CN110517976A - A kind of wafer resist remover - Google Patents
A kind of wafer resist remover Download PDFInfo
- Publication number
- CN110517976A CN110517976A CN201910790226.9A CN201910790226A CN110517976A CN 110517976 A CN110517976 A CN 110517976A CN 201910790226 A CN201910790226 A CN 201910790226A CN 110517976 A CN110517976 A CN 110517976A
- Authority
- CN
- China
- Prior art keywords
- flabellum
- cover board
- rinsing table
- accommodating groove
- rinse bath
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
The invention discloses a kind of wafer resist removers, its structure includes rack, electric cabinet, console, controller, rinsing table, rinse bath, cover board, the front of rack is equipped with electric cabinet, rinsing table is located at the rear end of rack, the front front of rinsing table is equipped with console, console is equipped with controller, and the centre of rinsing table is equipped with rinse bath, and the opening above rinse bath is flexibly connected with cover board；The utility model has the advantages that the present invention is equipped with four groups of collection flabellum on the back side of cover board, the cavity structure that flabellum is hollow trumpet type is collected, facilitates dross to enter and collects in flabellum；It collects and is movably installed with collection material cabinet in flabellum, collection material cabinet is to be slidably matched with accommodating groove, and extraction slot will collect material cabinet and take out from accommodating groove, convenient to handle dross；The end for collecting material cabinet is equipped with filter screen and elastic strip, and elastic strip can make filter screen, and deformation occurs, accommodates more drosses.
Description
Technical field
The present invention is a kind of wafer resist remover, belongs to wafer processing technical field.
Background technique
Wafer manufacture in integrated circuits in the important role of performer, it is the basic material for manufacturing semiconductor chip,
The processable structure that various circuit elements are made of wafer, needs to clean it before wafer comes into operation, clear
It is had the disadvantage that during washing
Various pollutants, including some photoresists, organic matter, metal and particle are easy to produce in wafer surface
Object etc., during soaking and washing, since the pollutant on wafer is cleaned in solution concussion, pollutant is easy with bubble
It is swum in solution surface with the form of dross, takes out wafer and be easy to pollute again.
Summary of the invention
In view of the deficienciess of the prior art, it is an object of the present invention to provide a kind of wafer resist remover, to solve.
To achieve the goals above, the present invention is to realize by the following technical solutions: a kind of wafer resist remover,
Structure includes rack, electric cabinet, console, controller, rinsing table, rinse bath, cover board, and the front of the rack is equipped with automatically controlled
Case, the rinsing table are located at the rear end of rack, and the front front of the rinsing table is equipped with console, and the console is equipped with
Controller, the centre of the rinsing table are equipped with rinse bath, and the opening above the rinse bath is flexibly connected with cover board；
The back side of the cover board includes rotating electric machine, deslagging device and rotary shaft, and the rotating electric machine is vertical by bolt
It is mounted on the centre at the cover board back side, the rotary shaft is connected with rotating electric machine by shaft coupling, in the rotary shaft uniformly
The equidistant deslagging device for being equipped with four groups.
Preferably, the deslagging device is made of collection flabellum, accommodating groove, port, the front end for collecting flabellum
It is provided with accommodating groove and most narrow side is provided with port.
Preferably, described collect the cavity structure that flabellum is trumpet type, be open the arc that maximum one end is indent
Shape and bottom edge are equipped with stock guide.
Preferably, the accommodating groove internal activity is equipped with collection material cabinet, the shape of the collection material cabinet and accommodating groove
Chamfered shape is consistent, and is slidably matched between the two.
Preferably, the collection material cabinet is made of extraction slot, elastic strip, filter screen, draw runner, the front side of the collection material cabinet
It is provided with extraction slot among the longest edge of plate, an elastic strip is connected on the short side of rear and front end, is connected between the elastic strip
There is filter screen, two draw runners are respectively equipped on the both side plate up and down of the collection material cabinet.
Preferably, being provided with two sliding rails on the inner wall up and down of the accommodating groove, sliding rail and the draw runner are sliding
Dynamic cooperation.
Preferably, the filter screen in the collection material cabinet is located in port, under the action of elastic strip, filter screen can be certainly
By stretching.
Preferably, the cover board is transparent material, facilitate wafer cleaning state in observation rinse bath
Beneficial effect
A kind of wafer resist remover of the present invention, has the effect that
The present invention is equipped with four groups of collection flabellum on the back side of cover board, collects the cavity knot that flabellum is hollow trumpet type
Structure facilitates dross to enter and collects in flabellum；
The present invention is movably installed with collection material cabinet in collecting flabellum, and collection material cabinet is to be slidably matched with accommodating groove, and extracting slot will
Collect material cabinet to take out from accommodating groove, it is convenient that dross is handled；
The present invention is equipped with filter screen and elastic strip in the end of collection material cabinet, and elastic strip can make filter screen, and deformation occurs,
Accommodate more drosses.
Detailed description of the invention
Upon reading the detailed description of non-limiting embodiments with reference to the following drawings, other feature of the invention,
Objects and advantages will become more apparent upon:
Fig. 1 is a kind of schematic perspective view of wafer resist remover of the present invention；
Fig. 2 is a kind of structure schematic diagram of cover board of the present invention；
Fig. 3 is a kind of schematic perspective view of deslagging device of the present invention；
Fig. 4 is a kind of positive structure schematic for collecting material cabinet of the present invention.
In figure: rack -1, electric cabinet -2, console -3, controller -4, rinsing table -5, rinse bath -6, cover board -7, rotation
Motor-a, it deslagging device-b, rotary shaft-c, collects flabellum-b1, accommodating groove-b2, port-b3, stock guide-e, collection material cabinet-d, take out
Take slot-d1, elastic strip-d2, filter screen-d2, draw runner-d3.
Specific embodiment
To be easy to understand the technical means, the creative features, the aims and the efficiencies achieved by the present invention, below with reference to
Specific embodiment, the present invention is further explained.
Fig. 1-Fig. 4 is please referred to, the present invention provides a kind of wafer resist remover technical solution:
As depicted in figs. 1 and 2, structure includes rack 1, electric cabinet 2, console 3, controller 4, rinsing table 5, rinse bath
6, the front of cover board 7, the rack 1 is equipped with electric cabinet 2, and the rinsing table 5 is located at the rear end of rack 1, the rinsing table 5
Positive front is equipped with console 3, and the console 3 is equipped with controller 4, and the centre of the rinsing table 5 is equipped with rinse bath 6,
The opening of 6 top of rinse bath is flexibly connected with cover board 7；The wafer for needing to clean is placed in rinse bath 6, is added molten
Agent covers cover board 7 and is cleaned.
Wherein, the back side of the cover board 7 includes rotating electric machine a, deslagging device b and rotary shaft c, the rotating electric machine a logical
It crosses bolt to be vertically mounted on the centre at 7 back side of cover board, the rotary shaft c is connected with rotating electric machine a by shaft coupling, described
Uniformly the equidistant deslagging device b for being equipped with four groups, rotating electric machine a keep four groups of deslagging device b on rotary shaft c slow on rotary shaft c
Rotation is collected the dross for swimming in 6 top of rinse bath.
As shown in figure 3, the deslagging device b is made of collection flabellum b1, accommodating groove b2, port b3, the collection flabellum
The front end of b1 is provided with accommodating groove b2 and most narrow side is provided with port b3.
Wherein, described to collect the cavity structure that flabellum b1 is trumpet type, be open the arc shape that maximum one end is indent
And bottom edge is equipped with stock guide e, the dross of superjacent is entered by stock guide e to be collected in flabellum b1.
Wherein, the accommodating groove b2 internal activity is equipped with collection material cabinet d, and the shape of the collection material cabinet d is with accommodating groove b2's
Chamfered shape is consistent, and is slidably matched between the two.
As shown in Figure 3 and Figure 4, the collection material cabinet d is made of extraction slot d1, elastic strip d2, filter screen d2, draw runner d3, institute
It states to be provided among the longest edge of the front side board of collection material cabinet d and extracts slot d1, be connected with an elastic strip d2 on the short side of rear and front end,
It is connected with filter screen d2 between the elastic strip d2, two draw runner d3 are respectively equipped on the both side plate up and down of the collection material cabinet d,
The dross of superjacent is entered together with solution in collection material cabinet d, and the solution in dross passes through filter screen d2, and filter screen d2 will be floated
Slag intercepts, extract slot d1 facilitate will state collection material cabinet d detached from accommodating groove b2, dispose dross.
Wherein, two sliding rails are provided on the inner wall up and down of the accommodating groove b2, sliding rail and the draw runner d3 are slided
Cooperation.
The wafer cleaned will be needed to be put into rinse bath 6, cleaning solution is poured into, flood wafer, pass through controller 4
Start the vibrator inside rinsing table 5 and vibration washing, after a period of time, the solution of rinse bath 6 are carried out to the solution in rinse bath 6
It top can the adrift pollutants dross such as photoresist；At this point, starting rotating electric machine a work, drives deslagging device b in superjacent
It is slowly rotated, the dross of superjacent is entered in the collection material cabinet d collected in flabellum b1 by stock guide e, with receipts
Collect the rotation of flabellum b1, dross constantly enters in collection material cabinet d, and under the interception of filter screen d2, dross, which is incorporated in, to gather materials
In cabinet d, after being filled with dross in collection material cabinet d, the motor a that stops rotating rotation will collect material cabinet d from accommodating groove b2 by extracting slot d1
It takes out, dross is outwelled.
Above only describes basic principle of the invention and preferred embodiment, those skilled in the art can be according to foregoing description
Many changes may be made and improves, and these changes and improvements should be within the scope of protection of the invention.
In addition, it should be understood that although this specification is described in terms of embodiments, but not each embodiment is only wrapped
Containing an independent technical solution, this description of the specification is merely for the sake of clarity, and those skilled in the art should
It considers the specification as a whole, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
The other embodiments being understood that.
Claims (3)
1. a kind of wafer resist remover, it is characterised in that: its structure includes rack (1), electric cabinet (2), console (3), control
The front of device (4), rinsing table (5), rinse bath (6), cover board (7), the rack (1) is equipped with electric cabinet (2), the rinsing table
(5) it is located at the rear end of rack (1), the front front of the rinsing table (5) is equipped with console (3), sets on the console (3)
Have controller (4), the centre of the rinsing table (5) is equipped with rinse bath (6), opening and cover board (7) above the rinse bath (6)
It is flexibly connected.
2. a kind of wafer resist remover as described in claim 1, it is characterised in that: the back side of the cover board (7) includes rotation
Motor (a), deslagging device (b) and rotary shaft (c), the rotating electric machine (a) are vertically mounted on cover board (7) back side by bolt
On centre, the rotary shaft (c) is connected with rotating electric machine (a) by shaft coupling, is uniformly equidistantly equipped on the rotary shaft (c)
Four groups of deslagging device (b), the deslagging device (b) is made of collection flabellum (b1), accommodating groove (b2), port (b3), described
The front end for collecting flabellum (b1) is provided with accommodating groove (b2) and most narrow side is provided with port (b3).
3. a kind of wafer resist remover as claimed in claim 2, it is characterised in that: collect flabellum (b1) is trumpet type
Cavity structure, is open arc shape that maximum one end is indent and bottom edge is equipped with stock guide (e), and the accommodating groove (b2) is internal
It is movably installed with collection material cabinet (d), the shape of collection material cabinet (d) is consistent with the chamfered shape of accommodating groove (b2), and between the two
It is slidably matched.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910790226.9A CN110517976A (en) | 2019-08-26 | 2019-08-26 | A kind of wafer resist remover |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910790226.9A CN110517976A (en) | 2019-08-26 | 2019-08-26 | A kind of wafer resist remover |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN110517976A true CN110517976A (en) | 2019-11-29 |
Family
ID=68627800
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201910790226.9A Withdrawn CN110517976A (en) | 2019-08-26 | 2019-08-26 | A kind of wafer resist remover |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN110517976A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN114721231A (en) * | 2022-04-17 | 2022-07-08 | 江苏晟驰微电子有限公司 | Tool clamp for cleaning photoetching plate |
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| CN103212325A (en) * | 2012-06-29 | 2013-07-24 | 深圳市堃琦鑫华科技有限公司 | Collecting device, and stirring and collecting device |
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| PB01 | Publication | ||
| PB01 | Publication | ||
| SE01 | Entry into force of request for substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| WW01 | Invention patent application withdrawn after publication |
Application publication date: 20191129 |
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| WW01 | Invention patent application withdrawn after publication |