CN110441935B - A irradiator for ultraviolet is joined in marriage - Google Patents

A irradiator for ultraviolet is joined in marriage Download PDF

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Publication number
CN110441935B
CN110441935B CN201910707447.5A CN201910707447A CN110441935B CN 110441935 B CN110441935 B CN 110441935B CN 201910707447 A CN201910707447 A CN 201910707447A CN 110441935 B CN110441935 B CN 110441935B
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lamps
reflector
illumination
vertical distance
arrangement direction
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CN110441935A (en
Inventor
赵仁堂
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TCL Huaxing Photoelectric Technology Co Ltd
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TCL Huaxing Photoelectric Technology Co Ltd
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G02F1/133788—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation by light irradiation, e.g. linearly polarised light photo-polymerisation

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Mathematical Physics (AREA)
  • Liquid Crystal (AREA)

Abstract

The invention discloses an irradiation machine, comprising: the lamp holder and the illumination platform are arranged, wherein a first vertical distance is reserved between the plurality of lamp tubes in a central area of the reflecting plate and the illumination platform, a second vertical distance is reserved between the plurality of lamp tubes in an edge area of the reflecting plate and the illumination platform, and the first vertical distance is larger than the second vertical distance. The lamp tubes in the middle area of the lamp holder are arranged higher, and the lamp tubes on two sides of the lamp holder are arranged lower, so that the middle illumination is reduced, the illumination on two sides is improved, the overall illumination is close to be consistent, and the illumination uniformity is improved.

Description

A irradiator for ultraviolet is joined in marriage
Technical Field
The present invention relates to an irradiator for ultraviolet alignment, and more particularly to an irradiator for polymer stable vertical alignment with improved illuminance uniformity.
Background
In recent years, liquid crystal displays have become the mainstream of displays. A Thin film transistor liquid crystal display (TFT-LCD) is one of various liquid crystal displays, and can improve image quality. The TFT-LCD comprises two glass substrates, a liquid crystal layer arranged between the two glass substrates, an upper glass substrate including a color filter, and a lower glass substrate provided with a TFT. When the current passes through the thin film transistor, an electric field is changed to cause liquid crystal molecules of the liquid crystal layer to deflect, so that the polarization of light is changed, and the bright and dark states of pixels are determined by utilizing the polarizer. The polymer stabilized vertical alignment (PS-VA) is a novel liquid crystal display technology and has the following advantages: high contrast, wide viewing angle, low color cast, fast response, low power consumption and the like, and is suitable for the development of factory buildings of various generations. In the process of forming a liquid crystal cell in PS-VA, a reactive monomer is contained in a PS-VA liquid crystal, and in the process of curing the liquid crystal, the reactive monomer in the liquid crystal is reacted by irradiating energy (e.g., ultraviolet light (UV1)) to a substrate, and the liquid crystal is formed into a pretilt angle under the synergistic effect of voltage, which is called as UV alignment. The ultraviolet alignment of the liquid crystal is realized by an ultraviolet irradiation machine, and the main characteristic of the ultraviolet irradiation machine which influences the quality of the panel is the illuminance uniformity, when the illuminance uniformity is poor, the illuminance difference of each position of the panel is large, so that the pretilt angle difference is large, and the panel is easy to generate display defects.
As shown in fig. 1 and 2, fig. 1 is a front view of a conventional ultraviolet irradiator 1 in which a plurality of lamps extend in a longitudinal direction perpendicular to a plane of paper. Fig. 2 is a side view of the conventional ultraviolet irradiation apparatus 1 shown in fig. 1. The ultraviolet irradiation apparatus 1 includes: a lamp holder 10, a plurality of lamps 11 and an illumination platform 13. The lamps 11 are horizontally arranged on the lamp holder 10, and a substrate 14 for irradiating the irradiation platform 13 is disposed for alignment. However, the existing uv irradiation apparatus for uv alignment in the industry is mainly of a chamber type. As shown in fig. 1, the middle of the substrate 14 is irradiated by the ultraviolet rays of the lamps directly above and also by the oblique rays of the lamps at the edges of the two sides, so that the illumination of the middle of the substrate 14 is high in actual production, and the illumination of the edges of the substrate 14 is low, which causes the quality of the panels at different positions of the same substrate to be different, thereby affecting the yield of the product.
Further, as shown in fig. 2, a side view of the conventional ultraviolet irradiation machine 1 shown in fig. 1 is shown. Due to the inherent characteristics of the lamp tube, along the length direction of the lamp tube, the illuminance at the middle position of the substrate 14 is higher, and the illuminance at two ends of the substrate 14 is lower, so that the illuminance at the other two ends of the ultraviolet irradiation machine 1 is inconsistent with the middle illuminance, the quality of panels at different positions of the same substrate is also inconsistent, and the product yield is influenced. Therefore, in actual production, the illuminance on four sides of the uv alignment apparatus is low, and the illuminance in the middle is high, which may result in inconsistent panel quality or poor product.
Therefore, it is necessary to provide an irradiation machine for uv alignment to solve the problems of the prior art.
Disclosure of Invention
In view of the above, the present invention provides an irradiation machine for ultraviolet alignment to solve the problems in the prior art.
The present invention is directed to an irradiation machine for uv alignment, which can improve the problems of uneven quality of a display panel or poor products caused by low illuminance at four sides and high illuminance at the middle of the display panel.
The secondary objective of the present invention is to provide an irradiator for uv alignment, which can reduce the central illuminance and increase the illuminance at both sides by setting the lamp tubes at the central region of the lamp holder higher and the lamp tubes at both sides of the lamp holder lower, so that the overall illuminance approaches to be consistent, thereby improving the illuminance uniformity.
To achieve the above object, an embodiment of the present invention provides an irradiation machine for uv alignment, comprising: the irradiation machine includes:
a lamp holder and an illumination platform, wherein the lamp holder comprises a plurality of lamps and a reflecting plate, the lamps are arranged on the reflecting plate, the lamps are configured to illuminate a substrate on the illumination platform,
wherein the plurality of lamps in a central region of the reflector plate are at a first vertical distance from the illumination platform, the plurality of lamps in an edge region of the reflector plate are at a second vertical distance from the illumination platform,
when the plurality of lamp tubes irradiate the substrate, the first vertical distance is greater than the second vertical distance.
In an embodiment of the present invention, the plurality of lamps in the central area have a first arrangement direction; and the plurality of lamp tubes in the edge area are provided with a second setting direction, wherein the first setting direction is vertical to the second setting direction.
In an embodiment of the invention, the edge area has four reflector extensions disposed on four sides of a flat portion of the central area, wherein the plurality of lamps in two opposite ones of the four reflector extensions have a third disposition direction, and the third disposition direction is parallel to the first disposition direction.
In an embodiment of the invention, the edge region of the reflector is arranged in a step-like configuration or in a flat-like configuration inclined toward the illumination stage.
In an embodiment of the invention, the reflector is configured in an arc shape, wherein the plurality of lamps are configured along the arc shape.
Furthermore, another embodiment of the present invention provides an irradiation machine, comprising:
a lamp holder and an irradiation platform, wherein the lamp holder comprises a plurality of lamp tubes and a reflecting plate, the plurality of lamp tubes are arranged on the reflecting plate,
the reflector plate comprises a main body part and a reflector plate extension part, wherein the plurality of lamp tubes in the main body part have a first arrangement direction, the plurality of lamp tubes in the reflector plate extension part have a second arrangement direction, and the first arrangement direction is perpendicular to the second arrangement direction.
In an embodiment of the invention, the plurality of lamps of the main body have a first vertical distance from the irradiation platform; and the plurality of lamp tubes of the reflector plate extension part have a second vertical distance from the illumination platform, wherein the first vertical distance is greater than the second vertical distance.
In an embodiment of the invention, four reflector extensions are disposed on four sides of the main body, wherein the plurality of lamps in two opposite ones of the four reflector extensions have a third disposition direction, and the third disposition direction is parallel to the first disposition direction.
In an embodiment of the invention, the reflector extension is disposed in a step-like configuration or in a flat-like configuration inclined toward the illumination platform.
In an embodiment of the invention, the reflector is configured in an arc shape, wherein the plurality of lamps are configured along the arc shape.
Compared with the prior art, the irradiation machine for ultraviolet alignment can reduce the middle illumination and improve the illumination at two sides by arranging the lamp tubes at the middle area of the lamp holder to be higher and the lamp tubes at two sides of the lamp holder to be lower, so that the overall illumination approaches to be consistent, and the illumination uniformity is improved.
In order to make the aforementioned and other objects of the present invention more comprehensible, preferred embodiments accompanied with figures are described in detail below:
drawings
FIG. 1 is a front view of a conventional ultraviolet ray irradiator in which a plurality of lamps extend in the longitudinal direction thereof perpendicularly to the plane of the drawing;
fig. 2 shows a side view of the conventional ultraviolet irradiation machine of fig. 1;
fig. 3 shows a schematic view of an irradiator for ultraviolet alignment of a first embodiment of the present invention;
fig. 4 shows a schematic view of an irradiator for ultraviolet alignment of a second embodiment of the present invention;
fig. 5 is a schematic bottom view showing the reflection plate in the irradiation machine for ultraviolet alignment according to the second embodiment of the present invention;
fig. 6 shows a schematic view of an irradiator for ultraviolet alignment of a third embodiment of the present invention;
fig. 7 shows a schematic view of an irradiator for ultraviolet alignment of a fourth embodiment of the present invention.
Detailed Description
The following description of the embodiments refers to the accompanying drawings for illustrating the specific embodiments in which the invention may be practiced. Furthermore, directional phrases used herein, such as, for example, upper, lower, top, bottom, front, rear, left, right, inner, outer, lateral, peripheral, central, horizontal, lateral, vertical, longitudinal, axial, radial, uppermost or lowermost, etc., refer only to the orientation of the attached drawings. Accordingly, the directional terms used are used for explanation and understanding of the present invention, and are not used for limiting the present invention.
Although the terms first, second, etc. may be used herein to describe various elements, components, regions, layers and/or sections, these elements, components, regions, layers and/or sections should not be limited by these terms. These terms are used to distinguish one element, component, region, layer or section from another element, component, region, layer or section. Thus, a first element, component, region, layer or section discussed below could be termed a second element, component, region, layer or section without departing from the teachings of the present invention.
Fig. 3 is a schematic view of an irradiation machine for uv alignment according to a first embodiment of the present invention. In order to achieve the above-mentioned objective of the present invention, an embodiment of the present invention provides an irradiation machine for ultraviolet alignment. The irradiation machine 2 for ultraviolet alignment includes:
a lamp holder 20 and an illumination platform 23, wherein the lamp holder 20 comprises a plurality of lamps 21 and a reflection plate 25. The plurality of lamps 21 are disposed on the reflection plate 25, and the lamp holder 20 is shaped to match the reflection plate 25. The lamps 21 are configured to illuminate a substrate 24 on the illumination stage 23.
The lamp holder 20 is disposed above the illumination platform 23, the lamps 21 in a central region of the reflection plate 25 have a first vertical distance D1 from the illumination platform 23, the lamps 21 in an edge region of the reflection plate 25 have a second vertical distance D2 from the illumination platform 23, and the first vertical distance D1 is greater than the second vertical distance D2.
Alternatively, the lamps 21 in a central region of the lamp holder 20 have a first vertical distance D1 from the illumination platform 23, the lamps 21 in an edge region of the lamp holder 20 have a second vertical distance D2 from the illumination platform 23, and the first vertical distance D1 is greater than the second vertical distance D2.
In other words, a first group of lamps 21A in the central region of the reflector 25 is disposed higher from the illumination platform 23, and a second group of lamps 21B at both ends of the edge region of the reflector 25 is disposed lower from the illumination platform 23, so as to reduce the middle illuminance and increase the illuminance at both sides, thereby making the overall illuminance approximately consistent and improving the illuminance uniformity.
Optionally, the first vertical distance D1 and the second vertical distance D2 are fixed non-adjustable distances. Alternatively, the first vertical and the second vertical distances D2 are adjustable distances, e.g., the first vertical and the second vertical distances D2 are equal when the illuminator is not starting to illuminate the substrate 24. When the irradiator starts irradiating the substrate 24, the lamp holder is adjusted so that the first vertical distance D1 is greater than the second vertical distance D2.
Optionally, a first lamp tube at the edge region of the reflection plate 25 has the second perpendicular distance from the illumination platform 23, a second lamp tube at the edge region of the reflection plate 25 away from the central region has the third perpendicular distance from the illumination platform 23, and the second perpendicular distance is greater than the third perpendicular distance.
Next, referring to fig. 4, a schematic diagram of an irradiator for uv alignment according to a second embodiment of the present invention is shown. The plurality of lamp tubes 21 in the central area have a first arrangement direction; and the plurality of lamps 21 in the edge area have a second arrangement direction, wherein the first arrangement direction is perpendicular to the second arrangement direction. For example, in the present embodiment, the first arrangement direction of the first group of lamps 21A disposed in the center region is a direction parallel to the paper surface, and the second arrangement direction of the third group of lamps 21C disposed in the edge region is a direction perpendicular to the paper surface. Therefore, the first group of lamps 21A in the central region of the reflector 25 is disposed higher from the illumination platform 23, and the lamps 21C at the other two ends of the edge region of the reflector 25 are disposed lower from the illumination platform 23, so that the central illuminance is reduced and the illuminance at the two sides is increased, thereby making the overall illuminance approximately consistent and improving the illuminance uniformity.
Fig. 5 is a schematic bottom view of the reflector 25 in the illumination apparatus for uv alignment according to the second embodiment of the present invention. The edge region of the reflector 25 has four reflector extensions 252, 253, 254, 255 disposed on four sides of a flat portion 251 of the central region of the reflector 25, wherein the lamps 21 of two opposite reflector extensions 252, 254 of the four reflector extensions 252, 253, 254, 255 have a third disposition direction, and the third disposition direction is parallel to the first disposition direction. For example, in the present embodiment, the first arrangement direction of the first group of lamps 21A arranged on the flat portion 251 is a direction parallel to the paper surface. Further, the second installation direction of the third group of lamps 21C of the two reflector extensions 253 and 255 installed on the left and right sides of the flat portion 251 is a direction perpendicular to the plane of the paper. The third installation direction of the second group of lamps 21B of the two reflector extensions 252 and 254 installed on the upper and lower sides of the flat portion 251 is a direction parallel to the paper surface. That is, the first group of lamps 21A and the third group of lamps 21C are disposed vertically, and the first group of lamps 21A and the second group of lamps 21B are disposed in parallel.
Alternatively, as shown in fig. 6, a schematic view of an irradiator for ultraviolet alignment of a third embodiment of the present invention is shown. This embodiment is generally similar to the first embodiment of the invention of fig. 3, with the difference that: the edge region of the reflection plate is in a stepped configuration. Optionally, the first group of lamps 21A are disposed on a flat portion of the stepped configuration. The second group of lamps 21B are disposed on the step portion of the step arrangement. The first group of light tubes 21A and the second group of light tubes 21B are arranged in parallel. Alternatively, another step portion is also provided on the other two sides (two sides perpendicular to the paper surface) of the flat portion, the third group of lamps 21C is provided on the another step portion, and the first group of lamps 21A and the third group of lamps 21C are vertically provided.
Alternatively, the edge region of the reflector plate is arranged obliquely toward the illumination stage 23 in a flat manner, as shown in fig. 3.
Fig. 7 is a schematic view of an irradiator for uv alignment according to a fourth embodiment of the present invention. This embodiment is generally similar to the first embodiment of the invention of fig. 3, with the difference that: the reflector is configured in an arc shape, wherein the plurality of lamps 21 are configured along the arc shape. In other words, the vertical distance between the plurality of lamps 21 of the lamp holder 20 and the irradiation stage 23 decreases from the central region toward the edge region.
Referring to fig. 4 and 5, another embodiment of the invention provides an irradiation machine 2, including:
a lamp holder 20 and an illumination platform 23, wherein the lamp holder 20 comprises a plurality of lamps 21 and a reflective plate 25, the lamps 21 are disposed on the reflective plate 25, wherein the reflective plate 25 has a main body 251 and a reflective plate extension portion, the lamps 21A of the main body 251 have a first disposition direction, the lamps 21C of the reflective plate extension portions 253, 255 have a second disposition direction, and the first disposition direction is perpendicular to the second disposition direction.
The plurality of lamps 21A of the main body 251 are spaced apart from the illumination platform 23 by a first vertical distance D1; and the plurality of lamps 21C of the reflector extensions 253, 255 have a second vertical distance D2 from the illumination platform 23, wherein the first vertical distance D1 is greater than the second vertical distance D2.
In this embodiment, four reflector extensions 252, 253, 254, 255 are disposed on four sides of the main body 251, wherein the plurality of lamps 21B in two opposite ones 252, 254 of the four reflector extensions 252, 253, 254, 255 have a third disposition direction, and the third disposition direction is parallel to the first disposition direction.
In an embodiment of the present invention, the reflector extensions 252, 253, 254, 255 are disposed in a step-like configuration or in a flat-like configuration inclined toward the illumination platform 23.
In an embodiment of the present invention, the reflective plate 25 is configured in an arc shape, wherein the plurality of lamps 21 are configured along the arc shape.
As described above, compared to the existing ultraviolet irradiator, the middle position of the substrate is irradiated by the ultraviolet rays of the lamps directly above and also by the oblique irradiation of the lamps at the edges of the two sides, and because of the inherent characteristics of the lamps, the illuminance at the two ends along the length direction of the lamps is low, so that the illuminance at the middle position of the substrate is high in the actual production, the illuminance at the edges of the substrate is low, the quality of the panels at different positions of the same substrate is different, and the yield of the product is affected. According to the irradiation machine for ultraviolet alignment, the lamp tubes in the middle area of the lamp holder are arranged higher, and the lamp tubes on the two sides of the lamp holder are arranged lower, so that the middle illumination is reduced, the illumination on the two sides is improved, the overall illumination is close to be consistent, and the illumination uniformity is improved.
The present invention has been described in relation to the above embodiments, which are only exemplary of the implementation of the present invention. It must be noted that the disclosed embodiments do not limit the scope of the invention. Rather, modifications and equivalent arrangements included within the spirit and scope of the claims are included within the scope of the invention.

Claims (3)

1. An irradiator for ultraviolet alignment, characterized in that: the irradiation machine includes:
a lamp holder and an irradiation platform, wherein the lamp holder comprises a plurality of lamp tubes and a reflecting plate, the plurality of lamp tubes are arranged on the reflecting plate,
wherein the reflector has a main body portion and four reflector extensions, the lamps in the main body portion have a first arrangement direction, the lamps in two opposite ones of the four reflector extensions have a second arrangement direction, wherein the first arrangement direction is perpendicular to the second arrangement direction,
the four reflector extension parts are arranged on four sides of the main body part, wherein the plurality of lamp tubes in the other two opposite of the four reflector extension parts have a third arrangement direction, the third arrangement direction is parallel to the first arrangement direction,
the plurality of lamp tubes of the main body part have a first vertical distance from the irradiation platform; and the plurality of lamp tubes of the four reflector plate extending parts have a second vertical distance from the illumination platform, wherein the first vertical distance is greater than the second vertical distance.
2. The irradiation machine for ultraviolet alignment according to claim 1, characterized in that: the four reflector extensions are arranged in a stepped configuration or in a flat configuration inclined toward the illumination platform.
3. The irradiation machine for ultraviolet alignment according to claim 1, characterized in that: the reflector plate is configured in an arc shape, wherein the plurality of lamp tubes are configured along the arc shape.
CN201910707447.5A 2019-08-01 2019-08-01 A irradiator for ultraviolet is joined in marriage Active CN110441935B (en)

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CN110888266A (en) * 2019-11-26 2020-03-17 Tcl华星光电技术有限公司 Method for manufacturing liquid crystal display panel

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JP2002298790A (en) * 2001-03-29 2002-10-11 Shinetsu Engineering Kk Excimer lighting system
CN102803840A (en) * 2009-06-30 2012-11-28 岩崎电气株式会社 Illuminating device
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CN102346337B (en) * 2011-08-05 2013-07-17 南京中电熊猫液晶显示科技有限公司 Light alignment equipment for LCD (liquid crystal display) panel
CN102980107A (en) * 2012-12-05 2013-03-20 北京益泰金天光电技术有限公司 LED (Light Emitting Diode) high-power street lamp
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JP2002298790A (en) * 2001-03-29 2002-10-11 Shinetsu Engineering Kk Excimer lighting system
CN102803840A (en) * 2009-06-30 2012-11-28 岩崎电气株式会社 Illuminating device
CN106773329A (en) * 2015-11-25 2017-05-31 群创光电股份有限公司 Exposure system and exposure method

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