CN110482873A - Application of the metal film in the softening temperature for improving substrate of glass - Google Patents

Application of the metal film in the softening temperature for improving substrate of glass Download PDF

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Publication number
CN110482873A
CN110482873A CN201910884303.7A CN201910884303A CN110482873A CN 110482873 A CN110482873 A CN 110482873A CN 201910884303 A CN201910884303 A CN 201910884303A CN 110482873 A CN110482873 A CN 110482873A
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film
glass
metal
target
sputtering
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张冷
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Jinling Institute of Technology
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Jinling Institute of Technology
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001General methods for coating; Devices therefor
    • C03C17/002General methods for coating; Devices therefor for flat glass, e.g. float glass
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/06Surface treatment of glass, not in the form of fibres or filaments, by coating with metals
    • C03C17/09Surface treatment of glass, not in the form of fibres or filaments, by coating with metals by deposition from the vapour phase
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3649Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer made of metals other than silver
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/36Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal
    • C03C17/3602Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer
    • C03C17/3668Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties
    • C03C17/3678Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating being a metal the metal being present as a layer the multilayer coating having electrical properties specially adapted for use in solar cells
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14Metallic material, boron or silicon
    • C23C14/18Metallic material, boron or silicon on other inorganic substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/35Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/25Metals
    • C03C2217/251Al, Cu, Mg or noble metals
    • C03C2217/254Noble metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/25Metals
    • C03C2217/257Refractory metals
    • C03C2217/258Ti, Zr, Hf
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/25Metals
    • C03C2217/257Refractory metals
    • C03C2217/259V, Nb, Ta
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00Coatings on glass
    • C03C2217/20Materials for coating a single layer on glass
    • C03C2217/25Metals
    • C03C2217/257Refractory metals
    • C03C2217/26Cr, Mo, W
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/10Deposition methods
    • C03C2218/15Deposition methods from the vapour phase
    • C03C2218/154Deposition methods from the vapour phase by sputtering
    • C03C2218/156Deposition methods from the vapour phase by sputtering by magnetron sputtering
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00Methods for coating glass
    • C03C2218/30Aspects of methods for coating glass not covered above
    • C03C2218/365Coating different sides of a glass substrate

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Sustainable Development (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

The present invention provides application of the metal film in the softening temperature for improving substrate of glass, metallic film is coated in glass using magnetically controlled sputter method on one side, the metal film is at least one of metal Cr film, metal Mo film, Pt metal film, metal W film, metal Ti film, metal V film;The softening temperature of glass can be improved, softening temperature is improved from 550 DEG C to 610 DEG C, this has further widened the temperature application range of glass.

Description

Application of the metal film in the softening temperature for improving substrate of glass
Technical field
The invention belongs to glass and its arts, specifically metal film answering in the softening temperature for improving substrate of glass With.
Background technique
Glass is widely used in scientific research and industrial circle, substrate, FPD including being applied to solar cell Substrate etc..The problem of researcher is commonly encountered is that the softening temperature of Conventional glass is relatively low, as soda-lime glass and Pyrex are logical The problem of warpage, deformation softening often occur at 550 DEG C or more.This is because when glass is heated, due to structural relaxation, viscosity It can gradually decrease.When reaching certain temperature, glass just becomes flowable state by solid-state, that is, softens.As substrate After glass deformation softening, functional layer film plated thereon can be dissolved to inside glass or trickle with glass precursor solution, so that at this Functional layer film performance at a temperature of one is difficult to detect and be unable to get the functional layer film product at a temperature of this.This is unfavorable for Research is higher than the properties of plated made membrane on 550 DEG C of glass, so that the temperature limit of glass is limited, in addition, high temperature Under the glass that is in a liquid state stick on sample stage or specimen holder, cleaning to follow-up equipment and research, production work are repeated Property brings difficulty.
Summary of the invention
The technical problem to be solved by the present invention is to, provide a kind of the soft of glass to can be improved in view of the deficiencies of the prior art Change temperature method, it is intended to solve the problems, such as the softening temperature of glass it is lower, can temperature limit it is narrow.
In order to solve the above-mentioned technical problem, the technical solution adopted by the present invention is as follows:
Application of the metal film in the softening temperature for improving substrate of glass.
Specifically, the metal film is one layer or more, is coated on the one side of substrate of glass;It is prepared by the another side of substrate of glass Functional layer.
Preferably, the metal film is metal Cr film, metal Mo film, Pt metal film, metal W film, metal Ti At least one of film, metal V film.
The softening temperature of glass can be improved in the metal film that is coated on one side of glass, be because these metals all have more than glass The fusing point of glass softening temperature, it may have certain intensity and ductility, when glass softens internal viscosity reduction, metal film is risen Certain supporting role is arrived, it is suppressed that the flowing of glass molecule;When temperature further increases, the viscosity of inside glass is into one Step reduces, and the mobility of glass molecule improves, and the supporting role of metal film cannot inhibit the flowing of glass molecule, therefore glass bend Song deformation.
Softening temperature proposed by the present invention that be coated with metal on one side and improve glass by glass, it is desirable that the gold being coated with Belong to the necessary fusing point with higher of film, such as metal Bi, Sn, fusing point is very low, and metal first dissolves before Glass Transition, this In the case of cannot improve the softening temperature of glass.
Further, the thickness of single-layer metal film is not higher than 1500nm.
Specifically, metal film is coated with using the method for magnetron sputtering metal targets on the glass substrate.
The method that metal film magnetron sputtering is coated with are as follows:
Metallic film is prepared using the method for magnetron sputtering metal targets.Concrete technology flow process are as follows:
(1) sample is placed installs with target
Sheet glass to be sputtered is placed in above sample stage, target is mounted on target position, closes vacuum chamber chamber door;
(2) it vacuumizes
Mechanical pump is opened to vacuum chamber to 2~5Pa, the molecular pump in vacuum suction device is opened, to vacuum chamber It is evacuated to (1.0~3.0) × 10-3Pa;
(3) pre-sputtering target
Argon gas is poured into vacuum chamber, until vacuum chamber room pressure maintains 1.2~2.0Pa, opens target power supply, control is splashed Penetrating power density is 0.6~1.4W/cm2, pre-sputtering 10~20min of target, when pre-sputtering target, sample stage is moved to far from target One end of material;
(4) magnetron sputtering plating
Sample stage is moved to immediately ahead of target, formal sputtering, in order to guarantee uniformity of film, sample stage is inside target It moves back and forth;The thickness of sputter coating is controlled by adjusting sputtering power, sputtering time;
(5) plated film terminates, samples
Shielding power supply is closed, closes flowmeter, molecular pump and mechanical pump, argon gas or air are poured into vacuum chamber makes vacuum Room pressure is equal to atmospheric pressure, opens vacuum chamber, takes out powder, and plated film terminates.
The sputtering pressure that the present invention uses is 1.5-2.0Pa, and when air pressure is higher, the atom come out from target as sputter is to base It will receive the scattering of more gas molecule when bottom is getted over, energy is smaller when reaching substrate, therefore atomic arrangement is loose, consistency Lower, film residual stress is smaller, also smaller in the thermal stress that subsequent processes generate, the binding force between film and glass Preferably.
The utility model has the advantages that
The present invention is coated with metallic film in glass using magnetically controlled sputter method on one side, and the softening temperature of glass can be improved Degree, softening temperature are improved from 550 DEG C to 610 DEG C, this has further widened the temperature application range of glass.
Detailed description of the invention
The present invention is done with reference to the accompanying drawings and detailed description and is further illustrated, of the invention is above-mentioned And/or otherwise advantage will become apparent.
Fig. 1 is the structural schematic diagram of 1 soda-lime glass substrate plating metal Cr film of embodiment.
Fig. 2 is that embodiment 1 plates membrane sample softening temperature test device figure.
Fig. 3 is that embodiment 3CIGS prefabricated membrane is annealed the film morphology of 40min at 550 DEG C.
Fig. 4 is that embodiment 3CIGS prefabricated membrane is annealed the film morphology of 40min at 600 DEG C.
Wherein, each appended drawing reference respectively represents: 1 other functional layers;2 soda-lime glass substrates;3 Cr thin films;4, plated film sample Product;5, quartz ampoule.
Specific embodiment
According to following embodiments, the present invention may be better understood.
Embodiment 1: different-thickness Cr thin film is coated on soda-lime glass
Metallic film is prepared using the method for magnetron sputtering C r metal targets.Concrete technology flow process are as follows:
(1) sample is placed installs with target
Sheet glass to be sputtered is placed in above sample stage, target is mounted on target position, closes vacuum chamber chamber door;
(2) it vacuumizes
Mechanical pump is opened to vacuum chamber to 5Pa, opens the molecular pump in vacuum suction device, vacuum chamber is taken out true Sky is to 2.0 × 10-3Pa;
(3) pre-sputtering target
Argon gas is poured into vacuum chamber, until vacuum chamber room pressure maintains 1.5Pa, opens target power supply, control sputtering function Rate density is 0.9W/cm2, pre-sputtering target 10min, when pre-sputtering target, sample stage is moved to one end far from target;
(4) magnetron sputtering plating
Sample stage is moved to immediately ahead of target, formal sputtering, in order to guarantee uniformity of film, sample stage is inside target It moves back and forth;The thickness of sputter coating is controlled by adjusting sputtering power, sputtering time;
(5) plated film terminates, samples
Shielding power supply is closed, closes flowmeter, molecular pump and mechanical pump, argon gas or air are poured into vacuum chamber makes vacuum Room pressure is equal to atmospheric pressure, opens vacuum chamber, takes out powder, and plated film terminates.
As shown in Figure 1, being coated with Cr thin film 3 and its respectively on the two sides of soda-lime glass substrate 2 respectively using above-mentioned steps His functional layer 1 (semiconductive thin film), obtain Cr thin film thickness be respectively 100nm, 300nm, 900nm, 1200nm, 1500nm, The plating membrane sample 4 of 1800nm, 2100nm.
The conventional method of glass transition temperature test at present includes glass fiber horizontal sheet process, plavini, glass fiber vertical elongated Method, principle are that its physical parameter is changed to a certain critical point and determines its softening temperature after glass fiber is heated, these tests It is uniform everywhere that method requires glass sample to need.For the glass proposed by the present invention for being coated with layer of metal film, glass fiber is difficult To obtain, so these types of test method is difficult to measure its softening temperature.
The present invention heats sample using quartz tube furnace, and plating membrane sample 4, quartz are vacantly placed in quartz ampoule 5 The internal diameter of pipe 5 is 80mm, and the size of plating membrane sample 4 is 76mm*25mm, by glass sample length direction along quartzy bore side To placement, as shown in Figure 1.The sample of be coated with metal film is heated, in order to prevent in air the gases such as oxygen to glass Hot physical property have an impact, first quartz ampoule is vacuumized, then inert gas is filled with into quartz ampoule.Its rate of heat addition, which is arranged, is 10-20 DEG C/min, until reaching predetermined temperature TsAfterwards, 30min, then, Temperature fall are kept the temperature.It is cooled to room temperature, opens furnace body Chamber lid observes the glass sample in quartz ampoule.If glass sample is bent downwardly, illustrate softening temperature lower than Ts;If glass sample Keep straight, then softening temperature is higher than Ts
Table 1 show and is coated with the corresponding glass transition temperature of different-thickness metal Cr on soda-lime glass, hair there are currently no When being coated with metal Cr film, the softening temperature of soda-lime glass is 550 DEG C, with the increase of thickness of metal film, the softening temperature of glass Degree increases, until, with the increase of thickness of metal film, glass transition temperature no longer improves after metal film thickness is 1500nm.
Table 1
Cr film thickness/nm 0 100 300 900 1200 1500 1800 2100
Softening temperature/DEG C 550 565 570 590 600 610 610 610
Embodiment 2: 1000nm different metal film is coated on Pyrex
Film plating process is similar to Example 1, is coated with the different gold of 1000nm on borosilicate glass using different metal targets Belong to film.The softening temperature test method for plating membrane sample is same as Example 1.
Table 2 show and is coated with the corresponding glass transition temperature of 1000nm metal film on borosilicate glass, and discovery is coated with metal When film thickness is identical, each sample glass transition temperature is close.
Table 2
Metallic film type Cr Mo Pt W Ti V
Softening temperature/DEG C 595 595 595 595 595 595
Embodiment 3
Copper indium gallium selenide (CIGS) solar cell is multi-layer film structure, and determine CIGS solar cell transfer efficiency is to absorb Layer --- the performance of cigs layer.After obtaining CIGS prefabricated membrane, need to be heat-treated it to improve its crystallite dimension and electricity Learn performance.However since the conventional use of sodium glass transition temperature is 550 DEG C, the maximum temperature one of CIGS prefabricated membrane heat treatment As be arranged at 550 DEG C hereinafter, which has limited film crystallite dimension and electric properties.
Using the glass for being coated with Mo layers of metal of the invention, CIGS prefabricated membrane is respectively placed at 550 DEG C and 600 DEG C heat Reason.As a result as shown in Figure 3 and Figure 4, the crystallite dimension of annealing thin film is bigger at 600 DEG C of discovery, and electric property is more excellent, and electricity Pond transfer efficiency further increases.The corresponding battery efficiency of film of annealing 40min is 14.4% at 550 DEG C, and short circuit current is 33.5mA/cm2, the corresponding battery efficiency of film for the 40min that anneals at 600 DEG C is 10.2%, short circuit current 28.6mA/cm2。 The defect density contained inside the big film of crystallite dimension is lower, and carrier lifetime is higher, thus short circuit current is higher, battery effect Rate is also higher.
The present invention provides the thinking and method of a kind of application of metal film in the softening temperature for improving substrate of glass, tools Body realizes that there are many method of the technical solution and approach, the above is only a preferred embodiment of the present invention, it is noted that right For those skilled in the art, without departing from the principle of the present invention, several improvement can also be made And retouching, these modifications and embellishments should also be considered as the scope of protection of the present invention.Each component part being not known in the present embodiment is equal It can be realized with the prior art.

Claims (6)

1. application of the metal film in the softening temperature for improving substrate of glass.
2. application according to claim 1, which is characterized in that the metal film is one layer or more, is coated on substrate of glass One side.
3. application according to claim 2, which is characterized in that the metal film is metal Cr film, metal Mo film, gold Belong at least one of Pt film, metal W film, metal Ti film, metal V film.
4. application according to claim 3, which is characterized in that the thickness of single-layer metal film is not higher than 1500nm.
5. application according to claim 2, which is characterized in that using the method for magnetron sputtering metal targets in substrate of glass On be coated with metal film.
6. application according to claim 5, which comprises the steps of:
(1) sample is placed installs with target
Substrate of glass to be coated is placed on sample stage, target is mounted on target position, closes vacuum chamber chamber door;
(2) it vacuumizes
Mechanical pump is opened to vacuum chamber to 2~5Pa, opens the molecular pump in vacuum suction device, vacuum chamber is taken out true Sky is to (1.0~3.0) × 10-3Pa;
(3) pre-sputtering target
Argon gas is poured into vacuum chamber, until vacuum chamber room pressure maintains 1.2~2.0Pa, opens target power supply, control sputtering function Rate density is 0.6~1.4W/cm2, pre-sputtering 10~20min of target, when pre-sputtering target, sample stage is moved to far from target One end;
(4) magnetron sputtering plating
Sample stage is moved to immediately ahead of target, formal sputtering, in order to guarantee that uniformity of film, sample stage are reciprocal inside target Movement;The thickness of sputter coating is controlled by adjusting sputtering power, sputtering time;
(5) plated film terminates, samples
Shielding power supply is closed, closes flowmeter, molecular pump and mechanical pump, argon gas or air are poured into vacuum chamber to be made in vacuum chamber Pressure is equal to atmospheric pressure, opens vacuum chamber, takes out powder, and plated film terminates.
CN201910884303.7A 2019-09-19 2019-09-19 Application of the metal film in the softening temperature for improving substrate of glass Pending CN110482873A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115216734B (en) * 2022-08-09 2024-01-26 中国科学院力学研究所 Method for improving binding force of platinum film and substrate material

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169182A (en) * 1975-05-24 1979-09-25 Honda Giken Kogyo Kabushiki Kaisha Heat insulating material for high temperature use and process for manufacturing thereof
EP1065179A1 (en) * 1999-06-30 2001-01-03 Saint-Gobain Vitrage Process for the deposition of a tungsten and/or molybdenum based layer on a glass, ceramic or glass ceramic substrate and coated substrate according to the process
CN104193188A (en) * 2014-08-21 2014-12-10 武汉北方光电科技有限公司 Multi-metal-coating high-temperature-resistant corrosion-resistant optical fiber
CN104342624A (en) * 2014-03-21 2015-02-11 宁波海燕家电玻璃技术有限公司 Method for manufacturing high-temperature-resisting black borosilicate glass
CN106571173A (en) * 2016-11-04 2017-04-19 郑州新世纪材料基因组工程研究院有限公司 High-temperature-resistant composite and transparent conductive film, preparation method thereof and application thereof
CN109608048A (en) * 2017-10-04 2019-04-12 肖特股份有限公司 Sintered body with conductive coating
CN110482852A (en) * 2019-08-29 2019-11-22 中国兵器工业第五九研究所 Glass die coating and preparation method thereof, application, mold

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4169182A (en) * 1975-05-24 1979-09-25 Honda Giken Kogyo Kabushiki Kaisha Heat insulating material for high temperature use and process for manufacturing thereof
EP1065179A1 (en) * 1999-06-30 2001-01-03 Saint-Gobain Vitrage Process for the deposition of a tungsten and/or molybdenum based layer on a glass, ceramic or glass ceramic substrate and coated substrate according to the process
US20020094425A1 (en) * 1999-06-30 2002-07-18 Saint-Gobain Vitrage Process for depositing a tungsten-based and/or molybdenum-based layer on a rigid substrate, and substrate thus coated
CN104342624A (en) * 2014-03-21 2015-02-11 宁波海燕家电玻璃技术有限公司 Method for manufacturing high-temperature-resisting black borosilicate glass
CN104193188A (en) * 2014-08-21 2014-12-10 武汉北方光电科技有限公司 Multi-metal-coating high-temperature-resistant corrosion-resistant optical fiber
CN106571173A (en) * 2016-11-04 2017-04-19 郑州新世纪材料基因组工程研究院有限公司 High-temperature-resistant composite and transparent conductive film, preparation method thereof and application thereof
CN109608048A (en) * 2017-10-04 2019-04-12 肖特股份有限公司 Sintered body with conductive coating
CN110482852A (en) * 2019-08-29 2019-11-22 中国兵器工业第五九研究所 Glass die coating and preparation method thereof, application, mold

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
戴金辉等: "《无机非金属材料概论》", 31 July 2018, 哈尔滨工业大学出版社 *
王辰亚: "《简明玻璃手册》", 31 August 1981, 北京玻璃容器委员会 *

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN115216734B (en) * 2022-08-09 2024-01-26 中国科学院力学研究所 Method for improving binding force of platinum film and substrate material

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