CN110749377A - High-precision light flux measuring method - Google Patents

High-precision light flux measuring method Download PDF

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Publication number
CN110749377A
CN110749377A CN201910961814.4A CN201910961814A CN110749377A CN 110749377 A CN110749377 A CN 110749377A CN 201910961814 A CN201910961814 A CN 201910961814A CN 110749377 A CN110749377 A CN 110749377A
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light spot
illuminance
area
light
point
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CN201910961814.4A
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CN110749377B (en
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李刚
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Qingdao Zhongke Zhifu Photoelectric Technology Co ltd
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Huzhou Zhongke Optoelectronic Technology Co Ltd
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00Photometry, e.g. photographic exposure meter
    • G01J1/02Details
    • G01J1/04Optical or mechanical part supplementary adjustable parts
    • G01J1/0407Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)

Abstract

The invention relates to the technical field of luminous flux measurement, in particular to a high-precision luminous flux measurement method. The method comprises the following steps: step 1: the method comprises the steps of obtaining the diameter D of a light receiving surface of an illuminometer, obtaining the diameter D of a central hole of a diaphragm, and obtaining the proportional relation C of illuminance according to the diameter D and the diameter D; step 2: acquiring the illuminance En of n measuring points along the radial direction of the light spot, and calculating the area Sn of the light spot area where each measuring point is located; and 3, step 3: calculating the luminous flux phi n of each light spot area according to the proportional relation C, the illuminance En and the area Sn; and 4, step 4: and superposing the luminous fluxes of the light spot areas to obtain the luminous flux phi of the light spots. In the prior art, a light spot is averagely divided into n parts, and the average value of the illuminance of each part is calculated to obtain the luminous flux of the light spot. Compared with the prior art, the light spot is divided into a plurality of parts along the radial direction, the average value of the illuminance of each part does not need to be calculated, and the calculation is simpler and more convenient.

Description

High-precision light flux measuring method
Technical Field
The invention relates to the technical field of luminous flux measurement, in particular to a high-precision luminous flux measurement method.
Background
In the prior art, most of light spots generated by artificial light sources are circular, and the illuminance of the artificial light spots is gradually weakened from the circle center of the light spots to the radial direction of the light spots. In order to obtain the luminous flux of the light spot, the illuminance of the whole light spot is measured by using an illuminometer, and then the area of the light spot is calculated, so that the luminous flux of the light spot is obtained, but only one sampling point is needed, so that the measuring range of the illuminometer is easily exceeded, and the measuring error is large.
Chinese patent discloses a method for testing luminous flux of LED surface lighting fixture [ application number: CN201410844014.1, publication No.: CN104568387A ] includes: measuring the illuminance E of the light emitting surface of the LED by using an illuminometer; measuring the area A of the luminous surface of the LED; and calculating the luminous flux of the tested LED by using the formula phi ═ E × A. Although the method disclosed in the patent averagely divides the light spot into n minutes so as to measure a plurality of measuring points, the average value of the illuminance of each area needs to be calculated due to the characteristic that the illuminance of the light spot gradually changes, the actual operation is time-consuming and labor-consuming, and a more reasonable measuring method is quite necessary.
Disclosure of Invention
Aiming at the technical problems in the prior art, the invention provides a high-precision light flux measuring method.
In order to solve the technical problems, the invention provides the following technical scheme:
a high-precision light flux measuring method comprises the following steps:
step 1: the method comprises the steps of obtaining the diameter D of a light receiving surface of an illuminometer, obtaining the diameter D of a central hole of a diaphragm, and obtaining the proportional relation C of illuminance according to the diameter D and the diameter D;
step 2: acquiring the illuminance En of n measuring points along the radial direction of the light spot, and calculating the area Sn of the light spot area where each measuring point is located;
and 3, step 3: calculating the luminous flux phi n of each light spot area according to the proportional relation C, the illuminance En and the area Sn;
and 4, step 4: and superposing the luminous fluxes of the light spot areas to obtain the luminous flux phi of the light spots.
In actual operation, a vernier caliper is used for measuring the diameter D of a light receiving surface of the illuminometer, meanwhile, the vernier caliper is used for measuring the diameter D of a central hole of the diaphragm, and the proportional relation C of the illuminance is obtained according to the diameter D and the diameter D. The diaphragm is fixed on the light receiving surface of the illuminometer such that the central aperture of the diaphragm is concentric with the light receiving surface of the illuminometer, thereby limiting the receiving area of the light receiving surface by the diaphragm. And moving the illuminometer to enable the illuminometer to acquire the illuminance E1 of the first measuring point, the illuminance E2 of the second measuring point and the illuminance En of the nth measuring point along the radial direction of the light spot, and calculating the area Sn of the annular light spot area where each measuring point is located. And calculating the luminous flux phi n of each light spot region according to the proportional relation C, the illuminance En and the area Sn of each measuring point, and superposing the luminous fluxes of each light spot region to obtain the luminous flux phi n of the whole light spot. In summary, by using the diaphragm, the illuminometer can measure a plurality of measurement points along the radial direction of the light spot, instead of dividing the light spot into n average measurement points to obtain the measurement points, the illuminance of the light spot gradually decreases from the center of the light spot to the outside along the radial direction, and then the illuminance of the plurality of measurement points measured along the radial direction can be regarded as the average value of the illuminance of the corresponding annular light spot area, so that the average value of each illuminance does not need to be calculated.
Further, the proportional relation C = D ^2/D ^ 2.
Further, the step 2 further comprises the following steps: step 2-1: acquiring the measuring point with the maximum illuminance in the light spot, recording as a point 0, setting a sampling interval A,
step 2-2: according to the sampling interval A, selecting n measuring points from the point 0 along the radial direction of the light spot and acquiring the illuminance En of the corresponding measuring point;
step 2-3: and calculating the area Sn of each light spot area according to the sampling interval A.
Further, the steps 2-3 further comprise the following steps: step 2-3-1: setting an initial light spot area by taking the point 0 as a circle center, and setting the radius of the initial light spot area as r;
step 2-3-2: and calculating the area Sn according to the sampling interval A, the radius r and the number n of the measuring points.
Further, the Sn is ((r) + (A) × (n-1)) ^2- ((r) + (A) × (n-2)) ^ 2) × pi, wherein n is greater than or equal to 2.
Further, the luminous flux φ n of each spot region is C × En × S.
Compared with the prior art, the invention has the following advantages:
by using the diaphragm, the area of the light receiving surface of the illuminance meter is reduced, so that the overlapping of light spot areas where two adjacent measuring points are located is effectively prevented, and the measuring precision is improved.
And n measuring points are obtained along the radial direction of the light spots, and the illuminance of the measuring points can be regarded as the average value of the illuminance of the area of the light spots, so that the average value of the illuminance does not need to be calculated.
Drawings
FIG. 1: a method flow diagram.
FIG. 2: a dot profile is measured.
Detailed Description
The following are specific embodiments of the present invention and are further described with reference to the drawings, but the present invention is not limited to these embodiments.
A high-precision light flux measuring method comprises the following steps:
step 1: the method comprises the steps of obtaining the diameter D of a light receiving surface of an illuminometer, obtaining the diameter D of a central hole of a diaphragm, and obtaining the proportional relation C of illuminance according to the diameter D and the diameter D, wherein the proportional relation C is D ^2/D ^ 2.
Step 2: acquiring the illuminance En of n measuring points along the radial direction of the light spot, and calculating the area Sn of the light spot area where each measuring point is located;
and 3, step 3: and calculating the luminous flux phi n of each light spot area according to the proportional relation C, the illuminance En and the area Sn, wherein the luminous flux phi n is C.
And 4, step 4: and superposing the luminous fluxes of the light spot areas to obtain the luminous flux phi of the light spots.
Wherein, step 2 further comprises the following steps: step 2-1: acquiring the measuring point with the maximum illuminance in the light spot, recording as a point 0, setting a sampling interval A,
step 2-2: according to the sampling interval A, selecting n measuring points from the point 0 along the radial direction of the light spot and acquiring the illuminance En of the corresponding measuring point;
step 2-3: and calculating the area Sn of each light spot area according to the sampling interval A.
Meanwhile, the steps 2-3 also comprise the following steps: the steps 2-3 further comprise the following steps: step 2-3-1: setting an initial light spot area by taking the point 0 as a circle center, and setting the radius of the initial light spot area as r;
step 2-3-2: calculating an area Sn by the number n of the measuring points according to the sampling interval A, the radius r, and the radius r, wherein Sn is ((r) + (A) × (n-1)) ^2- ((r) + (A) × (n-2)) ^ 2) × pi, and n is greater than or equal to 2.
In actual operation, the diameter D of the light receiving surface of the illuminometer and the diameter D of the central hole of the diaphragm are measured by a vernier caliper, so that the proportional relationship C is obtained, and in the present embodiment, the proportional relationship C is 100. The diaphragm is fixed on the light receiving surface of the illuminometer so that the central aperture of the diaphragm is concentric with the light receiving surface of the illuminometer, thereby limiting the receiving area of the light receiving surface of the illuminometer by the diaphragm. And moving the illuminometer, so as to find a measuring point with the maximum illuminance in the light spot, and recording the measuring point as a point 0, wherein the point 0 is the 1 st measuring point, and the set point 0 is the center of the light spot. Setting a sampling interval a, in this embodiment, setting a measurement point every 2d along the radial direction of the light spot and acquiring the illuminance of the measurement point with the sampling interval a being 2d, taking the point 0 as a starting point, setting the illuminance of the point 0 as E1, the illuminance of the 2 nd measurement point as E2, the illuminance of the 3 rd measurement point as E3, and so on until the nth measurement point. In this embodiment, the initial spot area where the point 0 is located is a circle, the spot areas where the other measurement points are located are all annular, and the radius of the initial spot area is set to be r, where the initial radius r is d, and the distance between the 2 nd measurement point and the point 0 is d +2d, so that overlap of the 2 nd measurement point and the spot area where the point 0 is located is effectively prevented. And calculating the area Sn of the corresponding light spot area of each measuring point according to the sampling interval A and the radius r. In this embodiment, as shown in fig. 2, the area S1 of the spot region where the point 0 is located is (d ^2-0^ 2) ^ pi, the area S2 of the spot region where the 2 nd measurement point is (d +2 d) ^2-d ^ 2) ^ pi, the area S3 of the spot region where the 3 rd measurement point is located is ((d +2d ^ 2) ^2- (d +2 d) ^ 2) ^ pi, and so on, the area Sn of the spot region where the nth measurement point is ((d +2d ^2 (n-1)) ^2- (d +2d (n-2)) ^ pi). Thus, the luminous flux φ n of the corresponding spot region of each measurement point is C × En × Sn, for example: the luminous flux Φ 1 of the spot region where the spot 0 is located is C × E1 × S1, the luminous flux Φ 1 of the spot region where the 2 nd measurement point is located is C × E2 × S2, and so on until the nth measurement point Φ n. And superposing the light fluxes of the light spot areas, wherein the light flux phi of the light spots is the sum of phi 1, phi 2, phi 3 and phi n.
According to the method, the receiving area of the light receiving surface of the illuminance meter is reduced through the diaphragm, so that on one hand, overlapping of light spot areas where the measuring points are located can be effectively prevented, on the other hand, the distance between every two adjacent measuring points is effectively reduced, the number of the measuring points is increased, and further, the illuminance of the measuring points can be regarded as the average value of the illuminance of the corresponding light spot areas. In summary, if the illuminometer is used directly for measurement, the error is too large to implement the method.
The specific embodiments described herein are merely illustrative of the spirit of the invention. Various modifications or additions may be made to the described embodiments or alternatives may be employed by those skilled in the art without departing from the spirit or ambit of the invention as defined in the appended claims.

Claims (6)

1. A high-precision light flux measuring method is characterized in that: the method comprises the following steps: step 1: the method comprises the steps of obtaining the diameter D of a light receiving surface of an illuminometer, obtaining the diameter D of a central hole of a diaphragm, and obtaining the proportional relation C of illuminance according to the diameter D and the diameter D;
step 2: acquiring the illuminance En of n measuring points along the radial direction of the light spot, and calculating the area Sn of the light spot area where each measuring point is located;
and 3, step 3: calculating the luminous flux phi n of each light spot area according to the proportional relation C, the illuminance En and the area Sn;
and 4, step 4: and superposing the luminous fluxes of the light spot areas to obtain the luminous flux phi of the light spots.
2. A high-precision light flux measuring method according to claim 1, characterized in that: the proportional relation C = D ^2/D ^ 2.
3. A high-precision light flux measuring method according to claim 1, characterized in that: the step 2 further comprises the following steps: step 2-1: acquiring the measuring point with the maximum illuminance in the light spot, recording as a point 0, setting a sampling interval A,
step 2-2: according to the sampling interval A, selecting n measuring points from the point 0 along the radial direction of the light spot and acquiring the illuminance En of the corresponding measuring point;
step 2-3: and calculating the area Sn of each light spot area according to the sampling interval A.
4. A high-precision light flux measuring method according to claim 3, characterized in that: the steps 2-3 further comprise the following steps: step 2-3-1: setting an initial light spot area by taking the point 0 as a circle center, and setting the radius of the initial light spot area as r;
step 2-3-2: and calculating the area Sn according to the sampling interval A, the radius r and the number n of the measuring points.
5. A high-precision light flux measuring method according to claim 4, characterized in that: the Sn is ((r) + (A) × (n-1)) ^2- ((r) + (A) × (n-2)) ^ 2) × pi, wherein n is greater than or equal to 2.
6. A high-precision light flux measuring method according to claim 1, characterized in that: the luminous flux φ n of each spot region is C × En × Sn.
CN201910961814.4A 2019-10-11 2019-10-11 High-precision light flux measuring method Active CN110749377B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5914777A (en) * 1997-01-20 1999-06-22 Minolta Co., Ltd. Apparatus for and method of measuring a distribution of luminous intensity of light source
US7015489B2 (en) * 2001-01-23 2006-03-21 Carl Zeiss Smt Ag Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm
CN101287974A (en) * 2006-04-12 2008-10-15 松下电器产业株式会社 Optical measuring device
CN101464186A (en) * 2007-12-21 2009-06-24 株式会社光学系统 Photometry apparatus of luminophor

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5914777A (en) * 1997-01-20 1999-06-22 Minolta Co., Ltd. Apparatus for and method of measuring a distribution of luminous intensity of light source
US7015489B2 (en) * 2001-01-23 2006-03-21 Carl Zeiss Smt Ag Collector having unused region for illumination systems using a wavelength less than or equal to 193 nm
CN101287974A (en) * 2006-04-12 2008-10-15 松下电器产业株式会社 Optical measuring device
CN101464186A (en) * 2007-12-21 2009-06-24 株式会社光学系统 Photometry apparatus of luminophor

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Effective date of registration: 20230926

Address after: 266000 room 205, building 1, 61 Guangsheng Road, high tech Zone, Qingdao, Shandong Province

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Address before: 313000 office 1206-11, floor 12, building 3, No. 1366, Hongfeng Road, Huzhou Economic and Technological Development Zone, Huzhou City, Zhejiang Province

Patentee before: HUZHOU CAS PHOTOELECTRIC TECHNOLOGY CO.,LTD.

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