CN110718341A - Method for manufacturing adjustable insulation layer of surface resistance of conducting wire - Google Patents
Method for manufacturing adjustable insulation layer of surface resistance of conducting wire Download PDFInfo
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- CN110718341A CN110718341A CN201910994653.9A CN201910994653A CN110718341A CN 110718341 A CN110718341 A CN 110718341A CN 201910994653 A CN201910994653 A CN 201910994653A CN 110718341 A CN110718341 A CN 110718341A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/06—Insulating conductors or cables
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B13/00—Apparatus or processes specially adapted for manufacturing conductors or cables
- H01B13/06—Insulating conductors or cables
- H01B13/16—Insulating conductors or cables by passing through or dipping in a liquid bath; by spraying
- H01B13/165—Insulating conductors or cables by passing through or dipping in a liquid bath; by spraying by spraying
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Abstract
The invention discloses a method for manufacturing a surface resistance-adjustable insulating layer of a wire, wherein the wire is provided with a wire core, and the method comprises the steps of manufacturing the resistance-adjustable insulating layer on the surface of the wire core by using a vapor deposition coating method; the material for forming the resistance adjustable insulating layer comprises at least one of metal oxide, metal nitride, metal sulfide, metal fluoride, metal carbide and nano non-metal material. According to the scheme, the multilayer resistance adjustable insulating layer is manufactured on the surface of the wire core by using a vapor deposition coating method, so that the wires with different voltage resistance and insulating resistance insulating layers are manufactured on the surface of the wire core. The surface resistance adjustable insulating layer lead can transmit electric power and a signal source in a conventional frequency and high frequency region, can be made into a special cable for power transmission, a high-frequency signal transmission lead and a lead for high-frequency shielding, can replace an enameled wire adopting a conventional surface dip coating process, and can reach a certain voltage-resistant and high-temperature-resistant grade.
Description
Technical Field
The invention relates to the technical field of wire and cable processing, in particular to a method for manufacturing an insulation layer with adjustable surface resistance of a lead.
Background
For years, metal is widely applied in the electrical field, enameled wires are the main raw materials of products such as motors, electric appliances and household appliances, especially, the continuous and rapid growth of the power industry is realized in recent years, the rapid development of the household appliances brings a wider field for the application of the enameled wires, and then higher requirements are put forward on the enameled wires. Therefore, the product structure of the enameled wire is inevitably adjusted, and the raw materials (copper and paint), the enameled process, the process equipment, the detection means and the like matched with the enameled wire are also urgently needed to be developed and researched.
At present, the annual production capacity of enameled wires in China exceeds 25 ~ 30 ten thousand tons, but the conditions of the enameled wires in China are low-level repetition in general, namely 'high yield, low grade, backward equipment, high energy consumption and great environmental pollution caused by an immersion process'.
In the development of electrical signal transmission and miniaturization of high-frequency motors and electric appliances, the traditional cable is gradually replaced by the ultra-fine lead wire suitable for various frequencies. The biggest problem exists is that the dip coating thickness and the material of the traditional enameled wire can not meet the insulation requirement of high temperature resistance, and a material with adjustable medium needs to be found to meet the special requirement of an electric signal on a transmission cable.
Specifically, the larger the diameter of the wire core of the conventional enameled wire is, the thinner the dip coating thickness on the outer surface of the conventional enameled wire is, and the smaller the diameter of the wire core is, the thicker the dip coating thickness on the outer surface of the conventional enameled wire is, and the dip coating thickness of the conventional enameled wire is usually between 0.05 mm and 0.15 mm according to the size of the wire diameter, so that the dip coating thickness is generally relatively too thick.
Disclosure of Invention
In order to solve the above technical problems, an object of the present invention is to provide a method for manufacturing a surface resistance-adjustable insulation layer of a conductive wire, which can manufacture different withstand voltages and insulation resistances on the surface of the conductive wire.
In order to achieve the purpose of the invention, the invention adopts the following technical scheme: a method for manufacturing a surface resistance adjustable insulating layer of a wire, wherein the wire is provided with a wire core, and the method comprises the steps of manufacturing the resistance adjustable insulating layer on the surface of the wire core by using a vapor deposition coating method; the material for forming the resistance adjustable insulating layer comprises at least one of metal oxide, metal nitride, metal sulfide, metal fluoride, metal carbide and nano non-metal material.
In the above technical solution, preferably, the total thickness of the manufactured insulating layers is 0.1 μm to 5 μm.
In the above technical solution, preferably, the metal oxide includes at least one of silicon dioxide, aluminum oxide, tantalum pentoxide, titanium dioxide, niobium pentoxide, zirconium dioxide, niobium oxide, zinc oxide, tin oxide, yttrium oxide, and tungsten trioxide; and/or the metal nitride comprises at least one of aluminum nitride, silicon nitride, titanium nitride, zirconium nitride and vanadium nitride; and/or the metal sulfide comprises at least one of molybdenum sulfide, zinc sulfide, niobium sulfide, tin sulfide, tungsten sulfide and tantalum sulfide; and/or the metal fluoride comprises at least one of magnesium fluoride, zirconium fluoride and iridium fluoride; and/or the metal carbide comprises at least one of titanium carbide, zirconium carbide, tungsten carbide, tantalum carbide and vanadium carbide.
In the above technical solution, preferably, the wire core is made of gold, silver, copper, aluminum, iron, nickel or metal alloy.
In the above technical solution, preferably, the wire core is a wire or a tape.
In the above technical solution, preferably, when the wire core is a wire or a strip, the vapor deposition coating mode is a vapor deposition coating of a continuous film layer of the wire or the strip.
In the above technical solution, preferably, the resistance-adjustable insulating layer includes at least one insulating film, and a thickness of a single insulating film is 1nm to 100 nm.
In the above technical solution, preferably, the total number of layers of the resistance-adjustable insulating layer is 2 to 2000.
In the above technical solution, preferably, when the number of insulating films forming the resistance-adjustable insulating layer is greater than or equal to 2, the outer surface of the core is coated with corresponding materials forming each insulating film layer by using a vapor deposition coating method to manufacture the resistance-adjustable insulating layer.
In the above technical solution, preferably, the vapor deposition coating of the continuous film layer of the wire strip includes: and continuously moving the wire core under the vacuum or normal pressure condition, and depositing corresponding materials for forming each insulating film layer on the outer surface of the continuously moving battery core layer by layer in one of a normal pressure plasma vapor deposition nanometer nonmetal film layer mode, an electron beam film layer deposition mode under the vacuum condition, a chemical vapor deposition film layer mode under the negative pressure high temperature or low temperature condition and a direct current or alternating current medium frequency or radio frequency reaction vapor deposition film layer mode under the negative pressure condition.
The invention realizes the manufacture of the lead with different voltage resistance and insulation resistance insulation layers on the surface of the wire core by manufacturing the insulation layer with adjustable resistance on the surface of the wire core by using a vapor deposition coating method. The surface resistance adjustable insulating layer lead can transmit electric power and a signal source in a conventional frequency and high frequency region, can be made into a special cable for power transmission, a high-frequency signal transmission lead and a lead for high-frequency shielding, can replace an enameled wire adopting a conventional surface dip coating process, and can reach a certain voltage-resistant and high-temperature-resistant grade.
Drawings
FIG. 1 is a schematic cross-sectional view of a wire according to an embodiment of the present invention;
FIG. 2 is a schematic flow diagram of a film forming apparatus comprising a normal pressure plasma vapor deposition coating zone;
FIG. 3 is a schematic cross-sectional view of a second wire according to an embodiment of the present invention;
FIG. 4 is a schematic flow diagram of a vacuum film forming apparatus including a normal pressure plasma vapor deposition coating zone or a vapor deposition coating zone in a vacuum environment;
10, a lead; 11. a wire core; 12. a resistance adjustable insulating layer; 13. a UV paint protective layer;
200. a wire rod; 201. a composite wire; 21. an unwinding system; 211. an unwinding mechanism; 22. an ion cleaning system; 23. a plasma spray deposition system; 231. plasma spraying the deposition area; 232. a nitrogen protection system; 233. an argon protection system; 234. a plasma power supply system; 24. a rolling pretreatment system; 25. a winding system; 251. a winding mechanism;
30. a wire; 31. a wire core; 32. a resistance adjustable insulating layer;
400. flat wires; 401. compounding flat wires; 41. unreeling a vacuum chamber; 411. an unwinding mechanism; 412. a vacuum-pumping system for the coating area; 43. a vacuum coating system; 431. an electron beam plasma vapor deposition zone; 432. a vacuum-pumping system for the coating area; 433. a gas system; 434. a vacuum-pumping system for the coating area; 44. a surface treatment chamber; 45. a winding system; 451. a winding mechanism; 452. and a vacuum pumping system for the coating area.
Detailed Description
For the purpose of illustrating the technical content, the constructional features, the achieved objects and the effects of the invention in detail, reference will be made to the following detailed description of the embodiments in conjunction with the accompanying drawings.
In one embodiment, a copper wire/aluminum oxide/aluminum nitride/aluminum oxide surface insulation layer wire and a process for making the same
As shown in fig. 1, which shows a schematic cross-sectional view of a metal copper wire/aluminum oxide/aluminum nitride/aluminum oxide surface insulation layer wire 10, a central wire core 11 of the wire 10 is formed by a single copper wire with a diameter of 0.50mm, and an outer surface of the wire core 11 is sequentially coated with a resistance-adjustable insulation layer 12 formed by an aluminum oxide/aluminum nitride/aluminum oxide composite film and a UV coating protection layer 13 manufactured by a UV coating method by using an atmospheric pressure plasma deposition process; the aluminum oxide/aluminum nitride/aluminum oxide composite film is formed by alternately stacking aluminum oxide films and aluminum nitride films, the aluminum oxide films and the aluminum nitride films are respectively provided with 20 layers, the thickness of each aluminum oxide film and each aluminum nitride film is 10nm, and the thickness of the UV paint protective layer 13 is 0.5 mu m.
The following describes the manufacturing process of the copper metal wire/aluminum oxide/aluminum nitride/aluminum oxide surface insulation layer wire 10:
the first step is as follows: the prepared single copper wire with the thickness of 0.5mm is made into a continuous coiled material, the coiled material is placed into an unreeling system 21 in the figure 2, the unreeling mechanism 211 is utilized to complete wire leading and enter a reeling pretreatment system 24 in the figure 2 according to the process requirements, three groups of independent plasma spraying deposition areas 231 in a plasma spraying deposition system 23 are respectively started, the plasma spraying deposition system 23 comprises a nitrogen protection system 232 and an argon protection system 233, and a reeling system 25 and a reeling mechanism 251 are arranged at the downstream of the reeling pretreatment system 24.
The second step is that: the wire 200 enters the ion cleaning system 22 through guidance, enters the plasma spraying deposition system 23 after surface pretreatment is completed, is subjected to multiple-cycle deposition of an alumina film and an aluminum nitride film, enters the rolling pretreatment system 24 after the surface pretreatment is completed, is subjected to manufacturing of a UV coating protective layer, is subjected to manufacturing of the whole process flow to obtain the composite wire 201, and then enters the rolling system 25 to be rolled to obtain a finished product. Among them, the plasma spray deposition system 23 can also be provided with more groups to realize the fabrication of insulating layers containing more insulating films, and by replacing and combining different deposition materials.
In the plasma spraying deposition system 23, argon for the process of the argon protection system 232 and nitrogen for the process of the nitrogen protection system 233 are input into the plasma spraying deposition system 23 through the gas supply pipeline, so that the process required gas pressure reaches 1.3 to 1.5 kg/cm2Setting the deposition material to be the combination of aluminum oxide and aluminum nitride at atmospheric pressure, adjusting a plasma power supply system 234 to control the current to be 100A and 120A respectively, controlling the voltage to be 10V, alternately depositing the aluminum oxide material and the aluminum nitride material on the outer surface of the 0.5mm wire rod 200 in a layered mode, and repeating the coating process of depositing the aluminum oxide film and the aluminum nitride film 20 times respectively to ensure that the resistance-adjustable insulating layer with uniform components is obtained, wherein the thickness of each coating film is controlled to be about 10 nm.
In the plasma deposition system 23, the wire rod on which the aluminum oxide material and the aluminum nitride material have been deposited is introduced into the winding pretreatment system 24, and the UV coating protective layer is added to improve the wear-resistant and corrosion-resistant properties, and the thickness of the UV coating protective layer is controlled to be about 0.5 μm.
Second embodiment, the conductor with the resistance-adjustable insulation layer of Al/AlN/TiC and the manufacturing process thereof
As shown in FIG. 3, a cross-sectional view of an aluminum/aluminum nitride/titanium carbide resistance-adjustable insulated layer wire 30 is shown, wherein a central core 31 of the wire 30 is a flat aluminum ribbon conductive core with a length x width of 2.0mm x 0.25mm, the surface of the aluminum ribbon core 31 is sequentially coated with a resistance-adjustable insulated layer 32 composed of a plurality of layers of aluminum nitride films and a plurality of layers of titanium carbide films by vacuum plasma vapor deposition, and the surface resistance of a wire of the resistance-adjustable insulated layer 32 can be 1.0 × 106～14A Europe mother; wherein, the aluminum nitride film is designed into 30 layers in total, and the thickness of each layer is designed to be 5 nm; the titanium carbide film was designed to have 30 layers in total, and the thickness of each layer was designed to be 2 nm.
The process for making the aluminum/aluminum nitride/titanium carbide resistance-adjustable insulated layer wire 30 is described as follows:
the first step is as follows: the prepared 2.0mm x 0.25mm flat wire core is made into a continuous coiled material, and is placed into an unreeling vacuum chamber 41 in the attached drawing 4, the unreeling mechanism 411 is used for completing the wire leading and unreeling preparation in the attached drawing 3 according to the process requirements, and a vacuum coating system 43 comprising three groups of independent electron beam plasma vapor deposition areas 431, vacuum pumping systems 412, 432 and 452 of the coating areas are respectively started to enable the vacuum degree of the whole cavity to reach 3.0 x 10 < -3 > Pa.
The second step is that: process argon/nitrogen/methane (CH 4) was made into a mixed gas via gas system 433, mixing ratio 6: 2: 2 respectively enter a vacuum coating system 43, and the working vacuum degree reaching the coating process requirement is 3 multiplied by 10-1Pa, ion beam current is controlled at 5A and voltage 480V respectively, ion beam sputtering reaction coating is carried out to prepare an aluminum nitride film and a titanium carbide film on the surface of the aluminum flat wire 400, and the preparation of the aluminum nitride film and the titanium carbide film is repeated for 30 times, namely, 30 layers of aluminum nitride films and 30 layers of titanium carbide films are alternately formed on the outer side of the aluminum flat wire core, and the surface resistance of the wire is controlled at 1.0 multiplied by 1012～14The Europe/corona voltage is 2500V, and the surface resistance of the Europe/corona voltage realizes on-line detection and feedback control of the film coating condition.
In the vacuum film forming apparatus, the composite flat wire 401 on which the aluminum nitride/titanium carbide film layer has been deposited in the vacuum film coating system 43 may be introduced into the surface treatment chamber 44, a UV coating protective layer is added to improve the wear-resistant and corrosion-resistant properties, the thickness of the UV coating protective layer is controlled to be about 0.2 μm, and finally the UV coating protective layer enters the winding system 45, and the product is wound by the winding mechanism 451. The UV paint protective layer can not be manufactured due to different requirements on products.
Example III copper/tantalum pentoxide/zirconium fluoride resistance-adjustable insulation layer wire and manufacturing process thereof
The copper/tantalum pentoxide/zirconium fluoride resistance-adjustable insulating layer wire has a structure similar to that of the second embodiment, and can be manufactured by the apparatus of the second embodiment. The middle wire core of the wire consists of a single flat copper wire with the thickness of 4.0x2.0mm, and the surface of the wire core is sequentially coated with a resistance-adjustable insulating layer consisting of a high-temperature tantalum pentoxide/zirconium fluoride composite film through evaporation and vacuum reaction by an electron gun; the tantalum pentoxide/zirconium fluoride composite film is formed by alternately superposing tantalum pentoxide films and zirconium fluoride films, wherein each film layer of the tantalum pentoxide films and each film layer of the zirconium fluoride films are respectively provided with 30 layers, the thickness of each tantalum pentoxide film is designed to be 10nm, and the thickness of each zirconium fluoride film is designed to be 5 nm. And a UV paint protective layer with the thickness of 0.3 μm is arranged on the outer side of the insulating layer.
The following describes the manufacturing process of the copper/tantalum pentoxide/zirconium fluoride resistance-adjustable insulation layer wire:
the first step is as follows: the prepared single flat copper wire with the diameter of 4.0 multiplied by 2.0mm is used as a base material of a flat strip after the surface of the single flat copper wire is subjected to pre-cleaning treatment and is used as a wire core to be made into a continuous coiled material, the coiled material is placed into an unreeling vacuum chamber 41 in the attached drawing 4, the unreeling mechanism 411 in the attached drawing 4 is used for completing the preparation of leading and unreeling according to the process requirements, and three groups of independent electron guns of a vacuum coating system 43 are respectively started to evaporate, react, coat and deposit areas 431' and coat area vacuumizing systems 412, 432 and 452 so that the vacuum degree of the whole cavity reaches 3.-3Pa。
The second step is that: preparing process oxygen/CF 4 into mixed gas through a gas system 8, and respectively feeding the mixed gas into a vacuum coating system at a mixing ratio of 6:443, starting vacuum degree to 6.0 × 10-3Pa, the working vacuum degree required by the reaction evaporation process is 3 multiplied by 10-1Pa, a cathode heating power supply AC is 3V/50A, the anode voltage is controlled at 10KV, an electron gun evaporation reaction coating film is carried out on the surface of the copper flat wire to prepare a tantalum pentoxide film and a zirconium fluoride film, and the tantalum pentoxide film and the zirconium fluoride reaction coating film are alternately repeated for 30 times to prepare a high-temperature resistant resistance adjustable insulating layer; at the moment, the insulation temperature resistance of the lead can reach 380-500 ℃, and the surface resistance is controlled to be 1.0 multiplied by 1012～14The Europe/corona voltage is 2500V, and the surface resistance of the Europe/corona voltage realizes on-line detection and feedback control of the film coating condition.
In the plasma deposition system, the copper flat wire on which the tantalum pentoxide and zirconium fluoride materials are deposited is introduced into the surface treatment chamber 44, a UV coating protective layer is added to improve the wear-resistant and corrosion-resistant characteristics, the thickness of the UV coating protective layer is controlled to be about 0.2 μm, and UV coating can be omitted when the requirements on products are different.
Fourth embodiment, copper/aluminum trioxide/silicon dioxide combined resistance-adjustable insulating layer wire and manufacturing process thereof
The structure of the copper/aluminum trioxide/silicon dioxide combined resistance-adjustable insulating layer wire has a similar structure to the wire in embodiment 2 described above, and can be manufactured using the apparatus in embodiment 2. The middle wire core of the wire consists of a single copper wire with the wire diameter of 1.15mm, and the surface of the wire core is sequentially coated with methylaluminoxane and monosilane (SiH)4) Disilane (Si)2H6) Hydrogen (H)2) And water (H)20) Forming a resistance-adjustable insulating layer by vapor-phase reaction deposition of an alumina film layer and a silicon dioxide film layer; wherein, the film layer of the aluminum oxide film and the film layer of the silicon dioxide are alternately overlapped, the film layer of the aluminum oxide film and the film layer of the silicon dioxide are respectively designed into 300 layers, the thickness of each layer of the aluminum oxide film is designed into 3nm, the thickness of each layer of the silicon dioxide film is designed into 2nm, the outer side of the insulating layer is also provided with a UV paint protective layer, and the thickness of the UV paint protective layer is designed into 0.2 mu m.
The following describes the fabrication process of the copper/aluminum trioxide/silicon dioxide combined resistance adjustable insulation layer wire 30:
the first step is as follows: preparing a single wire with the diameter of 1.15mmCopper wires, which are used as wire cores after surface pre-cleaning treatment, are made into continuous coils, are placed in the unwinding vacuum chamber 41 in the figure 4, the unwinding mechanism 411 in the figure 3 is used for completing the preparation of wire leading and unwinding according to the process requirements, and three groups of independent chemical vapor reaction deposition coating areas 431' and coating area vacuumizing systems 412, 432 and 452 of the vacuum coating system 43 are respectively started to ensure that the vacuum degree of the whole cavity reaches 8.0 multiplied by 10-3Pa。
The second step is that: when the vacuum degree of a deposition reaction vacuum coating area reaches 6.0 multiplied by 10 < -3 > Pa, working gas prepared by Methylaluminoxane (MAO), monosilane (SiH4), working carrier gas hydrogen (H2) and high purity water for reaction through a gas system respectively enters a reaction chamber of the vacuum coating system, wherein the temperature of the reaction chamber is kept at 220 ℃, the working vacuum degree required by a reaction evaporation process is 5.0 multiplied by 10 < -1 > Pa, the Methylaluminoxane (MAO), the monosilane (SiH4) and the working carrier gas hydrogen (H2) are mixed, and the gas flow ratio is as follows: MAO/SiH4/H2 is controlled at 300sccm/220sccm/500sccm, and the wire continuously enters the reaction chamber to be alternately deposited to prepare the high-temperature resistance adjustable insulating layer, the insulation temperature of the wire can reach 300-400 ℃, and the surface resistance is controlled at 1.0 multiplied by 1010～12The Europe/corona voltage is 1800V, and the surface resistance of the Europe/corona voltage realizes on-line detection and feedback control of the film coating condition.
In the plasma deposition system, the wire rod with the deposited aluminum oxide and silicon dioxide copper materials is introduced into the surface treatment chamber, the UV coating protective layer is added to improve the wear-resisting and corrosion-resisting properties, the thickness of the UV coating protective layer is controlled to be about 0.2 mu m, and UV coating can be omitted when the requirements on products are different.
The above embodiments are merely illustrative of the technical ideas and features of the present invention, and the purpose thereof is to enable those skilled in the art to understand the contents of the present invention and implement the present invention, and not to limit the protection scope of the present invention. All equivalent changes or modifications made according to the spirit of the present invention should be covered within the protection scope of the present invention.
Claims (10)
1. A method for manufacturing a surface resistance adjustable insulating layer of a wire, wherein the wire is provided with a wire core, and is characterized in that the manufacturing method comprises the steps of manufacturing the resistance adjustable insulating layer on the surface of the wire core by using a vapor deposition coating method; the material for forming the resistance adjustable insulating layer comprises at least one of metal oxide, metal nitride, metal sulfide, metal fluoride, metal carbide and nano non-metal material.
2. The method of claim 1, wherein the total thickness of the insulating layer is 0.1 μm to 5 μm.
3. The method of claim 1, wherein the metal oxide comprises at least one of silicon dioxide, aluminum oxide, tantalum pentoxide, titanium dioxide, niobium pentoxide, zirconium dioxide, niobium oxide, zinc oxide, tin oxide, yttrium oxide, tungsten trioxide; and/or the metal nitride comprises at least one of aluminum nitride, silicon nitride, titanium nitride, zirconium nitride and vanadium nitride; and/or the metal sulfide comprises at least one of molybdenum sulfide, zinc sulfide, niobium sulfide, tin sulfide, tungsten sulfide and tantalum sulfide; and/or the metal fluoride comprises at least one of magnesium fluoride, zirconium fluoride and iridium fluoride; and/or the metal carbide comprises at least one of titanium carbide, zirconium carbide, tungsten carbide, tantalum carbide and vanadium carbide.
4. The method of claim 1, wherein the wire core is made of gold, silver, copper, aluminum, iron, nickel, or a metal alloy.
5. The method of claim 1, wherein the wire core is a wire or a ribbon.
6. The method of claim 5, wherein the vapor deposition coating is a continuous film vapor deposition coating of the wire or tape when the wire core is a wire or tape.
7. The method according to claim 1, wherein the resistance tunable insulating layer comprises at least one insulating film, and a thickness of a single insulating film is 1nm to 100 nm.
8. The method of claim 7, wherein the total number of layers of the resistance tunable insulating layer is 2 to 2000 layers.
9. The method as claimed in claim 8, wherein when the number of insulating films constituting the insulation layer is 2 or more, the insulation layer is prepared by coating the corresponding material constituting each insulating film on the outer surface of the core layer by vapor deposition coating.
10. The method of claim 9, wherein said line strip continuous film vapor deposition coating comprises: and continuously moving the wire core under the vacuum or normal pressure condition, and depositing corresponding materials for forming each insulating film layer by layer on the outer surface of the continuously moving wire core in a vapor deposition film layer manner in one of a normal pressure plasma vapor deposition nanometer nonmetal film layer manner, an electron beam deposition film layer manner under the vacuum condition, a chemical vapor deposition film layer manner under the negative pressure high temperature or low temperature condition and a direct current or alternating current medium frequency or radio frequency reaction vapor deposition film layer manner under the negative pressure condition.
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| CN111363996A (en) * | 2020-04-14 | 2020-07-03 | 广州珈鹏科技有限公司 | Protective coating for electromagnetic induction heating coil and preparation method |
| CN112701024A (en) * | 2020-12-25 | 2021-04-23 | 南京三乐集团有限公司 | Novel insulating material for miniaturized rapid-start cathode heater assembly and preparation method thereof |
| CN112798130A (en) * | 2020-12-30 | 2021-05-14 | 浙江启尔机电技术有限公司 | Multi-path temperature measuring device and multi-path temperature measuring circuit thereof |
| CN114520083A (en) * | 2022-03-10 | 2022-05-20 | 湘潭市霞城电工有限公司 | Production process and equipment of freon-resistant composite enameled wire wrapped by glass fiber |
| CN114758838A (en) * | 2021-01-11 | 2022-07-15 | 上海乔辉新材料科技有限公司 | Manufacturing method of silver-plated wire |
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| CN114758838A (en) * | 2021-01-11 | 2022-07-15 | 上海乔辉新材料科技有限公司 | Manufacturing method of silver-plated wire |
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