CN110408892A - A kind of preparation method of multi-functional photic resistance changing film - Google Patents
A kind of preparation method of multi-functional photic resistance changing film Download PDFInfo
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/12—Organic material
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Abstract
The invention belongs to electronic technology field, specially a kind of preparation method of multi-functional photic resistance changing film.Method proposed by the present invention is successively vacuum evaporation 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones, 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides, 3- (5- hydroxyl amyl) -6- xenyl -7H-1 on ito glass plate, 2,4- triazol [3,4-b] [1,3,4] thiadiazine, 3,4,5- triacetoxyl group benzoic acid jamaicin ester, obtain multi-functional photic resistance changing film, the light transmittance of the film is 87 ~ 91%, and mist degree is 88 ~ 94%；The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates multi-functional photic resistance changing film 5 minutes respectively, and the square resistance of multi-functional photic resistance changing film is respectively 18.7 ten thousand ~ 23.1 ten thousand Ω/, 36.1 ~ 42.3 Ω/ and 1.2 ~ 1.9 Ω/ after illumination.
Description
Technical field
The invention belongs to electronic technology field, specially a kind of preparation method of multi-functional photic resistance changing film.
Background technique
The arrival of big data era, global information amount explosive growth, mass data needs are effectively handled and are deposited
Storage, therefore many requirements such as low-power consumption, miniaturization, high capacity and high functional density are proposed to information-storing device, thus urgently
Need to develop the novel memory devices based on new construction, new principle and new material.Resistance-variable storing device is because it is with non-volatile, structure
Simply, the advantages such as low-power consumption, ultra high density, fast reading and writing, it is considered to be one of most potential novel memory technology.Have
The photochromic of body system also tends to occur simultaneously along with many processes related with photochemical reaction, so as to cause molecule knot
Structure certain change, reactive mode specifically include that valence link isomery, cis-trans isomerism, key fracture, polymerization, oxidationreduction,
Pericyclic reaction etc..Currently, light-scattering film material is more common, but the thin-film material for having both the above characteristic concurrently is very rare.
Fan Lili etc. is with bis- (4- aminophenoxy phenyl) propane and 3,3 ' of fragrant alkyldiamine 2,2-, 4,4 '-biphenyl four
Polyamic acid is applied to ito glass using spin-coating method by solution polycondensation synthesizing polyamides acid solution for raw material by formic acid dianhydride
On, a kind of biphenyl polyimide film is obtained as functional layer through imidization, prepares a kind of organic resistive random access memory.To this
Biphenyl polyimide carries out structural characterization and studies its thermal stability, using the research organic resistive random access storage of I-V Characteristic Analysis instrument
The resistance-change memory performance of device.The result shows that: the biphenyl polyimide of synthesis has good thermal stability;Organic resistance of preparation
Transition storage has good change resistance performance and fatigue performance (insulating materials, the 3rd phase 29-32 in 2016,37).
Rong Jialing etc. explores the resistive mechanism and its SPICE circuit simulation of ITO/PMMA/Al device, by optimizing poly- first
Base methyl acrylate (PMMA) layer annealing temperature, device can realize continuous wiping-read-write-read operation.Based on different annealing temperature
The Study on surface topography of PMMA film constructs the non-linear charge shift model of single layer organic resistive random access device, and description should
The state equation of model doped region Interface Moving, and SPICE artificial circuit is established by feedback control integrator.Finally, generation
Enter device actual measurement parameter, obtains the current-voltage simulation curve almost the same with device actual result.Result verification list
The resistive mechanism of layer organic assembly illustrates that the SPICE of the non-linear charge shift model is emulated in organic resistive random access device simulation
Equally applicable (Acta Physica Sinica, the 22nd phase 428-433 in 2013).
Zhang Yongzhi etc. is prepared for one kind with graphene quantum dot (GQDs): polyvinylpyrrolidone (PVP) mixes composite wood
Material is used as organic function layer, the resistive device with tin indium oxide (ITO)/GQDs:PVP/ aluminium (Al) sandwich.Pass through control
Graphene quantum dot effectively regulates and controls between the low resistance state electric current of resistive device and high-impedance state electric current in the concentration in compound system
Ratio (on-off ratio).When GQDs content is 0.6wt%, the maximum value of on-off ratio is up to 1.2 × 104.At room temperature most to this
Excellent device carries out current-voltage (I-V) specificity analysis, the result shows that, which has efficient resistive characteristic, it may be achieved ＂ writes
Enter-wipe ＂ operation.The I-V characteristic curve is fitted, it is found that carrier transport mechanism of the device under different biass is main
It is codetermined by thermionic emission mechanism, space charge limited current transport mechanism and ohmic conduction mechanism.It is led based on these
Motor system and the band structure for combining GQDs:PVP composite material, discuss the carrier capture machine in GQDs:PVP laminated film
System and releasing mechanism;Meanwhile also detailed analysis carrier in the capture release process of the device and the resistive behavior (light of initiation
Electronic technology, the 4th phase 274-279 in 2017).
Guo Mei etc. is with polyethylene terephthalate (PET) for matrix, linear low density polyethylene (LLDPE) and spherical shape
Organic siliconresin (SR) particle is dispersed phase, is prepared for PKF/LLDPE, PET/SR, PET/LLDPE/SR using melt-blending process
Three kinds of light-scattering films regulate and control its dispersed phase morphology structure by compression molding and extrusion moulding, utilize scanning electron microscopy
Influence of the micromorphology of mirror and homemade light scattering test study of platform film to its light scattering property.Studies have shown that institute
The light-scattering film of preparation is significant to the scattering property of light, and there is the (polymer material science that is closely connected with micromorphology
With engineering, the 2nd phase 54-57 in 2010).
In conclusion organic material can be used for constructing the electron-optical film of multiple functions.The film of simple function is
Study relatively comprehensively, but multifunctional composite film exploitation is still in the stage of fumbling, needs constantly to accumulate knowledge and experience.Ability
The common recognition of field technique personnel is the photic change resistance performance and light scattering property of multi-functional photic resistance changing film, not only with it is thin
The composition of film is related, additionally depends on the structure of film, needs to cooperate with the component and structure of optimization film, multi-functional has to obtain
Machine electron-optical film.
Summary of the invention
The purpose of the present invention is to provide a kind of preparation methods of multi-functional photic resistance changing film.
The preparation method of multi-functional photic resistance changing film proposed by the present invention, the specific steps are as follows:
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolines of 30 ~ 50nm thickness are successively deposited on ito glass plate
Ketone, 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 30 ~ 50nm thickness, 30 ~ 50nm thickness 3- (5- hydroxyl penta
Base) -6- xenyl -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 30 ~ 50nm thickness 3,4,5- triacetoxyl group
Benzoic acid jamaicin ester obtains multi-functional photic resistance changing film.
Reference literature (polymer material science and engineering, the 2nd phase 54-57 in 2010), with light transmittance/mist degree analyzer,
The light transmittance for measuring multi-functional photic resistance changing film is 87 ~ 91%, and mist degree is 88 ~ 94%.
The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates above-mentioned multifunctional light respectively
It causes resistance changing film 5 minutes, the square resistance with four probe sheet resistance tester detection lights according to rear multi-functional photic resistance changing film is distinguished
For 18.7 ten thousand ~ 23.1 ten thousand Ω/, 36.1 ~ 42. 3 Ω/ and 1.2 ~ 1.9 Ω/.
The organic layer of multi-functional photic resistance changing film prepared by the present invention be by four kinds of layer-by-layer vacuum depositions of organic material and
At if only using a kind of organic material prepares organic layer, the present invention provides following 4 technical solutions as a comparison:
(1) 5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa,
6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones of 30nm thickness are deposited on ito glass plate, must have
Machine film；With light transmittance/mist degree analyzer, the light transmittance for measuring organic film is 87%, mist degree 11%.It is with white light, wavelength
The ultraviolet light and wavelength of 365nm is that the ultraviolet light of 254nm irradiates above-mentioned organic film 5 minutes respectively, is surveyed with four probe sheet resistances
It is respectively 18.9 ten thousand Ω/, 16.3 ten thousand Ω/, 14.2 ten thousand Ω/ that instrument detection light, which is tried, according to the square resistance of rear organic film.
It can be seen that the mist degree of 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinone films compared with
Low, light scattering property is poor, does not also have the photic resistive effect of apparent multistable.
(2) 5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3 Pa
Under, 6- chloro-2-methyl -3- (5- methoxyl group -2- hydroxy benzenes methylene amino) -4 (3H)-of 40nm thickness are deposited on ito glass plate
Quinazolinone obtains organic film；With light transmittance/mist degree analyzer, the light transmittance for measuring organic film is 88%, mist degree 10%.
The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates above-mentioned organic film 5 minutes respectively, uses
Four probe sheet resistance tester detection lights according to the square resistance of rear organic film be respectively 19.1 ten thousand Ω/, 15.8 ten thousand Ω/,
14.9 ten thousand Ω/.
It can be seen that 6- chloro-2-methyl -3- (5- methoxyl group -2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinone films
Mist degree it is lower, light scattering property is poor, also do not have the photic resistive effect of apparent multistable.
(3) 5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3 Pa
Under, 3- (5- hydroxyl amyl) -6- xenyl -7H-1 of vapor deposition 30nm thickness on ito glass plate, 2,4- triazols [3,4-b] [1,3,
4] thiadiazine obtains organic film；With light transmittance/mist degree analyzer, the light transmittance for measuring organic film is 90%, mist degree 9%.With
The ultraviolet light that the ultraviolet light and wavelength that white light, wavelength are 365nm are 254nm irradiates above-mentioned organic film 5 minutes respectively, with four
Probe sheet resistance tester detection light is respectively 18.7 ten thousand Ω/, 16.1 ten thousand Ω/, 14.9 according to the square resistance of rear organic film
Ten thousand Ω/.
It can be seen that 3- (5- hydroxyl amyl) -6- xenyl -7H-1,2,4- triazols [3,4-b] [1,3,4] thiadiazine are thin
The mist degree of film is lower, and light scattering property is poor, does not also have the photic resistive effect of apparent multistable.
(4) 5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3 Pa
Under, 3,4,5- triacetoxyl group benzoic acid jamaicin esters of 35nm thickness are deposited on ito glass plate, obtain organic film；Use light transmission
Rate/mist degree analyzer, the light transmittance for measuring organic film is 90%, mist degree 9%.With the ultraviolet light that white light, wavelength are 365nm with
And the ultraviolet light that wavelength is 254nm irradiates above-mentioned organic film 5 minutes respectively, has after being shone with four probe sheet resistance tester detection lights
The square resistance of machine film is respectively 18.3 ten thousand Ω/, 16.8 ten thousand Ω/, 14.4 ten thousand Ω/.
It can be seen that the mist degree of 3,4,5- triacetoxyl group benzoic acid jamaicin ester films is lower, light scattering property is poor,
Without the photic resistive effect of apparent multistable.
Four kinds of organic matters it can be seen from correlation technique scheme (1) ~ (4): 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene
Amino) -4 (3H)-quinazolinones, 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides, 3- (5- hydroxyl amyl) -6-
Xenyl -7H-1,2,4- triazols [3,4-b] [1,3,4] thiadiazine, 3,4,5- triacetoxyl group benzoic acid jamaicin esters,
It cannot be separately as light-scattering film material or multistable photic resistive material.
If four kinds of organic matters in the organic layer of the multi-functional photic resistance changing film in the present invention lack one kind, the present invention
Also provide following 4 technical solutions as a comparison:
(5) lack 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones in organic layer
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
It is thick that 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 35nm thickness, 30nm are successively deposited on ito glass plate
Tri- second of 3,4,5- of 3- (5- hydroxyl amyl) -6- xenyl -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 30nm thickness
Acetoxybenzoic jamaicin ester, obtains compound organic film.
With light transmittance/mist degree analyzer, the light transmittance for measuring compound organic film is 89%, mist degree 27%.With white light, wave
The ultraviolet light and wavelength of a length of 365nm is that the ultraviolet light of 254nm irradiates above-mentioned compound organic film 5 minutes respectively, is visited with four
Needle sheet resistance tester detection light according to the square resistance of rear compound organic film be respectively 10.2 ten thousand Ω/, 10.7 ten thousand Ω/,
10.4 ten thousand Ω/.
It can be seen that the mist degree of compound organic film is promoted than single layer organic film, but can not show a candle to multi-functional photic
Resistance changing film, moreover, compound organic film do not have the photic resistive effect of apparent multistable.
(6) lack 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides in organic layer
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 35nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
3- (5- hydroxyl amyl) -6- xenyl -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine of 35nm thickness, 40nm it is thick 3,
4,5- triacetoxyl group benzoic acid jamaicin esters, obtain compound organic film.
With light transmittance/mist degree analyzer, the light transmittance for measuring compound organic film is 88%, mist degree 29%.With white light, wave
The ultraviolet light and wavelength of a length of 365nm is that the ultraviolet light of 254nm irradiates above-mentioned compound organic film 5 minutes respectively, is visited with four
Needle sheet resistance tester detection light according to the square resistance of rear compound organic film be respectively 11.1 ten thousand Ω/, 10.9 ten thousand Ω/,
11.3 ten thousand Ω/.
It can be seen that the mist degree of compound organic film is promoted than single layer organic film, but can not show a candle to multi-functional photic
Resistance changing film, moreover, compound organic film do not have the photic resistive effect of apparent multistable.
(7) lack 3- (5- hydroxyl amyl) -6- xenyl -7H-1,2,4- triazol [3,4-b] [1,3,4] thiophene in organic layer
Diazine
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 35nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
The 3,4,5- triacetoxyl group benzene first of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 30nm thickness, 30nm thickness
Sour jamaicin ester, obtains compound organic film.
With light transmittance/mist degree analyzer, the light transmittance for measuring compound organic film is 88%, mist degree 26%.With white light, wave
The ultraviolet light that the ultraviolet light and wavelength of a length of 365nm is 254nm irradiates four probes of above-mentioned compound organic film 5 minutes respectively
Sheet resistance tester detection light is respectively 10.7 ten thousand Ω/, 10.9 ten thousand Ω/, 10.6 according to the square resistance of rear compound organic film
Ten thousand Ω/.
It can be seen that the mist degree of compound organic film is promoted than single layer organic film, but can not show a candle to multi-functional photic
Resistance changing film, moreover, compound organic film do not have the photic resistive effect of apparent multistable.
(8) lack 3,4,5- triacetoxyl group benzoic acid jamaicin ester in organic layer
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 30nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
3- (5- hydroxyl amyl) -6- biphenyl of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 35nm thickness, 40nm thickness
Base -7H-1,2,4- triazols [3,4-b] [1,3,4] thiadiazine, obtains compound organic film.
With light transmittance/mist degree analyzer, the light transmittance for measuring compound organic film is 89%, mist degree 28%.With white light, wave
The ultraviolet light and wavelength of a length of 365nm is that the ultraviolet light of 254nm irradiates above-mentioned compound organic film 5 minutes respectively, is visited with four
Needle sheet resistance tester detection light according to the square resistance of rear compound organic film be respectively 10.1 ten thousand Ω/, 10.6 ten thousand Ω/,
10.3 ten thousand Ω/.
It can be seen that the mist degree of compound organic film is promoted than single layer organic film, but can not show a candle to multi-functional photic
Resistance changing film, moreover, compound organic film do not have the photic resistive effect of apparent multistable.
By above-mentioned correlation technique scheme (5) ~ (8) once it can be seen from a certain component missing in organic layer, then what is prepared answers
It is poor to close organic film light scattering property, and does not have the photic resistive effect of apparent multistable.
In conclusion the beneficial effects of the present invention are: it has used 4 kinds of light scattering properties poor, and itself has not had obvious
The organic material of photic resistive effect has been obtained multistable with high transparency and mist degree by optimization film composition and structure
The photic resistance changing film of state；Moreover, if lacking a certain material for not having obvious photic change resistance performance itself in organic layer
Material, then the mist degree decline of compound organic film, photic resistive effect deteriorate.
Therefore, the technical solution of the claims in the present invention has marked improvement outstanding, produces unexpected technology
Effect, the creativeness with patent statute.
Specific embodiment
The present invention is further described below by example.
Embodiment 1
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 30nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
3- (5- hydroxyl amyl) -6- biphenyl of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 30nm thickness, 30nm thickness
The 3,4,5- triacetoxyl group benzoic acid jamaicin of base -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 30nm thickness
Ester obtains multi-functional photic resistance changing film.
With light transmittance/mist degree analyzer, the light transmittance for measuring multi-functional photic resistance changing film is 91%, mist degree 88%.
The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates above-mentioned multifunctional light respectively
It causes resistance changing film 5 minutes, the square resistance with four probe sheet resistance tester detection lights according to rear multi-functional photic resistance changing film is distinguished
For 23.1 ten thousand Ω/, 36.1 Ω/ and 1.2 Ω/.
Embodiment 2
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 40nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
3- (5- hydroxyl amyl) -6- biphenyl of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 40nm thickness, 40nm thickness
The 3,4,5- triacetoxyl group benzoic acid jamaicin of base -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 40nm thickness
Ester obtains multi-functional photic resistance changing film.
With light transmittance/mist degree analyzer, the light transmittance for measuring multi-functional photic resistance changing film is 87%, mist degree 94%.
The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates above-mentioned multifunctional light respectively
It causes resistance changing film 5 minutes, the square resistance with four probe sheet resistance tester detection lights according to rear multi-functional photic resistance changing film is distinguished
For 18.7 ten thousand Ω/, 42. 3 Ω/ and 1.9 Ω/.
Embodiment 3
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 30nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
3- (5- hydroxyl amyl) -6- biphenyl of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 35nm thickness, 30nm thickness
The 3,4,5- triacetoxyl group benzoic acid jamaicin of base -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 40nm thickness
Ester obtains multi-functional photic resistance changing film.
With light transmittance/mist degree analyzer, the light transmittance for measuring multi-functional photic resistance changing film is 89%, mist degree 91%.
The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates above-mentioned multifunctional light respectively
It causes resistance changing film 5 minutes, the square resistance with four probe sheet resistance tester detection lights according to rear multi-functional photic resistance changing film is distinguished
For 19.8 ten thousand Ω/, 39.1 Ω/ and 1.3 Ω/.
Embodiment 4
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 40nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
3- (5- hydroxyl amyl) -6- biphenyl of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 35nm thickness, 35nm thickness
The 3,4,5- triacetoxyl group benzoic acid jamaicin of base -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 45nm thickness
Ester obtains multi-functional photic resistance changing film.
With light transmittance/mist degree analyzer, the light transmittance for measuring multi-functional photic resistance changing film is 90%, mist degree 90%.
The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates above-mentioned multifunctional light respectively
It causes resistance changing film 5 minutes, the square resistance with four probe sheet resistance tester detection lights according to rear multi-functional photic resistance changing film is distinguished
For 23.0 ten thousand Ω/, 41.1 Ω/ and 1.8 Ω/.
Embodiment 5
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, In
Successively be deposited on ito glass plate 37nm thickness 6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones,
3- (5- hydroxyl amyl) -6- biphenyl of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of 48nm thickness, 39nm thickness
The 3,4,5- triacetoxyl group benzoic acid jamaicin of base -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 46nm thickness
Ester obtains multi-functional photic resistance changing film.
With light transmittance/mist degree analyzer, the light transmittance for measuring multi-functional photic resistance changing film is 88%, mist degree 91%.
The ultraviolet light that the ultraviolet light and wavelength for being 365nm with white light, wavelength are 254nm irradiates above-mentioned multifunctional light respectively
It causes resistance changing film 5 minutes, the square resistance with four probe sheet resistance tester detection lights according to rear multi-functional photic resistance changing film is distinguished
For 20.4 ten thousand Ω/, 40.9 Ω/ and 1.6 Ω/.
Claims (1)
1. a kind of preparation method of multi-functional photic resistance changing film, which is characterized in that specific step is as follows:
5cm × 5cm × 0.5mm ito glass plate is placed in vacuum coating equipment, is 2 × 10 in vacuum degree-3Under Pa, in ITO
6- chloro-2-methyl -3- (2- hydroxy benzenes methylene amino) -4 (3H)-quinazolinones, 30 of 30 ~ 50nm thickness are successively deposited on glass plate
3- (5- hydroxyl amyl) -6- of 2- (the chloro- 3- sulfanilamide (SN) phenyl of 4-)-N- isopropyl hydrazido thioamides of ~ 50nm thickness, 30 ~ 50nm thickness
The 3,4,5- triacetoxyl group benzoic acid of xenyl -7H-1,2,4- triazol [3,4-b] [1,3,4] thiadiazine, 30 ~ 50nm thickness
Jamaicin ester obtains multi-functional photic resistance changing film；
Wherein the performance of multi-functional photic resistance changing film is that light transmittance is 87 ~ 91%, and mist degree is 88 ~ 94%；It is with white light, wavelength
The ultraviolet light and wavelength of 365nm is that the ultraviolet light of 254nm irradiates multi-functional photic resistance changing film 5 minutes respectively, more after illumination
The square resistance of the photic resistance changing film of function is respectively 18.7 ten thousand ~ 23.1 ten thousand Ω/, 36.1 ~ 42. 3 Ω/ and 1.2 ~ 1.9
Ω/□。
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| CN114702485A (en) * | 2022-03-16 | 2022-07-05 | 中原工学院 | Terephthalic acid berberine dye supermolecular salt and preparation method thereof |
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