CN110230100B - Preparation method of monocrystal potassium niobate film - Google Patents
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- CN110230100B CN110230100B CN201910561860.5A CN201910561860A CN110230100B CN 110230100 B CN110230100 B CN 110230100B CN 201910561860 A CN201910561860 A CN 201910561860A CN 110230100 B CN110230100 B CN 110230100B
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- UKDIAJWKFXFVFG-UHFFFAOYSA-N potassium;oxido(dioxo)niobium Chemical compound [K+].[O-][Nb](=O)=O UKDIAJWKFXFVFG-UHFFFAOYSA-N 0.000 title claims abstract description 41
- 238000002360 preparation method Methods 0.000 title claims abstract description 12
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 claims abstract description 69
- 239000013078 crystal Substances 0.000 claims abstract description 35
- 239000000758 substrate Substances 0.000 claims abstract description 33
- 238000003756 stirring Methods 0.000 claims abstract description 25
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims abstract description 23
- ZKATWMILCYLAPD-UHFFFAOYSA-N niobium pentoxide Inorganic materials O=[Nb](=O)O[Nb](=O)=O ZKATWMILCYLAPD-UHFFFAOYSA-N 0.000 claims abstract description 11
- URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims abstract description 8
- 238000010335 hydrothermal treatment Methods 0.000 claims abstract description 7
- 238000006243 chemical reaction Methods 0.000 claims description 60
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 42
- 239000008367 deionised water Substances 0.000 claims description 24
- 229910021641 deionized water Inorganic materials 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 24
- 229910052758 niobium Inorganic materials 0.000 claims description 18
- 239000010955 niobium Substances 0.000 claims description 18
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims description 18
- 239000002243 precursor Substances 0.000 claims description 16
- 239000002002 slurry Substances 0.000 claims description 16
- 239000010408 film Substances 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 claims description 12
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 12
- 238000001035 drying Methods 0.000 claims description 12
- 235000019441 ethanol Nutrition 0.000 claims description 12
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 claims description 12
- 239000000463 material Substances 0.000 claims description 12
- 229910052700 potassium Inorganic materials 0.000 claims description 12
- 239000011591 potassium Substances 0.000 claims description 12
- 239000000725 suspension Substances 0.000 claims description 9
- 239000007864 aqueous solution Substances 0.000 claims description 6
- 239000007795 chemical reaction product Substances 0.000 claims description 6
- 238000001816 cooling Methods 0.000 claims description 6
- 238000001914 filtration Methods 0.000 claims description 6
- WPCMRGJTLPITMF-UHFFFAOYSA-I niobium(5+);pentahydroxide Chemical compound [OH-].[OH-].[OH-].[OH-].[OH-].[Nb+5] WPCMRGJTLPITMF-UHFFFAOYSA-I 0.000 claims description 6
- 238000007789 sealing Methods 0.000 claims description 6
- 238000005406 washing Methods 0.000 claims description 6
- 238000005303 weighing Methods 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
- -1 polytetrafluoroethylene Polymers 0.000 claims description 4
- 229920001343 polytetrafluoroethylene Polymers 0.000 claims description 4
- 239000004810 polytetrafluoroethylene Substances 0.000 claims description 4
- 229910001220 stainless steel Inorganic materials 0.000 claims description 2
- 239000010935 stainless steel Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 abstract description 3
- 238000006555 catalytic reaction Methods 0.000 abstract description 2
- 238000003860 storage Methods 0.000 abstract description 2
- 239000002994 raw material Substances 0.000 abstract 2
- 238000011031 large-scale manufacturing process Methods 0.000 abstract 1
- 239000000243 solution Substances 0.000 description 4
- 238000009210 therapy by ultrasound Methods 0.000 description 4
- 238000001027 hydrothermal synthesis Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000002425 crystallisation Methods 0.000 description 2
- 230000008025 crystallization Effects 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 238000004549 pulsed laser deposition Methods 0.000 description 2
- 238000003786 synthesis reaction Methods 0.000 description 2
- 229910002367 SrTiO Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000005621 ferroelectricity Effects 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- WFPQISQTIVPXNY-UHFFFAOYSA-N niobium strontium Chemical compound [Sr][Nb] WFPQISQTIVPXNY-UHFFFAOYSA-N 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 239000000047 product Substances 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/16—Oxides
- C30B29/22—Complex oxides
- C30B29/30—Niobates; Vanadates; Tantalates
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
- C30B29/64—Flat crystals, e.g. plates, strips or discs
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- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B7/00—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions
- C30B7/10—Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions by application of pressure, e.g. hydrothermal processes
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- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
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Abstract
The invention discloses a preparation method of a single crystal potassium niobate film. The method comprises the steps of taking niobium pentoxide as a main raw material, taking potassium hydroxide as a raw material and a mineralizer, stirring strongly at room temperature, adding a niobium-doped strontium titanate substrate, and carrying out hydrothermal treatment at high temperature to obtain the single-crystal potassium niobate film. The preparation method of the invention has the advantages of simple process, easy control, no pollution, low cost and easy large-scale production; the prepared product is a high-quality large-area single crystal film, forms a high-quality heterojunction interface with the substrate, and has wide potential application prospects in the fields of optical waveguides, holographic storage, catalysis, photovoltaics and the like.
Description
Technical Field
The invention relates to a preparation method of a single crystal potassium niobate film, belonging to the field of functional material preparation.
Background
Potassium niobate (KNbO)3) Is a perovskite crystal with strong ferroelectricity, has the advantages of perovskite compounds and is concerned by researchers at home and abroad. The potassium niobate serving as an environment-friendly perovskite material has high-efficiency photocatalytic activity, high electro-catalytic performance and excellent nonlinear optical response, so that the potassium niobate has a wide potential application prospect in the fields of optical waveguide, holographic storage, catalysis, photovoltaics and the like. However, KNbO is currently prepared3The process of (a) also encounters a number of difficulties, mainly in the following areas: firstly, the preparation of bulk single crystal potassium niobate often requires high temperature, harsh production conditions and high price of required equipment; secondly, in the hydrothermal method, the pure phase synthesis of mono-oriented potassium niobate is difficult, and (00l) crystal faces are often accompanied, thereby affecting the performance of the potassium niobate.
Disclosure of Invention
The invention aims to provide a preparation method of a single crystal potassium niobate film, which has the advantages of low cost, simple process, easy process control and capability of obtaining a high-quality heterojunction interface.
The invention is realized by adopting the following technical scheme:
a preparation method of a single crystal potassium niobate film comprises the following steps:
1) weighing niobium pentoxide and potassium hydroxide according to the molar ratio of 0.5:1, dissolving the niobium pentoxide and the potassium hydroxide in deionized water, and fully stirring;
2) adding a potassium hydroxide aqueous solution into the step 1) under a stirring state, and continuously stirring for 2-3 hours to obtain a hydroxide suspension of niobium and potassium;
3) adding the hydroxide suspension of niobium and potassium prepared in the step 2) into a reaction kettle liner, adjusting the volume of reaction materials in the reaction kettle liner to 60-80% of the volume of the reaction kettle liner by using deionized water, and stirring for at least 5min to obtain precursor slurry;
4) ultrasonically treating the single-crystal niobium-doped strontium titanate substrate in acetone, ethanol, deionized water and ethanol for at least 10min in sequence, drying at 50-80 ℃, and vertically placing the dried niobium-doped strontium titanate substrate in a reaction kettle filled with precursor slurry in the step 2) to enable the distance between the niobium-doped strontium titanate substrate and the bottom of an inner container of the reaction kettle to be 1-2 cm;
5) and (3) placing the inner container of the reaction kettle in the step 4) into the reaction kettle, sealing, preserving at 160-240 ℃ for 12-72 h for hydrothermal treatment, naturally cooling the reaction kettle to room temperature, unloading the kettle, washing a reaction product by deionized water and absolute ethyl alcohol, filtering, and drying to obtain the single crystal potassium niobate film.
In the above technical scheme, further, the reaction kettle is a polytetrafluoroethylene inner container and a stainless steel sleeve closed reaction kettle, and the niobium-doped strontium titanate substrate is arranged on a polytetrafluoroethylene frame.
Furthermore, the purity of the niobium pentoxide and the potassium hydroxide is not lower than the chemical purity.
Furthermore, the molar concentration of the niobium hydroxide in the precursor slurry is 0.005-0.1 mol/L, and the molar concentration of the total amount of potassium hydroxide in the precursor slurry is 4-9 mol/L.
Further, the niobium-doped strontium titanate substrate is a single-polished or double-polished square single crystal substrate, the orientation of the single crystal is (001), and the Nb-doped concentration is higher than 0.5 wt%. Doping with different concentrations of niobium will result in a different conductivity of the substrate. The higher the niobium concentration, the better the conductivity of the substrate and the better the quality of the resulting film. Because the niobium-doped concentration in the prior Nb-doped niobium strontium titanate substrate is not higher than 1.0 wt%, the Nb-doped concentration is preferably 1.0 wt%.
Furthermore, the thickness of the prepared single crystal potassium niobate film is 0.5-5 μm.
The invention has the beneficial effects that:
different from physical deposition methods such as PLD (pulsed laser deposition) and the like adopted for preparing the potassium niobate film, the invention adopts a hydrothermal method to prepare the potassium niobate film. The hydrothermal method can realize the synthesis of potassium niobate with the stoichiometry maintained at a lower temperature. Meanwhile, the reaction environment is a liquid phase, so that the uniform nucleation and diffusion of the crystallization reaction are facilitated, and the crystallization performance of the product is good. In the preparation method, niobium-doped strontium titanate (Nb-SrTiO) is introduced3) The conductive substrate regulates and controls the growth of the potassium niobate crystal through the combined action of charge transfer of an interface and heterogeneous nucleation. Therefore, the preparation method can prepare the high-quality large-area monocrystal potassium niobate thin film in a hydrothermal environment, and forms a high-quality heterojunction interface with the substrate. The invention has simple process, easy control, no pollution, low cost and easy production.
Drawings
FIG. 1 is a Scanning Electron Microscope (SEM) image of a single-crystal potassium niobate thin film produced in example 1 of the present invention;
FIG. 2 is an X-ray diffraction pattern (XRD) of the single-crystal potassium niobate thin film prepared in example 1 of the present invention;
FIG. 3 is a Transmission Electron Microscope (TEM) image of a single-crystal potassium niobate thin film prepared in example 2 of the present invention;
FIG. 4 is a Scanning Electron Microscope (SEM) image of a single-crystal potassium niobate thin film prepared in example 4 of the present invention.
Detailed Description
The technical scheme of the invention is further illustrated by the following examples.
Example 1
1) Weighing niobium pentoxide and potassium hydroxide according to the molar ratio of 0.5:1, dissolving in deionized water, and fully stirring;
2) adding a potassium hydroxide aqueous solution into the solution containing niobium prepared in the step 1) under stirring, and stirring for 2-3 hours to obtain a hydroxide suspension of niobium and potassium;
3) adding the hydroxide turbid liquid of niobium and potassium prepared in the step 2) into a reaction kettle liner, adjusting the volume of reaction materials in the reaction kettle liner to 70% of the volume of the reaction kettle liner by using deionized water, and stirring for at least 5min to obtain precursor slurry, wherein the molar concentration of niobium hydroxide is 0.075mol/L, the molar concentration of potassium hydroxide is 7.5mol/L, and the volume base number of the molar concentration is the total volume of the precursor slurry;
4) carrying out ultrasonic treatment on a monocrystal niobium-doped 0.7 wt% strontium titanate substrate in acetone, ethanol, deionized water and ethanol for at least 10min in sequence, drying at 60 ℃, and vertically placing the dried niobium-doped strontium titanate substrate at a position 1.5cm away from the bottom of an inner container of a reaction kettle;
5) and (3) placing the inner container of the reaction kettle, which is provided with the reaction materials and the substrate in the step 4), in the reaction kettle, sealing, storing at 220 ℃ for 36h for hydrothermal treatment, naturally cooling the reaction kettle to room temperature, unloading the kettle, repeatedly washing the reaction product with deionized water and absolute ethyl alcohol, filtering, and drying to obtain the single crystal potassium niobate film.
Example 2
1) Weighing niobium pentoxide and potassium hydroxide according to the molar ratio of 0.5:1, dissolving in deionized water, and fully stirring;
2) adding a potassium hydroxide aqueous solution into the solution containing niobium prepared in the step 1) under stirring, and stirring for 2-3 hours to obtain a hydroxide suspension of niobium and potassium;
3) adding the hydroxide suspension of niobium and potassium prepared in the step 2) into a reaction kettle liner, adjusting the volume of reaction materials in the reaction kettle liner to 70% of the volume of the reaction kettle liner by using deionized water, and stirring for at least 5min to obtain precursor slurry, wherein the molar concentration of niobium hydroxide is 0.02mol/L, the molar concentration of potassium hydroxide is 7.5mol/L, and the volume base number of the molar concentration is the total volume of the precursor slurry;
4) carrying out ultrasonic treatment on a monocrystal niobium-doped 0.7 wt% strontium titanate substrate in acetone, ethanol, deionized water and ethanol for at least 10min in sequence, drying at 60 ℃, and vertically placing the dried niobium-doped strontium titanate substrate at a position 1.5cm away from the bottom of an inner container of a reaction kettle;
5) and (3) placing the inner container of the reaction kettle, which is provided with the reaction materials and the substrate in the step 4), in the reaction kettle, sealing, storing at 220 ℃ for 36h for hydrothermal treatment, naturally cooling the reaction kettle to room temperature, unloading the kettle, repeatedly washing the reaction product with deionized water and absolute ethyl alcohol, filtering, and drying to obtain the single crystal potassium niobate film.
Example 3
1) Weighing niobium pentoxide and potassium hydroxide according to the molar ratio of 0.5:1, dissolving in deionized water, and fully stirring;
2) adding a potassium hydroxide aqueous solution into the solution containing niobium prepared in the step 1) under stirring, and stirring for 2-3 hours to obtain a hydroxide suspension of niobium and potassium;
3) adding the hydroxide turbid liquid of niobium and potassium prepared in the step 2) into a reaction kettle liner, adjusting the volume of reaction materials in the reaction kettle liner to 70% of the volume of the reaction kettle liner by using deionized water, and stirring for at least 5min to obtain precursor slurry, wherein the molar concentration of niobium hydroxide is 0.075mol/L, the molar concentration of potassium hydroxide is 7.5mol/L, and the volume base number of the molar concentration is the total volume of the precursor slurry;
4) carrying out ultrasonic treatment on a monocrystal niobium-doped 0.7 wt% strontium titanate substrate in acetone, ethanol, deionized water and ethanol for at least 10min in sequence, drying at 60 ℃, and vertically placing the dried niobium-doped strontium titanate substrate at a position 1.5cm away from the bottom of an inner container of a reaction kettle;
5) and (3) placing the inner container of the reaction kettle, which is provided with the reaction materials and the substrate in the step 4), in the reaction kettle, sealing, storing at 220 ℃ for 24h for hydrothermal treatment, naturally cooling the reaction kettle to room temperature, unloading the kettle, repeatedly washing a reaction product by deionized water and absolute ethyl alcohol, filtering, and drying to obtain the single crystal potassium niobate film.
Example 4
1) Weighing niobium pentoxide and potassium hydroxide according to the molar ratio of 0.5:1, dissolving in deionized water, and fully stirring;
2) adding a potassium hydroxide aqueous solution into the solution containing niobium prepared in the step 1) under stirring, and stirring for 2-3 hours to obtain a hydroxide suspension of niobium and potassium;
3) adding the hydroxide turbid liquid of niobium and potassium prepared in the step 2) into a reaction kettle liner, adjusting the volume of reaction materials in the reaction kettle liner to 70% of the volume of the reaction kettle liner by using deionized water, and stirring for at least 5min to obtain precursor slurry, wherein the molar concentration of niobium hydroxide is 0.075mol/L, the molar concentration of potassium hydroxide is 7.5mol/L, and the volume base number of the molar concentration is the total volume of the precursor slurry;
4) carrying out ultrasonic treatment on a monocrystal niobium-doped 0.5 wt% strontium titanate substrate in acetone, ethanol, deionized water and ethanol for at least 10min in sequence, drying at 60 ℃, and vertically placing the dried niobium-doped strontium titanate substrate at a position 1.5cm away from the bottom of an inner container of a reaction kettle;
5) and (3) placing the inner container of the reaction kettle, which is provided with the reaction materials and the substrate in the step 4), in the reaction kettle, sealing, storing at 220 ℃ for 36h for hydrothermal treatment, naturally cooling the reaction kettle to room temperature, unloading the kettle, repeatedly washing the reaction product with deionized water and absolute ethyl alcohol, filtering, and drying to obtain the single crystal potassium niobate film.
As can be seen from FIG. 1, the potassium niobate thin film synthesized by the method of the present invention has a flat upper surface; as can be seen from fig. 2, the synthesized potassium niobate has only a diffraction peak of (0ll), is epitaxially grown and is a single crystal; as can be seen from fig. 3, potassium niobate grows on the oriented (001) niobium-doped strontium titanate substrate and has a flat surface, forming a high-quality potassium niobate/strontium titanate heterojunction, and the thickness of the single-crystal potassium niobate thin film is 1.88 μm; as can be seen from FIG. 4, the surface of the potassium niobate thin film synthesized by using the single crystal niobium-doped 0.5 wt% strontium titanate substrate is rough.
Claims (5)
1. A preparation method of a single crystal potassium niobate film is characterized by comprising the following steps:
1) weighing niobium pentoxide and potassium hydroxide according to the molar ratio of 0.5:1, dissolving the niobium pentoxide and the potassium hydroxide in deionized water, and fully stirring;
2) adding a potassium hydroxide aqueous solution into the step 1) under a stirring state, and continuously stirring for 2-3 hours to obtain a hydroxide suspension of niobium and potassium;
3) adding the hydroxide suspension of niobium and potassium prepared in the step 2) into a reaction kettle liner, adjusting the volume of reaction materials in the reaction kettle liner to 60-80% of the volume of the reaction kettle liner by using deionized water, and stirring for at least 5min to obtain precursor slurry;
4) ultrasonically treating the single-crystal niobium-doped strontium titanate substrate in acetone, ethanol, deionized water and ethanol for at least 10min in sequence, drying at 50-80 ℃, and vertically placing the dried niobium-doped strontium titanate substrate in a reaction kettle filled with precursor slurry in the step 2) to enable the distance between the niobium-doped strontium titanate substrate and the bottom of an inner container of the reaction kettle to be 1-2 cm; the niobium-doped strontium titanate substrate is a single-polished or double-polished single crystal substrate, wherein the orientation of a single crystal is (001), and the niobium-doped concentration is higher than 0.5 wt%;
5) and (3) placing the inner container of the reaction kettle in the step 4) into the reaction kettle, sealing, preserving at 220-240 ℃ for 12-72 h for hydrothermal treatment, naturally cooling the reaction kettle to room temperature, unloading the kettle, washing a reaction product by deionized water and absolute ethyl alcohol, filtering, and drying to obtain the monocrystalline potassium niobate thin film growing along the orientation of <011 >.
2. The method for preparing single-crystal potassium niobate films according to claim 1, wherein the reaction kettle is a polytetrafluoroethylene inner container and a stainless steel sleeve closed reaction kettle, and the niobium-doped strontium titanate substrate is arranged on a polytetrafluoroethylene frame.
3. The method of producing a single-crystal potassium niobate thin film according to claim 1, wherein the purity of both of the niobium pentoxide and the potassium hydroxide is not lower than chemical purity.
4. The method for producing a single-crystal potassium niobate thin film according to claim 1, wherein a molar concentration of the niobium hydroxide in the precursor slurry is 0.005 to 0.1mol/L, and a molar concentration of a total amount of the potassium hydroxide in the precursor slurry is 4 to 9 mol/L.
5. The method for producing a single-crystal potassium niobate thin film according to claim 1, wherein the thickness of the produced single-crystal potassium niobate thin film is 0.5 to 5 μm.
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