CN111025450B - Deep ultraviolet composite structure metal wire grating polarizer - Google Patents
Deep ultraviolet composite structure metal wire grating polarizer Download PDFInfo
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- CN111025450B CN111025450B CN202010002668.5A CN202010002668A CN111025450B CN 111025450 B CN111025450 B CN 111025450B CN 202010002668 A CN202010002668 A CN 202010002668A CN 111025450 B CN111025450 B CN 111025450B
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3075—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state for use in the UV
Abstract
A deep ultraviolet composite structure metal wire grid polarizer comprises a substrate, a metal wire grid with a groove and a medium filling structure. The metal grating and the medium filling structure have the same period P of 100-300 nm, the duty ratio W/P of the metal grating is 0.5-0.85, and the aspect ratio H/W of the metal grating is 1-3. The invention reduces the inhibition effect on TM polarized light by reducing the generation of metal and medium interface surface plasma, and increases TM polarized transmittance and extinction ratio. The invention has the characteristics of large period, simple manufacturing process, high polarization transmittance and extinction ratio and the like in the deep ultraviolet band. The device has compact structure and easy integration, and the polarization detection system used as the analyzer does not need a collimating optical system, can effectively simplify the detection system, miniaturizes the polarization detection system, has wide adaptability range, and has important application value in the polarization detection system of the deep ultraviolet lithography machine.
Description
Technical Field
The invention relates to the technical field of polarizers, in particular to a deep ultraviolet composite structure metal wire grid polarizer with 193nm working wavelength.
Background
As the photolithography process nodes have reached 14nm, 10nm and below, step-and-scan projection lithography machines used for photolithography must use high numerical aperture projection objectives and polarized illumination subsystems. The influence of the polarization parameters of the high-numerical-aperture projection objective and the illumination subsystem of the photoetching machine on photoetching imaging and illumination quality is not negligible, and the influence is more and more obvious along with the reduction of process nodes. The premise of effectively regulating and controlling the polarization parameters of the projection objective and the illumination subsystem is to realize high-precision measurement of the polarization parameters of the optical system of the photoetching machine. The traditional polarizer cannot realize large beam receiving angle and light weight at the same time, has high requirements on an optical system, and sometimes needs to add a collimating optical system in a light path, so that the system is complex and large, and cannot meet the requirements of miniaturization, convenience and high efficiency of a detection system of a photoetching machine.
The metal wire grid polarizer has the characteristics of small volume, easy integration, flexible design, large beam receiving angle and the like, and is widely applied to visible light and infrared optical systems due to good polarization performance. In ultraviolet band, Chinese patent CN103018815, "a deep ultraviolet aluminum grating polarizer" introduces an aluminum grating wrapped by a substrate medium with 157nm of working wavelength; g.kang et al propose aluminum gratings with a period of 176nm using the anomalous polarization effect of sub-wavelength gratings in the resonance region, a transmittance of 40% at 193nm wavelength, and an extinction ratio of 16dB (g.kang, et al, appl.phys.lett.,99(2011) 071103); the t.weber design produced a tungsten grid polarizer with a period of 100nm, a transmittance of 44% at 193nm wavelength, and an extinction of 20dB (t.weber, appl.opt.51, 3224-3227 (2012)); the Asano et al design produced a 90nm periodic chromium oxide wire grid polarizer with an extinction ratio of 20dB at 193nm wavelength (K.Asano, appl.Opt.,53(13): 2942-; takashima et al, using a periodic index-profile sub-wavelength germanium grating as the wire grid polarizer, has an extinction ratio of 17.4dB at a wavelength of 360nm (Y.Takashima, appl.Opt.,56(29):8224-8229 (2017)). The wire grid polarizer used in the above article cannot always give consideration to both high extinction ratio and large grating period, and the extinction ratio is usually improved by reducing the characteristic size of the wire grid to make the grating generate zero-order diffracted light only, and the processing difficulty is greatly increased due to the limitation of the nano process.
The problems common to the above wire grid polarizers for the deep ultraviolet band are: they typically use only the zero-order diffraction of the grating and achieve higher polarization transmittance and extinction ratio by constraining the grating period to be much smaller than the incident wavelength. For the deep ultraviolet band, the grating period is more strict, the processing difficulty is high and the manufacturing cost is high due to the small grating period, and most researches only consider the condition of vertical incidence and do not consider the stability of the polarization performance under the condition of large-angle incidence.
The numerical aperture of the immersion lithography machine reaches 1.35, which enables the incident angle of the beam on the mask surface to reach 20 degrees. If a wire grid polarizer is used to detect the polarization parameter of the beam at the current location, the polarizer must ensure a more consistent polarization performance over an angle range of-20 to 20. In order to ensure accurate detection of polarization parameters on the mask surface of the lithography machine, a wire grid polarizer with good polarization performance at a wider incident angle needs to be designed. In addition, factors such as ease of processing and cost of processing need to be considered in optimally designing the period of the wire grid polarizer.
Disclosure of Invention
Aiming at the defects of small grating period and stability of large-angle incident polarization performance of a deep ultraviolet band in the prior art, the invention provides the deep ultraviolet composite structure metal wire grid polarizer, which has large period, reduces processing difficulty and cost, and has higher and stable polarization transmittance and extinction ratio in a wide incidence angle range of-30 degrees to 30 degrees. The performance requirement of the polarization detection system on the polarizer under a large incident angle can be met, and the method has a wide and definite application prospect in the polarization detection system of the deep ultraviolet lithography machine.
In order to achieve the purpose, the invention adopts the following technical scheme:
a deep ultraviolet composite structure metal wire grid polarizer comprises a substrate and a metal grating from bottom to top in sequence, and is characterized in that the metal grating is provided with a groove, a medium filling structure is arranged in the groove, and the metal grating and the medium filling structure have the same period P.
The period P of the metal grating is 100-300 nm; the duty ratio W/P (grid line width/grating period) of the metal grating is 0.5-0.85; the height-width ratio H/W (grid line height/grid line width) of the metal grating is 1-3. The larger period can effectively reduce the processing difficulty and cost of the wire grid polarizer. Under the condition of large-angle incidence, each diffraction order of the grating still has higher and more consistent polarization transmittance and extinction ratio, and the performance requirement of the polarization detection of the photoetching machine on the wire grid polarizer can be met.
The medium filling structure can be rectangular, trapezoidal or triangular.
The medium filling structure is completely arranged in the groove of the metal grating; when the incidence of TM polarized light is inhibited by adding the medium filling structure on the metal grating, surface plasmas are generated on the interface of the metal material and the medium material, so that the inhibition effect of the surface plasmas on the TM polarized light is reduced, and the aims of improving the TM polarized light transmittance and the extinction ratio of the wire grid polarizer are fulfilled.
The metal grating is made of aluminum, tungsten or silver; the substrate material is silicon dioxide, and the medium filling material is silicon dioxide, aluminum oxide or magnesium fluoride.
The invention has the beneficial effects that: the designed deep ultraviolet composite structure metal wire grid polarizer has a larger grating period, and the processing difficulty and cost are effectively reduced. The dielectric filling structure is added in the metal grating, and the inhibition effect of the dielectric filling structure on the transmission of TM polarized light is reduced by reducing surface plasma generated by the incidence of the TM polarized light, so that the effects of improving the TM polarized transmittance and the extinction ratio are achieved. In addition, the wire grid polarizer has higher polarization transmittance and extinction ratio in a wide incidence angle range of-30 degrees to 30 degrees, and meets the performance requirement of a photoetching machine on the polarizer. The polarization detection system does not need an additional collimating optical element, has a compact structure and is easy to integrate, the polarization detection system can be effectively simplified, the influence of other elements on the detection precision is reduced, and the requirements of miniaturization and high efficiency of the detection system of the photoetching machine are met.
Drawings
Fig. 1 is a schematic diagram of a deep ultraviolet composite structured metal wire grid polarizer according to the present invention. Wherein 1 is a substrate, 2 is a metal grating, and 3 is a dielectric filling structure, and the dielectric filling structure takes a rectangle as an example.
Fig. 2 is a longitudinal cross-sectional view of a deep ultraviolet composite structured metal wire grid polarizer of the present invention.
FIG. 3 is a graph of the transmittance of TM polarized light and TE polarized light of the wire grid polarizer as a function of the angle of incident light in example 1.
FIG. 4 is a graph of the extinction ratio of a wire grid polarizer as a function of the angle of incident light in example 1.
FIG. 5 is a graph of the transmittance of TM polarized light and TE polarized light of the wire grid polarizer as a function of the angle of incident light in example 2.
FIG. 6 is a graph of the extinction ratio of a wire grid polarizer as a function of the angle of incident light in example 2.
FIG. 7 is a graph of the transmittance of TM polarized light and TE polarized light of the wire grid polarizer as a function of the angle of incident light in example 3.
FIG. 8 is a graph of the extinction ratio of a wire grid polarizer as a function of incident light angle for example 3.
FIG. 9 is a graph of the transmittance of TM polarized light and TE polarized light of the wire grid polarizer as a function of the angle of incident light in example 4.
FIG. 10 is a graph of the extinction ratio of a wire grid polarizer as a function of incident light angle for example 4.
Detailed Description
The invention is further illustrated by the following examples in conjunction with the accompanying drawings, without limiting the scope of the invention:
referring to fig. 2, fig. 2 is a longitudinal cross-sectional view of a deep ultraviolet composite-structured metal wire grid polarizer of the present invention. The invention relates to a deep ultraviolet composite structure metal wire grid polarizer, which comprises a silicon dioxide substrate 1, wherein a composite structure consisting of a metal wire grid 2 and a medium filling structure 3 is arranged on the substrate. P is the period of the metal grating and the medium filling structure; W/P is the duty ratio; H/W is the aspect ratio; the medium filling structure takes a rectangle as an example, and c is the width of the medium filling structure; h is the depth of the dielectric filled structure.
Example 1
The metal aluminum grating and the magnesium fluoride medium filling structure have the same period P of 134nm, the duty ratio W/P of the aluminum grating is 0.67, and the height-to-width ratio H/W is 2.5. The width of the rectangular magnesium fluoride medium filling structure is 32nm, and the depth of the rectangular magnesium fluoride medium filling structure is 15 nm.
Referring to fig. 3, fig. 3 is a graph of transmittance of TM polarized light and TE polarized light according to an incident angle of example 1. Wherein, the o line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, the delta line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure, the line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, and the plus line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure. As can be seen from FIG. 3, at normal incidence, the TM polarized light transmittance of the metal wire grid polarizer with the dielectric filling structure is improved by nearly 177%, and the transmittance is more than 9.3% in the range of-30 degrees to 30 degrees.
Referring to fig. 4, fig. 4 is a graph of extinction ratio versus incident light angle for example 1. Where Δ represents the extinction ratio of the non-composite structured wire grid polarizer and Δ represents the extinction ratio of the composite structured wire grid polarizer. As can be seen from FIG. 4, at normal incidence, the extinction ratio of the metal wire grid polarizer with the dielectric filling structure is improved by 8%, and the extinction ratios are all above 47dB in the range of-30 to 30 degrees.
Example 2
The metal aluminum grating and the silicon dioxide medium filling structure have the same period P of 176nm, the duty ratio W/P of the aluminum grating is 0.74, and the aspect ratio H/W is 3. The width of the rectangular silicon dioxide medium filling structure is 84nm, and the depth of the rectangular silicon dioxide medium filling structure is 60 nm.
Referring to fig. 5, fig. 5 is a graph of transmittance of TM polarized light and TE polarized light according to an incident angle of example 2. Wherein, the o line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, the delta line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure, the line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, and the plus line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure. As can be seen from fig. 5, at normal incidence, the TM polarized light transmittance of the metal wire grid polarizer with the dielectric filling structure is improved by nearly 21 times, and the transmittance is all above 2.2% in the range of-30 ° to 30 °.
Referring to fig. 6, fig. 6 is a graph of extinction ratio versus incident light angle for example 2. Where Δ represents the extinction ratio of the non-composite structured wire grid polarizer and Δ represents the extinction ratio of the composite structured wire grid polarizer. As can be seen from FIG. 6, at normal incidence, the extinction ratio of the metal wire grid polarizer with the dielectric filling structure is improved by 50%, and the extinction ratios are all above 85dB in the range of-30 to 30 degrees.
Example 3
The metal aluminum grating and the silicon dioxide medium filling structure have the same period P of 200nm, the duty ratio W/P of the aluminum grating is 0.76, and the aspect ratio H/W is 1.52. The width of the rectangular silicon dioxide medium filling structure is 80nm, and the depth of the rectangular silicon dioxide medium filling structure is 30 nm.
Referring to fig. 7, fig. 7 is a graph of transmittance of TM polarized light and TE polarized light according to an incident angle of example 3. Wherein, the o line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, the delta line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure, the line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, and the plus line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure. As can be seen from FIG. 7, at normal incidence, the TM polarized light transmittance of the metal wire grid polarizer with the dielectric filling structure is improved by nearly 69%, and the transmittance is all above 4.5% in the range of-30 to 30 degrees.
Referring to fig. 8, fig. 8 is a graph of extinction ratio versus incident light angle for example 3. Where Δ represents the extinction ratio of the non-composite structured wire grid polarizer and Δ represents the extinction ratio of the composite structured wire grid polarizer. As can be seen from FIG. 8, at normal incidence, the extinction ratio of the metal wire grid polarizer with the dielectric filling structure is improved by 18%, and the extinction ratios are all above 41dB in the range of-30 to 30 degrees.
Example 4
The metal tungsten grating and the silicon dioxide medium filling structure have the same period P of 300nm, the tungsten grating duty ratio W/P of 0.83 and the height-to-width ratio H/W of 1.15. Wherein the width of the rectangular silicon dioxide dielectric filling structure is 114nm, and the depth is 94 nm.
Referring to fig. 9, fig. 9 is a graph of transmittance of TM polarized light and TE polarized light according to an incident angle of example 4. Wherein, the o line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, the delta line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure, the line type represents the TM polarized light transmittance of the wire grid polarizer without the composite structure, and the plus line type represents the TE polarized light transmittance of the wire grid polarizer without the composite structure. As can be seen from fig. 9, at normal incidence, the TM polarized light transmittance of the metal wire grid polarizer with the dielectric filling structure is improved by nearly 39%, and the transmittance is all above 1.6% in the range of-30 ° to 30 °.
Referring to fig. 10, fig. 10 is a graph of extinction ratio versus incident light angle for example 4. Where Δ represents the extinction ratio of the non-composite structured wire grid polarizer and Δ represents the extinction ratio of the composite structured wire grid polarizer. As can be seen from FIG. 10, at normal incidence, the extinction ratio of the metal wire grid polarizer with the dielectric filling structure is improved by 1%, and the extinction ratios are all above 66dB in the range of-30 to 30 degrees.
The above description is only for the preferred embodiment of the present invention, and is not intended to limit the scope of the present invention. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.
Claims (5)
1. The deep ultraviolet composite structure metal wire grid polarizer sequentially comprises a substrate (1) and a metal grating (2) from bottom to top, and is characterized in that the ridge of the metal grating (2) is provided with a groove, a medium filling structure (3) is arranged in the groove, and the metal grating (2) and the medium filling structure (3) have the same period P.
2. The deep ultraviolet composite structured metal wire grid polarizer of claim 1, wherein the period P of the metal grating is 100 to 300 nm; the duty ratio W/P of the metal grating is 0.5-0.85; the height-to-width ratio H/W of the metal grating is 1-3.
3. The deep ultraviolet composite wire grid polarizer of claim 1, wherein the dielectric filled structures are rectangular, trapezoidal, or triangular.
4. The deep ultraviolet composite wire grid polarizer of claim 1, wherein the metal grating material is aluminum, tungsten, or silver.
5. The deep ultraviolet composite structured metal wire grid polarizer of claim 1 wherein the substrate material is silica; the medium filling structure material is silicon dioxide, aluminum oxide or magnesium fluoride.
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| WO2007053579A2 (en) * | 2005-10-31 | 2007-05-10 | Kabushiki Kaisha Toshiba | Short-wavelength polarizing elements and the manufacture and use thereof |
| CN101435890A (en) * | 2008-12-09 | 2009-05-20 | 华中科技大学 | Sub-wave length metal grating polarizer |
| CN107121720A (en) * | 2017-07-12 | 2017-09-01 | 中国科学院上海技术物理研究所 | A kind of infrared polarizer with medium and wire grating structure |
| CN108333655A (en) * | 2018-04-26 | 2018-07-27 | 苏州苏大维格光电科技股份有限公司 | Polarization insensitive electromagnetic absorption structure and preparation method |
| CN108919407A (en) * | 2018-07-11 | 2018-11-30 | 京东方科技集团股份有限公司 | The preparation method and wire grid polarizer of metal wire and wire grating, electronic device |
| CN110568541A (en) * | 2019-08-27 | 2019-12-13 | 清华大学深圳研究生院 | Metal polaroid and manufacturing method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN101290371A (en) * | 2008-05-30 | 2008-10-22 | 苏州大学 | Sub-wavelength grate structure polarizing film and its manufacture method |
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Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007053579A2 (en) * | 2005-10-31 | 2007-05-10 | Kabushiki Kaisha Toshiba | Short-wavelength polarizing elements and the manufacture and use thereof |
| CN101435890A (en) * | 2008-12-09 | 2009-05-20 | 华中科技大学 | Sub-wave length metal grating polarizer |
| CN107121720A (en) * | 2017-07-12 | 2017-09-01 | 中国科学院上海技术物理研究所 | A kind of infrared polarizer with medium and wire grating structure |
| CN108333655A (en) * | 2018-04-26 | 2018-07-27 | 苏州苏大维格光电科技股份有限公司 | Polarization insensitive electromagnetic absorption structure and preparation method |
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| CN110568541A (en) * | 2019-08-27 | 2019-12-13 | 清华大学深圳研究生院 | Metal polaroid and manufacturing method thereof |
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