CN110483763B - Branched phthalonitrile resin containing benzoyl structure and preparation method thereof - Google Patents
Branched phthalonitrile resin containing benzoyl structure and preparation method thereof Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
- C08G65/4012—Other compound (II) containing a ketone group, e.g. X-Ar-C(=O)-Ar-X for polyetherketones
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/48—Polymers modified by chemical after-treatment
Abstract
The invention belongs to the field of preparation of novel low-melting-point high-temperature-resistant high polymer materials, and provides a branched phthalonitrile resin containing a benzoyl structure and a preparation method thereof. The invention creatively introduces the benzoyl structure with rigidity and flexibility to obtain a novel branched phthalonitrile structure. The benzoyl group-containing branched phthalonitrile resin contains an aryl group and phthalonitrile group having excellent heat resistance, and the flexibility of the acyl structure imparts good solubility to the resin. The branched structure is used for increasing the crosslinking density, so that the heat resistance is improved, and the thermal stability is excellent. Glass transition temperature TgGreater than 500 deg.C, thermal decomposition temperature Td5%Can reach 553 ℃, is used as a novel branched phthalonitrile, expands the application range of phthalonitrile resin, and can be applied to high-tech fields such as microelectronics, aerospace and the like.
Description
Technical Field
The invention belongs to the technical field of preparation of novel low-melting-point high-temperature-resistant high polymer materials, and relates to novel low-melting-point high-temperature-resistant phthalonitrile resin containing a branched structure and a preparation method thereof.
Background
The phthalonitrile resin containing the benzoyl branched structure is a high-performance thermosetting resin, has excellent solubility, thermal stability, thermal oxidation stability, moisture resistance, flame retardance, chemical stability and mechanical performance, has wide application in the fields of aerospace, electronics, ships, machinery and the like, and has wide application prospect.
The branched phthalonitrile resin containing the benzoyl structure is high-temperature-resistant dissoluble high-performance thermosetting resin formed by polymerizing phthalonitrile structural units. The research of the resin is pioneering in the research laboratory of the American navy, and the phthalonitrile resin with various typical structures is prepared in the long-term research process.
The following documents list Phthalonitrile monomers which have been prepared synthetically in some recent years, Low melting point (Y.Han, D.Tang, G.Wang, Y.Guo, H.ZHou, W.Qiu, T.ZHao, Low melting polymeric resins and/or acrylic Polymers: Synthesis, curing behavor, thermal and mechanical Polymers, Eur.Polymer.J. 111(2019)104-113, H.Wang, J.Wang, H.Guo, X.Chen, X.Yu, Y.set, P.Ji, K.Naito, Z.Zhang, Q.Zhang, additive high molecular cellulose-butyl-phenolic resins, K.N.P.N.P.N.P.N.P.N.P.N.P.N.P.N.P.J.P.M.P.N.P.N.P.J.P.P.P.P.N.P.P.P.N.N.P.N.J.P.P.P.P.N.M.J.P.M.P.M.P.J.P.P.J.P.P.P.M.S., Z.J.P.P.P.P.P.P.P.P.J.P.P.P.P.J.P.P.P.P.P.P.P.P.P.M.S.P.P.P.N.M.M.M.M.M.M.M.C.C.P.M.M.J.P.M.M.M.M.P.P.M.M.M.P.C.P.M.M.J.P.P.C.P.P.C.P.P.C.P.P.M.M.M.M.P.P.M.C.M.P.P.P.P.C.P.M.C.C.M.C.C.C.M.P.P.C.C.C.C.C.C.C.M.C.P.P.C.C.P.M.P.P.C.C.C.C.C.C.C.C.C.P.C.C.C.M.C.P.P.P.P.P.P.P.P.C.P.P.P.C.C.C.C.P.P.P.C.C.P.M.P.C.C.C.C.C.C.C.C.C.C.C.C.P.P.J.C.P.P.P.P.P.P.C.P.P.P.C.C.C.C.P.P.P.C.C.P.P.P.P.P.P.P.P.P.P.P.P.P.C.C.C.C.C.C.C.C.C.C.C.C.C.P.C.C.C.P.P.P.C.C.P.P.P.C.C.C.C.C.C.C.C.C.C.C.C.C.C.P.C.C.P.C.C.C.C.C.C.C.C.C.C.C.C.P.P.C.C.P.C.C.P.P.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.C.D.C.D.C.C.C.C.C.C.C.C.C.C.D.C.C.C.C.C, appl.therm.eng.115(2017) 630-; still other studies have focused on functional and optical extensions (Y.Han, D.Tang, G.Wang, Y.Zhang, Y.Guo, H.ZHou, W.Qiu, T.ZHao, Crosslinkable hyperbranched poly (arylene ether nitrile) modifier for thermoplastic resins Synthesis, chain-end functionalization and Properties, Polymer 173(2019)88-102, W.ZHong, Y.ZHao, W.H.ZHuang, J.J.Wu, F.Z.Wang, C.H.Li, J.L.Zuo, Phosphorins: Fused-bed Synthesized chemical chemistry, chemical Synthesis 130, and chemical reaction 1568 (1568).
The phthalonitrile monomer mostly takes a benzene ring as a basic skeleton and is mostly in a linear structure, and the polymer and the composite material thereof show excellent heat resistance and mechanical property.
Disclosure of Invention
In order to expand the structural diversity, aiming at exploring a novel low-melting-point high-temperature-resistant phthalonitrile structure, a benzoyl structure and a branched structure which have rigidity and flexibility are introduced into a main chain of a polymer to prepare a branched novel low-melting-point high-temperature-resistant phthalonitrile resin, so that the application range and the application prospect of the branched novel low-melting-point high-temperature-resistant phthalonitrile resin are expanded, the obtained novel resin can have good solubility in various low-boiling-point solvents, and the cured resin also has excellent thermal stability.
The technical scheme of the invention is as follows:
a branched phthalonitrile resin containing a benzoyl structure has the following chemical structure:
wherein m is more than or equal to 1, n is more than or equal to 1, and Z is more than or equal to 1;
one or a combination of two or more of them; wherein, R, R1、R2、R3、R4、R5、R6、R7、R8Structure of (1)Comprises the following steps: H. f, Cl, Br, I, CN, NH2、Cr+1H2r+2、CrH2r+1、CrH2r+1COOH、CrH2r+1COOCrH2r+1、CF3、 One or more than two of the (a) and r is more than or equal to 1; r, R1、R2、R3、R4、R5、R6、R7And R8The same or different.
A preparation method of branched phthalonitrile resin containing a benzoyl structure comprises the following polymerization reaction formula:
wherein m is more than or equal to 1, n is more than or equal to 1, Z is more than or equal to 1, and X is F, Cl, Br or I;
the preparation method comprises the following specific steps:
under the protection of inert gas, the compound containing benzoyl structureTrihalomonomer of (a) or (b) and (c) containingMixing structural diphenol monomer and alkali, adding strong polar aprotic solvent and azeotropic solvent, carrying out water treatment on the reaction system at the temperature of 90-140 ℃, removing the azeotropic solvent after reacting for 2-3 hours, and heating to 150-220 ℃ for reacting for 8-12 hours; when the temperature is reduced to 60-90 ℃, 4-nitrophthalonitrile is added for reaction for 10-12 hours; then pouring the product into excessive 0.1-0.2mol/L diluted hydrochloric acid, washing the filtrate to be neutral by using distilled water, and carrying out vacuum drying at 80-120 ℃ for 24-48 hours to obtain the benzoyl structure-containing branched phthalonitrile prepolymerAnd is ready for use; whereinAnd containing benzoyl structureThe molar ratio of (A) to (B) is 3 to 4.2; comprisesThe mol ratio of structural diphenol monomer to alkali is 1.2-1.6:1, and the volume mL of the strong polar aprotic solvent is 5-20 timesStructural bisphenols andthe sum of the mass g, the volume of the azeotropic solvent is 0.5 to 2 times of the volume of the strong polar aprotic solvent, the molar weight of the 4-nitrophthalonitrile is 1.2 to 1.4 times of the excess hydroxyl, wherein the excess hydroxyl isWith benzoyl structureThe residual hydroxyl after the reaction of the trihalo monomer;
and (3) curing: mixing the benzoyl structure-containing branched phthalonitrile prepolymer with aromatic diamine, fully mixing and stirring, compounding with glass fiber to obtain a laminated board, placing the laminated board in a muffle furnace at 250-375 ℃ for temperature programming and curing for 16 hours to finally obtain the cured benzoyl structure-containing branched phthalonitrile resin; wherein the mass ratio of the benzoyl structure-containing branched phthalonitrile prepolymer to the aromatic diamine is 1: 0.05.
wherein, X structure is: x is one of F, Cl, Br and I;
when the temperature is below zero ℃, adding fluorobenzene into a reactor, then gradually adding anhydrous aluminum trichloride by using a feeder, uniformly stirring, adding 1,3, 5-benzene trimethyl acyl chloride, stirring, removing the reactor from a constant temperature tank, reacting at room temperature for 10-24 hours, and heating to 90 ℃ for 2 hours; after cooling to room temperature, pouring the product into a glacial acid bath, washing a filter cake with distilled water, and performing vacuum drying at 80-120 ℃ for 24-48 hours to obtain a monomer 1,3, 5-tris (4-fluorobenzoyl) benzene (TB) for later use; wherein the molar ratio of the 1,3, 5-benzene trimethyl chloride to the fluorobenzene is 1:1.9, and the molar ratio of the 1,3, 5-benzene trimethyl chloride to the aluminum trichloride is 1: 2.4;
when the temperature is below zero ℃, chlorobenzene is firstly added into a reactor, then anhydrous aluminum trichloride is gradually stirred by a feeder uniformly, 1,3, 5-benzene trimethyl acyl chloride is added, the mixture is stirred, the reactor is moved out of a constant temperature tank, and after the mixture reacts for 10 to 24 hours at room temperature, the temperature is raised to 90 ℃ for reaction for 2 hours; after cooling to room temperature, pouring the product into a glacial acid bath, washing a filter cake with distilled water, and performing vacuum drying at 80-120 ℃ for 24-48 hours to obtain a monomer 1,3, 5-tri (4-chlorophenyl) benzene (TB) for later use; wherein the molar ratio of the 1,3, 5-benzene trimethyl acyl chloride to the chlorobenzene is 1:2.1, and the molar ratio of the 1,3, 5-benzene trimethyl acyl chloride to the aluminum trichloride is 1: 2.6;
when the temperature is below zero, bromobenzene is firstly added into a reactor, then anhydrous aluminum trichloride is gradually stirred uniformly by a feeder, 1,3, 5-benzene trimethyl acyl chloride is added, the mixture is stirred, the reactor is moved out of a constant temperature tank, the temperature is increased to 90 ℃ for reaction for 2 hours after the reaction is carried out for 10 to 24 hours at room temperature; after cooling to room temperature, pouring the product into a glacial acid bath, washing a filter cake with distilled water, and carrying out vacuum drying at 80-120 ℃ for 24-48 hours to obtain a monomer 1,3, 5-tris (4-bromobenzoyl) benzene (TB) for later use; wherein the molar ratio of the 1,3, 5-benzene trimethyl acyl chloride to the bromobenzene is 1:2.3, and the molar ratio of the 1,3, 5-benzene trimethyl acyl chloride to the aluminum trichloride is 1: 2.8;
the inert gas is one of nitrogen, argon and helium.
The alkali is one or more of potassium carbonate, cesium carbonate, sodium hydroxide and potassium hydroxide.
The strong polar aprotic solvent is one or a mixture of more than two of N, N-methylformamide, N-methylacetamide, dimethyl sulfoxide and N-methylpyrrolidone.
The azeotropic solvent is one or more of toluene, xylene and chlorobenzene.
The aromatic diamine is one or the mixture of more than two of 4,4 '-diaminodiphenyl sulfone, 4' -diaminodiphenyl ether, 4 '-diaminodiphenyl methane, 1, 3-di (4-aminophenoxy) benzene, 4' -bis (4-aminophenoxy) diphenyl sulfone, 2, 6-di (4-aminophenoxy) benzonitrile and 2, 4-di [4- (4-aminophenoxy) phenyl ] -6-phenyl-1, 3, 5-triazine.
The invention has the beneficial effects that: introducing benzoyl and combining with a branched structure to obtain a novel branched phthalonitrile resin structure. The trifunctional monomer containing the benzoyl structure has the characteristic of compatibility between rigidity and flexibility, and is introduced into the main chain of phthalonitrile resin to show good processability, and the branched structure is added to increase the crosslinking density, so that the thermal property of the resin is excellent, and the thermal decomposition temperature (T) is highd5%) A glass transition temperature (T) of 553 ℃ at the maximumg) Over 500 ℃, as a novel branched phthalonitrile, the application range of phthalonitrile resin is expanded and the method can be appliedThe method is used in high-tech fields such as ships, aerospace and the like.
Drawings
FIG. 1 is a nuclear magnetic hydrogen spectrum of hydroquinone branched phthalonitrile (TBHQPh);
FIG. 2 is an infrared spectrum of hydroquinone branched phthalonitrile (TBHQPh).
Detailed Description
The following further describes a specific embodiment of the present invention with reference to the drawings and technical solutions.
Example 1
Monomer synthesis: when the temperature is below zero ℃, 4.8 g (0.095mol) of fluorobenzene is firstly added into a reactor, then 16 g (0.12mol) of anhydrous aluminum trichloride is gradually added into the reactor by a feeder, after uniform stirring, 13.25 g (0.05mol) of 1,3, 5-benzene tricarboxychloride is added, after stirring for a period of time, the reactor is removed from a constant temperature tank, and after 10-24 hours of reaction at room temperature, the temperature is increased to 90 ℃ for 2 hours of reaction. After cooling to room temperature, pouring the product into a glacial acid bath, washing a filter cake with distilled water, and performing vacuum drying at 80-120 ℃ for 24-48 hours to obtain a monomer 1,3, 5-tris (4-fluorobenzoyl) benzene (TB) for later use;
prepolymer synthesis: adding 0.025 mol of TB, 0.09 mol of hydroquinone, 0.108 mol of catalyst anhydrous potassium carbonate into a reactor, adding 210.2ml of solvent NMP, adding 106ml of toluene with the volume of the solvent, adding water into the toluene at 130 ℃ for 2 hours, evaporating the toluene at 150 ℃, and reacting for 8 hours; adding 0.126 mol of 4-nitrophthalonitrile for end capping and 20ml of solvent NMP; the reaction is carried out for 10 to 12 hours at the temperature of 80 ℃; then pouring the product into 500ml of 0.1 mol/L diluted hydrochloric acid, washing the filtrate to be neutral by using distilled water, and carrying out vacuum drying for 24 hours at 80 ℃ to obtain a branched phthalonitrile prepolymer for later use;
and (3) curing: weighing 10 g of the branched phthalonitrile prepolymer obtained above, mixing with 0.5 g of aromatic diamine, fully mixing and stirring, compounding with quartz fiber to obtain a laminated board, and placing in a muffle furnace for heating and curing by adopting a program of 250 ℃/3 h, 325 ℃/3 h, 350 ℃/2 h and 375 ℃/8 h to finally obtain the branched phthalonitrile resin.
FIG. 1 is a nuclear magnetic hydrogen spectrum of hydroquinone branched phthalonitrile (TBHQPh), and it can be seen from the figure that the baseline of the spectrum is flat and the peak shape is clear. Through calculation, each hydrogen in the monomer structure is proved in a nuclear magnetic hydrogen spectrum, and the synthesized structure is proved to be hydroquinone branched phthalonitrile.
FIG. 2 shows an infrared spectrum of hydroquinone-branched phthalonitrile (TBHQPh) at 2231cm-1An extensional vibration absorption peak of 1658cm which is-CN-11240cm, which is the stretching vibration absorption peak of carbonyl group-1Is the absorption peak of the stretching vibration of the aromatic ether. And (4) combining the infrared spectrogram and the nuclear magnetic hydrogen spectrum to show that the obtained structure is consistent with the designed structure.
The thermal decomposition temperature of the branched phthalonitrile prepared according to the method under the conditions of air and nitrogen is as follows:
(1) air: t isid(initial thermal decomposition temperature) 481 ℃ C, T5%(5% temperature of thermal weight loss) 527 ℃ and the carbon residue rate (800 ℃) 11.3%;
(2) nitrogen gas: t isid(initial thermal decomposition temperature) 496 ℃ C. T5%The heat loss 5% temperature was 536 ℃ and the char yield (800 ℃) was 79.3%, showing excellent heat resistance.
Example 2
The monomer synthesis procedure was the same as in example 1.
Prepolymer synthesis: adding 0.025 mol of TB, 0.09 mol of resorcinol and 0.108 mol of catalyst anhydrous potassium carbonate into a reactor, adding 210.2ml of solvent NMP, adding 106ml of toluene with the volume of the solvent, adding water into the toluene at 130 ℃ for 2 hours, evaporating the toluene at 150 ℃, and reacting for 8 hours; adding 0.126 mol of 4-nitrophthalonitrile for end capping and 20ml of solvent NMP; the reaction is carried out for 10 to 12 hours at the temperature of 80 ℃; then, the product was poured into 500ml of 0.1 mol/L diluted hydrochloric acid, and after the filtrate was washed with distilled water to neutrality, it was vacuum-dried at 80 ℃ for 24 hours to obtain a branched phthalonitrile prepolymer. The structural formula is as follows:
the curing procedure was the same as in example 1.
The thermal decomposition temperature of the branched phthalonitrile prepared according to the method under the conditions of air and nitrogen is as follows:
(1) air: t isid(initial pyrolysis temperature) 475 ℃, T5%(5% of thermal weight loss temperature) 524 ℃, and carbon residue rate (800 ℃) 4%;
(2) nitrogen gas: t isid(initial thermal decomposition temperature) 498 ℃ C, T5%The heat loss 5% temperature was 540 ℃ and the char yield (800 ℃) was 77.8%, showing excellent heat resistance.
Example 3
The monomer synthesis procedure was the same as in example 1.
Prepolymer synthesis: 0.025 mol of TB and 0.09 mol of 4- (4-hydroxy) phenyl-2, 3-naphthyridin-1-one (DHPZ), 0.108 mol of anhydrous potassium carbonate as a catalyst, 210.2ml of NMP as a solvent, 106ml of toluene as a solvent volume, water-carrying toluene at 130 ℃ for 2 hours, and reacting at 150 ℃ for 8 hours after evaporating toluene; adding 0.126 mol of 4-nitrophthalonitrile for end capping and 20ml of solvent NMP; the reaction is carried out for 10 to 12 hours at the temperature of 80 ℃; then, the product was poured into 500ml of 0.1 mol/L diluted hydrochloric acid, and after the filtrate was washed with distilled water to neutrality, it was vacuum-dried at 80 ℃ for 24 hours to obtain a branched phthalonitrile prepolymer. The structural formula is as follows:
the curing procedure was the same as in example 1.
The thermal decomposition temperature of the DHPZ-type phthalonitrile prepared by the method under the conditions of air and nitrogen is as follows:
(1) air: t isid(initial thermal decomposition temperature) 590 ℃ C., T5%(Heat loss)Weight 5%) 540 ℃, and carbon residue (800 ℃), 12%;
(2) nitrogen gas: t isid(initial pyrolysis temperature) 508 ℃ C, T5%The heat loss 5% temperature was 550 ℃ and the char yield (800 ℃) was 78.1%, showing excellent heat resistance.
Claims (10)
1. The benzoyl structure-containing branched phthalonitrile resin is characterized by having the following chemical structure:
wherein m is more than or equal to 1, n is more than or equal to 1, and Z is more than or equal to 1;
2. The method for preparing the branched phthalonitrile resin containing the benzoyl structure according to claim 1, wherein the polymerization reaction formula is as follows:
wherein m is more than or equal to 1, n is more than or equal to 1, Z is more than or equal to 1, and X is F, Cl, Br or I;
the preparation method comprises the following specific steps: under the protection of inert gas, the compound containing benzoyl structureTrihalomonomer of (a) or (b) and (c) containingMixing structural diphenol monomer and alkali, adding strong polar aprotic solvent and azeotropic solvent, carrying out water treatment on the reaction system at the temperature of 90-140 ℃, removing the azeotropic solvent after reacting for 2-3 hours, and heating to 150-220 ℃ for reacting for 8-12 hours; when the temperature is reduced to 60-90 ℃, 4-nitrophthalonitrile is added for reaction for 10-12 hours; then pouring the product into excessive 0.1-0.2mol/L diluted hydrochloric acid, washing the filtrate to be neutral by using distilled water, and carrying out vacuum drying for 24-48 hours at the temperature of 80-120 ℃ to obtain a branched phthalonitrile prepolymer containing a benzoyl structure for later use; whereinAnd containing benzoyl structureThe molar ratio of (A) to (B) is 3 to 4.2; comprisesThe mol ratio of structural diphenol monomer to alkali is 1.2-1.6:1, and the volume mL of the strong polar aprotic solvent is 5-20 timesStructural bisphenols andthe sum of the mass g, the volume of the azeotropic solvent is 0.5 to 2 times of the volume of the strong polar aprotic solvent, the molar weight of the 4-nitrophthalonitrile is 1.2 to 1.4 times of the excess hydroxyl, wherein the excess hydroxyl isWith benzoyl structureThe residual hydroxyl after the reaction of the trihalo monomer;
and (3) curing: mixing the benzoyl structure-containing branched phthalonitrile prepolymer with aromatic diamine, fully mixing and stirring, compounding with glass fiber to obtain a laminated board, placing the laminated board in a muffle furnace at 250-375 ℃ for temperature programming and curing for 16 hours to finally obtain the cured benzoyl structure-containing branched phthalonitrile resin; wherein the mass ratio of the branched phthalonitrile prepolymer containing the benzoyl structure to the aromatic diamine is 1: 0.05;
wherein, X structure is: x is one of F, Cl, Br and I.
3. The production method according to claim 2,
when the temperature is below zero, adding fluorobenzene into a reactor, then gradually adding anhydrous aluminum trichloride by using a feeder, uniformly stirring, adding 1,3, 5-benzenetricarboxychloride, stirring, removing the reactor from a constant temperature tank, reacting at room temperature for 10-24 hours, and heating to 90 ℃ for reacting for 2 hours; after cooling to room temperature, pouring the product into a glacial acid bath, washing a filter cake with distilled water, and performing vacuum drying at 80-120 ℃ for 24-48 hours to obtain monomer 1,3, 5-tri (4-fluorobenzoyl) benzene for later use; wherein the molar ratio of the 1,3, 5-benzene trimethyl chloride to the fluorobenzene is 1:1.9, and the molar ratio of the 1,3, 5-benzene trimethyl chloride to the aluminum trichloride is 1: 2.4;
when the temperature is below zero ℃, chlorobenzene is firstly added into a reactor, then anhydrous aluminum trichloride is gradually added by a feeder, after the mixture is uniformly stirred, 1,3, 5-benzene trimethyl acyl chloride is added, the mixture is stirred, the reactor is moved out of a constant temperature tank, after the mixture reacts for 10 to 24 hours at room temperature, the temperature is raised to 90 ℃ for reaction for 2 hours; after cooling to room temperature, pouring the product into a glacial acid bath, washing a filter cake with distilled water, and carrying out vacuum drying at 80-120 ℃ for 24-48 hours to obtain a monomer 1,3, 5-tri (4-chlorophenyl) benzene for later use; wherein the molar ratio of the 1,3, 5-benzene trimethyl acyl chloride to the chlorobenzene is 1:2.1, and the molar ratio of the 1,3, 5-benzene trimethyl acyl chloride to the aluminum trichloride is 1: 2.6;
when the temperature is below zero, bromobenzene is firstly added into a reactor, then anhydrous aluminum trichloride is gradually added by a feeder, after the mixture is uniformly stirred, 1,3, 5-benzene trimethyl acyl chloride is added, the mixture is stirred, the reactor is moved out of a constant temperature tank, after the mixture reacts for 10 to 24 hours at room temperature, the temperature is raised to 90 ℃ for reaction for 2 hours; after cooling to room temperature, pouring the product into a glacial acid bath, washing a filter cake with distilled water, and carrying out vacuum drying at 80-120 ℃ for 24-48 hours to obtain monomer 1,3, 5-tri (4-bromobenzoyl) benzene for later use; wherein the molar ratio of the 1,3, 5-benzene trimethyl chloride to the bromobenzene is 1:2.3, and the molar ratio of the 1,3, 5-benzene trimethyl chloride to the aluminum trichloride is 1: 2.8.
4. The production method according to claim 2 or 3,
the strong polar aprotic solvent is one or a mixture of more than two of N, N-methylformamide, N-methylacetamide, dimethyl sulfoxide and N-methylpyrrolidone;
the azeotropic solvent is one or more of toluene, xylene and chlorobenzene.
5. The production method according to claim 4,
the aromatic diamine is one or the mixture of more than two of 4,4 '-diaminodiphenyl sulfone, 4' -diaminodiphenyl ether, 4 '-diaminodiphenyl methane, 1, 3-di (4-aminophenoxy) benzene, 4' -bis (4-aminophenoxy) diphenyl sulfone, 2, 6-di (4-aminophenoxy) benzonitrile and 2, 4-di [4- (4-aminophenoxy) phenyl ] -6-phenyl-1, 3, 5-triazine.
6. The production method according to claim 2,3 or 5,
the inert gas is one of nitrogen, argon and helium.
7. The production method according to claim 4,
the inert gas is one of nitrogen, argon and helium.
8. The production method according to claim 2,3, 5 or 7,
the alkali is one or more of potassium carbonate, cesium carbonate, sodium hydroxide and potassium hydroxide.
9. The production method according to claim 4,
the alkali is one or more of potassium carbonate, cesium carbonate, sodium hydroxide and potassium hydroxide.
10. The production method according to claim 6,
the alkali is one or more of potassium carbonate, cesium carbonate, sodium hydroxide and potassium hydroxide.
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