CN110484890B - Method for improving surface wear resistance of spray needle of number spraying machine - Google Patents

Method for improving surface wear resistance of spray needle of number spraying machine Download PDF

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Publication number
CN110484890B
CN110484890B CN201910942622.9A CN201910942622A CN110484890B CN 110484890 B CN110484890 B CN 110484890B CN 201910942622 A CN201910942622 A CN 201910942622A CN 110484890 B CN110484890 B CN 110484890B
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cleaning
spray needle
target
vacuum
vacuum cavity
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CN110484890A (en
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赵�卓
周艳文
张开策
陈雪娇
郭媛媛
吕哲
武俊生
李彤
张晶
杨永杰
张豫坤
方方
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University of Science and Technology Liaoning USTL
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C23C14/352—Sputtering by application of a magnetic field, e.g. magnetron sputtering using more than one target

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The invention relates to a method for improving the surface wear resistance of a spray needle of a marking machine, wherein chromium, titanium, aluminum and silicon target materials required by coating are arranged on 1-4 target seats on the periphery of a vacuum cavity; cleaning a spray needle: sequentially carrying out alkali washing, industrial cleaning agent ultrasonic cleaning and alcohol cleaning; vacuum cleaning before film coating: fixing the spray needle on a self-rotating frame in a vacuum cavity, pre-vacuumizing, starting a molecular pump, vacuumizing, heating, preserving heat, and introducing argon and nitrogen; opening 1-4 filaments, cleaning in a bias mode, and cleaning a target; film coating: adjusting the direct current bias of the substrate, controlling the flow of argon and nitrogen, and controlling the pressure of the vacuum cavity to be 0.3-2.0 Pa; starting 1-4 target power supplies, starting sputtering until the coating is finished. The nitride film prepared on the surface of the spray needle by adopting the vacuum magnetron sputtering plating method obviously improves the wear resistance of the surface of the spray needle, and the film has better binding force and is not easy to fall off.

Description

Method for improving surface wear resistance of spray needle of number spraying machine
Technical Field
The invention belongs to the field of film preparation by a magnetron sputtering method, and particularly relates to a method for improving the surface wear resistance of a spray needle of a marking machine.
Background
The spray gun is a core component of the automatic marking machine, the spray needle and the spray nozzle are core components of the spray gun, and the quality of the spray needle directly influences the use effect of the automatic marking machine. The operation of the spray gun is mainly characterized in that the spray needle acts under the action of an electromagnetic controller to enable the coating in the spray nozzle to be output according to control, so that the matching and sealing excellent degree between the spray needle and the spray nozzle determine the use of the spray gun. The main problem of the spray needle in the using process is abrasion, and the abrasion of the spray needle and a nozzle is serious due to high using frequency, so that the technical problem which needs to be overcome by a marking machine is always solved.
The wear-resistant coating is coated on the surface of the spray needle, and is one of means for effectively improving the wear resistance. Magnetron sputtering is widely applied to the preparation of surface protection layers as a vacuum coating technology. The film prepared by the magnetron sputtering technology has the advantages of good film-substrate binding force, higher hardness than a substrate, higher wear resistance and the like.
Disclosure of Invention
In order to overcome the defects of the prior art, the invention aims to provide a method for improving the wear resistance of the surface of a spray needle of a marking machine.
In order to achieve the purpose, the invention is realized by the following technical scheme:
a method for improving the wear resistance of the surface of a spray needle of a marking machine comprises the following steps:
1) mounting chromium, titanium, aluminum and silicon target materials required by coating on 1-4 target seats on the periphery of the vacuum cavity;
cleaning a spray needle:
alkali washing: na with the concentration of 20-50 g/L is used2CO3Ultrasonic cleaning the solution, heating to 70-80 ℃, and cleaning for 10-30 min at the ultrasonic frequency of 70 Hz;
ultrasonic cleaning with an industrial cleaning agent: diluting an industrial cleaning agent and deionized water by 1:3, adding the industrial cleaning agent and the deionized water into an ultrasonic cleaning machine, heating to 70-80 ℃, and cleaning for 10-30 min at the ultrasonic frequency of 70 Hz; washing the spray needle with deionized water;
alcohol cleaning: placing the spray needle in a beaker filled with absolute ethyl alcohol, placing the spray needle in an ultrasonic cleaning machine for cleaning for 10-30 min, taking out the spray needle for drying, and then placing the spray needle in a drying box at 100-200 ℃ for drying for 10-30 min;
2) vacuum cleaning before film coating:
fixing the spray needle on a self-rotating frame in a vacuum cavity, pre-vacuumizing to 1-20 Pa, starting a molecular pump, and vacuumizing to reduce the pressure in the cavity to 10 when the rotating speed of the molecular pump reaches more than 2000r/min-4～10-3Pa, heating to 200-400 ℃, preserving heat, and introducing argon and nitrogen;
opening 1-4 filaments, preheating the filaments for 15-30 min, cleaning at-50 to-200V low bias for 10-40 min, and cleaning at-200 to-400V high bias for 10-40 min; adjusting the target current to 1-10A, and cleaning the target for 10-40 min;
3) film coating:
after the vacuum cleaning is finished, the direct current bias voltage of the substrate is adjusted to-50 to-100V, the flow of argon gas is controlled to be 100 to 200sccm, the flow of nitrogen gas is controlled to be 0 to 200sccm, and the pressure of the vacuum cavity is controlled to be 0.3 to 2.0 Pa; adjusting the current of the lamp filament to be 1-10A, turning on 1-4 target power supplies, turning on a baffle plate, and starting sputtering until the film coating is finished.
4 filaments are wound around the vacuum cavity, rectangular metal target materials are respectively arranged on the four walls of the vacuum cavity, and more than one target material is a chromium target, a titanium target, an aluminum target or a silicon target.
Compared with the prior art, the invention has the beneficial effects that:
the nitride film prepared on the surface of the spray needle by adopting the vacuum magnetron sputtering plating method obviously improves the wear resistance of the surface of the spray needle, and the film has better binding force and is not easy to fall off. The plasma bombards the oxide layer and other impurities of the workpiece before film coating, so that the surface of the workpiece is activated, and meanwhile, a pseudo diffusion layer is formed on the surface of the workpiece, which is beneficial to improving the binding force between the film layer and the surface of the workpiece. Meanwhile, the vacuum environment in the equipment can ensure that the spray needle is not subjected to secondary oxidation in the coating process after being cleaned. The method adopts a hot wire enhanced plasma non-equilibrium magnetron sputtering technology, takes a tungsten wire as a hot wire, fixes the hot wire in a vacuum cavity filled with argon atmosphere, improves the ionization rate of argon and the bombardment speed of argon ions by adjusting the bias voltage applied on the hot wire, and further improves the film-substrate bonding strength and the compactness of the film.
Detailed Description
The present invention is described in detail below, but it should be noted that the practice of the present invention is not limited to the following embodiments.
A method for improving the wear resistance of the surface of a spray needle of a marking machine comprises the following steps:
1) preparing before coating: cleaning a vacuum cavity: installing a rotating frame for supporting a spray needle, removing dirt in a vacuum cavity (in a hot wire enhanced plasma non-equilibrium magnetron sputtering coating machine), and sucking dust by using a dust collector. Winding 1-4 tungsten filaments on the binding posts fixed on the periphery in the cavity.
Cleaning a spray needle:
alkali washing: preparing Na with the concentration of 20-50 g/L2CO3And (3) ultrasonically cleaning the solution, heating to 70-80 ℃, and cleaning for 10-30 min at the ultrasonic frequency of 70 Hz. The cleaning agent for removing oil (antirust type) is used for ultrasonic cleaning in MT-28A procedures of Sandaoko chemical Co., Ltd: diluting the industrial cleaning agent and deionized water by 1:3, adding the diluted industrial cleaning agent and the deionized water into an ultrasonic cleaning machine, heating to 70-80 ℃, and cleaning for 10-30 min at the ultrasonic frequency of 70 Hz. The needle was rinsed twice with a flowing deionized water source.
Alcohol cleaning: and placing the sample in a beaker filled with absolute ethyl alcohol, placing the sample in an ultrasonic cleaning machine for cleaning for 10-30 min, taking out the sample for drying, and then placing the sample in a drying box at 100-200 ℃ for drying for 10-30 min. The spray needle is fixed on the self-rotating frame, and the motor of the rotating frame is started to ensure that the rotating frame rotates normally and the spray needle rotates normally. Keeping the vacuum cavity and the spray needle clean, wearing gloves and holding the spray needle; ensuring the insulation of the filament, the target material and the cavity; the normal operation of the water cooler is ensured, the cooling effect can be achieved, and the alarm caused by overhigh temperature of the molecular pump, the target power supply and the substrate bias power supply in the film coating process is prevented. And wiping a sealing ring on the vacuum chamber door by using alcohol, and closing the vacuum chamber door. And the insulativity of the filament and the cavity is detected again, so that the filament and the cavity are ensured to be insulated, and the short circuit is avoided in the process of closing the vacuum cavity door.
2) Vacuumizing a vacuum cavity: and opening the mechanical pump, and opening the bypass pumping valve after the mechanical pump runs stably. The mechanical pump is first pumped to 1-20 Pa, thenThen the side pumping valve is closed, the molecular pump is opened, and after the rotating speed of the pump reaches more than 2000r/min, the pump is precisely pumped until the pressure in the vacuum cavity is reduced to 10-4～10-3Pa, heating and continuously vacuumizing, and aims to further remove water vapor in the vacuum cavity so as to avoid the problem of secondary oxidation in the film coating process. When the temperature rises to 200-400 ℃, the temperature is kept, and the vacuum pumping is continued to reduce the pressure in the cavity to 10 DEG C-4～10-3Pa or less, the heating was turned off. Setting the flow of argon gas to be 100-200 sccm and the flow of nitrogen gas to be 0-50 sccm, introducing argon gas and nitrogen gas, filling the vacuum cavity with atmosphere capable of generating plasma through glow discharge, preparing for subsequent cleaning and coating, and simultaneously cooling the vacuum cavity and the spray needle.
3) Cleaning before film coating: and after the temperature of the vacuum cavity is reduced to 100-200 ℃, closing the nitrogen stop valve and the corresponding gas cylinder. Opening 1-4 filaments, setting the power of the filaments to be 30% -40% of rated power, setting the rated power to be 5000W, preheating the filaments for 10-40 min, opening a filament bias voltage power supply, and slowly adjusting the bias voltage of the filaments to-100 to-150V. And then, after the filament bias power supply current meter has a reading, slowly adjusting the power of the filament to enable the filament bias current to reach the preset filament current. The spray needle rotates along with the rotating frame at a constant speed, a substrate power supply is turned on, the argon flow is set to be 100-200 sccm, the hydrogen flow is set to be 50-150 sccm, the substrate pulse bias is adjusted to be-50-200V, and low-bias substrate cleaning is carried out for 10-40 min. Then adjusting the bias voltage to-200 to-400V, and carrying out high-bias cleaning for 10-40 min. And (3) turning on a target power supply of 1-4 targets, adjusting the target current to 1-10A, and cleaning the targets for 10-40 min.
4) Film coating: after cleaning, the direct-current bias voltage of the substrate is adjusted to-50 to-100V, the flow of argon is set to 100 to 200sccm, the flow of nitrogen is set to 0 to 200sccm, the gas cylinder and the stop valve are opened, and the pressure of the vacuum cavity is kept between 0.3 and 2.0Pa by controlling the flow of argon and nitrogen. Adjusting the power of 1-4 filaments to enable the current of each filament to reach 1-10A, adjusting the target current of 1-4 target power supplies to be 1-10A, opening a baffle plate, starting sputtering, wherein the sputtering time is determined according to the required film thickness, observing whether the numerical values of the base body bias current and the filament current change or not in the film coating process, and adjusting the filament power to enable the current to maintain a normal level if the numerical values change.
5) Cooling after film coating: and after the film coating is finished, closing the baffle. Then the target power supply, the matrix direct-current power supply and the filament power supply are sequentially turned off; turning off the turret motor; setting the nitrogen flow to be 10-100 sccm, closing the nitrogen when the temperature is reduced to 50-150 ℃, releasing the pressure when the pressure of the vacuum chamber reaches 10 DEG C5Pa, opening a door of the vacuum cavity, taking out the spray needle, and detecting the mechanical properties of the spray needle, such as hardness, binding force, friction and abrasion, so that the requirements are met, and the method can be applied to actual production.
Example 1:
a method for improving the wear resistance of the surface of a spray needle of a marking machine comprises the following steps:
1) preparing before coating: cleaning a vacuum cavity: and installing a rotating frame, removing dirt in the vacuum cavity, and sucking dust by using a dust collector. 4 tungsten filaments are wound on the four pairs of binding posts fixed in the cavity.
Cleaning a sample:
alkali washing: with Na2CO3And (4) ultrasonically cleaning the solution. 100g of Na is prepared2CO3Dissolving in 3L deionized water, heating to 70 deg.C, ultrasonic frequency 70Hz, and cleaning for 10 min. And (4) carrying out ultrasonic cleaning by using an industrial cleaning agent. Diluting industrial cleaning agent with deionized water at a ratio of 1:3, heating to 70 deg.C, cleaning at ultrasonic frequency of 70Hz for 10min, and washing twice with flowing deionized water source.
Alcohol cleaning: placing the spray needle in a beaker filled with absolute ethyl alcohol, placing the spray needle in an ultrasonic cleaning machine for cleaning for 10min, taking out the spray needle for drying, and then placing the spray needle in a drying box at 100 ℃ for drying for 20 min. Fixing the spray needle on a self-rotating frame, and driving the spray needle to rotate by the rotating frame to ensure that the filament, the target material and the cavity are insulated; and wiping a sealing ring on the door of the vacuum cavity by using alcohol, and closing the vacuum cavity.
2) Vacuumizing: and opening the mechanical pump, and opening the bypass pumping valve after the mechanical pump runs stably. The mechanical pump firstly pumps the liquid to 8Pa, then the side pumping valve and the front valve are closed, the molecular pump is opened, and the liquid is pumped into vacuum after the rotating speed of the pump reaches more than 2000 r/min. Finely pumping until the pressure in the cavity is reduced to 1 × 10-3Pa or less, and a set temperature of 35Heating at 0 deg.C and continuing to vacuumize to further remove water vapor in the vacuum chamber. When the temperature is raised to 350 ℃, the temperature is preserved, so that the pressure in the cavity is reduced to 1 multiplied by 10-3Pa or less, the heating was stopped. Argon gas and nitrogen gas were introduced, and the flow rate of argon gas and the flow rate of nitrogen gas were set to 120sccm and 10sccm, respectively.
3) Cleaning before film coating: after the temperature of the vacuum cavity is reduced to 120 ℃, closing nitrogen, opening 4 filaments, preheating the filaments for 20min, slowly adjusting the bias voltage of the filaments to-120V, and then slowly adjusting the power of the filaments until the current of the filaments reaches 5A. Rotating the rotating frame, turning on the power supply of the substrate, introducing argon gas of 120sccm and hydrogen of 100sccm, adjusting the pulse bias to-120V for low-bias cleaning, and cleaning for 10 min. Then the bias was adjusted to-300V, and the rest was left unchanged and then cleaned for 10 min. And (4) turning on target power supplies of the chromium targets, adjusting the target current to be 5A, and cleaning for 10 min. .
4) Film coating: after cleaning, the direct current bias voltage of the substrate is adjusted to-50V, the flow of argon is controlled to be 100sccm, the flow of nitrogen is controlled to be 100sccm, and the pressure of the cavity is controlled to be 0.5 Pa. The filament current is adjusted to be 5A, the target current is adjusted to be 5A, the baffle is opened, sputtering is started, and the sputtering time is 1 h.
5) Cooling after film coating: after the film coating is finished, the baffle plate is closed, and the target power supply, the matrix direct-current power supply and the filament power supply are closed; stopping the operation of the rotating frame; after the temperature is reduced to 50 ℃, closing the nitrogen and relieving the pressure, and when the pressure of the vacuum chamber reaches 10 DEG C5And Pa, opening the vacuum cavity and taking out the spray needle.
By adopting the method, the chromium nitride film with the thickness of 1-1.5 mu m can be obtained on the surface of the spray needle, and the service life of the coated spray needle can be prolonged to more than 5 months from 3 months.
Example 2:
a method for improving the wear resistance of the surface of a spray needle of a marking machine comprises the following steps:
1) preparing before coating:
cleaning a vacuum cavity: and installing a rotating frame, removing dirt in the vacuum cavity, and sucking dust by using a dust collector. 4 tungsten filaments are wound on the four pairs of wiring terminals fixed in the cavity.
Cleaning a sample: alkali washing: with Na2CO3And (4) ultrasonically cleaning the solution. Adding 100g of Na2CO3Dissolving in 4L deionized water, heating to 80 deg.C, ultrasonic frequency 70Hz, and cleaning for 10 min. And (4) carrying out ultrasonic cleaning by using an industrial cleaning agent. The ratio of the industrial cleaning agent to the deionized water is 1:3, heating to 70 ℃, and cleaning for 20min at the ultrasonic frequency of 70 Hz. Washing twice with deionized water: a flowing water source is used.
Alcohol cleaning: placing the sample in a beaker filled with absolute ethyl alcohol, placing the sample in an ultrasonic cleaning machine for cleaning for 20min, taking out the sample for drying, and then placing the sample in a drying box at 150 ℃ for drying for 30 min. Fixing the spray needle on a rotating frame, determining that the filament, the target material and the cavity are insulated, driving the spray needle to rotate by the rotating frame, wiping a sealing ring on the vacuum cavity door with alcohol, and closing the vacuum cavity door.
2) Vacuumizing in the vacuum cavity: starting the mechanical pump, vacuumizing to 8Pa after the mechanical pump runs stably, then starting the molecular pump, and finely pumping to reduce the pressure in the vacuum cavity to 3 multiplied by 10 after the pump speed reaches more than 2000r/min-3Pa below, set at 400 deg.C, heating and vacuum-pumping to remove water vapor in the vacuum chamber. When the temperature is raised to 400 ℃, the temperature is preserved, so that the pressure in the vacuum cavity is reduced to 3 multiplied by 10-3Pa or less, the heating was stopped. Argon gas and nitrogen gas were introduced at an argon flow rate of 100sccm and a nitrogen flow rate of 20 sccm.
3) Cleaning before film coating: after the temperature in the vacuum cavity is reduced to 120 ℃, closing nitrogen, opening 4 filaments, setting the power of the filaments to be 40 percent of rated power, setting the rated power to be 5000W, preheating the filaments for 20min, slowly adjusting the bias voltage of the filaments to-120V, and then slowly adjusting the power of the filaments until the current of the filaments reaches 5A. Rotating the rotating frame, turning on a matrix power supply, introducing argon and hydrogen, wherein the gas flow is 100sccm, adjusting the pulse bias to-120V for low-bias cleaning, and cleaning for 15 min. Then the bias was adjusted to-300V, and the rest was left unchanged and washed for 15 min. And (4) turning on a target power supply of the titanium targets, adjusting the target current to 5A, and cleaning for 15 min. .
4) Film coating: after cleaning, the direct current bias voltage of the substrate is adjusted to-50V, the flow rate of argon is controlled to be 120sccm, the flow rate of nitrogen is controlled to be 80sccm, and the pressure in the vacuum cavity is 0.5 Pa. The filament current is adjusted to be 5A, the target current is adjusted to be 5A, the baffle is opened, sputtering is started, and the sputtering time is 1 h.
5) Cooling after film coating: after the film coating is finished, the baffle plate is closed, and the target power supply, the matrix direct-current power supply and the filament power supply are closed; turning off the turret motor; after the temperature is reduced to 50 ℃, closing the nitrogen and relieving the pressure, and when the pressure of the vacuum chamber reaches 10 DEG C5And Pa, opening a vacuum cavity door, and taking out the sample.
By adopting the method, the titanium nitride film with the thickness of 1-1.5 mu m can be obtained on the surface of the spray needle, and the service life of the coated spray needle can be prolonged by more than 1 time.

Claims (2)

1. A method for improving the wear resistance of the surface of a spray needle of a marking machine is characterized by comprising the following steps:
1) mounting chromium, titanium, aluminum and silicon target materials required by coating on 1-4 target seats on the periphery of the vacuum cavity;
cleaning a spray needle:
alkali washing: na with the concentration of 20-50 g/L is used2CO3Ultrasonic cleaning the solution, heating to 70-80 ℃, and cleaning for 10-30 min at the ultrasonic frequency of 70 Hz;
ultrasonic cleaning with an industrial cleaning agent: diluting an industrial cleaning agent and deionized water by 1:3, adding the industrial cleaning agent and the deionized water into an ultrasonic cleaning machine, heating to 70-80 ℃, and cleaning for 10-30 min at the ultrasonic frequency of 70 Hz; washing the spray needle with deionized water;
alcohol cleaning: placing the spray needle in a beaker filled with absolute ethyl alcohol, placing the spray needle in an ultrasonic cleaning machine for cleaning for 10-30 min, taking out the spray needle for drying, and then placing the spray needle in a drying box at 100-200 ℃ for drying for 10-30 min;
2) vacuum cleaning before film coating:
fixing the spray needle on a self-rotating frame in a vacuum cavity, pre-vacuumizing to 1-20 Pa, starting a molecular pump, and vacuumizing to reduce the pressure in the cavity to 10 when the rotating speed of the molecular pump reaches more than 2000r/min-4～10-3Pa, heating to 200-400 ℃, preserving heat, and introducing argon and nitrogen;
opening 1-4 filaments, preheating the filaments for 15-30 min, cleaning at-50 to-200V low bias for 10-40 min, and cleaning at-200 to-400V high bias for 10-40 min; adjusting the target current to 1-10A, and cleaning the target for 10-40 min; cleaning an oxide layer and other impurities of the workpiece, and activating the surface of the workpiece; a pseudo diffusion layer is formed on the surface of the workpiece, which is beneficial to improving the binding force between the film layer and the surface of the workpiece;
3) film coating:
after the vacuum cleaning is finished, the direct current bias voltage of the substrate is adjusted to-50 to-100V, the flow of argon gas is controlled to be 100 to 200sccm, the flow of nitrogen gas is controlled to be 0 to 200sccm, and the pressure of the vacuum cavity is controlled to be 0.3 to 2.0 Pa; adjusting the current of the lamp filament to be 1-10A, turning on 1-4 target power supplies, turning on a baffle plate, and starting sputtering until the film coating is finished.
2. The method according to claim 1, wherein 4 filaments are wound around the vacuum chamber, and rectangular metal targets are respectively disposed on four walls of the vacuum chamber, wherein more than one target is selected from a chromium target, a titanium target, an aluminum target, and a silicon target.
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