CN110835756A - Preparation method for MCrAlY single crystal coating epitaxially grown on single crystal high-temperature alloy substrate - Google Patents
Preparation method for MCrAlY single crystal coating epitaxially grown on single crystal high-temperature alloy substrate Download PDFInfo
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- CN110835756A CN110835756A CN201911125525.7A CN201911125525A CN110835756A CN 110835756 A CN110835756 A CN 110835756A CN 201911125525 A CN201911125525 A CN 201911125525A CN 110835756 A CN110835756 A CN 110835756A
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C24/00—Coating starting from inorganic powder
- C23C24/08—Coating starting from inorganic powder by application of heat or pressure and heat
- C23C24/10—Coating starting from inorganic powder by application of heat or pressure and heat with intermediate formation of a liquid phase in the layer
- C23C24/103—Coating with metallic material, i.e. metals or metal alloys, optionally comprising hard particles, e.g. oxides, carbides or nitrides
- C23C24/106—Coating with metal alloys or metal elements only
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B19/00—Liquid-phase epitaxial-layer growth
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/52—Alloys
Abstract
A preparation method of a single crystal MCrAlY coating epitaxially grown on a single crystal superalloy substrate is provided, wherein the single crystal superalloy substrate is polished on the surface of a sample by using sand paper, and surface layer stress and oxides are removed; ultrasonically cleaning with acetone and drying; drying the MCrAlY powder in a drying oven, pressing into a sheet with a certain thickness by using a tablet press, and placing the sheet on the surface of the high-temperature alloy substrate; and cladding the powder sheet on the substrate by adopting electron beam cladding equipment to form a coating. The invention provides a new method for the surface epitaxial growth of the MCrAlY single crystal coating on the single crystal high-temperature alloy substrate, the method can prepare thicker single crystal coating with the same orientation as the substrate at one time, the mixed crystal structure in the coating is less, the substrate does not need to be preheated, and the like. The invention can be used for preparing the single crystal coating on all single crystal high temperature alloy substrates.
Description
Technical Field
The invention relates to a preparation method for an MCrAlY monocrystal coating epitaxially grown on a monocrystal superalloy substrate, belonging to the technical field of metal and alloy surface coatings.
Background
With the continuous increase of the working temperature of the gas turbine engine, the gas turbine blade of the gas turbine engine is required to have enough temperature bearing performance, and the single crystal high temperature alloy is widely applied to the manufacture of the gas turbine engine blade due to the excellent high temperature performance of the single crystal high temperature alloy. However, under high-temperature working conditions, the damping surface of the blade shroud of the single crystal turbine blade is easy to wear and oxidize, so a high-temperature wear-resistant oxidation-resistant coating needs to be applied on the damping surface. MCrAlY (wherein M represents Ni-based or Co-based ternary Ni-Cr-Al or CoCr-Al alloy system) becomes an indispensable part in a high-temperature protection system of a hot-end part of an aeroengine due to excellent high-temperature oxidation resistance and hot corrosion resistance. However, by adopting the traditional coating preparation technology, such as thermal spraying, magnetron sputtering, low-pressure plasma spraying and the like, the prepared MCrAlY coating is a polycrystalline coating with any orientation, and a great thermal stress is generated between the polycrystalline coating and a monocrystal high-temperature alloy substrate due to frequent starting and stopping of an engine in the use process, so that the thermal fatigue and the thermal mechanical fatigue performance are deteriorated. Therefore, it is necessary to develop a process for epitaxially depositing a coating of a directionally solidified, single crystal alloy on a single crystal superalloy substrate.
The publication No. CN108330483 discloses a laser cladding forming method of a single crystal MCrAlY coating on a single crystal superalloy substrate, which adopts a coaxial powder feeding mode to carry out cladding forming on the single crystal superalloy substrate, and obtains a coating structure through annealing treatment, the crystal orientation of the prepared single crystal MCrAlY coating is consistent with that of the alloy substrate, and the contact surface of the coating and the substrate can form compact metallurgical bonding. However, the single crystal MCrAlY coating prepared by the method is easy to generate CET transformation at the upper part of the coating and the joint position of each molten pool line to form isometric crystals with inconsistent orientation with the substrate, so that the performance of the coating is greatly influenced. Publication No. CN101126143 discloses a method for high-energy micro-arc spark multilayer deposition of directionally solidified columnar crystals or single crystal coatings on directionally solidified columnar crystals or single crystal high-temperature alloy substrates, which does not produce thermal damage to nickel-based high-temperature alloys, and the matrix does not need preheating treatment. However, this method has disadvantages of low deposition efficiency, thin single layer coating (several micrometers), and the occurrence of mixed crystals at the bonding interface during multi-layer deposition.
The electron beam cladding technology is a new technology developed recently, has high electron beam energy density and high utilization rate, can heat the surface of a metal material from room temperature to austenitizing temperature or melting temperature within milliseconds, and has the cooling speed of 106-108Therefore, the solidification rate of a liquid-phase molten pool in the cladding process is very high, and unbalanced solidification is formed, so that coating crystals can easily grow along the vertical direction of the substrate, and the directional solidification forms columnar crystals with certain grain orientation. Compared with laser cladding and micro-arc spark deposition methods, the method can epitaxially grow a single crystal coating of dozens of micrometers to several millimeters on a single crystal superalloy substrate at one time by pre-spreading powder, and the coating does not have a mixed crystal structure, does not need subsequent heat treatment, does not need preheating of the substrate and the like.
Disclosure of Invention
The invention aims to provide a preparation method for epitaxially growing an MCrAlY single crystal coating on a single crystal high-temperature alloy substrate, aiming at the problems of the existing single crystal MCrAlY coating process.
The technical scheme of the invention is as follows: a method for preparing a single crystal MCrAlY coating epitaxially grown on a single crystal superalloy substrate comprises the steps of pressing dried MCrAlY powder into a sheet, placing the sheet on the surface of the cleaned and polished single crystal superalloy substrate, and forming the coating on the substrate by electron beam cladding.
A preparation method of a single crystal MCrAlY coating epitaxially grown on a single crystal superalloy substrate comprises the following steps:
(1) polishing the surface of a sample of the single crystal high-temperature alloy matrix by using abrasive paper, and removing surface layer stress and oxides; ultrasonically cleaning with acetone, and blow-drying with an electric heating blower for later use;
(2) drying the MCrAlY powder in a drying oven, pressing into a sheet with a certain thickness by using a tablet press, and placing the sheet on the surface of the high-temperature alloy substrate;
(3) and cladding the powder sheet on the substrate by adopting electron beam cladding equipment to form a coating, and taking out after cooling.
In the step (1), the sand paper with 100 meshes and 1000 meshes is adopted for grinding the sample.
In the step (2), M in the MCrAlY powder is Ni, Co or NiCo; the particle size of the powder is 45-200 μm. And trace Ta and W elements can be selectively added into the MCrAlY powder.
In the step (2), the thickness of the slice is 0.1-5mm, and the slice is dried in a vacuum drying oven at 100-150 ℃ before use.
In the step (3), the electron beam cladding voltage is 10-70kV, the cladding rate is 10-100mm2/s, and the cladding current is 10-100 mA; the vacuum degree of the electron beam cladding equipment is 2 multiplied by 10-1~2×10-2Pa。
The invention has the beneficial effects that the invention provides a new preparation method for the MCrAlY single crystal coating epitaxially grown on the surface of the single crystal superalloy substrate, the method can prepare thicker single crystal coating with the same orientation as the substrate at one time, the mixed crystal structure in the coating is less, and the substrate does not need to be preheated, etc.
The invention can be used for preparing the single crystal coating on all single crystal high temperature alloy substrates.
Drawings
FIG. 1 is a flow chart of the preparation of an epitaxially grown single crystal NiCoCrAlTaY coating of the present invention;
FIG. 2 is an optical micrograph of a NiCoCrAlTaY single crystal coating of example 1;
FIG. 3 is an XRD photograph of a NiCoCrAlTaY single crystal coating of example 1;
FIG. 4 is an EBSD photograph of a NiCoCrAlTaY single crystal coating in example 1;
FIG. 5 is an optical micrograph of a NiCoCrAlTaY single crystal coating of example 2;
FIG. 6 is an EBSD photograph of a CoNiCrAlTaY single crystal coating of example 2.
Detailed Description
A specific embodiment of the present invention is shown in fig. 1.
Example 1 a NiCoCrAlTaY single crystal coating was epitaxially grown on a single crystal nickel-based superalloy according to the method described in the process of preparation of the epitaxially grown single crystal MCrAlY coating of the present invention, the single crystal alloy having the composition 8.23Cr-5.6Co-2.47Mo-6.7W-2.39Ta-6Al-1.68Ti (mass%), the remainder Ni, the NiCoCrAlYTa powder added with trace element Ta, the composition 25Co-20Cr-8Al-4Ta-0.8Y (mass%), the remainder Ni.
A single crystal superalloy bar substrate is prepared by a traditional spiral crystal selection method, the diameter of the bar is phi 15mm, a round slice with the thickness of 2mm is cut on the single crystal substrate, the surface of the substrate is cleaned by acetone ultrasonic waves after being polished by 180-mesh abrasive paper to remove oil stains and impurities, and the substrate is blown by electric heat and dried for later use. NiCoCrAlYTa powder is pressed into a round sheet with the thickness of 0.3mm by a tablet machine and then is paved on a substrate. The cladding parameters are cladding voltage of 60kV and cladding speed of 20mm2(s) cladding current 18.0mA, vacuum degree 2X 10-4。
After the experiment was completed, 5g of CuSO4+20ml of HCL +100ml of H was used2The solution of O was etched for 5s and observed under an optical microscope. The observation results are shown in FIG. 2, in which FIG. 2 (a) shows that the coating thickness was about 200 μm and the coating was grown in a columnar shape in one direction, and FIG. 2(b) is a partially enlarged view of FIG. 2 (a), and it can be seen from FIG. 2(b) that the dendrite spacing of the columnar shape was about 5 μm. Wherein FIG. 3 is an XRD pattern of electron beam epitaxially grown NiCoCrAlYTa coating on a nickel-based superalloy, it can be observed that both the coating and the substrate are composed of γ -Ni and γ' -Ni3Al, and the (111)/(200) diffraction peak angles of the coating and the substrate are consistent. FIG. 4 is an EBSD image of NiCoCrAlYTa coating, FIG. 4 (a) is a scanning electron microscope image, FIG. 4 (b) is a corresponding IPF image, and it can be seen from the images that the orientations of the coating and the substrate are consistent, and both are<001>In the direction, no equiaxial crystals in laser cladding appear on the upper part of the coating, and only a few low-angle mixed crystals appear at the junction of the molten pool.
Example 2a NiCrAlTaY single crystal coating was epitaxially grown on a single crystal nickel-based superalloy according to the method described in the process of preparation of the epitaxially grown single crystal MCrAlY coating of the present invention, the single crystal alloy having the composition 8.23Cr-5.6Co-2.47Mo-6.7W-2.39Ta-6Al-1.68Ti (mass%), the remainder Ni, the conicratay powder with added trace element Ta, the composition 30Ni-15Cr-12Al-4Ta-0.8Y (mass%), the remainder Co.
A single crystal superalloy bar substrate is prepared by a traditional spiral crystal selection method, the diameter of the bar is phi 15mm, a round slice with the thickness of 2mm is cut on the single crystal substrate, the surface of the substrate is cleaned by acetone ultrasonic waves after being polished by 180-mesh abrasive paper to remove oil stains and impurities, and the substrate is blown by electric heat and dried for later use.
CoNiCrAlTaY powder was pressed into round pieces with a thickness of 0.3mm by means of a tablet press and then spread on a substrate. The cladding parameters are cladding voltage of 60kV and cladding speed of 20mm2(s) cladding current 18.0mA, vacuum degree 2X 10-4. After the experiment was completed, 5g of CuSO4+20ml of HCL +100ml of H was used2The solution of O was etched for 5s and observed under an optical microscope. The observation results are shown in FIG. 5, in which FIG. 5 (a) shows that the coating thickness was about 200 μm and the coating was grown in a columnar shape in one direction, and FIG. 5(b) is a partially enlarged view of FIG. 5 (a), and it can be seen from FIG. 5(b) that the dendrite spacing of the columnar shape was about 5 μm. FIG. 6 is an EBSD map of a CoNiCrAlTaY coating, FIG. 6 (a) is a scanning electron micrograph, and FIG. 6 (b) is a corresponding IPF map, from which it can be seen that the orientation of the coating and the substrate are identical, both for<001>In the direction, no equiaxed crystal in laser cladding appears on the upper part of the coating, no mixed crystal appears at the interface of a molten pool, but a small amount of low-angle mixed crystal is observed in the coating.
Claims (7)
1. A preparation method of a single crystal MCrAlY coating epitaxially grown on a single crystal superalloy substrate is characterized in that the method comprises the steps of pressing dried MCrAlY powder into a sheet, placing the sheet on the surface of the cleaned and polished single crystal superalloy substrate, and forming the coating on the substrate by electron beam cladding.
2. A method of producing a single crystal MCrAlY coating on a single crystal superalloy substrate by epitaxial growth according to claim 1, comprising the steps of:
(1) polishing the surface of a sample of the single crystal high-temperature alloy matrix by using abrasive paper, and removing surface layer stress and oxides; ultrasonically cleaning with acetone, and blow-drying with an electric heating blower for later use;
(2) drying the MCrAlY powder in a drying oven, pressing into a sheet with a certain thickness by using a tablet press, and placing the sheet on the surface of the high-temperature alloy substrate;
(3) and cladding the powder sheet on the substrate by adopting electron beam cladding equipment to form a coating, and taking out after cooling.
3. The method for preparing an epitaxially grown single crystal MCrAlY on a single crystal superalloy substrate as in claim 2, wherein the abrasive sample is 100-1000 mesh sand paper.
4. A method of preparing a single crystal MCrAlY epitaxially grown on a single crystal superalloy substrate according to claim 2, wherein M in the MCrAlY powder is Ni, Co or NiCo; the particle size of the powder is 45-200 μm.
5. A method of preparing a single crystal MCrAlY epitaxially grown on a single crystal superalloy substrate according to claim 2, wherein the thickness of the thin sheet is 0.1-5mm and is dried in a vacuum oven at 100-150 ℃ before use.
6. The method for preparing single crystal MCrAlY epitaxially grown on single crystal superalloy substrate according to claim 2, wherein electron beam cladding voltage is 10-70kV, cladding rate is 10-100mm2/s, and cladding current is 10-100 mA; the vacuum degree of the electron beam cladding equipment is 2 multiplied by 10-1~2×10-2Pa。
7. A method of preparing single crystal MCrAlY epitaxially grown on a single crystal superalloy substrate as in claim 4, wherein trace amounts of Ta, W elements are added to the MCrAlY powder.
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Cited By (2)
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| CN111926287A (en) * | 2020-05-19 | 2020-11-13 | 中国科学院金属研究所 | Surface pretreatment method for improving MCrAlY coating and monocrystal superalloy interface structure stability |
| CN112226816A (en) * | 2020-09-25 | 2021-01-15 | 北京科技大学 | Method for epitaxial growth of second generation nickel-based single crystal superalloy by two-step high-flux method |
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| CN112226816A (en) * | 2020-09-25 | 2021-01-15 | 北京科技大学 | Method for epitaxial growth of second generation nickel-based single crystal superalloy by two-step high-flux method |
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Application publication date: 20200225 |