CN110488315B

CN110488315B - Laser output device and laser radar device

Info

Publication number: CN110488315B
Application number: CN201910130712.8A
Authority: CN
Inventors: 张准桓; 尹熙善
Original assignee: Sos Experimental Co ltd
Current assignee: Sos Experimental Co ltd
Priority date: 2018-05-14
Filing date: 2019-02-21
Publication date: 2023-09-12
Anticipated expiration: 2039-02-21
Also published as: CN110488315A

Abstract

The present invention relates to a laser output device and a laser radar device, and the laser radar device according to one aspect of the present invention includes: a laser output unit; and a metasurface (metasurface) including a plurality of beam manipulation units that guide the laser beam with a plurality of nano-pillars and are arranged in a two-dimensional array in a row direction and a column direction, wherein a characteristic of the plurality of nano-pillars belonging to the plurality of beam manipulation units with respect to at least one of a width, a height, and a number per unit length of the plurality of nano-pillars repeatedly increases from a center of the metasurface toward a position direction of a row to which the plurality of beam manipulation units belong (subwav elength pattern). The laser radar device of the invention can be manufactured in a miniaturized manner; utilizing the nanopillars to form a plurality of sub-wavelength patterns to generate a scanning point cloud; solid-state lidar capable of three-dimensional scanning is realized using metasurfaces.

Description

Laser output device and laser radar device

Technical Field

The present invention relates to a laser radar device. More particularly, the present invention relates to a lidar device that manipulates a laser beam with a metasurface including nano-pillars to obtain distance information of an obstacle.

Background

While the use of edge-emitting lasers is widespread, the recent interest in vertical cavity surface emitting lasers (VCSELs: vertical Cavity Surf ace Emitting Laser) has increased. The vertical cavity surface emitting laser is a semiconductor laser that emits laser light in a direction perpendicular to the upper surface, and has advantages in that mass production is easy due to a simple manufacturing process, and miniaturization can be achieved due to high integration.

In addition, the vertical cavity surface emitting laser has been mainly applied to the communication field in the past, and recently, an application to an optical system has been actively attempted. In particular, with the attention paid to auto-cruise vehicles, there are many attempts to apply laser radar (LiDAR) to vertical cavity surface emitting lasers.

Disclosure of Invention

Technical problem

The technical problem to be solved according to an embodiment is to miniaturize a lidar device by using a vertical cavity surface emitting laser element.

The technical problem to be solved according to another embodiment is to generate a scanning point cloud using nano-pillars for a plurality of sub-wavelength patterns.

The technical problem to be solved according to yet another embodiment is to implement Solid-State LiDAR (Solid-State LiDAR) capable of three-dimensional scanning with metasurfaces.

The technical problems to be solved by the present invention are not limited to the above-mentioned problems, and those skilled in the art to which the present invention pertains can clearly understand the technical problems not mentioned through the present specification and the accompanying drawings.

Technical proposal

According to one embodiment, there is provided a laser radar apparatus for measuring a distance from an obstacle included in a Field Of View (FOV) formed by a plurality Of scanning points distributed in a vertical direction and a horizontal direction, the laser radar apparatus including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavity S urface Emitting Laser) elements arranged in an array and emitting laser beams; and a metasurface (metasurface) that includes a plurality of beam steering units that guide the laser beam so as to correspond to the plurality of scanning points by using a plurality of nano-pillars arranged on an emission surface side of the laser output section and are arranged in a two-dimensional array along a row direction corresponding to the vertical direction and a column direction corresponding to the horizontal direction, wherein a first characteristic of the plurality of nano-pillars belonging to the plurality of beam steering units with respect to at least one of a width, a height, and a number per unit length of the plurality of nano-pillars repeatedly increases from a center of the metasurface to a position direction of a row to which the plurality of beam steering units belong, a sub-wavelength pattern (subwavelength pattern) in which, as regards a second characteristic of at least one of a width, a height, and a number per unit length of the plurality of nanopillars, the second characteristic increases repeatedly from a center of the metasurface toward a position direction of a column to which the plurality of beam steering units belong, the increasing rate of the first characteristic increases as the position of a row to which the plurality of beam steering units belong is farther from the center of the metasurface and the increasing rate of the second characteristic increases as the position of the column to which the plurality of beam steering units belong is farther from the center of the metasurface.

The technical solution for solving the technical problems of the present invention is not limited to the above technical solution, and other technical solutions not mentioned can be clearly understood by those skilled in the art to which the present invention pertains through the present specification and the accompanying drawings.

Technical effects

According to an embodiment, the laser radar device can be miniaturized by using the vertical cavity surface emitting laser element.

According to another embodiment, a plurality of sub-wavelength patterns may be formed using the nanopillars to generate a scanning point cloud.

According to yet another embodiment, a Solid-State lidar (Solid-State lidar) capable of three-dimensional scanning may be implemented with a metasurface.

The technical effects of the present invention are not limited to the above technical effects, and those skilled in the art to which the present invention pertains can clearly understand the technical effects not mentioned through the present specification and drawings.

Drawings

FIG. 1 is a perspective view showing a laser output device of an embodiment;

FIGS. 2-7 are cross-sectional views of laser output devices of various embodiments;

fig. 8 to 14 are schematic views for explaining a beam steering section of the various embodiments;

fig. 15 is a perspective view showing a laser beam emitted from a laser output device of an embodiment;

FIG. 16 is a schematic diagram showing a beam steering section of an embodiment;

FIG. 17 is a schematic diagram showing a beam projection surface of an embodiment;

FIG. 18 is a perspective view showing a laser output device of an embodiment;

fig. 19 is a perspective view showing a laser output device of an embodiment;

FIG. 20 is an exploded perspective view of a laser output device of an embodiment;

fig. 21 to 23 are exploded perspective views of the laser output device of the various embodiments viewed from the side;

fig. 24-26 are exploded perspective views of laser output devices of various embodiments;

fig. 27 and 28 are exploded perspective views of the laser output device of fig. 26 viewed from the side;

fig. 29 to 31 are block diagrams for explaining a lidar device of various embodiments;

fig. 32 to 35 are perspective views of a lidar device showing a plurality of embodiments;

fig. 36 is an upper view of the lidar device of fig. 35 viewed from above;

fig. 37 is a schematic view for explaining a lidar device of still another embodiment.

Detailed Description

The above objects, features and advantages of the present invention will become more apparent with reference to the accompanying drawings and the following detailed description. The invention is capable of many modifications and embodiments and is capable of many specific embodiments and is described in detail below with reference to the drawings.

The thicknesses of layers and regions in the drawings are exaggerated for clarity, and the case where a constituent element (element) or layer is referred to as "upper (on)" or "upper (on)" of other constituent element or layer includes not only directly on top of other constituent element or layer but also with other layer or other constituent element interposed therebetween. Like reference numerals refer to like elements throughout the specification in principle. The same reference numerals are used to describe constituent elements having the same functions within the same scope as those shown in the drawings of the embodiments.

It is judged that a detailed description of known functions or configurations incorporated herein will be omitted when it may unnecessarily obscure the subject matter of the present invention. Further, numerals (for example, first, second, etc.) used in the description of the present specification are merely identification marks for distinguishing one component from another.

The term "module" and "part" of the constituent elements used in the following description are added or mixed for convenience of writing the description, and do not have a meaning or function of distinguishing themselves.

According to another embodiment, the vertical component of the steering direction of the beam steering unit may range from-M degrees to M degrees, and the horizontal component may range from-N degrees to N degrees, where N is greater than M.

According to a further embodiment, the magnitude of the component of the steering direction of the plurality of beam steering units corresponding to the vertical direction corresponds to the position of the beam steering unit in the row direction, and the magnitude of the component of the steering direction of the plurality of beam steering units corresponding to the horizontal direction may correspond to the position of the beam steering unit in the column direction.

According to a further embodiment, the position of each of the plurality of scanning points comprised in the field of view may be related to the position of the beam steering unit.

According to a further embodiment, a vertical direction position of each scanning point of the plurality of scanning points corresponds to a position of the beam steering unit in the row direction, and a horizontal direction position of each scanning point of the plurality of scanning points may correspond to a position of the beam steering unit in the column direction.

According to a further embodiment, the nanopillars may be cylindrical or polygonal pillar shapes.

According to still another embodiment, there may be provided a laser output apparatus having a Field Of View (FOV) formed by a plurality Of scan points distributed in a vertical direction and a horizontal direction, including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavity Surface Emitting Laser) elements arranged in an array and emitting laser beams; and a metasurface (metasurface) including a plurality of beam steering units that guide the laser beam so as to correspond to the plurality of scanning points by using a plurality of nano-pillars arranged on an emission surface side of the laser output portion and are arranged in a two-dimensional array along a row direction corresponding to the vertical direction and a column direction corresponding to the horizontal direction, wherein the plurality of nano-pillars belonging to the plurality of beam steering units form a first characteristic with respect to at least one of a width, a height, and a number per unit length of the plurality of nano-pillars that repeatedly increases from a center of the metasurface to a positional direction of a row to which the plurality of beam steering units belong, a sub-wavelength pattern (subwavelength pattern) in which, as regards a second characteristic of at least one of a width, a height, and a number per unit length of the plurality of nanopillars, the second characteristic increases repeatedly from a center of the metasurface toward a position direction of a column to which the plurality of beam steering units belong, the increasing rate of the first characteristic increases as the position of a row to which the plurality of beam steering units belong is farther from the center of the metasurface and the increasing rate of the second characteristic increases as the position of the column to which the plurality of beam steering units belong is farther from the center of the metasurface.

According to still another embodiment, there is provided a laser radar apparatus for measuring a distance from an obstacle included in a Field Of View (FOV) formed by a plurality Of scanning points distributed in a vertical direction and a horizontal direction, the laser radar apparatus including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavi ty Surface Emitting Laser) elements arranged in an array and emitting laser beams; and a metasurface (metasurface) that includes a plurality of beam steering units that guide the laser beam with a plurality of nano-pillars arranged on an emission surface side of the laser output portion so as to correspond to the plurality of scanning points, wherein a first characteristic of the plurality of nano-pillars belonging to the plurality of beam steering units with respect to at least one of a width, a height, and a number per unit length of the plurality of nano-pillars repeatedly increases along a direction of a component of a steering direction of the plurality of beam steering units that guides the laser beam in a vertical direction corresponding to the field of view, regarding a second characteristic of at least one of a width, a height, and a number per unit length of the plurality of nano-pillars, a direction in which the plurality of beam steering units guide a component of the steering direction of the laser beam, which corresponds to the horizontal direction of the field of view, repeatedly increases, a rate of increase of the first characteristic increases as a size of a first component of the steering direction of the plurality of beam steering units, which corresponds to the vertical direction, increases, and a sub-wavelength pattern (subwavelength pattern) in which a rate of increase of the second characteristic increases as a size of a second component of the steering direction of the plurality of beam steering units, which corresponds to the horizontal direction, increases.

According to a further embodiment, the vertical component of the steering direction of the beam steering unit may range from-M degrees to M degrees, and the horizontal component may range from-N degrees to N degrees, wherein N is greater than M.

According to a further embodiment, the plurality of beam steering units are arranged in a two-dimensional array along a row direction corresponding to the vertical direction and a column direction corresponding to the horizontal direction, the magnitude of the component of the steering direction of the plurality of beam steering units corresponding to the vertical direction corresponds to the position of the row direction of the beam steering units, and the magnitude of the component of the steering direction of the plurality of beam steering units corresponding to the horizontal direction may correspond to the position of the column direction of the beam steering units.

According to still another embodiment, there may be provided a laser output apparatus having a Field Of View (FOV) formed by a plurality Of scan points distributed in a vertical direction and a horizontal direction, including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavity Surface Emitting Laser) elements arranged in an array and emitting laser beams; and a metasurface (metasurface) that includes a plurality of beam steering units that guide the laser beam with a plurality of nano-pillars arranged on an emission surface side of the laser output portion so as to correspond to the plurality of scanning points, wherein a first characteristic of the plurality of nano-pillars belonging to the plurality of beam steering units with respect to at least one of a width, a height, and a number per unit length of the plurality of nano-pillars repeatedly increases along a direction of a component of a steering direction of the plurality of beam steering units that guides the laser beam in a vertical direction corresponding to the field of view, regarding a second characteristic of at least one of a width, a height, and a number per unit length of the plurality of nano-pillars, a direction in which the plurality of beam steering units guide a component of the steering direction of the laser beam, which corresponds to the horizontal direction of the field of view, repeatedly increases, a rate of increase of the first characteristic increases as a size of a first component of the steering direction of the plurality of beam steering units, which corresponds to the vertical direction, increases, and a sub-wavelength pattern (subwavelength pattern) in which a rate of increase of the second characteristic increases as a size of a second component of the steering direction of the plurality of beam steering units, which corresponds to the horizontal direction, increases.

According to still another embodiment, there is provided a laser radar apparatus for measuring a distance from an obstacle included in a Field Of View (FOV) formed by a plurality Of scanning points distributed in a vertical direction and a horizontal direction, the laser radar apparatus including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavi ty Surface Emitting Laser) elements arranged in an array and emitting laser beams; and a metasurface (metasurface) including a plurality of beam steering units that guide the laser beam so as to correspond to the plurality of scanning points by using a plurality of nano-pillars arranged on an emission surface side of the laser output section and are arranged in a two-dimensional array along a row direction corresponding to the vertical direction and a column direction corresponding to the horizontal direction, wherein the plurality of beam steering units include a first unit, a second unit located on the same row as the first unit and on a right side of the first unit, and a third unit located on the same column as the first unit and on a lower side of the first unit, a plurality of nanopillars belonging to the first to third units, respectively, repeatedly increasing in a direction from a center of the metasurface to a position of a row to which the first to third units belong with respect to a first characteristic of at least one of a width, a height, and a number per unit length of the plurality of nanopillars, a sub-wavelength pattern (subwavelength pattern) in which a second characteristic of at least one of a width, a height, and a number per unit length of the nanopillars repeatedly increases from a center of the metasurface to a position of a column to which the first to third units belong, the first to third units being located on an upper left side of a center of the metasurface, a rate of increase in the second characteristic of the first pattern formed by the plurality of nanopillars belonging to the first unit being larger than a rate of decrease in the second characteristic of the second pattern formed by the plurality of nanopillars belonging to the second unit, the first characteristic of the first pattern is increased more than the first characteristic of a third pattern formed of a plurality of nano-pillars belonging to the third unit.

According to still another embodiment, there is provided a laser radar apparatus for measuring a distance from an obstacle included in a Field Of View (FOV) formed by a plurality Of scanning points distributed in a vertical direction and a horizontal direction, the laser radar apparatus including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavi ty Surface Emitting Laser) elements arranged in an array and emitting laser beams; a first metasurface (metasurface) including a plurality of first beam steering units that direct the laser beam in a first steering direction corresponding to any one of the vertical direction and the horizontal direction by using a plurality of nano-pillars arranged on an emission surface side of the laser output section and are arranged in a one-dimensional array along the first direction; and a second metasurface (metasurface) that guides the laser beam in a second manipulation direction corresponding to the other of the vertical direction and the horizontal direction by using a plurality of nanopillars arranged on an exit surface side of the first metasurface, and a plurality of second beam manipulation units arranged in a one-dimensional array along a second direction perpendicular to the first direction, wherein the plurality of nanopillars belonging to the plurality of first beam manipulation units form a first sub-wavelength pattern (subwavelength pattern) in which a first characteristic with respect to at least one of an area, a height, and a number per unit length of the plurality of nanopillars repeatedly increases along the first manipulation direction and a rate of increase of the first characteristic increases as the size of the first manipulation direction increases, and the plurality of nanopillars belonging to the plurality of second beam manipulation units form a second sub-wavelength pattern in which a second characteristic with respect to at least one of an area, a height, and a number per unit length of the nanopillars repeatedly increases along the second manipulation direction and the rate of decrease of the second characteristic increases as the size of the second sub-wavelength increases as the size of the second pattern increases.

According to a further embodiment, the first metasurface comprises a first support layer supporting a plurality of nano-pillars comprised in the first beam steering unit, and the second metasurface may comprise a second support layer supporting a plurality of nano-pillars comprised in the second beam steering unit.

According to a further embodiment, the refractive index of the first support layer may be the same as the refractive index of the second support layer.

According to a further embodiment, the refractive index of the first support layer may be smaller than the refractive index of the nano-pillars belonging to the first beam steering unit.

According to a further embodiment, the plurality of first beam steering units may direct the laser beam in the vertical direction and the plurality of second beam steering units may direct the laser beam in the horizontal direction.

According to a further embodiment, the length of the first manipulation direction of the first metasurface may be smaller than the length of the first manipulation direction of the second metasurface.

According to a further embodiment, the rate of increase of the first characteristic may be smaller than the rate of increase of the second characteristic.

According to a further embodiment, the angle of the post-laser beam passing through the first metasurface may range from-45 degrees to 45 degrees with respect to an axis perpendicular to the first metasurface, and the angle of the post-laser beam passing through the second metasurface may range from-90 degrees to 90 degrees with respect to the axis.

According to a further embodiment, the position of each of the plurality of scanning points included in the field of view may be correlated with at least any one of the position of the first beam steering unit and the position of the second beam steering unit.

According to still another embodiment, there may be provided a laser output apparatus having a Field Of View (FOV) formed by a plurality Of scan points distributed in a vertical direction and a horizontal direction, including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavity Surface Emitting Laser) elements arranged in an array and emitting laser beams; a first metasurface (metasurface) including a plurality of first beam steering units that direct the laser beam in a first steering direction corresponding to any one of the vertical direction and the horizontal direction by using a plurality of nano-pillars arranged on an emission surface side of the laser output section and are arranged in a one-dimensional array along the first direction; and a second metasurface (metasurface) that guides the laser beam in a second manipulation direction corresponding to the other of the vertical direction and the horizontal direction by using a plurality of nanopillars arranged on an exit surface side of the first metasurface, and a plurality of second beam manipulation units arranged in a one-dimensional array along a second direction perpendicular to the first direction, wherein the plurality of nanopillars belonging to the plurality of first beam manipulation units form a first sub-wavelength pattern (subwavelength pattern) in which a first characteristic with respect to at least one of an area, a height, and a number per unit length of the plurality of nanopillars repeatedly increases along the first manipulation direction and a rate of increase of the first characteristic increases as the size of the first manipulation direction increases, and the plurality of nanopillars belonging to the plurality of second beam manipulation units form a second sub-wavelength pattern in which a second characteristic with respect to at least one of an area, a height, and a number per unit length of the nanopillars repeatedly increases along the second manipulation direction and the rate of decrease of the second characteristic increases as the size of the second sub-wavelength increases as the size of the second pattern increases.

According to still another embodiment, there is provided a laser radar apparatus for measuring a distance from an obstacle included in a Field Of View (FOV) formed by a plurality Of scanning points distributed in a vertical direction and a horizontal direction, the laser radar apparatus including: a laser output unit including a plurality of vertical cavity surface emitting laser (VCSEL: vertical Cavi ty Surface Emitting Laser) elements arranged in an array and emitting laser beams; a first metasurface (metasurface) including a plurality of first beam steering units that direct the laser beam in a first steering direction corresponding to any one of the vertical direction and the horizontal direction by using a plurality of nano-pillars arranged on an emission surface side of the laser output section and are arranged in a one-dimensional array along the first direction; and a second metasurface (metasurface) that guides the laser beam to a second manipulation direction corresponding to the other of the vertical direction and the horizontal direction by using a plurality of nanopillars arranged on an exit surface side of the first metasurface and that are arranged in a one-dimensional array along the second direction perpendicular to the first direction, wherein the plurality of nanopillars belonging to the plurality of first beam manipulation units form a first sub-wavelength pattern (su bwavelength pattern) in which a first characteristic with respect to at least one of an area, a height, and a number per unit length of the plurality of nanopillars repeatedly increases along the first manipulation direction and a rate of increase of the first characteristic increases as a position of the first beam manipulation unit to which the plurality of nanopillars belong is further from a center of the first metasurface, and the plurality of nanopillars belonging to the plurality of second beam manipulation units form a second sub-wavelength pattern (su bwavelength pattern) in which a rate of increase of the first characteristic increases as a second characteristic to at least one of the plurality of nanopillars increases along the second direction from the center of the first metasurface.

According to a further embodiment, the vertical direction position of each of the plurality of scanning points is related to the position of the first beam steering unit, and the horizontal direction position of each of the plurality of scanning points is related to the position of the second beam steering unit.

According to still another embodiment, there may be provided a laser radar apparatus including: a polygon mirror that rotates with one axis and reflects a laser beam supplied from one side toward an object, and is irradiated with the laser beam reflected from the object; a laser output module including a plurality of vertical cavity surface emitting laser elements arranged along a rotation axis direction of the polygon mirror and emitting laser beams to the polygon mirror, respectively; forming a metasurface (metasurface) of a beam of a line pattern extending in the rotation axis direction from a laser beam emitted from the laser output module by using a plurality of nano-pillars arranged on an emission surface side of the laser output module; and a sensor section that receives the laser beam reflected from the object through the polygon mirror.

According to a further embodiment, the metasurface may comprise a plurality of beam steering units arranged in an array form along the rotation axis direction and steering the emitted laser beams towards the rotation axis direction.

According to a further embodiment, the steering direction of the beam steering unit may be determined according to the position of the beam steering unit on the array.

According to a further embodiment, the beam steering unit comprises a first beam steering unit at an upper end of the array and a second beam steering unit at a lower end of the array, a direction of the rotational axis direction component of a first steering direction of the first beam steering unit being reversible with a direction of the rotational axis direction component of a second steering direction of the second beam steering unit.

According to still another embodiment, a first spot where the first laser beam manipulated by the first beam manipulation unit is irradiated onto the polygon mirror may be located on an upper side than a second spot where the second laser beam manipulated by the second beam manipulation unit is irradiated onto the polygon mirror.

According to a further embodiment, it may be characterized in that the length in the rotation axis direction of the light beam of the line pattern is shorter than the length in the rotation axis direction of the metasurface.

According to a further embodiment, the plurality of beam steering units each comprise the plurality of nanopillars, at least a portion of the plurality of nanopillars may form a sub-wavelength pattern having at least one characteristic of its width, height and number per unit length that increases from a center of the metasurface towards a beam steering unit to which the portion belongs, the further the beam steering unit is positioned from the center of the metasurface, the greater the rate of increase of the characteristic may be.

According to a further embodiment, the plurality of nano-pillars may form a sub-wavelength pattern in which at least one characteristic of a width, a height, and a number per unit length thereof is repeatedly increased and decreased along a rotation axis direction of the polygon mirror and an increasing and decreasing rate of the characteristic is changed with a position of the rotation axis direction.

According to a further embodiment, the length of the metasurface in the rotation axis direction may be shorter than the length of the polygon mirror in the rotation axis direction.

According to a further embodiment, the length of the metasurface in the rotation axis direction may be longer than the length of the polygon mirror in the rotation axis direction.

According to a further embodiment, the laser output module may emit a laser beam in a direction perpendicular to a rotation axis of the polygon mirror.

According to still another embodiment, there may be provided a laser radar apparatus including: a laser output module including a plurality of vertical cavity surface emitting laser elements that emit laser beams, respectively; a laser beam generator configured to generate a laser beam, the laser beam generator including a plurality of beam steering units configured to steer the laser beam emitted from the laser output module along a first axis, which is one of a vertical axis and a horizontal axis, by using a nano-pillar arranged on an emission surface side of the laser output module, and forming a metasurface of the beam in a line pattern extending along the first axis; a scanning mirror that forms a planar pattern beam by rotating a beam from the line pattern along the first axis and is irradiated with a laser beam reflected from an object; and a sensor unit that receives the laser beam reflected from the object by the scanning mirror.

According to a further embodiment, the plurality of beam steering units may be arranged in an array configuration along the first axis, the length of the array in the direction of the first axis being greater than the length of the array in the direction of the second axis perpendicular to the first axis.

According to a further embodiment, the scanning mirror may have a polygonal column shape including a first reflecting surface and a second reflecting surface sharing one side with the first reflecting surface, and may be rotated 360 degrees along the first axis.

According to a further embodiment, the scanning mirror rotates with the first axis within a predetermined range, through which an imaginary line extending the light beam of the line pattern formed through the metasurface may pass.

Fig. 1 is a perspective view showing a laser output device 1000 of an embodiment.

The laser output apparatus 1000 of one embodiment can emit laser beams in multiple directions.

The laser output apparatus 1000 of an embodiment may include a laser output section 100 and a beam steering section 200.

The laser beam emitted from the laser output section 100 can be manipulated by the beam manipulation section 200. Thus, laser beams of various shapes can be formed. As an example, the laser output apparatus 1000 can emit a laser beam in a planar beam form. As another example, the laser output apparatus 1000 may emit a laser beam in the form of a line beam. Alternatively, the laser output apparatus 1000 may emit a laser beam in the form of a point light source.

Each structure of the laser output apparatus 1000 will be specifically described below.

The laser output unit 100 can emit a laser beam to one side. The beam steering unit 200 is disposed on one side of the laser output unit 100, and is capable of steering the laser beam emitted from the laser output unit 100. The beam manipulation part 200 may manipulate the emitted laser beam according to a nano pattern formed by the plurality of nano-pillars 10. Accordingly, the flight path of the laser beam emitted from the laser output part 100 may be determined by the nanopattern. The nanopattern may have the same meaning as the sub-wavelength pattern (subwavelength pattern).

The laser output unit 100 can emit laser beams of various wavelengths. For example, the laser output unit 100 may emit a laser beam having a wavelength of 905 nm. Alternatively, the laser output section 100 may emit a laser beam having a wavelength of 1550 nm.

The laser output unit 100 may be in the form of a flat plate.

The laser output 100 may include a support surface and an exit surface. The support surface and the ejection surface may be parallel to each other.

The laser output unit 100 may emit a laser beam in a direction perpendicular to the support surface. Alternatively, the laser output unit 100 may emit the laser beam in a direction perpendicular to the emission surface.

The beam manipulation part 200 may generate various forms of laser beams based on the laser beam supplied from one side. As an example, the beam steering unit 200 may generate a laser beam in a line beam form from a laser beam in a point light source form. As another example, the beam steering unit 200 may generate a laser beam in a planar beam form from a laser beam in a point light source form. As another example, the beam steering unit 200 may generate a laser beam in a planar beam form from a laser beam in a linear beam form.

The beam steering unit 200 can refract the laser beam emitted from the laser output unit 100. For example, the beam manipulation part 200 may refract the emitted laser beam according to a nano pattern formed by the plurality of nano-pillars 10. The post-refraction angle of the refracted laser beam may be determined from the nanopattern.

The beam steering section 200 may include a plurality of nano-pillars 10.

The plurality of nano-pillars 10 may have a sub-wavelength (sub-wavelength) size. For example, the interval between the plurality of nano-pillars 10 may be smaller than the wavelength of the laser beam emitted from the laser output section 100. Alternatively, the width, diameter, and height of the nanopillars 10 may be less than the length of the wavelength of the laser beam.

The beam steering section 200 may be a metasurface (metasurface).

The beam steering section 200 may refract the laser beam emitted from the laser output section 100 by adjusting the phase of the laser beam.

The beam steering section 200 may be disposed on the laser output section 100. For example, the beam steering section 200 may be disposed on the emission surface side of the laser output section 100.

Alternatively, the beam manipulation part 200 may be deposited on the laser output part 100. A plurality of nano-pillars 10 may be formed at an upper portion of the laser output section 100. The plurality of nano-pillars 10 may form various nano-patterns on the laser output part 100.

The nanopillar 10 may have a variety of shapes. For example, the nanopillar 10 may have a shape of a cylinder, a polygonal column, a cone, a polygonal cone, or the like. Furthermore, the nano-pillars 10 may have an irregular shape.

Fig. 2 is a cross-sectional view of a laser output device 1000 according to an embodiment.

As shown in fig. 2, the laser output device 1000 of an embodiment may include a laser output section 100 and a beam steering section 200.

The laser output part 100 of an embodiment may include a substrate 110 electrically connected to an external power source, a light source part 120 emitting a laser beam, and reflection parts 130, 140 reflecting the laser beam emitted from the light source part 120.

The laser beam emitted from the light source unit 120 is reflected by the reflection units 130 and 140 and oscillates. The laser beam emitted may be repeatedly reflected by the first reflecting portion 130 and the second reflecting portion 140, and then emitted to the outside of the laser output portion 100 through the second reflecting portion 140.

The light source 120 can emit laser beams of various wavelengths. For example, the light source unit 120 may emit a laser beam having a wavelength of 905 nm. Alternatively, the light source section 120 may emit a laser beam having a wavelength of 1550 nm.

The light source section 120 may be composed of a plurality of substances. For example, the light source part 120 may include GaAs, alGaAs, gaAlAs, si.

The wavelength of the laser beam emitted from the light source 120 may vary depending on the constituent material of the light source 120.

The intensity of the laser beam emitted from the light source section 120 may vary depending on the intensity of the power supplied from the outside.

The light source portion 120 may be disposed between the first reflecting portion 130 and the second reflecting portion 140.

The first reflecting portion 130 may reflect the laser beam provided to one side. For example, the first reflection part 130 may reflect the laser beam emitted from the light source part 120 toward the light source part 120. The first reflecting portion 130 may reflect the laser beam reflected from the second reflecting portion 140 toward the light source portion 120.

The first reflecting portion 130 may include a plurality of layers. The plurality of layers may have a structure in which layers having a relatively high refractive index and layers having a relatively low refractive index are alternately arranged. The thickness of each of the plurality of layers may be 1/4 of the wavelength of the laser beam emitted from the light source section 120.

As shown, the first reflecting portion 130 may be disposed on the upper portion of the substrate 110. For example, the first reflecting portion 130 may be deposited on the substrate 110. Of course, other structures may be included between the substrate 110 and the first reflecting portion 130.

The first reflecting portion 130 may be a distributed bragg reflector (DRR: distributed Bragg Reflector).

The first reflecting part 130 may include gallium arsenide (GaAs), indium Tin Oxide (ITO) Indium Zinc Oxide (IZO) indium Zinc Oxide (Zinc-Oxide), gallium Indium Zinc Oxide (GIZO) Ga-In-Zn-Oxide, aluminum Zinc Oxide (AZO) Al-Zn-Oxide, gallium Zinc Oxide (GZO) Ga-Zn-Oxide, zinc Oxide (ZnO).

The second reflecting portion 140 may reflect the laser beam provided to one side. For example, the second reflection part 140 may reflect the laser beam emitted from the light source part 120 toward the light source part 120. The second reflection part 140 may reflect the laser beam reflected from the first reflection part 130 toward the light source part 120.

The second reflecting portion 140 may include a plurality of layers. The plurality of layers may have a structure in which layers having a relatively high refractive index and layers having a relatively low refractive index are alternately arranged. The thickness of each of the plurality of layers may be 1/4 of the wavelength of the laser beam emitted from the light source section 120.

The laser beam emitted from the light source 120 and reflected by the first reflecting portion 130 and the second reflecting portion 140 can pass through the second reflecting portion 140 and be emitted toward the nanopillar 10. The laser beam may be emitted in a direction perpendicular to the substrate 110.

The second reflecting portion 140 may be disposed at an upper portion of the light source portion 120. For example, the second reflecting portion 140 may be deposited on the light source portion 120. Of course, other structures may be included between the substrate 110 and the second reflecting portion 140.

The second reflecting portion 140 may be a distributed bragg reflector (DBR: distributed Bragg Reflector).

The second reflecting portion 140 may include GaAs, cuAl ₂ O、NiO、CuO。

The electronic characteristics of the first reflecting portion 130 and the electronic characteristics of the second reflecting portion 140 may be different. For example, the first reflecting portion 130 may be an n-type (n-tpye) semiconductor, and the second reflecting portion 140 may be a p-type (p-type) semiconductor.

The first reflecting portion 130 may include a greater number of layers than the second reflecting portion 140.

The reflectivity of the first reflecting portion 130 may be greater than the reflectivity of the second reflecting portion 140.

The laser output section 100 of an embodiment may be a vertical cavity surface emitting laser (VCSEL: vertical Cavity Surface Emitting Laser) element. The laser beam emitted from the laser output unit 100 may be emitted in a direction perpendicular to the substrate 110. The laser beam emitted may be emitted in a direction perpendicular to the support surface of the laser output section 100.

Fig. 2 shows that the first reflecting portion 130 is disposed between the substrate 110 and the light source portion 120, but this is an example, and positions of the first reflecting portion 130 and the second reflecting portion 140 may be interchanged. The laser output unit 100 may include other components in addition to the illustrated components.

Although fig. 2 shows the nanopillar 10 and the second reflecting portion 140 in contact, this is for convenience of description, and other configurations may be arranged between the nanopillar 10 and the second reflecting portion 140. For example, a transparent electrode layer may be disposed between the nanopillar 10 and the second reflective portion 140.

The beam steering unit 200 can refract the laser beam emitted from the laser output unit 100. For example, the beam manipulation part 200 may manipulate the laser beam by controlling the phase of the laser beam. Also, the beam manipulation part 200 may manipulate the laser beam by controlling the light amount of the laser beam.

The beam steering section 200 may include a plurality of nano-pillars 10.

The height of the nanopillar 10 may be at least half or more of the wavelength of the laser beam emitted from the laser output unit 100.

The nanopillar 10 may be composed of a variety of materials. For example, the metal may be composed of a metal such as Ag, au, al, pt or a metal nitride such as TiN or TaN.

The refractive index of the nano-pillar 10 may be greater than that of the second reflection part 140.

The plurality of nano-pillars 10 may form a plurality of nano-patterns. The beam manipulation part 200 may manipulate the laser beam emitted from the laser output part 100 according to the nano pattern.

The nano-pillars 10 may form nano patterns according to various characteristics. The characteristics may include Width (W) of the nanopillar 10, spacing (Pitch, P), height (H), and number per unit length.

The following describes the manipulation of nanopatterns formed according to various characteristics and laser beams corresponding thereto.

The plurality of nano-pillars 10 may form a nano pattern according to the width W thereof. For example, the plurality of nano-pillars 10 may be configured such that the widths W1, W2, W3 thereof increase with a trend direction. Here, the laser beam emitted from the laser output part 100 may be manipulated to increase toward the width W of the nano-pillar 10.

For example, the beam manipulation part 200 may include a first nano-pillar 11 having a first width W1, a second nano-pillar 12 having a second width W2, and a third nano-pillar 13 having a third width W3. The third width W3 may be greater than the first width W1 and the second width W2. The second width W2 may be greater than the first width W1. That is, the width W of the nanopillar 10 may increase as it goes from the first nanopillar 11 toward the third nanopillar 13 side. Here, the laser beam emitted from the laser output part 100 may be manipulated to be directed in a third direction, which is a direction between the first direction emitted from the laser output part 100 and the second direction, which is a direction from the first nanopillar 11 to the third nanopillar 13. The third direction may be calculated from a sum of a first vector having the first direction and a second vector having the second direction. The second direction may be perpendicular to the first direction.

In addition, the steering angle θ of the laser beam may vary with the rate of increase and decrease of the width W of the nanopillar 10. Here, the rate of increase and decrease in the width W of the nanopillars 10 may represent a value obtained by averaging the degree of increase and decrease in the width W of the adjacent plurality of nanopillars 10. Here, the steering angle θ may represent an angle formed by the laser beam steered by the beam steering unit 200 and the virtual reference line R. The reference line R may be related to an emission direction of the laser beam emitted from the laser output unit 100. For example, the reference line R may be parallel to the emission direction.

The rate of increase and decrease of the width W of the nanopillar 10 can be calculated according to the difference between the first width W1 and the second width W2 and the difference between the second width W2 and the third width W3.

The difference between the first width W1 and the second width W2 may be different from the difference between the second width W2 and the third width W3.

The steering angle θ of the laser beam may vary with the width W of the nanopillar 10.

Specifically, the manipulation angle θ may be increased as the rate of increase and decrease of the width W of the nano-pillar 10 increases.

For example, the nano-pillars 10 may be formed in a first pattern having a first rate of increase and decrease according to the width W thereof. And, the nano-pillars 10 may form a second pattern having a second rate of increase smaller than the first rate of increase according to the width W thereof.

Here, the first manipulation angle based on the first pattern may be larger than the second manipulation angle based on the second pattern.

In addition, the manipulation angle θ may range from-90 degrees to 90 degrees.

The plurality of nano-pillars 10 may form a nano pattern according to a variation in the interval P between adjacent nano-pillars 10. The beam manipulation part 200 may manipulate the laser beam emitted from the laser output part 100 according to the nano pattern formed based on the variation of the interval P between the nano-pillars 10.

Fig. 3 is a sectional view for explaining beam manipulation based on the variation of the intervals P1, P2, P3 between the nano-pillars 10. The laser output apparatus 1000 may include a laser output section 100 and a beam steering section 200. The beam steering section 200 may include a plurality of nano-pillars 10.

The laser output section 100 of fig. 3 may correspond to the laser output section 100 illustrated in fig. 1 and 2. Therefore, a specific description thereof will be omitted, and a description will be focused on points of distinction from the laser output apparatus 1000 of fig. 2.

According to an embodiment, the interval P between the nano-pillars 10 may decrease with the trend direction. Here, the interval P may represent a distance between centers of two adjacent nano-pillars 10. For example, a distance between the center of the first nano-pillar 11 and the center of the second nano-pillar 12 may be defined as the first interval P1. Alternatively, the shortest distance between the first nano-pillars 11 and the second nano-pillars 12 may be defined as the first interval P1.

The laser beam emitted from the laser output part 100 may be manipulated to be directed toward a direction in which the interval P between the nano-pillars 10 is reduced.

The beam manipulation part 200 may include a first nano-pillar 11, a second nano-pillar 12, a third nano-pillar 13, and a fourth nano-pillar 14. Here, the first interval P1 may be obtained according to a distance between the first and second nano-pillars 11 and 12. Also, the second interval P2 may be obtained according to the distance between the second and third nano-pillars 12 and 13. And, the third interval P3 may be obtained according to the distance between the third and fourth nano-pillars 13 and 14. Here, the first interval P1 may be greater than the second interval P2 and the third interval P3. The second interval P2 may be greater than the third interval P3. That is, the interval P may decrease as going from the first nano-pillar 11 toward the fourth nano-pillar 14 side.

Here, the laser beam emitted from the laser output part 100 may be manipulated to be directed between a first direction emitted from the laser output part 100 and a second direction, which is a direction from the first nano-pillar 11 to the third nano-pillar 13.

The steering angle θ of the laser beam may vary with the spacing P between the nanopillars 10.

Specifically, the steering angle θ of the laser beam may vary with the rate of increase and decrease of the interval P between the nano-pillars 10. Here, the rate of increase and decrease of the interval P between the nano-pillars 10 may represent a value obtained by averaging the degree of change of the interval P between the adjacent nano-pillars 10.

The manipulation angle θ of the laser beam may be increased as the rate of increase and decrease of the interval P between the nano-pillars 10 increases.

For example, the nano-pillars 10 may be formed in a first pattern having a first rate of increase and decrease according to the interval P thereof. And, the nano-pillars 10 may form a second pattern having a second rate of increase smaller than the first rate of increase according to the interval P thereof.

In addition, the principle of manipulation of the laser beam based on the variation of the interval P of the nano-pillars 10 described above can be similarly applied also in the case where the number of the nano-pillars 10 per unit length varies.

For example, in the case where the number of nano-pillars 10 per unit length varies, the laser beam emitted from the laser output section 100 may be manipulated to be directed between a first direction emitted from the laser output section 100 and a second direction in which the number of nano-pillars 10 per unit length increases.

In addition, the plurality of nano-pillars 10 may form a nano pattern according to a variation in height H of the nano-pillars 10.

Fig. 4 is a cross-sectional view for explaining beam manipulation based on a change in the height H of the nano-pillar 10. Referring to fig. 4, the laser output device 1000 may include a laser output part 100 and a beam manipulation part 200. The beam steering section 200 may include a plurality of nano-pillars 10.

The laser output section 100 of fig. 4 may correspond to the laser output section 100 illustrated in fig. 1 and 2. Therefore, a specific description thereof will be omitted, and a description will be focused on points of distinction from the laser output apparatus 1000 of fig. 2.

According to an embodiment, the heights H1, H2, H3 of the plurality of nano-pillars 10 may increase with a trend direction. The laser beam emitted from the laser output part 100 may be manipulated to increase toward the height H of the nanopillar 10.

For example, the beam manipulation part 200 may include a first nano-pillar 11 having a first height H1, a second nano-pillar 12 having a second height H2, and a third nano-pillar 13 having a third height H3. The third height H3 may be greater than the first height H1 and the second height H2. The second height H2 may be greater than the first height H1. That is, the height H of the nano-pillars 10 may increase as going from the first nano-pillar 11 toward the third nano-pillar 13 side. Here, the laser beam emitted from the laser output part 100 may be manipulated to be directed between a first direction emitted from the laser output part 100 and a second direction, which is a direction from the first nano-pillar 11 to the third nano-pillar 13.

The steering angle θ of the laser beam may vary with the height H of the nanopillar 10.

Specifically, the steering angle θ of the laser beam may vary with the rate of increase and decrease of the height H of the nanopillar 10. Here, the rate of increase in the height H of the nanopillars 10 may represent a value obtained by averaging the degree of change in the height H of the neighboring nanopillars 10.

The increasing and decreasing rate of the height H of the nano-pillars 10 can be calculated according to the difference between the first height H1 and the second height H2 and the difference between the second height H2 and the third height H3. The difference between the first height H1 and the second height H2 may be different from the difference between the second height H2 and the third height H3.

The steering angle θ of the laser beam may increase as the rate of increase and decrease of the height H of the nanopillar 10 increases.

For example, the nano-pillars 10 may form a first pattern having a first rate of increase and decrease according to the height H thereof. And, the nano-pillars 10 may form a second pattern having a second rate of increase smaller than the first rate of increase according to the height H thereof.

In addition, fig. 2 to 4 show the first to fourth nano-pillars 11, 12, 13, 14 as a group formed on the laser output section 100, but nano-patterns may be formed on one laser output section 100 by a plurality of groups of nano-pillars 10. For example, a new nano pattern repeating the nano patterns formed in fig. 2 to 4 may be formed on the laser output part 100.

Also, the nano patterns formed in fig. 2 to 4 may be combined with each other and formed on one laser output part 100.

The following description describes laser output devices having various nanopatterns and laser beam manipulation based on the nanopatterns.

Fig. 5 is a cross-sectional view for explaining a laser output device 1000 of an embodiment. Referring to fig. 5, the laser output device 1000 may include a plurality of laser output sections 101, 102, 103. Also, the laser output device 1000 may include a beam manipulation part 200 including a plurality of nano-pillars 10.

The laser beams emitted from the plurality of laser output units 101, 102, 103 can be manipulated by the plurality of nanopillars 10 disposed on the plurality of laser output units 101, 102, 103, respectively.

The laser output apparatus 1000 may include a first laser output section 101, a second laser output section 102, and a third laser output section 103. The first to third laser output units 101, 102, 103 may correspond to the laser output unit 100 described with reference to fig. 1 and 2. A specific description thereof will be omitted.

The laser output unit 100 may be configured in an array configuration. For example, the laser output unit 100 may be configured in a 1×3 array configuration. Here, the first to third laser output portions 101, 102, 103 may be arranged in the first to third columns of the array, respectively.

The first to third laser output units 101, 102, 103 may emit laser beams in the same direction. For example, the first to third laser output units 101, 102, 103 may emit laser beams in a direction perpendicular to the emission surface of the laser output apparatus 1000.

The beam steering unit 200 may be configured in an array configuration. The beam manipulation part 200 may include a plurality of beam manipulation units 210. The beam steering unit 210 may include a first beam steering unit 211, a second beam steering unit 212, and a third beam steering unit 213. The plurality of beam steering units 210 may be arranged in an array configuration.

The first to third beam steering units 211, 212, 213 can change the irradiation direction of each of the laser beams by controlling the phase of each of the laser beams emitted from the plurality of laser output units 101, 102, 103.

The first to third beam steering units 211, 212, 213 can change the irradiation direction of each of the laser beams by controlling the transmittance of each of the laser beams emitted from the plurality of laser output units 101, 102, 103.

The first to third beam manipulation units 211, 212, 213 may include a plurality of nano-pillars 10 forming a nano-pattern, respectively. The laser beam emitted from the laser output part 100 can be manipulated by the nano-pillar 10.

The nanopillar 10 can form laser beams of various shapes by manipulating the laser beam emitted from the laser output section 100.

As an example, the nanopillar 10 may form a laser beam having a shape diverging from the center of the laser output section 100. As another example, the nanopillar 10 may be formed into a laser beam having a shape converging to an irradiation path of the laser beam emitted from the laser output unit 100 disposed at the center of the array. As another example, the nanopillar 10 may form a laser beam that irradiates in a direction perpendicular to the support surface of the laser output apparatus 1000.

The following description will be focused on the case where the laser beam manipulated by the nanopillar 10 has a shape diverging from the center of the laser output section 100 for convenience of description.

In addition, the plurality of nano-pillars 10 may form a nano-pattern according to the position of the beam steering unit 210. For example, the nano-pillar 10 may form a nano-pattern such that a manipulation angle θ through the beam manipulation unit 210 far from the center of the beam manipulation part 200 is greater than a manipulation angle θ through the beam manipulation unit 210 near to the center of the beam manipulation part 200.

Such a nanopattern may be formed according to the width W of the nano-pillars 10, the interval P between the nano-pillars 10, and the height H of the nano-pillars 10 described above.

Referring to fig. 5, the nano-pillars 10 may form nano patterns according to a variation of the width W thereof and the position of the beam steering unit 210.

Specifically, the second beam steering unit 212 located at the center portion of the beam steering part 200 may include a plurality of nano-pillars 10 having the same width W.

Also, the first beam manipulation unit 211, which is disposed farther from the center of the beam manipulation part 200 than the second beam manipulation unit 212, may include a plurality of nano-pillars 10 whose width W increases as it is farther from the center of the beam manipulation part 200.

Also, the third beam manipulation unit 213, which is disposed farther from the center of the beam manipulation part 200 than the second beam manipulation unit 212, may include a plurality of nano-pillars 10 whose width W increases as it is farther from the center of the beam manipulation part 200.

Accordingly, the beam manipulation part 200 may form a divergently shaped laser beam.

In addition, a first manipulation angle of a first beam manipulation unit disposed far from the center of the beam manipulation part 200 may be larger than a second manipulation angle of a second beam manipulation unit disposed near to the center of the beam manipulation part 200.

Here, the rate of increase of the width W of the nanopillar 10 belonging to the first beam steering unit may be greater than the rate of increase of the width W of the nanopillar 10 belonging to the second beam steering unit.

In addition, fig. 5 shows that the laser beams respectively manipulated by the first beam manipulation unit 211 and the third beam manipulation unit 213 do not traverse an extended line extending along the emission direction of the laser beam manipulated by the second beam manipulation unit 212. But is not limited thereto, the laser beams respectively manipulated by the first beam manipulation unit 211 and the third beam manipulation unit 213 may traverse the extension lines.

Accordingly, the laser beam manipulated by the first beam manipulation unit 211 may be manipulated to be directed between a first direction in which the laser beam is emitted from the laser output part 100 and a second direction in which the laser beam is directed from the first beam manipulation unit 211 toward the center of the beam manipulation part 200.

Also, the laser beam manipulated by the third beam manipulation unit 213 may be manipulated to be directed between a third direction in which the laser beam is emitted from the laser output section 100 and a fourth direction in which the laser beam is directed from the third beam manipulation unit 213 toward the center of the beam manipulation section 200.

In addition, the plurality of nano-pillars 10 forming the nano-pattern may form a symmetrical pattern with respect to the center of the beam manipulation part 200. For example, the first nanopattern formed by the nanopillars 10 belonging to the first beam steering unit 211 may be symmetrical to the third nanopattern formed by the nanopillars 10 belonging to the third beam steering unit 213.

Accordingly, the first steering angle of the first beam steering unit 211 and the third steering angle of the third beam steering unit 213 may have the same magnitude.

In addition, the shapes of the nano-pillars 10 included in the plurality of beam steering units 210 may be respectively different. For example, the nano-pillars 10 included in the first beam steering unit 211 may have a cylindrical shape, and the nano-pillars 10 included in the second beam steering unit 212 may have a polygonal pillar shape.

Also, the shapes of the plurality of nano-pillars 10 included in the same beam steering unit 210 may be different from each other. For example, one portion of the plurality of nano-pillars 10 included in the first beam steering unit 211 may have a cylindrical shape, and the other portion may have a polygonal pillar shape.

In addition, the steering angles θ of the respective plurality of beam steering units 210 may be different from each other. For example, the first steering angle of the first beam steering unit 211 and the third steering angle of the third beam steering unit 213 may be different.

In addition, the plurality of laser output sections 100 may be independently controlled. For example, the characteristics (wavelength, intensity, emission period, etc.) of the laser beams emitted from the respective laser output sections 100 may be different from each other. Also, ON/OFF (ON/OFF) of each laser output section 100 may be individually controlled.

For example, the laser output section 100 may include a plurality of vertical cavity surface emitting laser elements arranged in an array configuration. Here, ON/OFF (ON/OFF) of the plurality of vertical cavity surface emitting laser elements may be independently controlled. That is, the laser output section 100 may include an addressable vertical cavity surface emitting laser (addressable VCSEL).

The laser output apparatus 1000 can adjust the steering angle of the laser beam by adjusting the ON/OFF (ON/OFF) and intensity of each of the plurality of laser output sections 100.

Alternatively, the plurality of laser output units 100 may be linked. For example, ON/OFF (ON/OFF) of the first laser output section 101 and the second laser output section 102 may be simultaneously controlled.

The laser output apparatus 1000 can emit laser beams of various wavelengths. For example, the first laser output section 101 emits a first laser beam having a first wavelength, and the second laser output section 102 may emit a second laser beam having a second wavelength.

Fig. 6 is a cross-sectional view for explaining a laser output device 1000 of another embodiment. Referring to fig. 6, the laser output device 1000 may include a plurality of laser output parts 100. Also, the laser output device 1000 may include a beam manipulation part 200 including a plurality of nano-pillars 10. The beam manipulation part 200 may include a plurality of beam manipulation units 210.

The laser beams emitted from the plurality of laser output parts 100 may be respectively manipulated by the plurality of nano-pillars 10 included in the plurality of beam manipulation units 210.

The laser output apparatus 1000 may include a first laser output section 101, a second laser output section 102, and a third laser output section 103. The beam steering unit 210 may include a first beam steering unit 211, a second beam steering unit 212, and a third beam steering unit 213.

The first to third laser output units 101, 102, 103 may correspond to the laser output unit 100 described with reference to fig. 1, 2, and 5. Therefore, a specific description thereof will be omitted, and a point of comparison with the laser output apparatus 1000 of fig. 5 will be mainly described.

Referring to fig. 6, the nano-pillars 10 may form nano patterns according to the variation of the interval P thereof and the position of the beam steering unit 210.

Specifically, the second beam manipulation unit 212 located at the central portion of the beam manipulation part 200 may include a plurality of nano-pillars 10 having the same interval P.

Also, the first beam manipulation unit 211, which is disposed farther from the center of the beam manipulation part 200 than the second beam manipulation unit 212, may include a plurality of nano-pillars 10 whose interval P increases as it is farther from the center of the beam manipulation part 200.

Also, the third beam manipulation unit 213, which is disposed farther from the center of the beam manipulation part 200 than the second beam manipulation unit 212, may include a plurality of nano-pillars 10 whose interval P increases as it is farther from the center of the beam manipulation part 200.

Here, the rate of increase of the interval P of the nano-pillars 10 belonging to the first beam steering unit may be greater than the rate of increase of the interval P of the nano-pillars 10 belonging to the second beam steering unit.

For example, the plurality of nano-pillars 10 included in the first beam-manipulating unit 211 may form a nano-pattern in which the number of nano-pillars 10 per unit length increases as it is farther from the center of the beam-manipulating part 200.

Also, the plurality of nano-pillars 10 included in the third beam-manipulating unit 213 may form a nano-pattern in which the number of nano-pillars 10 per unit length increases as it is farther from the center of the beam-manipulating part 200.

Also, the plurality of nano-pillars 10 included in the second beam-steering unit 212 located at the central portion of the beam-steering part 200 may form a nano-pattern having a predetermined number of nano-pillars 10 per unit length.

Fig. 7 is a cross-sectional view for explaining a laser output device 1000 of still another embodiment. Referring to fig. 7, the laser output device 1000 may include a plurality of laser output parts 100. Also, the laser output device 1000 may include a beam manipulation part 200 including a plurality of nano-pillars 10. The beam manipulation part 200 may include a plurality of beam manipulation units 210.

Referring to fig. 7, the nano-pillars 10 may form nano patterns according to a variation in height H thereof and a position of the beam steering unit 210.

In particular, the second beam steering unit 212 located at the central portion of the beam steering part 200 may include a plurality of nano-pillars 10 having the same height H.

Also, the first beam manipulation unit 211, which is disposed farther from the center of the beam manipulation part 200 than the second beam manipulation unit 212, may include a plurality of nano-pillars 10 whose height H increases as it is farther from the center of the beam manipulation part 200.

Also, the third beam manipulation unit 213, which is disposed farther from the center of the beam manipulation part 200 than the second beam manipulation unit 212, may include a plurality of nano-pillars 10 whose height H increases as it is farther from the center of the beam manipulation part 200.

Here, the increasing and decreasing rate of the height H of the nano-pillars 10 belonging to the first beam steering unit may be greater than the increasing and decreasing rate of the height H of the nano-pillars 10 belonging to the second beam steering unit.

In addition, the case where the nano-pillar 10 forms a nano pattern using only one of the characteristics W, P, H is described above for convenience of description. But is not limited thereto, the nano-pillars 10 may form nano patterns using a plurality of characteristics among the characteristics. For example, the plurality of nano-pillars 10 included in the first beam steering unit 211 may form a nano-pattern according to a variation in the width W thereof, and the plurality of nano-pillars 10 included in the third beam steering unit 213 may form a nano-pattern according to a variation in the interval P thereof.

Also, a plurality of nano-pillars 10 may form nano-patterns using a plurality of characteristics on one laser beam manipulation unit 210. For example, the plurality of nano-pillars 10 included in the first beam steering unit 211 may form nano-patterns according to variations in the width W and the interval P thereof.

In addition, fig. 5 to 7 show that the plurality of nano-pillars 10 forming the nano-pattern have a symmetrical shape with reference to the center of the array, but the nano-pattern may have an asymmetrical shape. Accordingly, the first steering angle of the first beam steering unit 211 and the third steering angle of the laser beam emitted from the third beam steering unit 213 may be different.

Also, the plurality of nano-pillars 10 respectively included in the respective beam steering units of the plurality of beam steering units 210 may form the same nano-pattern. Accordingly, the laser beams emitted from the plurality of laser output sections 100 can be steered to face the same direction.

In addition, fig. 5 to 7 show that each beam steering unit 210 is formed with one nanopattern, but the same pattern repeated nanopattern may be formed in one beam steering unit 210.

In addition, the second beam steering unit 212 may not include the nanopillar 10. Therefore, the laser beam passing through the second beam steering unit 212 can be irradiated in the same direction as the emission direction from the laser output section 100.

The following description deals with beam steering units arranged in a two-dimensional array configuration to steer beams.

Fig. 8 is a schematic diagram for explaining a beam steering section of an embodiment.

Referring to fig. 8, the beam manipulation part 200 may include a plurality of beam manipulation units 210 and a plurality of nano-pillars 10. The beam steering unit 210 may include first to ninth beam steering units 211, 212, 213, 214, 215, 216, 217, 218, 219.

The beam steering unit 210 of an embodiment may be configured in a two-dimensional array. For example, the beam steering unit 210 may be configured in a 3x3 array configuration. The first to ninth beam manipulation units 211, 212, 213, 214, 215, 216, 217, 218, 219 may be arranged in a two-dimensional array along a row direction corresponding to a vertical direction and a column direction corresponding to a horizontal direction.

The beam manipulation unit 210 may manipulate the laser beam emitted from the laser output part using a plurality of nano-pillars 10 forming a nano pattern.

The beam steering unit 210 may form laser beams of various shapes by steering the laser beams emitted from the laser output part 100.

For example, the beam steering unit 210 may form a laser beam of a shape diverged from the center of the laser output part 100.

The plurality of nano-pillars 10 may form a nano-pattern according to the position of the beam steering unit 210. For example, the plurality of nano-pillars 10 may form a nano-pattern whose width W increases as it goes away from the center of the beam-manipulating part 200. Accordingly, the laser beam emitted from the laser output section 100 may have a shape diverging from the center of the beam manipulation section 200.

Referring to fig. 8, a plurality of nano-pillars 10 may form a nano pattern according to the position of the beam steering unit 210.

For example, the plurality of nano-pillars 10 included in the fifth beam steering unit 215 located at the center portion of the beam steering part 200 may have the same size and be arranged with a predetermined interval therebetween. Therefore, the laser beam manipulated by the fifth beam manipulation unit 215 is not refracted by the nano-pillars 10 configured, and may pass through the nano-pillars 10 as it is.

In addition, the fifth beam steering unit 215 may not include the nanopillar 10. Accordingly, the laser beam emitted from the laser output section 100 can pass through the fifth beam steering unit 215 with the emission direction maintained.

The fourth beam steering unit 214 is located in the same row as the fifth beam steering unit 215, and may be located in the left column as compared to the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the fourth beam steering unit 214 may form a nano-pattern in which the width W increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the fourth beam steering unit 214 may be the same as the direction from the center of the beam steering section 200 toward the fourth beam steering unit 214.

Also, the plurality of nano-pillars 10 included in the sixth beam-steering unit 216, which is located in the same row as the fifth beam-steering unit 215 and in a right column compared to the fifth beam-steering unit 215, may form a nano-pattern in which the width W increases as it is farther from the center of the beam-steering section 200. Accordingly, the steering direction of the sixth beam steering unit 216 may be the same as the direction from the center of the beam steering section 200 toward the sixth beam steering unit 216.

In addition, in the case where the fourth beam steering unit 214 and the sixth beam steering unit 216 are symmetrically arranged with respect to the center of the beam steering unit 200, the steering angles of the fourth beam steering unit 214 and the sixth beam steering unit 216 may be the same.

The second beam steering unit 212 is located in the same column as the fifth beam steering unit 215, and may be located in an upper row compared to the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the second beam steering unit 212 may form a nano-pattern in which the width W increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the second beam steering unit 212 may be the same as the direction from the center of the beam steering section 200 toward the second beam steering unit 212.

Also, the plurality of nano-pillars 10 included in the eighth beam-steering unit 218 located in the same column as the fifth beam-steering unit 215 and in a lower row than the fifth beam-steering unit 215 may form a nano-pattern in which the width W increases as it is farther from the center of the beam-steering section 200. Therefore, the steering direction of the eighth beam steering unit 218 may be the same as the direction from the center of the beam steering section 200 toward the eighth beam steering unit 218.

In addition, in the case where the second beam steering unit 212 and the eighth beam steering unit 218 are symmetrically arranged with respect to the center of the beam steering section 200, the steering angles of the second beam steering unit 212 and the eighth beam steering unit 218 may be the same.

The first beam steering unit 211 may be located at the upper left side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the first beam steering unit 211 may form a nano-pattern in which the width W increases as it is farther from the center of the beam steering part 200. Therefore, the manipulation direction of the first beam manipulation unit 211 may be the same as the direction from the center of the beam manipulation section 200 toward the first beam manipulation unit 211.

The third beam steering unit 213 may be located at the upper right side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the third beam steering unit 213 may form a nano-pattern in which the width W increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the third beam steering unit 213 may be the same as the direction from the center of the beam steering section 200 toward the third beam steering unit 213.

The seventh beam steering unit 217 may be located at the lower left side of the fifth beam steering sheet 215. Here, the plurality of nano-pillars 10 included in the seventh beam steering unit 217 may form a nano-pattern in which the width W increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the seventh beam steering unit 217 may be the same as the direction from the center of the beam steering section 200 toward the seventh beam steering unit 217.

The ninth beam steering unit 219 may be located on the lower right side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the ninth beam steering unit 219 may form a nano-pattern in which the width W increases as it moves away from the center of the beam steering section 200. Therefore, the steering direction of the ninth beam steering unit 219 may be the same as the direction from the center of the beam steering section 200 toward the ninth beam steering unit 219.

In addition, the nanopatterns formed by the plurality of nano-pillars 10 included in the beam steering unit 210 at the same distance from the center of the beam steering part 200 may have a correlation with each other.

For example, the first beam steering unit 211 and the third beam steering unit 213 may be spaced apart from the center of the beam steering section 200 by the same distance. Here, the plurality of nano-pillars 10 included in the first beam steering unit 211 may form a first nano-pattern. And, the plurality of nano-pillars 10 included in the third beam-steering unit 213 may form a third nano-pattern.

Here, when the first nanopattern is rotated by a predetermined angle about the center of the beam manipulation part 200, the first nanopattern and the third nanopattern may have the same shape. The predetermined angle may be obtained according to the positions of the first beam steering unit 211 and the third beam steering unit 213 with respect to the center of the beam steering part 200.

In addition, the beam manipulation part 200 of another embodiment may manipulate the laser beam according to the interval P of the nano-pillars 10, i.e., the variation of the number of nano-pillars 10 per unit length.

Fig. 9 is a schematic diagram for explaining a beam steering section of another embodiment.

Referring to fig. 9, the beam manipulation part 200 may include a plurality of beam manipulation units 210 and a plurality of nano-pillars 10. The beam steering unit 210 may include first to ninth beam steering units 211, 212, 213, 214, 215, 216, 217, 218, 219.

The plurality of nano-pillars 10 may form a nano-pattern according to the position of the beam steering unit 210. For example, the plurality of nano-pillars 10 may form a nano-pattern whose interval P decreases as it goes away from the center of the beam-manipulating part 200. Alternatively, the plurality of nano-pillars 10 may form a nano-pattern in which the number of nano-pillars 10 per unit length increases as it goes away from the center of the beam-manipulating part 200. Accordingly, the laser beam emitted from the laser output section 100 may have a shape diverging from the center of the beam manipulation section 200.

Referring to fig. 9, a plurality of nano-pillars 10 may form a nano pattern according to the position of the beam steering unit 210.

For example, the plurality of nano-pillars 10 included in the fifth beam steering unit 215 located at the center portion of the beam steering part 200 may have the same size and be arranged with a predetermined interval therebetween. Therefore, the laser beam manipulated by the fifth beam manipulation unit 215 is not refracted by the nano-pillar 10 configured, and can pass through the nano-pillar 10 as it is.

The fourth beam steering unit 214 is located in the same row as the fifth beam steering unit 215, and may be located in the left column as compared to the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the fourth beam steering unit 214 may form a nano-pattern in which the interval P decreases as it gets farther from the center of the beam steering part 200. Therefore, the steering direction of the fourth beam steering unit 214 may be the same as the direction from the center of the beam steering section 200 toward the fourth beam steering unit 214.

Also, the plurality of nano-pillars 10 included in the sixth beam-steering unit 216, which is located in the same row as the fifth beam-steering unit 215 and in a right column compared to the fifth beam-steering unit 215, may form a nano-pattern in which the interval P decreases as it is farther from the center of the beam-steering section 200. Accordingly, the steering direction of the sixth beam steering unit 216 may be the same as the direction from the center of the beam steering section 200 toward the sixth beam steering unit 216.

The second beam steering unit 212 is located in the same column as the fifth beam steering unit 215, and may be located in an upper row compared to the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the second beam steering unit 212 may form a nano-pattern in which the interval P decreases as it gets farther from the center of the beam steering part 200. Therefore, the steering direction of the second beam steering unit 212 may be the same as the direction from the center of the beam steering section 200 toward the second beam steering unit 212.

Also, the plurality of nano-pillars 10 included in the eighth beam-steering unit 218 located in the same column as the fifth beam-steering unit 215 and in a lower row than the fifth beam-steering unit 215 may form a nano-pattern in which the interval P decreases as it is farther from the center of the beam-steering section 200. Therefore, the steering direction of the eighth beam steering unit 218 may be the same as the direction from the center of the beam steering section 200 toward the eighth beam steering unit 218.

The first beam steering unit 211 may be located at the upper left side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the first beam manipulation unit 211 may form a nano-pattern in which the interval P decreases as it gets farther from the center of the beam manipulation part 200. Therefore, the manipulation direction of the first beam manipulation unit 211 may be the same as the direction from the center of the beam manipulation section 200 toward the first beam manipulation unit 211.

The third beam steering unit 213 may be located at the upper right side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the third beam steering unit 213 may form a nano-pattern in which the interval P decreases as it gets farther from the center of the beam steering part 200. Therefore, the steering direction of the third beam steering unit 213 may be the same as the direction from the center of the beam steering section 200 toward the third beam steering unit 213.

The seventh beam steering unit 217 may be located at the lower left side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the seventh beam steering unit 217 may form a nano-pattern in which the interval P decreases as it gets farther from the center of the beam steering part 200. Therefore, the steering direction of the seventh beam steering unit 217 may be the same as the direction from the center of the beam steering section 200 toward the seventh beam steering unit 217.

The ninth beam steering unit 219 may be located on the lower right side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the ninth beam steering unit 219 may form a nano-pattern in which the interval P decreases as it gets farther from the center of the beam steering section 200. Therefore, the steering direction of the ninth beam steering unit 219 may be the same as the direction from the center of the beam steering section 200 toward the ninth beam steering unit 219.

In addition, the beam manipulation part 200 of still another embodiment may manipulate the laser beam according to the variation of the height H of the nano-pillar 10.

Fig. 10 is a schematic diagram for explaining a beam steering section of still another embodiment.

Referring to fig. 10, the beam manipulation part 200 may include a plurality of beam manipulation units 210 and a plurality of nano-pillars 10. The beam steering unit 210 may include first to ninth beam steering units 211, 212, 213, 214, 215, 216, 217, 218, 219.

The beam steering unit 210 of an embodiment may be configured in a two-dimensional array. For example, the beam steering unit 210 may be in a 3x3 array configuration. The first to ninth beam manipulation units 211, 212, 213, 214, 215, 216, 217, 218, 219 may be arranged in a two-dimensional array along a row direction corresponding to a vertical direction and a column direction corresponding to a horizontal direction.

The plurality of nano-pillars 10 may form a nano-pattern according to the position of the beam steering unit 210. For example, the plurality of nano-pillars 10 may form a nano-pattern whose height H increases as it is away from the center of the beam-manipulating part 200. Accordingly, the laser beam emitted from the laser output section 100 may have a shape diverging from the center of the beam manipulation section 200.

As shown in fig. 10, the first to eighth heights H1, H2, H3, H4, H5, H6, H7, H8 may have values that increase as one goes from the first height H1 toward the eighth height H8.

Referring to fig. 10, a plurality of nano-pillars 10 may form a nano pattern according to the position of the beam steering unit 210.

For example, the plurality of nanopillars 10 included in the fifth beam steering unit 215 positioned at the center of the beam steering unit 200 may have the same size and may be arranged at predetermined intervals. Therefore, the laser beam manipulated by the fifth beam manipulation unit 215 is not refracted by the nano-pillars 10 configured, and can pass through the nano-pillars 10 faithfully.

The fourth beam steering unit 214 is located in the same row as the fifth beam steering unit 215, and may be located in the left column as compared to the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the fourth beam steering unit 214 may form a nano-pattern in which the height H increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the fourth beam steering unit 214 may be the same as the direction from the center of the beam steering section 200 toward the fourth beam steering unit 214.

Also, the plurality of nano-pillars 10 included in the sixth beam-steering unit 216, which is located in the same row as the fifth beam-steering unit 215 and in a right column compared to the fifth beam-steering unit 215, may form a nano-pattern in which the height H increases as it is farther from the center of the beam-steering section 200. Accordingly, the steering direction of the sixth beam steering unit 216 may be the same as the direction from the center of the beam steering section 200 toward the sixth beam steering unit 216.

The second beam steering unit 212 is located in the same column as the fifth beam steering unit 215, and may be located in an upper row compared to the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the second beam steering unit 212 may form a nano-pattern in which the height H increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the second beam steering unit 212 may be the same as the direction from the center of the beam steering section 200 toward the second beam steering unit 212.

Also, the plurality of nano-pillars 10 of the eighth beam steering unit 218, which are located in the same column as the fifth beam steering unit 215 and are located in a lower row than the fifth beam steering unit 215, may form a nano-pattern in which the height H increases as it is away from the center of the beam steering part 200. Therefore, the steering direction of the eighth beam steering unit 218 may be the same as the direction from the center of the beam steering section 200 toward the eighth beam steering unit 218.

The first beam steering unit 211 may be located at the upper left side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the first beam steering unit 211 may form a nano-pattern in which the height H increases as it is farther from the center of the beam steering part 200. Therefore, the manipulation direction of the first beam manipulation unit 211 may be the same as the direction from the center of the beam manipulation section 200 toward the first beam manipulation unit 211.

The third beam steering unit 213 may be located at the upper right side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the third beam steering unit 213 may form a nano-pattern in which the height H increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the third beam steering unit 213 may be the same as the direction from the center of the beam steering section 200 toward the third beam steering unit 213.

The seventh beam steering unit 217 may be located at the lower left side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the seventh beam steering unit 217 may form a nano-pattern in which the height H increases as it is farther from the center of the beam steering part 200. Therefore, the steering direction of the seventh beam steering unit 217 may be the same as the direction from the center of the beam steering section 200 toward the seventh beam steering unit 217.

The ninth beam steering unit 219 may be located on the lower right side of the fifth beam steering unit 215. Here, the plurality of nano-pillars 10 included in the ninth beam steering unit 219 may form a nano-pattern in which the height H increases as it is farther from the center of the beam steering section 200. Therefore, the steering direction of the ninth beam steering unit 219 may be the same as the direction from the center of the beam steering section 200 toward the ninth beam steering unit 219.

Fig. 8 to 10 illustrate nanopatterns formed according to any one of the characteristics of the width W, the interval P, and the height H for convenience of description.

The nanopatterns formed according to the various characteristics are described below.

Fig. 11 is a schematic view for explaining a beam steering section of still another embodiment.

Referring to fig. 11, the beam manipulation part 200 may include a plurality of beam manipulation units 210 and a plurality of nano-pillars 10. The beam steering unit 210 may include first to ninth beam steering units 211, 212, 213, 214, 215, 216, 217, 218, 219.

The plurality of nano-pillars 10 included in the beam steering unit 210 may form a nano-pattern according to the width W and the interval P. Specifically, the plurality of nano-pillars 10 may form a nano pattern according to the width W of the row direction, and the interval P of the column direction.

The plurality of nano-pillars 10 may form a nano-pattern according to the position of the beam steering unit 210.

For example, the plurality of nano-pillars 10 may form a nano-pattern in which the width W of the plurality of nano-pillars 10 increases from the center of the beam-manipulating part 200 toward the position direction of the row to which the beam-manipulating unit 210 including the plurality of nano-pillars 10 belongs.

Also, the plurality of nano-pillars 10 may form nano-patterns in which the intervals P of the plurality of nano-pillars 10 are reduced from the center of the beam steering section 200 toward the position direction of the column to which the beam steering unit 210 including the plurality of nano-pillars 10 belongs. That is, the plurality of nano-pillars 10 may form a nano-pattern in which the number of nano-pillars 10 per unit length increases from the center of the beam-manipulating portion 200 toward the position direction of the column to which the beam-manipulating unit 210 including the plurality of nano-pillars 10 belongs.

For example, the plurality of nano-pillars 10 included in the fifth beam steering unit 215 located at the center portion of the beam steering part 200 may have the same size and be arranged with a predetermined interval therebetween. Therefore, the laser beam manipulated by the fifth beam manipulation unit 215 is not refracted by the nano-pillars 10 configured, and can pass through the nano-pillars 10 faithfully.

The first beam steering unit 211 may be located at the upper left side of the fifth beam steering unit 215.

Here, the plurality of nano-pillars 10 included in the first beam manipulation unit 211 may form a nano-pattern in which the interval P decreases as being away from the center of the beam manipulation part 200 in the column direction.

Also, the plurality of nano-pillars 10 included in the first beam manipulation unit 211 may form a nano-pattern in which the width W increases as being away from the center of the beam manipulation part 200 in the row direction.

Therefore, the manipulation direction of the first beam manipulation unit 211 may be the same as the direction from the center of the beam manipulation section 200 toward the first beam manipulation unit 211.

The third beam steering unit 213 may be located at the upper right side of the fifth beam steering unit 215.

Here, the plurality of nano-pillars 10 included in the third beam steering unit 213 may form a nano-pattern in which the interval P decreases as being away from the center of the beam steering part 200 in the column direction.

Also, the plurality of nano-pillars 10 included in the third beam steering unit 213 may form a nano-pattern in which the width W increases as being away from the center of the beam steering part 200 in the row direction.

Therefore, the steering direction of the third beam steering unit 213 may be the same as the direction from the center of the beam steering section 200 toward the third beam steering unit 213.

The seventh beam steering unit 217 may be located at the lower left side of the fifth beam steering unit 215.

Here, the plurality of nano-pillars 10 included in the seventh beam steering unit 217 may form a nano-pattern in which the interval P decreases as being away from the center of the beam steering part 200 in the column direction.

Also, the plurality of nano-pillars 10 included in the seventh beam steering unit 217 may form a nano-pattern in which the width W increases as being away from the center of the beam steering part 200 in the row direction.

Therefore, the steering direction of the seventh beam steering unit 217 may be the same as the direction from the center of the beam steering section 200 toward the seventh beam steering unit 217.

The ninth beam steering unit 219 may be located on the lower right side of the fifth beam steering unit 215.

Here, the plurality of nano-pillars 10 included in the ninth beam manipulation unit 219 may form a nano-pattern in which the interval P decreases as being away from the center of the beam manipulation part 200 in the column direction.

Also, the plurality of nano-pillars 10 included in the ninth beam manipulation unit 219 may form a nano-pattern in which the width W increases as it moves away from the center of the beam manipulation part 200 in the row direction.

Therefore, the steering direction of the ninth beam steering unit 219 may be the same as the direction from the center of the beam steering section 200 toward the ninth beam steering unit 219.

For example, the first beam steering unit 211 and the third beam steering unit 213 may be spaced apart from the center of the beam steering part 200 by the same distance. Here, the plurality of nano-pillars 10 included in the first beam steering unit 211 may form a first nano-pattern. And, the plurality of nano-pillars 10 included in the third beam-steering unit 213 may form a third nano-pattern.

In addition, unlike fig. 11, the plurality of nano-pillars 10 may form a nano pattern according to the interval P in the row direction, the width W in the column direction.

Fig. 12 is a schematic view for explaining a beam steering section of still another embodiment.

Referring to fig. 12, the beam manipulation part 200 may include a plurality of beam manipulation units 210 and a plurality of nano-pillars 10. The beam steering unit 210 may include first to ninth beam steering units 211, 212, 213, 214, 215, 216, 217, 218, 219.

The plurality of nano-pillars 10 included in the beam steering unit 210 may form a nano-pattern according to the width W and the height H. In particular, the plurality of nano-pillars 10 may form a nano pattern according to the width W of the row direction and the height H of the column direction.

Also, the plurality of nano-pillars 10 may form a nano-pattern in which the height H of the plurality of nano-pillars 10 increases from the center of the beam-manipulating part 200 toward the position direction of the column to which the beam-manipulating unit 210 including the plurality of nano-pillars 10 belongs.

Here, the plurality of nano-pillars 10 included in the first beam manipulation unit 211 may form a nano-pattern in which the height H increases as being far from the center of the beam manipulation part 200 in the column direction.

Here, the plurality of nano-pillars 10 included in the third beam steering unit 213 may form a nano-pattern in which the height H increases as being far from the center of the beam steering part 200 in the column direction.

Here, the plurality of nano-pillars 10 included in the seventh beam steering unit 217 may form a nano-pattern in which the height H increases as being away from the center of the beam steering part 200 in the column direction.

Here, the plurality of nano-pillars 10 included in the ninth beam steering unit 219 may form a nano-pattern in which the height H increases as it moves away from the center of the beam steering section 200 in the column direction.

In addition, unlike fig. 12, the plurality of nano-pillars 10 may form a nano pattern according to the height H of the row direction, the width W of the column direction.

Fig. 13 is a schematic view for explaining a beam steering section of still another embodiment.

Referring to fig. 13, the beam manipulation part 200 may include a plurality of beam manipulation units 210 and a plurality of nano-pillars 10. The beam steering unit 210 may include first to ninth beam steering units 211, 212, 213, 214, 215, 216, 217, 218, 219.

The plurality of nano-pillars 10 included in the beam steering unit 210 may form a nano-pattern according to the interval P and the height H. In particular, the plurality of nano-pillars 10 may form a nano pattern according to the height H of the row direction, the interval of the column direction.

For example, the plurality of nano-pillars 10 may form a nano-pattern in which the height H of the plurality of nano-pillars 10 increases from the center of the beam-manipulating part 200 toward the position direction of the row to which the beam-manipulating unit 210 including the plurality of nano-pillars 10 belongs.

Also, the plurality of nano-pillars 10 may form nano-patterns in which the intervals P of the plurality of nano-pillars 10 are reduced from the center of the beam steering section 200 toward the position direction of the column to which the beam steering unit 210 including the plurality of nano-pillars 10 belongs.

Also, the plurality of nano-pillars 10 included in the eighth beam-steering unit 218 located in the same column as the fifth beam-steering unit 215 and in a lower row than the fifth beam-steering unit 215 may form a nano-pattern in which the height H increases as it is farther from the center of the beam-steering section 200. Therefore, the steering direction of the eighth beam steering unit 218 may be the same as the direction from the center of the beam steering section 200 toward the eighth beam steering unit 218.

Also, the plurality of nano-pillars 10 included in the first beam manipulation unit 211 may form a nano-pattern in which the height H increases as being away from the center of the beam manipulation part 200 in the row direction.

Also, the plurality of nano-pillars 10 included in the third beam-manipulating unit 213 may form a nano-pattern in which the height H increases as being away from the center of the beam-manipulating part 200 in the row direction.

Also, the plurality of nano-pillars 10 included in the seventh beam steering unit 217 may form a nano-pattern in which the height H increases as being away from the center of the beam steering part 200 in the row direction.

Also, the plurality of nano-pillars 10 included in the ninth beam manipulation unit 219 may form a nano-pattern in which the height H increases as being away from the center of the beam manipulation part 200 in the row direction.

In addition, unlike fig. 13, the plurality of nano-pillars 10 may form a nano pattern according to the interval P in the row direction, the height H in the column direction.

Fig. 14 is an upper view for explaining a beam steering section of an embodiment.

Referring to fig. 14, the beam steering part 200 of an embodiment may include a plurality of beam steering units 210 and a plurality of nano-pillars 10. The beam steering unit 210 may include first to ninth beam steering units 211, 212, 213, 214, 215, 216, 217, 218, 219.

The beam steering unit 210 of an embodiment may form a two-dimensional array configuration. For example, the beam steering unit 210 may constitute a 3x3 array configuration. The first to ninth beam manipulation units 211, 212, 213, 214, 215, 216, 217, 218, 219 may be arranged in a two-dimensional array along a row direction corresponding to a vertical direction and a column direction corresponding to a horizontal direction.

A plurality of laser output parts 100 may be disposed at a lower portion of at least any one of the plurality of beam steering units 210.

For example, the lower portion of the third beam steering unit 213 may be configured with the first to fourth laser output sections 101, 102, 103, 104.

The first to fourth laser output sections 101, 102, 103, 104 can be individually controlled.

The characteristics of the laser beam emitted from the first laser output section 101 may be different from those of the laser beam emitted from the second laser output section 102.

As an example, the wavelength of the laser beam emitted from the first laser output unit 101 may be different from the wavelength of the laser beam emitted from the second laser output unit 102.

As another example, the intensity of the laser beam emitted from the first laser output unit 101 may be different from the intensity of the laser beam emitted from the second laser output unit 102.

As another example, the laser beam emission time points of the first laser output unit 101 and the second laser output unit 102 may be different. Specifically, during the time that the first laser output section 101 emits the laser beam, the second laser output section 102 may be in an OFF (OFF) state.

In addition, the plurality of nano-pillars 10 included in the beam steering unit 210 may form a plurality of nano-patterns. For example, the plurality of nanopatterns may include a first nanopattern A1 and a second nanopattern A2.

At least any one of the plurality of nanopatterns may be repeatedly formed on the beam steering unit 210. For example, the plurality of nano-pillars 10 included in the sixth beam steering unit 216 of fig. 14 may repeatedly form the first nano-pattern A1. In particular, the method comprises the steps of,

the first nanopattern A1 may have a pattern in which the width W of the nanopillar 10 repeatedly increases.

The second nanopattern A2 may have a different morphology compared to the first nanopattern A1. For example, the first nanopattern A1 may have a morphology in which the width W of the nanopillar 10 increases as it is distant from the center of the beam manipulation part 200, and the nanopillar has a predetermined width W according to the row direction position. On the contrary, the second nanopattern A2 may have a form in which the width W of the nanopillar 10 increases as it is distant from the center of the beam manipulation part 200, and the width W of the nanopillar 10 varies according to the row direction position.

In addition, laser beams of various shapes can be formed by adjusting ON/OFF (ON/OFF) of each laser output section. For example, the shape of the laser beam emitted from the laser output apparatus 1000 may be changed according to the on/off states of the first laser output section 101 and the second laser output section 102.

The laser beams of various shapes can be formed by adjusting on/off of the plurality of light source sections included in the laser output section. For example, the shape of the laser beam emitted from the third laser output unit 103 and passing through the nanopillar 10 may be changed according to on/off of the first light source unit and the second light source unit included in the third laser output unit 103.

The laser beams having various shapes can be formed by adjusting the intensity of the laser beam emitted from each laser output section. For example, the shape of the laser beam emitted from the laser output apparatus 1000 may change as the intensity of the laser beam emitted from the first laser output unit 101 and the second laser output unit 102 is adjusted.

The laser beams having various shapes can be formed by adjusting the intensities of the laser beams emitted from the plurality of light source units included in the laser output unit. For example, the shape of the laser beam emitted from the third laser output unit 103 and passing through the nanopillar 10 may be changed as the intensities of the laser beams emitted from the first and second light source units are adjusted.

In addition, the case where the nanopatterns are formed in units of each beam steering unit 210 has been described above, and the nanopatterns may be formed in all the beam steering sections 200 regardless of the boundaries of the plurality of beam steering units 210. Accordingly, the nanopillar 10 may be disposed on the boundary line of two adjacent beam steering units 210.

The number of nano-pillars 10 disposed on each beam steering unit 210 may be different.

The description has been made above by taking, as an example, the case where the beam steering unit 210 is configured as a 3×3 array, that is, as an NxN array for convenience of description, but the beam steering unit 210 may be configured as an NxM array (where N is different from M).

Fig. 15 is a perspective view showing a laser beam emitted from the laser output device of an embodiment.

Referring to fig. 15, the laser output device 1000 may include a laser output part 100, a beam manipulation part 200, and a plurality of nano-pillars 10. In addition, at least one of the plurality of nano-pillars 10 shown in fig. 15 may include a plurality of nano-structures. For example, the nanopillar 10 may comprise at least one or more nanostructures having an irregular shape.

The laser output device 1000 may project a laser beam toward an object.

The laser output apparatus 1000 can generate a plurality of scanning points distributed in the h direction as the horizontal direction and the v direction as the vertical direction. The laser output device 1000 may have a Field Of View (FOV) formed by the plurality Of scan points. For example, the laser output device 1000 may have a field of view (FOV) in the range of-N degrees to N degrees with respect to the h-direction. Also, the laser output device 1000 may have a field of view (FOV) ranging from-M degrees to M degrees with respect to the v direction. In particular, the laser output device 1000 may have a field of view (FOV) in the range of-60 degrees to 60 degrees relative to the h-direction, and-15 degrees to 15 degrees relative to the v-direction.

The N may be greater than the M. That is, the laser output device 1000 may have a wider field of view (FOV) with respect to the h direction than with respect to the v direction.

The above-described contents of the laser output section 100 are applicable to the laser output section 100 as they are, and thus, a detailed description thereof is omitted.

The beam steering section 200 may include a plurality of nano-pillars 10.

The beam manipulation part 200 may include the plurality of beam manipulation units. The plurality of beam steering units may be arranged in a two-dimensional array configuration. The plurality of beam steering units may be arranged in the two-dimensional array along a row direction corresponding to the vertical direction and a column direction corresponding to the horizontal direction.

The plurality of beam steering units may include a plurality of nano-pillars 10, respectively.

The plurality of beam steering units may guide the laser beams emitted from the laser output part 100 so as to correspond to the plurality of scanning points. Here, the plurality of beam steering units may guide the laser beam using a plurality of nano-pillars 10.

In addition, one surface included in a region for manipulating the laser beam emitted from the laser output unit 100 may be defined as a beam manipulation surface S1. Specifically, the beam steering surface S1 may represent a cross section of the beam steering section 200.

A surface included in the area where the laser beam emitted from the laser output apparatus 1000 is projected onto the object may be defined as a beam projection surface S2.

The beam steering surface S1 may be parallel to the beam projection surface S2.

As described above, the plurality of nano-pillars 10 included in the beam manipulation part 200 may form nano-patterns according to the positions of the beam manipulation units. That is, the plurality of nano-pillars 10 may form a nano pattern according to a position on the beam-manipulating surface S1.

Alternatively, the plurality of nano-pillars 10 may form nano patterns according to a manipulation direction in which the plurality of manipulation units guide the laser beam emitted from the laser output part 100. That is, the plurality of nano-pillars 10 may form a nano pattern according to positions on the beam projection surface S2.

The nanopatterns formed according to the positions on the beam steering surface S1 and the beam projection surface S2 are described below.

Fig. 16 is a schematic diagram showing a beam steering section 200 of an embodiment.

Specifically, fig. 16 is a schematic diagram for explaining a nanopattern formed according to a position on the beam steering surface S1.

The beam manipulation section 200 may include first to fourth beam manipulation units 211, 212, 213, 214. The first to fourth beam manipulation units 211, 212, 213, 214 may include a plurality of nano-pillars forming a nano-pattern.

The first beam manipulation unit 211 may be arranged at the center of the beam manipulation part 200.

The h-coordinate of the second beam steering unit 212 may be greater than the h-coordinate of the first beam steering unit 211. Herein, included in

The plurality of nano-pillars of the second beam-steering unit 212 may form a nano-pattern in which an increase in the first characteristic with respect to at least one of the width W, the height H, and the number per unit length of the nano-pillars is repeated from the center of the beam-steering section 200 toward the second beam-steering unit 212.

The v-coordinate of the third beam steering unit 213 may be greater than that of the first beam steering unit 211. Here, the plurality of nano-pillars included in the third beam steering unit 213 may form a nano-pattern in which an increase in characteristics with respect to at least one of the width W, the height H, and the number per unit length of the nano-pillars is repeated from the center of the beam steering section 200 toward the third beam steering unit 213.

In addition, the farther the distance from the center of the beam manipulation part 200 to the beam manipulation unit is, the larger the rate of increase in the characteristics of the plurality of nano-pillars included in the beam manipulation unit may be.

For example, the h-coordinate of the fourth beam steering unit 214 may be greater than the h-coordinate of the second beam steering unit 212. Accordingly, the distance from the center of the beam manipulation part 200 to the fourth beam manipulation unit 214 may be greater than the distance from the center of the beam manipulation part 200 to the second beam manipulation unit 212.

Here, the plurality of nano-pillars included in the fourth beam steering unit 214 may form a nano-pattern in which an increase in the second characteristic with respect to at least one of the width W, the height H, and the number per unit length of the nano-pillars is repeated from the center of the beam steering section 200 toward the fourth beam steering unit 214. The rate of increase of the characteristic may be greater than the rate of increase of the first characteristic.

Fig. 17 is a schematic diagram showing a beam projection surface S2 of an embodiment.

Specifically, fig. 17 is a schematic diagram for explaining a nanopattern formed according to a position on the beam projection surface S2.

The beam projection surface S2 can be expressed as a two-dimensional array pattern based on the h direction corresponding to the horizontal direction and the v direction corresponding to the vertical direction.

The first projection unit C1 may be located at the center of the beam projection surface S2. Here, the first laser beam projected to the first projection unit C1 may be a laser beam manipulated by the first beam manipulation unit. The plurality of nano-pillars included in the first beam-steering unit may constitute a nano-pattern having the same first characteristics with respect to at least one of a width W, a height H, and a number per unit length of the nano-pillars.

The h-coordinate of the second projection unit C2 may be greater than the h-coordinate of the first projection unit C1. Here, the second laser beam projected to the second projection unit C2 may be a laser beam manipulated by the second beam manipulation unit. The plurality of nano-pillars included in the second beam-steering unit may form a nano-pattern in which a second characteristic with respect to at least one of a width W, a height H, and a number per unit length of the nano-pillars repeatedly increases along a direction of an H-axis component of a steering direction of the second beam-steering unit.

The v-coordinate of the third projection unit C3 may be greater than that of the first projection unit C1. Here, the third laser beam projected to the third projection unit C3 may be a laser beam manipulated by the third beam manipulation unit. The plurality of nano-pillars included in the third beam-steering unit may form a nano-pattern in which a third characteristic with respect to at least one of a width W, a height H, and a number per unit length of the nano-pillars repeatedly increases along a direction of a v-axis component of a steering direction of the third beam-steering unit.

In addition, the farther the position of the projection unit is from the center of the beam projection surface S2, the larger the rate of increase in the characteristics of the plurality of nano-pillars contained in the beam steering unit that steers the laser beam projected to the projection unit may be.

For example, the fourth projection unit C4 may have a larger h-coordinate than the first projection unit C1, and be located at a position far from the center of the beam projection surface S2 than the second projection unit C2. The fourth laser beam projected to the fourth projection unit C4 may be a laser beam manipulated by a fourth beam manipulation unit. The plurality of nano-pillars included in the fourth beam-steering unit may form a nano-pattern in which a fourth characteristic with respect to at least one of a width W, a height H, and a number per unit length of the nano-pillars repeatedly increases along a direction of an H-axis component of a steering direction of the fourth beam-steering unit.

Here, the rate of increase and decrease of the fourth characteristic may be greater than the rate of increase and decrease of the second characteristic.

The change in the rate of increase and decrease of the characteristic can occur similarly even when the magnitude of the v-axis component in the steering direction is changed.

In addition, the position on the beam steering surface S1 may have a correlation with the position on the beam projection surface S2.

For example, the position on the beam steering surface S1 may correspond to the position on the beam projection surface S2.

Specifically, the first to fourth projection units C1, C2, C3, C4 may correspond to the first to fourth beam manipulation units 211, 212, 213, 214 of fig. 16, respectively. That is, the first laser beam irradiated to the first projection unit C1 may be a laser beam manipulated by the first beam manipulation unit 211. The same applies to the second to fourth projection units C2, C3, and C4.

Alternatively, the position on the beam steering surface S1 may not correspond to the position on the beam projection surface S2.

Specifically, or, the first to fourth projection units C1, C2, C3, C4 may not correspond to the first to fourth beam manipulation units 211, 212, 213, 214, respectively. For example, the third laser beam irradiated to the third projection unit C3 may be a laser beam manipulated by the second beam manipulation unit 212.

In addition, referring to fig. 18, the size of each of the plurality of nano-pillars 10 included in the beam manipulation part 200 of the laser output device 1000 may be the same. For example, the width W and the height H of each of the plurality of nanopillars 10 may be the same. Alternatively, the intervals P between the plurality of nano-pillars 10 may be the same.

Here, the steering angle θ of the laser beam may be 0 degrees. That is, the first angle, which is the emission angle of the laser beam emitted from the laser output unit 100, may be the same as the second angle, which is the irradiation angle of the laser beam emitted from the laser output unit 100 and then passed through the beam steering unit 200.

The laser output apparatus 1000 in which the beam steering section 200 is formed of a single layer has been described above.

The laser output apparatus 1000 in which the beam steering section 200 is constituted by a plurality of layers will be described below.

Fig. 19 is a perspective view showing a laser output device of an embodiment.

Referring to fig. 19, the laser output device 1000 may include a laser output part 100 and a beam manipulation part 200.

In addition, the laser output device 1000 may operate the same as or similar to the laser output device 1000 illustrated in fig. 1 to 18. Therefore, a specific description of the portions common to them will be omitted, and the description will be focused on the points of distinction.

The laser output apparatus 1000 can generate laser beams of various shapes from the laser beams emitted from the laser output section 100 by the beam steering section 200. For example, the laser output device 1000 may generate a laser beam in a shape diverged from its center.

The laser output section 100 may operate the same as or similar to the laser output section 100 illustrated in fig. 1 to 18. For example, the laser output section 100 may include a plurality of Vertical Cavity Surface Emitting Laser (VCSEL) elements arranged in an array configuration and emitting laser beams.

The beam steering section 200 steers the laser beam emitted from the laser output section 100. The beam steering section 200 may generate laser beams of various shapes by steering the emitted laser beams.

For example, the beam steering section 200 may generate a laser beam having an h direction as a horizontal direction and a v direction as a vertical direction from the emitted laser beam.

The beam steering section 200 may include a first beam steering section 201 and a second beam steering section 202. The first beam steering part 201 and the second beam steering part 202 may include a plurality of nano-pillars 10, respectively.

The first beam steering section 201 can steer the laser beam emitted from the laser output section 100. The plurality of nano-pillars 10 included in the first beam manipulation part 201 may form a nano-pattern. The first beam manipulation part 201 may manipulate the laser beam emitted from the laser output part 100 according to the nano pattern.

The laser beam manipulated by the first beam manipulation section 201 can be projected to the second beam manipulation section 202 side.

The second beam steering section 202 can obtain the laser beam emitted from the first beam steering section 201. The second beam steering section 202 can steer the obtained laser beam.

The plurality of nano-pillars 10 included in the second beam steering section 202 may form a nano-pattern. The second beam manipulation part 202 may manipulate the obtained laser beam according to the nanopattern.

The laser beam manipulated by the second beam manipulation section 202 may be projected toward an object.

The first beam steering section 201 may be disposed at an upper portion of the laser output section 100. Specifically, the first beam steering unit 201 may be disposed on the side of the emission surface from which the laser beam is emitted from the laser output unit 100.

The second beam steering section 202 may be disposed at an upper portion of the first beam steering section 201.

Accordingly, the laser beam emitted from the laser output section 100 can sequentially pass through the first beam steering section 201 and the second beam steering section 202.

Fig. 20 is an exploded perspective view of a laser output device of an embodiment.

Referring to fig. 20, the laser output device 1000 may include a laser output part 100 and a beam manipulation part 200. The beam steering section 200 may include a first beam steering section 201 and a second beam steering section 202.

The laser output apparatus 1000 can generate a plurality of scanning points distributed in the horizontal direction and the vertical direction. The laser output device 1000 may have a field of view formed by the horizontal direction and the vertical direction.

The laser output unit 100 is disposed below the first beam steering unit 201, and irradiates the first beam steering unit 201 with a laser beam. In addition, the laser output section 100 may operate the same as or similar to the laser output section 100 described in fig. 1 to 18, and thus a detailed description thereof will be omitted.

The first beam steering unit 201 is disposed above the laser output unit 100, and can obtain the laser beam emitted from the laser output unit 100. The first beam manipulation part 201 may generate laser beams of various shapes by manipulating the obtained laser beams.

Specifically, the first beam manipulation part 201 may manipulate the obtained laser beams using a plurality of nano-pillars 10. The first beam steering portion 201 may include a metasurface (metasurface).

The first beam manipulation part 201 may manipulate the laser beam in the h direction corresponding to the horizontal direction and the v direction corresponding to the vertical direction.

For example, the first beam manipulation part 201 may generate a laser beam of a shape diverged along the v direction. The vertical manipulation angle θv of the first beam manipulation part 201 may have a range of-15 ° to 15 °. Here, the steering angle may represent an angle in a clockwise direction from an imaginary reference line perpendicular to the emission surface of the first beam steering section 201. That is, the manipulation direction having a positive manipulation angle is located on the right side of the reference line, and the manipulation direction having a negative manipulation angle may be located on the left side of the reference line.

Here, the plurality of nano-pillars 10 included in the first beam steering portion 201 may form a sub-wavelength pattern (subwavelength pattern) in which characteristics of at least one of a width W, a height H, and a number per unit length repeatedly increase along the v direction.

The second beam steering section 202 is disposed above the first beam steering section 201, and can obtain the laser beam steered by the first beam steering section 201. The second beam steering section 202 can generate laser beams of various shapes by steering the laser beams obtained from the first beam steering section 201.

Specifically, the second beam manipulation section 202 may manipulate the obtained laser beam using a plurality of nano-pillars 10. The second beam steering portion 202 may include a metasurface (metasurface).

The second beam steering section 202 may steer the laser beam in the h direction corresponding to the horizontal direction and in the v direction corresponding to the vertical direction.

For example, the second beam steering section 202 may generate a laser beam of a shape diverging along the h direction. The horizontal steering angle θh of the second beam steering section 202 may have a range of-60 ° to 60 °.

Here, the plurality of nano-pillars 10 included in the second beam steering section 202 may form a sub-wavelength pattern (subwavelength pattern) in which characteristics of at least one of a width W, a height H, and a number per unit length repeatedly increase along the H direction.

In addition, the first beam manipulation part 201 and the second beam manipulation part 202 may have the plurality of beam manipulation units including the plurality of nano-pillars 10, respectively. The plurality of beam steering units may be arranged in an array configuration along a v-axis or an h-axis.

Here, the arrangement direction of the plurality of beam steering units included in the first beam steering section 201 and the arrangement direction of the plurality of beam steering units included in the second beam steering section 202 may be different.

For example, the plurality of beam steering units included in the first beam steering part 201 may be arranged in an array form along the v-axis. On the contrary, the plurality of beam steering units included in the second beam steering part 202 may be arranged in an array form along the h-axis.

In addition, fig. 20 appears that a part of the laser beam manipulated by the first beam manipulation section 201 is projected to the outside of the second beam manipulation section 202, but this is for convenience of explanation only, and the part is not actually emitted to the outside of the second beam manipulation section 202.

Fig. 21 to 23 are exploded perspective views of the laser output device of the various embodiments viewed from the side.

Specifically, fig. 21 and 22 are exploded perspective views of the laser output device viewed from the h axis. Fig. 23 is an exploded perspective view of the laser output device viewed from the v-axis.

Referring to fig. 21, the laser output device 1000 may include a laser output part 100 and a beam manipulation part 200. The beam steering section 200 may include a first beam steering section 201 and a second beam steering section 202. The first beam steering part 201 and the second beam steering part 202 may include a plurality of nano-pillars 10, respectively.

The laser output device 1000 may include a support 300 that supports the beam manipulation part 200.

The support 300 may support the nano-pillars 10 included in the beam manipulation part 200. Alternatively, a metasurface comprising a plurality of nanopillars 10 may be supported. Thus, a plurality of nano-pillars 10 may be deposited on the support 300.

The light transmittance of the supporting part 300 may be at least 90% or more.

The support 300 may be composed of various substances. For example, the support 300 may include glass, metas, and the like.

The support 300 may be in the form of a flat plate.

The support 300 may include a first support 301 and a second support 302.

The first support 301 is disposed between the laser output unit 100 and the first beam steering unit 201, and can support the first beam steering unit 201.

The second support 302 is disposed between the first beam steering part 201 and the second beam steering part 202, and can support the second beam steering part 202.

The first support 301 and the second support 302 may be composed of different substances.

The refractive index of the first support 301 may be smaller than that of the nano-pillars 10 included in the first beam manipulation part 201.

The laser output section 100 may include a plurality of laser output sections 101, 102, 103 arranged in a one-dimensional array along the v-direction.

The plurality of laser output units 101, 102, 103 can emit laser beams to the beam steering unit 200 side, respectively.

The first beam steering section 201 can obtain the laser beam emitted from the laser output section 100.

The first beam manipulation part 201 may manipulate the obtained laser beam using a plurality of nano-pillars 10.

The first beam steering section 201 may generate a laser beam having a shape diverging in the v-axis direction. For example, the vertical steering angle θv of the first beam steering section 201 may have a range of-15 ° to 15 °.

Here, the plurality of nano-pillars 10 included in the first beam manipulation part 201 may form a sub-wavelength pattern (subwavelength pattern) whose width W increases along the v-axis.

Specifically, the plurality of nano-pillars 10 included in the first beam manipulation part 201 may form a nano-pattern whose width W increases from the center of the first beam manipulation part 201 in a direction away along the v-axis.

In addition, the first beam manipulation part 201 may include a first beam manipulation unit 2011, a second beam manipulation unit 2012, and a third beam manipulation unit 2013. The plurality of nano-pillars 10 respectively included in the plurality of beam steering units 2011, 2012, 2013 may form nano-patterns according to positions of the plurality of beam steering units 2011, 2012, 2013.

For example, the plurality of nano-pillars 10 included in the second beam steering unit 2012 located at the center of the first beam steering part 201 may form a nano-pattern having uniform characteristics with respect to at least one of the width W, the height H, and the number per unit length. Thus, the first and second substrates are bonded together,

the steering angle of the second beam steering unit 2012 may become 0 degrees.

Here, the plurality of nano-pillars 10 included in the first beam manipulation unit 2011 located at the left side of the second beam manipulation unit 2012 may form a nano-pattern in which characteristics regarding at least one of the width W, the height H, and the number per unit length of the nano-pillars 10 increase in a direction from the center of the first beam manipulation part 201 to the first beam manipulation unit 2011. Therefore, the vertical manipulation angle θ of the first beam manipulation unit 2011 may have a negative value.

Also, the plurality of nano-pillars 10 included in the third beam-steering unit 2013 located on the right side of the second beam-steering unit 2012 may form a nano-pattern in which characteristics with respect to at least one of the width W, the height H, and the number per unit length of the nano-pillars 10 increase in a direction from the center of the first beam-steering part 201 to the third beam-steering unit 2013. Therefore, the vertical steering angle θv of the third beam steering unit 2013 may have a positive value.

On the contrary, the plurality of nano-pillars 10 may form a nano-pattern in which the characteristics decrease in a direction from the center of the first beam manipulation part 201 to each of the beam manipulation units 2011, 2013.

Referring to fig. 22, the plurality of nano-pillars 10 included in the second beam manipulation unit 2012 located at the center of the first beam manipulation part 201 may form a nano-pattern having uniform characteristics with respect to at least one of a width W, a height H, and a number per unit length. Accordingly, the steering angle of the second beam steering unit 2012 may become 0 degrees.

Here, the plurality of nano-pillars 10 included in the first beam manipulation unit 2011 located at the left side of the second beam manipulation unit 2012 may form a nano-pattern in which characteristics regarding at least one of the width W, the height H, and the number per unit length of the nano-pillars 10 decrease in a direction from the center of the first beam manipulation part 201 to the first beam manipulation unit 2011. Therefore, the vertical steering angle θv of the first beam steering unit 2011 may have a positive value.

Also, the plurality of nano-pillars 10 included in the third beam-steering unit 2013 located on the right side of the second beam-steering unit 2012 may form a nano-pattern in which characteristics regarding at least one of the width W, the height H, and the number per unit length of the nano-pillars 10 decrease in a direction from the center of the first beam-steering part 201 to the third beam-steering unit 2013. Therefore, the vertical steering angle θv of the third beam steering unit 2013 may have a negative value.

The second beam steering section 202 can obtain the laser beam steered by the first beam steering section 201.

The second beam steering section 202 may include a plurality of beam steering units 2021, 2022, 2023.

The second beam steering section 202 may steer the obtained laser beam using a plurality of nano-pillars 10.

As shown in fig. 23, the second beam steering section 202 may generate a laser beam having a shape diverging in the h-axis direction. For example, the horizontal steering angle θh of the second beam steering section 202 may have a range of-60 ° to 60 °.

Here, the plurality of nano-pillars 10 included in the second beam manipulation part 202 may form a sub-wavelength pattern (subwavelength pattern) whose width W increases along the h-axis.

Specifically, the plurality of nano-pillars 10 included in the second beam steering portion 202 may form a nano-pattern whose width W increases in a direction away from the center of the second beam steering portion 202 along the h-axis.

Also, the plurality of nano-pillars 10 included in the second beam steering section 202 may form nano-patterns according to the positions of the plurality of beam steering units 2021, 2022, 2023.

In addition, the vertical manipulation angle θv of fig. 21 may be smaller than the horizontal manipulation angle θh of fig. 23. Accordingly, the horizontal extent of the field of view (FOV) of the laser output device 1000 may be greater than the vertical extent of the field of view (FOV).

In addition, the steering performance of the second beam steering portion 202 may vary with the angle of incidence of the laser beam incident on the second beam steering portion 202. Specifically, the closer the incident angle of the laser beam is to 90 degrees, the higher the steering performance of the second beam steering section 202 can be. Here, the incident angle may represent an angle between the second supporting part 302 and the incident laser beam.

In other words, the steering performance of the second beam steering section 202 may be correlated with the steering angle of the first beam steering section 201. Specifically, the smaller the steering angle of the first beam steering portion 201, the higher the steering performance of the second beam steering portion 202 can be.

Accordingly, the first steering angle of the first beam steering portion 201 may be smaller than the second steering angle of the second beam steering portion 202. That is, the first beam steering section 201 steers the laser beam in the vertical direction in which the steering angle is relatively small, and the second beam steering section 202 steers the laser beam in the horizontal direction in which the steering angle is relatively large.

Thus, the drivability of the laser output device 1000 can be improved.

Fig. 21 to 23 illustrate the nanopattern formed based on the change in the width W of the nanopillar 10, but the plurality of nanopillars 10 included in the beam steering unit 200 may form the nanopattern according to the change in the height H and the number per unit length. This can be fully understood in accordance with the principles illustrated in fig. 2-7.

In addition, the steering directions of the first beam steering section 201 and the second beam steering section 202 are interchangeable. That is, the first beam manipulation part 201 may manipulate the laser beam along the h direction, and the second beam manipulation part 202 may manipulate the laser beam along the v direction.

Fig. 23 is an exploded perspective view of a laser output device of another embodiment.

Referring to fig. 23, the laser output device 1000 may include a laser output part 100 and a beam manipulation part 200. The beam steering section 200 may include a first beam steering section 201 and a second beam steering section 202.

The laser output apparatus 1000 is different from the laser output apparatus 1000 of fig. 20 in the steering direction of the first beam steering unit 201 and the second beam steering unit 202, and the other operation principles may be the same. Therefore, the following description will be focused on points that are compared with fig. 20.

The first beam manipulation part 201 may form a laser beam of a shape diverged along the h direction. The horizontal steering angle θh of the first beam steering section 201 may have a range of-60 ° to 60 °.

Here, the plurality of nano-pillars 10 included in the first beam steering portion 201 may form a sub-wavelength pattern (subwavelength pattern) in which characteristics of at least one of a width W, a height H, and a number per unit length repeatedly increase along the H direction.

The second beam steering section 202 is disposed above the first beam steering section 201, and can obtain the laser beam steered by the first beam steering section 201. The second beam steering section 202 can generate laser beams of various shapes by operating the laser beam obtained from the first beam steering section 201.

For example, the second beam steering section 202 may generate a laser beam of a shape diverging along the v-direction. The vertical steering angle θv of the second beam steering section 202 may have a range of-15 ° to 15 °.

Here, the plurality of nano-pillars 10 included in the second beam steering section 202 may form a sub-wavelength pattern (subwavelength pattern) in which at least one characteristic of the width W, the height H, and the number per unit length repeatedly increases along the H direction.

In addition, fig. 24 appears that a part of the laser beam manipulated by the first beam manipulation section 201 is projected to the outside of the second beam manipulation section 202, but this is for convenience of explanation only, and the part is not actually projected to the outside of the second beam manipulation section 202.

Fig. 25 is an exploded perspective view of a laser output device of yet another embodiment.

Referring to fig. 25, the laser output device 1000 may include a laser output part 100 and a beam manipulation part 200. The beam steering section 200 may include a first beam steering section 201 and a second beam steering section 202.

The laser output apparatus 1000 is different from the laser output apparatus 1000 of fig. 20 in terms of steering direction and angle of the first beam steering unit 201 and the second beam steering unit 202, and the remaining operation principles may be the same. Therefore, the following description will be focused on points that are contrasted with fig. 20.

The first beam steering section 201 may generate a laser beam having a shape divergent along the h direction and the v direction. Here the number of the elements to be processed is,

the horizontal steering angle θh of the first beam steering section 201 may have a range of-20 ° to 20 °. Also, the vertical manipulation angle θv of the first beam manipulation part 201 may have a range of-5 ° to 5 °.

The plurality of nanopillars 10 included in the first beam steering section 201 may form a sub-wavelength pattern (subwavelength pattern) in which at least one of the width W, the height H, and the number per unit length repeatedly increases along the v direction.

The second beam steering section 202 may generate a laser beam having a shape divergent along the v-direction and the h-direction.

For example, the second beam steering section 202 may steer the laser beam steered by the first beam steering section 201 by-10 ° to 10 ° with respect to the h direction. Accordingly, the laser beam manipulated by the second beam manipulation section 202 can be emitted at a manipulation angle in the range of-15 ° to 15 ° in which the manipulation angle of the first beam manipulation section 201 and the manipulation angle of the second beam manipulation section 202 are added.

And, the second beam steering section 202 may steer the laser beam steered by the first beam steering section 201 by-40 ° to 40 ° with respect to the v direction. Accordingly, the laser beam manipulated by the second beam manipulation section 202 can be emitted at a manipulation angle in the range of-60 ° to 60 ° in which the manipulation angle of the first beam manipulation section 201 and the manipulation angle of the second beam manipulation section 202 are added.

The plurality of nano-pillars 10 included in the second beam manipulation part 202 may form a sub-wavelength pattern (subwavelength pattern) in which characteristics of at least one of a width W, a height H, and a number per unit length repeatedly increase along the H direction.

The plurality of nanopillars 10 included in the second beam steering section 202 may form a sub-wavelength pattern (subwavelength pattern) in which at least one characteristic of the width W, the height H, and the number per unit length repeatedly increases along the v direction.

In fig. 25, it is assumed that a part of the laser beam manipulated by the first beam manipulation unit 201 is emitted to the outside of the second beam manipulation unit 202, but this is only for convenience of explanation, and the part is not emitted to the outside of the second beam manipulation unit 202 in practice.

The first beam steering portion 201 and the second beam steering portion 202 may be different in size. For example, the h-axis directional cross-sectional area of the second beam steering portion 202 may be larger than the h-axis directional cross-sectional area of the first beam steering portion 201.

Fig. 26 is an exploded perspective view of a laser output device of yet another embodiment.

Referring to fig. 26, the laser output device 1000 may include a laser output part 100 and a beam manipulation part 200. The beam steering section 200 may include a first beam steering section 201 and a second beam steering section 202.

The laser output apparatus 1000 is different from the laser output apparatus 1000 of fig. 25 in the size relationship between the first beam steering section 201 and the second beam steering section 202, and the other operation principles may be the same. Therefore, the following description will be focused on points that are compared with fig. 25.

Fig. 27 and 28 are exploded perspective views of the laser output device of fig. 26 viewed from the side. Specifically, fig. 27 is an exploded perspective view of the laser output device of fig. 26 viewed from the h-axis direction. Fig. 28 is an exploded perspective view of the laser output device of fig. 26 viewed from the v-axis direction.

Referring to fig. 27, the length of the first beam manipulation part 201 in the v-axis direction may be smaller than the length of the second beam manipulation part 202 in the v-axis direction.

Therefore, the second beam steering section 202 can easily obtain the laser beam steered by the first beam steering section 201.

Specifically, when the first beam steering section 201 generates a laser beam that diverges in the v-axis direction, a part of the diverged laser beam may be emitted to the outside of the second beam steering section 202. Accordingly, light loss may occur as the first beam manipulation section 201 manipulates the light beam.

The light loss can be prevented in the case where the length of the second beam steering section 202 in the v-axis direction is larger than the length of the first beam steering section 201 in the v-axis direction.

Also, as shown in fig. 28, the length of the h-axis direction of the first beam steering portion 201 may be smaller than the length of the h-axis direction of the second beam steering portion 202 when viewed from the v-axis direction.

When the first beam steering section 201 generates a laser beam that diverges in the h-axis direction, a part of the diverged laser beam may be emitted to the outside of the second beam steering section 202. Accordingly, light loss may occur as the first beam manipulation section 201 manipulates the light beam.

In the case where the length of the second beam steering section 202 in the h-axis direction is larger than the length of the first beam steering section 201 in the h-axis direction, the light loss can be prevented.

In addition, the length of the second beam steering part 202 may be determined according to the steering direction of the first beam steering part 201.

As an example, when the first beam steering section 201 steers the laser beam in the v-axis direction, the length of the second beam steering section 202 in the v-axis direction as seen from the h-axis direction may be longer than the length of the first beam steering section 201 in the v-axis direction as seen from the h-axis direction.

Here, the length of the h-axis direction of the second beam steering part 202 seen from the v-axis direction may be equal to the length of the h-axis direction of the first beam steering part 201 seen from the v-axis direction.

As another example, in the case where the first beam steering section 201 steers the laser beam in the h-axis direction, the length of the second beam steering section 202 in the h-axis direction as seen from the v-axis direction may be longer than the length of the first beam steering section 201 in the h-axis direction as seen from the v-axis direction.

Here, the length of the v-axis direction of the second beam steering part 202 seen from the h-axis direction may be equal to the length of the v-axis direction of the first beam steering part 201 seen from the h-axis direction.

As another example, when the first beam steering unit 201 steers the laser beam in the h-axis and the v-axis directions, the lengths of the second beam steering unit 202 in the v-axis and the h-axis directions as viewed from the v-axis and the h-axis directions may be longer than the lengths of the first beam steering unit 201 in the v-axis and the h-axis directions as viewed from the v-axis and the h-axis directions.

In addition, the length of the second beam steering part 202 may be determined according to the magnitude of the steering angle of the first beam steering part 201.

For example, the length of the second beam steering portion 202 may be smaller when the steering angle of the first beam steering portion 201 is a first angle than when the steering angle of the first beam steering portion 201 is a second angle larger than the first angle.

Fig. 27 and 28 show portions of the first beam steering unit 201 where the width W of the plurality of nanopillars 10 varies for convenience of description. It is therefore apparent that the sizes of the plurality of nano-pillars 10 all look the same in the case of viewing fig. 26 from the actual side.

In addition, fig. 19 to 28 illustrate that the laser output device 1000 includes two beam manipulation parts 201, 202, but is not limited thereto, and the laser output device 1000 may include three or more beam manipulation parts 200.

The operation principle of the laser output apparatus 1000 of the embodiments is described above.

An embodiment to which the laser output apparatus 1000 is applied will be described below.

FIG. 29 is a block diagram illustrating a LiDAR (LiDAR: light Detection And Ranging) device of an embodiment. A lidar device may represent a device that obtains distance information of its surrounding objects using a laser.

Referring to fig. 29, a lidar device 10000 of an embodiment may include a laser output device 1000, a sensor portion 2000, and a control portion 3000.

The laser beam emitted from the laser output device 1000 may be sensed by the sensor portion 2000 after being irradiated to the object. The control unit 3000 can acquire distance information of the object based on the light receiving time point of the laser beam sensed by the sensor unit 2000 and the light emitting time point of the laser beam emitted from the laser output apparatus 1000.

Each structure of the lidar device 10000 will be specifically described below.

The laser output apparatus 1000 may include a laser output section 100 and a beam steering section 200. In addition, the laser output apparatus 1000 may operate the same as or similar to the laser output apparatus described in fig. 1 to 28, and thus a detailed description thereof will be omitted.

The sensor part 2000 may sense a laser beam reflected from an object.

The sensor portion 2000 may include a single sensor element or may include a sensor array including a plurality of sensor elements. For example, the sensor portion 2000 may include avalanche photodiodes (APDs: avalanche Photodiode) and may include silicon photomultipliers (SiPMs: silicon PhotoMultipliers) composed of a plurality of Single photon avalanche diode (SPAD: single-Photon Avalanche Diode) arrays.

The sensor section 2000 may be constituted by a single channel including a plurality of APDs. The sensor portion 2000 may include a plurality of channels.

The sensor section 2000 may include a Charge-Coupled Device (CCD) and a CMOS image sensor.

The control unit 3000 can control the laser output unit 100 and the sensor unit 2000. For example, the control unit 3000 may control the emission timing, emission period, and intensity of the laser beam emitted from the laser output unit 100.

The control unit 3000 can acquire the light emission time point of the laser beam emitted from the laser output unit 100. The control section 3000 can acquire the light receiving time point of the laser beam reflected from the object and sensed by the sensor section 2000. The control unit 3000 may acquire the distance information of the object using the light emission time point and the light reception time point.

Fig. 30 is a block diagram for explaining a lidar device of another embodiment.

Referring to fig. 30, a lidar apparatus 10000 of an embodiment may include a laser output section 100, a beam steering section 200, a sensor section 2000, a control section 3000, and a scanning section 4000.

In addition, the lidar device of fig. 30 may operate like the lidar device of fig. 29 except for the beam steering section 200. Therefore, a specific description of other components will be omitted, and the description will be mainly made of the beam steering unit 200.

The beam manipulation part 200 may manipulate the laser beam emitted from the laser output part 100 using a plurality of nano-columns.

The beam steering section 200 may include a plurality of beam steering modules. For example, the beam steering part 200 may include a first beam steering module 200a and a second beam steering module 200b.

The first beam manipulation module 200a and the second beam manipulation module 200b may respectively include the plurality of nano-pillars.

The plurality of nano-pillars may form a sub-wavelength pattern according to at least one of the characteristics of the width W, the interval P, and the height H.

The first nano-pillars included in the first beam-steering module 200a may form sub-wavelength patterns according to the first characteristics.

The second nano-pillars included in the second beam-steering module 200b may form sub-wavelength patterns according to the second characteristics.

The first characteristic may be the same as the second characteristic.

In addition, the first beam steering module 200a and the second beam steering module 200b may be disposed on different planes. For example, the second beam steering module 200b may be disposed on an upper side of the first beam steering module 200 a.

Fig. 31 is a block diagram for explaining a lidar device of yet another embodiment.

Referring to fig. 31, a lidar apparatus 10000 of an embodiment may include a laser output section 100, a beam steering section 200, a sensor section 2000, and a control section 3000.

The laser radar apparatus of fig. 31 can operate in the same manner as the laser radar apparatus of fig. 29, except that the scanning unit 4000 is included. Therefore, a specific description of other components will be omitted, and the description will be mainly made of the scanner 4000.

The laser beam emitted from the laser output section 100 can be manipulated by the beam manipulation section 200. The beam steering unit 200 may irradiate the object with the laser beam emitted from the laser output unit 100 through the scanning unit 4000. The sensor part 2000 may receive the laser beam reflected by the object through the scanning part 4000. The control unit 3000 may obtain the distance from the lidar 10000 to the object using the emission time point of the emitted laser beam and the reception time point of the received laser beam.

The scanning section 4000 of one embodiment can obtain a laser beam emitted from the laser output apparatus 1000. The scanning section 4000 may reflect the obtained laser beam toward the object.

The scanning section 4000 can obtain the laser beam reflected by the object. The scanning section 4000 may reflect the obtained laser beam toward the sensor section.

The scanner 4000 can manipulate the laser beam emitted from the laser output device 1000. For example, the scanning unit 4000 may change the flight path of the laser beam emitted by reflecting the laser beam emitted. Alternatively, the scanning unit 4000 may change the flight path of the laser beam emitted by refracting the emitted laser beam.

The scanning section 4000 may form laser beams of various patterns. For example, the scanning unit 4000 may form a line-patterned laser beam from a point-source-type laser beam. Alternatively, the scanning section 4000 may form a laser beam of a planar pattern from a laser beam of a line pattern.

The scanner 4000 can form a Field Of View (FOV) including a plurality Of scan points distributed in the vertical direction and the horizontal direction.

The scanning portion 4000 may include a variety of optical configurations.

For example, the scanning part 4000 may include a scanning mirror that reflects light. In particular, the scanning mirror may include a flat mirror, a microelectromechanical system (MEMS: micro Electro Mechanical System), a galvanometer mirror (galvano mirror), a polygon mirror (polygonal mirror).

Also, the scanning section 4000 may include a lens, a collimator.

Fig. 32 is a perspective view showing a lidar device of an embodiment.

Referring to fig. 32, the lidar device 10000 may include a laser output device 1000, a sensor portion 2000, and a polygon mirror 4100.

The laser beam emitted from the laser output apparatus 1000 can be projected onto an object through the polygon mirror 4100. The laser beam reflected by the object can be received by the sensor section 2000 through the polygon mirror 4100.

Each configuration of the lidar device is specifically described below.

The laser output apparatus 1000 can emit a laser beam to the polygon mirror 4100. Specifically, the laser output apparatus 1000 can emit a laser beam to an upper portion of the reflecting surface of the polygon mirror 4100.

The laser output apparatus 1000 can emit laser beams of various forms. For example, the laser output device 1000 may emit a light beam of a line pattern extending along the rotation axis direction of the polygon mirror 4100.

The laser beam emitted from the laser output apparatus 1000 may be projected onto a reflecting surface of the polygon mirror 4100.

The polygon mirror 4100 can change the flight path of the laser beam emitted from the laser output apparatus 1000. For example, the polygon mirror 4100 may change the flight path of the laser beam by reflecting the emitted laser beam.

The polygon mirror 4100 may project the laser beam emitted by reflection toward the object.

The polygon mirror 4100 can rotate with one axis. The polygon mirror 4100 can form laser beams of various patterns by rotating 360 degrees. For example, the polygon mirror 4100 may form a laser beam of a planar pattern from the laser beam of the line pattern by rotation. Alternatively, the polygon mirror 4100 may form a laser beam in a line form extending along an axis perpendicular to the one axis from a laser beam in a point light source form.

The polygon mirror 4100 can obtain a laser beam reflected by the object. The polygon mirror 4100 may reflect the obtained laser beam toward the sensor portion 2000 side.

The polygon mirror 4100 can obtain the laser beam reflected by the object through the reflection surface.

The polygon mirror 4100 may reflect the laser beam obtained from the lower portion of the reflection surface out of the obtained laser beams toward the sensor portion 2000.

The polygon mirror 4100 may have various shapes. For example, the polygon mirror 4100 may have a polygonal column shape.

The polygon mirror 4100 may include a plurality of reflecting surfaces. For example, the polygon mirror 4100 may include four reflecting surfaces.

The sensor portion 2000 may receive the laser beam reflected by the polygon mirror 4100. Specifically, the sensor section 2000 may receive the laser beam reflected from the object through the polygon mirror 4100.

The sensor unit 2000 may be located on the same side as the laser output device 1000 with respect to the polygon mirror 4100. For example, the sensor section 2000 may be disposed at a lower portion of the laser output device 1000.

In addition, the laser output device 1000 may have a laser output section including a plurality of vertical cavity surface emitting laser elements and a beam manipulation section including a plurality of nano-pillars.

Fig. 33 is a schematic diagram for explaining a lidar device of an embodiment. Specifically, the laser output device 1000 of the exploded view 32 is an exploded perspective view.

Referring to fig. 33, the lidar device 10000 may include a laser output device 1000, a sensor portion 2000, and a polygon mirror 4100.

The laser output apparatus 1000 may include a laser output section 100 and a beam steering section 200.

The laser output section 100 of an embodiment may include a plurality of vertical cavity surface emitting laser elements.

The plurality of vertical cavity surface emitting laser elements may be arranged in an array form along the rotation axis direction of the polygon mirror 4100.

The plurality of vertical cavity surface emitting laser elements may emit laser beams in a direction perpendicular to an emission surface of the laser output section 100.

The laser output unit 100 can emit a laser beam toward the beam steering unit 200.

The laser output unit 100 can emit a laser beam in a direction perpendicular to the rotation axis of the polygon mirror 4100.

The beam manipulation part 200 of an embodiment may manipulate the laser beam emitted from the laser output part 100 along the rotation axis direction.

The beam steering unit 200 may generate a laser beam having a line pattern extending in the rotation axis direction from the laser beam emitted from the laser output unit 100.

The beam manipulation part 200 may include a plurality of beam manipulation units 210 respectively including a plurality of nano-pillars 10.

For example, the beam steering unit 210 may include a first beam steering unit 211, a second beam steering unit 212, a third beam steering unit 213, a fourth beam steering unit 214, and a fifth beam steering unit 215.

The first to fifth beam manipulation units 211, 212, 213, 214, 215 may manipulate laser beams using a plurality of nano-pillars 10, respectively. For example, the first to fifth beam manipulation units 211, 212, 213, 214, 215 may manipulate the laser beams emitted from the laser output part 100 along the rotation axis direction of the polygon mirror 4100 using a plurality of nano-pillars 10, respectively.

The first to fifth beam steering units 211, 212, 213, 214, 215 may be arranged in an array along the rotation axis direction.

The plurality of nanopillars 10 can manipulate the laser beam emitted from the laser output section 100.

The plurality of nano-pillars 10 may form sub-wavelength patterns according to at least one of the characteristics of width W, height H, and number per unit length thereof. For example, the plurality of nano-pillars 10 may form sub-wavelength patterns according to arrangement positions of the plurality of beam steering units 211, 212, 213, 214, 215 on an array in which the plurality of beam steering units 211, 212, 213, 214, 215 are arranged.

In particular, a plurality of nanopillars 10 may form a sub-wavelength pattern in which the characteristic repeatedly increases from the center of the array toward the beam steering unit 210 to which the plurality of nanopillars 10 belong.

Accordingly, the plurality of nano-pillars 10 belonging to the first beam steering unit 211 located at the upper end of the array may form a sub-wavelength pattern in which the characteristics increase toward the upper side of the array.

Conversely, the plurality of nano-pillars 10 belonging to the fifth beam steering unit 215 located at the lower end of the array may form a sub-wavelength pattern in which the characteristic increases toward the lower side of the array.

Also, the plurality of nano-pillars 10 belonging to the third beam steering unit 213 located at the center of the array may form the sub-wavelength pattern having uniform characteristics.

In addition, the plurality of nano-pillars 10 may form a sub-wavelength pattern in which the rate of increase of the characteristic is greater as the beam steering unit 210 is further from the center of the array. For example, the rate of increase of the first characteristic of the plurality of nano-pillars 10 belonging to the first beam-steering unit 211 may be greater than the rate of increase of the second characteristic of the plurality of nano-pillars 10 belonging to the second beam-steering unit 212.

Accordingly, the magnitude of the rotation axis direction component of the steering angle of the beam steering unit 210 may increase as it is away from the center of the array. For example, the magnitude of the rotation axis direction component of the first manipulation angle of the first beam manipulation unit 211 may be larger than the magnitude of the rotation axis direction component of the second manipulation angle of the second beam manipulation unit 212.

As described above, the magnitude of the rotation axis direction of the laser beam emitted from the laser output apparatus 1000 may increase as the laser beam goes from the laser output apparatus 1000 toward the polygon mirror 4100 side.

Accordingly, the second length L2 of the polygon mirror 4100 in the rotation axis direction may be larger than the first length L1 of the array in which the plurality of beam steering units 211, 212, 213, 214, 215 are arranged.

That is, the length of the laser beam reflected by the polygon mirror 4100 and projected toward the object in the rotation axis direction may be larger than the length of the laser beam emitted from the laser output unit 100 in the rotation axis direction.

Therefore, the range of the rotation axis direction in the measurable range of the laser radar apparatus 10000 can be increased. Therefore, the short-range object measurement performance of the lidar device 10000 can be improved.

Further, as the length of the polygon mirror 4100 in the rotation axis direction, that is, the height of the polygon mirror 4100 increases, the light receiving amount of the laser beam reflected from the object may increase. Therefore, the measurable distance of the lidar device 10000 can be increased.

In addition, the direction of the rotation axis direction component of the manipulation direction of the beam manipulation unit 210 located at the upper end of the array in which the beam manipulation units 210 are arranged may be opposite to the direction of the rotation axis direction component of the manipulation direction of the beam manipulation unit 210 located at the lower end of the array.

For example, the direction of the rotation axis direction component of the first manipulation direction of the first beam manipulation unit 211 may be opposite to the direction of the rotation axis direction component of the fifth manipulation direction of the fifth beam manipulation unit 215.

In addition, for convenience of explanation, fig. 33 shows that the plurality of beam steering units 211, 212, 213, 214, 215 are one-dimensionally arranged, but is not limited thereto, and the plurality of beam steering units 211, 212, 213, 214, 215 may be arranged in a two-dimensional array. For example, the first to fourth beam steering units 211, 212, 213, 214 may be arranged in a 2x2 array.

Fig. 34 is a schematic diagram for explaining a lidar device of another embodiment.

Referring to fig. 34, the lidar device 10000 may include a laser output device 1000, a sensor portion 2000, and a polygon mirror 4100.

In addition, the laser output section of fig. 34 may correspond to the laser output section of fig. 33. Therefore, a specific description thereof will be omitted, and a description will be given below centering on points that are to be compared with the laser radar apparatus of fig. 33.

The plurality of nano-pillars 10 may form sub-wavelength patterns according to characteristics of at least one of width W, height H, and number per unit length thereof. For example, the plurality of nano-pillars 10 may form sub-wavelength patterns according to arrangement positions of the plurality of beam steering units 211, 212, 213, 214, 215 on an array in which the plurality of beam steering units 211, 212, 213, 214, 215 are arranged.

In particular, a plurality of nanopillars 10 may form a sub-wavelength pattern in which the characteristic repeatedly decreases from the center of the array toward the beam steering unit 210 to which the plurality of nanopillars 10 belong.

Accordingly, the plurality of nano-pillars 10 belonging to the first beam steering unit 211 located at the upper end of the array may form a sub-wavelength pattern in which the characteristics decrease toward the upper side of the array.

Conversely, the plurality of nano-pillars 10 belonging to the fifth beam steering unit 215 located at the lower end of the array may form a sub-wavelength pattern in which the characteristics decrease toward the lower side of the array.

As described above, the magnitude of the rotation axis direction of the laser beam emitted from the laser output apparatus 1000 may decrease as it goes from the laser output apparatus 1000 toward the polygon mirror 4100 side.

Accordingly, the second length L2 of the polygon mirror 4100 in the rotation axis direction may be smaller than the first length L1 of the array in which the plurality of beam steering units 211, 212, 213, 214, 215 are arranged.

Therefore, the polygon mirror 4100 can be manufactured to be miniaturized. That is, as the size of the polygon mirror 4100 decreases, the lidar device 10000 can be manufactured to be miniaturized.

Further, as the size of the polygon mirror 4100 decreases, the load of the motor that supplies the rotational force to the polygon mirror 4100 can be reduced.

The sensor unit 2000 may be disposed on the opposite side of the laser output apparatus 1000 with respect to the polygon mirror 4100.

The sensor portion 2000 may receive the laser beam reflected by the object through a second reflection surface different from the first reflection surface of the polygon mirror 4100 that projects the laser beam emitted from the laser output device 1000.

Therefore, it is possible to prevent an interference phenomenon between the first laser beam projected to the object through the first reflecting surface and the second laser beam reflected from the object toward the second reflecting surface.

Fig. 35 is a schematic view for explaining a lidar device of still another embodiment.

Referring to fig. 35, the lidar device 10000 may include a laser output device 1000, a sensor portion 2000, and a wobble mirror 4200.

In addition, the laser output section of fig. 35 may correspond to the laser output section of fig. 33. Therefore, a specific description thereof will be omitted, and a description will be given below centering on points that are to be compared with the laser radar apparatus of fig. 33.

The first to fifth beam manipulation units 211, 212, 213, 214, 215 may manipulate laser beams using a plurality of nano-pillars 10, respectively. For example, the first to fifth beam manipulation units 211, 212, 213, 214, 215 may manipulate the laser beams emitted from the laser output part 100 along the rotation axis direction of the oscillating mirror 4200 using the plurality of nano-pillars 10, respectively.

As described above, the magnitude of the rotation axis direction of the laser beam emitted from the laser output apparatus 1000 may decrease as the laser output apparatus 1000 approaches the wobble mirror 4200 side.

Accordingly, the third length L3 of the oscillating mirror 4200 in the rotation axis direction may be smaller than the first length L1 of the array in which the plurality of beam steering units 211, 212, 213, 214, 215 are arranged.

Therefore, the wobble mirror 4200 can be manufactured to be miniaturized. That is, as the size of the wobble mirror 4200 decreases, the lidar device 10000 can be made compact.

In addition, the wobble mirror 4200 may be a microelectromechanical system (MEMS: micro Electro Mechanical System) mirror. Here, the rotation speed of the oscillating mirror 4200 may be faster than that of the polygon mirror 4100 of fig. 33. Therefore, the scanning speed of the lidar device 10000 can be increased.

Further, the lidar device of fig. 35 does not include a motor that provides a rotational force, as compared to the lidar device of fig. 33, and thus durability can be improved.

The sensor section 2000 can receive the laser beam reflected by the oscillating mirror 4200. Specifically, the sensor section 2000 can receive the laser beam reflected from the object through the oscillating mirror 4200.

In addition, the lidar device 10000 may include a condenser lens 4300 for increasing the amount of light of the laser beam received from the object to the oscillating mirror 4200.

The condenser lens 4300 may obtain a laser beam reflected by the object. The laser beam obtained may be transferred to the oscillating mirror 4200.

In addition, the oscillating mirror 4200 is rotatable within a predetermined range. For example, the rotation range of the wobble mirror 4200 may be-15 degrees to 15 degrees.

Therefore, the sensor section 2000 that receives the laser beam reflected from the object through the oscillating mirror 4200 can be located on the same side as the laser output device 1000 with reference to the oscillating mirror 4200.

Fig. 36 is a top view of the lidar device of fig. 35 viewed from above.

Referring to fig. 36, the lidar device 10000 may include a laser output device 1000 and a wobble mirror 4200.

The oscillating mirror 4200 is rotatable within a predetermined range along with the rotation axis, and projects the laser beam emitted from the laser output device 1000 toward the object.

The laser output apparatus 1000 can emit a laser beam toward the rotation axis of the oscillating mirror 4200. That is, an imaginary line extending the laser beam emitted from the laser output apparatus 1000 may pass through the rotation axis of the oscillating mirror 4200.

Referring to fig. 37, the lidar device 10000 may include a laser output device 1000, a sensor portion 2000, a wobble mirror 4200, and a condenser lens 4300.

The laser output apparatus 1000 and the wobble mirror 4200 of fig. 37 can operate as the laser output apparatus 1000 and the wobble mirror 4200 of fig. 35. Therefore, a specific description thereof will be omitted, and a description will be given below centering on points that are to be compared with the laser radar apparatus of fig. 35.

The oscillating mirror 4200 guides the laser beam emitted from the laser output device 1000 to the subject. For example, the wobble mirror 4200 may guide the emitted laser beam toward the object by reflecting the emitted laser beam.

The oscillating mirror 4200 is rotatable with an axis of the direction in which the first to fifth beam steering units 211, 212, 213, 214, 215 are arranged. Alternatively, the laser beam may be rotated along an axis perpendicular to the emission direction of the laser beam emitted from the laser output unit 100.

By rotating with the axis, the wobble mirror 4200 can form a laser beam in a plane (plane) form from a laser beam of a linear form. That is, the wobble mirror 4200 may form a laser beam spot cloud.

The oscillating mirror 4200 may irradiate the laser beam of the planar form to the object.

The sensor part 2000 may receive the laser beam reflected by the object.

The condenser lens 4300 is disposed between the sensor unit 2000 and the object, and can obtain a laser beam reflected by the object. The obtained laser beam may be obtained by the sensor section 2000.

The sensor portion 2000 may include a plurality of sensor elements arranged in an array configuration. For example, the plurality of sensor elements may be arranged along a direction parallel to the arrangement direction of the first to fifth beam steering units 211, 212, 213, 214, 215.

The methods of the embodiments may be configured in the form of program instructions executable by a variety of computer devices and stored in a computer-readable medium. The computer readable medium may include program instructions, data files, data structures, etc., or combinations thereof. The program instructions stored in the medium may be specially designed and constructed for the embodiments, but may be of the kind well known and used by computer software technicians. The computer readable storage medium may be, for example, a magnetic medium (magnetic medium) such as a hard disk, a floppy disk, a magnetic tape, an optical storage medium (optical medium) such as a CD-ROM, a DVD, a magneto-optical medium (magnetic-optical medium) such as a floppy disk, a ROM, a RAM, or a flash disk, or a hardware device specially configured to store and execute program instructions. Further, the program instructions include, for example, not only machine code obtained by a compiler but also high-level language code that can be executed by a computer using an interpreter. The hardware devices described above may be configured to operate as more than one software module in order to perform the actions of the embodiments, and vice versa.

The embodiments have been described above by way of the defined embodiments and the accompanying drawings, but many modifications and variations based on the description may be made by those of ordinary skill in the art. For example, techniques described are performed in a different order than illustrated, and/or constituent elements of systems, structures, devices, circuits, etc. described are combined or combined in a different manner than illustrated, or replaced or substituted by other constituent elements or equivalents may also achieve suitable results.

Therefore, other implementations, other embodiments, and technical solutions equivalent to the technical solutions all fall within the scope of the present invention.

Claims

1. A laser radar device for measuring a distance from an obstacle included in a field of view FOV formed by a plurality of scanning points distributed in a vertical direction and a horizontal direction, the laser radar device comprising:

a plurality of laser output sections which are arranged in an array form and emit a plurality of spot laser beams having a specific wavelength, and which include at least one vertical cavity surface emitting laser VCSEL element;

a sensor unit that detects light reflected from an object;

a control section that obtains distance information based on an emission time point of the laser beam and a reception time point of the light sensed to be reflected; and

A metasurface including a plurality of beam steering units that guide the laser beam so as to correspond to the plurality of scanning points using a plurality of nanopillars arranged on an emission surface side of the laser output section and are arranged in a two-dimensional array along a row direction corresponding to the vertical direction and a column direction corresponding to the horizontal direction,

wherein a plurality of spot laser beams emitted from the plurality of laser output sections are guided by the plurality of beam steering units so that the plurality of spot laser beams correspond to the plurality of scanning points distributed in the vertical direction and the horizontal direction forming the FOV,

wherein the plurality of beam steering units respectively corresponding to the plurality of laser output units respectively include a plurality of nanopillars having a height and a width smaller than the specific wavelength, and have a steering direction different from that of the other beam steering units by using the nanopillars,

wherein the plurality of spot laser beams emitted from the plurality of laser output sections are respectively manipulated by corresponding beam manipulation units,

wherein the steering direction is defined by a vertical steering angle and a horizontal steering angle,

wherein the vertical steering angle of each of the beam steering units is determined according to a vertical direction increasing and decreasing rate of a first characteristic of the nano-pillars included in each of the beam steering units, and the horizontal steering angle is determined according to a horizontal direction increasing and decreasing rate of a second characteristic of the nano-pillars included in each of the beam steering units,

Wherein a vertical direction increasing rate of the first characteristic of the nanopillar corresponding to each of the beam manipulation units gradually increases as a vertical distance between a center position of each of the beam manipulation units and a center position of the metasurface increases so that the laser beam corresponds to the plurality of scan points distributed in the vertical direction forming the FOV,

wherein a horizontal direction increasing rate of the second characteristic of the nanopillar corresponding to each of the beam steering units gradually increases as a horizontal distance between a center position of each of the beam steering units and a center position of the metasurface increases so that the laser beam corresponds to the plurality of scan points distributed in the horizontal direction forming the FOV, and

wherein the first characteristic is related to at least one of a width of the nanopillar, a height of the nanopillar, and a vertical spacing between adjacent nanopillars, and the second characteristic is related to at least one of a width of the nanopillar, a height of the nanopillar, and a horizontal spacing between adjacent nanopillars.

2. The lidar device according to claim 1, wherein:

The steering direction of one beam steering unit selected from the plurality of beam steering units has a vertical component ranging from-M degrees to M degrees and a horizontal component ranging from-N degrees to N degrees, wherein N is greater than M.

3. The lidar device according to claim 1, wherein:

the position of each scan point of the plurality of scan points contained in the FOV is correlated with the position of the beam steering unit at the metasurface.

4. The lidar device according to claim 1, wherein:

the nano column is in the shape of a cylinder or a polygonal column.

5. The lidar device according to claim 1, wherein the first characteristic is different from the second characteristic.

6. The lidar device of claim 1, wherein the first characteristic is one characteristic selected from a width of a nanopillar, a height of a nanopillar, and a spacing between adjacent nanopillars, and the second characteristic is another characteristic selected from a width of the nanopillar, a height of a nanopillar, and a distance between adjacent nanopillars.