CN110444636A - A kind of sintering furnace of circle temperature layout - Google Patents

A kind of sintering furnace of circle temperature layout Download PDF

Info

Publication number
CN110444636A
CN110444636A CN201910772518.XA CN201910772518A CN110444636A CN 110444636 A CN110444636 A CN 110444636A CN 201910772518 A CN201910772518 A CN 201910772518A CN 110444636 A CN110444636 A CN 110444636A
Authority
CN
China
Prior art keywords
section
bringing
warm area
reason material
cooling zone
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN201910772518.XA
Other languages
Chinese (zh)
Inventor
张志郢
何凤琴
王冬冬
张敏
常纪鹏
杨超
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Huanghe Water Electric Light Volt Industrial Technology Co Ltd
Photovoltaic Industry Technology Branch of Qinghai Huanghe Hydropower Development Co Ltd
Original Assignee
Huanghe Water Electric Light Volt Industrial Technology Co Ltd
Photovoltaic Industry Technology Branch of Qinghai Huanghe Hydropower Development Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Huanghe Water Electric Light Volt Industrial Technology Co Ltd, Photovoltaic Industry Technology Branch of Qinghai Huanghe Hydropower Development Co Ltd filed Critical Huanghe Water Electric Light Volt Industrial Technology Co Ltd
Priority to CN201910772518.XA priority Critical patent/CN110444636A/en
Publication of CN110444636A publication Critical patent/CN110444636A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/324Thermal treatment for modifying the properties of semiconductor bodies, e.g. annealing, sintering
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/186Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1876Particular processes or apparatus for batch treatment of the devices
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electromagnetism (AREA)
  • Tunnel Furnaces (AREA)

Abstract

The invention discloses a kind of sintering furnaces of round temperature layout, which is characterized in that including reason material section, bringing-up section, cooling zone and charging driving equipment;Reason material section, bringing-up section and cooling zone are circumferentially distributed, and circumference initial position is reason material section, and circumferentially feedstock direction is followed successively by bringing-up section and cooling zone;Bringing-up section includes warm area and thermal insulation areas, and warm area and thermal insulation areas are circumferentially alternately distributed;Charging driving equipment driving material successively by reason material section, bringing-up section, cooling zone and is eventually returned to reason material section.The present invention sets warm area to space individually is added, and can substantially reduce the volume of single warm area, greatly reduces the volume of equipment.It is transmitted using mechanical arm, and by warm area independence, between each other almost without influence, the heating-up time is short, and cooling rate is fast.

Description

A kind of sintering furnace of circle temperature layout
Technical field
The present invention relates to a kind of sintering furnaces of round temperature layout, are especially applied to the production of crystal-silicon solar cell, Belong to photovoltaic technology field.
Background technique
Solar cell sintering technology is the key technology in crystal-silicon solar cell manufacturing process, and principle is using infrared The Al-back-surface-field (BSF) paste of the silver electrode paste for being printed on solar battery surface and the back side is carried out high temperature sintering by heating technique, is generated good Good Ohmic contact, since the film layer of silver electrode and Al-BSF is relatively thin, so the sintering velocity to sintering temperature is all very sensitive. Since printing, sintering process have negative impact to the photoelectric conversion efficiency of solar cell, so printing, drying and sintering process It is horizontal lower, it will greatly affect the practical transfer efficiency of solar cell power output.So to the steady of temperature in sintering process Qualitative, heating, cooling rate has great requirement.
Existing solar cell sintering process generally uses chain-type sintering furnace, chain-type sintering furnace generally point-blank needle Several warm areas, including baking zone, pre-burning interface, sintering zone, cooling zone etc. are arranged to different functions, use the net of nichrome Band is transmitted, and cell piece is entered from feed inlet, by cooling after different warm areas, finally from discharge port taking-up.
Existing chain-type sintering furnace volume is too long, main reason is that chain-type sintering furnace technical process is a linear type, nothing Method reuses a warm area and reaches identical effect, during battery advances, needs in some warm area residence time Length ratio can only be determined by warm area length.So must just lengthen warm area to guarantee sintering and drying effect, make existing Some sintering furnaces need nearly tens of meters of length.
Existing chain-type sintering furnace temperature curve is excessively gentle, and the heating-up time is long, and cooling rate is slow, in solar cell metal During change, it is unfavorable for forming good Ohmic contact, it is a lasting process, In that reason, which essentially consists in chain-type sintering furnace, Leaving a warm area and reaching another warm area is a continuous process, causes temperature curve excessively gentle, cannot be formed good Depth-width ratio.
Existing tradition chain-type sintering furnace power consumption is larger, main reason is that setting warm area is longer, fluorescent tube power consumption is larger, by This mating pressure of bring factory service further increases, and cooling zone by high-temperature region due to being influenced, to keep low temperature, so that energy consumption Increase.
Existing chain-type sintering furnace, temperature-controlled precision are bad.Reason is the needs transmitted due to furnace zone, warm area and warm area it Between lattice gear gap it is larger, interfered with each other between warm area, due to the influence of internal gas flow, high-temperature region can be to low temperature block transitive heat Amount, so that high-temperature region temperature reduces, low-temperature space temperature is increased, and to reach temperature controlled precision, it is bigger to would have to consumption Energy keeps the temperature difference between warm area, to further increase energy consumption.
Existing sintering furnace due to designing, feed inlet with discharge port each one, need one end to be put into cell piece, one Cell piece is taken out at end, and whether automation or manpower take cell piece, can all increase additional cost.
Summary of the invention
The technical problem to be solved by the present invention is to how improve solar cell sintering efficiency, and reduce cost.
In order to solve the above-mentioned technical problem, the technical solution of the present invention is to provide a kind of sintering of round temperature layout Furnace, which is characterized in that including reason material section, bringing-up section, cooling zone and charging driving equipment;Reason material section, bringing-up section and cooling zone are in Circle distribution, circumference initial position are reason material section, and circumferentially feedstock direction is followed successively by bringing-up section and cooling zone;Bringing-up section includes adding Hot-zone and thermal insulation areas, heating zone and thermal insulation areas are circumferentially alternately distributed;Driving equipment driving material is fed by reason material section, heating Section, cooling zone are simultaneously eventually returned to reason material section;Thermal insulation areas is equipped with the gap for allowing material to pass through.
Preferably, the heating zone quantity is at least 2.
Preferably, the charging driving equipment is rotating mechanical arm, and rotary shaft is set to circle center.
Preferably, the charging driving equipment is roller bearing.
The present invention is set individual heating zone for warm area, can be substantially reduced single warm area using mechanical arm transmission mode Volume, greatly reduce equipment volume.Transmitted using rotating mechanical arm, and by heating zone independence, between each other almost without It influences, the heating-up time is short, and cooling rate is fast.The present invention reduces the volume of warm area, and energy consumption can be greatly reduced.Each warm area is only It stands, heat-barrier material of the centre using bigger thickness, smaller transmission gap, almost without influence between warm area, makes temperature control more It is accurate.The present invention is the design of round sintering furnace, and charging discharge port can be made to be combined into one, substantially reduce cost.
Detailed description of the invention
Fig. 1 is a kind of structural schematic diagram of the sintering furnace of the round temperature layout provided in the present embodiment.
Specific embodiment
In order to make the present invention more obvious and understandable, hereby with preferred embodiment, and attached drawing is cooperated to be described in detail below.
Embodiment 1
As shown in Figure 1, heating zone 1,3,5,7,9 and thermal insulation areas 2,4,6,8,10 are alternately arranged, thermal insulation areas 2,4,6,8,10 Using thermal baffle, further include cooling zone 11, battery supporting plate 12, can 360 degree rotation rotating mechanical arm 13.This sintering furnace is set For meter using round temperature layout, each heating zone 1,3,5,7,9 all can serve as an independent warm area.In resonable material section, electricity Placing battery on pond supporting plate 12, after by rotating mechanical arm 13 drive enter any warm area, carry out related process, all independent In warm area, drying, pre-sintering, sintering warm area can be arbitrarily set, after finally entering the cooling of cooling zone 11, return to reason material section, it is heat-insulated Baffle has slit opening, to guarantee that rotating mechanical arm 13 can arbitrarily pass through.
Warm area is separated into independent design, heat-barrier material is added in centre, mutual interference can be substantially reduced, it can be achieved that The temperature control of higher precision, the residence time that the transmission of rotating mechanical arm 13 can be arbitrarily arranged in each warm area, and can be in pole Next warm area is reached in short time so that heating rate of temperature fall increases, due to rotating mechanical arm 13 can 360 degree rotation, can Enter any warm area at any time, using in technique above can provide more selections.
Embodiment 2
The transmission of cell piece can also be used roller type to transmit in the warm area of circular distribution, by controlling stopping for different roller bearings Turn the time to control its residence time in warm area, remaining is same as Example 1.
The present invention, is transmitted or roller type mode using rotating mechanical arm 13, sets independent for heating zone 1,3,5,7,9 Warm area, the volume of single warm area can be substantially reduced, greatly reduce equipment volume.Use rotating mechanical arm 13 or roller type Transmission.Independent between warm area, between each other almost without influence, the heating-up time is short, and cooling rate is fast.
Present design reduces the volume of warm area, and energy consumption can be greatly reduced.Each warm area is independent, and centre is using more The heat-barrier material of big thickness, smaller transmission gap keep temperature control more accurate almost without influence between warm area.
The design is the design of round sintering furnace, and charging discharge port can be made to be combined into one, substantially reduce cost.

Claims (4)

1. a kind of sintering furnace of circle temperature layout, which is characterized in that including reason material section, bringing-up section, cooling zone (11) and charging Driving equipment;Reason material section, bringing-up section and cooling zone are circumferentially distributed, and circumference initial position is reason material section, circumferentially feedstock direction It is followed successively by bringing-up section and cooling zone (11);Bringing-up section includes heating zone (1;3;5;7;And thermal insulation areas (2 9);4;6;8;10) it, heats Area (1;3;5;7;And thermal insulation areas (2 9);4;6;8;10) it is circumferentially alternately distributed;Driving equipment driving material is fed by reason material Section, bringing-up section, cooling zone (11) are simultaneously eventually returned to reason material section;Thermal insulation areas (2;4;6;8;10) it is equipped between allowing material to pass through Gap.
2. a kind of sintering furnace of round temperature layout as described in claim 1, which is characterized in that the heating zone (1;3; 5;7;9) quantity is at least 2.
3. a kind of sintering furnace of round temperature layout as described in claim 1, which is characterized in that the charging driving equipment For rotating mechanical arm (13), rotary shaft is set to circle center.
4. a kind of sintering furnace of round temperature layout as described in claim 1, which is characterized in that the charging driving equipment For roller bearing.
CN201910772518.XA 2019-08-21 2019-08-21 A kind of sintering furnace of circle temperature layout Pending CN110444636A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201910772518.XA CN110444636A (en) 2019-08-21 2019-08-21 A kind of sintering furnace of circle temperature layout

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201910772518.XA CN110444636A (en) 2019-08-21 2019-08-21 A kind of sintering furnace of circle temperature layout

Publications (1)

Publication Number Publication Date
CN110444636A true CN110444636A (en) 2019-11-12

Family

ID=68436861

Family Applications (1)

Application Number Title Priority Date Filing Date
CN201910772518.XA Pending CN110444636A (en) 2019-08-21 2019-08-21 A kind of sintering furnace of circle temperature layout

Country Status (1)

Country Link
CN (1) CN110444636A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103357981A (en) * 2012-03-26 2013-10-23 武汉飞恩微电子有限公司 Rotation type reflow soldering furnace and soldering method thereof
CN104810309A (en) * 2015-04-25 2015-07-29 北京金晟阳光科技有限公司 Roller way type solar cell sintering and radiation annealing integrated continuous furnace
CN106288772A (en) * 2016-10-07 2017-01-04 苏州南北深科智能科技有限公司 A kind of sintering furnace for photovoltaic solar cell silicon chip

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103357981A (en) * 2012-03-26 2013-10-23 武汉飞恩微电子有限公司 Rotation type reflow soldering furnace and soldering method thereof
CN104810309A (en) * 2015-04-25 2015-07-29 北京金晟阳光科技有限公司 Roller way type solar cell sintering and radiation annealing integrated continuous furnace
CN106288772A (en) * 2016-10-07 2017-01-04 苏州南北深科智能科技有限公司 A kind of sintering furnace for photovoltaic solar cell silicon chip

Similar Documents

Publication Publication Date Title
CN107086255B (en) Solar battery filming equipment and solar battery chain type production equipment
CN101817523A (en) Graphite purification and graphitizable high temperature vertical continuous induction heating furnace
CN106319473B (en) CIGS solar battery thin film production line
CN110444636A (en) A kind of sintering furnace of circle temperature layout
CN101226969A (en) Fast peak sintering process for preparing solar battery
CN102036433A (en) Infrared electric heating film heating tube with double-film layer structure as well as preparation method and application thereof
CN106811738A (en) The film plating process and support plate of a kind of solar cell
CN203642678U (en) Roller way type solar cell silicon chip drying and sintering integrated furnace
CN201327839Y (en) Silicon chip loading device for diffusion system
CN107221579A (en) Solar cell film plating process and solar cell
CN211739832U (en) Silicon-carbon negative electrode material continuous atmosphere protection rotary furnace
CN206098426U (en) Be used for thin -film solar cell continuous annealer
CN210892560U (en) Lithium battery negative plate baking oven
CN204537995U (en) Roller bed type solar cell sintering and radiation annealing one continuous oven
CN201105993Y (en) Polycrystalline silicon hydrogen reducing furnace suitable for low-voltage normal power supply hot start
CN105006501A (en) Preparation method and preparation device for CIGS-based thin-film solar cell
CN110207493A (en) A kind of rotary aluminum-bar heating furnace
CN211503665U (en) Double-roller symmetrical synchronous transmission type solar cell sintering furnace
CN102243020A (en) Continuous type microwave auxiliary sintering furnace and method
CN112467042B (en) Intelligent automatic production system for perovskite solar cell module
CN201655827U (en) Device for manufacturing CIGS optical absorbing layer in non-vacuum way
CN212197104U (en) Transmission mechanism for solar energy production equipment
CN102369307B (en) Apparatus for manufacture of solar cells
CN110981210B (en) Photovoltaic glass anti-reflection strengthening continuous production device and method
CN113915980A (en) Pole piece drying system for lithium ion battery coating process and technological method thereof

Legal Events

Date Code Title Description
PB01 Publication
PB01 Publication
SE01 Entry into force of request for substantive examination
SE01 Entry into force of request for substantive examination
RJ01 Rejection of invention patent application after publication
RJ01 Rejection of invention patent application after publication

Application publication date: 20191112