230000002401 inhibitory effect Effects 0.000 title description 3
- 239000008151 electrolyte solution Substances 0.000 claims abstract description 66
- 229910003002 lithium salt Inorganic materials 0.000 claims abstract description 23
- 159000000002 lithium salts Chemical class 0.000 claims abstract description 23
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 21
- 125000001153 fluoro group Chemical group F* 0.000 claims abstract description 21
- 239000003960 organic solvent Substances 0.000 claims abstract description 21
- QAOWNCQODCNURD-UHFFFAOYSA-N sulfuric acid Substances OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910000147 aluminium phosphate Inorganic materials 0.000 claims abstract description 4
- 239000004327 boric acid Substances 0.000 claims abstract description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-N phosphoric acid Substances OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 162
- 125000000217 alkyl group Chemical group 0.000 claims description 31
- 150000001875 compounds Chemical class 0.000 claims description 29
- 125000003118 aryl group Chemical group 0.000 claims description 26
- 125000003342 alkenyl group Chemical group 0.000 claims description 24
- 125000003710 aryl alkyl group Chemical group 0.000 claims description 24
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 23
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 7
- 125000005843 halogen group Chemical group 0.000 claims description 5
- 229910001496 lithium tetrafluoroborate Inorganic materials 0.000 claims description 5
- 229910013406 LiN(SO2CF3)2 Inorganic materials 0.000 claims description 4
- 229910013426 LiN(SO2F)2 Inorganic materials 0.000 claims description 4
- 229910013833 LiOSO2 Inorganic materials 0.000 claims description 4
- 229910001290 LiPF6 Inorganic materials 0.000 claims description 4
- 125000002252 acyl group Chemical group 0.000 claims description 4
- 125000005429 oxyalkyl group Chemical group 0.000 claims description 4
- 229910007549 Li2SiF6 Inorganic materials 0.000 claims description 3
- 229910001547 lithium hexafluoroantimonate(V) Inorganic materials 0.000 claims description 3
- 125000002560 nitrile group Chemical group 0.000 claims description 3
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 3
- 229910019142 PO4 Inorganic materials 0.000 claims description 2
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 1
- 239000010452 phosphate Substances 0.000 claims 1
- 125000000623 heterocyclic group Chemical group 0.000 description 23
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 22
- 239000003792 electrolyte Substances 0.000 description 19
- 239000011255 nonaqueous electrolyte Substances 0.000 description 19
- 229940021013 electrolyte solution Drugs 0.000 description 15
- 239000002904 solvent Substances 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 12
- 229910052744 lithium Inorganic materials 0.000 description 11
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 11
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 11
- 239000002994 raw material Substances 0.000 description 10
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 8
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 8
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 8
- 229910001416 lithium ion Inorganic materials 0.000 description 8
- 239000007774 positive electrode material Substances 0.000 description 8
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 7
- 239000004020 conductor Substances 0.000 description 7
- 238000012360 testing method Methods 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 239000002033 PVDF binder Substances 0.000 description 6
- 239000004698 Polyethylene Substances 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 229910052759 nickel Inorganic materials 0.000 description 6
- 229920000573 polyethylene Polymers 0.000 description 6
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 6
- 229910052723 transition metal Inorganic materials 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- KMTRUDSVKNLOMY-UHFFFAOYSA-N Ethylene carbonate Chemical compound O=C1OCCO1 KMTRUDSVKNLOMY-UHFFFAOYSA-N 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 5
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical group C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 5
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 5
- 229910052782 aluminium Inorganic materials 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 229910052799 carbon Inorganic materials 0.000 description 5
- 239000003575 carbonaceous material Substances 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 229910052802 copper Inorganic materials 0.000 description 5
- 239000010949 copper Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 150000002430 hydrocarbons Chemical group 0.000 description 5
- 238000004519 manufacturing process Methods 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 239000002002 slurry Substances 0.000 description 5
- 238000013112 stability test Methods 0.000 description 5
- 229910001220 stainless steel Inorganic materials 0.000 description 5
- 239000010935 stainless steel Substances 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 4
- HEDRZPFGACZZDS-MICDWDOJSA-N Trichloro(2H)methane Chemical compound [2H]C(Cl)(Cl)Cl HEDRZPFGACZZDS-MICDWDOJSA-N 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000006230 acetylene black Substances 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 229910052742 iron Inorganic materials 0.000 description 4
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 239000007773 negative electrode material Substances 0.000 description 4
- 229920002239 polyacrylonitrile Polymers 0.000 description 4
- 239000013558 reference substance Substances 0.000 description 4
- 239000010936 titanium Substances 0.000 description 4
- 229910052719 titanium Inorganic materials 0.000 description 4
- 150000003624 transition metals Chemical class 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 229910052720 vanadium Inorganic materials 0.000 description 4
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 4
- 238000005160 1H NMR spectroscopy Methods 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- 229920000049 Carbon (fiber) Polymers 0.000 description 3
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 3
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- OIFBSDVPJOWBCH-UHFFFAOYSA-N Diethyl carbonate Chemical compound CCOC(=O)OCC OIFBSDVPJOWBCH-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YLQBMQCUIZJEEH-UHFFFAOYSA-N Furan Chemical group C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 3
- 238000005481 NMR spectroscopy Methods 0.000 description 3
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- YTPLMLYBLZKORZ-UHFFFAOYSA-N Thiophene Chemical group C=1C=CSC=1 YTPLMLYBLZKORZ-UHFFFAOYSA-N 0.000 description 3
- 229910021383 artificial graphite Inorganic materials 0.000 description 3
- 239000004917 carbon fiber Substances 0.000 description 3
- 239000001768 carboxy methyl cellulose Substances 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 229920001577 copolymer Polymers 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- JBTWLSYIZRCDFO-UHFFFAOYSA-N ethyl methyl carbonate Chemical compound CCOC(=O)OC JBTWLSYIZRCDFO-UHFFFAOYSA-N 0.000 description 3
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical group FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- QSZMZKBZAYQGRS-UHFFFAOYSA-N lithium;bis(trifluoromethylsulfonyl)azanide Chemical compound [Li+].FC(F)(F)S(=O)(=O)[N-]S(=O)(=O)C(F)(F)F QSZMZKBZAYQGRS-UHFFFAOYSA-N 0.000 description 3
- 239000011777 magnesium Substances 0.000 description 3
- 239000011572 manganese Substances 0.000 description 3
- 229910052698 phosphorus Inorganic materials 0.000 description 3
- 239000011574 phosphorus Substances 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 3
- 239000004810 polytetrafluoroethylene Substances 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 3
- DHKHKXVYLBGOIT-UHFFFAOYSA-N 1,1-Diethoxyethane Chemical compound CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 2
- CMJLMPKFQPJDKP-UHFFFAOYSA-N 3-methylthiolane 1,1-dioxide Chemical compound CC1CCS(=O)(=O)C1 CMJLMPKFQPJDKP-UHFFFAOYSA-N 0.000 description 2
- 238000004679 31P NMR spectroscopy Methods 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- ZEYHEAKUIGZSGI-UHFFFAOYSA-N 4-methoxybenzoic acid Chemical compound COC1=CC=C(C(O)=O)C=C1 ZEYHEAKUIGZSGI-UHFFFAOYSA-N 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- 208000005156 Dehydration Diseases 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- 229910013398 LiN(SO2CF2CF3)2 Inorganic materials 0.000 description 2
- 229910013872 LiPF Inorganic materials 0.000 description 2
- 229910001228 Li[Ni1/3Co1/3Mn1/3]O2 (NCM 111) Inorganic materials 0.000 description 2
- 101150058243 Lipf gene Proteins 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- PVNIIMVLHYAWGP-UHFFFAOYSA-N Niacin Chemical compound OC(=O)C1=CC=CN=C1 PVNIIMVLHYAWGP-UHFFFAOYSA-N 0.000 description 2
- 229920000459 Nitrile rubber Polymers 0.000 description 2
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 2
- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 2
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 2
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 2
- 239000011149 active material Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 239000003963 antioxidant agent Substances 0.000 description 2
- 230000003078 antioxidant effect Effects 0.000 description 2
- UJMDYLWCYJJYMO-UHFFFAOYSA-N benzene-1,2,3-tricarboxylic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1C(O)=O UJMDYLWCYJJYMO-UHFFFAOYSA-N 0.000 description 2
- QMKYBPDZANOJGF-UHFFFAOYSA-N benzene-1,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=CC(C(O)=O)=C1 QMKYBPDZANOJGF-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- KRUQDZRWZXUUAD-UHFFFAOYSA-N bis(trimethylsilyl) sulfate Chemical compound C[Si](C)(C)OS(=O)(=O)O[Si](C)(C)C KRUQDZRWZXUUAD-UHFFFAOYSA-N 0.000 description 2
- 239000002041 carbon nanotube Substances 0.000 description 2
- 229910021393 carbon nanotube Inorganic materials 0.000 description 2
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 2
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 230000018044 dehydration Effects 0.000 description 2
- 238000006297 dehydration reaction Methods 0.000 description 2
- IEJIGPNLZYLLBP-UHFFFAOYSA-N dimethyl carbonate Chemical compound COC(=O)OC IEJIGPNLZYLLBP-UHFFFAOYSA-N 0.000 description 2
- WJKVFIFBAASZJX-UHFFFAOYSA-N dimethyl(diphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C)(C)C1=CC=CC=C1 WJKVFIFBAASZJX-UHFFFAOYSA-N 0.000 description 2
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
- KZTYYGOKRVBIMI-UHFFFAOYSA-N diphenyl sulfone Chemical compound C=1C=CC=CC=1S(=O)(=O)C1=CC=CC=C1 KZTYYGOKRVBIMI-UHFFFAOYSA-N 0.000 description 2
- WJJMNDUMQPNECX-UHFFFAOYSA-N dipicolinic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=N1 WJJMNDUMQPNECX-UHFFFAOYSA-N 0.000 description 2
- 230000007613 environmental effect Effects 0.000 description 2
- FKRCODPIKNYEAC-UHFFFAOYSA-N ethyl propionate Chemical compound CCOC(=O)CC FKRCODPIKNYEAC-UHFFFAOYSA-N 0.000 description 2
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
- CHTHALBTIRVDBM-UHFFFAOYSA-N furan-2,5-dicarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)O1 CHTHALBTIRVDBM-UHFFFAOYSA-N 0.000 description 2
- 239000006232 furnace black Substances 0.000 description 2
- 229910052733 gallium Inorganic materials 0.000 description 2
- JBFHTYHTHYHCDJ-UHFFFAOYSA-N gamma-caprolactone Chemical compound CCC1CCC(=O)O1 JBFHTYHTHYHCDJ-UHFFFAOYSA-N 0.000 description 2
- GAEKPEKOJKCEMS-UHFFFAOYSA-N gamma-valerolactone Chemical compound CC1CCC(=O)O1 GAEKPEKOJKCEMS-UHFFFAOYSA-N 0.000 description 2
- 229910021389 graphene Inorganic materials 0.000 description 2
- 229910021469 graphitizable carbon Inorganic materials 0.000 description 2
- MNWFXJYAOYHMED-UHFFFAOYSA-N heptanoic acid Chemical compound CCCCCCC(O)=O MNWFXJYAOYHMED-UHFFFAOYSA-N 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- QQVIHTHCMHWDBS-UHFFFAOYSA-N isophthalic acid Chemical compound OC(=O)C1=CC=CC(C(O)=O)=C1 QQVIHTHCMHWDBS-UHFFFAOYSA-N 0.000 description 2
- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000002905 metal composite material Substances 0.000 description 2
- 229910044991 metal oxide Inorganic materials 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- 229920000609 methyl cellulose Polymers 0.000 description 2
- TZIHFWKZFHZASV-UHFFFAOYSA-N methyl formate Chemical compound COC=O TZIHFWKZFHZASV-UHFFFAOYSA-N 0.000 description 2
- BHIWKHZACMWKOJ-UHFFFAOYSA-N methyl isobutyrate Chemical compound COC(=O)C(C)C BHIWKHZACMWKOJ-UHFFFAOYSA-N 0.000 description 2
- 239000001923 methylcellulose Substances 0.000 description 2
- 235000010981 methylcellulose Nutrition 0.000 description 2
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 2
- 239000012046 mixed solvent Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- DNIAPMSPPWPWGF-UHFFFAOYSA-N monopropylene glycol Natural products CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 2
- TXXHDPDFNKHHGW-UHFFFAOYSA-N muconic acid Chemical compound OC(=O)C=CC=CC(O)=O TXXHDPDFNKHHGW-UHFFFAOYSA-N 0.000 description 2
- 229910021382 natural graphite Inorganic materials 0.000 description 2
- BDJRBEYXGGNYIS-UHFFFAOYSA-N nonanedioic acid Chemical compound OC(=O)CCCCCCCC(O)=O BDJRBEYXGGNYIS-UHFFFAOYSA-N 0.000 description 2
- ZWLPBLYKEWSWPD-UHFFFAOYSA-N o-toluic acid Chemical compound CC1=CC=CC=C1C(O)=O ZWLPBLYKEWSWPD-UHFFFAOYSA-N 0.000 description 2
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- SIOXPEMLGUPBBT-UHFFFAOYSA-N picolinic acid Chemical compound OC(=O)C1=CC=CC=N1 SIOXPEMLGUPBBT-UHFFFAOYSA-N 0.000 description 2
- 229920002492 poly(sulfone) Polymers 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 2
- CYIDZMCFTVVTJO-UHFFFAOYSA-N pyromellitic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)C=C1C(O)=O CYIDZMCFTVVTJO-UHFFFAOYSA-N 0.000 description 2
- CXMXRPHRNRROMY-UHFFFAOYSA-N sebacic acid Chemical compound OC(=O)CCCCCCCCC(O)=O CXMXRPHRNRROMY-UHFFFAOYSA-N 0.000 description 2
- YIKQLNRXIWIZFA-UHFFFAOYSA-N silyl dihydrogen phosphate Chemical compound OP(O)(=O)O[SiH3] YIKQLNRXIWIZFA-UHFFFAOYSA-N 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 229920003048 styrene butadiene rubber Polymers 0.000 description 2
- HXJUTPCZVOIRIF-UHFFFAOYSA-N sulfolane Chemical compound O=S1(=O)CCCC1 HXJUTPCZVOIRIF-UHFFFAOYSA-N 0.000 description 2
- HHVIBTZHLRERCL-UHFFFAOYSA-N sulfonyldimethane Chemical compound CS(C)(=O)=O HHVIBTZHLRERCL-UHFFFAOYSA-N 0.000 description 2
- 150000003462 sulfoxides Chemical class 0.000 description 2
- 229910052717 sulfur Inorganic materials 0.000 description 2
- 239000011593 sulfur Substances 0.000 description 2
- 238000010998 test method Methods 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 229910000319 transition metal phosphate Inorganic materials 0.000 description 2
- KQTIIICEAUMSDG-UHFFFAOYSA-N tricarballylic acid Chemical compound OC(=O)CC(C(O)=O)CC(O)=O KQTIIICEAUMSDG-UHFFFAOYSA-N 0.000 description 2
- AQRLNPVMDITEJU-UHFFFAOYSA-N triethylsilane Chemical compound CC[SiH](CC)CC AQRLNPVMDITEJU-UHFFFAOYSA-N 0.000 description 2
- ARCGXLSVLAOJQL-UHFFFAOYSA-N trimellitic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C(C(O)=O)=C1 ARCGXLSVLAOJQL-UHFFFAOYSA-N 0.000 description 2
- KXFSUVJPEQYUGN-UHFFFAOYSA-N trimethyl(phenyl)silane Chemical compound C[Si](C)(C)C1=CC=CC=C1 KXFSUVJPEQYUGN-UHFFFAOYSA-N 0.000 description 2
- NVRBTKMAZQNKPX-UHFFFAOYSA-N trimethyl-(4-trimethylsilylphenyl)silane Chemical compound C[Si](C)(C)C1=CC=C([Si](C)(C)C)C=C1 NVRBTKMAZQNKPX-UHFFFAOYSA-N 0.000 description 2
- JCUPGHJJFSUZRF-UHFFFAOYSA-N trimethylsilyl benzenesulfonate Chemical compound C[Si](C)(C)OS(=O)(=O)C1=CC=CC=C1 JCUPGHJJFSUZRF-UHFFFAOYSA-N 0.000 description 2
- YZYKZHPNRDIPFA-UHFFFAOYSA-N tris(trimethylsilyl) borate Chemical compound C[Si](C)(C)OB(O[Si](C)(C)C)O[Si](C)(C)C YZYKZHPNRDIPFA-UHFFFAOYSA-N 0.000 description 2
- QJMMCGKXBZVAEI-UHFFFAOYSA-N tris(trimethylsilyl) phosphate Chemical compound C[Si](C)(C)OP(=O)(O[Si](C)(C)C)O[Si](C)(C)C QJMMCGKXBZVAEI-UHFFFAOYSA-N 0.000 description 2
- VMZOBROUFBEGAR-UHFFFAOYSA-N tris(trimethylsilyl) phosphite Chemical compound C[Si](C)(C)OP(O[Si](C)(C)C)O[Si](C)(C)C VMZOBROUFBEGAR-UHFFFAOYSA-N 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 239000011701 zinc Substances 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- 229910052726 zirconium Inorganic materials 0.000 description 2
- ZWVMLYRJXORSEP-LURJTMIESA-N (2s)-hexane-1,2,6-triol Chemical compound OCCCC[C@H](O)CO ZWVMLYRJXORSEP-LURJTMIESA-N 0.000 description 1
- VZKFVPRKXHZBQO-UHFFFAOYSA-N (4-fluorophenyl)-trimethylsilane Chemical compound C[Si](C)(C)C1=CC=C(F)C=C1 VZKFVPRKXHZBQO-UHFFFAOYSA-N 0.000 description 1
- WXUAQHNMJWJLTG-VKHMYHEASA-N (S)-methylsuccinic acid Chemical compound OC(=O)[C@@H](C)CC(O)=O WXUAQHNMJWJLTG-VKHMYHEASA-N 0.000 description 1
- KURIPTHAZOPONO-UHFFFAOYSA-N 1,1,1-trifluoro-2-[2-(2,2,2-trifluoroethoxy)ethoxy]ethane Chemical compound FC(F)(F)COCCOCC(F)(F)F KURIPTHAZOPONO-UHFFFAOYSA-N 0.000 description 1
- UHIKTEOLOIVDKF-UHFFFAOYSA-N 1,1,1-trifluoro-2-[2-[2-(2,2,2-trifluoroethoxy)ethoxy]ethoxy]ethane Chemical compound FC(F)(F)COCCOCCOCC(F)(F)F UHIKTEOLOIVDKF-UHFFFAOYSA-N 0.000 description 1
- LSXNZIYETGBUEI-UHFFFAOYSA-N 1,2-bis(2,2,2-trifluoroethoxy)propane Chemical compound FC(F)(F)COC(C)COCC(F)(F)F LSXNZIYETGBUEI-UHFFFAOYSA-N 0.000 description 1
- TVMAVQHAYKJLPS-UHFFFAOYSA-N 1,2-bis(trifluoromethoxy)ethane Chemical compound FC(F)(F)OCCOC(F)(F)F TVMAVQHAYKJLPS-UHFFFAOYSA-N 0.000 description 1
- ZZXUZKXVROWEIF-UHFFFAOYSA-N 1,2-butylene carbonate Chemical compound CCC1COC(=O)O1 ZZXUZKXVROWEIF-UHFFFAOYSA-N 0.000 description 1
- VZFJMKRFMNCZSK-UHFFFAOYSA-N 1,3,5-trithiane-2,4,6-tricarboxylic acid Chemical compound OC(=O)C1SC(C(O)=O)SC(C(O)=O)S1 VZFJMKRFMNCZSK-UHFFFAOYSA-N 0.000 description 1
- WNXJIVFYUVYPPR-UHFFFAOYSA-N 1,3-dioxolane Chemical compound C1COCO1 WNXJIVFYUVYPPR-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- PXGZQGDTEZPERC-UHFFFAOYSA-N 1,4-cyclohexanedicarboxylic acid Chemical compound OC(=O)C1CCC(C(O)=O)CC1 PXGZQGDTEZPERC-UHFFFAOYSA-N 0.000 description 1
- 125000004973 1-butenyl group Chemical group C(=CCC)* 0.000 description 1
- NSLXRDJMYHNCHG-UHFFFAOYSA-N 1-ethoxycarbonyloxypropan-2-yl ethyl carbonate Chemical compound CCOC(=O)OCC(C)OC(=O)OCC NSLXRDJMYHNCHG-UHFFFAOYSA-N 0.000 description 1
- MBDUIEKYVPVZJH-UHFFFAOYSA-N 1-ethylsulfonylethane Chemical compound CCS(=O)(=O)CC MBDUIEKYVPVZJH-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- PRPINYUDVPFIRX-UHFFFAOYSA-N 1-naphthaleneacetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CC=CC2=C1 PRPINYUDVPFIRX-UHFFFAOYSA-N 0.000 description 1
- LNETULKMXZVUST-UHFFFAOYSA-N 1-naphthoic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1 LNETULKMXZVUST-UHFFFAOYSA-N 0.000 description 1
- BQCCJWMQESHLIT-UHFFFAOYSA-N 1-propylsulfinylpropane Chemical compound CCCS(=O)CCC BQCCJWMQESHLIT-UHFFFAOYSA-N 0.000 description 1
- JEXYCADTAFPULN-UHFFFAOYSA-N 1-propylsulfonylpropane Chemical compound CCCS(=O)(=O)CCC JEXYCADTAFPULN-UHFFFAOYSA-N 0.000 description 1
- XYHKNCXZYYTLRG-UHFFFAOYSA-N 1h-imidazole-2-carbaldehyde Chemical compound O=CC1=NC=CN1 XYHKNCXZYYTLRG-UHFFFAOYSA-N 0.000 description 1
- VUAXHMVRKOTJKP-UHFFFAOYSA-M 2,2-dimethylbutanoate Chemical compound CCC(C)(C)C([O-])=O VUAXHMVRKOTJKP-UHFFFAOYSA-M 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- CCQMORVULNZXIA-UHFFFAOYSA-N 2-[2-(carboxymethylsulfanyl)ethylsulfanyl]acetic acid Chemical compound OC(=O)CSCCSCC(O)=O CCQMORVULNZXIA-UHFFFAOYSA-N 0.000 description 1
- 125000004974 2-butenyl group Chemical group C(C=CC)* 0.000 description 1
- MYNUAGYBVSQRFN-UHFFFAOYSA-N 2-ethoxycarbonyloxyethyl ethyl carbonate Chemical compound CCOC(=O)OCCOC(=O)OCC MYNUAGYBVSQRFN-UHFFFAOYSA-N 0.000 description 1
- DOMLQXFMDFZAAL-UHFFFAOYSA-N 2-methoxycarbonyloxyethyl methyl carbonate Chemical compound COC(=O)OCCOC(=O)OC DOMLQXFMDFZAAL-UHFFFAOYSA-N 0.000 description 1
- 125000003229 2-methylhexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- WLJVXDMOQOGPHL-PPJXEINESA-N 2-phenylacetic acid Chemical compound O[14C](=O)CC1=CC=CC=C1 WLJVXDMOQOGPHL-PPJXEINESA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- AGIJRRREJXSQJR-UHFFFAOYSA-N 2h-thiazine Chemical group N1SC=CC=C1 AGIJRRREJXSQJR-UHFFFAOYSA-N 0.000 description 1
- XOUFYAQSTVWOPZ-UHFFFAOYSA-N 3,4-dimethylthiolane 1,1-dioxide Chemical compound CC1CS(=O)(=O)CC1C XOUFYAQSTVWOPZ-UHFFFAOYSA-N 0.000 description 1
- WIWBGPFHCBCIHT-UHFFFAOYSA-N 3-(bromomethyl)thiolane 1,1-dioxide Chemical compound BrCC1CCS(=O)(=O)C1 WIWBGPFHCBCIHT-UHFFFAOYSA-N 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-M 3-Methylbutanoic acid Natural products CC(C)CC([O-])=O GWYFCOCPABKNJV-UHFFFAOYSA-M 0.000 description 1
- 125000004975 3-butenyl group Chemical group C(CC=C)* 0.000 description 1
- LQENBVCXBPWHIX-UHFFFAOYSA-N 3-ethyl-2,5-dihydrothiophene 1,1-dioxide Chemical compound CCC1=CCS(=O)(=O)C1 LQENBVCXBPWHIX-UHFFFAOYSA-N 0.000 description 1
- SBLRHMKNNHXPHG-UHFFFAOYSA-N 4-fluoro-1,3-dioxolan-2-one Chemical compound FC1COC(=O)O1 SBLRHMKNNHXPHG-UHFFFAOYSA-N 0.000 description 1
- OVDQEUFSGODEBT-UHFFFAOYSA-N 4-methyl-1,3-dioxan-2-one Chemical compound CC1CCOC(=O)O1 OVDQEUFSGODEBT-UHFFFAOYSA-N 0.000 description 1
- KDVYCTOWXSLNNI-UHFFFAOYSA-N 4-t-Butylbenzoic acid Chemical compound CC(C)(C)C1=CC=C(C(O)=O)C=C1 KDVYCTOWXSLNNI-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical group [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- NOPPGBXKCYALLF-UHFFFAOYSA-N B(O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C)(O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C)O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C Chemical compound B(O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C)(O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C)O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C NOPPGBXKCYALLF-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical group [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- OZYGIFGDNSLOGV-UHFFFAOYSA-N C(C1=CC=CC=C1)C1CS(CC1CC1=CC=CC=C1)(=O)=O Chemical compound C(C1=CC=CC=C1)C1CS(CC1CC1=CC=CC=C1)(=O)=O OZYGIFGDNSLOGV-UHFFFAOYSA-N 0.000 description 1
- XMWRBQBLMFGWIX-UHFFFAOYSA-N C60 fullerene Chemical compound C12=C3C(C4=C56)=C7C8=C5C5=C9C%10=C6C6=C4C1=C1C4=C6C6=C%10C%10=C9C9=C%11C5=C8C5=C8C7=C3C3=C7C2=C1C1=C2C4=C6C4=C%10C6=C9C9=C%11C5=C5C8=C3C3=C7C1=C1C2=C4C6=C2C9=C5C3=C12 XMWRBQBLMFGWIX-UHFFFAOYSA-N 0.000 description 1
- KRYQPDPPJYGVJW-UHFFFAOYSA-N C=1C=CC=CC=1[Si](C)(C)C([Si](C)(C)C=1C=CC=CC=1)(C)[Si](C)(C)C1=CC=CC=C1 Chemical compound C=1C=CC=CC=1[Si](C)(C)C([Si](C)(C)C=1C=CC=CC=1)(C)[Si](C)(C)C1=CC=CC=C1 KRYQPDPPJYGVJW-UHFFFAOYSA-N 0.000 description 1
- FWIFCXUAFVIMEV-UHFFFAOYSA-N C[Si](C)(C)OC(=O)C1=CC=C(S1)C(=O)O[Si](C)(C)C Chemical compound C[Si](C)(C)OC(=O)C1=CC=C(S1)C(=O)O[Si](C)(C)C FWIFCXUAFVIMEV-UHFFFAOYSA-N 0.000 description 1
- KCGOQNQJXPWWMK-UHFFFAOYSA-N C[Si](C1=CC=CC=C1)(C2=CC=CC=C2)OP(=O)(O[Si](C)(C3=CC=CC=C3)C4=CC=CC=C4)O[Si](C)(C5=CC=CC=C5)C6=CC=CC=C6 Chemical compound C[Si](C1=CC=CC=C1)(C2=CC=CC=C2)OP(=O)(O[Si](C)(C3=CC=CC=C3)C4=CC=CC=C4)O[Si](C)(C5=CC=CC=C5)C6=CC=CC=C6 KCGOQNQJXPWWMK-UHFFFAOYSA-N 0.000 description 1
- 239000005635 Caprylic acid (CAS 124-07-2) Substances 0.000 description 1
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 1
- 239000005751 Copper oxide Substances 0.000 description 1
- RZTOWFMDBDPERY-UHFFFAOYSA-N Delta-Hexanolactone Chemical compound CC1CCCC(=O)O1 RZTOWFMDBDPERY-UHFFFAOYSA-N 0.000 description 1
- DKMROQRQHGEIOW-UHFFFAOYSA-N Diethyl succinate Chemical compound CCOC(=O)CCC(=O)OCC DKMROQRQHGEIOW-UHFFFAOYSA-N 0.000 description 1
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 1
- JJHHIJFTHRNPIK-UHFFFAOYSA-N Diphenyl sulfoxide Chemical compound C=1C=CC=CC=1S(=O)C1=CC=CC=C1 JJHHIJFTHRNPIK-UHFFFAOYSA-N 0.000 description 1
- IAYPIBMASNFSPL-UHFFFAOYSA-N Ethylene oxide Chemical compound C1CO1 IAYPIBMASNFSPL-UHFFFAOYSA-N 0.000 description 1
- 229920002153 Hydroxypropyl cellulose Polymers 0.000 description 1
- JGFBQFKZKSSODQ-UHFFFAOYSA-N Isothiocyanatocyclopropane Chemical compound S=C=NC1CC1 JGFBQFKZKSSODQ-UHFFFAOYSA-N 0.000 description 1
- 238000003109 Karl Fischer titration Methods 0.000 description 1
- 229910000733 Li alloy Inorganic materials 0.000 description 1
- 229910009748 Li1.1Mn1.85Al0.05O4 Inorganic materials 0.000 description 1
- 229910002983 Li2MnO3 Inorganic materials 0.000 description 1
- 229910010085 Li2MnO3-LiMO2 Inorganic materials 0.000 description 1
- 229910010099 Li2MnO3—LiMO2 Inorganic materials 0.000 description 1
- 229910002986 Li4Ti5O12 Inorganic materials 0.000 description 1
- 229910013075 LiBF Inorganic materials 0.000 description 1
- 229910032387 LiCoO2 Inorganic materials 0.000 description 1
- 229910011279 LiCoPO4 Inorganic materials 0.000 description 1
- 229910052493 LiFePO4 Inorganic materials 0.000 description 1
- 229910016118 LiMn1.5Ni0.5O4 Inorganic materials 0.000 description 1
- 229910014297 LiMn1.8Al0.2O4 Inorganic materials 0.000 description 1
- 229910002993 LiMnO2 Inorganic materials 0.000 description 1
- 229910013716 LiNi Inorganic materials 0.000 description 1
- 229910002991 LiNi0.5Co0.2Mn0.3O2 Inorganic materials 0.000 description 1
- 229910012752 LiNi0.5Mn0.5O2 Inorganic materials 0.000 description 1
- 229910011328 LiNi0.6Co0.2Mn0.2O2 Inorganic materials 0.000 description 1
- 229910011715 LiNi0.80 Inorganic materials 0.000 description 1
- 229910011456 LiNi0.80Co0.15Al0.05O2 Inorganic materials 0.000 description 1
- 229910015872 LiNi0.8Co0.1Mn0.1O2 Inorganic materials 0.000 description 1
- 229910013292 LiNiO Inorganic materials 0.000 description 1
- 229910012219 LiPFa Inorganic materials 0.000 description 1
- 229910012265 LiPO2F2 Inorganic materials 0.000 description 1
- 229910012981 LiVO2 Inorganic materials 0.000 description 1
- 229910002097 Lithium manganese(III,IV) oxide Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- RJUFJBKOKNCXHH-UHFFFAOYSA-N Methyl propionate Chemical compound CCC(=O)OC RJUFJBKOKNCXHH-UHFFFAOYSA-N 0.000 description 1
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical group C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 1
- TXXHDPDFNKHHGW-CCAGOZQPSA-N Muconic acid Natural products OC(=O)\C=C/C=C\C(O)=O TXXHDPDFNKHHGW-CCAGOZQPSA-N 0.000 description 1
- IGGHSANJNRYSQB-UHFFFAOYSA-N OS([SiH3])(=O)=O Chemical compound OS([SiH3])(=O)=O IGGHSANJNRYSQB-UHFFFAOYSA-N 0.000 description 1
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 239000004695 Polyether sulfone Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- RWRDLPDLKQPQOW-UHFFFAOYSA-N Pyrrolidine Chemical group C1CCNC1 RWRDLPDLKQPQOW-UHFFFAOYSA-N 0.000 description 1
- JDLCUNGOIIZQNC-UHFFFAOYSA-N S(=O)(=O)(O[Si](C1=CC=CC=C1)(C)C)O[Si](C1=CC=CC=C1)(C)C Chemical compound S(=O)(=O)(O[Si](C1=CC=CC=C1)(C)C)O[Si](C1=CC=CC=C1)(C)C JDLCUNGOIIZQNC-UHFFFAOYSA-N 0.000 description 1
- DXACGJFYDGUOCN-UHFFFAOYSA-N S(=O)(=O)(O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C)O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C Chemical compound S(=O)(=O)(O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C)O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C DXACGJFYDGUOCN-UHFFFAOYSA-N 0.000 description 1
- 229910000676 Si alloy Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 229920002472 Starch Polymers 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical group C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- YPWFISCTZQNZAU-UHFFFAOYSA-N Thiane Chemical group C1CCSCC1 YPWFISCTZQNZAU-UHFFFAOYSA-N 0.000 description 1
- FZWLAAWBMGSTSO-UHFFFAOYSA-N Thiazole Chemical group C1=CSC=N1 FZWLAAWBMGSTSO-UHFFFAOYSA-N 0.000 description 1
- 239000003490 Thiodipropionic acid Substances 0.000 description 1
- 229910003092 TiS2 Inorganic materials 0.000 description 1
- LJNLQINQNBIRMR-UHFFFAOYSA-N [4-[dimethyl(phenyl)silyl]phenyl]-dimethyl-phenylsilane Chemical compound C=1C=C([Si](C)(C)C=2C=CC=CC=2)C=CC=1[Si](C)(C)C1=CC=CC=C1 LJNLQINQNBIRMR-UHFFFAOYSA-N 0.000 description 1
- BKKRTYHQSSGTLN-UHFFFAOYSA-N [dimethyl(phenyl)silyl] methanesulfonate Chemical compound CS(=O)(=O)O[Si](C)(C)C1=CC=CC=C1 BKKRTYHQSSGTLN-UHFFFAOYSA-N 0.000 description 1
- DPXJVFZANSGRMM-UHFFFAOYSA-N acetic acid;2,3,4,5,6-pentahydroxyhexanal;sodium Chemical compound [Na].CC(O)=O.OCC(O)C(O)C(O)C(O)C=O DPXJVFZANSGRMM-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical group [H]C([H])([H])C(*)=O 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- LBVBDLCCWCJXFA-UHFFFAOYSA-N adamantane-1,2-dicarboxylic acid Chemical compound C1C(C2)CC3CC1C(C(=O)O)C2(C(O)=O)C3 LBVBDLCCWCJXFA-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- GWYFCOCPABKNJV-UHFFFAOYSA-N beta-methyl-butyric acid Natural products CC(C)CC(O)=O GWYFCOCPABKNJV-UHFFFAOYSA-N 0.000 description 1
- 125000006267 biphenyl group Chemical group 0.000 description 1
- OITVFMRNHJZOHF-BQYQJAHWSA-N bis(trimethylsilyl) (e)-but-2-enedioate Chemical compound C[Si](C)(C)OC(=O)\C=C\C(=O)O[Si](C)(C)C OITVFMRNHJZOHF-BQYQJAHWSA-N 0.000 description 1
- QUUDZINXVRFXLB-UHFFFAOYSA-N bis(trimethylsilyl) butanedioate Chemical compound C[Si](C)(C)OC(=O)CCC(=O)O[Si](C)(C)C QUUDZINXVRFXLB-UHFFFAOYSA-N 0.000 description 1
- YRUVPYQFCGWAPZ-UHFFFAOYSA-N bis(triphenylsilyl) sulfate Chemical compound C1(=CC=CC=C1)[Si](C1=CC=CC=C1)(C1=CC=CC=C1)OS(=O)(=O)O[Si](C1=CC=CC=C1)(C1=CC=CC=C1)C1=CC=CC=C1 YRUVPYQFCGWAPZ-UHFFFAOYSA-N 0.000 description 1
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- DISYGAAFCMVRKW-UHFFFAOYSA-N butyl ethyl carbonate Chemical compound CCCCOC(=O)OCC DISYGAAFCMVRKW-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- BGOXDXKKPCBMEG-UHFFFAOYSA-N butyl-dimethyl-phenylsilane Chemical compound CCCC[Si](C)(C)C1=CC=CC=C1 BGOXDXKKPCBMEG-UHFFFAOYSA-N 0.000 description 1
- YTIVTFGABIZHHX-UHFFFAOYSA-N butynedioic acid Chemical compound OC(=O)C#CC(O)=O YTIVTFGABIZHHX-UHFFFAOYSA-N 0.000 description 1
- PWLNAUNEAKQYLH-UHFFFAOYSA-N butyric acid octyl ester Natural products CCCCCCCCOC(=O)CCC PWLNAUNEAKQYLH-UHFFFAOYSA-N 0.000 description 1
- 125000004063 butyryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- OJIJEKBXJYRIBZ-UHFFFAOYSA-N cadmium nickel Chemical compound [Ni].[Cd] OJIJEKBXJYRIBZ-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000003660 carbonate based solvent Substances 0.000 description 1
- 238000010000 carbonizing Methods 0.000 description 1
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 235000010980 cellulose Nutrition 0.000 description 1
- 239000012461 cellulose resin Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 239000011335 coal coke Substances 0.000 description 1
- 239000011300 coal pitch Substances 0.000 description 1
- CKFRRHLHAJZIIN-UHFFFAOYSA-N cobalt lithium Chemical compound [Li].[Co] CKFRRHLHAJZIIN-UHFFFAOYSA-N 0.000 description 1
- 229910000428 cobalt oxide Inorganic materials 0.000 description 1
- GIPIUENNGCQCIT-UHFFFAOYSA-K cobalt(3+) phosphate Chemical class [Co+3].[O-]P([O-])([O-])=O GIPIUENNGCQCIT-UHFFFAOYSA-K 0.000 description 1
- IVMYJDGYRUAWML-UHFFFAOYSA-N cobalt(ii) oxide Chemical compound [Co]=O IVMYJDGYRUAWML-UHFFFAOYSA-N 0.000 description 1
- 229920001940 conductive polymer Polymers 0.000 description 1
- 229910000431 copper oxide Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- ILUAAIDVFMVTAU-UHFFFAOYSA-N cyclohex-4-ene-1,2-dicarboxylic acid Chemical compound OC(=O)C1CC=CCC1C(O)=O ILUAAIDVFMVTAU-UHFFFAOYSA-N 0.000 description 1
- QSAWQNUELGIYBC-UHFFFAOYSA-N cyclohexane-1,2-dicarboxylic acid Chemical compound OC(=O)C1CCCCC1C(O)=O QSAWQNUELGIYBC-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 125000001511 cyclopentyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000003074 decanoyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- 125000003493 decenyl group Chemical group [H]C([*])=C([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 125000002704 decyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- FYTRVXSHONWYNE-UHFFFAOYSA-N delta-octanolide Chemical compound CCCC1CCCC(=O)O1 FYTRVXSHONWYNE-UHFFFAOYSA-N 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 150000001991 dicarboxylic acids Chemical class 0.000 description 1
- CCAFPWNGIUBUSD-UHFFFAOYSA-N diethyl sulfoxide Chemical compound CCS(=O)CC CCAFPWNGIUBUSD-UHFFFAOYSA-N 0.000 description 1
- JJQZDUKDJDQPMQ-UHFFFAOYSA-N dimethoxy(dimethyl)silane Chemical compound CO[Si](C)(C)OC JJQZDUKDJDQPMQ-UHFFFAOYSA-N 0.000 description 1
- ALNUXDUOGDPMDN-UHFFFAOYSA-N dimethyl-octyl-phenylsilane Chemical compound CCCCCCCC[Si](C)(C)C1=CC=CC=C1 ALNUXDUOGDPMDN-UHFFFAOYSA-N 0.000 description 1
- IUNMPGNGSSIWFP-UHFFFAOYSA-N dimethylaminopropylamine Chemical compound CN(C)CCCN IUNMPGNGSSIWFP-UHFFFAOYSA-N 0.000 description 1
- JMPVESVJOFYWTB-UHFFFAOYSA-N dipropan-2-yl carbonate Chemical compound CC(C)OC(=O)OC(C)C JMPVESVJOFYWTB-UHFFFAOYSA-N 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- UTCXESIWEYTBMM-UHFFFAOYSA-N dodecane-1,1,12,12-tetracarboxylic acid Chemical compound OC(=O)C(C(O)=O)CCCCCCCCCCC(C(O)=O)C(O)=O UTCXESIWEYTBMM-UHFFFAOYSA-N 0.000 description 1
- 125000005066 dodecenyl group Chemical group C(=CCCCCCCCCCC)* 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 239000007772 electrode material Substances 0.000 description 1
- 239000011808 electrode reactant Substances 0.000 description 1
- 239000003759 ester based solvent Substances 0.000 description 1
- 230000032050 esterification Effects 0.000 description 1
- 238000005886 esterification reaction Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- KLKFAASOGCDTDT-UHFFFAOYSA-N ethoxymethoxyethane Chemical compound CCOCOCC KLKFAASOGCDTDT-UHFFFAOYSA-N 0.000 description 1
- HHEIMYAXCOIQCJ-UHFFFAOYSA-N ethyl 2,2-dimethylpropanoate Chemical compound CCOC(=O)C(C)(C)C HHEIMYAXCOIQCJ-UHFFFAOYSA-N 0.000 description 1
- IJUHLFUALMUWOM-UHFFFAOYSA-N ethyl 3-methoxypropanoate Chemical compound CCOC(=O)CCOC IJUHLFUALMUWOM-UHFFFAOYSA-N 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- UKFXDFUAPNAMPJ-UHFFFAOYSA-N ethylmalonic acid Chemical compound CCC(C(O)=O)C(O)=O UKFXDFUAPNAMPJ-UHFFFAOYSA-N 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- WBJINCZRORDGAQ-UHFFFAOYSA-N formic acid ethyl ester Natural products CCOC=O WBJINCZRORDGAQ-UHFFFAOYSA-N 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 125000002485 formyl group Chemical group [H]C(*)=O 0.000 description 1
- 229910003472 fullerene Inorganic materials 0.000 description 1
- 239000001530 fumaric acid Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 125000003976 glyceryl group Chemical group [H]C([*])([H])C(O[H])([H])C(O[H])([H])[H] 0.000 description 1
- 125000000268 heptanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003187 heptyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 1
- 125000003104 hexanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000006038 hexenyl group Chemical group 0.000 description 1
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000003707 hexyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- BHEPBYXIRTUNPN-UHFFFAOYSA-N hydridophosphorus(.) (triplet) Chemical compound [PH] BHEPBYXIRTUNPN-UHFFFAOYSA-N 0.000 description 1
- 239000001863 hydroxypropyl cellulose Substances 0.000 description 1
- 235000010977 hydroxypropyl cellulose Nutrition 0.000 description 1
- 125000002636 imidazolinyl group Chemical group 0.000 description 1
- 125000002883 imidazolyl group Chemical group 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000003780 insertion Methods 0.000 description 1
- 230000037431 insertion Effects 0.000 description 1
- 239000011229 interlayer Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- GJRQTCIYDGXPES-UHFFFAOYSA-N iso-butyl acetate Natural products CC(C)COC(C)=O GJRQTCIYDGXPES-UHFFFAOYSA-N 0.000 description 1
- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
- WDAXFOBOLVPGLV-UHFFFAOYSA-N isobutyric acid ethyl ester Natural products CCOC(=O)C(C)C WDAXFOBOLVPGLV-UHFFFAOYSA-N 0.000 description 1
- FGKJLKRYENPLQH-UHFFFAOYSA-M isocaproate Chemical compound CC(C)CCC([O-])=O FGKJLKRYENPLQH-UHFFFAOYSA-M 0.000 description 1
- 125000004491 isohexyl group Chemical group C(CCC(C)C)* 0.000 description 1
- 125000001972 isopentyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- OQAGVSWESNCJJT-UHFFFAOYSA-N isovaleric acid methyl ester Natural products COC(=O)CC(C)C OQAGVSWESNCJJT-UHFFFAOYSA-N 0.000 description 1
- 239000003273 ketjen black Substances 0.000 description 1
- 239000006233 lamp black Substances 0.000 description 1
- 125000000400 lauroyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000464 lead oxide Inorganic materials 0.000 description 1
- 239000001989 lithium alloy Substances 0.000 description 1
- KWGKDLIKAYFUFQ-UHFFFAOYSA-M lithium chloride Inorganic materials [Li+].[Cl-] KWGKDLIKAYFUFQ-UHFFFAOYSA-M 0.000 description 1
- 229910001540 lithium hexafluoroarsenate(V) Inorganic materials 0.000 description 1
- 229910021445 lithium manganese complex oxide Inorganic materials 0.000 description 1
- RSNHXDVSISOZOB-UHFFFAOYSA-N lithium nickel Chemical compound [Li].[Ni] RSNHXDVSISOZOB-UHFFFAOYSA-N 0.000 description 1
- 229910001486 lithium perchlorate Inorganic materials 0.000 description 1
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 229910052976 metal sulfide Inorganic materials 0.000 description 1
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940017219 methyl propionate Drugs 0.000 description 1
- GIGVICQLYWGMGW-UHFFFAOYSA-N methyl(triphenyl)silane Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C)C1=CC=CC=C1 GIGVICQLYWGMGW-UHFFFAOYSA-N 0.000 description 1
- ZIYVHBGGAOATLY-UHFFFAOYSA-N methylmalonic acid Chemical compound OC(=O)C(C)C(O)=O ZIYVHBGGAOATLY-UHFFFAOYSA-N 0.000 description 1
- 239000012982 microporous membrane Substances 0.000 description 1
- 150000002763 monocarboxylic acids Chemical class 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- UUIQMZJEGPQKFD-UHFFFAOYSA-N n-butyric acid methyl ester Natural products CCCC(=O)OC UUIQMZJEGPQKFD-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 239000011331 needle coke Substances 0.000 description 1
- 125000001971 neopentyl group Chemical group [H]C([*])([H])C(C([H])([H])[H])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 235000001968 nicotinic acid Nutrition 0.000 description 1
- 229960003512 nicotinic acid Drugs 0.000 description 1
- 239000011664 nicotinic acid Substances 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 1
- 125000001402 nonanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 125000005187 nonenyl group Chemical group C(=CCCCCCCC)* 0.000 description 1
- 125000001400 nonyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229960002446 octanoic acid Drugs 0.000 description 1
- 125000002801 octanoyl group Chemical group C(CCCCCCC)(=O)* 0.000 description 1
- 125000004365 octenyl group Chemical group C(=CCCCCCC)* 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005447 octyloxy group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])O* 0.000 description 1
- 150000003961 organosilicon compounds Chemical class 0.000 description 1
- 125000001181 organosilyl group Chemical group [SiH3]* 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 125000002971 oxazolyl group Chemical group 0.000 description 1
- UFOIOXZLTXNHQH-UHFFFAOYSA-N oxolane-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C1OC(C(O)=O)C(C(O)=O)C1C(O)=O UFOIOXZLTXNHQH-UHFFFAOYSA-N 0.000 description 1
- YEXPOXQUZXUXJW-UHFFFAOYSA-N oxolead Chemical compound [Pb]=O YEXPOXQUZXUXJW-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- ROTJZTYLACIJIG-UHFFFAOYSA-N pentane-1,3,5-tricarboxylic acid Chemical compound OC(=O)CCC(C(O)=O)CCC(O)=O ROTJZTYLACIJIG-UHFFFAOYSA-N 0.000 description 1
- 125000002255 pentenyl group Chemical group C(=CCCC)* 0.000 description 1
- 125000004115 pentoxy group Chemical group [*]OC([H])([H])C([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 239000002006 petroleum coke Substances 0.000 description 1
- 239000011301 petroleum pitch Substances 0.000 description 1
- 239000002530 phenolic antioxidant Substances 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 125000000286 phenylethyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004344 phenylpropyl group Chemical group 0.000 description 1
- PARWUHTVGZSQPD-UHFFFAOYSA-N phenylsilane Chemical class [SiH3]C1=CC=CC=C1 PARWUHTVGZSQPD-UHFFFAOYSA-N 0.000 description 1
- 229940081066 picolinic acid Drugs 0.000 description 1
- 125000003386 piperidinyl group Chemical group 0.000 description 1
- 239000011295 pitch Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920002401 polyacrylamide Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002312 polyamide-imide Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 229920000036 polyvinylpyrrolidone Polymers 0.000 description 1
- 239000001267 polyvinylpyrrolidone Substances 0.000 description 1
- 235000013855 polyvinylpyrrolidone Nutrition 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- FVSKHRXBFJPNKK-UHFFFAOYSA-N propionitrile Chemical compound CCC#N FVSKHRXBFJPNKK-UHFFFAOYSA-N 0.000 description 1
- 125000001501 propionyl group Chemical group O=C([*])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000003373 pyrazinyl group Chemical group 0.000 description 1
- 125000003226 pyrazolyl group Chemical group 0.000 description 1
- 125000000168 pyrrolyl group Chemical group 0.000 description 1
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 125000003548 sec-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- WSYBLCQRXWDMSI-UHFFFAOYSA-N silyl hydrogen sulfate Chemical compound OS(=O)(=O)O[SiH3] WSYBLCQRXWDMSI-UHFFFAOYSA-N 0.000 description 1
- ACECBHHKGNTVPB-UHFFFAOYSA-N silylformic acid Chemical compound OC([SiH3])=O ACECBHHKGNTVPB-UHFFFAOYSA-N 0.000 description 1
- GKQAJHRXRWQREX-UHFFFAOYSA-N silyloxyboronic acid Chemical compound OB(O)O[SiH3] GKQAJHRXRWQREX-UHFFFAOYSA-N 0.000 description 1
- 235000019812 sodium carboxymethyl cellulose Nutrition 0.000 description 1
- 229920001027 sodium carboxymethylcellulose Polymers 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000008107 starch Substances 0.000 description 1
- 235000019698 starch Nutrition 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- YPMOSINXXHVZIL-UHFFFAOYSA-N sulfanylideneantimony Chemical compound [Sb]=S YPMOSINXXHVZIL-UHFFFAOYSA-N 0.000 description 1
- MBDNRNMVTZADMQ-UHFFFAOYSA-N sulfolene Chemical compound O=S1(=O)CC=CC1 MBDNRNMVTZADMQ-UHFFFAOYSA-N 0.000 description 1
- 150000003457 sulfones Chemical class 0.000 description 1
- 230000004083 survival effect Effects 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- FFFHXSGSMLTXFJ-UHFFFAOYSA-N tert-butyl propyl carbonate Chemical compound CCCOC(=O)OC(C)(C)C FFFHXSGSMLTXFJ-UHFFFAOYSA-N 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- RAOIDOHSFRTOEL-UHFFFAOYSA-N tetrahydrothiophene Chemical group C1CCSC1 RAOIDOHSFRTOEL-UHFFFAOYSA-N 0.000 description 1
- 125000000383 tetramethylene group Chemical group [H]C([H])([*:1])C([H])([H])C([H])([H])C([H])([H])[*:2] 0.000 description 1
- 239000006234 thermal black Substances 0.000 description 1
- 239000002562 thickening agent Substances 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 229930192474 thiophene Natural products 0.000 description 1
- LUEGQDUCMILDOJ-UHFFFAOYSA-N thiophene-2,3,4,5-tetracarboxylic acid Chemical compound OC(=O)C=1SC(C(O)=O)=C(C(O)=O)C=1C(O)=O LUEGQDUCMILDOJ-UHFFFAOYSA-N 0.000 description 1
- XYDGZBIMFVKRQW-UHFFFAOYSA-N thiophene-2,3,5-tricarboxylic acid Chemical compound OC(=O)C1=CC(C(O)=O)=C(C(O)=O)S1 XYDGZBIMFVKRQW-UHFFFAOYSA-N 0.000 description 1
- YCGAZNXXGKTASZ-UHFFFAOYSA-N thiophene-2,5-dicarboxylic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)S1 YCGAZNXXGKTASZ-UHFFFAOYSA-N 0.000 description 1
- QERYCTSHXKAMIS-UHFFFAOYSA-N thiophene-2-carboxylic acid Chemical compound OC(=O)C1=CC=CS1 QERYCTSHXKAMIS-UHFFFAOYSA-N 0.000 description 1
- ZWWLLYJRPKYTDF-UHFFFAOYSA-N thiophene-3,4-dicarboxylic acid Chemical compound OC(=O)C1=CSC=C1C(O)=O ZWWLLYJRPKYTDF-UHFFFAOYSA-N 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 125000003944 tolyl group Chemical group 0.000 description 1
- YHGNXQAFNHCBTK-OWOJBTEDSA-N trans-3-hexenedioic acid Chemical compound OC(=O)C\C=C\CC(O)=O YHGNXQAFNHCBTK-OWOJBTEDSA-N 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- CEAWWDXUKYZTJL-UHFFFAOYSA-N triethyl(phenyl)silane Chemical compound CC[Si](CC)(CC)C1=CC=CC=C1 CEAWWDXUKYZTJL-UHFFFAOYSA-N 0.000 description 1
- GUXKMBDCQVQNDN-UHFFFAOYSA-N trimethyl-(2,4,6-trifluorophenyl)silane Chemical compound C[Si](C)(C)C1=C(F)C=C(F)C=C1F GUXKMBDCQVQNDN-UHFFFAOYSA-N 0.000 description 1
- YHMJZIJXVNRXIN-UHFFFAOYSA-N trimethyl-(2-trimethylsilylphenyl)silane Chemical compound C[Si](C)(C)C1=CC=CC=C1[Si](C)(C)C YHMJZIJXVNRXIN-UHFFFAOYSA-N 0.000 description 1
- YFHICDDUDORKJB-UHFFFAOYSA-N trimethylene carbonate Chemical compound O=C1OCCCO1 YFHICDDUDORKJB-UHFFFAOYSA-N 0.000 description 1
- 125000003258 trimethylene group Chemical group [H]C([H])([*:2])C([H])([H])C([H])([H])[*:1] 0.000 description 1
- ITFADMQUIJYAEK-UHFFFAOYSA-N trimethylsilyl 2-(2-oxo-2-trimethylsilyloxyethyl)sulfanylacetate Chemical compound C[Si](C)(C)OC(=O)CSCC(=O)O[Si](C)(C)C ITFADMQUIJYAEK-UHFFFAOYSA-N 0.000 description 1
- PGQNYIRJCLTTOJ-UHFFFAOYSA-N trimethylsilyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)O[Si](C)(C)C PGQNYIRJCLTTOJ-UHFFFAOYSA-N 0.000 description 1
- 125000000026 trimethylsilyl group Chemical group [H]C([H])([H])[Si]([*])(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- HJYWSCOBSDDZJM-UHFFFAOYSA-N trimethylsilyl phenylmethanesulfonate Chemical compound C[Si](C)(C)OS(=O)(=O)CC1=CC=CC=C1 HJYWSCOBSDDZJM-UHFFFAOYSA-N 0.000 description 1
- NTJPIRDYMVYFNP-UHFFFAOYSA-M trimethylsilylmethanesulfonate Chemical compound C[Si](C)(C)CS([O-])(=O)=O NTJPIRDYMVYFNP-UHFFFAOYSA-M 0.000 description 1
- OEYLFHZJEQHFLI-UHFFFAOYSA-N tris(triphenylsilyl) borate Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)OB(O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 OEYLFHZJEQHFLI-UHFFFAOYSA-N 0.000 description 1
- HQLWIQNIBWDXFB-UHFFFAOYSA-N tris(triphenylsilyl) phosphate Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)OP(O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)(=O)O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 HQLWIQNIBWDXFB-UHFFFAOYSA-N 0.000 description 1
- IUWFXWWRPUSLJH-UHFFFAOYSA-N tris(triphenylsilyl) phosphite Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)OP(O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C=1C=CC=CC=1)O[Si](C=1C=CC=CC=1)(C=1C=CC=CC=1)C1=CC=CC=C1 IUWFXWWRPUSLJH-UHFFFAOYSA-N 0.000 description 1
- KHYUQXYUMVNYNE-UHFFFAOYSA-N tris[dimethyl(phenyl)silyl] borate Chemical compound C=1C=CC=CC=1[Si](C)(C)OB(O[Si](C)(C)C=1C=CC=CC=1)O[Si](C)(C)C1=CC=CC=C1 KHYUQXYUMVNYNE-UHFFFAOYSA-N 0.000 description 1
- UDHDACBTMWDEAQ-UHFFFAOYSA-N tris[dimethyl(phenyl)silyl] phosphate Chemical compound P(=O)(O[Si](C1=CC=CC=C1)(C)C)(O[Si](C1=CC=CC=C1)(C)C)O[Si](C1=CC=CC=C1)(C)C UDHDACBTMWDEAQ-UHFFFAOYSA-N 0.000 description 1
- UIYMMUOQWUDYIX-UHFFFAOYSA-N tris[dimethyl(phenyl)silyl] phosphite Chemical compound P(O[Si](C1=CC=CC=C1)(C)C)(O[Si](C1=CC=CC=C1)(C)C)O[Si](C1=CC=CC=C1)(C)C UIYMMUOQWUDYIX-UHFFFAOYSA-N 0.000 description 1
- ROEKYMIVSHPDKB-UHFFFAOYSA-N tris[methyl(diphenyl)silyl] phosphite Chemical compound C=1C=CC=CC=1[Si](C=1C=CC=CC=1)(C)OP(O[Si](C)(C=1C=CC=CC=1)C=1C=CC=CC=1)O[Si](C)(C=1C=CC=CC=1)C1=CC=CC=C1 ROEKYMIVSHPDKB-UHFFFAOYSA-N 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 125000000297 undecanoyl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 125000005065 undecenyl group Chemical group C(=CCCCCCCCCC)* 0.000 description 1
- 125000002948 undecyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229940005605 valeric acid Drugs 0.000 description 1
- 125000003774 valeryl group Chemical group O=C([*])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- 125000005023 xylyl group Chemical group 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0566—Liquid materials
- H01M10/0567—Liquid materials characterised by the additives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01M—PROCESSES OR MEANS, e.g. BATTERIES, FOR THE DIRECT CONVERSION OF CHEMICAL ENERGY INTO ELECTRICAL ENERGY
- H01M10/00—Secondary cells; Manufacture thereof
- H01M10/05—Accumulators with non-aqueous electrolyte
- H01M10/056—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes
- H01M10/0564—Accumulators with non-aqueous electrolyte characterised by the materials used as electrolytes, e.g. mixed inorganic/organic electrolytes the electrolyte being constituted of organic materials only
- H01M10/0566—Liquid materials
- H01M10/0568—Liquid materials characterised by the solutes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/10—Energy storage using batteries
Abstract
The present invention is a method for suppressing decomposition of a silyl ester compound in a nonaqueous electrolytic solution containing a lithium salt containing a fluorine atom, a silyl ester compound selected from the group consisting of a carboxylic acid silyl ester compound, a sulfuric acid silyl ester compound, a sulfonic acid silyl ester compound, a phosphorous acid silyl ester compound, a phosphoric acid silyl ester compound, and a boric acid silyl ester compound, and an organic solvent, wherein a phenylsilane compound represented by the following general formula (1) is incorporated in the nonaqueous electrolytic solution in an amount of 0.1 to 10 mass%, and the moisture content of the nonaqueous electrolytic solution is set to 1000 mass ppm or less. (the definition of each symbol in the formula refers to the description。)
Description
Technical Field
The present invention relates to a method for suppressing decomposition of a silyl ester compound in a nonaqueous electrolytic solution obtained by dissolving a lithium salt containing a fluorine atom and the silyl ester compound in an organic solvent.
Background
With the recent spread of portable personal computers, hand-held video cameras, portable electronic devices for information terminals, and the like, nonaqueous electrolyte secondary batteries having high voltage and high energy density have been widely used as power sources. In view of environmental problems, electric vehicles and hybrid vehicles using electric power as a part of motive power have been put to practical use. Among nonaqueous electrolyte secondary batteries, a secondary battery (so-called lithium ion secondary battery) utilizing insertion and extraction of lithium in charge and discharge reactions is widely used because it can achieve a higher energy density than a lead battery or a nickel-cadmium battery.
In lithium ion secondary batteries, nonaqueous electrolytes obtained by dissolving a lithium salt containing a fluorine atom such as lithium hexafluorophosphate as an electrolyte in a carbonate-based organic solvent such as propylene carbonate or diethyl carbonate have been used, and for the purpose of improving cycle characteristics and the like, nonaqueous electrolytes obtained by further adding a silyl ester compound such as silyl carboxylate (for example, see patent documents 1 to 3), silyl sulfate (for example, see patent documents 4 to 5), silyl sulfonate (for example, see patent documents 4 and 6), silyl phosphate (for example, see patent documents 5, 7 and 8), or silyl borate (for example, see patent documents 5 and 9) have been studied.
It is known that a lithium salt containing a fluorine atom is slowly hydrolyzed by moisture to generate hydrofluoric acid, and when a silyl ester compound is decomposed by hydrofluoric acid, the cycle characteristics are not improved in some cases. Therefore, as a scavenger of hydrofluoric acid, lactone compounds (for example, see patent document 10), cycloolefin compounds (for example, see patent document 11), silane compounds having SiH groups (for example, see patent document 12), organosilicon compounds having Si — N bonds (for example, see patent document 13), alkoxysilane compounds (for example, see patent document 14), and the like have been studied, but these scavengers have a low rate of trapping hydrofluoric acid and may not effectively inhibit decomposition of silyl ester compounds when the water content in the electrolyte solution is high.
Documents of the prior art
Patent document
Patent document 1: japanese laid-open patent publication No. 2002-313416
Patent document 2: US2006172200a1
Patent document 3: WO2016/013480 booklet
Patent document 4: US2002197537a1
Patent document 5: japanese patent laid-open publication No. 2006 and 253086
Patent document 6: US2013022861a1
Patent document 7: japanese patent laid-open No. 2001-319685
Patent document 8: japanese patent laid-open publication No. 2004-342607
Patent document 9: japanese patent laid-open No. 2001 and 283908
Patent document 10: japanese patent laid-open No. 2000-182666
Patent document 11: japanese laid-open patent publication No. 2002-
Patent document 12: japanese patent laid-open publication No. 2001-167792
Patent document 13: japanese laid-open patent publication No. 11-016602
Patent document 14: US2016248121a1
Disclosure of Invention
The purpose of the present invention is to suppress the decomposition of a silyl ester compound and improve the storage stability even in the presence of some moisture in a nonaqueous electrolytic solution obtained by dissolving a lithium salt containing a fluorine atom and a silyl ester (silyl ester) compound in an organic solvent.
The present inventors have conducted extensive studies and, as a result, have found that a silane compound having a specific structure has a high effect of suppressing the decomposition of a silyl ester compound, and have completed the present invention.
That is, the present invention is a method for suppressing decomposition of a silyl ester compound in a nonaqueous electrolytic solution containing a lithium salt containing a fluorine atom, a silyl ester compound selected from the group consisting of a carboxylic acid silyl ester compound, a sulfuric acid silyl ester compound, a sulfonic acid silyl ester compound, a phosphorous acid silyl ester compound, a phosphoric acid silyl ester compound and a boric acid silyl ester compound, and an organic solvent, wherein,
a phenylsilane compound represented by the following general formula (1) is mixed in the nonaqueous electrolytic solution in an amount of 0.1-10 mass%, and the water content of the nonaqueous electrolytic solution is set to be less than 1000 mass ppm.
[ chemical formula 1]
(in the formula, R1、R2、R3、R4And R5Each independently represents a hydrogen atom, a halogen atom, a nitrile group, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, an aralkyl group having 7 to 12 carbon atoms, an oxyalkyl group having 1 to 12 carbon atoms, an acyl group having 1 to 12 carbon atoms or-SiR8R9R10A group represented by, R6、R7、R8、R9And R10Independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and X1Represents a hydrocarbon group having a valence of m, and m represents a number of 1 to 3. )
Drawings
Fig. 1 is a longitudinal sectional view schematically showing an example of the structure of a coin-type battery as a secondary battery as an example of the use of a nonaqueous electrolytic solution in the method of the present invention.
Fig. 2 is a schematic diagram showing a basic configuration of a cylindrical battery as a secondary battery as an example of the use of the nonaqueous electrolytic solution in the method of the present invention.
Fig. 3 is a perspective view showing an internal structure of a cylindrical battery of a secondary battery in a cross section as an example of the use of the nonaqueous electrolytic solution in the method of the present invention.
Detailed Description
Hereinafter, preferred embodiments of the present invention will be described.
In the general formula (1), R1、R2、R3、R4And R5(hereinafter also referred to as "R")1~R5". ) Each independently represents a hydrogen atom, a halogen atom, a nitrile group, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, an aralkyl group having 7 to 12 carbon atoms, an oxyalkyl group having 1 to 12 carbon atoms, an acyl group having 1 to 12 carbon atoms or-SiR8R9R10The group shown. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, an iodine atom and the like.
Examples of the alkyl group having 1 to 12 carbon atoms include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, an isopropyl group, an isobutyl group, a sec-butyl group, a tert-butyl group, an isopentyl group, a neopentyl group, a 1-methylbutyl group, an isohexyl group, a 2-ethylhexyl group, and a 2-methylhexyl group.
Examples of the alkenyl group having 2 to 12 carbon atoms include a vinyl group, an allyl group, a 1-butenyl group, a 2-butenyl group, a 3-butenyl group, a1, 3-butadienyl group, a 1-methylvinyl group, a 2-methylvinyl group, a 1-methylallyl group, a1, 1-dimethylallyl group, a pentenyl group, a hexenyl group, a heptenyl group, an octenyl group, a nonenyl group, a decenyl group, an undecenyl group, and a dodecenyl group.
Examples of the cycloalkyl group having 5 to 12 carbon atoms include cyclopentyl, cyclohexyl, and 2-norbornenyl.
Examples of the aryl group having 6 to 12 carbon atoms include a phenyl group, a biphenyl group, a naphthyl group, a tolyl group, a xylyl group, a trimethylphenyl group, an ethylphenyl group and the like.
Examples of the aralkyl group having 7 to 12 carbon atoms include a benzyl group, a phenylethyl group, a phenylpropyl group, a tolylmethyl group, a tolylethyl group, a tolylpropyl group, a ditolylmethyl group, and a ditolylpropyl group.
Examples of the oxyalkyl group having 1 to 12 carbon atoms include a methoxy group, an ethoxy group, a propoxy group, a butoxy group, a pentyloxy group, a hexyloxy group, an octyloxy group, a decyloxy group and the like.
Examples of the acyl group having 1 to 12 carbon atoms include formyl group, acetyl group, propionyl group, butyryl group, pentanoyl group, hexanoyl group, heptanoyl group, octanoyl group, nonanoyl group, decanoyl group, undecanoyl group, and dodecanoyl group.
R6、R7、R8、R9And R10(hereinafter also referred to as "R")6~R10". ) Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms. Examples of the alkyl group having 1 to 12 carbon atoms, the alkenyl group having 2 to 12 carbon atoms, the cycloalkyl group having 5 to 12 carbon atoms, the aryl group having 6 to 12 carbon atoms and the aralkyl group having 7 to 12 carbon atoms include R1~R5The alkyl group having 1 to 12 carbon atoms, the alkenyl group having 2 to 12 carbon atoms, the cycloalkyl group having 5 to 12 carbon atoms, the aryl group having 6 to 12 carbon atoms and the aralkyl group having 7 to 12 carbon atoms are exemplified in (A) and (B).
As R1~R5From the viewpoint of easy availability of industrial raw materials, preferred is a hydrogen atom, a halogen atom, an alkyl group having 1 to 4 carbon atoms or-SiR8R9R10Further, a hydrogen atom or a fluorine atom is preferable. In addition, R is also preferable1~R 51 to 2 of them are-SiR8R9R10. In this case, the remaining R is preferred1~R5Is a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and the remaining R is particularly preferred1~R5Is a hydrogen atom.
As R6And R7In view of easy availability of industrial raw materials, an alkyl group having 1 to 4 carbon atoms or a phenyl group is preferable, and a methyl group is more preferable.
As R8、R9And R10In view of easy availability of industrial raw materials, an alkyl group having 1 to 4 carbon atoms or a phenyl group is preferable, and a methyl group is more preferable.
X1Represents a hydrocarbon group having a valence of m, and m represents a number of 1 to 3. Examples of the 1-valent hydrocarbon group in which m is a number of 1 include R1~R5The alkyl group having 1 to 12 carbon atoms, the alkenyl group having 2 to 12 carbon atoms, the cycloalkyl group having 5 to 12 carbon atoms, the aryl group having 6 to 12 carbon atoms and the aralkyl group having 7 to 12 carbon atoms are exemplified in (A) and (B).
Examples of the 2-valent hydrocarbon group in which m is a number of 2 include alkane diyl groups having 1 to 10 carbon atoms such as methane-1, 1-diyl group, ethane-1, 2-diyl group, ethane-1, 1-diyl group, propane-1, 3-diyl group, propane-1, 2-diyl group, butane-1, 4-diyl group, 2-methylpropane-1, 3-diyl group, 2-dimethylpropane-1, 3-diyl group, pentane-1, 5-diyl group, hexane-1, 6-diyl group, heptane-1, 7-diyl group, octane-1, 8-diyl group, nonane-1, 9-diyl group, decane-1, 10-diyl group, and the like; a group represented by the following general formula (6), a group represented by the following general formula (7), and the like. One or more methylene groups other than both ends of the alkanediyl group having 3 or more carbon atoms may be substituted with-S-or-O-.
[ chemical formula 2]
(in the formula, R45And R46Each independently represents a carbon atom number of1 to 10 alkanediyl groups or a direct bond. )
[ chemical formula 3]
(in the formula, R47And R48Each independently represents an alkanediyl group having 1 to 10 carbon atoms or a direct bond. )
Examples of the 3-valent hydrocarbon group in which m is a number of 3 include alkanetriyl groups having 1 to 10 carbon atoms such as methane-1, 1, 1-triyl, ethane-1, 1, 1-triyl, propane-1, 2, 3-triyl, pentane-1, 3, 5-triyl, hexane-1, 1-triyl, octane-1, 1, 1-triyl, decane-1, 1, 1-triyl, and the like; a group represented by the following general formula (8), a group represented by the following general formula (9), and the like.
[ chemical formula 4]
(in the formula, R49、R50And R51Each independently represents an alkanediyl group having 1 to 10 carbon atoms or a direct bond. )
[ chemical formula 5]
(in the formula, R52、R53And R54Each independently represents an alkanediyl group having 1 to 10 carbon atoms or a direct bond. )
As R45、R46、R47、R48、R49、R50、R51、R52、R53And R54The alkanediyl group having 1 to 10 carbon atoms is exemplified by X1Examples of the group include alkanediyl groups having 1 to 10 carbon atoms, and the groups exemplified above.
Among the phenylsilane compounds represented by the general formula (1), particularly preferred compounds include trimethylphenylsilane, triethylphenylsilane, dimethyldiphenylsilane, methyltriphenylsilane, trimethyl-4-fluorophenylsilane, trimethyl-2, 4, 6-trifluorophenylsilane, butyldimethylphenylsilane, dimethyloctylphenylsilane, 1, 4-bis (trimethylsilyl) benzene, 1, 2-bis (trimethylsilyl) benzene, 1, 4-bis (dimethylphenylsilyl) benzene, 1,1, 1-tris (dimethylphenylsilyl) ethane and the like.
The addition amount of the phenylsilane compound represented by the general formula (1) in the nonaqueous electrolytic solution is preferably 0.1 to 10% by mass. By setting the amount of addition to 0.1 mass% or more, sufficient effects are easily exhibited, and by setting the amount to 10 mass% or less, an incremental effect commensurate with the amount of addition is easily obtained, and the possibility of degradation of battery performance due to an increase can be prevented. The addition amount of the phenylsilane compound represented by the general formula (1) in the nonaqueous electrolytic solution is more preferably 0.1 to 7% by mass, still more preferably 0.5 to 7% by mass, and most preferably 1 to 5% by mass.
The timing of mixing the phenylsilane compound represented by the general formula (1) in the nonaqueous electrolytic solution is not limited, and the phenylsilane compound may be mixed in the nonaqueous electrolytic solution together with the lithium salt, the silyl ester compound, and the organic solvent. For example, the nonaqueous electrolytic solution may be prepared by mixing any one of the lithium salt, the silyl ester compound, and the organic solvent with the phenylsilane compound and then mixing the other materials, or may be prepared by mixing a material other than the lithium salt, the silyl ester compound, and the organic solvent with the phenylsilane compound and then mixing the lithium salt, the silyl ester compound, and the organic solvent.
[ lithium salt containing fluorine atom ]
The method for suppressing the decomposition of a silyl ester compound of the present invention is a method for suppressing the decomposition of a silyl ester compound in a nonaqueous electrolytic solution in which a lithium salt containing a fluorine atom and the silyl ester compound are dissolved in an organic solvent. The lithium salt containing a fluorine atom is a component to be mixed as an electrolyte of the nonaqueous electrolytic solution. The lithium salt containing a fluorine atom includes LiPF6、LiBF4、LiPO2F2、LiAsF6、Li2SiF6、LiSbF6、LiN(SO2F)2、LiOSO2Rf { wherein Rf represents a fluorocarbon group }, and LiN (SO)2Rf)2{ wherein Rf represents a fluorocarbon group }, and LiPFa(Rf)6-a{ wherein Rf represents a fluorocarbon group, and a represents a number of 0 to 5 }, and the like. The lithium salt containing a fluorine atom to be used as the nonaqueous electrolytic solution to which the phenylsilane compound of the present invention is applied is preferably LiPF because excellent battery performance can be obtained, while decomposition of the silyl ester compound is likely to occur, and the decomposition-inhibiting effect by the phenylsilane compound of the present invention is large6、LiBF4、Li2SiF6、LiSbF6、LiN(SO2F)2、LiOSO2CF3、LiN(SO2CF3)2、LiN(SO2CF2CF3)2Further preferably LiPF6、LiBF4、LiN(SO2F)2、LiOSO2CF3、LiN(SO2CF3)2、LiN(SO2CF2CF3)2Most preferably LiPF6、LiBF4、LiN(SO2CF3)2。
The electrolyte in the nonaqueous electrolytic solution may contain an electrolyte other than the lithium salt containing a fluorine atom, but since the decomposition of the silyl ester compound becomes difficult to occur and the decomposition-suppressing effect by the phenylsilane compound of the present invention becomes difficult to obtain when the proportion of the lithium salt containing a fluorine atom in the electrolyte is low, the proportion of the lithium salt containing a fluorine atom is preferably at least 20 mol% with respect to the entire electrolyte. Examples of the electrolyte other than the lithium salt containing a fluorine atom include LiClO4LiCl, LiBr, etc. The concentration of the electrolyte in the nonaqueous electrolytic solution is preferably 0.1 to 7mol/L, and more preferably 0.5 to 1.8 mol/L. When the electrolyte concentration is in this range, the safety can be improved, and a battery having high reliability and contributing to reduction of environmental load can be obtained.
[ silyl ester Compound ]
Examples of the silyl ester compound include a carboxylic acid silyl ester compound, a sulfuric acid silyl ester compound, a sulfonic acid silyl ester compound, a phosphorous acid silyl ester compound, a phosphoric acid silyl ester compound, and a boric acid silyl ester compound. The content of the silyl ester compound in the nonaqueous electrolytic solution is preferably 0.01 to 7% by mass, more preferably 0.1 to 5% by mass, and most preferably 0.3 to 3% by mass.
Examples of the carboxylic acid silyl ester compound include compounds represented by the following general formula (2).
[ chemical formula 6]
(in the formula, R11、R12And R13Independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and X2Represents a direct bond or a group having a valence of n, and n represents a number of 1 to 4. )
In the general formula (2), R11、R12And R13(hereinafter also referred to as "R")11~R13". ) Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms. Examples of such a group include R of the general formula (1)6~R10The groups exemplified in (1). As R11~R13From the viewpoint of easy availability of industrial raw materials, methyl or phenyl is preferred, and methyl is more preferred.
X2Represents a group having a valence of n, and n represents a number of 1 to 4.
As X when n is 12In addition to X when m is 1 in the general formula (1)1Examples of the groups listed in the aboveIn addition to the same groups, a heterocyclic group having 2 to 12 carbon atoms and having a valence of 1 may be mentioned. The heterocyclic group having 2 to 12 carbon atoms and having a valence of 1 is preferably a group having 3 to 9 carbon atoms, and examples thereof include a group having a valence of 1 derived from a heterocyclic ring such as a pyrrole ring, furan ring, thiophene ring, pyrrolidine ring, tetrahydrofuran ring, tetrahydrothiophene ring, piperidine ring, tetrahydropyran ring, tetrahydrothiopyran ring, imidazole ring, pyrazole ring, oxazole ring, thiazole ring, imidazoline ring, pyrazine ring, morpholine ring, or thiazine ring, or a polynuclear heterocyclic ring of these heterocyclic rings and benzene rings.
In the case where n is 1, X2Preferably an alkyl group having 2 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, a cycloalkyl group having 6 to 8 carbon atoms, an aryl group having 6 to 10 carbon atoms, an aralkyl group having 7 to 9 carbon atoms or a heterocyclic group having 2 to 5 carbon atoms, and particularly preferably an alkenyl group having 2 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms or an aralkyl group having 7 to 9 carbon atoms.
As X when n is 22In addition to X when m is 2 in the general formula (1)1Examples of the (C) group include, in addition to the same groups as those listed above, a direct bond, an alkylenediyl group having 2 to 10 carbon atoms, and a heterocyclic group having 2 to 12 carbon atoms and having a valence of 2. Examples of the alkenediyl group having 2 to 10 carbon atoms include ethylene-1, 1-diyl, ethylene-1, 2-diyl, propylene-1, 3-diyl, propylene-2, 3-diyl, 1-butene-1, 2-diyl, 1-butene-1, 3-diyl, 1-butene-1, 4-diyl, 2-pentene-1, 5-diyl, and 3-hexene-1, 6-diyl. Examples of the heterocyclic group having 2-12 carbon atoms and having a valence of 2 include X when n is 12The 2-valent group derived from the heterocyclic ring or polynuclear heterocyclic ring mentioned in (1) is preferably a group having 3 to 9 carbon atoms.
In the case where n is 2, X2Preferably a C2-6 alkanediyl group, a C2-6 alkenediyl group, a group represented by the general formula (6) or (7), a 2-valent C2-5 heterocyclic group, particularly preferably a C2-6 alkanediyl group, a C2-6 alkenediyl group, a C2-valent C2-5 heterocyclic group2 to 5 heterocyclic groups. As mentioned above, the methylene group in the alkanediyl group may be substituted by-S-or-O-.
As X when n is 32In addition to X when m is 3 in the general formula (1)1Examples of the (C) group include heterocyclic groups having 2 to 12 carbon atoms and having a valence of 3 in addition to the same groups as those listed above. Examples of the heterocyclic group having 2 to 12 carbon atoms and having a valence of 3 include X when n is 12The heterocyclic or polynuclear heterocyclic group having a valence of 3 in the above-mentioned groups preferably has 3 to 9 carbon atoms.
As X when n is 42X is 1 to 3 inclusive of n2The corresponding group having a valence of 4.
In the case where n is 3, X2Preferably an alkanetriyl group having 3 to 6 carbon atoms, a group represented by general formula (8) or (9), or a heterocyclic group having 2 to 5 carbon atoms and having 3 valence, and particularly preferably a group represented by general formula (9) or a heterocyclic group having 2 to 5 carbon atoms and having 3 valence.
In the case where n is 4, X2Preferably an alkanetetrayl group having 4 to 6 carbon atoms, an aromatic ring-containing group having 6 to 10 carbon atoms and having 4 valence, or a heterocyclic group having 2 to 5 carbon atoms and having 4 valence.
In the present specification, when a "heterocyclic group-containing group having 2 to 12 carbon atoms" is referred to, the "carbon number is 2 to 12" herein does not specify the carbon number of only one of the heterocyclic groups but specifies the carbon number of the entire heterocyclic group-containing group.
The compound represented by the general formula (2) may be a silyl ester of a carboxylic acid compound represented by the following general formula (2a), and the compound represented by the general formula (2) can be obtained by silyl esterification of the carboxyl group of the carboxylic acid compound represented by the general formula (2a) by a known method.
[ chemical formula 7]
(in the formula, X2And n is as defined for formula (1). )
In the carboxylic acid compound represented by the general formula (2a), examples of monocarboxylic acids in which n is 1 include acetic acid, propionic acid, butyric acid, valeric acid, isovaleric acid, caproic acid, enanthic acid, caprylic acid, acrylic acid, methacrylic acid, crotonic acid, benzoic acid, methylbenzoic acid, 4-tert-butylbenzoic acid, naphthalenecarboxylic acid, phenylacetic acid, naphthylacetic acid, 4-methoxybenzoic acid, 2-thiophenecarboxylic acid, picolinic acid, and nicotinic acid.
Examples of the dicarboxylic acid in which n is 2 include dicarboxylic acids such as oxalic acid, malonic acid, succinic acid, maleic acid, fumaric acid, glutaric acid, adipic acid, azelaic acid, sebacic acid, muconic acid, dihydromuconic acid, acetylene dicarboxylic acid, 4-cyclohexene-1, 2-dicarboxylic acid, 1, 2-cyclohexanedicarboxylic acid, 1, 4-cyclohexanedicarboxylic acid, phthalic acid, isophthalic acid, terephthalic acid, 2 ' -thiodiacetic acid, ethylenedithiodiacetic acid, 3 ' -thiodipropionic acid, 3 ' -dithiodipropionic acid, 2, 5-thiophenedicarboxylic acid, 3, 4-thiophenedicarboxylic acid, adamantanedicarboxylic acid, 2, 5-furandicarboxylic acid, and dipicolinic acid.
Examples of the tricarboxylic acid in which n is 3 include propane-1, 2, 3-tricarboxylic acid, pentane-1, 3, 5-tricarboxylic acid, benzene-1, 2, 3-tricarboxylic acid, benzene-1, 2, 4-tricarboxylic acid, benzene-1, 3, 5-tricarboxylic acid, thiophene-2, 3, 5-tricarboxylic acid, 1,3, 5-trithiane-2, 4, 6-tricarboxylic acid, and the like.
Examples of the tetracarboxylic acid in which n is a number of 4 include dodecane-1, 1,12, 12-tetracarboxylic acid, cyclopentane-1, 2,3, 4-tetracarboxylic acid, benzene-1, 2,4, 5-tetracarboxylic acid, tetrahydrofuran-2, 3,4, 5-tetracarboxylic acid, and thiophene-2, 3,4, 5-tetracarboxylic acid.
Examples of the silyl sulfate compound and the silyl sulfonate compound include compounds represented by the following general formula (3).
[ chemical formula 8]
(in the formula, R14、R15、R16And R17Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and p represents a number of 0 or 1. )
In the general formula (3), R14、R15、R16And R17(hereinafter also referred to as "R")14~R17". ) Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms. Examples of such a group include R of the general formula (1)6~R10The groups exemplified in (1). p represents a number of 0 or 1, and when p is a number of 0, the compound represented by the general formula (3) is a silyl sulfate compound, and when p is a number of 1, it is a silyl sulfonate compound.
As R14In view of easy availability of industrial raw materials, an alkyl group having 1 to 4 carbon atoms or an aryl group having 6 to 10 carbon atoms is preferable. As R15、R16And R17From the viewpoint of easy availability of industrial raw materials, an alkyl group having 1 to 4 carbon atoms or a phenyl group is preferable, a methyl group or a phenyl group is more preferable, and a methyl group is particularly preferable.
When p in the general formula (3) is a number of 0, that is, when the compound represented by the general formula (3) is a silyl sulfate compound, preferable examples of the compound include bis (trimethylsilyl) sulfate, bis (dimethylphenylsilyl) sulfate, bis (methyldiphenylsilyl) sulfate, bis (triphenylsilyl) sulfate, and the like.
When p in the general formula (3) is a number of 1, that is, when the compound represented by the general formula (3) is a silyl sulfonate compound, preferable compounds include trimethylsilyl methanesulfonate, dimethylphenylsilyl methanesulfonate, trimethylsilyl benzenesulfonate, trimethylsilyl toluenesulfonate, and the like.
Examples of the silyl phosphite compound and the silyl phosphate compound include compounds represented by the following general formula (4).
[ chemical formula 9]
(in the formula, R18、R19、R20、R21、R22、R23、R24、R25And R26Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and q represents a number of 0 or 1. )
In the general formula (4), R18、R19、R20、R21、R22、R23、R24、R25And R26(hereinafter also referred to as "R")18~R26") independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms. Examples of such a group include R of the general formula (1)6~R10The groups exemplified in (1). As R18~R26From the viewpoint of easy availability of industrial raw materials, an alkyl group having 1 to 4 carbon atoms or a phenyl group is preferable, a methyl group or a phenyl group is more preferable, and a methyl group is particularly preferable. q represents a number of 0 or 1, and when q is a number of 0, the compound represented by the general formula (4) is a silyl phosphite compound, and when q is a number of 1, it is a silyl phosphate compound.
When q in the general formula (4) is a number of 0, that is, when the compound represented by the general formula (4) is a silyl phosphite compound, preferable compounds include tris (trimethylsilyl) phosphite, tris (dimethylphenylsilyl) phosphite, tris (methyldiphenylsilyl) phosphite, tris (triphenylsilyl) phosphite, and the like.
When q in the general formula (4) is a number of 1, that is, when the compound represented by the general formula (4) is a silyl phosphate compound, preferable examples of the compound include tris (trimethylsilyl) phosphate, tris (dimethylphenylsilyl) phosphate, tris (methyldiphenylsilyl) phosphate, and tris (triphenylsilyl) phosphate.
Examples of the silyl borate compound include compounds represented by the following general formula (5).
[ chemical formula 10]
(in the formula, R27、R28、R29、R30、R31、R32、R33、R34And R35Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms. )
In the general formula (5), R27、R28、R29、R30、R31、R32、R33、R34And R35(hereinafter also referred to as "R")27~R35") independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms. Examples of such a group include R of the general formula (1)6~R10The groups exemplified in (1). As R27~R35From the viewpoint of easy availability of industrial raw materials, an alkyl group having 1 to 4 carbon atoms or a phenyl group is preferable, a methyl group or a phenyl group is more preferable, and a methyl group is particularly preferable.
Preferable examples of the compound represented by the general formula (5) include tris (trimethylsilyl) borate, tris (dimethylphenylsilyl) borate, tris (methyldiphenylsilyl) borate, and tris (triphenylsilyl) borate.
[ organic solvent ]
As the organic solvent used in the nonaqueous electrolytic solution in the method for suppressing decomposition of a silyl ester compound of the present invention, 1 kind of organic solvent generally used in nonaqueous electrolytic solutions may be used or 2 or more kinds may be used in combination. Specific examples thereof include carbonate solvents, ester solvents, ether solvents, sulfoxide solvents, and the like.
Examples of the carbonate-based solvent include saturated chain carbonate compounds such as dimethyl carbonate, ethyl methyl carbonate, diethyl carbonate, ethyl butyl carbonate, methyl t-butyl carbonate, diisopropyl carbonate, and t-butyl propyl carbonate; saturated cyclic carbonate compounds such as ethylene carbonate, 1-fluoroethylene carbonate, 1, 2-propylene carbonate, 1, 3-propylene carbonate, 1, 2-butylene carbonate, 1, 3-butylene carbonate, 1-dimethylethylene carbonate, 1, 2-bis (methoxycarbonyloxy) ethane, 1, 2-bis (ethoxycarbonyloxy) ethane and 1, 2-bis (ethoxycarbonyloxy) propane, and the like.
Examples of the ester solvent include saturated cyclic ester compounds such as γ -butyrolactone, γ -valerolactone, γ -caprolactone, δ -caprolactone and δ -octalactone; and saturated chain ester compounds such as methyl formate, ethyl formate, methyl acetate, ethyl acetate, propyl acetate, isobutyl acetate, butyl acetate, methyl propionate, ethyl propionate, methyl butyrate, methyl isobutyrate, methyl pivalate, ethyl pivalate, methyl malonate, ethyl malonate, methyl succinate, ethyl succinate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethylene glycol diacetyl, and propylene glycol diacetyl.
Examples of the ether solvent include chain ether compounds such as dimethoxyethane, ethoxymethoxyethane, diethoxyethane, ethylene glycol bis (trifluoroethyl) ether, propylene glycol bis (trifluoroethyl) ether, ethylene glycol bis (trifluoromethyl) ether, and diethylene glycol bis (trifluoroethyl) ether; cyclic ether compounds such as tetrahydrofuran, dioxolane and dioxane.
Examples of the sulfoxide-based solvent include dimethyl sulfoxide, diethyl sulfoxide, dipropyl sulfoxide, diphenyl sulfoxide, and thiophene. Examples of the sulfone-based solvent include dimethyl sulfone, diethyl sulfone, dipropyl sulfone, diphenyl sulfone, sulfolane (also referred to as tetramethylene sulfone), 3-methylsulfolane, 3, 4-dimethylsulfolane, 3, 4-diphenylmethylsulfolane, sulfolene, 3-methylsulfolane, 3-ethylsulfolene and 3-bromomethylsulfolane. Examples of the amide solvent include N-methylpyrrolidone, dimethylformamide, and dimethylacetamide. In addition, acetonitrile, propionitrile, nitromethane, or a derivative thereof may be used as the organic solvent.
In the method for suppressing decomposition of a silyl ester compound of the present invention, decomposition of the silyl ester compound can be suppressed efficiently when the moisture content in the nonaqueous electrolytic solution is 1000ppm by mass or less. When the moisture content is more than 1000 mass ppm, it becomes difficult to suppress the decomposition of the silyl ester compound. The water content in the nonaqueous electrolytic solution is preferably 500 mass ppm or less, and more preferably 300 mass ppm or less. The moisture content of the nonaqueous electrolytic solution can be measured by karl fischer titration or the like. The moisture content of the nonaqueous electrolytic solution may be measured at any time as long as the nonaqueous electrolytic solution contains a lithium salt containing a fluorine atom, a silyl ester compound, an organic solvent, and a phenylsilane compound represented by the general formula (1).
The moisture in the nonaqueous electrolytic solution causes decomposition of the silyl ester compound, but the moisture is not only mixed in from the raw material of the nonaqueous electrolytic solution, but also mixed in at the time of production of the nonaqueous electrolytic solution or at the time of assembly of the battery. Therefore, in the case of producing a nonaqueous electrolytic solution, it is not sufficient to use only a raw material having a small water content, and it is necessary to produce the nonaqueous electrolytic solution in an inert gas atmosphere, a low-humidity atmosphere, or the like, and to perform a sufficient dehydration treatment after the production. In addition, the battery needs to be mounted in a low-humidity atmosphere (for example, in a dry room) during the mounting of the battery, and a large cost is required for setting the low-humidity atmosphere. According to the method for suppressing decomposition of a silyl ester compound of the present invention, the cost required for dehydration treatment of a nonaqueous electrolytic solution or the cost required for a low humidity atmosphere can be reduced.
In order to set the water content in the nonaqueous electrolytic solution to 1000ppm or less, it is sufficient to blow an inert gas after drying into the nonaqueous electrolytic solution, as described in examples described later, or the like. As the inert gas, nitrogen gas can be cited.
In the method for suppressing decomposition of a silyl ester compound of the present invention, when the moisture content in the nonaqueous electrolytic solution is higher than a certain value, the silyl ester compound is likely to be decomposed, and therefore the phenylsilane compound of the present invention is likely to further exhibit the effect of suppressing decomposition. Therefore, in the method for suppressing decomposition of the silyl ester compound of the present invention, the moisture content of the nonaqueous electrolytic solution is preferably 5 ppm by mass or more, more preferably 10 ppm by mass or more, and still more preferably 20 ppm by mass or more. In a secondary battery such as a lithium ion secondary battery, a laminate of a heat-fusible film and an aluminum foil is used as an outer covering member in order to prevent moisture from penetrating into the nonaqueous electrolytic solution from the outer covering portion, but the moisture may not be completely blocked and may slowly penetrate into the nonaqueous electrolytic solution from the outer covering portion. Therefore, even when the moisture in the nonaqueous electrolytic solution of the assembled secondary battery is not contained so as to immediately cause the decomposition of the silyl ester compound, it is preferable to add 0.1 to 10 mass% of the phenylsilane compound represented by the general formula (1) to the nonaqueous electrolytic solution in order to prevent the moisture from entering the exterior package.
The nonaqueous electrolytic solution obtained by the method for suppressing decomposition of a silyl ester compound of the present invention can be suitably used for conventionally known nonaqueous electrolytic solution secondary batteries, particularly lithium ion secondary batteries.
As the positive electrode, a sheet-like positive electrode is used which is obtained by coating a current collector with a slurry of a positive electrode active material, a binder and a conductive material in an organic solvent or water and drying the coating.
As the positive electrode active material, the followingFor example, a known positive electrode active material capable of inserting and extracting lithium as an electrode reactant can be used for a lithium ion secondary battery. Examples of the known positive electrode active material include a lithium transition metal complex oxide, a lithium-containing transition metal phosphate compound, a metal oxide, a metal sulfide, a metal halide, a metal interlayer compound, and sulfur, and they may be used in combination. As the transition metal of the lithium transition metal composite oxide, vanadium, titanium, chromium, manganese, iron, cobalt, nickel, copper, and the like are preferable. Specific examples of the lithium transition metal composite oxide include LiCoO2Lithium cobalt composite oxide, LiNiO, etc2Lithium nickel composite oxide and LiMnO2、LiMn2O4、Li2MnO3And lithium manganese complex oxides, and those obtained by substituting a part of transition metal atoms that are the main components of these lithium transition metal complex oxides with another metal such as aluminum, titanium, vanadium, chromium, manganese, iron, cobalt, lithium, nickel, copper, zinc, magnesium, gallium, and zirconium. Specific examples of the substance obtained by substitution include, for example, Li1.1Mn1.8Mg0.1O4、Li1.1Mn1.85Al0.05O4、LiNi0.5Co0.2Mn0.3O2、LiNi0.8Co0.1Mn0.1O2、LiNi0.5Mn0.5O2、LiNi0.80Co0.17Al0.03O2、LiNi0.80Co0.15Al0.05O2、LiNi1/3Co1/ 3Mn1/3O2、LiNi0.6Co0.2Mn0.2O2、LiMn1.8Al0.2O4、LiMn1.5Ni0.5O4、Li2MnO3-LiMO2And (M ═ Co, Ni, Mn) and the like. The transition metal of the lithium-containing transition metal phosphate compound is preferably vanadium, titanium, manganese, iron, cobalt, nickel, or the like, and specific examples thereof include LiFePO4Iso-phosphates, LiCoPO4Cobalt phosphates, phosphorus to be the lithium transition metalAnd those obtained by substituting a part of transition metal atoms in the main body of the acid compound with another metal such as aluminum, titanium, vanadium, chromium, manganese, iron, cobalt, lithium, nickel, copper, zinc, magnesium, gallium, zirconium, niobium, and the like. The surface of the positive electrode active material may be covered with a conductive material described later as necessary.
Examples of the binder include Polytetrafluoroethylene (PTFE), polyvinylidene fluoride (PVDF), ethylene-propylene-diene copolymer (EPDM), styrene-butadiene rubber (SBR), acrylonitrile butadiene rubber (NBR), styrene-isoprene copolymer, polymethyl methacrylate, polyacrylate, polyvinyl alcohol (PVA), carboxymethyl cellulose (CMC), Methyl Cellulose (MC), starch, polyvinyl pyrrolidone, Polyethylene (PE), polypropylene (PP), polyethylene oxide (PEO), Polyimide (PI), polyamide imide (PAI), Polyacrylonitrile (PAN), polyvinyl chloride (PVC), polyacrylic acid, and polyurethane. The amount of the binder used is usually about 1 to 50% by mass, preferably 2 to 20% by mass, based on the positive electrode active material.
Examples of the conductive material include carbon materials such as fine particles of graphite, natural graphite, artificial graphite, carbon black, acetylene black, ketjen black, channel black, furnace black, lamp black, thermal black, carbon nanotubes, vapor-phase carbon fibers, graphene, and needle coke; metal powders such as aluminum powder, nickel powder, titanium powder, and the like; conductive metal oxides such as zinc oxide and titanium oxide; la2S3、Sm2S3、Ce2S3、TiS2Etc. sulfur-containing conductive materials, etc. The amount of the conductive material used is usually about 0.5 to 30% by mass, preferably 1 to 15% by mass, based on the positive electrode active material.
As the solvent for slurrying, an organic solvent or water in which the binder is dissolved is used. Examples of the organic solvent include N-methylpyrrolidone, dimethylformamide, dimethylacetamide, methyl ethyl ketone, cyclohexanone, methyl acetate, methyl acrylate, diethyltriamine, N-dimethylaminopropylamine, ethylene oxide, and tetrahydrofuran. The amount of the solvent used is usually about 20 to 400 mass%, preferably 30 to 200 mass%, based on the positive electrode active material.
As the current collector of the positive electrode, aluminum, stainless steel, nickel-plated steel, or the like is generally used.
As the negative electrode, a sheet-like negative electrode obtained by applying a current collector with a substance obtained by slurrying a negative electrode active material, a binder, and a conductive material with an organic solvent or water and drying the resultant is generally used.
Examples of the negative electrode active material include carbonaceous materials, lithium alloys, silicon alloys, silicon oxide, tin alloys, tin oxide, phosphorus, germanium, indium, copper oxide, antimony sulfide, titanium oxide, iron oxide, manganese oxide, cobalt oxide, nickel oxide, lead oxide, ruthenium oxide, tungsten oxide, and zinc oxide, and further include LiVO2、Li2VO4、Li4Ti5O12And composite oxides, conductive polymers, and the like. The carbonaceous material is not particularly limited, and examples thereof include crystalline carbon such as natural graphite, artificial graphite, fullerene, graphene, broken graphite fibers, carbon nanotubes, graphite whiskers, highly oriented pyrolytic graphite, kish graphite, hard graphitizable carbon, easy graphitizable carbon, petroleum coke, coal coke, petroleum pitch carbide, coal pitch carbide, phenol resin, crystalline cellulose resin carbide, and the like, and carbon materials obtained by partially carbonizing these, furnace black, acetylene black, pitch carbon fibers, PAN carbon fibers, and the like.
Examples of the binder, the conductive material, and the solvent to be slurried include the same ones as those of the positive electrode. The amount of the binder used is usually about 0.1 to 30% by mass, preferably about 0.5 to 15% by mass, based on the negative electrode active material. The amount of the solvent used is usually about 25 to 400 mass%, preferably 30 to 200 mass%, based on the negative electrode active material.
As the current collector of the negative electrode, copper, nickel, stainless steel, nickel-plated steel, or the like is generally used.
In the nonaqueous electrolyte secondary battery of the present invention, a separator is used between the positive electrode and the negative electrode, and a generally used polymer microporous membrane can be used as the separator without particular limitation. Examples of the membrane include membranes formed of a polymer compound or a derivative thereof, a copolymer or a mixture thereof mainly composed of polyethylene, polypropylene, polyvinylidene fluoride, polyvinylidene chloride, polyacrylonitrile, polyacrylamide, polytetrafluoroethylene, polysulfone, polyethersulfone, polycarbonate, polyamide, polyimide, polyethers such as polyethylene oxide and polypropylene oxide, various celluloses such as carboxymethyl cellulose and hydroxypropyl cellulose, poly (meth) acrylic acid and various esters thereof, and the like. These films may be used alone, or these films may be stacked to form a multilayer film. Further, in these films, various additives may be used, and the kind or content thereof is not particularly limited. Among these films, a film made of polyethylene, polypropylene, polyvinylidene fluoride, or polysulfone is preferably used for the nonaqueous electrolyte secondary battery of the present invention. These membranes are made microporous so that ions can easily permeate through the membranes by permeation of the electrolyte. In addition, for the purpose of improving safety, it may be coated with ceramics such as alumina or silica.
In the nonaqueous electrolyte secondary battery of the present invention, a phenolic antioxidant, a phosphorus antioxidant, a thioether antioxidant, a hindered amine compound, or the like may be added to the electrode material, the nonaqueous electrolyte, and the separator for the purpose of further improving safety.
The shape of the nonaqueous electrolyte secondary battery of the present invention including the above-described configuration is not particularly limited, and the nonaqueous electrolyte secondary battery may be formed into various shapes such as a coin shape, a cylinder shape, a square shape, a laminate shape, and the like. Fig. 1 is a view showing an example of a coin-type battery of a nonaqueous electrolyte secondary battery of the present invention, and fig. 2 and 3 are views showing an example of a cylinder-type battery.
In a coin-type nonaqueous electrolyte secondary battery 10 shown in fig. 1,1 is a positive electrode capable of releasing lithium ions, 1a is a positive electrode current collector, 2 is a negative electrode made of a carbonaceous material capable of inserting and releasing lithium ions released from the positive electrode, 2a is a negative electrode current collector, 3 is the nonaqueous electrolyte of the present invention, 4 is a positive electrode case made of stainless steel, 5 is a negative electrode case made of stainless steel, 6 is a gasket made of polypropylene, and 7 is a separator made of polyethylene.
In the cylindrical nonaqueous electrolyte secondary battery 10' shown in fig. 2 and 3, 11 is a negative electrode, 12 is a negative electrode current collector, 13 is a positive electrode, 14 is a positive electrode current collector, 15 is the nonaqueous electrolyte of the present invention, 16 is a separator, 17 is a positive electrode terminal, 18 is a negative electrode terminal, 19 is a negative electrode, 20 is a negative electrode lead, 21 is a positive electrode, 22 is a positive electrode lead, 23 is a case, 24 is an insulating plate, 25 is a gasket, 26 is a safety valve, and 27 is a PTC element.
Examples
The present invention will be specifically described below with reference to examples and comparative examples, which do not limit the scope of the present invention. In the examples, "parts" or "%" are by mass unless otherwise specified.
All the operations in the examples were carried out in a drying chamber, and the moisture was measured using a Karl Fischer moisture meter.
In the electrolyte a: LiPF is dissolved at a concentration of 0.8mol/L in a mixed solvent containing 30 vol% of ethylene carbonate, 40 vol% of ethylmethyl carbonate, and 30 vol% of dimethyl carbonate6LiN (SO) was dissolved at a concentration of 0.2mol/L2CF3)2. Then, in order to reduce the moisture content of the electrolyte, dry nitrogen gas was blown into the electrolyte at 20 ℃ for 24 hours at 3L/min through a glass capillary tube, and further, the electrolyte was heated to 70 ℃ and dry nitrogen gas was blown at 3L/min according to the method described in WO 99/34471. The moisture content of the electrolyte a obtained in this manner was 1.3 mass ppm.
In the electrolyte B: in a mixed solvent containing 50 vol% of ethylene carbonate and 50 vol% of diethyl carbonate, LiBF was dissolved at a concentration of 1.0mol/L4An electrolyte solution is prepared. Thereafter, the same operation as in the case of the electrolyte solution a was performed, thereby obtaining an electrolyte solution B. The moisture content of the electrolyte B was 1.8 mass ppm.
To the electrolyte solution a or the electrolyte solution B, the following silicon compound and silyl ester compound were added according to the formulation shown in table 1, and the water content was adjusted to prepare electrolyte solutions of examples 1 to 25 and comparative examples 1 to 18. The adjustment of the moisture content is performed by blending the electrolyte solution in which the moisture content is reduced and the electrolyte solution before the moisture content is reduced.
< silicon Compound >
A1: trimethylphenylsilane
A2: 1, 4-bis (trimethylsilyl) benzene
A3: dimethyl diphenylsilane
A' 1: triethylsilane
A' 2: 1,1,3,3, 3-hexamethyldisilazane
A' 3: dimethoxydimethylsilane
< silyl ester Compound >
B1: trimethylsilyl methacrylate
B2: succinic acid bis (trimethylsilyl) ester
B3: fumaric acid bis (trimethylsilyl) ester
B4: 2, 2' -Thiodiacetic acid bis (trimethylsilyl) ester
B5: 2, 5-Thiophenedicarboxylic acid bis (trimethylsilyl) ester
B6: benzene-1, 2, 4-tricarboxylic acid tris (trimethylsilyl) ester
B7: bis (trimethylsilyl) sulfate
B8: benzenesulfonic acid trimethylsilyl ester
B9: phosphoric acid tris (trimethylsilyl) ester
B10: phosphorous acid tris (trimethylsilyl) ester
B11: boric acid tris (trimethylsilyl) ester
[ storage stability test ]
The storage stability of the electrolyte solution was evaluated by measuring the residual rate of the silyl ester compound by the following method. It can be said that the higher the survival rate, the higher the storage stability.
[ storage stability test method ]
The electrolyte was placed in a stainless steel container under an argon atmosphere, sealed, and stored in a thermostatic bath at 45 ℃ to obtain an electrolyte after 3 weeks of storage.
Comprising silyl phosphate compounds or phosphorous acidElectrolytic solution passing measurement of silyl ester Compound31P-NMR to calculate the residual ratio, and the electrolyte solution containing the carboxylic acid silyl ester compound, the sulfuric acid silyl ester compound, and the sulfonic acid silyl ester compound was measured1The residual ratio was calculated by H-NMR.
[ utilization of31Method of P-NMR
The electrolyte solution to which triphenylphosphine was added as a reference substance was measured under the following conditions31P-NMR was carried out to determine the ratio of the area of the peak derived from the phosphosilyl ester compound or the phosphosilyl ester compound to the area of the peak derived from the reference substance. The ratio (%) of the area of the peak after the storage test to the area of the peak before the storage test was defined as the residual ratio.
A measuring device: nuclear magnetic resonance device, model number ECA-600, manufactured by Nippon electronic Co., Ltd
Solvent: deuterated chloroform
Reference substance: triphenylphosphine (-6.0ppm)
[ utilization of1Method of H-NMR
The electrolyte solution was measured under the following conditions1H-NMR was carried out to determine the ratio of the area of the peak derived from the trimethylsilyl group of the silyl ester compound to the area of the peak derived from the ethylene carbonate in the solvent. The ratio (%) of the area of the peak after the storage test to the area of the peak before the storage test was defined as the residual ratio.
A measuring device: nuclear magnetic resonance device, model number ECA-600, manufactured by Nippon electronic Co., Ltd
Solvent: deuterated chloroform
Reference substance: ethylene carbonate (4.58ppm)
< addition of test method >
[ Charge-discharge cycle test ]
In the examples and comparative examples, nonaqueous electrolyte secondary batteries (lithium ion secondary batteries) were produced according to the following production steps.
[ manufacture of Positive electrode ]
LiNi was added as an active material in an amount of 90 parts by mass1/3Co1/3Mn1/3O2(NCM111: manufactured by japan chemical industry), 5 parts by mass of acetylene black (AB: denka, product), and 5 parts by mass of polyvinylidene fluoride (PVDF: KUREHA) was dispersed in 120 parts by mass of N-methyl-2-pyrrolidone (NMP) to prepare a slurry. The slurry was applied to an aluminum current collector, dried, and then pressure-molded. Then, the electrode was cut into a predetermined size to prepare a disk-shaped positive electrode. The electrode capacity of the positive electrode was set to 2.5mAh/cm2。
[ production of cathode ]
96 parts by mass of artificial graphite (MAG, manufactured by Hitachi chemical Co., Ltd.) as an active material, 1 part by mass of acetylene black (AB, manufactured by Denka) as a conductive assistant, 1.5 parts by mass of a 40% by mass aqueous dispersion of SBR (manufactured by Zeon, Japan) as a binder, and 1.5 parts by mass of sodium carboxymethylcellulose (CMC, manufactured by Daicel FineChem) as a thickener were dispersed in 120 parts by mass of water to prepare a slurry. The slurry was applied to a copper current collector, dried, and then pressure-molded. Then, the electrode was cut into a predetermined size to prepare a disk-shaped negative electrode. The electrode capacity of the negative electrode was set to 2.8mAh/cm2。
[ Assembly of Battery ]
The obtained disk-shaped positive electrode and disk-shaped negative electrode were held in a case with a microporous film made of polyethylene having a thickness of 25 μm serving as a separator interposed therebetween. Then, each nonaqueous electrolyte prepared previously was poured into a case, and the case was sealed and sealed to prepare nonaqueous electrolyte secondary batteries of examples and comparative examples (Coin type with a thickness of 3.2 mm).
[ Charge-discharge cycle test method ]
The nonaqueous electrolyte secondary battery was placed in a thermostatic bath at 25 ℃ and charged at a current of 0.5mA/cm2(current value corresponding to 0.2C) was charged at constant current until 4.2V and discharged at a current of 0.5mA/cm2(current value corresponding to 0.2C) constant current dischargeThe operation was performed 5 times until the voltage reached 3.0V. Thereafter, the sample was transferred to a constant temperature bath at 45 ℃ and charged at a charging current of 2.5mA/cm2(current value corresponding to 1C) was charged at constant current until 4.2V and discharged at a current of 2.5mA/cm2(corresponding to a current value of 1C) the operation of the cycle until the constant current discharge was completed to 3.0V was performed 100 times. As shown in the following formula, the discharge capacity maintenance rate (%) was determined at a rate of the discharge capacity after 100 cycles of the test with the initial discharge capacity at 1C being 100.
The discharge capacity maintenance rate (%) (discharge capacity at 100 th cycle (1C))/(discharge capacity at 1 st cycle (1C)) ] × 100
TABLE 1
The number in () in the table is the content (unit: mass%) of the silicon compound or silyl ester compound in the electrolytic solution.
From the results of the storage stability test, the residual rate of the silyl ester compound was high in the electrolyte solution containing the phenylsilane compound represented by the general formula (1) of the present invention, but the residual rate was decreased in comparative examples 11 and 16 in which the water content exceeded 1000 ppm.
When the storage stability test and the charge-discharge cycle test were compared, it was found that the discharge capacity maintaining rate was high in the battery using the electrolyte solution having a high silyl ester compound remaining rate in the storage stability test, and the discharge capacity was maintained as the silyl ester compound remained.
Industrial applicability
According to the present invention, in the nonaqueous electrolytic solution obtained by dissolving the lithium salt containing a fluorine atom and the silyl ester compound in the organic solvent, even when some moisture is present, the decomposition of the silyl ester compound can be suppressed, and the storage stability can be improved.
Claims (7)
1. A method for suppressing decomposition of a silyl ester compound, which is a method for suppressing decomposition of a silyl ester compound in a nonaqueous electrolytic solution containing a lithium salt containing a fluorine atom, a silyl ester compound selected from the group consisting of a carboxylic acid silyl ester compound, a sulfuric acid silyl ester compound, a sulfonic acid silyl ester compound, a phosphorous acid silyl ester compound, a phosphoric acid silyl ester compound and a boric acid silyl ester compound, and an organic solvent, wherein,
a phenylsilane compound represented by the following general formula (1) is mixed in the nonaqueous electrolytic solution in an amount of 0.1-10 mass%, and the water content of the nonaqueous electrolytic solution is set to be less than 1000 mass ppm,
in the formula, R1、R2、R3、R4And R5Each independently represents a hydrogen atom, a halogen atom, a nitrile group, a nitro group, an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms, an aralkyl group having 7 to 12 carbon atoms, an oxyalkyl group having 1 to 12 carbon atoms, an acyl group having 1 to 12 carbon atoms or-SiR8R9R10A group represented by, R6、R7、R8、R9And R10Independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and X1Represents a hydrocarbon group having a valence of m, and m represents a number of 1 to 3.
2. The method for suppressing decomposition of a silyl ester compound according to claim 1, wherein said lithium salt containing a fluorine atom is selected from the group consisting of LiPF6、LiBF4、Li2SiF6、LiSbF6、LiN(SO2F)2、LiOSO2CF3、LiN(SO2CF3)2And LiN (SO)2CF2CF3)21 or 2 or more of the group.
3. The method for suppressing decomposition of a silyl ester compound according to claim 1 or 2, wherein the silyl ester carboxylate compound is a compound represented by the following general formula (2),
in the formula, R11、R12And R13Independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and X2Represents a direct bond or a group having a valence of n, and n represents a number of 1 to 4.
4. The method for suppressing decomposition of a silyl ester compound according to claim 1 or 2, wherein the silyl sulfate compound and the silyl sulfonate compound are compounds represented by the following general formula (3),
in the formula, R14、R15、R16And R17Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and p represents a number of 0 or 1.
5. The method for suppressing decomposition of a silyl ester compound according to claim 1 or 2, wherein the silyl ester phosphite compound and the silyl ester phosphate compound are compounds represented by the following general formula (4),
in the formula, R18、R19、R20、R21、R22、R23、R24、R25And R26Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms, and q represents a number of 0 or 1.
6. The method for suppressing decomposition of a silyl ester compound according to claim 1 or 2, wherein the silyl ester borate compound is a compound represented by the following general formula (5),
in the formula, R27、R28、R29、R30、R31、R32、R33、R34And R35Each independently represents an alkyl group having 1 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkyl group having 5 to 12 carbon atoms, an aryl group having 6 to 12 carbon atoms or an aralkyl group having 7 to 12 carbon atoms.
7. The method for suppressing decomposition of a silyl ester compound according to any one of claims 1 to 6, wherein the amount of water in the nonaqueous electrolytic solution is 5 ppm by mass or more.
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JP7458932B2 (en) | 2020-03-11 | 2024-04-01 | Muアイオニックソリューションズ株式会社 | Non-aqueous electrolyte for power storage devices and power storage devices |
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