CN110760790A

CN110760790A - Mask plate and mask assembly

Info

Publication number: CN110760790A
Application number: CN201910153400.9A
Authority: CN
Inventors: 李加伟
Original assignee: Yungu Guan Technology Co Ltd
Current assignee: Yungu Guan Technology Co Ltd
Priority date: 2019-02-28
Filing date: 2019-02-28
Publication date: 2020-02-07

Abstract

The application provides a mask plate and a mask assembly. The mask plate comprises a first evaporation coating area and a second evaporation coating area, the first evaporation coating area reaches a plurality of evaporation coating openings are arranged in the second evaporation coating area respectively, the density of the evaporation coating openings in the first evaporation coating area is larger than that of the evaporation coating openings in the second evaporation coating area, and the thickness of the first evaporation coating area is larger than that of the second evaporation coating area. The mask assembly comprises a mask plate frame, a support bar and at least one mask plate, the support bar is fixedly arranged on the mask plate frame, and the at least one mask plate is arranged on the support bar and fixedly connected with the mask plate frame.

Description

Mask plate and mask assembly

Technical Field

The application relates to the technical field of display device preparation, especially relates to a mask plate and a mask assembly.

Background

With the rapid development of electronic devices, the requirements of users on screen occupation ratio are higher and higher, so that the comprehensive screen display of the electronic devices is concerned more and more in the industry. Traditional electronic equipment such as cell-phone, panel computer etc. owing to need integrate such as leading camera, earphone and infrared sensing element etc. so the accessible is slotted (Notch) on the display screen, sets up camera, earphone and infrared sensing element etc. in the fluting region, but the fluting region can not be used for the display screen, like the bang screen among the prior art, or adopts the mode of trompil on the screen, to the electronic equipment who realizes the function of making a video recording, external light accessible screen on trompil department get into the photosensitive element who is located the screen below. However, these electronic devices are not all full-screen in the true sense, and cannot display in each area of the whole screen, for example, the camera area cannot display the picture.

Disclosure of Invention

According to the first aspect of this application embodiment, a mask plate is provided, the mask plate includes first coating by vaporization region and second coating by vaporization region, first coating by vaporization region reaches be equipped with a plurality of coating by vaporization openings in the second coating by vaporization region respectively, coating by vaporization open-ended density is greater than in the second coating by vaporization region in the first coating by vaporization region, the regional thickness of first coating by vaporization is greater than the regional thickness of second coating by vaporization.

In one embodiment, the mask further includes a transition region adjacent to the first evaporation region and the second evaporation region, a plurality of evaporation openings are provided in the transition region, and the thickness of the transition region is greater than that of the second evaporation region and less than that of the first evaporation region. Because the transition region borders on first coating by vaporization region and second coating by vaporization region, and the thickness in transition region is greater than the thickness in second coating by vaporization region, is less than the thickness in first coating by vaporization region, then the mask plate is at the net in-process that opens, and the transition region can play the cushioning effect to the deformation stress that first coating by vaporization region and second coating by vaporization region received, more does benefit to the deformation volume that makes the coating by vaporization opening in first coating by vaporization region and second coating by vaporization region unanimous.

In one embodiment, the thickness of the transition region is gradually reduced along the direction from the first evaporation region to the second evaporation region, the maximum thickness of the transition region is greater than that of the second evaporation region, and the minimum thickness of the transition region is less than that of the first evaporation region. The thickness of the transition region is gradually reduced along the direction of the first evaporation region pointing to the second evaporation region, so that the buffer effect of the transition region on the deformation stress of the first evaporation region and the second evaporation region is better. The thickness of the transition region adjacent to the first evaporation region is close to that of the first evaporation region, and then the deformation resistance of the transition region and the deformation resistance of the first evaporation region are close to each other, so that the deformation quantity of the evaporation opening of the transition region and the deformation quantity of the evaporation opening of the first evaporation region are close to each other; the thickness of the region of the transition region adjacent to the second evaporation region is close to that of the second evaporation region, and then the deformation resistance of the region and the second evaporation region is close, so that the deformation amount of the evaporation openings of the region and the deformation amount of the evaporation openings of the second evaporation region are close. Therefore, the deformation amount of the evaporation openings in the transition region and the deformation amount of the evaporation openings in the first evaporation region and the second evaporation region have smaller differences, and the evaporation yield can be improved.

In one embodiment, the transition region includes a plurality of sub-regions, the plurality of sub-regions are arranged along a direction in which the first evaporation region points to the second evaporation region, thicknesses of the same sub-region are the same everywhere, and thicknesses of the sub-regions are sequentially reduced along a direction in which the first evaporation region points to the second evaporation region. So set up, at the in-process of opening the net, the deformation stress of a plurality of subregion of transition region is by first evaporation plating region to the regional gradual change of second evaporation plating to the realization is to the cushioning effect of the deformation stress in first evaporation plating region and second evaporation plating region.

In one embodiment, the thickness of the transition region is the same throughout. Therefore, when the mask plate is prepared, firstly, etching is carried out on the corresponding transition region of the mask plate and the region of the second evaporation region, and then etching is carried out on the region corresponding to the second evaporation region, so that the mask plate can be obtained. Therefore, the preparation process of the mask plate is simple.

In one embodiment, the transition region includes a first transition region and a second transition region, the thickness of the first transition region is greater than the thickness of the second transition region, the first transition region is adjacent to the first evaporation region, the second transition region is adjacent to the second evaporation region, the density of evaporation openings in the first transition region is the same as the density of evaporation openings in the first evaporation region, and the density of evaporation openings in the second transition region is the same as the density of evaporation openings in the second evaporation region. Because the density of the evaporation openings in the first transition zone is the same as that of the evaporation openings in the first evaporation zone, and the thickness of the first transition zone is greater than that of the second transition zone, the difference between the thickness of the first transition zone and that of the first evaporation zone is smaller, so that the difference between the deformation quantity of the evaporation openings in the first transition zone and that of the evaporation openings in the first evaporation zone is smaller; because the density of the evaporation openings in the second transition zone is the same as that of the evaporation openings in the second evaporation zone, and the thickness of the first transition zone is greater than that of the second transition zone, the difference between the thickness of the second transition zone and that of the second evaporation zone is smaller, and therefore the difference between the deformation quantity of the evaporation openings in the second transition zone and that of the evaporation openings in the second evaporation zone is smaller. Therefore, the deformation of the evaporation openings in the first evaporation area, the deformation of the evaporation openings in the second evaporation area and the deformation of the evaporation openings in the transition area of the mask plate are smaller, and the evaporation yield can be improved.

In one embodiment, the area of each evaporation opening in the first evaporation region is the same, the area of each evaporation opening in the second evaporation region is the same, and the area of the evaporation opening in the first evaporation region is smaller than the area of the evaporation opening in the second evaporation region. Because each coating by vaporization opening is used for the pixel in the non-transparent display area of coating by vaporization display panel in the first coating by vaporization region, and each coating by vaporization opening is used for the pixel in the transparent display area of coating by vaporization display panel in the second coating by vaporization region, then the pixel area in the transparent display area of display panel that adopts the mask plate preparation that this application embodiment provided is great, more is favorable to improving the luminousness in transparent display area.

In one embodiment, the area of each evaporation opening in the first transition zone is the same, and the area of each evaporation opening in the first transition zone is the same as the area of each evaporation opening in the first evaporation zone; the area of each evaporation coating opening in the second transition zone is the same, and the area of each evaporation coating opening in the second transition zone is the same as the area of each evaporation coating opening in the second evaporation coating zone. So set up, when the coating by vaporization organic light emitting material, the coating by vaporization opening in the first coating by vaporization region of accessible and the coating by vaporization opening in first transition district to the non-transparent display area coating by vaporization organic light emitting material of display panel, through the coating by vaporization opening in second coating by vaporization region and the coating by vaporization opening in second transition district to the transparent display area coating by vaporization organic light emitting material of display panel to make the coating by vaporization opening of mask plate all utilized.

In one embodiment, the thickness of the first evaporation area ranges from 30 μm to 60 μm, and the thickness of the second evaporation area ranges from 20 μm to 50 μm. So set up and more do benefit to in the mask plate in the regional deformation volume of coating by vaporization opening of in the first coating by vaporization region of a net in-process and the deformation volume of coating by vaporization opening is unanimous in the second coating by vaporization region.

According to the second aspect of the embodiment of the application, a mask assembly is provided, and the mask assembly comprises a mask plate frame, a support bar and at least one mask plate, wherein the support bar is fixedly arranged on the mask plate frame, and at least one mask plate is arranged on the support bar and fixedly connected with the mask plate frame.

The utility model provides a mask plate and mask subassembly, the density of coating by vaporization opening is greater than the regional density of coating by vaporization opening of second coating by vaporization in the first coating by vaporization region of mask plate, because the regional thickness of first coating by vaporization is greater than the regional thickness of second coating by vaporization, then the mask plate is at the in-process of opening a net, can make the regional open-ended deformation volume of coating by vaporization of first coating by vaporization reduce, thereby make the regional open-ended deformation volume of coating by vaporization unanimous with the regional open-ended deformation volume of coating by vaporization of second coating by vaporization of the regional in first coating by vaporization, avoid in the coating by vaporization process because the regional inconsistent open-ended deformation volume of coating by vaporization of first coating by vaporization and second coating by vaporization region and lead to the coating by vaporization process.

Drawings

Fig. 1 is a top view of a mask provided in an embodiment of the present application;

FIG. 2 is a side view of the mask shown in FIG. 1;

FIG. 3 is another side view of the mask shown in FIG. 1;

FIG. 4 is a further side view of the mask shown in FIG. 1;

fig. 5 is a schematic structural diagram of a mask assembly according to an embodiment of the present disclosure.

Detailed Description

Reference will now be made in detail to the exemplary embodiments, examples of which are illustrated in the accompanying drawings. When the following description refers to the accompanying drawings, like numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with the present application. Rather, they are merely examples of apparatus consistent with certain aspects of the present application, as detailed in the appended claims.

On intelligent electronic equipment such as a mobile phone and a tablet computer, because a photosensitive device such as a front camera and a light sensor needs to be integrated, full-screen display of the electronic equipment is generally realized by arranging a transparent display screen on the electronic equipment.

Generally, the pixel density of the transparent display area is less than that of the non-transparent display area, so that the density of the evaporation openings in the area of the evaporation mask plate corresponding to the transparent display area is lower when the organic light-emitting material is prepared, and the density of the evaporation openings in the area corresponding to the non-transparent display area is higher. The density difference of the evaporation openings at different areas of the evaporation mask plate leads to the inconsistent deformation of the evaporation openings of the evaporation mask plate at different densities in the screen opening process, so that the dislocation of the evaporation openings and the pixel openings of the display area is caused, the problems of evaporation color mixing and the like are caused, and the product yield of the electronic equipment is reduced.

In order to solve the above problem, an embodiment of the application provides a mask plate and a mask assembly. The mask plate and the mask assembly in the embodiments of the present application are described in detail below with reference to the accompanying drawings. The features of the following examples and embodiments can be supplemented or combined with each other without conflict.

Fig. 1 is a top view of a mask according to an embodiment of the present disclosure, fig. 2 is a side view of the mask shown in fig. 1, fig. 3 is another side view of the mask shown in fig. 1, fig. 4 is still another side view of the mask shown in fig. 1, and fig. 5 is a schematic structural view of a mask assembly according to an embodiment of the present disclosure.

The embodiment of the application provides a mask plate. Referring to fig. 1, the mask 100 includes a first evaporation region 10 and a second evaporation region 20, a plurality of evaporation openings 11 and 21 are respectively disposed in the first evaporation region 10 and the second evaporation region 20, and a density of the evaporation openings 11 in the first evaporation region 10 is greater than a density of the evaporation openings 21 in the second evaporation region 20. Referring to fig. 2 to 4, the thickness of the first evaporation region 10 is greater than that of the second evaporation region 20. The thicknesses of the first vapor deposition region 10 and the second vapor deposition region 20 refer to the dimensions of the mask plate 100 in the direction perpendicular to the extending direction.

When the thickness of the mask 100 is the same, the deformation resistance of the region with the higher density of the evaporation openings is smaller than that of the region with the lower density of the evaporation openings. Through the thickness in the great region of increase coating by vaporization opening density, can improve this regional anti deformability to make the anti deformability in the great region of coating by vaporization opening density and the anti deformability in the less region of coating by vaporization opening density be close unanimous, and then make mask plate 100 in the deformation volume of the mesh in-process everywhere coating by vaporization opening unanimous.

The mask 100 provided by the embodiment of the application, the density of evaporation openings 11 in the first evaporation area 10 is greater than the density of evaporation openings 21 in the second evaporation area 20, because the thickness of the first evaporation area 10 is greater than the thickness of the second evaporation area 20, the mask 100 can reduce the deformation of the evaporation openings 11 in the first evaporation area 10 in the mesh-opening process, so that the deformation of the evaporation openings 11 in the first evaporation area 10 is consistent with the deformation of the evaporation openings 21 in the second evaporation area 20, and the phenomenon that the color mixing occurs in the evaporation process due to the inconsistent deformation of the evaporation openings in the first evaporation area 10 and the second evaporation area 20 in the evaporation process is avoided, thereby improving the evaporation yield.

When the mask plate 100 provided by the embodiment of the application is used for vapor deposition, the first vapor deposition region 10 can cover a non-transparent display region of a display panel, and the second vapor deposition region 20 can cover a transparent display region of the display panel, so that organic light-emitting materials of the non-transparent display region and the transparent display region can be simultaneously prepared through vapor deposition openings 11 of the first vapor deposition region 10 and vapor deposition openings 21 of the second vapor deposition region 20.

In one embodiment, referring to fig. 1 again, the mask plate 100 may further include a transition region 30 adjacent to the first evaporation region 10 and the second evaporation region 20, and a plurality of

evaporation openings

31 and 32 are disposed in the transition region 30. Referring again to fig. 2 to 4, the thickness of the transition region 30 is greater than the thickness of the second evaporation region 20 and less than the thickness of the first evaporation region 10. The transition region 30 is adjacent to the first evaporation region 10 and the second evaporation region 20, which means that the transition region 30 is located between the first evaporation region 10 and the second evaporation region 20.

Because the transition region 30 is adjacent to the first evaporation region 10 and the second evaporation region 20, and the thickness of the transition region 30 is greater than the thickness of the second evaporation region 20 and less than the thickness of the first evaporation region 10, the transition region 30 can buffer the deformation stress of the first evaporation region 10 and the second evaporation region 20 during the screen-opening process of the mask 100, and is more favorable for making the deformation amount of the evaporation openings of the first evaporation region 10 and the second evaporation region 20 consistent.

In one embodiment, the thickness of the transition region 30 gradually decreases along the direction in which the first evaporation region 10 points to the second evaporation region 20, the maximum thickness of the transition region 30 is greater than the thickness of the second evaporation region 20, and the minimum thickness of the transition region 30 is less than the thickness of the first evaporation region 10.

Since the thickness of the transition region 30 is gradually reduced along the direction from the first evaporation region 10 to the second evaporation region 20, the transition region 30 can have a better buffer effect on the deformation stress of the first evaporation region 10 and the second evaporation region 20. The thickness of the region of the transition region 30 adjacent to the first evaporation region 10 is close to the thickness of the first evaporation region 10, and the deformation resistance of the region is close to that of the first evaporation region 10, so that the deformation amount of the evaporation openings of the region is close to that of the evaporation openings of the first evaporation region 10; if the thickness of the region of the transition region 30 adjacent to the second vapor deposition region 20 is close to the thickness of the second vapor deposition region 20, the deformation resistance of the region is close to that of the second vapor deposition region 20, and the deformation amount of the vapor deposition openings of the region is close to that of the second vapor deposition region 20. Therefore, the amount of deformation of the vapor deposition openings in the transition region 30 is less different from the amount of deformation of the vapor deposition openings in the first vapor deposition region 10 and the second vapor deposition region 20, and the vapor deposition yield can be improved.

When the thickness of the transition region 30 is gradually decreased along the direction in which the first evaporation region 10 points to the second evaporation region 20, the thickness distribution of the transition region 30 has the following two modes.

In one instance, the transition region 30 has a discontinuous thickness variation. Referring to fig. 2, the transition region 30 includes a plurality of sub-regions 33, the plurality of sub-regions 33 are arranged along the direction in which the first evaporation region 10 points to the second evaporation region 20, the thickness of the same sub-region 33 is the same everywhere, and the thickness of the sub-regions decreases in sequence along the direction in which the first evaporation region 10 points to the second evaporation region 20.

With this arrangement, in the screen-spreading process, the deformation stress of the plurality of sub-regions 33 of the transition region 30 gradually changes from the first evaporation region 10 to the second evaporation region 20, thereby achieving a buffer effect on the deformation stress of the first evaporation region 10 and the second evaporation region 20.

When the mask 100 is prepared, the mask 100 may be etched a plurality of times to form a plurality of sub-regions 33 of the transition region 30.

It should be noted that fig. 2 only illustrates that the transition region 30 includes four sub-regions 33, and in other embodiments, the number of sub-regions 33 included in the transition region 30 may be less than or greater than four.

In another case, see FIG. 3, the thickness of the transition region 30 varies continuously. When the thickness of the transition region 30 changes continuously, it is more beneficial to improve the buffer effect of the transition region 30 on the deformation stress of the first evaporation region 10 and the second evaporation region 20, but the transition region 30 can be prepared only by etching many times, and the preparation process is more complicated compared with the transition region 30 shown in fig. 2.

In another embodiment, the thickness of the transition region 30 is the same throughout, see fig. 4. In this way, when the mask 100 is prepared, first, etching is performed on the regions of the mask 100 corresponding to the transition region 30 and the second evaporation region 20, and then, etching is performed on the regions corresponding to the second evaporation region 20, so that the mask shown in fig. 4 can be obtained. It can be seen that the process for manufacturing the mask 100 is relatively simple.

In one embodiment, the vapor deposition openings 11 in the first vapor deposition region 10 have the same area, the vapor deposition openings 21 in the second vapor deposition region 20 have the same area, and the vapor deposition openings 11 in the first vapor deposition region 10 have an area smaller than the area of the vapor deposition openings 21 in the second vapor deposition region 20. Since each evaporation opening 11 in the first evaporation area 10 is used for evaporating a pixel in a non-transparent display area of the display panel, and each evaporation opening 21 in the second evaporation area 20 is used for evaporating a pixel in a transparent display area of the display panel, the pixel area of the transparent display area of the display panel prepared by using the mask plate 100 provided by the embodiment of the present application is large, and the improvement of the light transmittance of the transparent display area is facilitated.

In one embodiment, referring again to fig. 1, the transition region 30 comprises a first transition region 301 and a second transition region 302, the thickness of the first transition region 301 is greater than the thickness of the second transition region 302, the first transition region 301 is adjacent to the first evaporation region 10, the second transition region 302 is adjacent to the second evaporation region 20, the density of evaporation openings 31 in the first transition region 301 is the same as the density of evaporation openings 11 in the first evaporation region 10, and the density of evaporation openings 32 in the second transition region 302 is the same as the density of evaporation openings 21 in the second evaporation region 20.

Since the density of the evaporation openings 31 in the first transition zone 301 is the same as the density of the evaporation openings 11 in the first evaporation zone 10, and the thickness of the first transition zone 301 is greater than the thickness of the second transition zone 302, the difference between the thickness of the first transition zone 301 and the thickness of the first evaporation zone 10 is small, and thus the difference between the deformation amount of the evaporation openings in the first transition zone 301 and the deformation amount of the evaporation openings in the first evaporation zone 10 is small; since the density of the vapor deposition openings 32 in the second transition region 302 is the same as the density of the vapor deposition openings 21 in the second vapor deposition region 20, and the thickness of the first transition region 301 is greater than the thickness of the second transition region 302, the difference between the thickness of the second transition region 302 and the thickness of the second vapor deposition region 20 is small, and thus the difference between the deformation amount of the vapor deposition openings in the second transition region 302 and the deformation amount of the vapor deposition openings in the second vapor deposition region 20 is small. Therefore, the difference between the amount of deformation of the vapor deposition openings 11 in the first vapor deposition region 10, the amount of deformation of the vapor deposition openings 21 in the second vapor deposition region 20, and the amount of deformation of the vapor deposition openings in the transition region 30 of the mask 100 is small, and the vapor deposition yield can be improved.

The thickness of the first transition region 301 may gradually decrease along a direction in which the first evaporation region 10 points to the second transition region 302, and the thickness of the second transition region 302 may gradually decrease along a direction in which the first transition region 301 points to the second evaporation region 20.

In one embodiment, the area of each vapor deposition opening 31 in the first transition zone 301 is the same, and the area of each vapor deposition opening 31 in the first transition zone 301 is the same as the area of each vapor deposition opening 11 in the first vapor deposition region 10; the area of each vapor deposition opening 32 in the second transition region 302 is the same, and the area of each vapor deposition opening 32 in the second transition region 302 is the same as the area of each vapor deposition opening 21 in the second vapor deposition region 20.

In this arrangement, when depositing an organic light emitting material, the organic light emitting material can be deposited on the non-transparent display region of the display panel through the vapor deposition openings 11 of the first vapor deposition region 10 and the vapor deposition openings 31 of the first transition region 301, and the organic light emitting material can be deposited on the transparent display region of the display panel through the vapor deposition openings 21 of the second vapor deposition region 20 and the vapor deposition openings 32 of the second transition region 302, so that all the vapor deposition openings of the mask plate 100 are used.

In one embodiment, the thickness of the first evaporation region 10 is in the range of 30 μm to 60 μm, and the thickness of the second evaporation region 20 is in the range of 20 μm to 50 μm. This arrangement is more favorable for the amount of deformation of the vapor deposition openings 11 in the first vapor deposition region 10 to be consistent with the amount of deformation of the vapor deposition openings 21 in the second vapor deposition region 20 during the process of screening the mask plate 100. The thickness of the first vapor deposition region 10 may be 35 μm, 40 μm, 45 μm, 50 μm, 55 μm, or the like, and the thickness of the second vapor deposition region 20 may be 25 μm, 30 μm, 45 μm, 40 μm, 45 μm, or the like.

The embodiment of the present application further provides a mask assembly, referring to fig. 5, the mask assembly 200 includes a mask plate frame 210, a supporting bar 220 and at least one mask plate 100, the supporting bar 220 is fixedly disposed on the mask plate frame 210, and at least one mask plate 100 is disposed on the supporting bar 220 and fixedly connected to the mask plate frame 210.

When the mask assembly works, the mask plate frame 210 and the supporting bars 30 support the mask plate 100, so that the mask plate 100 can be prevented from sagging in the evaporation process, and the wrinkle phenomenon of the mask plate 100 in the screen opening process can be reduced.

The mask assembly 200 provided by the embodiment of the application, the density of the evaporation openings 11 in the first evaporation area 10 of the mask plate 100 is greater than the density of the evaporation openings 21 in the second evaporation area 20, because the thickness of the first evaporation area 10 is greater than the thickness of the second evaporation area 20, the mask plate 100 can reduce the deformation of the evaporation openings in the first evaporation area 10 in the mesh-opening process, so that the deformation of the evaporation openings in the first evaporation area 10 is consistent with the deformation of the evaporation openings in the second evaporation area 20, and the phenomenon that the color mixing occurs in the evaporation process due to the inconsistency of the deformation of the evaporation openings in the first evaporation area 10 and the second evaporation area 20 in the evaporation process is avoided, thereby improving the evaporation yield.

It is noted that in the drawings, the sizes of layers and regions may be exaggerated for clarity of illustration. Also, it will be understood that when an element or layer is referred to as being "on" another element or layer, it can be directly on the other element or layer or intervening layers may also be present. In addition, it will be understood that when an element or layer is referred to as being "under" another element or layer, it can be directly under the other element or intervening layers or elements may also be present. In addition, it will also be understood that when a layer or element is referred to as being "between" two layers or elements, it can be the only layer between the two layers or elements, or more than one intermediate layer or element may also be present. Like reference numerals refer to like elements throughout.

In the present invention, the terms "first" and "second" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance. The term "plurality" means two or more unless expressly limited otherwise.

Other embodiments of the invention will be apparent to those skilled in the art from consideration of the specification and practice of the disclosure disclosed herein. This invention is intended to cover any variations, uses, or adaptations of the invention following, in general, the principles of the invention and including such departures from the present disclosure as come within known or customary practice within the art to which the invention pertains. It is intended that the specification and examples be considered as exemplary only, with a true scope and spirit of the invention being indicated by the following claims.

It will be understood that the invention is not limited to the precise arrangements described above and shown in the drawings and that various modifications and changes may be made without departing from the scope thereof. The scope of the invention is limited only by the appended claims.

Claims

1. The utility model provides a mask plate, its characterized in that, the mask plate includes first coating by vaporization region and second coating by vaporization region, first coating by vaporization region reaches be equipped with a plurality of coating by vaporization openings in the second coating by vaporization region respectively, coating by vaporization open-ended density is greater than in the first coating by vaporization region coating by vaporization open-ended density in the second coating by vaporization region, the thickness in first coating by vaporization region is greater than the thickness in second coating by vaporization region.

2. A mask according to claim 1, further comprising a transition region adjacent to the first evaporation region and the second evaporation region, wherein a plurality of evaporation openings are provided in the transition region, and the thickness of the transition region is greater than that of the second evaporation region and less than that of the first evaporation region.

3. A mask according to claim 2, wherein the thickness of the transition region is gradually reduced along a direction in which the first evaporation region points to the second evaporation region, the maximum thickness of the transition region is greater than the thickness of the second evaporation region, and the minimum thickness of the transition region is less than the thickness of the first evaporation region.

4. A mask according to claim 3, wherein the transition region comprises a plurality of sub-regions, the plurality of sub-regions are arranged along the direction in which the first evaporation region points to the second evaporation region, the thickness of the same sub-region is the same everywhere, and the thickness of the sub-regions decreases sequentially along the direction in which the first evaporation region points to the second evaporation region.

5. A mask according to claim 2, wherein the thickness of the transition region is the same throughout.

6. A mask according to claim 2, wherein the transition region comprises a first transition region and a second transition region, the thickness of the first transition region is greater than that of the second transition region, the first transition region is adjacent to the first evaporation region, the second transition region is adjacent to the second evaporation region, the density of evaporation openings in the first transition region is the same as that of evaporation openings in the first evaporation region, and the density of evaporation openings in the second transition region is the same as that of evaporation openings in the second evaporation region.

7. A mask according to claim 6, wherein the areas of the evaporation openings in the first evaporation region are the same, the areas of the evaporation openings in the second evaporation region are the same, and the areas of the evaporation openings in the first evaporation region are smaller than the areas of the evaporation openings in the second evaporation region.

8. A mask according to claim 7, wherein the area of each evaporation opening in the first transition region is the same, and the area of each evaporation opening in the first transition region is the same as the area of each evaporation opening in the first evaporation region; the area of each evaporation coating opening in the second transition zone is the same, and the area of each evaporation coating opening in the second transition zone is the same as the area of each evaporation coating opening in the second evaporation coating zone.

9. A mask according to claim 1, wherein the thickness of the first evaporation region is in the range of 30 μm to 60 μm, and the thickness of the second evaporation region is in the range of 20 μm to 50 μm.

10. A mask assembly, which is characterized in that the mask assembly comprises a mask frame, support bars and at least one mask plate according to any one of claims 1 to 9, wherein the support bars are fixedly arranged on the mask frame, and at least one mask plate is arranged on the support bars and is fixedly connected with the mask frame.