CN110238746A - A kind of cmp method and polishing fluid of FV520B material impeller blade - Google Patents
A kind of cmp method and polishing fluid of FV520B material impeller blade Download PDFInfo
- Publication number
- CN110238746A CN110238746A CN201910576337.XA CN201910576337A CN110238746A CN 110238746 A CN110238746 A CN 110238746A CN 201910576337 A CN201910576337 A CN 201910576337A CN 110238746 A CN110238746 A CN 110238746A
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- CN
- China
- Prior art keywords
- polishing
- impeller
- impeller blade
- fv520b
- polishing fluid
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/003—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor whereby the workpieces are mounted on a holder and are immersed in the abrasive material
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B31/00—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor
- B24B31/10—Machines or devices designed for polishing or abrading surfaces on work by means of tumbling apparatus or other apparatus in which the work and/or the abrasive material is loose; Accessories therefor involving other means for tumbling of work
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09G—POLISHING COMPOSITIONS; SKI WAXES
- C09G1/00—Polishing compositions
- C09G1/02—Polishing compositions containing abrasives or grinding agents
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- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Structures Of Non-Positive Displacement Pumps (AREA)
Abstract
The invention discloses the cmp methods and polishing fluid of a kind of FV520B material impeller blade, the polishing method are as follows: impeller blade rotates in chemical mechanical polishing liquid, chemically react FV520B material impeller blade surface with chemical reagent, the scraping mechanism for passing through abrasive material and blade surface simultaneously, its surface defective material is removed；Wherein chemical mechanical polishing liquid includes kind of an abrasive grain, oxidant, surfactant, brightener, lytic agent and deionized water.Impeller blade cmp method proposed by the present invention operates that easier, blade surface polishing precision is higher, polishing cycle is shorter compared with modes such as its traditional machining, chemical etching, hand polishes, the FV520B material polishing solution of development has filled up domestic and international blank, and can effectively remove the defective material at each position of FV520B material impeller blade surface.
Description
Technical field
The present invention relates to a kind of polishing processing method and polishing fluids, the especially chemical machinery of FV520B material impeller blade
Polishing method and polishing fluid.
Background technique
FV520B, that is, martensite type precipitation-hardening stainless steel has the performances such as intensity height, good toughness, corrosion-resistant, extensive
Applied to wheel disc, blade, axis, gear etc., especially in fan blade field, application is more typical.Blade is the core of turbogenerator
Key components and parts, the quality of processing quality directly affects the working efficiency of engine, therefore manufactures high-precision blade meaning weight
Greatly.
FV520B material hardness is high, and difficult using universal cutter machining, the material is corrosion-resistant in addition, therefore general
Chemical reagent can not soften its surface texture；Impeller blade distortion is big, thickness is thin, runner is narrow, and common numerical control machining cutter is easy
It interferes, wear greatly, blade surface burn is serious；For the polishing of impeller blade, craft is relied primarily at home at present, and
Not only low efficiency, quality are difficult to ensure hand polish, but also unfavorable to human body, are furthermore directed to the chemical mechanical polishing liquid of the material
It is both at home and abroad almost blank.
To solve the above problems, the invention patent proposes a kind of chemically mechanical polishing side of FV520B material impeller blade
Method and polishing fluid.
Summary of the invention
The problem to be solved in the present invention: there are tool wear, cutter are dry for the simple machining mode of impeller blade at present
It relates to, the chemical etching difficulty that blade processing is of poor quality, simple, artificial low efficiency, quality conformance difference and and harm operation
The health of person, the chemical mechanical polishing liquid otherwise for FV520B material are at home and abroad almost blank.
The technical solution of the present invention is as follows:
A kind of chemical mechanical polishing liquid of FV520B material impeller blade, including abrasive grain, oxidant, surfactant, light
Bright adjuvant, lytic agent and deionized water；
The abrasive grain is silicon carbide, and particle size is one or more of 1000 μm, 500 μm, 150 μm, 45 μm
Mixing, content is 1.5~3.5g/ml in polishing fluid；
The oxidant is 65wt% nitric acid solution and/or 30wt% hydrogen peroxide solution, and the content in polishing fluid is
50~120ml/L；
The surfactant is 10wt% nonylphenol polyoxyethylene ether solution, heavy alkylbenzene sulfonate crystal, alkyl sulphur
The mixing of one or more of hydrochlorate crystal, the content in polishing fluid are 3.2~6.3g/L；
The light adjuvant is sodium benzoate crystal and/or benzylideneacetone crystal, and the content in polishing fluid is 2.5
~5.5g/L；
The lytic agent be one of 85wt% phosphoric acid solution, 40wt% hydrofluoric acid solution, 38wt% acetum or
Two or more mixing, the content in polishing fluid are 60~100ml/L；
Remaining is deionized water.
A kind of chemical machinery throwing method of FV520B material impeller blade, impeller rotate in chemical mechanical polishing liquid, make
FV520B material impeller blade surface is chemically reacted with chemical mechanical polishing liquid, while the mechanical work scraped by abrasive material
With by the removal of its surface clout；Specific step is as follows:
(1) low rate start impeller makes rotation speed control in 10~18rpm, 7~12min of time；
(2) impeller is totally submerged by chemical mechanical polishing liquid, sealing, then improves impeller rotation polishing velocity, rotation speed
For 90~170rpm, polishing time is 65~100min；
(3) after polishing, impeller is taken out, is cleaned with clear water, is then dried；Blade surface multiple portions are chosen to carry out slightly
Rugosity measurement.
Beneficial effects of the present invention: impeller blade cmp method provided by the invention and traditional machining
The problems such as method is compared, and tool-path planning, tool wear, blade processing scorch is not present, compared to general chemistry
Corrosion has the advantages such as removal rate height, and which can be very good to eliminate cutter mark, the surface crater etc. of blade surface
Defective material；In addition, a kind of chemical polishing solution dedicated for polishing FV520B material is had developed, for the impeller blade of the material
It can guarantee the surface roughness Ra polished out in 2h better than 0.8 μm.
Detailed description of the invention
Fig. 1 is the chemically mechanical polishing machining sketch chart of FV520B material impeller blade；
Fig. 2 is the roughness concentration curve at blade point；
In figure: 1 cover board；2 containers；3 impellers；4 mixed polishing solutions；W wheel speed.
Specific embodiment
In conjunction with attached drawing, the chemically mechanical polishing processing method and polishing fluid preparation of FV520B material impeller blade are said
It is bright.
It is as follows that a kind of chemically mechanical polishing processing method of FV520B material impeller blade and polishing fluid prepare concrete operations:
1. a certain amount of deionized water is added into container 2；
2. by mass fraction being respectively that the nitric acid solution of 65wt% is mixed with the hydrogen peroxide solution of 30wt% by 3:2, then
It is slowly added in container 2, makes its total content 55ml/L in polishing fluid；
3. continuing to add respectively into container 2: heavy alkylbenzene sulfonate crystal makes its content 4.3g/ in polishing fluid
L；Benzylideneacetone crystal makes its content 5g/L in polishing fluid；
4. being respectively that the hydrofluoric acid solution of 40wt%, the phosphoric acid solution of 85wt%, the acetic acid of 38wt% are molten by mass fraction
Liquid is 1:6:2 mixing by volume, is then added in container 2, makes its total content 74ml/L in polishing fluid；
5. impeller 3 starts to rotate, speed 12rpm, time 8min；
6. being 1000 μm by partial size, 500 μm, 150 μm of silicon carbide, by volume it is 3:2:1 mixing, then slowly adds
It is added in container 3, makes its total content 2.1g/ml in polishing fluid, form chemical mechanical polishing liquid 4, and because guaranteeing chemistry
Impeller 3 can be totally submerged by machine polishing liquor 4；
7. container 2 is sealed with cover board 1；
8. improving the revolving speed of impeller 3, it is adjusted to 150rpm；
9. after polishing 70min, taking out impeller 3,8min is rinsed with clear water, is dried；
10. uniformly taking 5 points to measure in 3 different parts of blade, 0.5~0.7 μ of surface roughness Ra in the example
M, Fig. 2 are the roughness concentration curve at blade point, and Ra is 0.614 μm.
Content described in this specification embodiment is only enumerating to the way of realization of inventive concept, protection of the invention
Range should not be construed as being limited to the specific forms stated in the embodiments, and protection scope of the present invention also includes art technology
Personnel conceive according to the present invention it is conceivable that equivalent technologies mean.
Claims (2)
1. a kind of chemical mechanical polishing liquid of FV520B material impeller blade, which is characterized in that including abrasive grain, oxidant, surface
Activating agent, bright adjuvant, lytic agent and deionized water；
The abrasive grain is silicon carbide, and particle size is one or more of 1000 μm, 500 μm, 150 μm, 45 μm mixing,
Its content in polishing fluid is 1.5~3.5g/ml；
The oxidant is 65wt% nitric acid solution and/or 30wt% hydrogen peroxide solution, content in polishing fluid is 50~
120ml/L；
The surfactant is 10wt% nonylphenol polyoxyethylene ether solution, heavy alkylbenzene sulfonate crystal, alkylsulfonate
The mixing of one or more of crystal, the content in polishing fluid are 3.2~6.3g/L；
The light adjuvant is sodium benzoate crystal and/or benzylideneacetone crystal, content in polishing fluid is 2.5~
5.5g/L；
The lytic agent is one or both of 85wt% phosphoric acid solution, 40wt% hydrofluoric acid solution, 38wt% acetum
The above mixing, the content in polishing fluid are 60~100ml/L；
Remaining is deionized water.
2. a kind of chemical machinery of FV520B material impeller blade throws method, it is characterised in that: impeller is in chemical mechanical polishing liquid
Middle rotation chemically reacts FV520B material impeller blade surface with chemical mechanical polishing liquid, while being scraped by abrasive material
Mechanism, by its surface clout remove；Specific step is as follows:
(1) low rate start impeller makes rotation speed control in 10~18rpm, time 7-12min；
(2) impeller is totally submerged by chemical mechanical polishing liquid, sealing, then improves impeller rotation polishing velocity, rotation speed 90
~170rpm, polishing time are 65~100min；
(3) after polishing, impeller is taken out, is cleaned with clear water, is then dried；It chooses blade surface multiple portions and carries out roughness
Measurement.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910576337.XA CN110238746B (en) | 2019-06-28 | 2019-06-28 | Chemical mechanical polishing method and polishing solution for FV520B material impeller blade |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201910576337.XA CN110238746B (en) | 2019-06-28 | 2019-06-28 | Chemical mechanical polishing method and polishing solution for FV520B material impeller blade |
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| CN110238746A true CN110238746A (en) | 2019-09-17 |
| CN110238746B CN110238746B (en) | 2021-04-20 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110640613A (en) * | 2019-10-21 | 2020-01-03 | 大连理工大学 | Chemical mechanical polishing method for cylindrical thin and long thin-wall pure copper sample pool |
| CN115415926A (en) * | 2022-09-23 | 2022-12-02 | 中模智造科技江苏有限公司 | Centrifugal pump impeller combined type rotary polishing device |
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| CN101346806A (en) * | 2005-12-27 | 2009-01-14 | 日立化成工业株式会社 | Metal polishing liquid and method for polishing film to be polished |
| DE102011103606A1 (en) * | 2011-06-08 | 2012-12-13 | Rolls-Royce Deutschland Ltd & Co Kg | Processing apparatus for e.g. sharpening compressor disk of gas turbine, has moving part arranged adjacent to workpiece in container and comprising two differently dimensioned agitating arms that are kept in contact with medium |
| CN106086897A (en) * | 2016-06-14 | 2016-11-09 | 吴江创源新材料科技有限公司 | A kind of rustless steel light guide plate polishing fluid and its preparation method and application |
| CN106811751A (en) * | 2017-02-16 | 2017-06-09 | 河南科技学院 | A kind of 304 stainless steel chemically mechanical polishing polishing agents and polishing fluid and preparation method thereof |
| CN107695865A (en) * | 2017-08-28 | 2018-02-16 | 沈阳鼓风机集团申蓝机械有限公司 | A kind of self-priming waterpower runner burnishing device of small open end blade and technique |
| CN207616358U (en) * | 2018-05-28 | 2018-07-17 | 山东双轮股份有限公司 | Road polishing machine in double shrouded wheel |
-
2019
- 2019-06-28 CN CN201910576337.XA patent/CN110238746B/en active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101346806A (en) * | 2005-12-27 | 2009-01-14 | 日立化成工业株式会社 | Metal polishing liquid and method for polishing film to be polished |
| DE102011103606A1 (en) * | 2011-06-08 | 2012-12-13 | Rolls-Royce Deutschland Ltd & Co Kg | Processing apparatus for e.g. sharpening compressor disk of gas turbine, has moving part arranged adjacent to workpiece in container and comprising two differently dimensioned agitating arms that are kept in contact with medium |
| CN106086897A (en) * | 2016-06-14 | 2016-11-09 | 吴江创源新材料科技有限公司 | A kind of rustless steel light guide plate polishing fluid and its preparation method and application |
| CN106811751A (en) * | 2017-02-16 | 2017-06-09 | 河南科技学院 | A kind of 304 stainless steel chemically mechanical polishing polishing agents and polishing fluid and preparation method thereof |
| CN107695865A (en) * | 2017-08-28 | 2018-02-16 | 沈阳鼓风机集团申蓝机械有限公司 | A kind of self-priming waterpower runner burnishing device of small open end blade and technique |
| CN207616358U (en) * | 2018-05-28 | 2018-07-17 | 山东双轮股份有限公司 | Road polishing machine in double shrouded wheel |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110640613A (en) * | 2019-10-21 | 2020-01-03 | 大连理工大学 | Chemical mechanical polishing method for cylindrical thin and long thin-wall pure copper sample pool |
| CN115415926A (en) * | 2022-09-23 | 2022-12-02 | 中模智造科技江苏有限公司 | Centrifugal pump impeller combined type rotary polishing device |
| CN115415926B (en) * | 2022-09-23 | 2024-02-02 | 中模智造科技江苏有限公司 | Centrifugal pump impeller combined type rotary polishing device |
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| CN110238746B (en) | 2021-04-20 |
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