CN110911438B

CN110911438B - Display panel, display screen and display terminal

Info

Publication number: CN110911438B
Application number: CN201811071912.2A
Authority: CN
Inventors: 许立雄; 楼均辉
Original assignee: Kunshan Govisionox Optoelectronics Co Ltd
Current assignee: Kunshan Govisionox Optoelectronics Co Ltd
Priority date: 2018-09-14
Filing date: 2018-09-14
Publication date: 2020-09-29
Anticipated expiration: 2038-09-14
Also published as: CN110911438A

Abstract

The invention provides a display panel, a display screen and a display terminal, wherein the display panel comprises a substrate and a plurality of film layers which are sequentially arranged on the substrate, at least one film layer is provided with a graphical structure, a first film layer in the film layers is provided with a groove, and a compensation layer is arranged in the groove; when external incident light enters the display panel in a direction perpendicular to the surface of the substrate, a path of the light passing through the groove of the first film layer and the compensation layer is a first path, the rest paths are second paths, and the difference of the optical paths between the two paths is an integral multiple of the wavelength of the external incident light. In the scheme, the difference value between the two paths is the integral multiple of the wavelength of the light, so that when the light is emitted from the display panel through the two paths, the phase difference is zero, the diffraction phenomenon caused by the phase difference is eliminated, the image distortion caused by the diffraction cannot be generated after the light passes through the display panel, and the definition of the image perceived by the camera behind the display panel is improved.

Description

Display panel, display screen and display terminal

Technical Field

The invention relates to the technical field of display, in particular to a display panel, a display screen and a display terminal.

Background

With the rapid development of display terminals, the requirements of users on screen occupation ratio are higher and higher, so that the comprehensive screen display of the display terminal is concerned more and more in the industry. The comprehensive screen among the prior art is mostly the mode of fluting or trompil, like the bang screen of apple etc. all is the regional fluting or trompil of display screen that corresponds at components such as camera, sensor. When the function of shooing is realized, the external light penetrates into the camera below the display screen through the groove or the hole on the display screen, so that the shooting is realized. However, neither the bang screen nor the perforated screen is a real full screen, and therefore, the development of a real full screen is urgently needed in the industry.

Disclosure of Invention

In view of the above, it is necessary to provide a display panel, a display screen and a display terminal for full-screen display in order to solve the above technical problems.

Therefore, the invention provides the following technical scheme:

the embodiment of the invention provides a display panel, which comprises a substrate and a plurality of film layers sequentially arranged on the substrate, wherein at least one film layer is provided with a graphical structure, a first film layer in the film layers is provided with a groove, and a compensation layer is arranged in the groove; the display panel is internally provided with m light-permeable paths, m is an integer larger than or equal to 2, the paths are light-permeable paths vertical to the surface of the substrate, a first path in the m paths longitudinally penetrates through the groove and the compensation layer, and a second path in the m paths is different from a film layer included in the first path;

and after external incident light enters the display panel in a direction perpendicular to the surface of the substrate and passes through the first path and the second path, the difference of the optical paths between the two paths is an integral multiple of the wavelength of the external incident light.

Optionally, the external incident light enters the display panel in a direction perpendicular to the substrate surface, and passes through any two of the m paths, and then an obtained optical path difference is an integer multiple of the wavelength of the external incident light.

Optionally, the difference between the optical lengths of the two paths is 0.

Optionally, the thickness of the compensation layer is less than or equal to the depth of the groove; the compensation layer is a transparent material layer.

Optionally, the calculation formula of the optical path length is as follows:

L＝d₁*n₁+d₂*n₂+…+d_i*n_iwhere L is the optical path length, i is the number of layers in the path traversed by the light, d₁，d₂，…，d_iIs the thickness of each film layer in the path traversed by the light; n is₁，n₂，…，n_iIs the refractive index of each film layer in the path traversed by the light.

Optionally, the display panel is an AMOLED display panel or a PMOLED display panel, and the film layer includes an encapsulation layer, a second electrode layer, a light emitting layer, a first electrode layer, and a pixel defining layer;

the first path comprises a packaging layer, a compensation layer, a second electrode layer, a light emitting layer, a first electrode layer and a substrate;

the second path comprises an encapsulation layer, a second electrode layer, a pixel defining layer, a first electrode layer and a substrate;

also included is a third path including an encapsulation layer, a second electrode layer, a pixel defining layer, and a substrate.

Optionally, the display panel is an AMOLED display panel, the film layer further includes a conductive line, the conductive line is a single-layer line or a multi-layer line, and the conductive line includes at least one of a scan line, a data line, a power line, and a reset line;

the paths further include a fourth path including an encapsulation layer, a second electrode layer, a pixel defining layer, a conductive line, and a substrate.

Optionally, the conductive line is a single-layer line, the conductive line and the first electrode layer are disposed on the same layer, the material of the conductive line and the material of the first electrode layer are the same, and the thickness of the film layer included in the fourth path and the thickness of the film layer included in the second path are the same;

when the conductive wire is a multilayer circuit, at least one layer of the conductive wire and the first electrode layer are arranged on the same layer, and the conductive wire and the first electrode layer are made of the same or different materials.

Optionally, the conductive line is a dual-layer line and includes a first conductive line and a second conductive line, the first conductive line and the first electrode layer are disposed on the same layer, the second conductive line is disposed between the planarization layer and the substrate, the first conductive line and the second conductive line are made of the same material as the first electrode layer, and the fourth path includes a package layer, a second electrode layer, a pixel defining layer, the first conductive line and/or the second conductive line, and the substrate.

Optionally, when the projection of the conductive line on the substrate overlaps with the projection of the first electrode layer on the substrate, the path further includes a fifth path, and the fifth path includes the encapsulation layer, the second electrode layer, the light emitting layer, the first electrode layer, the second conductive line, and the substrate.

Optionally, the external incident light enters the display panel in a direction perpendicular to the substrate surface, and after passing through the first path and the third path, an obtained optical path difference is an integer multiple of a wavelength of the external incident light.

Optionally, the display panel is an AMOLED display panel, and the film layer further includes a support layer disposed on the pixel defining layer and a TFT structure layer for manufacturing a pixel circuit;

the support layer is a transparent structure, and at least one of the second path, the third path and the fourth path further comprises a support layer and/or a TFT structure layer.

Optionally, the display panel is an AMOLED display panel, and the film layer further includes a support layer disposed on the pixel defining layer and a TFT structure layer for manufacturing a pixel circuit; the supporting layer is an opaque structure, and the TFT structure layer is arranged below the supporting layer.

Optionally, the display panel is a flexible screen or a hard screen adopting a film packaging mode, the packaging layer includes a film packaging layer, the film packaging layer includes an organic material packaging layer, the material of the compensation layer is the organic packaging material, and the thickness of the organic material packaging layer in the first path is greater than the thickness of the organic material packaging layer in the other paths.

Optionally, the display panel is a hard screen adopting a glass powder packaging mode, the packaging layer includes a vacuum gap layer and a packaging substrate, and the thickness of the low-vacuum gap layer in the first path is greater than or equal to the thickness of the low-vacuum gap layer in the other path.

Optionally, the thickness and/or refractive index of one or more film layers in the two paths are adjusted so that the difference between the obtained optical paths after the external incident light passes through the two paths is an integral multiple of the wavelength of the external incident light.

Optionally, the wavelength of the external incident light is 380-780 nanometers.

Optionally, the wavelength of the external incident light is 500-600 nm.

Optionally, the wavelength of the externally incident light is 550 nm.

The embodiment also provides a display screen which is provided with at least one display area; the at least one display area comprises a first display area, and a photosensitive device can be arranged below the first display area;

the display panel according to the above embodiment is disposed in the first display area, and each of the at least one display area is used for displaying a dynamic or static picture.

Optionally, the at least one display area further comprises a second display area; the display panel arranged in the first display area is a PMOLED display panel or an AMOLED display panel, and the display panel arranged in the second display area is an AMOLED display panel.

The present embodiment further provides a display terminal, including:

an apparatus body having a device region;

the display screen according to the above embodiment is covered on the device body;

the device area is located below the first display area, and a photosensitive device for collecting light through the first display area is arranged in the device area.

Optionally, the device region is a trenched region; and the photosensitive device comprises a camera and/or a light sensor.

The technical scheme of the invention has the following advantages:

(1) in the display panel provided by the embodiment of the invention, the film layers are provided with the graphical structures, the first film layer in the film layers is provided with the groove, and the groove is internally provided with the compensation layer; when external incident light enters the display panel in a direction perpendicular to the surface of the substrate, a path of the light passing through the groove of the first film layer and the compensation layer is a first path, and the difference of optical paths between the first path and the second path is an integral multiple of the wavelength of the external incident light by arranging the compensation layer and controlling the thickness and the refractive index of the compensation layer. In the scheme, the difference of the optical paths between the two paths is an integral multiple of the wavelength of the light, so that the phase difference is zero after the light rays are emitted from the display panel through the two paths. Because the phase difference generated after the light rays with the same phase pass through the display panel is one of the important reasons for the occurrence of diffraction, by adopting the scheme in the embodiment, after the light rays with the same phase pass through the display panel through two paths, the phase is still the same, the phase difference can not be generated, the diffraction phenomenon caused by the phase difference is eliminated, the image distortion caused by the diffraction can not be generated after the light rays pass through the display panel, the definition of the image perceived by the camera behind the display panel is improved, the photosensitive element behind the display panel can obtain clear and real images, and the full-screen display is realized.

(2) In the display panel provided in the embodiment of the invention, the path of light passing through the display panel is a plurality of paths, the number of the paths is determined according to the type of the path through which light rays vertical to the display panel pass when passing through the display panel, and different paths include different film layers. When there are multiple paths, the difference between the optical paths formed by two paths through which the incident light passes is an integer multiple of the wavelength of the incident light, and in a preferred embodiment, there are multiple paths, such as three, four, or five paths, where the difference between the optical paths formed by any two paths is an integer multiple of the wavelength of the incident light. Thus, the diffraction of the light passing through the paths after passing through the display panel can be effectively reduced, and the more paths satisfying the conditions, the weaker the diffraction phenomenon of the light after passing through the display panel. As a most preferable scheme, the difference between the optical paths formed by the light passing through any two paths in all the paths is an integral multiple of the wavelength of the incident light. Therefore, the phase difference caused by the phase difference after the light passes through the display panel can be eliminated, and the diffraction phenomenon can be greatly reduced.

(3) The display panel in the embodiment of the invention may be a PMOLED or an AMOLED, and according to the difference of the film layering structure of the display panel, different paths may be formed when light passes through the display panel, and by adjusting the thickness and/or refractive index of one film layer in a certain path, the difference between the optical path of the light passing through the path and the optical path of one or more other paths is an integral multiple of the wavelength of the light. Specifically, the thickness of the film layer is adjusted as required, and if the thickness cannot be adjusted under the condition that the performance requirement is met, the material of the film layer can be adjusted, so that the refractive index of the film layer is changed, and the purpose is achieved.

(4) The display panel in the embodiment of the invention can preferentially adjust the thickness of the pixel limiting layer or the thickness of the electrode layer, is easy to adjust because the thickness of the pixel limiting layer is thicker than other film layers, and adjusts the optical path of light passing through the path by adjusting the thickness of the pixel limiting layer on the premise of meeting the performance requirement. In addition, the material of the pixel defining layer may be adjusted to change the refractive index, and the optical path length of light passing through the path may be adjusted by adjusting the refractive index of the pixel defining layer, thereby reducing diffraction of light after passing through the display panel.

(5) The embodiment of the invention also provides a display screen and a display terminal with the display screen, wherein the display panel is adopted, and the photosensitive elements such as a camera, a photosensitive element and the like are arranged below the display panel.

Drawings

In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the embodiments or the prior art will be briefly described below, and it is obvious that the drawings in the following description are some embodiments of the present invention, and other drawings can be obtained by those skilled in the art without creative efforts.

FIG. 1 is a diagram of a display panel according to an embodiment of the present invention;

FIG. 2 is a structural diagram of a display panel according to another embodiment of the present invention;

FIG. 3 is a structural diagram of a display panel according to another embodiment of the present invention;

FIG. 4 is a structural diagram of a display panel according to another embodiment of the present invention;

FIG. 5 is a structural diagram of a display panel according to another embodiment of the present invention;

FIG. 6 is a diagram illustrating a structure of a display panel with light passing through according to another embodiment of the present invention;

FIG. 7 is a structural diagram of a display panel according to another embodiment of the present invention;

FIG. 8 is a schematic structural diagram of a cathode of a display panel according to an embodiment of the present invention;

FIG. 9 is a schematic diagram of a structure of light passing through a cathode in an embodiment of the present invention;

FIG. 10 is a schematic structural diagram of a display panel according to an embodiment of the present invention;

FIG. 11 is a schematic structural diagram of a display panel according to another embodiment of the present invention;

FIG. 12 is a schematic structural diagram of a display panel according to another embodiment of the present invention;

FIG. 13 is a schematic structural diagram of a display panel according to another embodiment of the present invention;

FIG. 14 is a schematic structural diagram of a display screen in an embodiment of the invention;

fig. 15 is a schematic diagram of a terminal structure in an embodiment of the present invention;

FIG. 16 is a schematic view of an apparatus body in an embodiment of the present invention;

the reference numbers are as follows:

1-substrate, 2-first film layer, 3-second film layer, 001-substrate, 002-stack, 003-planarization layer, 0041-conductive line, 0042-anode layer, 005-pixel definition layer, 0051-support layer, 006-light emitting structure layer, 007-cathode layer, 008-light extraction layer, 009-vacuum gap layer, 010-glass encapsulation layer; 011-an organic material encapsulation layer, 012-an inorganic material encapsulation layer, 301-a groove, 302-a groove, 161-a first display region, 162-a second display region; 810-device body, 812-slotted zone, 814-non-slotted zone, 820-display screen, 930-camera.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention more apparent, the present invention is described in further detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention.

In the description of the present invention, it is to be understood that the terms "center", "lateral", "upper", "lower", "left", "right", "vertical", "horizontal", "top", "bottom", "inner" and "outer" etc. indicate orientations or positional relationships based on those shown in the drawings, and are only for convenience of description and simplicity of description, and do not indicate or imply that the referenced devices or elements must have a particular orientation, be constructed in a particular orientation, and be operated, and thus, are not to be construed as limiting the present invention. Further, when an element is referred to as being "formed on" another element, it can be directly connected to the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. In contrast, when an element is referred to as being "directly on" another element, there are no intervening elements present.

As described in the background, the full-screen of the prior art is not a real full-screen, but in the course of research, it was found that when a display panel is directly covered on a photosensitive device such as a camera, the display panel above the photosensitive device such as the camera is required to have high light transmittance, but the inventor further found that when the photosensitive device such as the camera is disposed below a transparent display panel, the photographed picture is blurred. Further, the inventor researches and discovers that the root cause of the problem is that due to the existence of the patterned film structures in the display screen, external light is diffracted after passing through the patterned film structures, and thus the photographing is blurred.

Further, the inventors found that the cross-sectional structures of the regions with the patterned film layer and the regions without the patterned film layer are different, so that the light path is different when the light enters the display screen and reaches the photosensitive element. When light passes through different areas of the transparent screen, different film layer structures generate difference values between optical paths of the light due to the difference of the refractive index and the thickness. When light passes through the different regions, the light originally having the same phase generates a phase difference, which is one of the important reasons for generating diffraction, and the phase difference causes an obvious diffraction phenomenon, so that diffraction fringes are generated after the light passes through the display panel, and a photographed picture is distorted and blurred.

The embodiment provides a display panel, as shown in fig. 1, which includes a substrate 1, and a first film layer 2 and a second film layer 3 sequentially disposed on the substrate 1, wherein the first film layer 2 has a patterned structure, and the second film layer 3 is a film layer disposed above the first film layer 2. Because the second film layer has a patterned structure, a plurality of light-permeable paths are formed in the display panel, and each path comprises a different film layer. In the present embodiment, a path a and a path b, which are alternatively referred to as a first path and a second path, are formed in the display panel, and the path in this application refers to a path through which external incident light enters the display panel in a direction perpendicular to the substrate surface, and the path through which light passes through the display panel refers to a path through which light passes perpendicular to the substrate surface. In this embodiment, the path a and the path b include different film layers, the path a includes the second film layer 3, the first film layer 2, and the substrate 1, and the path b includes the second film layer 3 and the substrate 1. Wherein the difference of the optical paths of the path a and the path b through which the light passes is an integer multiple of the wavelength of the light.

The optical path is equal to the refractive index of the medium multiplied by the light propagation path in the medium, and the calculation formula of the optical path is that the optical path is equal to the refractive index × path, and according to the calculation formula, the refractive indexes of the light in the substrate 1, the first film layer 2 and the second film layer 3 are n in sequence₁、n₂、n₃The thickness of the substrate 1 is d₁The thickness of the first film layer is d₂The second film layer has a distance d in the path a_aThe second film layer has a distance d in the path b_bIn the present embodiment, d₂+d_a＝d_bThe optical path length L when the wavelength of light is λ_a＝n₁×d₁+n₂×d₂+n₃×d_a；L_b＝n₁×d₁+n₃×d_b(ii) a The difference between the optical path lengths of path a and path b is L_a-L_bX is an integer, including positive, negative, or zero. The light here may be any monochromatic light in visible light or white light. In this example, L is selected_a-L_bIs 0, i.e. two waysThe optical path of the optical path is 0, and compared with integral multiple, the optical path is better in operation and better in implementation.

The display panel in this scheme, because the graphical structure has in its rete, can have two different routes when light passes display panel, through the thickness of rationally setting up first rete and second rete, the refracting index of rationally selecting first rete and second rete for the difference of the optical path between two routes is the integral multiple of the wavelength of light. Since the difference between the two paths is an integral multiple of the wavelength of the light, the phase difference is zero when the light exits the display panel through the two paths. Because the phase difference generated after the light rays with the same phase pass through the display panel is one of the important reasons for the occurrence of diffraction, by adopting the scheme in the embodiment, after the light rays with the same phase pass through the display panel through two paths, the phase is still the same, the phase difference can not be generated, the diffraction phenomenon caused by the phase difference is eliminated, the image distortion caused by the diffraction can not be generated after the light rays pass through the display panel, the definition of the image perceived by the camera behind the display panel is improved, the photosensitive element behind the display panel can obtain clear and real images, and the full-screen display is realized.

As another embodiment, the film layer may be a plurality of film layers, one or more of the film layers may have a patterned structure, so that when light vertically passes through the display panel, a plurality of paths are formed, each path includes different film layers, and the difference of the optical paths of the light passing through at least two of the paths is an integer multiple of the wavelength of the light, so as to reduce the diffraction phenomenon of the light passing through the two paths. In further arrangements, there may be multiple paths such as three, four, five paths, where any two paths form optical paths that differ by an integer multiple of the wavelength of the incident light. Therefore, the diffraction of the light passing through the paths after passing through the display panel can be effectively reduced, and the more paths meeting the conditions, the weaker the diffraction phenomenon of the light after passing through the display panel. As a further preferable mode, after the external incident light enters the display panel in a direction perpendicular to the substrate surface and passes through any two of the plurality of paths, the difference of the obtained optical paths is an integral multiple of the wavelength of the external incident light. Therefore, the phase difference caused by the phase difference after the light passes through the display panel can be eliminated, and the diffraction phenomenon can be greatly reduced.

As a specific embodiment, the display panel in this embodiment is an AMOLED display panel, and as shown in fig. 2, the display panel includes a substrate 001, a stack 002, a planarization layer 003, a wire 0041, an anode layer 0042, a pixel defining layer 005, a light emitting structure layer 006, and a cathode layer 007.

The substrate 001 here may be a rigid substrate, such as a transparent substrate like a glass substrate, a quartz substrate, or a plastic substrate; the substrate 1 may also be a flexible transparent substrate, such as a PI film, to improve the transparency of the device. Since the substrate is the same in all paths through which light passes perpendicularly, the substrate has no substantial effect on the difference between the optical paths through which light passes.

The substrate 001 is provided with a stack 002, where the stack forms a pixel circuit, specifically, the stack includes one or more switching devices and a capacitor, and the plurality of switching devices are connected in series or in parallel as needed, for example, the pixel circuits such as 2T1C and 7T1C, which is not limited in this embodiment. The switching device may be a thin film transistor TFT, which may be an oxide thin film transistor or a low temperature polysilicon thin film transistor (LTPS TFT), and the thin film transistor is preferably an indium gallium zinc oxide thin film transistor (IGZO TFT). In another alternative embodiment, the switch device may also be a Metal-Oxide-Semiconductor Field-Effect Transistor (MOSFET), or other elements with switch characteristics in the prior art, such as an Insulated Gate Bipolar Transistor (IGBT), and so on, as long as the electronic elements that can implement the switch function in the present embodiment and can be integrated into the display panel fall within the protection scope of the present invention.

Since the pixel driving circuit includes various devices, a multi-layered film structure including a source electrode, a drain electrode, a gate insulating layer, an active layer, an interlayer insulating layer, etc., is also formed, and each film layer forms a patterned film layer structure. In different paths, the paths through which light passes are different, and therefore, the optical path lengths of the paths through which light passes can be adjusted by adjusting the thicknesses or refractive indexes of the film layers in the pixel circuit. In addition to adjusting the film layers on each path in the stack 002, other film layers may also be adjusted in combination to work together to adjust the optical path length of light through the path.

A planarization layer 003 is provided on the stacked layer 002, and the planarization layer 003 forms a flat plane, which facilitates the provision of electrodes, wires, and the like. Since the laminate 002 has a patterned structure, the planarization layer 003 has different thicknesses at different positions, and the optical lengths of different paths can be adjusted by adjusting the thicknesses and refractive indices of the planarization layer at different positions.

An anode layer 0042 and a conductive line 0041 are provided on the planarization layer 003. The anode layer 0042 and the conductive line 0041 in fig. 2 are the same layer, and in other embodiments, the anode layer 0042 and the conductive line 0041 may be different layers separately prepared, and the conductive layer includes at least one of a SCAN line, a data line, a power line, and a reset line, wherein the SCAN line may include a SCAN line and an EM line, the data line is Vdata, the power line is VDD or VSS, and the reset line is Vref. The conductive layer may be one or more layers of conductive lines disposed on the planarization layer, and the conductive lines may be multiple layers disposed in spaced, intersecting relation. The anode layer 0042 and the conductive line 0041 may be made of a transparent conductive material, and may be made of Indium Tin Oxide (ITO), Indium Zinc Oxide (IZO), or silver-doped indium tin oxide (Ag + ITO), or silver-doped indium zinc oxide (Ag + IZO). Because the ITO process is mature and the cost is low, the conductive material is preferably indium zinc oxide. Furthermore, in order to reduce the resistance of each conductive trace on the basis of ensuring high light transmittance, the transparent conductive material is made of materials such as aluminum-doped zinc oxide, silver-doped ITO, or silver-doped IZO.

The thickness and refractive index of the anode layer 0042 and the conductive line 0041 can be adjusted, and the optical path length of light passing through the path is adjusted by adjusting the thickness or the refractive index or both, so that the difference between the optical path lengths with other paths satisfies the above condition. When the anode layer 0042 is made of ITO, the thickness thereof is generally 20 nm to 200 nm, and the thickness of the ITO layer can be adjusted within this range. When the conductive line 0041 and the anode layer 0042 are separately prepared, the thickness and the refractive index thereof may be separately adjusted, and if the wire is multilayered, the thickness and/or the refractive index of each layer of the wire may be separately adjusted. If formed of the same layer, the thickness and refractive index of the conductive line 0041 and the anode layer 0042 can be adjusted only at the same time.

In this embodiment, the conductive line 0041 and the anode layer 0042 are disposed on the same layer, and in other embodiments, when the conductive line 0041 is a multi-layer line, there may be a layer disposed on the same layer as the anode layer in the conductive line, and the materials of the conductive line and the anode layer may be the same or different.

A pixel defining layer 005 for defining the position of a pixel is provided on the anode electrode layer 0041, and a pixel opening is formed on the pixel defining layer 005. The thickness of the pixel defining layer 005 is relatively large, and its adjustable range is somewhat large. The thickness of the pixel defining layer 005 is generally 0.3 to 3 μm, and the thickness of the pixel defining layer 005 can be adjusted within this range. It is preferable to adjust the thickness of the pixel defining layer 005 so that the optical path length satisfies the above-described requirements. If the thickness of the pixel defining layer 005 alone cannot be adjusted to meet the requirement, the material of the pixel defining layer 005 may be adjusted in combination to adjust the refractive index thereof. The thickness and refractive index of the pixel defining layer 005 may also be adjusted at the same time, thereby adjusting the optical path length of light passing through the path.

In some embodiments, a support layer 0051 is provided above the pixel defining layer 005 for supporting the mask during the production process. As shown in fig. 3, if the support layer 0051 is a transparent structure, for a light path passing through the support layer 0051, the optical path length of the path can also be adjusted by adjusting the thickness and refractive index of the support layer 0051. Since the pixel driving circuit structure in the stack 002 is complicated, and the adjustment of each film layer is also complicated, the supporting layer 0051 may be further configured as a light-tight structure, as shown in fig. 4, for example, a black light-tight structure (a black light-tight supporting layer SPC may be selected), and one or more TFT structures in the pixel circuit may be disposed under the black supporting layer 0051 by using the black light-tight structure to shield, so that light passing through the display panel may not pass through the multiple film layer structures in the pixel circuit, and the process of adjusting the optical paths of different paths is simplified while avoiding the occurrence of diffraction caused by the part of the patterning structure.

A pixel opening is formed in the pixel defining layer 005, and a Light emitting structure layer 006 is disposed in the pixel opening and above the pixel defining layer 005, where an OLED (Organic Light-emitting diode) is used. The light emitting structure layer 006 generally includes a light extraction layer, an electron injection layer, an electron transport layer, a hole blocking layer, a light emitting layer, a hole transport layer, and a hole injection layer. The remaining layers, except the light-emitting layer, are arranged over the entire surface, so that they have no effect on the difference between the optical paths of the light paths. The light-emitting layer is arranged in the pixel opening, and different light-emitting sub-pixels comprise different light-emitting materials of the light-emitting layer, including a red light-emitting material, a blue light-emitting material and a green light-emitting material. The optical path of light passing through the path can also be adjusted by adjusting the thickness or refractive index of the light-emitting material in the light-emitting layer, or both.

Since the overall thickness of the light emitting structure layer 006 is small, the adjustable range of the light emitting layer is small, and the light path can be adjusted by matching with other film layers, so that the light path can be prevented from being adjusted independently to meet the requirements.

A cathode layer 007 is disposed over the light emitting structure layer 006. Since the cathode layer is arranged over the entire surface, the cathode layer has no substantial effect on the difference between the optical paths of light passing through the paths. A light extraction layer 008 may also be disposed over the cathode layer 007, as shown in fig. 5, and the light extraction layer 008 may also be omitted in some embodiments.

An encapsulation layer is provided outside the light extraction layer 008. The packaging layer can be a hard screen package or an organic film package. The display panel in fig. 5 is a hard screen adopting a Frit sealing (i.e., Frit sealing) manner, the sealing layer includes a low vacuum gap layer 009 and a sealing substrate 010, an inert gas is filled in the vacuum gap layer, and the sealing substrate is sealing glass.

In the display panel shown in fig. 5, a plurality of light paths may be formed when light passes through the display panel. Because the display panel has two different modes of a top light-emitting structure and a bottom light-emitting structure, if the display panel is of the top light-emitting structure, one side of the package faces outwards, the substrate is arranged inside, and the camera is arranged below the substrate. If the display panel is of a bottom light-emitting structure, one side of the substrate faces outwards, one side of the package faces inwards, and the camera is arranged below the package glass. The display panel is a transparent display panel, and when a camera arranged below the display panel works, pixels in a camera area do not emit light, so that external light can conveniently penetrate through the display panel.

The path of the light through the panel is the same regardless of whether it is a top emission structure or a bottom emission structure. In this embodiment, a top emission structure is taken as an example, light is incident into the display screen from one side of the sealing glass 010, and when the light passes through the display panel, various paths are formed. As shown in fig. 6.

Path a includes passing through the package substrate 010, the vacuum gap layer 009, the light extraction layer 008, the cathode layer 007, the light emitting structure layer 006, the anode layer 0042, the planarization layer 003, the stack layer 002, and the substrate 001 in this order.

Path B includes sequentially passing through the package substrate 010, the vacuum gap layer 009, the light extraction layer 008, the cathode layer 007, the light emitting structure layer 006, the pixel defining layer 005, the planarization layer 003, the stack layer 002, and the substrate 001.

The path C sequentially passes through the package substrate 010, the vacuum gap layer 009, the light extraction layer 008, the cathode layer 007, the light emitting structure layer 006, the pixel defining layer 005, the wiring layer 0041, the planarization layer 003, the stack layer 002, and the substrate 001.

Path D sequentially passes through the package substrate 010, the vacuum gap layer 009, the light extraction layer 008, the cathode layer 007, the light emitting structure layer 006, the pixel defining layer 005, the anode layer 0042, the planarization layer 003, the stack layer 002, and the substrate 001.

The thickness of the low vacuum gap layer in the path A is larger than that of the low vacuum gap layer in other paths. For the path C and the path D, if the anode layer 0042 and the wire layer 0041 are disposed in the same layer, the path C and the path D are the same, and if the anode layer 0042 and the wire layer 0041 are different layers prepared separately, the path C and the path D are not the same.

The optical path of the light passing through the path A is L_AThe optical path of the light ray passing through the path B is L_BThe optical path of the light ray passing through the path C is L_CThe optical path of the light ray passing through the path D is L_DAdjusting the thickness or refractive index of one or more of the above layers to make L_A、L_B、L_C、L_DOne or more of the differences between the wavelengths are satisfied as integer multiples of the wavelength.

Here, with L_A、L_B、L_CFor the purpose of example only,

L_A-L_B＝ⅹ₁λ；ⅹ₁are integers.

Or L_B-L_C＝ⅹ₂λ；ⅹ₂Are integers.

Of course, L may be satisfied simultaneously_A-L_B＝ⅹ₁λ，L_B-L_C＝ⅹ₂λ, wherein x₁、ⅹ₂Is an integer and can be a positive or negative integer or zero. This makes it possible to satisfy that the differences between the optical paths between the path a, the path B, and the path C are all integer multiples of the wavelength of light. Thus, after the light passes through the path A, the path B and the path C, the phase of the incident light is the same as that of the emergent light, and the diffraction phenomenon can be greatly reduced.

The above optical path L_A、L_B、L_CThe calculation formula of (a) is as follows:

L＝d₁*n₁+d₂*n₂+…+d_i*n_iwhere L is the optical path length, i is the number of structured layers in the path through which the light passes, d₁，d₂，…，d_iThe thickness of each structural layer in the path through which light passes; n is₁，n₂，…，n_iThe refractive index of each structural layer in the path through which the light passes.

By measuring the thickness and refractive index of the layers, the optical path length of each path can be calculated.

In order to adjust each film layer in the path to satisfy the requirement of the difference between the optical paths, it is first necessary to determine which film layers in the layer affect the optical paths, and although more film layers pass through each path, when calculating the difference between the optical paths, if the same film layers exist in the paths and the materials and thicknesses of the film layers are the same, the difference between the optical paths between the two paths is not affected. Only layers of different materials, or layers of the same material but different thicknesses, will affect the difference between the optical path lengths.

Specifically, for the path a and the path B, the path C, and the path D, the light emitting layer is included in the light emitting structure layer 006 in the path a, and the light emitting layer is not included in the light emitting structure layer 006 in the path B, the path C, and the path D, and by adjusting the thickness and/or refractive index of the light emitting layer in the light emitting structure layer, the difference between the optical lengths of the path a and the path B, the path C, or the path D can be adjusted.

In addition, the substrate 001, the package substrate 010, the light extraction layer 008, and the cathode layer 007 are made of the same material and have the same thickness as the path a and the path B, and therefore, the thickness is not considered. The layers that distinguish path a from path B are vacuum gap layer 009 (both path a and path B but different thicknesses), pixel defining layer 005 (both path B), and anode layer 0042 (both path a), and since vacuum gap layer 009 has the same thickness in path a and path B as pixel defining layer 005, the thickness of pixel defining layer 005 is adjusted, and the difference in thickness of vacuum gap layer 009 in path a and path B is adjusted accordingly. It can be seen that the main film layers affecting paths a and B are the anode layer 0042 and the pixel defining layer 005. By adjusting the thickness and/or refractive index of the anode layer 0042, or the thickness and/or refractive index of the pixel defining layer 005, or both the anode layer 0042 and the pixel defining layer 005, the difference between the optical paths of the path a and the path B is an integral multiple of the wavelength.

Of course, in the above-mentioned path a and path B, the light emitting layer inside the light emitting structure layer 006 is different, the light emitting layer inside the pixel opening may be different from the light emitting layer outside the pixel opening, and the optical path of the path may be further adjusted by adjusting the light emitting layer. In addition, the film layer structures of the planarizing layer 003 and the stacked layer 002 located in the path a and the path B may be different from each other, and the optical length may be adjusted by adjusting the thickness and/or the refractive index of the different film layers. Because the pixel circuit in the inorganic insulating layer 002 has a complicated structure, the black supporting layer 0051 may be disposed above the switching device of the pixel circuit, so that light does not pass through the pixel circuit, thereby avoiding the influence of light on the performance of the pixel circuit, and avoiding the problem of light diffraction caused by the existence of each film layer of the pixel circuit.

For paths B and C, the layers included therein are not described in detail, and there is a main difference that a conductive line 0041 is included in path C, and the thickness of the pixel defining layer 005 in path C is different from that of the pixel defining layer 005 in path B, so that the difference between the optical paths of path B and path C satisfies an integral multiple of the wavelength by adjusting the thickness and the refractive index of the conductive line 0041. The wire in the path C may also be a double-layer wire, and includes a first conductive wire and a second conductive wire, the first conductive wire and the first electrode layer are disposed on the same layer, the second conductive wire is disposed between the planarization layer and the substrate, and the difference between the optical paths obtained by adjusting the thicknesses and/or refractive indexes of the first conductive wire and the second conductive wire after the external incident light passes through the path B and the path C is an integral multiple of the wavelength of the external incident light.

The difference between the paths a and C is the encapsulation layer within the recess, the pixel defining layer 005, the anode layer 0042 and the wiring layer 0041, the thickness of the encapsulation layer within the recess is determined by the thickness of the pixel defining layer 005, and thus the thickness or refractive index of the pixel defining layer 005 can be adjusted or both the thickness and refractive index of the pixel defining layer 005 can be adjusted. If the anode layer 0042 and the wire layer 0041 are the same layer, the anode layer 0042 and the wire layer 0041 have no substantial influence on the difference between the optical paths of the path a and the path C, and if the anode layer 0042 and the wire layer 0041 are different layers, the difference between the optical paths of the path a and the path C may also be adjusted by adjusting the thicknesses and/or refractive indices of the anode layer 0042 and the wire layer 0041.

The difference between the paths a and D is the encapsulation layer and the pixel defining layer 005 in the recess, and the thickness of the encapsulation layer in the recess is determined by the thickness of the pixel defining layer 005, so that the difference between the optical lengths of the paths a and D can be adjusted by adjusting the thickness or refractive index of the pixel defining layer 005 or adjusting the thickness and refractive index of the pixel defining layer 005 at the same time.

The difference between the paths B and D is between the pixel defining layer 005 and the anode layer 0042, and thus the thickness and/or refractive index of the pixel defining layer 005 and the anode layer 0042 may be adjusted to adjust the difference between the optical paths of the paths B and D.

The difference between the paths C and D is the anode layer 0042 and the wire layer 0041, if the anode layer 0042 and the wire layer 0041 are the same layer, the optical path lengths for the paths a and C are the same, and there is no difference between the optical path lengths, and if the anode layer 0042 and the wire layer 0041 are different layers, the difference between the optical path lengths of the paths C and D can also be adjusted by adjusting the thickness and/or refractive index of the anode layer 0042 and the wire layer 0041.

When the support layer 0051 is a transparent structure, the path B, the path C, and the path D may further include a support layer, and the path B, the path C, and the path D may further include a TFT structure layer forming a pixel circuit, and since the TFT structure layer includes a plurality of layers, different layers of the TFT structure may appear in the path B, the path C, and the path D according to specific structures. Since the support layer 0051 is disposed on the pixel defining layer 005, the support layer 0051 is not present in the path a.

The conductive line in the above embodiments may be a single-layer line or a multi-layer line, and the conductive line includes at least one of a SCAN line, a data line, a power line, and a reset line, where the SCAN line may include a SCAN line and an EM line, the data line is Vdata, the power line is VDD or VSS, and the reset line is Vref. In other embodiments, the conductive line may also be a double-layer line, for example, the conductive line includes a first conductive line and a second conductive line, the first conductive line and the anode layer are disposed on the same layer, the second conductive line is disposed between the planarization layer and the substrate, the first conductive line and the second conductive line are the same as the first electrode layer in material, and the encapsulation layer, the second electrode layer, the pixel defining layer, the first conductive line, and the substrate form a light path; the packaging layer, the second electrode layer, the pixel limiting layer, the second conductive circuit and the substrate can also form a light path; the packaging layer, the second electrode layer, the pixel defining layer, the first conductive circuit, the second conductive circuit and the substrate can also form a light path at the part where the first conductive circuit and the second conductive circuit are projected and overlapped. In a specific embodiment, when the projection of the conductive line on the substrate overlaps with the projection of the first electrode layer on the substrate, the path through which light passes may further include an encapsulation layer, a second electrode layer, a light emitting layer, a first electrode layer, a second conductive line, and a substrate.

With reference to fig. 6, on the basis of the above embodiment, the AMOLED display panel disclosed in another embodiment of the present invention preferably adjusts the thickness of the anode layer in the path a and the thickness of the pixel defining layer in the path C, so that the optical paths of the path a and the path C are the same.

In addition to the above hard encapsulation, a thin film encapsulation may be adopted, as shown in fig. 7, the thin film encapsulation is performed outside the light extraction layer 008 to form a thin film encapsulation layer, the thin film encapsulation layer includes an inorganic material encapsulation layer 012 and an organic material encapsulation layer 011, and the inorganic material encapsulation layer 012 is disposed on the whole surface and has a uniform thickness, so that there is no influence on the difference between the optical lengths of the paths. The organic material encapsulation layer 011 fills the pixel openings to form a whole layer of encapsulation layer. Therefore, the thicknesses of the organic material encapsulation layers are different in different paths, so that the adjustment of the optical path of light passing through the path can be realized by adjusting the thickness of the organic material encapsulation layer 011 in the pixel opening or the refractive index of the organic material encapsulation layer. The thickness and refractive index of the organic material encapsulation layer can also be adjusted simultaneously or jointly in combination with other ways. The thickness of the organic material packaging layer in the path A is larger than that of the organic material packaging layer in other paths.

In summary, since there are multiple paths that can be formed when light passes through the display panel, for example, the paths include the encapsulation layer, the second electrode layer, the light emitting structure layer, the first electrode layer, and the substrate; and/or the path comprises an encapsulation layer, a second electrode layer, a light emitting structure layer, a pixel defining layer and a substrate; and/or the path includes an encapsulation layer, a second electrode layer, a light emitting structure layer, a pixel defining layer, a conductive line, and a substrate. More paths can be formed if the distribution of a plurality of conducting wires at different positions and the distribution of pixel circuits are considered. According to the idea of the invention, as long as the thickness and/or refractive index of one or more film layers with difference in different paths are adjusted to make the difference between the optical paths of at least two paths satisfy the integral multiple of the wavelength of light, the diffraction of the light after passing through the two paths can be reduced, and the more paths satisfying the conditions, the better the diffraction can be reduced. Optionally, the thickness and/or refractive index of one or more of the encapsulation layer, the light emitting structure layer, the first electrode layer, the pixel defining layer, the insulating layer, and the conductive line are adjusted such that one or more of the difference between the optical paths is an integer multiple of the wavelength of the light. The specific adjustment manners have been described in the above embodiments, and are not described herein again.

In another embodiment, the display panel is a PMOLED, and since the PMOLED and the AMOLED have different structures, different paths are formed when light passes through the PMOLED. As shown in fig. 8, the PMOLED includes a substrate 110, an anode layer 120, a pixel defining layer 130, an isolation pillar 140, a light emitting structure layer 150, and a cathode layer 160, the anode layer 120 includes a plurality of first electrodes, and a plurality of anodes are regularly arranged on the substrate 110. A light emitting structure layer 150 is formed on the anode, and a cathode layer 160 is formed on the light emitting structure layer 150. The isolation pillar 140 is formed on the pixel defining layer 130 and disposed between adjacent first electrodes. The isolation pillars 140 are used to space the cathodes of two adjacent sub-pixel regions, as shown in fig. 8, the isolation pillars 140 are of an inverted trapezoid structure and made of a transparent material, such as a transparent photoresist. The surface of the isolation pillar 140 is higher than the surface height of the adjacent region, so that when the cathode is prepared on the surface of the display panel, the cathode formed above the isolation pillar 140 is disconnected from the cathode on the adjacent pixel region, thereby realizing the isolation of the cathodes of the adjacent sub-pixel regions, and finally ensuring that each sub-pixel region can be normally driven. Since the isolation pillars 140 are further included in the PMOLED, the isolation pillars 140 are further included in a part of the path through which light passes. As shown in fig. 9, the path C includes the cathode layer 160, the isolation pillar 140, the pixel defining layer 130, and the substrate 110, and the path D includes the cathode layer 160, the light emitting structure layer 150, the anode layer 120, and the substrate 110. In the path C and the path D, different film layers include the isolation pillars 140, the pixel defining layer 130, the light emitting structure layer 150, and the anode layer 120, and by adjusting the thickness and/or refractive index of one or more of the layers, the difference between the optical paths of light passing through the path C and the path D may be adjusted. In each path, the adjustment of the optical path length traversed by the light can be achieved by adjusting the thickness and/or refractive index of the film layers that differ. The adjustment modes of the remaining paths are the same as those in the above embodiment, and are not described again.

The path a, the path B, the path C, and the path D in the above embodiments may also be referred to as a first path, a second path, a third path, a fourth path, and the like.

As a specific implementation mode, the light can be selected to be visible light, the wavelength of the light is 380-780 nm, preferably the wavelength of the light is 500-600 nm, and the light (i.e. green light) in the range is sensitive to human eyes. Since the human eye is most sensitive to green, the incident light can be selected based on green light, i.e. when adjusting the optical path length through each path, λ can be selected to be 500 nm to 560 nm, such as 540 nm, 550 nm, 560 nm, of the green light. Since the green light has a wavelength between red and blue, the green light can be selected to be compatible with both red and blue light.

In this embodiment, a display panel is further provided, where on the basis of the display panel shown in fig. 1, a groove 301 is formed on the second film layer 3, as shown in fig. 10, a compensation material is filled in the groove 301 to form a compensation layer, the compensation material may be an organic transparent material, such as photoresist, and a plurality of paths through which light passes are formed in the display panel, where a structure layer through which each path passes is different. As in fig. 9, path a includes the second film layer 3, the first film layer 2, and the substrate 1, and path e includes the groove 301, the second film layer 3, and the substrate 1. The optical path of the light passing through the path e is a first optical path, and the optical path of the light passing through the path a is a second optical path. Since the compensation layer is disposed in the groove 301, the difference between the first optical path and the second optical path is an integral multiple of the wavelength of light by adjusting the thickness or the refractive index of the compensation layer or adjusting the thickness and the refractive index of the compensation layer at the same time.

In this embodiment, the refractive index of light in the substrate 1, the first film layer 2, and the second film layer 3 is n in this order₁、n₂、n₃The thickness of the substrate 1 is d₁The thickness of the first film layer is d₂Thickness in the groove is d₃Refractive index of n_eThe thickness of the second film layer in the path a is d_aThickness in path e is d_eAccording to a calculation formula, the optical length L_a＝n₁×d₁+n₂×d₂+n₃×d_a；L_e＝n_e×d₃+n₃×d_e(ii) a Then L is_a-L_bX is an integer including positive, negative and zero.

In this embodiment, the groove 301 is formed in the second film layer 3, and the optical path of the light passing through the path is adjusted by filling the groove 301 with the supplementary material, so that the difference between the optical path of the path and the optical paths of other paths satisfies the integral multiple of the wavelength, the phase difference of the light passing through the two paths is 0, and diffraction caused by the phase difference is avoided, thereby improving the clarity of the light passing through the transparent display panel, reducing the distortion degree, and satisfying the requirement of arranging photosensitive elements such as a camera under the transparent screen.

As some optional embodiments, when the second film layer 3 is provided with the groove, the path of the optical path is adjusted as needed to select a suitable position and a suitable depth, or a groove with a larger depth may be provided in advance, and when the material is filled in the groove, the thickness of the filling material is set as needed. One or more grooves are arranged according to needs, and the positions and the number are reasonably arranged according to needs.

In a preferred embodiment, the grooves are formed at specific positions, so that the difference of the optical paths of the light passing through any two paths in the display panel is an integral multiple of the wavelength of the light. Therefore, after the light passes through the display panel, phase differences can not be generated on all paths, and diffraction phenomenon caused by the phase differences can not be generated, so that diffraction is reduced.

In a specific embodiment, for an AMOLED display panel, the recess 301 may also be a pixel opening in the pixel defining layer, and the optical path of light passing through the path is adjusted by multiplexing the pixel opening and filling the compensation material in the pixel opening. As shown in fig. 11, the structure of the display panel is the same as that of the display panel shown in fig. 5, and the structure of the rest of the display panel has been described previously and will not be described again. In a pixel opening formed by the pixel defining layer 005, the light emitting structure layer 006, the cathode layer 007 and the light extraction layer 008 (optional) are sequentially arranged, the film layers are prepared by evaporation, one layer is evaporated at the bottom and the edge of the pixel opening, after the film layers are formed, the pixel opening still has a groove 301, and the depth of the groove 301 is equal to that of the pixel opening. A compensation material is provided in the recess 301 of the pixel opening, and the thickness of the compensation material may be less than or equal to the depth of the recess 301. In this scheme, the optical path of light through the path is adjusted by multiplexing the grooves formed in the pixel openings. The thickness of the compensation material filling in the recess may be less than the thickness of said recess. And adjusting the optical path of the light passing through the path by adjusting the thickness or the refractive index of the compensation material or adjusting the thickness and the refractive index of the compensation material simultaneously, so that the difference of the optical path and the optical paths of other paths is integral multiple of the wavelength of the light.

In the display panel shown in fig. 11, after the compensation material is filled in the hard encapsulation layer, a low vacuum gap layer is formed outside the light extraction layer 008 and the compensation material, and the outermost layer is an encapsulation substrate. The path of light passing through the compensation material in the display panel includes an encapsulation substrate 010, a vacuum gap layer 009, a compensation material, a light extraction layer 008, a cathode layer 007, a light emitting structure layer 006, an anode layer 0042, a planarization layer 003, a stack layer 002, and a substrate 001. The hard screen package is suitable for glass substrates to form a display panel of a hard screen.

In other embodiments, when a thin film encapsulation method is used, the compensation material disposed in the groove 301 of the pixel opening may be an encapsulation material, and the thin film encapsulation process is performed without using a separate processing process. As shown in fig. 12, the thin film encapsulation layer includes an inorganic material encapsulation layer 012 and an organic material encapsulation layer 011 disposed outside the light extraction layer 008. Since the inorganic material sealing layer 012 is formed by vapor deposition, the thickness is the same in each path through which light passes, and thus the difference between the optical paths is not affected. Because the organic material layer is mostly formed by ink-jet printing or evaporation film forming, and the thickness of different areas can be adjusted at will according to needs, the organic packaging material can flow and fill the groove 301 after film forming during packaging, and the whole organic material packaging layer 011 is formed. The organic material in the groove is used as a compensation material, the groove is filled, the thickness of the compensation material is equal to the thickness of the groove, the thickness or the refractive index or both of the organic material is filled, so that the optical path of the light ray passing through the groove 301 is adjusted, and the path of the light ray passing through the groove comprises: an organic material encapsulation layer 011, an inorganic material encapsulation layer 012, a light extraction layer 008, a cathode layer 007, a light emitting structure layer 006, an anode layer 0042, a planarization layer 003, a laminate 002, and a substrate 001. The thin film packaging mode is suitable for the flexible substrate.

As another embodiment, in the solution of fig. 11 or fig. 12, one or more grooves are formed in the pixel defining layer 005 or other film layers to adjust the optical path of the light passing through the grooves. As shown in fig. 13, on the basis of the structure of the display panel in fig. 12, one or more grooves 302 are provided in the pixel defining layer 005, the grooves 302 are filled with a compensation material, the thickness of the grooves 302 is set as needed, and the optical path length of light passing through the path is adjusted by adjusting the thickness or the refractive index of the compensation material or adjusting the thickness and the refractive index at the same time, so that the difference between the optical paths formed between the path and other paths satisfies an integral multiple of the wavelength.

As another combinable embodiment, the method for adjusting the thickness and/or the refractive index of each film layer described in the above embodiment may be combined with the method for adjusting by forming the groove in the present embodiment, and the difference between the optical paths between the two paths may be made to satisfy an integer of the wavelength.

As shown in fig. 14, the display screen includes a first display area 161 and a second display area 162, and both the first display area 161 and the second display area 162 are used for displaying a static or dynamic picture, where the first display area 161 is a display panel mentioned in any of the above embodiments, and the first display area 161 is located on the upper portion of the display screen. In the display panel, after the light passes through the display panel through at least two paths, phase difference can not be generated, and diffraction interference is reduced. If the phase of the light does not change after passing through all paths in the display panel, diffraction interference caused by phase difference can be avoided, and a camera below the screen can obtain clear and real image information.

In an alternative embodiment, the display screen may further include three or more display regions, for example, three display regions (a first display region, a second display region, and a third display region) are included, the first display region adopts the display panel mentioned in any of the above embodiments, and the second display region and the third display region adopt any display panel.

The embodiment also provides a display device which comprises the display screen covered on the device body. The display device can be a product or a component with a display function, such as a mobile phone, a flat panel, a television, a display, a palm computer, an ipod, a digital camera, a navigator and the like.

Fig. 15 is a schematic structural diagram of a display terminal in an embodiment, where the display terminal includes an apparatus body 810 and a display screen 820. The display 820 is provided on the apparatus body 810 and is interconnected with the apparatus body 810. The display 820 may be the display in any of the above embodiments, and is used to display static or dynamic pictures.

Fig. 16 is a schematic structural diagram of an apparatus main body 810 in an embodiment. In this embodiment, the device body 810 may have a slotted region 812 and a non-slotted region 814. Photosensitive devices such as cameras 930 and light sensors may be disposed in the slotted regions 812. At this time, the display panels of the first display area of the display 820 are attached together corresponding to the slotted area 812, so that the above-mentioned photosensitive devices such as the camera 930 and the optical sensor can collect external light through the first display area. Because the display panel in the first display area can effectively improve the diffraction phenomenon generated by the transmission of the external light through the first display area, the quality of the image shot by the camera 930 on the display equipment can be effectively improved, the distortion of the shot image caused by diffraction is avoided, and meanwhile, the accuracy and the sensitivity of the optical sensor for sensing the external light can also be improved.

Although the embodiments of the present invention have been described in conjunction with the accompanying drawings, those skilled in the art may make various modifications and variations without departing from the spirit and scope of the invention, and such modifications and variations fall within the scope defined by the appended claims.

Claims

1. A display panel comprises a substrate and a plurality of film layers sequentially arranged on the substrate, wherein at least one film layer has a graphical structure, and the display panel is characterized in that a groove is formed in a first film layer in the film layers, and a compensation layer is arranged in the groove; the display panel is internally provided with m light-permeable paths, m is an integer larger than or equal to 2, the paths are light-permeable paths vertical to the surface of the substrate, a first path in the m paths longitudinally penetrates through the groove and the compensation layer, and a second path in the m paths is different from a film layer included in the first path;

2. The display panel according to claim 1, wherein the difference between the optical paths of the external incident light entering the display panel in a direction perpendicular to the substrate surface and passing through any two of the m paths is an integer multiple of the wavelength of the external incident light.

3. A display panel as claimed in claim 1 or 2 characterized in that the difference between the optical path lengths of the two paths is 0.

4. The display panel according to claim 1 or 2, wherein the thickness of the compensation layer is less than or equal to the depth of the groove; the compensation layer is a transparent material layer.

5. The display panel according to claim 1 or 2, wherein the calculation formula of the optical length is as follows:

6. The display panel of claim 1, wherein the display panel is an AMOLED display panel or a PMOLED display panel, and the film layer comprises an encapsulation layer, a second electrode layer, a light emitting layer, a first electrode layer, a pixel defining layer;

7. The display panel of claim 6, wherein the display panel is an AMOLED display panel, the film layer further comprises conductive lines, the conductive lines are single-layer lines or multi-layer lines, and the conductive lines comprise at least one of scan lines, data lines, power lines, and reset lines;

8. The display panel according to claim 7, wherein the conductive line is a single-layer line, the conductive line is disposed on the same layer as the first electrode layer, the conductive line is made of the same material as the first electrode layer, and the fourth path and the second path include the same film layer and the same film thickness;

9. The display panel according to claim 8, wherein the conductive line is a dual-layer line including a first conductive line and a second conductive line, the first conductive line is disposed on the same layer as the first electrode layer, the second conductive line is disposed between a planarization layer and the substrate, the first conductive line and the second conductive line are made of the same material as the first electrode layer, and the fourth path includes an encapsulation layer, a second electrode layer, a pixel defining layer, the first conductive line and/or the second conductive line, and a substrate.

10. The display panel according to claim 9, wherein when a projection of the conductive line on the substrate overlaps a projection of the first electrode layer on the substrate, the path further includes a fifth path including the encapsulation layer, the second electrode layer, the light emitting layer, the first electrode layer, the second conductive line, and the substrate.

11. The display panel according to claim 6, wherein the difference in optical path lengths obtained after the external incident light enters the display panel in a direction perpendicular to the substrate surface and passes through the first path and the third path is an integer multiple of the wavelength of the external incident light.

12. The display panel of claim 7, wherein the display panel is an AMOLED display panel, and the film layer further comprises a support layer disposed on the pixel defining layer, a TFT structure layer for fabricating a pixel circuit;

13. The display panel of claim 6, wherein the display panel is an AMOLED display panel, and the film layer further comprises a support layer disposed on the pixel defining layer, a TFT structure layer for fabricating a pixel circuit; the supporting layer is an opaque structure, and the TFT structure layer is arranged below the supporting layer.

14. The display panel according to claim 6, wherein the display panel is a flexible screen or a hard screen adopting a thin film encapsulation method, the encapsulation layer comprises a thin film encapsulation layer, the thin film encapsulation layer comprises an organic material encapsulation layer, the compensation layer is made of the organic encapsulation material, and the thickness of the organic material encapsulation layer in the first path is greater than the thickness of the organic material encapsulation layers in the other paths.

15. The display panel of claim 6, wherein the display panel is a hard screen packaged by glass frit, the package layer comprises a vacuum gap layer and a package substrate, and the thickness of the low vacuum gap layer in the first path is greater than or equal to the thickness of the low vacuum gap layer in the other path.

16. The display panel according to any one of claims 6 to 15, wherein the difference between the optical paths of the externally incident light after passing through the two paths is an integral multiple of the wavelength of the externally incident light by adjusting the thickness and/or refractive index of one or more film layers having a difference between the two paths.

17. The display panel according to claim 1, wherein the wavelength of the externally incident light is 380 to 780 nm.

18. The display panel of claim 17, wherein the wavelength of the external incident light is 500-600 nm.

19. The display panel according to claim 18, wherein the wavelength of the externally incident light is 550 nm.

20. A display screen having at least one display area; the at least one display area comprises a first display area, and a photosensitive device can be arranged below the first display area;

the display panel as claimed in any one of claims 1 to 16 is disposed in the first display region, and each display region in the at least one display region is used for displaying a dynamic or static picture.

21. The display screen of claim 20, wherein the at least one display area further comprises a second display area; the display panel arranged in the first display area is a PMOLED display panel or an AMOLED display panel, and the display panel arranged in the second display area is an AMOLED display panel.

22. A display terminal, comprising:

an apparatus body having a device region;

a display screen as claimed in claim 20 or 21 overlaid on the device body;

23. The display terminal of claim 22, wherein the device region is a trenched region; and the photosensitive device comprises a camera and/or a light sensor.