CN110556444A - acid and alkali resistant photovoltaic reflective film and preparation method thereof - Google Patents
acid and alkali resistant photovoltaic reflective film and preparation method thereof Download PDFInfo
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- 239000002253 acid Substances 0.000 title claims abstract description 96
- 239000003513 alkali Substances 0.000 title claims abstract description 92
- 238000002360 preparation method Methods 0.000 title claims abstract description 18
- 239000010410 layer Substances 0.000 claims abstract description 198
- 239000011241 protective layer Substances 0.000 claims abstract description 46
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 26
- 239000012790 adhesive layer Substances 0.000 claims abstract description 20
- 229920005989 resin Polymers 0.000 claims abstract description 17
- 239000011347 resin Substances 0.000 claims abstract description 17
- 230000006835 compression Effects 0.000 claims abstract description 16
- 238000007906 compression Methods 0.000 claims abstract description 16
- 238000000034 method Methods 0.000 claims abstract description 15
- 230000003647 oxidation Effects 0.000 claims abstract description 14
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 14
- 238000007747 plating Methods 0.000 claims abstract description 11
- 239000011248 coating agent Substances 0.000 claims abstract description 10
- 238000000576 coating method Methods 0.000 claims abstract description 10
- 230000008018 melting Effects 0.000 claims abstract description 6
- 238000002844 melting Methods 0.000 claims abstract description 6
- 229910052751 metal Inorganic materials 0.000 claims abstract description 5
- 239000002184 metal Substances 0.000 claims abstract description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 24
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 21
- 239000000463 material Substances 0.000 claims description 12
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 8
- 238000009713 electroplating Methods 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 6
- 229920005749 polyurethane resin Polymers 0.000 claims description 6
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 4
- 239000004840 adhesive resin Substances 0.000 claims description 3
- 229920006223 adhesive resin Polymers 0.000 claims description 3
- 238000000313 electron-beam-induced deposition Methods 0.000 claims description 3
- 230000008020 evaporation Effects 0.000 claims description 3
- 238000001704 evaporation Methods 0.000 claims description 3
- 239000007788 liquid Substances 0.000 claims description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims description 2
- 238000003466 welding Methods 0.000 claims description 2
- 239000003292 glue Substances 0.000 abstract description 6
- 238000002156 mixing Methods 0.000 abstract description 6
- 230000000694 effects Effects 0.000 abstract description 4
- 230000002035 prolonged effect Effects 0.000 abstract description 3
- 239000002585 base Substances 0.000 description 11
- 238000004519 manufacturing process Methods 0.000 description 6
- 229920002799 BoPET Polymers 0.000 description 5
- 238000002791 soaking Methods 0.000 description 5
- 238000010586 diagram Methods 0.000 description 4
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 238000005286 illumination Methods 0.000 description 3
- 239000005022 packaging material Substances 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 238000010248 power generation Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/29—Laminated material
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/12—Reflex reflectors
- G02B5/126—Reflex reflectors including curved refracting surface
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/054—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means
- H01L31/0547—Optical elements directly associated or integrated with the PV cell, e.g. light-reflecting means or light-concentrating means comprising light concentrating means of the reflecting type, e.g. parabolic mirrors, concentrators using total internal reflection
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/322—Applications of adhesives in processes or use of adhesives in the form of films or foils for the production of solar panels
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/10—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet
- C09J2301/16—Additional features of adhesives in the form of films or foils characterized by the structural features of the adhesive tape or sheet by the structure of the carrier layer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/52—PV systems with concentrators
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Electromagnetism (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
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- Optical Elements Other Than Lenses (AREA)
- Laminated Bodies (AREA)
Abstract
The invention provides an acid and alkali resistant photovoltaic reflective film, which comprises: from bottom to top are divided into 5 layers, which are respectively: the light-reflecting layer comprises an adhesive layer, a carrier layer, a prismatic layer and an acid and alkali resistant functional protective layer. The preparation method comprises the following steps: preparing a plurality of prismatic structures on the surface of a compression roller in advance, then coating ultraviolet curing glue resin on the surface of a carrier layer, and performing ultraviolet curing through the compression roller to form a prismatic layer; plating a layer of metal aluminum on the upper surface of the prismatic layer to form a reflecting layer; carrying out oxidation treatment on the surface of the reflecting layer to obtain an acid and alkali resistant functional protective layer; blending and granulating, and then coating the lower surface of the carrier layer by melting and extruding to form a bonding layer, thereby obtaining the acid and alkali resistant photovoltaic reflective film. The prepared acid and alkali resistant photovoltaic reflective film effectively protects the reflective layer from being corroded through the acid and alkali resistant functional protective layer, and the service life of the reflective film is greatly prolonged, so that the effect of the reflective film on the gain of the generated energy of a photovoltaic assembly is kept, the process is simple and convenient, the cost is low, the operation is simple, and the application prospect is very wide.
Description
Technical Field
the invention belongs to the technical field of photovoltaic industry, and particularly relates to an acid and alkali resistant photovoltaic reflective film and a preparation method thereof.
Background
The photovoltaic reflective film attached to the surface of a solder strip is transported, but EVA as a packaging material is subjected to illumination and vapor in the open air for a long time, acetic acid is generated, a metallic aluminum reflective layer on the surface of the reflective film is corroded, the reflectivity of light is reduced, the gain effect disappears, technical personnel are familiar in preparation of the photovoltaic reflective film, and the problems of high cost, high corrosion cost, high film forming cost and the like of the conventional preparation method are solved.
Disclosure of Invention
The invention aims to solve the technical problem of providing an acid and alkali resistant photovoltaic reflective film and a preparation method thereof, and aims to solve the problem.
In order to solve the technical problems, the invention provides an acid and alkali resistant photovoltaic reflective film, which comprises: the solar photovoltaic module battery piece comprises an adhesive layer, a carrier layer, a prismatic layer, a light reflecting layer and an acid and alkali resistant functional protective layer, wherein the adhesive layer is arranged below the carrier layer, the adhesive layer is adhered to a front welding strip of a photovoltaic module battery piece, the prismatic layer is arranged above the carrier layer, the lower surface of the prismatic layer is planar, the upper surface of the prismatic layer is formed by a plurality of prismatic structures which are parallel and are arranged periodically, the light reflecting layer is arranged above the prismatic layer and is adhered to the upper surface of the prismatic layer, the light reflecting layer fluctuates along with the fluctuation of the plurality of prismatic structures, the upper surface of the light reflecting layer is provided with the acid and alkali resistant functional protective layer, the acid and alkali resistant functional protective layer covers the upper surface of the light reflecting layer, and the acid and alkali resistant functional protective layer fluctuates along with the fluctuation.
As a preferable embodiment of the acid and alkali resistant photovoltaic reflective film, a longitudinal cross section of the prismatic layer is a plurality of triangles, the prismatic layer has a plurality of first edge lines, vertexes of the triangles are respectively arranged on the first edge lines, the reflective layer has a plurality of second edge lines, the vertexes of the reflective layer are respectively located on the second edge lines, the acid and alkali resistant functional protective layer has a plurality of third edge lines, the vertexes of the acid and alkali resistant functional protective layer are respectively located on the third edge lines, and each first edge line, one second edge line and one third edge line are located on the same plane.
As a preferable embodiment of the acid and alkali resistant photovoltaic light reflecting film, the height from the bottom line to the first edge line of the prismatic layer is 25 ~ 50 μm.
As a preferable scheme of the acid and alkali resistant photovoltaic reflective film, the longitudinal section of the bonding layer is rectangular, the thickness of the bonding layer is 10 ~ 40 micrometers, and the material of the bonding layer is any one or a combination of more than two of modified polyurethane resin, EVA, EEA and SIS resin.
As a preferable scheme of the acid and alkali resistant functional photovoltaic reflective film, the longitudinal section of the carrier layer is rectangular, the thickness of the carrier layer is 35 ~ 90 micrometers, and the material of the carrier layer is any one of PP, PET and PBT films.
As a preferable scheme of the acid and alkali resistant photovoltaic reflective film, the thickness of the reflective layer is 80 ~ 100nm, and the reflective layer is made of metal aluminum.
As a preferable scheme of the acid and alkali resistant functional photovoltaic reflective film, the thickness of the acid and alkali resistant functional protective layer is 15 ~ 30nm, the material of the acid and alkali resistant functional protective layer is compact alumina, and when the acid and alkali resistant functional photovoltaic reflective film is soaked in 0.1mol/L sodium hydroxide and acetic acid solution for 48 hours, the area of aluminum removed from the surface of the reflective layer is less than or equal to 20%.
The invention also provides a preparation method of the acid and alkali resistant photovoltaic reflective film, which comprises the following steps:
(1) Preparing a plurality of prism structures on the surface of a compression roller in advance, coating ultraviolet curing adhesive resin on the surface of a carrier layer, passing through the compression roller, and simultaneously performing ultraviolet curing through an ultraviolet lamp to enable the plurality of prism structures to be attached to the carrier layer to form a prism layer;
(2) Plating a layer of metal aluminum on the upper surface of the prismatic layer to form a light reflecting layer compounded along a plurality of prismatic structures;
(3) carrying out oxidation treatment on the surface of the reflecting layer to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer;
(4) Any one or more than two of modified polyurethane resin, EVA, EEA and SIS resin are combined, blended and granulated, and then the mixture is extruded by melting to coat the lower surface of the carrier layer to form a bonding layer, so that the acid and alkali resistant photovoltaic reflective film is obtained.
As a preferable scheme of the preparation method of the acid and alkali resistant photovoltaic reflective film, the preparation process of the reflective layer adopts any one of evaporation, electroplating, magnetron sputtering and electron beam deposition.
As a preferable scheme of the preparation method of the acid and alkali resistant functional photovoltaic reflective film, the preparation process of the acid and alkali resistant functional protective layer adopts any one of liquid oxidation or plasma oxidation.
compared with the prior art, the acid and alkali resistant photovoltaic reflective film and the preparation method thereof provided by the invention have the following advantages: firstly, when the EVA as the component packaging material is influenced by illumination and water vapor outdoors to generate acidic substances, the reflecting layer is effectively protected from corrosion by the acid-base resistant functional protective layer, the service life of the reflecting film is greatly prolonged, and the effect of the EVA on the power generation gain of the photovoltaic component is kept; secondly, compared with the conventional protective layer preparation method, the method has the advantages of simple and convenient process, lower cost and simple operation; thirdly, the application prospect is extremely wide.
Drawings
In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the drawings needed to be used in the description of the embodiments will be briefly introduced below, and it is obvious that the drawings in the following description are only some embodiments of the present invention, and it is obvious for those skilled in the art to obtain other drawings based on these drawings without inventive exercise. Wherein the content of the first and second substances,
FIG. 1 is a schematic structural diagram of an acid and alkali resistant photovoltaic reflective film according to the present invention;
fig. 2 is a schematic longitudinal cross-sectional view of an acid and alkali resistant photovoltaic reflective film of the present invention.
Wherein: 1 is the tie coat, 2 is the carrier layer, 3 is the prismatic layer, 4 is the reflector layer, 5 is the protective layer, 6 is first crest line, 7 is the second crest line, 8 is the third crest line.
Detailed Description
The present invention will be described in further detail with reference to specific embodiments in order to make the above objects, features and advantages more apparent and understandable.
First, reference herein to "one embodiment" or "an embodiment" means that a particular feature, structure, or characteristic described in connection with the embodiment is included in at least one implementation of the invention. The appearances of the phrase "in one embodiment" in various places in the specification are not necessarily all referring to the same embodiment, nor are separate or alternative embodiments mutually exclusive of other embodiments.
Next, the present invention is described in detail by using schematic structural diagrams, etc., and for convenience of illustration, the schematic diagram showing the structure of the acid and alkali resistant photovoltaic reflective film will not be partially enlarged according to a general scale when describing the embodiments of the present invention, and the schematic diagram is only an example, which should not limit the scope of the present invention. In addition, the actual fabrication process should include three-dimensional space of length, width and depth.
the invention relates to an acid and alkali resistant functional photovoltaic reflective film, as shown in figure 1 ~, the acid and alkali resistant functional photovoltaic reflective film is divided into 5 layers from bottom to top, wherein the 5 layers are respectively an adhesive layer 1, a carrier layer 2, a prismatic layer 3, a reflective layer 4 and an acid and alkali resistant functional protective layer 5, the adhesive layer 1 is made of any one or a combination of more than two of modified polyurethane resin, EVA, EEA and SIS resin, the thickness is 10 ~ mu m, the upper surface and the lower surface of the adhesive layer 1 are both planes, the thickness of the carrier layer 2 is 35 ~ mu m, the carrier layer 2 can be made of any one of PP, PET and PBT films, the upper surface and the lower surface of the carrier layer 2 are both planes, the prismatic layer 3 is formed by a plurality of prism structures which are parallel and are periodically arranged, the lower surface is planar, the upper surface is wavy, the height from a bottom line to a ridge line is 25 ~ mu m, the longitudinal compact cross section of the prismatic layer 3 in figure 2 is a plurality of triangles, the thickness of the reflective layer 4 is 80nm, the material is aluminum metal, the material is made of the aluminum, when the vertical line of the reflective layer 4, when the vertical line is seen from the vertical line, the vertical line of the reflective layer is not more than the vertical line of the same as the vertical line, the vertical line of the acid and the reflective layer, the vertical line of the reflective layer, the vertical line of the acid and the protective layer, the vertical line of the acid and the vertical line of the reflective.
The preparation method of the acid and alkali resistant photovoltaic reflective film shown in fig. 1 comprises the following steps:
(1) preparing a plurality of prismatic structures on the surface of a compression roller in advance, coating ultraviolet curing adhesive resin on the surface of a carrier layer 2, passing through the compression roller, and simultaneously performing ultraviolet curing through an ultraviolet lamp to enable the plurality of prismatic structures to be attached to the carrier layer 2 to form a prismatic layer 3;
(2) Plating a layer of metal aluminum on the upper surface of the prismatic layer 3 by adopting any one of the processes of evaporation plating, electroplating, magnetron sputtering and electron beam deposition to form a reflecting layer 4 compounded along a plurality of prismatic structures;
(3) Oxidizing the surface of the reflecting layer 4 by adopting a liquid oxidation or plasma oxidation process to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer 5;
(4) Any one or more than two of modified polyurethane resin, EVA, EEA and SIS resin are combined, blended and granulated, and then the mixture is extruded by melting to be coated on the lower surface of the carrier layer 2 to form the bonding layer 1, so that the acid and alkali resistant photovoltaic reflective film is obtained.
for specific embodiments, see examples 1-5 below:
Example 1
As shown in fig. 1, the acid and alkali resistant photovoltaic reflective film has a five-layer structure, and comprises, from bottom to top, an adhesive layer 1, a carrier layer 2, a prismatic layer 3, a reflective layer 4, and an acid and alkali resistant functional protective layer 5. The thickness of the adhesive layer 1 is 30 μm, the thickness of the carrier layer 1 is 40 μm, the height of the prismatic layer 3 is 25 μm, the thickness of the reflective layer 4 is 80nm, and the thickness of the acid and alkali resistant functional protective layer 5 is 15 nm.
The manufacturing method of the acid and alkali resistant photovoltaic reflective film comprises the following steps: firstly, a plurality of prismatic structures are prepared on the surface of a compression roller in advance, a PET film is selected as a material of a carrier layer 2, ultraviolet curing glue resin is coated on the surface of the carrier layer 2 and passes through the compression roller, and ultraviolet curing is carried out through an ultraviolet lamp at the same time, so that the plurality of prismatic structures are attached to the carrier layer 2 to form a prismatic layer 3; plating the surface of the prismatic layer 3 by an aluminum target through a magnetron sputtering process to form an aluminum metal reflective layer 4 compounded along the prismatic structure; then, carrying out plasma oxidation treatment on the surface of the reflecting layer 4 to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer 5; and finally, blending and granulating the EVA and the EEA resin, and coating the lower surface of the carrier layer 2 by melting and extruding to form the bonding layer 1, thereby obtaining the acid and alkali resistant photovoltaic reflective film.
Acid-base solution soaking and PCT testing are carried out on the prepared photovoltaic reflecting film with the acid-base resistance function, and after the testing, the aluminum falling area on the surface of the reflecting film is 8.5% after 0.1mol/L acetic acid is corroded for 48 hours; after the reflector film is corroded by 0.1mol/L sodium hydroxide solution for 48 hours, the aluminum falling area on the surface of the reflector film is 0.7 percent; after the PCT is aged for 48 hours, the aluminum shedding area on the surface of the reflecting film is 29 percent.
Example 2
As shown in fig. 1, the acid and alkali resistant photovoltaic reflective film has a five-layer structure, and comprises, from bottom to top, an adhesive layer 1, a carrier layer 2, a prismatic layer 3, a reflective layer 4, and a protective layer 5. The thickness of the adhesive layer 1 is 30 micrometers, the thickness of the carrier layer 1 is 50 micrometers, the height of the prismatic layer 3 is 35 micrometers, the thickness of the reflective layer 4 is 100nm, and the thickness of the acid and alkali resistant functional protective layer 5 is 30 nm.
The manufacturing method of the acid and alkali resistant photovoltaic reflective film comprises the following steps: firstly, a plurality of prismatic structures are prepared on the surface of a compression roller in advance, a PET film is selected as a material of a carrier layer 2, ultraviolet curing glue resin is coated on the surface of the carrier layer 2 and passes through the compression roller, and ultraviolet curing is carried out through an ultraviolet lamp at the same time, so that the plurality of prismatic structures are attached to the carrier layer 2 to form a prismatic layer 3; plating the surface of the prismatic layer 3 by selecting an aluminum target material through a vacuum evaporation process to form an aluminum metal reflective layer 4 compounded along the prismatic structure; then, carrying out plasma oxidation treatment on the surface of the reflecting layer 4 to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer 5; and finally, blending and granulating the EVA, EEA and SIS resins, and then coating the mixture on the lower surface of the carrier layer 2 through melt extrusion to form a bonding layer 1, so as to obtain the acid and alkali resistant photovoltaic reflective film.
Acid-base solution soaking and PCT testing are carried out on the prepared photovoltaic reflecting film with the acid-base resistance function, and after the testing, the aluminum falling area on the surface of the reflecting film is 5.5% after 0.1mol/L acetic acid is corroded for 48 hours; after the reflector film is corroded by 0.1mol/L sodium hydroxide solution for 48 hours, the aluminum falling area on the surface of the reflector film is 0.3 percent; after PCT48 is aged for hours, the aluminum peeling area of the surface of the reflective film is 23 percent.
Example 3
As shown in fig. 1, the acid and alkali resistant photovoltaic reflective film has a five-layer structure, and comprises, from bottom to top, an adhesive layer 1, a carrier layer 2, a prismatic layer 3, a reflective layer 4, and an acid and alkali resistant functional protective layer 5. The thickness of the adhesive layer 1 is 15 μm, the thickness of the carrier layer 1 is 45 μm, the height of the prismatic layer 3 is 30 μm, the thickness of the reflective layer 4 is 90nm, and the thickness of the acid and alkali resistant functional protective layer 5 is 20 nm.
The manufacturing method of the acid and alkali resistant photovoltaic reflective film comprises the following steps: firstly, a plurality of prismatic structures are prepared on the surface of a compression roller in advance, a PET film is selected as a material of a carrier layer 2, ultraviolet curing glue resin is coated on the surface of the carrier layer 2 and passes through the compression roller, and ultraviolet curing is carried out through an ultraviolet lamp at the same time, so that the plurality of prismatic structures are attached to the carrier layer 2 to form a prismatic layer 3; plating the surface of the prismatic layer 3 by an electroplating process to form an aluminum metal reflecting layer 4 compounded along the prismatic structure; then, carrying out concentrated nitric acid oxidation treatment on the surface of the reflecting layer 4 to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer 5; and finally, blending and granulating the EVA, EEA and SIS resins, and then coating the mixture on the lower surface of the carrier layer 2 through melt extrusion to form a bonding layer 1, so as to obtain the acid and alkali resistant photovoltaic reflective film.
acid-base solution soaking and PCT testing are carried out on the prepared photovoltaic reflecting film with the acid-base resistance function, and after the testing, the aluminum falling area on the surface of the reflecting film is 5.9% after 0.1mol/L acetic acid is corroded for 48 hours; after the reflector film is corroded by 0.1mol/L sodium hydroxide solution for 48 hours, the aluminum falling area on the surface of the reflector film is 0.4 percent; after PCT48 is aged for hours, the aluminum peeling area of the surface of the reflective film is 25 percent.
example 4
As shown in fig. 1, the acid and alkali resistant photovoltaic reflective film has a five-layer structure, and comprises, from bottom to top, an adhesive layer 1, a carrier layer 2, a prismatic layer 3, a reflective layer 4, and a protective layer 5. The thickness of the adhesive layer 1 is 30 μm, the thickness of the carrier layer 1 is 40 μm, the height of the prismatic layer 3 is 25 μm, the thickness of the reflective layer 4 is 80nm, and the thickness of the acid and alkali resistant functional protective layer 5 is 30 nm.
The manufacturing method of the acid and alkali resistant photovoltaic reflective film comprises the following steps: firstly, a plurality of prismatic structures are prepared on the surface of a press roller in advance, a PET film is selected as a carrier film 2, the surface of the carrier layer 2 is coated with ultraviolet curing glue resin and passes through the press roller, and ultraviolet curing is carried out through an ultraviolet lamp at the same time, so that the plurality of prismatic structures are attached to the carrier layer 2 to form a prismatic layer 3; plating the surface of the prismatic layer 3 by an electroplating process to form an aluminum metal reflecting layer 4 compounded along the prismatic structure; then, carrying out plasma oxidation treatment on the surface of the reflecting layer 4 to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer 5; and finally, blending and granulating the EVA and the EEA resin, and coating the lower surface of the carrier layer 2 by melting and extruding to form the bonding layer 1, thereby obtaining the acid and alkali resistant photovoltaic reflective film.
Acid-base solution soaking and PCT testing are carried out on the prepared photovoltaic reflecting film with the acid-base resistance function, and after the testing, the aluminum falling area on the surface of the reflecting film is 9% after 0.1mol/L acetic acid is corroded for 48 hours; after the reflector film is corroded by 0.1mol/L sodium hydroxide solution for 48 hours, the aluminum falling area on the surface of the reflector film is 0.8 percent; after PCT48 is aged for hours, the aluminum peeling area on the surface of the reflecting film is 32 percent.
Example 5
As shown in fig. 1, the acid and alkali resistant photovoltaic reflective film has a five-layer structure, and comprises, from bottom to top, an adhesive layer 1, a carrier layer 2, a prismatic layer 3, a reflective layer 4, and a protective layer 5. The thickness of the adhesive layer 1 is 15 μm, the thickness of the carrier layer 1 is 45 μm, the height of the prismatic layer 3 is 30 μm, the thickness of the reflective layer 4 is 90nm, and the thickness of the protective layer 5 is 20 nm.
The manufacturing method of the acid and alkali resistant photovoltaic reflective film comprises the following steps: firstly, a plurality of prismatic structures are prepared on the surface of a compression roller in advance, a PET film is selected as a material of a carrier layer 2, ultraviolet curing glue resin is coated on the surface of the carrier layer 2 and passes through the compression roller, and ultraviolet curing is carried out through an ultraviolet lamp at the same time, so that the plurality of prismatic structures are attached to the carrier layer 2 to form a prismatic layer 3; plating the surface of the prismatic layer 3 by an electroplating process to form an aluminum metal reflecting layer 4 compounded along the prismatic structure; then, carrying out plasma oxidation treatment on the surface of the reflecting layer 4 to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer 5; and finally, blending and granulating the EVA, EEA and SIS resins, and then coating the mixture on the lower surface of the carrier layer 2 through melt extrusion to form a bonding layer 1, so as to obtain the acid and alkali resistant photovoltaic reflective film.
Acid-base solution soaking and PCT testing are carried out on the prepared photovoltaic reflecting film with the acid-base resistance function, and after the testing, the aluminum falling area on the surface of the reflecting film is 5.1% after 0.1mol/L acetic acid is corroded for 48 hours; after the reflector film is corroded by 0.1mol/L sodium hydroxide solution for 48 hours, the aluminum falling area on the surface of the reflector film is 0.5 percent; after PCT48 is aged for hours, the aluminum peeling area of the surface of the reflective film is 26 percent.
it should be understood by those skilled in the art that one of the features or objects of the present invention is to: according to the photovoltaic reflective film with the acid and alkali resistance function, the acid and alkali resistance functional protective layer is added, when the component packaging material EVA is influenced by illumination and water vapor outdoors to generate acidic substances, the reflective layer is effectively protected from corrosion through the acid and alkali resistance functional protective layer, the service life of the reflective film is greatly prolonged, and therefore the effect of the reflective film on the power generation gain of a photovoltaic component is kept.
It should be noted that the above-mentioned embodiments are only for illustrating the technical solutions of the present invention and not for limiting, and although the present invention has been described in detail with reference to the preferred embodiments, it should be understood by those skilled in the art that modifications or equivalent substitutions may be made on the technical solutions of the present invention without departing from the spirit and scope of the technical solutions of the present invention, which should be covered by the claims of the present invention.
Claims (10)
1. The utility model provides an acid and alkali-resistance function photovoltaic reflector film which characterized in that includes: the solar photovoltaic module battery piece comprises an adhesive layer, a carrier layer, a prismatic layer, a light reflecting layer and an acid and alkali resistant functional protective layer, wherein the adhesive layer is arranged below the carrier layer, the adhesive layer is adhered to a front welding strip of a photovoltaic module battery piece, the prismatic layer is arranged above the carrier layer, the lower surface of the prismatic layer is planar, the upper surface of the prismatic layer is formed by a plurality of prismatic structures which are parallel and are arranged periodically, the light reflecting layer is arranged above the prismatic layer and is adhered to the upper surface of the prismatic layer, the light reflecting layer fluctuates along with the fluctuation of the plurality of prismatic structures, the upper surface of the light reflecting layer is provided with the acid and alkali resistant functional protective layer, the acid and alkali resistant functional protective layer covers the upper surface of the light reflecting layer, and the acid and alkali resistant functional protective layer fluctuates along with the fluctuation.
2. The acid and alkali resistant photovoltaic reflective film of claim 1, wherein: the longitudinal section of the prism layer is a plurality of triangles, the prism layer is provided with a plurality of first edge lines, vertexes of the triangles are arranged on the first edge lines, the light reflecting layer is provided with a plurality of second edge lines, the vertexes of the light reflecting layer are respectively positioned on the second edge lines, the acid and alkali resistant functional protective layer is provided with a plurality of third edge lines, the vertexes of the acid and alkali resistant functional protective layer are respectively positioned on the third edge lines, and each first edge line is positioned on the same plane with one second edge line and one third edge line.
3. The acid and alkali resistant photovoltaic light reflecting film according to claim 2, wherein the height from the bottom line to the first edge line of the prismatic layer is 25 ~ 50 μm.
4. The acid and alkali resistant functional photovoltaic reflective film according to claim 1, wherein the longitudinal section of the bonding layer is rectangular, the thickness of the bonding layer is 10 ~ 40 μm, and the material of the bonding layer is any one or a combination of more than two of modified polyurethane resin, EVA, EEA and SIS resin.
5. The acid and alkali resistant functional photovoltaic reflective film according to claim 1, wherein the longitudinal section of the carrier layer is rectangular, the thickness of the carrier layer is 35 ~ 90 μm, and the material of the carrier layer is any one of PP, PET and PBT film.
6. The acid and alkali resistant photovoltaic reflector film as claimed in claim 1, wherein the thickness of the reflector layer is 80 ~ 100nm, and the reflector layer is made of aluminum.
7. the acid and alkali resistant functional photovoltaic reflective film according to claim 1, wherein the thickness of the acid and alkali resistant functional protective layer is 15 ~ 30nm, the material of the acid and alkali resistant functional protective layer is dense alumina, and when the acid and alkali resistant functional photovoltaic reflective film is soaked in 0.1mol/L sodium hydroxide and acetic acid solution for 48 hours, the area of aluminum removed from the surface of the reflective layer is less than or equal to 20%.
8. The preparation method of the acid and alkali resistant photovoltaic reflective film is characterized by comprising the following steps:
(1) Preparing a plurality of prism structures on the surface of a compression roller in advance, coating ultraviolet curing adhesive resin on the surface of a carrier layer, passing through the compression roller, and simultaneously performing ultraviolet curing through an ultraviolet lamp to enable the plurality of prism structures to be attached to the carrier layer to form a prism layer;
(2) Plating a layer of metal aluminum on the upper surface of the prismatic layer to form a light reflecting layer compounded along a plurality of prismatic structures;
(3) Carrying out oxidation treatment on the surface of the reflecting layer to form compact aluminum oxide and obtain an acid and alkali resistant functional protective layer;
(4) Any one or more than two of modified polyurethane resin, EVA, EEA and SIS resin are combined, blended and granulated, and then the mixture is extruded by melting to coat the lower surface of the carrier layer to form a bonding layer, so that the acid and alkali resistant photovoltaic reflective film is obtained.
9. The method for preparing the acid and alkali resistant photovoltaic reflective film according to claim 8, wherein the method comprises the following steps: the preparation process of the reflecting layer adopts any one of evaporation plating, electroplating, magnetron sputtering and electron beam deposition.
10. the method for preparing the acid and alkali resistant photovoltaic reflective film according to claim 8, wherein the method comprises the following steps: the preparation process of the acid and alkali resistant functional protective layer adopts any one of liquid oxidation or plasma oxidation.
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