CN110812713A - Beam flow line layout structure of rotating frame and self-eliminating chromatic aberration normal-temperature proton treatment equipment - Google Patents
Beam flow line layout structure of rotating frame and self-eliminating chromatic aberration normal-temperature proton treatment equipment Download PDFInfo
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- CN110812713A CN110812713A CN201911184487.2A CN201911184487A CN110812713A CN 110812713 A CN110812713 A CN 110812713A CN 201911184487 A CN201911184487 A CN 201911184487A CN 110812713 A CN110812713 A CN 110812713A
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- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N5/00—Radiation therapy
- A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
- A61N5/1001—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy using radiation sources introduced into or applied onto the body; brachytherapy
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- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N5/00—Radiation therapy
- A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
- A61N2005/1085—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy characterised by the type of particles applied to the patient
- A61N2005/1087—Ions; Protons
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- A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
- A61N5/00—Radiation therapy
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Abstract
The invention relates to a beam streamline layout structure of a rotating frame and self-achromatic normal temperature proton treatment equipment, wherein each of two self-achromatic units of the layout structure comprises two bending sections which are arranged in a mirror symmetry mode and used for deflecting beam current, at least one self-achromatic unit is an odd-unit quadrupole lens group, a middle quadrupole lens is arranged at the mirror symmetry center of the self-achromatic unit, an equal number of pairs of side quadrupole lenses are linearly arranged, the distance from the middle quadrupole lens to the adjacent side quadrupole lenses is the same, and the self-achromatic normal temperature proton treatment equipment and the two bending sections are used for eliminating chromatic aberration of the beam current passing through the self-achromatic unit. The invention has the reasonable layout of easily assembling the beam streamline, ensures that the motion trail of the proton beam with different energies of the rotating machine frame beam streamline meets the design requirement, and simultaneously obtains the effect of eliminating the proton chromatic aberration.
Description
Technical Field
The invention relates to the technical field of proton treatment, in particular to a streamline layout structure of a rotating machine frame beam and self-achromatic normal-temperature proton treatment equipment.
Background
Proton therapy is one means of radiation therapy. After the protons enter the body, a sharp dose peak (Bragg peak) is formed at the end of range. The Bragg peak can be made to cover the tumor by adjusting the proton energy. In addition, the energy loss of the proton on the incident channel is small, the side scattering is also small, and the dose on the normal tissues in front, back, left and right is small, so that the proton has better radiation physical performance. The phenomenon of beam dispersion adversely affects proton therapy and requires careful and tight control.
The rotating frame is an important component of proton treatment equipment, and beam current led out from a cyclotron enters the rotating frame through transmission of an intermediate beam streamline and is transmitted to a focus of a human body through the rotating frame beam streamline. The beam streamline of the rotating frame is a core component part on the rotating frame, and in order to control beam envelope, beam position and beam loss on the whole transmission line in the current beam streamline of the rotating frame, focusing elements, deflection elements, guide elements and the like must be arranged according to the size of a beam pipeline and the quality of proton beams, but the reasonable configuration layout of the elements is difficult to achieve when a self-chromatic aberration elimination mechanism is configured. In addition, the arrangement of the vacuum element is also required to be considered so as to maintain the vacuum of the pipeline and detect the vacuum degree in the pipeline in real time; it is also necessary to consider the arrangement of the diagnostic elements to detect the beam profile in the duct in real time in order to control the beam loss in time. Thus, the layout becomes more complicated, which results in a problem of beam loss due to too long beam line. The replacement of individual components also results in inconsistent quality of the beam line and inconvenience in assembly and maintenance.
Chinese invention patent application publication No. CN108290052A discloses a particle therapy gantry with an energy degrader and an achromatic final bend system, the movable gantry comprising: a) an entrance section for an accelerated particle beam and comprising a plurality of quadrupole magnets; b) a first curved section and an optional second curved section comprising a plurality of dipole and quadrupole magnets and optionally further magnets for beam correction; c) a transfer section comprising a plurality of quadrupole magnets and optionally further magnets for beam correction and a degrader (D); d) a final beam-bending section comprising a plurality of individual and/or combined dipole/quadrupole/higher-order multipole magnets forming an achromatic section, wherein all magnets of the achromatic final bending section (16) are located downstream of the degrader (D); any dispersion in the achromatic last bend section (16) is suppressed. The curved section itself is achromatic, i.e. the beam bending process is simultaneously achromatic, the curved section comprising several subsequent combined function magnets with overlapping dipole and quadrupole fields. With such prior designs, the inherently achromatic flexures are difficult to modularly adjust and replace.
The original applicant discloses a full-superconducting proton treatment system in Chinese patent application publication No. CN109224319A, which comprises a superconducting cyclotron used for generating proton beams; a superconducting rotary treatment cabin is arranged beside the superconducting cyclotron; the superconducting rotary treatment pod includes a beam line of the rotary treatment pod. A beam transport system and an energy selection system are sequentially arranged in the output direction of the beam generated by the superconducting cyclotron and between the superconducting cyclotron and the superconducting rotary treatment cabin. The beam transport system comprises a first quadrupole lens group and an energy degrader which are sequentially arranged, and the energy selection system comprises a first deflection magnet, a second quadrupole lens and a second deflection magnet which are sequentially arranged. In fact, existing rotating gantry beam streamlines like this are difficult to completely self-achromatic and the use of superconducting magnets also increases the difficulty of machining and installation.
Disclosure of Invention
One of the objectives of the present invention is to provide a beam line layout structure of a rotating machine frame, so as to solve the problem of the volume and weight of the rotating machine frame caused by the beam line being too long due to the unreasonable beam line layout of the rotating machine frame, and to meet the requirements of self-achromatic color and modularized fast replacement/adjustment.
The invention also aims to provide self-eliminating chromatic aberration normal-temperature proton treatment equipment which is used for solving the problem of beam chromatic dispersion during proton treatment, completely eliminating chromatic aberration in the beam transmission process of a rotating frame, meeting the high requirement of proton treatment on the quality of a proton beam at a central point, being convenient to assemble, reasonably arranging electromagnetic elements in a system, forming a self-eliminating chromatic aberration system on a beam line and improving the beam quality.
One of the purposes of the invention is realized by the following technical scheme: a beam streamline layout structure of a rotating machine frame is provided, which comprises a first self-achromatic color unit, a second self-achromatic color unit and a linear beam focusing unit. The first self-extinction chromatic aberration unit comprises a first bending section and a second bending section which are arranged in a mirror symmetry mode in pair and used for deflecting beam current at a first angle, the second self-extinction chromatic aberration unit comprises a third bending section and a fourth bending section which are arranged in a mirror symmetry mode in pair and used for deflecting beam current at a second angle, the first angle is larger than the second angle, the linear beam focusing unit is arranged between the first self-extinction chromatic aberration unit and the second self-extinction chromatic aberration unit, the first self-extinction chromatic aberration unit further comprises a first odd-numbered unit quadrupole lens group positioned in the mirror symmetry center, the first odd-numbered unit quadrupole lens group takes a first middle quadrupole lens as the symmetry axis center and is linearly provided with an equal number of pairs of first side quadrupole lenses, and the distance from the first middle quadrupole lens to the adjacent first side quadrupole lenses is the same, the color difference of the beam current passing through the first self-achromatic unit is eliminated between the first curved section and the second curved section.
By adopting the first basic technical scheme, the first odd-numbered unit quadrupole lens group in the first auto-achromatic unit which is specially configured is used as the mirror symmetry center of the bending section, the first middle quadrupole lens in the first odd-numbered unit quadrupole lens group is used as the symmetry axis center of the first side quadrupole lens group, namely, other lenses in the first auto-achromatic unit and magnets in the bending section are all configured in pairs and at equal intervals except for the first middle quadrupole lens used as the symmetry axis center, and the bending section, the linear beam focusing unit and the odd-numbered unit quadrupole lens group with linear achromatic aberration are configured in a segmented manner, and the first bending section and the second bending section are combined to eliminate chromatic aberration of the beam passing through the first auto-achromatic unit, and the achromatic aberration acts on a smaller linear section between the symmetrical bending sections, namely, a linear chromatic aberration section for eliminating is designed between mutually symmetrical beam bending and beam bending, the modular replacement and adjustment are facilitated, the unit layout with accurate fixed intervals can be achieved, and the complete zero chromatic aberration of the first self-achromatic unit after the first angular deflection can be achieved under an ideal state, namely the chromatic dispersion term in the first angular deflection is 0.
The present invention in a first preferred example may be further configured to: the second is from extinction colour difference unit still includes the second odd number unit quadrupole lens group that is located mirror symmetry center, the second odd number unit quadrupole lens group uses quadrupole lens in the middle of the second to be symmetrical axis center and linear configuration etc. pair's second side quadrupole lens, and the interval of quadrupole lens to adjacent second side quadrupole lens in the middle of the second is the same, be used for with third flexion with fourth flexion eliminates the beam current together and passes through the chromatism of second self-extinction colour difference unit.
By adopting the above preferred technical solution, the second self-achromatic unit having a section with a smaller deflection angle and a specific configuration, and the second odd-numbered unit quadrupole lens group as a mirror symmetry center of the curved section, and the second odd-numbered unit quadrupole lens group as a symmetry axis center, that is, the second self-achromatic unit uses the second middle quadrupole lens as a symmetry axis center, and other lenses in the lens group and magnets in the curved section are configured in pairs and at equal intervals, so that the chromatic aberration of the beam passing through the second self-achromatic unit can be eliminated between the curved sections with a smaller deflection angle, and the small linear section with achromatic aberration acting between the third and fourth curved sections, that is, the linear section with achromatic aberration is designed between the mutually symmetric beam bending and beam bending, the modular replacement and adjustment are facilitated, the unit layout with accurate fixed intervals can be achieved, and the complete zero chromatic aberration of the second self-achromatic unit after the second angular deflection can be achieved under an ideal state, namely the chromatic dispersion term in the second angular deflection is 0.
The present invention may be further configured in a specific structure of the first preferred example: the second odd-numbered unit quadrupole lens group is a three-unit quadrupole lens group.
By adopting the preferred technical scheme, the second odd-numbered unit quadrupole lens group is specifically a three-unit quadrupole lens group, and the number of the second side quadrupole lenses which are linearly configured in an equal-number pair at two sides of the second middle quadrupole lens is only one respectively, so that the second odd-numbered unit quadrupole lens group can be assembled in a fast module mode.
The present invention may be further configured in a more specific structure of the first preferred example to: the first odd-numbered unit quadrupole lens group is a three-unit quadrupole lens group.
By adopting the preferred technical scheme, the first odd-numbered unit quadrupole lens group is specifically a three-unit quadrupole lens group, and the number of the first side edge quadrupole lenses which are in equal pairs and linearly arranged on two sides of the first middle quadrupole lens is only one respectively, so that the first odd-numbered unit quadrupole lens group can be assembled in a fast module mode.
The present invention in a second preferred example may be further configured to: the first bending section and the second bending section are equidirectional deflection magnets with a half first angle and form an axisymmetrical structure, the third bending section and the fourth bending section are equidirectional deflection magnets with a half second angle and form an axisymmetrical structure, the first angle and the second angle are angle deflections in different directions, the first angle is larger than 90 degrees, and the second angle is smaller than 90 degrees.
Through adopting above-mentioned preferred technical scheme, utilize the angle of flexion section to divide equally and restrict, realize that two liang of pairwise flexion sections carry out the beam current deflection of symmetrical half first angle and half second angle in the rotatory frame beam streamline.
In a specific structure of the second preferred example, the present invention may be further configured such that: the first curved section, the second curved section, the third curved section, and the fourth curved section all include only one deflection magnet, and the first angle is equal to the sum of the second angle plus a vertical angle.
By adopting the preferred technical scheme, each bending section only comprises one deflection magnet, and the beam deflection of 90 degrees of the first angle minus the second angle is utilized to achieve the purpose that the beam line of the irradiation opening angle perpendicular to the injection opening angle is simplified.
The present invention in a third preferred example may be further configured to: the linear beam focusing unit consists of two pairs of double-unit quadrupole lens sets, a beam inlet of the second self-extinction chromatic aberration unit is connected with the double-unit quadrupole lens sets so as to connect a beam line led out by the cyclotron, the first self-extinction chromatic aberration unit is provided with a beam irradiation outlet, and the irradiation direction of the beam irradiation outlet is perpendicular to the injection direction of the beam inlet.
By adopting the preferable technical scheme, the focusing of the beam current on the linear section and the injection port is achieved by utilizing a plurality of groups of double-unit quadrupole lens groups, and the linear sections of the first self-extinction chromatic unit and the second self-extinction chromatic unit can be properly lengthened.
In a specific structure of any of the above preferred examples, the present invention may be further configured such that: the first self-achromatic color unit, the second self-achromatic color unit and the linear beam focusing unit are made of silicon steel sheets, so that eddy current generated by rapid change of a magnetic field is effectively prevented.
Through adopting above-mentioned preferred technical scheme, utilize the material of magnet all to be the silicon steel sheet, reach the effect of the vortex that the prevention magnetic field rapid change produced.
In another specific structure of any of the preferred examples described above, the present invention may be further configured such that: all magnets in the first self-extinction chromatic aberration unit, the second self-extinction chromatic aberration unit and the linear beam focusing unit adopt a normal-temperature magnet mode.
By adopting the preferred technical scheme, all the magnets in the beam line are in a normal-temperature magnet mode, and the modular processing, installation and positioning of the beam line elements can be facilitated.
The other purpose of the invention is realized by the following technical scheme:
a self-achromatic normal temperature proton treatment device is provided, which comprises a streamline layout structure of a rotating machine frame beam of any one of the above examples.
By adopting the second basic technical scheme, the beam streamline layout structure of the rotating frame is linearly and symmetrically configured in the lens group by taking the middle lens as the axis to form the paired lenses and the bent sections in the self-achromatic unit in a mirror symmetry mode, chromatic aberration can be completely eliminated in the beam transmission process of the rotating frame, the high requirement of proton treatment on the quality of the proton beam at the equal central point is met, and the assembling is convenient.
In summary, the invention includes at least one of the following beneficial technical effects:
1. the beam streamline layout of the rotating rack is more reasonable, the self-eliminating chromatic aberration effect is achieved, the length of the rotating rack is effectively shortened, and the occupied area of the rotating rack is reduced;
2. the middle quadrupole lens of the odd-number unit quadrupole lens group is used as the axial center of the odd-number unit quadrupole lens group and the mirror symmetry center of the self-chromatic aberration elimination unit, so that the unit layout with accurate fixed intervals is achieved, and the effect of completely eliminating chromatic aberration after modularized installation is easier to achieve;
3. the curved section, the linear beam focusing unit and the linear achromatic odd-numbered unit quadrupole lens set are configured in a segmented manner, so that the technical effect of eliminating the chromatic aberration of the beam passing through the self-achromatic unit together with the two curved sections is achieved, a linear section for eliminating the chromatic aberration is designed between beam bending and beam bending, modular replacement and adjustment are facilitated, and the size, weight, installation difficulty and the like of the configuration unit in the beam streamline of the rotating frame are greatly reduced.
Drawings
FIG. 1 is a schematic diagram of a beam line layout of a rotating gantry according to a preferred embodiment of the present invention;
FIG. 2 is a schematic diagram of a first self-achromatic unit according to a preferred embodiment of the present invention;
FIG. 3 is a schematic view of a first odd-numbered unit quadrupole lens set according to a preferred embodiment of the present invention;
FIG. 4 is a schematic diagram of a second self-achromatic unit according to a preferred embodiment of the present invention;
FIG. 5 is a schematic view of the second odd-numbered unit quadrupole lens set according to a preferred embodiment of the present invention.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and do not represent all the embodiments, and the purpose of the described embodiments is to explain the recited features of the claims and not to limit the scope of the claims. All other embodiments, which can be obtained by a person skilled in the art after a full understanding of the invention based on the inventive concepts presented in the embodiments, belong to the scope of protection of the present invention.
It should be noted that, if directional indications (such as up, down, left, right, front, and back … …) are involved in the embodiment of the present invention, the directional indications are only used to explain the relative positional relationship between the components, the movement situation, and the like in a specific posture (as shown in the drawing), and if the specific posture is changed, the directional indications are changed accordingly.
In order to facilitate understanding of the technical solution of the present invention, the streamline layout structure of the rotating gantry beam and the self-achromatic normal temperature proton therapy apparatus of the present invention are further described in detail below, but the following description should not be provided to limit the protection scope of the present invention.
FIG. 1 is a schematic diagram of a beam streamline layout structure of a rotating gantry according to a preferred embodiment of the invention. Fig. 2 is a schematic diagram of the first self-achromatic unit shown in fig. 1. FIG. 3 is a schematic diagram of the first odd-numbered unit quadrupole lens set of FIG. 2. Generally, the rotation of the rotating gantry uses the beam injection direction as the rotation axis to adjust the beam irradiation angle on the lesion of the human body.
Referring to fig. 1 and 2, a streamline layout structure of a rotating gantry beam disclosed in an embodiment of the present invention includes a first self-achromatic unit 10, a second self-achromatic unit 20, and a linear beam focusing unit 30. The linear beam focusing unit 30 is disposed between the first self-achromatic unit 10 and the second self-achromatic unit 20. The first self-extinction difference unit 10 comprises a first bent section 11 and a second bent section 12 which are arranged in a mirror symmetry mode in pair and used for deflecting beam current at a first angle, and the second self-extinction difference unit 20 comprises a third bent section 21 and a fourth bent section 22 which are arranged in a mirror symmetry mode in pair and used for deflecting beam current at a second angle, wherein the first angle is larger than the second angle. Typically, the first angle is between 100 and 180 degrees and the second angle is between 20 and 80 degrees. More specifically, the first angle is between 130 and 150 degrees, and the second angle is between 40 and 60 degrees. In this embodiment, the first angle is 140 degrees and the second angle is 50 degrees.
Referring to fig. 2 and 3, the first self-achromatic unit 10 further includes a first odd-numbered unit quadrupole lens group 40 located at the mirror symmetry center, the first odd-numbered unit quadrupole lens group 40 takes a first middle quadrupole lens 41 as the symmetry axis center and linearly arranges an equal number of pairs of first side quadrupole lenses 42,43, and the distance from the first middle quadrupole lens 41 to the adjacent first side quadrupole lenses 42,43 is the same for eliminating chromatic aberration of the beam passing through the first self-achromatic unit 10 together with the first curved section 11 and the second curved section 12.
The implementation principle of the embodiment is as follows: on the theoretical basis, the first bending section 11 and the second bending section 12 which are arranged in a mirror symmetry manner in pairs have the same beam angle deflection capability, the beam error deflected by one-half of the first angle after the first bend is easy to know the achromatic capability of the first self-achromatic unit 10 to adjust, the achromatic color of the excessive angle correction reaching twice angle correction can compensate the insufficient offset angle of the front section and the rear section at one time, the beam current with the excessive offset of the front section can still be offset excessively at the rear section, and the linear achromatic color of the middle section can correct the excessive offset angle of the front section and the rear section at one time, so that the beam current can be guided to the consistent direction after the first angle offset after the second section is bent. In terms of implementation structure, by using the mirror symmetry center of the first odd-numbered unit quadrupole lens group 40 as the curved section in the first self-achromatic unit 10 with a specific configuration and the symmetry axis center of the first side quadrupole lens 42,43 group in the first odd-numbered unit quadrupole lens group 40 with the first middle quadrupole lens 41 as the first side quadrupole lens, that is, by using the first middle quadrupole lens 41 as the symmetry axis center in the first self-achromatic unit 10, the other lenses in the lens group and the curved section magnets are arranged equidistantly in pairs, and the curved sections 11,12,21,22, the linear beam focusing unit 30 and the linear achromatic odd-numbered unit quadrupole lens group 40 are arranged in segments, it is possible to eliminate the chromatic aberration of the beam passing through the first self-achromatic unit 10 together with the first and second curved sections 11,12, and the achromatic effect is on a smaller linear section between the symmetrical curved sections, namely, a linear section for eliminating chromatic aberration is designed between the mutually symmetrical beam bending and the beam bending, which is beneficial to modularized replacement and adjustment and achieves accurate unit layout with fixed intervals, and the perfect zero chromatic aberration of the first self-eliminating chromatic aberration unit 10 after the first angle deviation can be achieved under an ideal state, namely, the chromatic dispersion term in the first angle deviation is 0.
FIG. 4 is a schematic diagram of a second self-achromatic unit shown in FIG. 2. FIG. 5 is a schematic diagram of the second odd-numbered unit quadrupole lens set of FIG. 4.
Referring to fig. 4, regarding an achromatic structure of the second self-achromatic unit 20, in the first preferred example of the present invention, the second self-achromatic unit 20 may further include a second odd-numbered unit quadrupole lens group 50 located at the mirror symmetry center, the second odd-numbered unit quadrupole lens group 50 is centered on a second middle quadrupole lens 51 and linearly configured with an equal number of pairs of second side quadrupole lenses 52,53, and a distance from the second middle quadrupole lens 51 to an adjacent second side quadrupole lens 52,53 is the same for eliminating chromatic aberration of a beam passing through the second self-achromatic unit 20 together with the third curved section 21 and the fourth curved section 22. Therefore, the second self-achromatic unit 20, which uses the section with smaller deflection angle and has a specific configuration, uses the second odd-numbered unit quadrupole lens set 50 as the mirror symmetry center of the curved section, and uses the second middle quadrupole lens 51 as the second side quadrupole lenses 52 and 53 as the symmetry center of the second odd-numbered unit quadrupole lens set 50, that is, the second self-achromatic unit 20 uses the second middle quadrupole lens 51 as the symmetry center, and the other lenses in the lens set and the magnets in the curved section are arranged in pairs and at equal intervals, so that the chromatic aberration of the beam passing through the second self-achromatic unit 20 can be eliminated between the curved sections with smaller deflection angle, and the achromatic aberration acts on a smaller linear section between the third and fourth curved sections 22, that is, a linear section for eliminating chromatic aberration is designed between the mutually symmetric beam bending and beam bending, the unit layout is favorable for modularized replacement and adjustment and accurate fixed interval, and the complete zero color difference of the second self-achromatic unit 20 after the second angular deflection can be achieved under an ideal state, namely the chromatic dispersion term in the second angular deflection is 0.
Referring to fig. 5, regarding a specific structure of the second odd-numbered unit quadrupole lens group 50, in a specific structure of the first preferred example, the second odd-numbered unit quadrupole lens group 50 is a three-unit quadrupole lens group. Therefore, with the second odd-numbered unit quadrupole lens group 50 being specifically a three-unit quadrupole lens group, the number of the second side quadrupole lenses 52,53 in the same number of pairs is linearly arranged on both sides of the second middle quadrupole lens 51, and is only one, so as to facilitate the fast modular assembly of the second odd-numbered unit quadrupole lens group 50.
Referring again to fig. 3, regarding a specific structure of the first odd-numbered unit quadrupole lens group 40, in a more specific structure of the first preferred example, the first odd-numbered unit quadrupole lens group 40 is a three-unit quadrupole lens group. Therefore, with the first odd-numbered unit quadrupole lens group 40 being specifically a three-unit quadrupole lens group, the first side quadrupole lenses 42,43 in equal pairs are linearly arranged on both sides of the first middle quadrupole lens 41 only in one number each, so as to facilitate the rapid modular assembly of the first odd-numbered unit quadrupole lens group 40. One side of the first middle quadrupole lens 41 is generally adjacent to one of the first side quadrupole lenses 42 and the other side of the first middle quadrupole lens 41 is generally adjacent to the other first side quadrupole lens 43, and the gaps 44 of the first middle quadrupole lens 41 and the other first side quadrupole lens 43 are all equal compared to the gaps 44 of the first middle quadrupole lens 41 and the first side quadrupole lens 42.
Regarding the bent section, in a second preferred example of the present invention, the first bent section 11 and the second bent section 12 are formed as an axisymmetrical structure by a one-half first angle of the equidirectional deflection magnet, and the third bent section 21 and the fourth bent section 22 are formed as an axisymmetrical structure by a one-half second angle of the equidirectional deflection magnet, the first angle and the second angle are different directions of angular deflection, the first angle is greater than 90 degrees, and the second angle is smaller than 90 degrees. Therefore, by utilizing the angle equipartition and limitation of the bent sections, beam deflection of a half first angle and a half second angle is carried out on two paired bent sections in the beam streamline of the rotating frame, and the irradiation port is inclined to the injection port. For example, corresponding to a first angle of 140 degrees and a second angle of 50 degrees, the first bending section 11 and the second bending section 12 are both 70-degree deflection magnets, and the third bending section 21 and the fourth bending section 22 are both 25-degree deflection magnets. The interval from the first curved section 11 to the first odd-numbered unit quadrupole lens group 40 and the interval from the second curved section 12 to the first odd-numbered unit quadrupole lens group 40 are all equal.
With regard to one structure of the bent section, in a specific structure of the second preferred example, the first bent section 11, the second bent section 12, the third bent section 21, and the fourth bent section 22 each include only one deflection magnet, and the first angle is equal to the sum of the second angle plus a vertical angle. Therefore, by using each bending section only comprising one deflection magnet, the beam deflection of 90 degrees of the first angle minus the second angle is simplified to achieve a beam line with the irradiation opening angle perpendicular to the injection opening angle.
With regard to an implementable structure of the linear beam focusing unit 30, in a third preferred example, the linear beam focusing unit 30 is composed of two pairs of double-unit quadrupole lens sets 31,32, a beam inlet of the second self-extinction chromatic unit 20 is connected with a double-unit quadrupole lens set 60 for connecting a beam line extracted by a cyclotron, and the first self-extinction chromatic unit 10 has a beam irradiation outlet 13, and an irradiation direction of the beam irradiation outlet 13 is perpendicular to an injection direction of the beam inlet. Therefore, by using the sets of the double-unit quadrupole lens sets 31,32,60, focusing of the beam on the linear section and the injection port is achieved, and the linear sections of the first self-achromatic unit 10 and the second self-achromatic unit 20 can be properly elongated.
Regarding the possible selection of the magnet material, in a specific structure of any of the above preferred examples, the first self-achromatic unit 10, the second self-achromatic unit 20 and the linear beam focusing unit 30 all use silicon steel sheets as the material of the magnet, so as to effectively prevent the eddy current generated by the rapid change of the magnetic field. Therefore, the magnet is made of silicon steel sheets, so that the effect of preventing eddy current generated by rapid change of a magnetic field is achieved.
Regarding the feasible types of magnets, in a specific structure of any of the above preferred examples, all the magnets in the first self-extinction difference unit 10, the second self-extinction difference unit 20, and the linear beam focusing unit 30 adopt a normal temperature magnet mode. Therefore, all the magnets in the beam line are in a normal-temperature magnet mode, and modularized processing, installation and positioning of the beam line elements can be facilitated. The normal-temperature magnet mode greatly simplifies the difficulty of designing, processing, installing and positioning the rotating machine frame beam streamline.
Another embodiment of the present invention further provides a self-achromatic normal temperature proton treatment apparatus corresponding to the beam flow line layout structure of the rotating gantry, including the beam flow line layout structure of the rotating gantry according to any one of the above examples. Therefore, the beam streamline layout structure of the rotating frame is used for configuring the paired lenses in the lens group in a linear symmetry manner by taking the middle lens as an axis and configuring the bent sections in a mirror symmetry manner in the self-achromatic unit, so that chromatic aberration can be completely eliminated in the beam transmission process of the rotating frame, the high requirement of proton treatment on the quality of the proton beam at the equal central point is met, and the assembling is convenient.
When the color difference normal temperature proton treatment apparatus is actually used, the first bending section 11 and the second bending section 12, together with the third bending section 21 and the fourth bending section 22, give a bending force to the proton beam, so that the particles move along a given beam trajectory. The linear beam focusing unit 30 provides a focusing force to the protons to focus the particles and controls the beam envelope on the beam trajectory.
When charged particles pass through the curved sections 21 and 22 to generate dispersion, the odd-numbered unit quadrupole lens group 50 in the middle linear section of the mirror symmetry curved section and the symmetry curved sections 21 and 22 form a symmetry achromatic system, and the magnetic field gradient of the second odd-numbered unit quadrupole lens group 50 is adjusted, so that the beam line in the section can deflect protons by a second angle (for example, 50 degrees) while the dispersion term is 0. Similarly, the curved sections 11 and 12 and the odd-numbered quadrupole lens group 40 also form a symmetric achromatic system, and by adjusting the magnetic field gradient of the odd-numbered quadrupole lens group 40, the beam line of the section can deflect the protons by a first angle (e.g. 140 degrees) while the dispersion term is 0, so that the system for self-achromatization can effectively improve the quality of the transported protons.
The embodiments of the present invention are merely preferred embodiments for easy understanding or implementing of the technical solutions of the present invention, and not intended to limit the scope of the present invention, and all equivalent changes in structure, shape and principle of the present invention should be covered by the claims of the present invention.
Claims (10)
1. The utility model provides a rotating machine frame restraints streamline layout structure which characterized in that includes:
the first self-extinction difference unit (10) comprises a first bending section (11) and a second bending section (12) which are arranged in a mirror symmetry mode in pair, and is used for deflecting beam current at a first angle;
a second self-achromatic unit (20) comprising a third curved section (21) and a fourth curved section (22) arranged in mirror symmetry in pairs for deflecting the beam at a second angle, the first angle being greater than the second angle,
a linear beam focusing unit (30) disposed between the first self-achromatic unit (10) and the second self-achromatic unit (20);
the first self-achromatic unit (10) further comprises a first odd-numbered unit quadrupole lens group (40) positioned at the mirror symmetry center, the first odd-numbered unit quadrupole lens group (40) takes a first middle quadrupole lens (42) as the symmetry axis center and is linearly configured with an equal number of pairs of first side quadrupole lenses (42,43), and the distance from the first middle quadrupole lens (42) to the adjacent first side quadrupole lenses (42,43) is the same, so that the first odd-numbered unit quadrupole lens group and the second odd-numbered unit quadrupole lens are used for eliminating chromatic aberration of a beam passing through the first self-achromatic unit (10) together with the first curved section (11) and the second curved section (12).
2. The rotating gantry beam streamline layout structure according to claim 1, wherein the second self-achromatic unit (20) further comprises a second odd-numbered unit quadrupole lens group (50) located at the mirror symmetry center, the second odd-numbered unit quadrupole lens group (50) is centered on the symmetry axis of a second middle quadrupole lens (51) and linearly configured with an equal number of pairs of second side quadrupole lenses (52,53), and the spacing of the second middle quadrupole lens (51) to the adjacent second side quadrupole lenses (52,53) is the same for eliminating chromatic aberration of the beam passing through the second self-achromatic unit (20) together with the third curved section (21) and the fourth curved section (22).
3. The rotating gantry beam streamline arrangement according to claim 2, wherein said second odd-numbered unit quadrupole lens group (50) is a three-unit quadrupole lens group.
4. A rotating gantry beam streamline arrangement according to claim 3, wherein said first odd-numbered quadrupole lens group (40) is a three-unit quadrupole lens group.
5. The rotary gantry beam streamline layout structure according to claim 1, wherein the first curved section (11) and the second curved section (12) are one-half of a first angle of a codirectional deflection magnet and are formed in an axisymmetric structure, the third curved section (21) and the fourth curved section (22) are one-half of a second angle of a codirectional deflection magnet and are formed in an axisymmetric structure, the first angle and the second angle are different directions of angular deflection, the first angle is greater than 90 degrees, and the second angle is smaller than 90 degrees.
6. The rotating gantry beam streamline arrangement according to claim 5, wherein the first curved section (11), the second curved section (12), the third curved section (21), the fourth curved section (22) each comprise only one deflection magnet, the first angle being equal to the sum of the second angle plus a vertical angle.
7. A rotating gantry beam streamline layout structure according to claim 1, characterized in that said linear beam focusing unit (30) is composed of two pairs of double-unit quadrupole lens set (31,32), the beam entrance of said second self-achromatic unit (20) is connected with a double-unit quadrupole lens set (60) for connecting the beam line extracted by the cyclotron, said first self-achromatic unit (10) has a beam irradiation exit (13), the irradiation direction of said beam irradiation exit (13) is perpendicular to the injection direction of said beam entrance.
8. The streamline layout structure of a rotating frame beam according to any one of claims 1 to 7, wherein the first self-achromatic unit (10), the second self-achromatic unit (20) and the linear beam focusing unit (30) are made of silicon steel sheets, so as to effectively prevent eddy currents caused by rapid changes of magnetic field.
9. The streamline layout structure of a rotating gantry beam according to any one of claims 1 to 7, wherein all magnets in the first auto-achromatic unit (10), the second auto-achromatic unit (20) and the linear beam focusing unit (30) adopt a normal temperature magnet mode.
10. A self-achromatic ambient temperature proton treatment apparatus, comprising a rotating gantry beam streamline arrangement structure according to any one of claims 1 to 9.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201911184487.2A CN110812713A (en) | 2019-11-27 | 2019-11-27 | Beam flow line layout structure of rotating frame and self-eliminating chromatic aberration normal-temperature proton treatment equipment |
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| CN201911184487.2A CN110812713A (en) | 2019-11-27 | 2019-11-27 | Beam flow line layout structure of rotating frame and self-eliminating chromatic aberration normal-temperature proton treatment equipment |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111249633A (en) * | 2020-03-21 | 2020-06-09 | 华中科技大学 | High momentum acceptance superconducting rotating gantry for proton therapy |
| CN113144443A (en) * | 2021-06-17 | 2021-07-23 | 中国原子能科学研究院 | Double-source proton treatment system and treatment control method |
-
2019
- 2019-11-27 CN CN201911184487.2A patent/CN110812713A/en active Pending
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111249633A (en) * | 2020-03-21 | 2020-06-09 | 华中科技大学 | High momentum acceptance superconducting rotating gantry for proton therapy |
| CN113144443A (en) * | 2021-06-17 | 2021-07-23 | 中国原子能科学研究院 | Double-source proton treatment system and treatment control method |
| CN113144443B (en) * | 2021-06-17 | 2021-09-03 | 中国原子能科学研究院 | Double-source proton treatment system and treatment control method |
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