CN110989063B - Color filter based on rectangular lattice arrangement and preparation method and application thereof - Google Patents

Color filter based on rectangular lattice arrangement and preparation method and application thereof Download PDF

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CN110989063B
CN110989063B CN201911071888.7A CN201911071888A CN110989063B CN 110989063 B CN110989063 B CN 110989063B CN 201911071888 A CN201911071888 A CN 201911071888A CN 110989063 B CN110989063 B CN 110989063B
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rectangular lattice
color filter
lattice arrangement
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CN110989063A (en
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岳文静
李阳
高嵩
张春伟
付小倩
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University of Jinan
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    • GPHYSICS
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    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
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Abstract

The invention relates to the technical field of color filters, in particular to a color filter based on rectangular lattice arrangement and a preparation method and application thereof. The optical filter structure is as follows: the nano-pillars are fixed on the surface of the transparent substrate, the transparent covering layer is filled between the nano-pillars, and the nano-pillars are wrapped in the transparent covering layer; the array formed by the nano columns is arranged in a rectangular crystal lattice mode, and the distance between every two adjacent rows of nano columns is not equal to the shortest distance between every two adjacent rows of nano columns. The rectangular lattice can independently change the transverse and longitudinal periods of the super surface, so that the transmission spectrum and the filtered color are more finely regulated and controlled, and finally the color filter with higher color saturation is obtained. Secondly, by introducing a rectangular lattice, i.e., setting the lateral and longitudinal periods of the super-surface to different values, the structure can exhibit excellent period insensitivity, thereby improving the stability of the color filter.

Description

Color filter based on rectangular lattice arrangement and preparation method and application thereof
Technical Field
The invention relates to the technical field of color filters, in particular to a color filter based on rectangular lattice arrangement and a preparation method and application thereof.
Background
The information disclosed in this background of the invention is only for enhancement of understanding of the general background of the invention and is not necessarily to be taken as an acknowledgement or any form of suggestion that this information forms the prior art already known to a person skilled in the art.
The super surface is an ultrathin two-dimensional optical plane structure formed by densely arranged plasma nano structures or high-refractive-index nano particles. As an alternative to conventional three-dimensional metamaterials, metamaterials have the significant advantages of being easy to manufacture, highly compact, and capable of being integrated with other optical or electronic devices, and thus have gained rapid attention in high-resolution color filter, structural color printing, display, and other applications. To achieve a high efficiency transmissive display/imaging device, a super-surface based color filter needs to provide high transmission and high saturation color filtering in the transmissive mode. In previous reports, ultra-high resolution structural color was generally achieved using a metal nanostructure-based plasmonic super surface, which can provide a significant color response, especially in the reflective mode. However, plasma surfaces have unavoidable conduction losses and it is difficult to obtain colors with high transmission, severely limiting their potential applications in transmissive devices. In order to overcome the conduction loss caused by the plasma super-surface, the all-dielectric super-surface based on the high-refractive-index nanoparticle resonant cavity has gained great attention and is considered as one of the best methods for obtaining high-transmission color. However, the presently reported all-dielectric meta-surfaces are limited by their high loss at short wavelengths and still operate mainly in the reflective mode, and do not exhibit the potential advantage of all-dielectric meta-surfaces to achieve high transmission efficiency. Hydrogenated amorphous silicon can provide not only lower absorption loss and higher refractive index but also can be easily deposited on a transparent substrate, and thus is considered as an optimal material for realizing a transmissive color filter.
Furthermore, the reported all-dielectric super-surface structures are mainly based on nanoparticles arranged in a square lattice. In these works, the tuning of the spectrum and resonance wavelength is mainly achieved by changing the geometry of the nanoparticles. The period, another parameter common to nanoparticle arrays, is considered to have little effect on the spectral and color response. Recent studies have shown that this is true only when the period varies over a very small range, which means that the colour produced by the filter has substantially strong period-sensitive characteristics. Further, the inventors found out that: since it is difficult to achieve precise control of the period during the manufacturing process, the color filter, which is usually carefully designed, cannot stably achieve the same color response as the design with high saturation.
Disclosure of Invention
The invention mainly aims to solve the following two main technical problems of the prior ultrahigh-resolution color filter:
first, the current ultra-high resolution color filter implemented by using a plasma or a silicon super-surface mainly works in a reflective mode because the plasma super-surface has inevitable conduction loss or the silicon super-surface has high light absorption at a short wavelength, and the implementation of a transmissive color filter with high saturation and high efficiency still faces a huge challenge, which hinders the application thereof in ultra-high resolution and high efficiency display.
Secondly, the currently proposed super-surface structure based on square lattice arrangement (equal period in the horizontal and vertical directions) has strong period sensitivity, that is, with the change of period, both the spectrum and the corresponding resonance wavelength change, so that the finally filtered color changes. Therefore, such poor structural stability of the designed color filter is difficult to realize mass production of the filter in consideration of errors in actual processing.
In order to overcome the two technical problems mentioned above, the invention provides a color filter based on rectangular lattice arrangement and a preparation method thereof. Firstly, as opposed to the traditional super-surface with square lattice arrangement with the same transverse and longitudinal periods, the rectangular lattice designed by the invention can independently change the transverse and longitudinal periods of the super-surface, thereby realizing finer regulation and control of transmission spectrum and filtering color, and finally obtaining the color filter with higher color saturation. Secondly, by introducing a rectangular lattice, i.e., setting the lateral and longitudinal periods of the super-surface to different values, the structure can exhibit excellent period insensitivity, thereby improving the stability of the color filter.
The first object of the present invention: a color filter based on a rectangular lattice arrangement is provided.
The second object of the present invention: a preparation method of the color filter based on the rectangular lattice arrangement is provided.
The third object of the present invention: the color filter based on the rectangular lattice arrangement and the application of the preparation method thereof are provided.
In order to realize the purpose, the invention discloses the following technical scheme:
first, the present invention discloses a color filter based on rectangular lattice arrangement, comprising: the nano-pillars are fixed on the surface of the transparent substrate, the transparent covering layer is filled between the nano-pillars, and the nano-pillars are wrapped in the transparent covering layer; the array formed by the nano columns is arranged in a rectangular crystal lattice mode, and the distance between every two adjacent rows of nano columns is not equal to the shortest distance between every two adjacent rows of nano columns.
Secondly, the invention discloses a preparation method of the color filter based on the rectangular lattice arrangement, which comprises the following steps:
(1) preparing a deposition layer with high refractive index on a transparent substrate, wherein the material of the deposition layer is the same as that of the nano-pillars;
(2) forming a photoresist nano-pillar array on the deposition layer, wherein the nano-pillar array is arranged in a rectangular lattice;
(3) etching off the excessive deposition layer exposed outside the photoresist; and removing the residual photoresist;
(4) and (3) coating the transparent covering layer on the surface of the nano-pillar array in a spinning way and curing to realize filling among the nano-pillars and coating of the nano-pillars, thus obtaining the nano-pillar array.
Finally, the invention discloses the application of the color filter based on the rectangular lattice arrangement and the products prepared by the preparation method thereof in the fields of display equipment, imaging equipment, high-performance sensors and the like.
Compared with the prior art, the color filter based on the rectangular lattice arrangement has the following characteristics and beneficial effects:
(1) the hydrogenated amorphous silicon super-surface arranged in rectangular crystal lattices realizes the transmission type color filter with high color saturation and high structural stability, and can promote the development of high-performance display imaging devices.
(2) By setting the transverse and longitudinal periods of the super-surface formed by the nano-pillar array to different values, namely rectangular lattice arrangement, a high-efficiency transmission spectrum with a high suppression ratio can be obtained, so that high saturation is obtained. Particularly, in the realization of the yellow optical filter, the limitation that the silicon super surface based on the square lattice arrangement cannot realize yellow color with high saturation and low crosstalk is successfully broken.
(3) Compared with the strong periodic sensitivity exhibited by the square lattice-arranged silicon super-surface, the super-surface based on the rectangular lattice arrangement can still provide stable high-saturation color output when the period is greatly changed (within 150 nm), the height consistency of the resonance wavelength, the transmittance and the spectral bandwidth is kept, and the structural stability of the color filter is greatly improved.
(4) Owing to the highly localized resonance mode excited by the super-surface of a material having a high refractive index such as hydrogenated amorphous silicon, the color filter has excellent optical characteristics of polarization insensitivity and incident angle insensitivity, and can be used for the development of a high-efficiency transmissive display device.
(5) When the lateral/longitudinal period of the super-surface increases beyond the period that can excite rayleigh anomalies, the super-surface excites strong lattice resonances, resulting in an extremely narrow and red-shifted spectrum with increasing period; the narrow-band characteristic of the periodic regulation enables the filter provided by the invention to be applied to the development of high-performance sensors.
Drawings
The accompanying drawings, which are incorporated in and constitute a part of this specification, are included to provide a further understanding of the invention, and are incorporated in and constitute a part of this specification, illustrate exemplary embodiments of the invention and together with the description serve to explain the invention and not to limit the invention.
Fig. 1 is a schematic diagram (left view) and a top view (right view) of a three-dimensional structure of a color filter based on a rectangular lattice arrangement prepared in example 1 of the present invention.
Fig. 2 is a comparison of spectral characteristics of Cyan, Magenta, and yellow (CMY: Cyan, Magenta, yellow) filters based on a rectangular lattice arrangement and a square lattice arrangement in example 2 of the present invention.
Fig. 3 is a transmission spectrum of a yellow (Y) filter based on a square lattice arrangement and a rectangular lattice arrangement according to example 3 of the present invention with a period.
Fig. 4 is a transmission spectrum of a magenta (M) filter based on a square lattice arrangement and a rectangular lattice arrangement with a period change in example 4 of the present invention.
Fig. 5 is a transmission spectrum of a cyan (C) filter based on a square lattice arrangement and a rectangular lattice arrangement with a period change in example 5 of the present invention.
Fig. 6 is a diagram showing narrow band characteristics exhibited by the filter in example 6 when the lateral/longitudinal period of the filter exceeds the period at which rayleigh anomaly occurs.
The designations in the above figures represent respectively: 1-transparent substrate, 2-transparent covering layer and 3-nano column.
4-transmission spectrum of yellow filter based on square lattice arrangement; 5-transmission spectrum of magenta filter based on square lattice arrangement; 6-transmission spectrum of cyan filter based on square lattice arrangement; 7-transmission spectrum of yellow filter based on rectangular lattice arrangement; 8-transmission spectrum of magenta filter based on rectangular lattice arrangement; 9-transmission spectrum of cyan filter based on rectangular lattice arrangement.
Detailed Description
It is to be understood that the following detailed description is exemplary and is intended to provide further explanation of the invention as claimed. Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs.
It is noted that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of exemplary embodiments according to the invention. As used herein, the singular forms also are intended to include the plural forms as well, unless the context clearly indicates otherwise, and it should be further understood that when the terms "comprises" and/or "comprising" are used in this specification, they specify the presence of the stated features, steps, operations, devices, components, and/or combinations thereof.
As mentioned above, the current ultra-high resolution color filters implemented with plasma or silicon super-surface mainly work in the reflective mode; moreover, the currently proposed super-surface structure based on the square lattice arrangement has strong period sensitivity. Therefore, the invention provides a color filter based on rectangular lattice arrangement and a preparation method thereof.
The core component of the invention is a high-refractive-index super-surface structure based on rectangular lattice arrangement, so that the nano-pillars are made of a material with high refractive index and low optical loss in a visible light wave band. In some exemplary embodiments, the material of the nanopillars includes: hydrogenated amorphous silicon, titanium dioxide, silicon carbide, and the like.
In some exemplary embodiments, for the transparent substrate and the transparent cover layer, any material having high transmittance in the visible light band, such as PMMA, PDMS, etc.; the high-transparency polymer such as PMMA, PDMS and the like can be used for preparing flexible devices with dynamic color matching capability due to the characteristics of stretching, bending and the like.
In addition, although the substrate mentioned above is a transparent material, and is directed to the production of a high-transmittance color filter, a high-reflectance color filter can be obtained by replacing the transparent substrate with a metal material (e.g., aluminum or the like), a non-metal material (e.g., a silicon substrate), or a composite material (e.g., glass coated with an aluminum film or the like) having a high reflectance.
Further, since the local resonance mode excited by the super surface is mainly affected by the size of the nanoparticles constituting the super surface, besides the nano-pillar structure, other morphology nanoparticle structures such as a nano-cube block, a nano-sphere, a nano-cone, etc. can be used to realize the super surface with stable color filtering function.
In addition, if the nano-column adopts an elliptic column, a rectangular block, a cross with different arm lengths and the like, a polarization-controlled dynamic color filter can be realized, and the method can be further applied to the fields of optical information storage, dynamic display and the like.
In some exemplary embodiments, the lateral period (i.e., the distance a between adjacent nano-pillars) of the rectangular lattice arrangement is 150-400nm, and the longitudinal period is 150-400nm (i.e., the shortest distance B between two adjacent rows of nano-pillars), for example, 150nm, 180nm, 210nm, 240nm, 270nm, 300nm, 350nm, 400 nm; but a ≠ B to form a rectangular lattice array distinct from a conventional square lattice array.
Preferably, the difference between the transverse period and the longitudinal period is not more than 150nm, but the periodic variation cycle amplitude is within the range, which can help to provide stable output of high saturation color, and maintain high consistency of resonance wavelength, transmittance and spectral bandwidth, thereby greatly improving the structural stability of the color filter.
In some exemplary embodiments, the circular nanopillars have a height of 50-120nm and a diameter of 80-140 nm.
In some exemplary embodiments, in step (1), Silane (SiH) is used4) And helium (He), by Plasma Enhanced Chemical Vapor Deposition (PECVD).
In some exemplary embodiments, in step (2), an array of photoresist nanopillars is formed over the deposited layer by e-beam lithography or nanoimprint.
In some exemplary embodiments, CHF is employed in step (3)3And SF6The mixed gas is subjected to dry etching in a plasma etcher to etch away the exposed deposited layer, and the residual photoresist is removed by oxidizing plasma in the etcher.
The invention will now be further described with reference to the accompanying drawings and detailed description.
Example 1
Referring to fig. 1, a color filter based on a rectangular lattice arrangement according to the present invention is illustrated, and includes: a transparent substrate 1, a transparent covering layer 2 and nano-pillars 3; wherein, the transparent substrate 1 is made of glass; the transparent covering layer 2 is made of PMMA; the nano-pillar array 3 is made of hydrogenated amorphous silicon.
The nano-columns 3 are cylindrical, the height of the nano-columns is 50-120nm, the diameter of the nano-columns is 80-140nm, the nano-columns are fixed on the upper surface of the transparent substrate 1, the transparent covering layer 2 is filled between the nano-columns 3, and the nano-columns 3 are wrapped in the transparent covering layer 2; the array formed by the nano-pillars 3 is arranged in a rectangular lattice, namely the transverse period is different from the longitudinal period, and the specific illustration is as follows: the distance A (transverse period) between adjacent nano columns is not equal to the shortest distance B (longitudinal period) between two adjacent rows of nano columns, which is exactly opposite to the traditional super surface with square lattice arrangement with the same transverse and longitudinal periods, so that the optical filter of the invention has some specific properties.
Example 2
1. The preparation of the color filter based on rectangular lattice arrangement comprises the following steps:
first, with the aid of Silane (SiH)4) And helium (He) gas, and deposition of hydrogenated amorphous silicon having a height of 80nm on a transparent substrate is achieved by Plasma Enhanced Chemical Vapor Deposition (PECVD).
And then, forming a photoresist nano-pillar array with different nano-pillar sizes and periods on the hydrogenated amorphous silicon thin film by means of electron beam lithography. The diameter/transverse period/longitudinal period of the photoresist nano-column array are respectively 180nm/370nm/400nm,140nm/260nm/350nm and 80nm/150nm/300nm, and correspond to the period and the diameter of the nano-columns of the CMY optical filter.
Then, with CHF3And SF6And carrying out dry etching on the mixed gas in a plasma etching machine to etch away the exposed redundant hydrogenated amorphous silicon, and removing the residual photoresist by using oxidation plasma in the etching machine to obtain the hydrogenated amorphous silicon nano-pillar array based on rectangular lattice arrangement.
And finally, coating the transparent covering layer on the surface of the hydrogenated amorphous silicon nano-pillar array in a spinning mode and solidifying to achieve filling among the nano-pillars.
2. The preparation of the color filter based on square lattice arrangement comprises the following steps: the process is consistent with the process for preparing the color filter with the rectangular lattice arrangement. The difference lies in that: and secondly, forming a photoresist nano-pillar array on the hydrogenated amorphous silicon film by using an electron beam lithography mode, wherein the diameter/transverse period/longitudinal period of the photoresist nano-pillar array is respectively 180nm/400nm/400nm,140nm/350nm/350nm and 80nm/150nm/150nm, and the diameter corresponds to the period and the diameter of the nano-pillar of the CMY optical filter based on square lattice arrangement.
And (3) performance testing:
by utilizing the super-surface formed by the hydrogenated amorphous silicon nano-pillar array, the suppression of incident light at a specific wavelength can be realized, so that a transmission spectrum with a wave trough and a corresponding color output are obtained. The inhibition of specific wavelength is mainly from electric dipole and magnetic dipole resonance excited by the nano-column and lattice resonance caused by coupling effect between dipoles. When the period is small, the resonance mode supported by the super surface is mainly dominated by a pure electric dipole mode and a pure magnetic dipole mode. The resonance wavelength of the transmission spectrum and the corresponding transmitted color response are now mainly determined by the geometrical parameters of the individual nanopillars, such as height, diameter. Therefore, the height and diameter of the nano-pillars need to be determined first to ensure that the transmission spectra of the three basic color filters of CMY can be obtained, and in order to use only one step of photolithography patterning process in actual processing, the height of the nano-pillars of the color filters of different colors is kept consistent in this embodiment.
In the embodiment, the transverse (longitudinal) period of the nano-pillar array is fixed, and the longitudinal (transverse) period of the nano-pillar array is changed, so that the characteristics such as the shape and the bandwidth of the transmission spectrum can be more finely regulated and controlled, and the transmission spectrum which is more excellent than that of the traditional filter based on square lattice arrangement can be obtained. Fig. 2 is a transmission spectrum of two filters arranged based on a square lattice and a rectangular lattice.
As can be seen from the left diagram of fig. 2, for the filter of the square lattice arrangement, by changing the period (lateral period ═ longitudinal period), the optimum yellow spectrum 4, magenta spectrum 5, and cyan spectrum 6 are finally obtained. It is also apparent from this figure that the yellow spectrum 4 has a very broad bandwidth and that the suppression of the light transmission at the resonance wavelength is not sufficient, and that up to 30% of the light still can pass. These two features of the spectrum imply that yellow filters based on a square lattice arrangement have high crosstalk and do not achieve satisfactorily high saturation. As shown in the right diagram of fig. 2, by arranging unequal periods, i.e., rectangular lattice arrangements, in the lateral and longitudinal directions, we can obtain the yellow spectrum 7, the magenta spectrum 8, and the cyan spectrum 9 in fig. 2, respectively. The yellow spectrum at this time obviously has an extremely narrow bandwidth, so that the yellow filter can effectively avoid crosstalk among different colors. Meanwhile, the transmission inhibition at the resonance wavelength is also reduced to about 10% from 30% of the square lattice arrangement, so that the color saturation of the yellow filter is greatly improved.
Example 3
The method for manufacturing a color filter of this embodiment is the same as that of embodiment 2, except that: increasing the period of the yellow filters of the square and rectangular lattice arrays from 150nm to 300 nm; wherein, for a square lattice arrangement, the longitudinal period and the lateral period increase simultaneously and the increments are the same. For a rectangular lattice arrangement, however, a fixed lateral (or longitudinal) period is used, and only a varying longitudinal (or lateral) period is used.
And (3) performance testing:
fig. 3 shows the transmission spectra of the yellow filter (Y) based on the square lattice arrangement and the rectangular lattice arrangement prepared in this example with the period, and as can be seen from the variation trend of the transmission spectra shown in the left graph of fig. 3, the resonance wavelength of the yellow filter based on the square lattice arrangement does not change greatly with the period, but the transmittance at the resonance wavelength gradually increases, which means that the saturation of the output color will decrease greatly with the period.
As can be seen from the trend of the transmission spectrum shown in the right diagram of fig. 3, the rectangular lattice arrangement can maintain the transmittance of the yellow filter at the resonance wavelength at a very low value compared to the square lattice arrangement, thereby providing a highly stable, highly saturated yellow output response. In addition, the transmission spectra obtained with extremely narrow bandwidths and high suppression at the resonance wavelength, when the lateral and longitudinal periods were set to 150nm and 300nm, respectively, were exactly those of the yellow filter based on the rectangular lattice arrangement optimized in fig. 2.
Example 4
The method for manufacturing a color filter of this embodiment is the same as that of embodiment 2, except that: increasing the period of the magenta (M) filters of the square and rectangular lattice arrays from 200nm to 450 nm; wherein, for a square lattice arrangement, the longitudinal period and the lateral period increase simultaneously and the increments are the same. For a rectangular lattice arrangement, however, a fixed lateral (or longitudinal) period is used, and only a varying longitudinal (or lateral) period is used.
Example 5
The method for manufacturing a color filter of this embodiment is the same as that of embodiment 2, except that: increasing the period of the cyan filter (C) filter of the square and rectangular lattice arrays from 250nm to 400 nm; wherein, for a square lattice arrangement, the longitudinal period and the lateral period increase simultaneously and the increments are the same. For a rectangular lattice arrangement, however, a fixed lateral (or longitudinal) period is used, and only a varying longitudinal (or lateral) period is used.
And (3) performance testing:
the transmission spectra of the filters prepared in examples 4 and 5, which increase with the period of the super surface, are shown in fig. 4 and 5, respectively. It can be seen that the transmission spectrum of a filter based on a square lattice arrangement has two resonance troughs that are far apart when at a smaller period. According to the mie resonance theory, the two resonances are mainly caused by the electric dipole and magnetic dipole resonances. With increasing period, the resonance trough excited by the electric dipole is sharply red-shifted, while the resonance trough excited by the magnetic dipole remains substantially stationary, eventually resulting in a change in output color. In contrast, with the filter of the rectangular lattice arrangement, resonances excited by electric and magnetic dipoles are close to each other and move only by a small amplitude as the period increases, and therefore, the filter can stably output a high saturation color response almost independent of the period.
Example 6
This example shows an example of the ability of the optical filter based on the rectangular lattice arrangement designed by the present invention to be used in a sensor, the preparation method of the optical filter based on the rectangular lattice arrangement is the same as that in example 2, the diameter and the lateral period of the nano-pillars of the optical filter and the magenta optical filter are consistent, and are 140nm and 350nm respectively, and the difference is that: the longitudinal period of the filter is increased to 380nm beyond the range of periods where a magenta filter provides stable color output, thereby obtaining a transmission spectrum with a very narrow bandwidth and a high rejection ratio suitable for realizing a sensor.
The specific test method is that, as shown in fig. 6, when the refractive index of the medium around the optical filter is gradually increased from 1.5 to 1.8, a very significant red shift occurs in the resonance trough, which indicates that the optical filter structure is very sensitive to the surrounding environment, and thus, the optical filter structure can be used for constructing various sensors with high sensitivity.
The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention, and various modifications and changes may be made by those skilled in the art. Any modification, equivalent replacement, or improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims (15)

1. A color filter based on rectangular lattice arrangement is characterized in that: the method comprises the following steps: the nano-pillars are fixed on the surface of the transparent substrate, the transparent covering layer is filled between the nano-pillars, and the nano-pillars are wrapped in the transparent covering layer; the array formed by the nano columns is arranged in a rectangular lattice manner, and the distance between every two adjacent rows of nano columns is not equal to the shortest distance between every two adjacent rows of nano columns;
the transverse period of the rectangular lattice arrangement is 150-400nm, and the longitudinal period is 150-400 nm;
the transverse and longitudinal periods differ by no more than 150 nm.
2. The color filter based on a rectangular lattice arrangement of claim 1, wherein: the nanopillars are made of a material having a high refractive index and low optical loss in the visible light band.
3. The color filter based on a rectangular lattice arrangement of claim 1, wherein: the nano-column is made of the following materials: hydrogenated amorphous silicon, titanium dioxide, or silicon carbide.
4. The color filter based on a rectangular lattice arrangement of claim 1, wherein: the transparent substrate is made of any one of glass, PMMA and PDMS.
5. The color filter based on a rectangular lattice arrangement of claim 1, wherein: the transparent covering layer is made of any one of PMMA and PDMS.
6. The color filter based on a rectangular lattice arrangement according to any one of claims 1 to 5, wherein: the nano-column is any one of a circular column, an elliptic column, a rectangular block and a cross with different arm lengths.
7. The color filter based on a rectangular lattice arrangement of claim 6, wherein: the nano column is a circular column, the height of the circular column is 50-120nm, and the diameter of the circular column is 80-140 nm.
8. The color filter based on a rectangular lattice arrangement of claim 1, wherein: the transverse period and the longitudinal period are any combination of different numerical values of 150nm, 180nm, 210nm, 240nm, 270nm, 300nm, 350nm and 400 nm.
9. The color filter based on a rectangular lattice arrangement according to any one of claims 1 to 5, wherein: the transparent substrate is replaced with an aluminum or silicon substrate.
10. The color filter based on a rectangular lattice arrangement according to any one of claims 1 to 5, wherein: and replacing the nano column with any one of a nano cube block, a nano sphere and a nano cone.
11. The method for manufacturing a color filter based on a rectangular lattice arrangement according to any one of claims 1 to 10, wherein: the method comprises the following steps:
(1) preparing a deposition layer on a transparent substrate, wherein the material of the deposition layer is the same as that of the nano-pillars;
(2) forming a photoresist nano-pillar array on the deposition layer, wherein the nano-pillar array is arranged in a rectangular lattice;
(3) etching off the excessive deposition layer exposed outside the photoresist; and removing the residual photoresist;
(4) and (3) coating the transparent covering layer on the surface of the nano-pillar array in a spinning way, and curing to realize filling among the nano-pillars and coating of the nano-pillars.
12. The method of claim 11, wherein: in the step (1), the preparation of the deposition layer on the transparent substrate is realized by plasma enhanced chemical vapor deposition with the aid of a mixed gas of silane and helium.
13. The method of claim 11, wherein: and (2) forming a photoresist nano-column array on the deposition layer by adopting an electron beam lithography or nano-imprinting mode.
14. The method of claim 11, wherein: in step (3), CHF is used3And SF6The mixed gas is subjected to dry etching in a plasma etcher to etch away the exposed nano-pillars, and the residual photoresist is removed by oxidation plasma in the etcher.
15. Use of a color filter based on a rectangular lattice arrangement according to any of claims 1 to 10 and/or a filter produced by the method according to any of claims 11 to 14 in a display device, an imaging device, a high performance sensor.
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