CN110931394A - Wafer cleaning solution recovery plant - Google Patents
Wafer cleaning solution recovery plant Download PDFInfo
- Publication number
- CN110931394A CN110931394A CN201911240106.8A CN201911240106A CN110931394A CN 110931394 A CN110931394 A CN 110931394A CN 201911240106 A CN201911240106 A CN 201911240106A CN 110931394 A CN110931394 A CN 110931394A
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- China
- Prior art keywords
- plate
- accumulator
- fluid director
- wafer cleaning
- cleaning liquid
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a wafer cleaning liquid recovery device, which structurally comprises a mobile recovery device, a shielding device, a fluid director, a rotary table, a rotary shaft, a motor and a pushing device, wherein the bottom of the rotary table is connected with the rotary shaft, the bottom of the rotary shaft is connected with the motor arranged in the fluid director, the shielding device is arranged on the left side of the fluid director, the mobile recovery device is arranged below the fluid director, a mobile recovery tank is movably connected with the pushing device, the fluid director comprises a side plate, an inclined plate, a surrounding plate and a bottom plate, the bottom of the surrounding plate is connected with the bottom plate, two ends of the surrounding plate are respectively connected with the side plate, the inclined plate is connected with the bottom plate and the surrounding plate, the mobile recovery device comprises a slide rail, a: can make the washing liquid directly flow to corresponding accumulator through the design, and the phenomenon that can not appear spilling or leak, and can judge the type automatically regulated accumulator position of washing liquid through the pH value, it is more intelligent.
Description
Technical Field
The invention relates to the field of wafer processing, in particular to a wafer cleaning solution recovery device.
Background
The wafer refers to a silicon wafer used for manufacturing a silicon semiconductor integrated circuit, and is called a wafer because the shape is circular; various circuit element structures can be processed on a silicon wafer to form an integrated circuit product with specific electrical functions.
The conventional wafer cleaning solution recovery device disclosed in patent No. 201711167935.9 comprises a recovery unit, a lifting unit and a discharge unit, wherein the recovery unit comprises a plurality of annular recovery grooves which are continuously arranged in the vertical direction; the lifting unit is used for controlling the recovery unit to move along the vertical direction, so that the recovery grooves in the recovery unit are respectively used for recovering different wafer cleaning liquids; and a discharge unit including a plurality of discharge pipes which are respectively in communication connection with the interiors of the plurality of recovery tanks. By using the wafer cleaning liquid recovery device provided by the invention, various wafer cleaning liquids can be effectively and independently collected and discharged, the possibility of chemical reaction among various cleaning liquids is reduced, the damage to the discharge pipe is reduced, and the service life and the safety of the discharge pipe are effectively improved.
Disclosure of Invention
The invention mainly aims to overcome the defects of the prior art and provide a wafer cleaning solution recovery device.
The invention is realized by adopting the following technical scheme: the utility model provides a wafer washing liquid recovery plant, its structure is including removing recovery unit, shielding ware, divertor, carousel, pivot, motor, thrust unit, the carousel bottom is connected with the pivot, the pivot bottom is connected with the motor of establishing in the divertor, the left side of divertor is equipped with shielding ware, it installs in the divertor below to remove recovery unit, it connects with thrust unit swing joint to move the accumulator.
Preferably, the fluid director comprises side plates, an inclined plate, a surrounding plate and a bottom plate, wherein the bottom of the surrounding plate is connected with the bottom plate, the two ends of the surrounding plate are respectively connected with the side plates, and the inclined plate is connected with the bottom plate and the surrounding plate.
As optimization, remove recovery unit and include slide rail, accumulator, output tube, baffle, extension board, the accumulator bottom is installed on the slide rail, the accumulator is inside to be equipped with 2 baffles and to separate into 3 check with the accumulator, 3 check bottoms respectively with the output tube intercommunication, the accumulator side is equipped with 3 extension boards.
As optimization, thrust unit includes pH value detector, motor cover, micromotor, bull stick, blade, the pH value detector is installed on the hang plate, the pH value detector passes through the electricity with micromotor and is connected, micromotor is installed in the motor cover, the motor cover is connected in the divertor outside, micromotor is connected with the bull stick of establishing in the bottom, the bull stick side is connected with the blade.
As an optimization, the shielding device comprises a guide rail, a descending plate and a gravity strip, wherein the descending plate is installed in the guide rail, the gravity strip is embedded at the bottom of the descending plate, and the gravity strip is in contact with the top of the recovery tank.
Preferably, the bottom of the recovery tank is inclined, and the lower side of the recovery tank is communicated with the output pipe.
Preferably, the blade is moon-shaped.
Preferably, the bottom of the recovery tank is made of metal.
Preferably, the interior of the slide rail is made of a permanent magnet.
Advantageous effects
When the cleaning device is used, a wafer is placed on the turntable, the motor drives the turntable to rotate through the rotating shaft, so that the wafer is cleaned, water can be prevented from splashing outside through the enclosing plate, the side plate and the descending plate during cleaning, the flowing-down cleaning liquid flows into the recovery tank through the inclined plate to be collected, when water flows through the inclined plate, the pH value detector detects the pH value of the cleaning liquid, so that the cleaning liquid is judged to belong to acid solution, alkali solution and deionized water, the micro motor is started to rotate, the recovery tank is driven to move on the sliding rail, the cleaning liquid can be prevented from splashing to different lattices through the descending plate, the top of the recovery tank is attached to the bottom plate, and the purpose of preventing the cleaning liquid from splashing to the.
Compared with the prior art, the invention has the beneficial effects that: can make the washing liquid directly flow to corresponding accumulator through the design, and the phenomenon that can not appear spilling or leak, and can judge the type automatically regulated accumulator position of washing liquid through the pH value, it is more intelligent.
Drawings
Other features, objects and advantages of the invention will become more apparent upon reading of the detailed description of non-limiting embodiments with reference to the following drawings:
FIG. 1 is a schematic structural diagram of a wafer cleaning solution recycling apparatus according to the present invention.
Fig. 2 is a schematic structural view of the fluid director of the present invention.
Fig. 3 is a cross-sectional view of a flow director of the present invention.
Fig. 4 is a top view of the mobile recovery device of the present invention.
FIG. 5 is a schematic view of the pushing device of the present invention.
Fig. 6 is a schematic structural view of the shutter according to the present invention.
In the figure: the device comprises a movable recovery device 1, a shutter 2, a fluid director 3, a rotary disc 4, a rotary shaft 5, a motor 6, a pushing device 7, a side plate 30, an inclined plate 31, a coaming 32, a bottom plate 33, a slide rail 10, a recovery tank 11, an output pipe 12, a partition plate 13, a support plate 14, a pH value detector 70, a motor cover 71, a micro motor 72, a rotary rod 73, blades 74, a guide rail 20, a descending plate 21 and a gravity strip 22.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments. All other embodiments, which can be derived by a person skilled in the art from the embodiments given herein without making any creative effort, shall fall within the protection scope of the present invention.
Referring to fig. 1-6, the present invention provides a technical solution for a wafer cleaning solution recycling apparatus: the structure of the device comprises a movable recovery device 1, a shielding device 2, a fluid director 3, a rotary table 4, a rotary shaft 5, a motor 6 and a pushing device 7, wherein the bottom of the rotary table 4 is connected with the rotary shaft 5, the bottom of the rotary shaft 5 is connected with the motor 6 arranged in the fluid director 3, the shielding device 2 is arranged on the left side of the fluid director 3, the movable recovery device 1 is arranged below the fluid director 3, and a movable recovery tank 1 is movably connected with the pushing device 7.
The fluid director 3 comprises a side plate 30, an inclined plate 31, a coaming 32 and a bottom plate 33, wherein the bottom of the coaming 32 is connected with the bottom plate 33, the two ends of the coaming 32 are respectively connected with the side plate 30, and the inclined plate 31 is connected with the bottom plate 33 and the coaming 32.
Remove recovery unit 1 and include slide rail 10, accumulator 11, output tube 12, baffle 13, extension board 14, accumulator 11 bottom is installed on slide rail 10, accumulator 11 is inside to be equipped with 2 baffles 13 and separates accumulator 11 into 3 check, and 3 check bottoms communicate with output tube 12 respectively, accumulator 11 side is equipped with 3 extension boards 14.
The shielding device 2 comprises a guide rail 20, a descending plate 21 and a gravity strip 22, wherein the descending plate 21 is installed in the guide rail 20, the gravity strip 22 is embedded at the bottom of the descending plate 21, the gravity strip 22 is in contact with the top of the recovery tank 11, and the gravity strip 22 can descend through gravity to enable the bottom of the descending plate 21 to be tightly attached to the top of the recovery tank 11.
The bottom of the recovery tank 11 is inclined, and the lower side of the recovery tank is communicated with the output pipe 12, so that the cleaning liquid can be conveniently retained in the output pipe 12.
The vanes 74 are moon-shaped to facilitate pushing the brace 14.
The bottom of the recovery tank 11 is made of metal.
The interior of the slide rail 10 is made of a permanent magnet, and the slide rail attracts the recovery tank 11, so that the recovery tank 11 is relatively fixed.
When the cleaning device is used, a wafer is placed on the rotary table 4, the motor 6 drives the rotary table 4 to rotate through the rotating shaft 5, so that the wafer is cleaned, water can be prevented from splashing through the enclosing plate 32, the side plate 30 and the descending plate 21 during cleaning, the flowing-down cleaning liquid flows into the recovery tank 11 through the inclined plate 31 to be collected, when water flows through the inclined plate 31, the pH value detector 70 detects the pH value of the cleaning liquid, so that the cleaning liquid is judged to belong to any one of acid solution, alkali solution and deionized water, the micro motor 72 is started to rotate, the recovery tank 11 is driven to move on the slide rail 10, the cleaning liquid can be prevented from splashing to different cases through the descending plate 21, and the top of the recovery tank 11 is attached to the bottom plate 33, so that the purpose of preventing the.
Compared with the prior art, the invention has the technical progress that: can make the washing liquid directly flow to corresponding accumulator through the design, and the phenomenon that can not appear spilling or leak, and can judge the type automatically regulated accumulator position of washing liquid through the pH value, it is more intelligent.
Although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that various changes in the embodiments and/or modifications of the invention can be made, and equivalents and modifications of some features of the invention can be made without departing from the spirit and scope of the invention.
Claims (5)
1. The utility model provides a wafer washing liquid recovery plant, its structure is including removing recovery unit (1), shelter from ware (2), divertor (3), carousel (4), pivot (5), motor (6), thrust unit (7), its characterized in that: the rotary table is characterized in that the bottom of the rotary table (4) is connected with a rotary shaft (5), the bottom of the rotary shaft (5) is connected with a motor (6) arranged in the fluid director (3), a shielding device (2) is arranged on the left side of the fluid director (3), the movable recovery device (1) is installed below the fluid director (3), and the movable recovery tank (1) is movably connected with a pushing device (7).
2. The wafer cleaning liquid recovery apparatus according to claim 1, wherein: the fluid director (3) comprises side plates (30), inclined plates (31), enclosing plates (32) and a bottom plate (33), wherein the bottoms of the enclosing plates (32) are connected with the bottom plate (33), the two ends of the enclosing plates (32) are respectively connected with the side plates (30), and the inclined plates (31) are connected with the bottom plate (33) and the enclosing plates (32).
3. The wafer cleaning liquid recovery apparatus according to claim 1, wherein: remove recovery unit (1) and include slide rail (10), accumulator (11), output tube (12), baffle (13), extension board (14), install on slide rail (10) accumulator (11) bottom, accumulator (11) inside is equipped with 2 baffle (13) and separates accumulator (11) into 3 check, and 3 check bottoms communicate with output tube (12) respectively, accumulator (11) side is equipped with 3 extension board (14).
4. The wafer cleaning liquid recovery apparatus according to claim 1, wherein: thrust unit (7) include PH value detector (70), motor cover (71), micromotor (72), bull stick (73), blade (74), install on hang plate (31) PH value detector (70), PH value detector (70) is connected through the electricity with micromotor (72), install in motor cover (71) micromotor (72), motor cover (71) is connected in divertor (3) outside, micromotor (72) is connected with bull stick (73) of establishing the bottom, bull stick (73) side is connected with blade (74).
5. The wafer cleaning liquid recovery apparatus according to claim 1, wherein: the shielding device (2) comprises a guide rail (20), a descending plate (21) and a gravity strip (22), wherein the descending plate (21) is installed in the guide rail (20), the gravity strip (22) is embedded at the bottom of the descending plate (21), and the gravity strip (22) is in contact with the top of the recovery tank (11).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911240106.8A CN110931394A (en) | 2019-12-06 | 2019-12-06 | Wafer cleaning solution recovery plant |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911240106.8A CN110931394A (en) | 2019-12-06 | 2019-12-06 | Wafer cleaning solution recovery plant |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110931394A true CN110931394A (en) | 2020-03-27 |
Family
ID=69858091
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201911240106.8A Withdrawn CN110931394A (en) | 2019-12-06 | 2019-12-06 | Wafer cleaning solution recovery plant |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110931394A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112588691A (en) * | 2020-12-10 | 2021-04-02 | 北京北方华创微电子装备有限公司 | Semiconductor cleaning equipment |
-
2019
- 2019-12-06 CN CN201911240106.8A patent/CN110931394A/en not_active Withdrawn
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112588691A (en) * | 2020-12-10 | 2021-04-02 | 北京北方华创微电子装备有限公司 | Semiconductor cleaning equipment |
| CN112588691B (en) * | 2020-12-10 | 2023-02-14 | 北京北方华创微电子装备有限公司 | Semiconductor cleaning equipment |
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Application publication date: 20200327 |
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| WW01 | Invention patent application withdrawn after publication |