CN110303383A - A kind of magnetorheological auxiliary atmosphere plasma polishing silicon-based component method - Google Patents
A kind of magnetorheological auxiliary atmosphere plasma polishing silicon-based component method Download PDFInfo
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- CN110303383A CN110303383A CN201910529967.1A CN201910529967A CN110303383A CN 110303383 A CN110303383 A CN 110303383A CN 201910529967 A CN201910529967 A CN 201910529967A CN 110303383 A CN110303383 A CN 110303383A
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- magnetorheological
- polishing
- plasma
- gas
- silicon
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B1/00—Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B29/00—Machines or devices for polishing surfaces on work by means of tools made of soft or flexible material with or without the application of solid or liquid polishing agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B57/00—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents
- B24B57/02—Devices for feeding, applying, grading or recovering grinding, polishing or lapping agents for feeding of fluid, sprayed, pulverised, or liquefied grinding, polishing or lapping agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Abstract
The present invention relates to silicon-based optical element surface ultra-smooth precision processing technology fields, and in particular to a kind of magnetorheological auxiliary atmosphere plasma polishing silicon-based component processing method.When solving the processing of existing atmosphere plasma, surface generates residue, causes optical element surface quality degradation problem.First with atmosphere plasma using He as carrier gas, CF4For reaction gas, O2Silicon-based component is processed for auxiliary gas, after generating residue, element surface is polished with magnetorheological, generated residue is quickly removed by flexible abrasive material in magnetic current liquid, realizes the high efficiency polishing of silicon-based optical element.
Description
Technical field
The present invention relates to silicon-based optical element surface ultra-smooth precision processing technology fields, and in particular to a kind of magnetorheological auxiliary
Atmosphere plasma is helped to polish silica-base material method.When solving the polishing of existing atmosphere plasma, surface generates residue, causes
The problem of making optical element surface quality degradation.
Background technique
With the progress of modern science and technology, more stringent requirements are proposed to material surface for contemporary optics and opto-electronics,
Thereupon, how lossless, quickly and superfinishing thickly rapidoprint becomes important research topic, and fused quartz, silicon carbide
Equal silica-base materials have a large amount of application in modern optical super-precision surface, and tradition polishing silica-base material has there are low efficiency to be drawn
The problems such as trace, such as SiC material is due to stable chemical performance, that thermal coefficient is high, thermal expansion coefficient is small, wear-resisting property is good etc. is excellent
Characteristic has special application in fields such as aerospace, microelectromechanical systems, these applications are determined to its machined surface shape
The high request of precision and surface quality, Ultraprecise polished in processing technology are to guarantee that surface to be machined realizes ultra-smooth, intact
It falls into, undamaged key.But the processing of nano-precision surface of SiC is a global problem, the Mohs' hardness of silicon carbide
Up to 9.25, optical manufacturing is extremely difficult, while traditional processing silicon-based component method is still unavoidable from traditional machinery
Contact processes intrinsic defect, and contact type mechanical processes the surface breakdown that can all cause material to some extent, is formed micro-
Crackle causes the lattice of material to disturb, to influence the surface quality of reflecting mirror, reduces its surface breakdown threshold value.
Atmosphere plasma polishing is under atmospheric pressure, using the radio-frequency voltage applied between the electrodes, so that fluorine-containing work
Property gas excitation in being loaded into the plasma atmosphere that is excited of gas He generate active particle, occur with the atom of workpiece surface
Chemical reaction generates volatile products, realizes and processes to the Contactless high-efficiency of silicon-based optical part, but due in process
Introduce reaction gas CF4, the active fluorine ions being excited largely react: SiC+4F*+2O=SiF4↑+CO2↑, Si+4F*=
SiF4↑、SiO2+ 4F*+=SiF4↑+O2↑ still there is small part fluorine ion and carbon atom commissure to remain in workpiece table for fluorocarbons
Face, it is difficult to remove, influence element roughness, this residue can be removed in such a way that magnetorheological auxiliary polishes.
By retrieval find, it is existing removal atmosphere plasma processing after residue method mainly pass through uniaxial machine into
The global polishing of row, this processing method removal efficiency is low and can destroy atmosphere plasma processing shape below.Magnetorheological auxiliary is big
Gas plasma polishing removal efficiency is high and does not destroy workpiece face shape, proposes a kind of highly-efficient processing silica-base material accordingly and can be quickly
Remove the process of surface residue.
Summary of the invention
It is an object of the invention to overcome the above-mentioned prior art, a kind of magnetorheological auxiliary atmosphere plasma polishing is provided
The method of silica-base material carries out efficient repairing to silica-base material in conjunction with atmosphere plasma polishing and Magnetorheological Polishing two ways
Shape, while can quickly remove the residue generated in process.
Step 1: workpiece to be processed is placed on atmospheric plasma apparatus processing platform, opens atmosphere plasma,
Using He as carrier gas, CF4Gas is reaction gas, O2To assist gas, wherein He range of flow: 1-5L/min, CF4Range of flow:
10-100mL/min、O2Range of flow: 5-100mL/min, firing power 40-150W generate plasma jet, and chemistry occurs
Reaction: SiC+4F*+2O=SiF4↑+CO2↑/Si+4F*=SiF4 ↑/SiO2+ 4F*+=SiF4↑+O2↑, generation reactant is gas
Volatilization, closes power supply and all gas after process finishing, workpiece roughness rms1 and face shape pv1 after detection processing, atmosphere etc. from
Workpiece surface is generated because gas CF4 reacts the residue not exclusively introduced after daughter processing；
Step 2: the workpiece after atmosphere plasma is processed is moved on magnetorheological devices workbench, selects cerium oxide
Or the flexible abrasive material that the workpiece to be processed that compares is soft, polish wheel load depth range: 0.2-0.8mm, open it is magnetorheological, be allowed to along it is equal from
Daughter flame machining locus polishes workpiece to be processed surface.
2, the magnetorheological auxiliary atmosphere plasma of one kind according to claim 1 polishes silicon-based component method, special
Sign is that the step 2 is specifically that polishing powder is added in magnetorheological fluid container, opens magnetic rheologic magnet, opens polishing
Wheel after polishing wheel is turned over, opens peristaltic pump, and recover begins to recycle magnetorheological fluid, finally opens centrifugal pump and drives nozzle to throwing
Spray into magnetorheological fluid on halo, polishing pressure depth is 0.4mm, polishing wheel along plasma flame machining locus to optical element surface into
Row uniform polish removes the residue during plasma process.
3, the magnetorheological auxiliary atmosphere plasma of one kind according to claim 1 polishes silicon-based component method, special
Sign is that the silica-base material includes silicon carbide, fused quartz or silicon wafer.
Compared with prior art, the beneficial effects of the present invention are: magnetorheological auxiliary atmosphere plasma polishes silica-base material
Method be able to achieve fast polishing silicon-based optical element and the residue that leaves after atmosphere plasma polishing can be removed, realize silicon
The high efficiency Ultra-precision Turning of sill.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of atmospheric plasma apparatus in the present invention.
Fig. 2 is the structural schematic diagram of magnetorheological finishing device in the present invention
In figure: 1-1: radio-frequency power supply, 1-2: electrode, 1-3: air inlet, 1-4: nozzle, 1-5: plasma jet, 2-1:
Magnetorheological fluid container, 2-2: peristaltic pump, 2-3: electromagnet, 2-4: recover, 2-5: polishing wheel, 2-6: nozzle, 2-7: centrifugal pump.
Specific embodiment
Below with reference to embodiment polishing silicon carbide (SiC), the invention will be further described, but should not limit this hair with this
Bright protection scope.
Present approach provides a kind of group technology processing methods of new shape, in conjunction with atmosphere plasma polishing and magnetic current
Become polishing, efficient correction of the flank shape can be carried out to silica-base material, while can quickly remove the residue generated in process.
Below in conjunction with the attached drawing of magnetorheological auxiliary atmosphere plasma polishing silica-base material, to the group technology of this new shape
Processing method carries out clear, system elaboration, its method and step are as follows:
Step 1: workpiece to be processed is placed on atmospheric plasma apparatus platform, open precisely to knife to workpiece
Atmosphere plasma radio-frequency power supply 1-1 is opened, carrier gas He, flow 3L/min are passed through in air inlet 1-3；Reaction gas CF4, stream
Amount is 30mL/min；Assist gas O2, flow 10mL/min, by air inlet, apply power is the mixed gas of composition
65W.Diameter 5mm, long 965mm, the aluminum alloy anode 1-2 of discharge end parts chamfering diameter 3mm are selected, generates plasma at its tip
Body flame forms plasma jet 1-5 by nozzle 1-4, and atmosphere plasma jet stream removes the high etching of SiC ceramic material,
The surface and subsurface defect that quickly removal SiC optical element generates in earlier processing steps, carry out optical element surface
Etching polishing.Power supply and gas are closed after the completion of polishing.SiC workpiece roughness rms1 and face shape pv1 after detection processing, atmosphere etc.
Gas ions are 3.6 × 10 to SiC high etching removal rate-3mm3/ min, workpiece surface generates residual because of reaction gas CF after processing4
React the residue not exclusively introduced.
Step 2: the workpiece after atmosphere plasma is processed is moved on magnetorheological devices workbench, precisely to knife after,
Polishing powder cerium oxide is added in magnetorheological fluid container 2-1, opens magnetic rheologic magnet 2-3, opens polishing wheel 2-5, polishing wheel
After turning over, peristaltic pump 2-2 is opened, recover 2-4 starts to recycle magnetorheological fluid, finally opens centrifugal pump 2-7 and drives nozzle 2-6
Magnetorheological fluid is sprayed on polishing wheel, polishing pressure depth is 0.4mm.Polishing wheel is along plasma flame machining locus to optical element table
Face carries out uniform polish, removes the residue during plasma process, and workpiece detects discovery fluorine carbon with XPS after magnetorheological processing
Chemical combination residue has been removed, after detect the face roughness rms2 shape pv2, after residue is gone out, roughness rms2 is compared with rms1
Reduce, because being polished using flexible abrasive material, pv1 is identical as pv2 after processing twice, is gone during removal of residue not with magnetorheological
It is broken to change face shape.Entire processing process has realized the efficient polishing of SiC optical ceramics element.
Magnetorheological auxiliary atmosphere plasma described in this patent polishes silicon-based optical element approach, by it is actual it is equal from
Daughter polishing experiments, polishing efficiency and surface roughness are much higher than traditional atmosphere plasma polishing method.
Claims (3)
1. a kind of method of magnetorheological auxiliary atmosphere plasma polishing silica-base material, it is characterized in that the polishing method includes following
Step:
Step 1: workpiece to be processed is placed on atmospheric plasma apparatus processing platform, atmosphere plasma is opened, with He
For carrier gas, CF4Gas is reaction gas, O2To assist gas, wherein He range of flow: 1-5L/min, CF4Range of flow: 10-
100mL/min、O2Range of flow: 5-100mL/min, firing power 40-150W generate plasma jet, and it is anti-that chemistry occurs
It answers: SiC+4F*+2O=SiF4↑+CO2↑, Si+4F*=SiF4↑, SiO2+4F*+=SiF4↑+O2↑, it generates reactant and is waved for gas
It sends out, power supply and all gas, workpiece roughness rms1 and face shape pv1 after detection processing, atmospheric plasma is closed after process finishing
Workpiece surface is generated because of gas CF after body processing4React the residue not exclusively introduced；
Step 2: the workpiece after atmosphere plasma is processed is moved on magnetorheological devices workbench, selects cerium oxide or phase
The soft flexible abrasive material of workpiece to be processed is compared, wheel load depth range: 0.2-0.8mm is polished, unlatching is magnetorheological, is allowed to along plasma
Flame machining locus polishes workpiece to be processed surface.
2. the magnetorheological auxiliary atmosphere plasma of one kind according to claim 1 polishes silicon-based component method, feature exists
In the step 2 is specifically that polishing powder is added in magnetorheological fluid container, opens magnetic rheologic magnet, opens polishing wheel, is thrown
After halo is turned over, peristaltic pump is opened, recover begins to recycle magnetorheological fluid, finally opens centrifugal pump driving nozzle on polishing wheel
Magnetorheological fluid is sprayed into, polishing pressure depth is 0.4mm, and polishing wheel carries out optical element surface along plasma flame machining locus uniform
Polishing removes the residue during plasma process.
3. the magnetorheological auxiliary atmosphere plasma of one kind according to claim 1 polishes silicon-based component method, feature exists
In the silica-base material includes silicon carbide, fused quartz or silicon wafer.
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| Application Number | Priority Date | Filing Date | Title |
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| CN201910529967.1A CN110303383A (en) | 2019-06-19 | 2019-06-19 | A kind of magnetorheological auxiliary atmosphere plasma polishing silicon-based component method |
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| CN201910529967.1A CN110303383A (en) | 2019-06-19 | 2019-06-19 | A kind of magnetorheological auxiliary atmosphere plasma polishing silicon-based component method |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111515769A (en) * | 2020-05-18 | 2020-08-11 | 中国科学院上海光学精密机械研究所 | Method for polishing silicon carbide reflector by using small grinding head to assist atmosphere plasma |
| CN111590395A (en) * | 2020-04-29 | 2020-08-28 | 中国科学院上海光学精密机械研究所 | Processing method of ultrathin optical element |
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Cited By (2)
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|---|---|---|---|---|
| CN111590395A (en) * | 2020-04-29 | 2020-08-28 | 中国科学院上海光学精密机械研究所 | Processing method of ultrathin optical element |
| CN111515769A (en) * | 2020-05-18 | 2020-08-11 | 中国科学院上海光学精密机械研究所 | Method for polishing silicon carbide reflector by using small grinding head to assist atmosphere plasma |
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Application publication date: 20191008 |