CN110184577A - Flexible substrates surface has both the preparation method and applications of the amorphous carbon-film of pressure drag performance and toughness - Google Patents
Flexible substrates surface has both the preparation method and applications of the amorphous carbon-film of pressure drag performance and toughness Download PDFInfo
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- CN110184577A CN110184577A CN201910533860.4A CN201910533860A CN110184577A CN 110184577 A CN110184577 A CN 110184577A CN 201910533860 A CN201910533860 A CN 201910533860A CN 110184577 A CN110184577 A CN 110184577A
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
- C23C14/042—Coating on selected surface areas, e.g. using masks using masks
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
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Abstract
The present invention provides the preparation methods that flexible substrates surface has both the amorphous carbon-film of pressure drag performance and toughness.This method uses high-power impulse magnetron sputtering technology, selects graphite target, and in flexible substrates surface sputtering sedimentation amorphous carbon-film in atmosphere of inert gases, pulse power voltage is 800~1000V, and pulse duty factor is 1%~5%.Compared with prior art, this method also avoids preparation process medium temperature and spends high and lead to the destroyed problem of flexible base material, so as to be applied in flexible pressure drag sensing element, realizes the flexibility of pressure drag sensing element.
Description
Technical field
The invention belongs to piezoresistive transducer technical fields more particularly to flexible substrates surface to have both pressure drag performance and toughness
Amorphous carbon-film preparation method and applications.
Background technique
In recent years, flexible strain sensing devices wearable device, robot, in terms of application increasingly
Extensively.The performance of sensor is mainly determined that pressure resistance type sensitive material is a kind of sensitive material that application is wider by sensitive material.Table
The important parameter for levying pressure resistance type sensitive material performance is piezoresistance coefficient, and that reflects the sensitivity levels of pressure drag material.
Most representative in pressure resistance type sensitive material is monocrystalline silicon, but due to preparation process, in flexibility
Application in sensor field is seldom.In recent years, it is strained using graphene, carbon nanotube as the novel sensitive material of representative in flexibility
In sensor using more and more, but due to still needing transfering process after its preparation, result in its production and be difficult to batch
Change, and higher cost.
Amorphous carbon-film, English name AmorphousCarbon, is abbreviated as a-C, is the system of a kind of amorphous carbon material
Claim.Generally, mainly pass through sp between carbon atom in amorphous carbon-film2Covalent bond and sp3Irregular space net structure is formed, is in
Amorphous state, therefore it is different from the anisotropy of crystalline material, external manifestation is isotropism.In recent years, amorphous carbon-film is sent out
Now there is outstanding pressure drag performance, while also there is good mechanical performance, optical property and chemical property etc., for example, high
Hardness and elastic modulus, low-friction coefficient, translucency, the Modulatory character of conductivity, chemical inertness and bio-compatibility etc., because
This can be used for pressure drag sensing element.But flexible member is prepared as using amorphous carbon-film as the sensing element of pressure resistance type sensitive material
Part is technical problem for those skilled in the art, because on the one hand requiring flexible substrates, on the other hand requires amorphous
Carbon film has good toughness on flexible substrates surface, and synchronous deformation can occur with flexible substrates.However, in flexible substrates
Surface preparation has the amorphous carbon-film not a duck soup of excellent toughness, because flexible substrates are easily deformed change during the preparation process
Matter, and realizing that amorphous carbon-film has good toughness is also one of research topic of those skilled in the art.
Summary of the invention
Status in view of the above technology, the present invention is directed to realize flexible substrates surface preparation have both good pressure drag performance with it is tough
The amorphous carbon-film of property, while flexible base material is not destroyed during the preparation process.
In order to achieve the above technical purposes, the present inventor attempts using high-power impulse magnetron sputtering technology in flexible substrates
Surface prepares amorphous carbon-film, finds compared with traditional magnetron sputtering technique, and pulse supply voltage is higher in the technology, on the one hand
It can make sp in amorphous carbon-film obtained3Content improves, so as to improve the piezoresistance coefficient of amorphous carbon-film；But another party
Face can be such that in preparation process temperature increases since power is higher, cause flexible base material be easy to during the preparation process by
It destroys, to influence its material and flexibility；In addition it is also necessary to the technique for realizing that amorphous carbon-film has excellent toughness is explored, from
And synchronous deformation can occur with the deformation of flexible substrates.
After the exploration of long-term many experiments, the inventors discovered that when select high power pulsed source voltage for 800~
When 1000V, the amorphous carbon-film of acquisition can have both good toughness while with high piezoresistance coefficient, on this basis, when
When strobe pulse duty ratio is 1%~5%, discovery can be avoided preparation process medium temperature and spend high and lead to flexible base material quilt
The problem of destruction.
That is, the technical solution of the present invention is as follows: a kind of amorphous carbon-film for having both pressure drag performance and toughness on flexible substrates surface
Preparation method select graphite target it is characterized in that: using high-power impulse magnetron sputtering technology, in atmosphere of inert gases
Flexible substrates surface sputtering sedimentation amorphous carbon-film, pulse power voltage are 800~1000V, and pulse duty factor is 1%~5%.
Preferably, the inert gas is argon gas.As further preferred, ar pressure is in vacuum deposition chamber
0.1Pa-0.2Pa。
Preferably, the DC pulse negative voltage of flexible substrates is -10V~-50V.
Flexible substrates refer to that base material has flexibility, and the deformation such as can bend, stretch.The flexible base material is not
Limit, including one of flexible high molecular material, such as PI, PET, PDMS, PMMA etc. or several.
Preferably, the amorphous carbon-film with a thickness of 100-500nm.
The present invention prepares amorphous carbon-film, preferably core work on flexible substrates surface using high-power impulse magnetron sputtering technology
Skill parameter high power pulsed source voltage is 800~1000V, and pulse duty factor is 1%~5%, in the preferred technological parameter
Under the conditions of realize the stable discharging of graphite target under high voltage, sputtered compared to conventional magnetron, amorphous carbon made from one side
There is higher sp in film3Content, to improve the piezoresistance coefficient of amorphous carbon-film；On the other hand preparation process medium temperature is avoided
It spends high and leads to the destroyed problem of flexible base material；Meanwhile amorphous carbon-film obtained has good toughness, is deforming
Cracking will not be generated in the process, synchronous with flexible substrates can be deformed, thus to realize that flexible pressure drag sensing element lays the foundation.
In addition, compared to pressure drag materials such as graphene, carbon nanotubes, in the present invention amorphous carbon-film preparation it is easy, can be with large area original position
Deposition, does not need manually to shift, therefore have apparent process advantage.
Based on above-mentioned preparation method, the present invention proposes a kind of flexible pressure resistance type sensing element, including flexible substrates, is located at soft
The amorphous carbon-film of property substrate surface is as varistor, and the metal electrode at varistor both ends is arranged in.
The material of the metal electrode is unlimited, metal or several combinations one of including Au, Cr, Cu, Al etc..
Preferably, further including flexible cover sheet, for protecting varistor.The flexible protective layer material is unlimited, packet
Include PDMS, PMMA etc..
The amorphous carbon-film varistor is in certain figure in matrix surface, as a kind of implementation, in flexible substrates
The method that surface prepares the amorphous carbon-film varistor includes the following steps:
(1) exposure mask one is prepared on flexible substrates surface using photoetching process, flexible substrates surface is made not have the portion of exposure mask one
Dividing is in the figure；
(2) by step (1), treated that flexible substrates are placed in vacuum coating chamber, using high-power impulse magnetron sputtering
Technology selects graphite target, deposits the amorphous carbon-film on flexible substrates surface, pulse power voltage is 800~1000V, pulse
Duty ratio is 1%~5%；
(3) by step (2), treated that flexible substrates are taken out from vacuum coating chamber, and stripping technology is used to remove exposure mask
One；
As a kind of implementation, the preparation method of metal electrode includes the following steps:
(1) exposure mask two is prepared on varistor surface using photoetching process, hides varistor surface by exposure mask two
The part of lid is in the metal electrode shape；
(2) magnetron sputtering technique is used, sputtering target material is metal, on varistor surface under the conditions of atmosphere of inert gases
Sputtering sedimentation obtains metal electrode；Then, exposure mask one is removed using stripping technology.
Preferably, the sputtering current is 2.0A-3.0A.
Preferably, deposition chambers pressure is 0.2-0.5Pa.
Preferably, the DC pulse bias voltage of flexible substrates is -100-0V.
Detailed description of the invention
Fig. 1 is the pressure drag the performance test results of the amorphous carbon-film on flexible substrates surface made from embodiment 1.
Fig. 2 is the surface microscopic topographic of the amorphous carbon-film on flexible substrates surface made from embodiment 1.
Fig. 3 is the surface microscopic topographic of flexible substrates amorphous carbon surface film made from comparative example 1.
Fig. 4 is the surface microscopic topographic of flexible substrates amorphous carbon surface film made from comparative example 2.
Fig. 5 is the pressure drag the performance test results of the amorphous carbon-film on flexible substrates surface made from embodiment 2.
Fig. 6 is the pressure drag the performance test results of the amorphous carbon-film on flexible substrates surface made from embodiment 3.
Fig. 7 is the top view of flexible substrates, amorphous carbon-film and metal electrode in the flexible pressure drag sensing element of embodiment 4.
Fig. 8 is the side view of flexible pressure drag sensing element in embodiment 4.
Specific embodiment
Below with reference to embodiment, present invention is further described in detail with attached drawing, it should be pointed out that reality as described below
It applies example to be intended to convenient for the understanding of the present invention, and does not play any restriction effect to it.
Appended drawing reference in Fig. 1 Fig. 2 are as follows: 1- flexible substrates, 2- amorphous carbon-film, 3- metal electrode, 4- flexible cover sheet.
Embodiment 1:
In this embodiment, flexible base material is PI, prepares amorphous carbon-film on the flexible substrates surface, specific as follows:
(1) flexible substrates are dried after acetone is cleaned by ultrasonic and are placed in vacuum coating chamber, are evacuated to 2.7 × 10- 3Pa uses thereafter argon plasma etch substrate surface 30min；
(2) high-power impulse magnetron sputtering technology is used, high purity graphite target is selected, by the argon gas after ionization by carbon atom
It is sputtered from high purity graphite target, in step (1) treated flexible substrates surface deposited amorphous carbon film, controls Vacuum Deposition membrane cavity
The argon gas pressure of room is 0.1Pa, and high power pulsed source voltage is 800V, pulse duty factor 1%, flexible substrates direct current arteries and veins
Rushing negative voltage is -10V, obtains amorphous carbon-film.
The flexible substrates of deposited amorphous carbon film in surface obtained above are draw textured, the pressure drag of amorphous carbon-film is tested
Performance, as a result as shown in Figure 1, abscissa dependent variable indicates the deflection and its ratio between size before deforming of amorphous carbon-film in figure.
It will be seen from figure 1 that the amorphous carbon-film has good pressure drag performance.Its surface microscopic topographic photo such as Fig. 2 after pressure drag test
It is shown, show the amorphous carbon-film that because deformation test cracks, not there is good toughness.
Comparative example 1:
In this embodiment, flexible substrates are in the same manner as in Example 1, prepare amorphous carbon-film on the flexible substrates surface, tool
Body is as follows:
(1) identical as step (1) in embodiment 1；
(2) essentially identical with the step (2) in embodiment 1, except that high power pulsed source voltage is 500V.
The surface microscopic topographic of the amorphous carbon-film on flexible substrates surface is as shown in Figure 3 after deposition, that is, the amorphous carbon-film
Since micro-crack occurs in the thermal stress action face in preparation process, it is not used to pressure drag test.
Comparative example 2:
In this embodiment, flexible substrates are in the same manner as in Example 1, prepare amorphous carbon-film on the flexible substrates surface, tool
Body is as follows:
(1) identical as step (1) in embodiment 1；
(2) essentially identical with the step (2) in embodiment 1, except that high power pulsed source voltage is 700V；
The surface microscopic topographic of the amorphous carbon-film on flexible substrates surface is as shown in Figure 4 after deposition, that is, the amorphous carbon-film
Since micro-crack occurs in the thermal stress action face in preparation process, it is not used to pressure drag test.
Comparative example 3:
In this embodiment, flexible substrates are in the same manner as in Example 1, prepare amorphous carbon-film on the flexible substrates surface, tool
Body is as follows:
(1) identical as step (1) in embodiment 1；
(2) essentially identical with the step (2) in embodiment 1, except that pulse duty factor is 10%；
Flexible base material distorts after above-mentioned amorphous carbon-film deposition, is not used to pressure drag test.
Comparative example 4:
In this embodiment, flexible substrates are in the same manner as in Example 1, prepare amorphous carbon-film on the flexible substrates surface, tool
Body is as follows:
(1) identical as step (1) in embodiment 1；
(2) essentially identical with the step (2) in embodiment 1, except that pulse duty factor is 20%；
There is severely deformed distortion ablation in flexible base material after above-mentioned amorphous carbon-film deposition, is not used to pressure drag survey
Examination.
Embodiment 2:
In this embodiment, flexible substrates are in the same manner as in Example 1, prepare amorphous carbon-film on the flexible substrates surface, tool
Body is as follows:
(1) identical as step (1) in embodiment 1；
(2) essentially identical with the step (2) in embodiment 1, except that high power pulsed source voltage is 1000V；
It is similar to Example 1, the flexible substrates of deposited amorphous carbon film in surface obtained above are draw textured, are tested
The pressure drag performance of amorphous carbon-film, as a result as shown in figure 5, showing that the amorphous carbon-film has good pressure drag performance.With 1 class of embodiment
Seemingly, the amorphous carbon-film has good toughness without cracking because of deformation test after pressure drag test.
Embodiment 3:
In this embodiment, flexible substrates are in the same manner as in Example 1, prepare amorphous carbon-film on the flexible substrates surface, tool
Body is as follows:
(1) identical as step (1) in embodiment 1；
(2) essentially identical with the step (2) in embodiment 1, except that pulse duty factor is 5%；
It is similar to Example 1, the flexible substrates of deposited amorphous carbon film in surface obtained above are draw textured, are tested
The pressure drag performance of amorphous carbon-film, as a result as shown in fig. 6, showing that the amorphous carbon-film has good pressure drag performance.With 1 class of embodiment
Seemingly, the amorphous carbon-film has good toughness without cracking because of deformation test after pressure drag test.
Embodiment 4:
In the present embodiment, the structure of flexible pressure resistance type sensing element as illustrated in figs. 7 and 8, including flexible substrates 1, amorphous
Carbon film 2 and metal electrode 3.In the present embodiment, flexible base material is PI.Amorphous carbon-film 2 is located at 1 surface of flexible substrates, in such as
Metal electrode position 3 is arranged as varistor, 2 both ends of amorphous carbon-film in fold-line-shaped shown in Fig. 7, amorphous carbon-film.
As shown in figure 8, flexible pressure resistance type sensing element further includes flexible cover sheet 4, and flexible cover sheet 4 in the present embodiment
Cover amorphous carbon-film.In the present embodiment, flexible protective layer material is PDMS.
The preparation method of the flexibility pressure resistance type sensing element includes the following steps:
(1) flexible substrates are dried after acetone is cleaned by ultrasonic；Amorphous carbon-film is prepared on a flexible substrate using photoetching process
Patterned masking；Exposure mask one is prepared on flexible substrates surface, makes the flexible substrates surface not be in by the part that exposure mask one covers
Fold-line-shaped as shown in Figure 1；
(2) by step (1), treated that flexible substrates are placed in vacuum coating chamber, is evacuated to 2.7 × 10-3Pa,
Thereafter argon plasma etch substrate surface 30min is used；
(3) high-power impulse magnetron sputtering technology is used, high purity graphite target is selected, by the argon gas after ionization by carbon atom
It is sputtered from high purity graphite target, in step (2) treated flexible substrates surface deposited amorphous carbon film, controls Vacuum Deposition membrane cavity
The argon gas pressure of room is 0.1Pa, and high power pulsed source voltage is 800V, pulse duty factor 1%, flexible substrates direct current arteries and veins
Rushing negative voltage is -10V, obtains patterned amorphous carbon-film；
(4) by step (3), treated that flexible substrates are taken out from vacuum coating chamber, uses acetone removing removal exposure mask
One；Then exposure mask two is prepared using photoetching process on amorphous carbon-film, makes the part not covered by exposure mask two in metal electrode
Shape；
(5) by step (4), treated that flexible substrates are put into vacuum coating chamber, using magnetron sputtering technique, selection
Metal targets, sputter gas are argon gas, and in amorphous carbon-film surface deposit metal electrodes, sputtering target current is 3.0A, control chamber
Pressure is 0.3Pa, and the DC pulse bias voltage of flexible substrates is -100V；
(6) by step (5), treated that the flexible substrates with amorphous carbon-film and metal electrode are taken out from chamber, uses
Acetone removing removal exposure mask two；Then, conductive silver paste connection metal silver wire and 120 DEG C of baking and curings are used on metal electrode；
(7) sample surfaces made from step (6) uniformly smear the PDMS of liquid, as shown in figure 8, its uniform fold is made to exist
Flexible substrates surface in addition to metal electrode, then 120 DEG C of solidification PDMS.
Embodiment 5:
In the present embodiment, the structure of flexible pressure resistance type sensing element is same as Example 4.
In the present embodiment, the preparation method of the flexibility pressure resistance type sensing element and the basic phase of preparation method in embodiment 4
Together, except that: in step (3), high power pulsed source voltage be 900V, pulse duty factor 3%.
Embodiment 6:
In the present embodiment, the structure of flexible pressure resistance type sensing element is same as Example 4.
In the present embodiment, the preparation method of the flexibility pressure resistance type sensing element and the basic phase of preparation method in embodiment 4
Together, except that: in step (3), high power pulsed source voltage be 1000V, pulse duty factor 5%.
Technical solution of the present invention is described in detail in embodiment described above, it should be understood that the above is only
For specific embodiments of the present invention, it is not intended to restrict the invention, all any modifications made in spirit of the invention,
Supplement or similar fashion substitution etc., should all be included in the protection scope of the present invention.
Claims (10)
1. flexible substrates surface has both the preparation method of the amorphous carbon-film of pressure drag performance and toughness, it is characterized in that: using high power
Pulsed magnetron sputtering technology selects graphite target, in flexible substrates surface sputtering sedimentation amorphous carbon-film, arteries and veins in atmosphere of inert gases
Rushing supply voltage is 800~1000V, and pulse duty factor is 1%~5%.
2. flexible substrates surface as described in claim 1 has both the preparation method of the amorphous carbon-film of pressure drag performance and toughness,
Be characterized in: the inert gas is argon gas；
Preferably, ar pressure is 0.1Pa-0.2Pa in deposition chambers.
3. flexible substrates surface as described in claim 1 has both the preparation method of the amorphous carbon-film of pressure drag performance and toughness,
Be characterized in: the DC pulse negative voltage of flexible substrates is -10V~-50V.
4. flexible substrates surface as described in claim 1 has both the preparation method of the amorphous carbon-film of pressure drag performance and toughness,
Be characterized in: the flexible base material is flexible high molecular material；
Preferably, the flexible base material is one of PI, PET, PDMS, PMMA or several.
5. flexible substrates surface as described in claim 1 has both the preparation method of the amorphous carbon-film of pressure drag performance and toughness,
Be characterized in: the amorphous carbon-film with a thickness of 100-500nm.
6. a kind of flexibility pressure resistance type sensing element, including flexible substrates, varistor and the gold that varistor both ends are arranged in
Belong to electrode；It is characterized in that: the varistor is made using preparation method described in any claim in claim 1 to 5.
7. flexibility pressure resistance type sensing element as claimed in claim 6, it is characterized in that: further including flexible cover sheet；
Preferably, the flexible protective layer material includes one of PDMS, PMMA or several.
8. flexibility pressure resistance type sensing element as claimed in claim 6, it is characterized in that: the varistor is in one in matrix surface
Determine figure, includes the following steps: in the method that flexible substrates surface prepares the varistor
(1) exposure mask one is prepared on flexible substrates surface using photoetching process, the part for making flexible substrates surface not have exposure mask one is in
The figure；
(2) by step (1), treated that flexible substrates are placed in vacuum coating chamber, using high-power impulse magnetron sputtering skill
Art selects graphite target, deposits the amorphous carbon-film on flexible substrates surface, pulse power voltage is 800~1000V, and pulse accounts for
Sky is than being 1%~5%；
(3) by step (2), treated that flexible substrates are taken out from vacuum coating chamber, and stripping technology is used to remove exposure mask one.
9. flexibility pressure resistance type sensing element as claimed in claim 6, it is characterized in that: the preparation method of the metal electrode includes
Following steps:
(1) exposure mask two is prepared on varistor surface using photoetching process, covers varistor surface by exposure mask two
Part is in the metal electrode shape；
(2) magnetron sputtering technique is used, sputtering target material is metal, is sputtered under the conditions of atmosphere of inert gases on varistor surface
Deposition, obtains metal electrode；Then, exposure mask one is removed using stripping technology.
10. flexibility pressure resistance type sensing element as claimed in claim 6, it is characterized in that: the sputtering current is 2.0A-3.0A；
Preferably, deposition chambers pressure is 0.2-0.5Pa；
Preferably, the DC pulse bias voltage of flexible substrates is -100-0V.
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| CN111647861A (en) * | 2020-06-16 | 2020-09-11 | 中国科学院宁波材料技术与工程研究所 | Tetrahedral amorphous carbon film and preparation method and application thereof |
| CN111962020A (en) * | 2020-08-11 | 2020-11-20 | 东莞市普拉提纳米科技有限公司 | Novel ta-c coating process |
| CN113564527A (en) * | 2021-08-10 | 2021-10-29 | 中国科学院兰州化学物理研究所 | Hydrogen-free carbon film polymer lubricating material and preparation method and application thereof |
| CN114440757A (en) * | 2021-12-08 | 2022-05-06 | 中国科学院宁波材料技术与工程研究所 | Ultrahigh-sensitivity amorphous carbon-based flexible sensor based on stress modulation and manufacturing method thereof |
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| CN113564527A (en) * | 2021-08-10 | 2021-10-29 | 中国科学院兰州化学物理研究所 | Hydrogen-free carbon film polymer lubricating material and preparation method and application thereof |
| CN113564527B (en) * | 2021-08-10 | 2022-06-07 | 中国科学院兰州化学物理研究所 | Anti-irradiation hydrogen-free carbon film polymer lubricating material and preparation method and application thereof |
| CN114440757A (en) * | 2021-12-08 | 2022-05-06 | 中国科学院宁波材料技术与工程研究所 | Ultrahigh-sensitivity amorphous carbon-based flexible sensor based on stress modulation and manufacturing method thereof |
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