CN110491951A - A kind of double-level-metal Meta Materials improving thin-film solar cells transformation efficiency - Google Patents

A kind of double-level-metal Meta Materials improving thin-film solar cells transformation efficiency Download PDF

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Publication number
CN110491951A
CN110491951A CN201910623919.9A CN201910623919A CN110491951A CN 110491951 A CN110491951 A CN 110491951A CN 201910623919 A CN201910623919 A CN 201910623919A CN 110491951 A CN110491951 A CN 110491951A
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China
Prior art keywords
film solar
solar cells
meta materials
thin
double
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CN201910623919.9A
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Chinese (zh)
Inventor
张建新
刘俊星
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Jiaxing University
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Jiaxing University
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Priority to CN201910623919.9A priority Critical patent/CN110491951A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0216Coatings
    • H01L31/02161Coatings for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/02167Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • H01L31/02168Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells the coatings being antireflective or having enhancing optical properties for the solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
    • H01L31/022408Electrodes for devices characterised by at least one potential jump barrier or surface barrier
    • H01L31/022425Electrodes for devices characterised by at least one potential jump barrier or surface barrier for solar cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/0248Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
    • H01L31/036Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
    • H01L31/0392Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate
    • H01L31/03925Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including thin films deposited on metallic or insulating substrates ; characterised by specific substrate materials or substrate features or by the presence of intermediate layers, e.g. barrier layers, on the substrate including AIIBVI compound materials, e.g. CdTe, CdS
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/04Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
    • H01L31/042PV modules or arrays of single PV cells
    • H01L31/0445PV modules or arrays of single PV cells including thin film solar cells, e.g. single thin film a-Si, CIS or CdTe solar cells
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

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  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Sustainable Development (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Electromagnetism (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Power Engineering (AREA)
  • Sustainable Energy (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photovoltaic Devices (AREA)

Abstract

The present invention discloses a kind of double-level-metal Meta Materials for improving thin-film solar cells transformation efficiency, belongs to area of solar cell.It is characterized in that the metal Meta Materials of the structure are covered on the upper and lower surfaces of solar cell semiconductor absorbed layer simultaneously, interfacial contact is formed with semiconductor material respectively.Size, shape by adjusting metal metamaterial modular construction, generate forceful electric power magnetic resonance in semiconductor absorption layer, and enhanced film battery obsorbing layer achievees the purpose that improve thin-film solar cells transformation efficiency to the absorption of incident light, the light transmission of reduction exit facet.The size of the cellular construction is between 1 micron to 0.01 micron.

Description

A kind of double-level-metal Meta Materials improving thin-film solar cells transformation efficiency
Technical field
The present invention relates to a kind of double-level-metal Meta Materials for improving thin-film solar cells transformation efficiency, belong to solar-electricity Pond field.
Background technique
Universal solar battery is the desirable route for solving future source of energy crises problem.The absorbed layer of thin-film solar cells Thickness is only a few micrometers or even hundreds of nanometers, saves the usage amount for absorbing layer material, can effectively reduce cost.However, ought be too After positive energy battery thin membranization, absorbed layer substantially reduces the absorption efficiency of long-wave band light wave, seriously limits its photoelectric efficiency It improves.
Summary of the invention
The invention discloses a kind of metal metamaterial structures that can produce forceful electric power magnetic resonance in long-wave band, are covered on simultaneously The upper and lower surfaces of thin-film solar cells semiconductor absorption layer form interfacial contact with semiconductor material respectively.It is based on Surface phasmon is theoretical and Meta Materials electromagnetic property can artificial adjustment unique advantage, by adjusting metal Meta Materials list Size, the shape of meta structure generate forceful electric power magnetic resonance in semiconductor absorption layer.Effect is focused using the field enhancing of Meta Materials and light It answers, enhanced film battery obsorbing layer reaches raising thin-film solar cells to the absorption of incident light, the light transmission of reduction exit facet The purpose of transformation efficiency.It is calculated by electromagnetic simulation software, the size of the cellular construction is between 1 micron to 0.01 micron.
The symmetrical metal Meta Materials of two-dimensional and periodic of semiconductor absorption layer upper surface are placed in, grating effect is played.Pass through Grating diffration interference can effectively reduce the light reflection of film surface, increase effective incident field.It can allow more Light enters in absorbed layer, reduces light in the first reflection of battery incidence surface, improves the photonic absorption of thin film solar cell, Improve the absorption efficiency of thin-film solar cells.
The symmetrical metal Meta Materials of two-dimensional and periodic of semiconductor absorption layer lower surface are placed in, sunken luminous effect is played.For The photon not being fully absorbed can be limited in absorbed layer by the relatively thin thin-film solar cells of absorbed layer, the structure, be reduced The light transmission of exit facet.
There is metal fine connection between the cellular construction of metal Meta Materials.Therefore, metal Meta Materials can be used directly Make the electrode of thin-film solar cells.
Double-level-metal Meta Materials combine, and complement each other, which can be improved the transformation efficiency of solar battery.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of double-level-metal Meta Materials for improving thin-film solar cells transformation efficiency.
Fig. 2 is the structural schematic diagram of the double silver Meta Materials of CdTe/CdS thin-film solar cells implantation trapezoid cross section.
Specific embodiment
The present embodiment in CdTe/CdS thin-film solar cells for being implanted into the double silver Meta Materials of trapezoid cross section.
In the present embodiment, the material selection metallic silver of metamaterial structure.The section of metamaterial modular construction is trapezoidal.It is single The upper bottom length of meta structure is 0.3 micron, and upper bottom width is 0.3 micron, and bottom length is 0.2 micron, and bottom width is 0.2 micro- Rice, is highly 0.3 micron.There is the connection of metal silver wire between cellular construction, silver wire width is 0.03 micron.With CdTe/CdS film Solar battery is object, is covered each by the Meta Materials of this structure in the upper and lower surfaces of absorbed layer.CdTe/CdS thin film solar Battery be implanted into trapezoid cross section double silver Meta Materials structural schematic diagram as shown in Fig. 2, wherein (a) be side view, (b) for overlook Figure.

Claims (4)

1. a kind of double-level-metal Meta Materials for improving thin-film solar cells transformation efficiency, it is characterised in that constitute super material with metal Material, is covered on the absorbed layer of thin-film solar cells, for improving the absorption efficiency of thin-film solar cells.
2. a kind of double-level-metal Meta Materials for improving thin-film solar cells transformation efficiency as described in claim 1, feature It is that the structure includes the double-deck Meta Materials, is respectively overlay in the upper and lower surfaces of absorbing layer of thin film solar cell.
3. a kind of double-level-metal Meta Materials for improving thin-film solar cells transformation efficiency as described in claim 1, feature It is the size of the length of metamaterial modular construction, width and thickness between 1 micron to 0.01 micron.
4. a kind of double-level-metal Meta Materials for improving thin-film solar cells transformation efficiency as described in claim 1, feature It is there is metal wire connection between metamaterial modular construction, the electrode of solar battery can be directly used as.
CN201910623919.9A 2019-07-04 2019-07-04 A kind of double-level-metal Meta Materials improving thin-film solar cells transformation efficiency Pending CN110491951A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910623919.9A CN110491951A (en) 2019-07-04 2019-07-04 A kind of double-level-metal Meta Materials improving thin-film solar cells transformation efficiency

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Application Number Priority Date Filing Date Title
CN201910623919.9A CN110491951A (en) 2019-07-04 2019-07-04 A kind of double-level-metal Meta Materials improving thin-film solar cells transformation efficiency

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CN110491951A true CN110491951A (en) 2019-11-22

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Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103606628A (en) * 2013-11-22 2014-02-26 哈尔滨工业大学深圳研究生院 Novel thin-film solar cell by means of metamaterials
CN103811580A (en) * 2014-03-05 2014-05-21 中国科学院半导体研究所 InGaAs infrared photodetector
CN104733554A (en) * 2015-04-10 2015-06-24 上海电机学院 Silicon based thin film solar cell with bottom provided with metal nanoparticle structure
CN205881917U (en) * 2016-05-16 2017-01-11 桂林电子科技大学 A photonic crystal light tripping structure for thin -film solar cell
CN106711271A (en) * 2017-02-03 2017-05-24 江西师范大学 Three-frequency band near-infrared absorber based on a semiconductor super-surface structure
KR20180036002A (en) * 2016-09-30 2018-04-09 포항공과대학교 산학협력단 Vertical Nano-structured Photodetector and Method of Forming the same

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103606628A (en) * 2013-11-22 2014-02-26 哈尔滨工业大学深圳研究生院 Novel thin-film solar cell by means of metamaterials
CN103811580A (en) * 2014-03-05 2014-05-21 中国科学院半导体研究所 InGaAs infrared photodetector
CN104733554A (en) * 2015-04-10 2015-06-24 上海电机学院 Silicon based thin film solar cell with bottom provided with metal nanoparticle structure
CN205881917U (en) * 2016-05-16 2017-01-11 桂林电子科技大学 A photonic crystal light tripping structure for thin -film solar cell
KR20180036002A (en) * 2016-09-30 2018-04-09 포항공과대학교 산학협력단 Vertical Nano-structured Photodetector and Method of Forming the same
CN106711271A (en) * 2017-02-03 2017-05-24 江西师范大学 Three-frequency band near-infrared absorber based on a semiconductor super-surface structure

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Application publication date: 20191122