CN110155961B - Method for preparing laminar material folds - Google Patents

Method for preparing laminar material folds Download PDF

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CN110155961B
CN110155961B CN201910302369.0A CN201910302369A CN110155961B CN 110155961 B CN110155961 B CN 110155961B CN 201910302369 A CN201910302369 A CN 201910302369A CN 110155961 B CN110155961 B CN 110155961B
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CN110155961A (en
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黄元
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Abstract

The invention provides a method for preparing folds of a layered material, which comprises the following steps: (1) taking the film as a substrate, and mechanically cleaving the layered material to obtain a substrate-layered material; (2) putting the substrate-layered material obtained in the step (1) into liquid nitrogen for quenching, taking out and placing at room temperature; and (3) optionally, repeating said step (2). The method can simply and efficiently obtain a large-area fold structure, reduce the scientific research cost and improve the scientific research efficiency.

Description

Method for preparing laminar material folds
Technical Field
The invention belongs to the field of layered materials. In particular, the invention relates to a method for rapidly preparing folds of a layered material.
Background
Since the 2004 report of graphene, studies on other layered materials such as hexagonal boron nitride (h-BN), Transition Metal Dichalcogenide (TMD), etc. have been receiving increasing attention, and these two-dimensional materials show remarkable chemical, physical and mechanical properties.
Particularly, graphene as a new two-dimensional material has a huge application prospect in the aspect of flexible electronic devices, the flexible electronic devices inevitably deform, and repeated deformation causes problems such as fatigue and fracture of the material. In addition, although graphene is considered to have very good mechanical properties, the single-layer graphene is still very fragile from a macroscopic point of view, and is prone to fracture and breakage. Thus, the multilayer graphene is relatively more advantageous in applications.
Researches show that the wrinkles, as common morphological structures in two-dimensional materials, can effectively regulate and control some physical and chemical properties of the materials, such as electronic structures, hydrophilicity and hydrophobicity, chemical reactivity, photoelectric characteristics and the like. Therefore, from the perspective of basic research, the introduction of wrinkles can change interlayer coupling of the layered material, thereby causing a change in energy band structure, which will further change the chemical activity, optical and electrical properties, and the wrinkle structure is an important model for researching various properties of two-dimensional materials. From the application perspective, the folds can buffer the extrusion and tensile stress in the deformation process, so that the material has a larger deformation range, and the fatigue resistance of the layered material is improved. Therefore, compared with a planar structure, the two-dimensional material with the folded structure has the advantages of higher stretchability, flexibility and the like, and has a huge application prospect in the field of flexible electronic devices. For example, future pleated laminate materials will be widely used in energy storage, composite materials and biomedical fields, and will also have potential applications in stretchable electronics, strain sensors, etc.
Taking reduced graphene oxide (rGO) and graphene as examples, the method for preparing the corrugated structure mainly comprises the following steps:
(1) and preparing a fold structure by a pre-strain method. First, a thin elastic polymer (e.g., polydimethylsiloxane, abbreviated as "PDMS") film is stretched and fixed to SiO2On a substrate. Next, rGO films were spin coated on pre-strained PDMS substrates, followed by spin coating of polymer-based nanocomposites (PNC) on rGO/PDMS composite substrates. The pre-stretched PDMS was released, creating a wrinkled structure.
(2) The liquid phase shrinkage method prepares graphene (WG) having a corrugated structure. Firstly, graphene grown by a CVD method is directly placed in ferric chloride (FeCl)3) In solution to etch the copper substrate. After etching, the graphene floats on the surface of the solution. It was then transferred to deionized water with a glass slide to remove the remaining ferric chloride solution and other impurities. After multiple washes, the washed graphene is transferred to an organic solution, such as an ethanol/water solution, and shrinks rapidly within seconds. Subsequently, the target substrate pretreated in air plasma was inserted into a solution to trap WG floating in an organic solvent, and baked at 60 ℃And (5) drying in a box.
(3) Graphene is prepared on a copper or nickel metal substrate by a CVD method, and a plurality of folds are generated due to lattice adaptation of the graphene and the substrate and inconsistency of thermal expansion coefficients of the graphene and the substrate in a cooling process. However, this method produces wrinkles that are random and non-directional.
For example, Young Lee et al, university of Korean Homing university, uses Chemical Vapor grown Graphene on a metal Substrate to generate folds, but the preparation process requires high temperature, strict control conditions, slower preparation process, lower yield per unit time, high cost, high energy consumption, and poor universality for other layered materials (Synthesis of Large-Area Graphene Layers on Poly-Nickel Substrate by Chemical Vapor Deposition: Wrinkle Formation). In addition, the fold structures formed by the method are distributed randomly, the shapes are not uniform, and the controllability is poor.
(4) Graphene grown on a metal substrate by a CVD method also generates wrinkles during transfer, but such wrinkle density and position are difficult to control.
The four methods can prepare the graphene folded structure, but the methods have poor controllability, high manufacturing cost, high processing technical difficulty and adverse working environment to human health, and are not a simple method for preparing the folded structure.
Disclosure of Invention
The object of the present invention is therefore directed to the existing preparation of layered materials (such as graphene, MoS)2,WS2,WSe2And the like), and provides a method for preparing laminar material folds, which can simply and efficiently obtain large-area fold structures, reduce scientific research cost and improve scientific research efficiency.
The purpose of the invention is realized by the following technical scheme.
The invention provides a method for preparing folds of a layered material, which comprises the following steps:
(1) taking the film as a substrate, and mechanically cleaving the layered material to obtain a substrate-layered material;
(2) putting the substrate-layered material obtained in the step (1) into liquid nitrogen for quenching, taking out and placing at room temperature; and
(3) optionally, repeating said step (2).
Preferably, in the method of the present invention, the layered material is graphite or a metal chalcogenide.
Preferably, in the method of the present invention, when the layered material is graphite, the obtained substrate-layered material is a substrate-graphene thin film material.
Preferably, in the method of the present invention, the graphite is a highly oriented pyrolytic graphite crystal or a natural graphite crystal.
Preferably, in the method of the present invention, the film is a polydimethylsiloxane film or a silica gel film.
Preferably, in the method of the present invention, the quenching in the step (2) is performed for 1 to 10 seconds.
Preferably, in the method of the present invention, the quenching in the step (2) is performed for 5 to 10 seconds.
Preferably, in the method of the present invention, the metal chalcogenide is:
MX2wherein M is Mo, W, Sn, Ta, Nb, Pt or Ga, and X is S, Se or Te; or
GaS。
Preferably, in the method of the present invention, the thickness of the thin film is 200 μm to 2 mm.
In one embodiment, the present invention provides a method of making a laminate pleat, comprising the steps of:
(1) taking a polydimethylsiloxane film as a substrate, and mechanically cleaving graphite to obtain a substrate-graphene film material;
(2) putting the substrate-graphene film material obtained in the step (1) into liquid nitrogen for quenching, taking out and placing at room temperature; and
(3) optionally, repeating said step (2).
Preferably, in the method of the present invention, the graphite is Highly Oriented Pyrolytic Graphite (HOPG) crystals or natural graphite crystals.
Preferably, in the method of the present invention, the graphite crystals are cleaved using the polydimethylsiloxane thin film in the step (1).
Preferably, in the method of the present invention, the quenching time in the step (2) is 1 to 10 seconds.
Without wishing to be bound by theory, it is believed that the process provided by the present invention is applicable to graphitic or layered metal chalcogenides which are MX2Where M ═ Mo, W, Sn, Ta, Nb, Pt or Ga, X ═ S, Se or Te; or GaS. The method comprises the steps of taking a PDMS film as a substrate, transferring a thick graphite sheet from a high-orientation pyrolytic graphite (HOPG) crystal or a natural graphite crystal, and repeatedly using the PDMS film to cleave the graphite crystal for many times, so that a large-area graphene sheet can be effectively obtained. The PDMS sample adhered with the graphene film is quickly placed into liquid nitrogen, and the PDMS can reach a stable temperature after being frozen in the liquid nitrogen for 1-10 seconds without shrinkage deformation. Due to the difference in thermal expansion coefficient between graphene and the PDMS substrate, the shrinkage rate of PDMS is greater than that of graphene during cooling, thereby causing the formation of a graphene wrinkle structure. The density of the fold structure increases along with the increase of the repeated temperature reduction times until the fold structure tends to be stable. The thickness of PDMS has no obvious influence on the formation of wrinkles, and PDMS with the thickness ranging from 200 micrometers to 2 millimeters can be used for preparing wrinkles of the layered material by using the rapid cooling method. Other flexible organic films may also produce similar effects, such as silicone gel, etc.
The fold structure has large distribution density and uniform and ordered shape. The height of the graphene corrugation ridges can be dozens to hundreds of nanometers and the width of the corrugations can be hundreds of nanometers to several micrometers according to the difference of layer thicknesses. The direction of the pleats tends to be in both the zigzag and Armchair directions. The number of graphene layers is not strictly required, regular folds can be realized on three-layer graphene to hundreds of layers of graphite, and the single-layer graphene and the two-layer graphene are easy to break in temperature change. The folds are joined into a net structure. The temperature-changing method is utilized to prepare the substrate which has the most key difference with the thermal expansion coefficient of the layered material, and the rapid temperature-changing condition is selected.
The method of the invention has the following advantages:
(1) as can be seen from the preparation principle and the steps, the design principle is simple and easy to understand, and the operation method is easy to master. In the preparation process, PDMS or silica gel is used as a substrate, and the preparation materials are easily obtained, so that the strict requirements on experimental equipment and medicines in the prior art are avoided. And the prepared graphene fold structure is high in distribution density and uniform in shape. The whole preparation process is simple, convenient, rapid and effective, and has low cost, low energy consumption, high quality and high fold yield, thereby being an environment-friendly, safe and reliable preparation method. The method is proved to be widely suitable for preparing other laminar material folds.
(2) The folded structure of the layered material can change the local structure, and compared with a planar structure, the layered material has the advantages of higher stretchability, bendability and the like, increases the surface area and the porosity, obviously influences the electronic transport, the mechanical behavior and the surface performance of the layered material, and has potential application prospects in the aspects of stretchable electronic devices, wearable electronic equipment, strain sensors and the like. Furthermore, since the corrugated structure is capable of reflecting photons multiple times, the geometry of the corrugations can serve as a good matrix for light amplification.
(3) The laser produces an ultra-low threshold due to the suspended cavity created by the corrugated structure in air. Furthermore, the corrugated structure may be stretched up to 100% when an external strain is applied, which makes the corresponding device flexible, bendable and wear resistant. Recently, retractable devices have attracted a great deal of attention in basic research and technical applications. Laser devices are an essential component of the next generation technology. The method can promote the diversified application of the laser device.
(4) The invention brings new discovery and thought for the research of the fold structure of the layered material. Furthermore, this study is beneficial for future development of high performance wearable optoelectronic devices.
Drawings
Fig. 1 shows a multilayer graphene wrinkled structure on a PDMS substrate according to example 1 of the present invention;
FIG. 2 shows the wrinkles of several layered materials prepared using a PDMS substrate in liquid nitrogen with a rapid cooling method;
figure 3 shows an atomic force microscope picture of wrinkles. After etching by hydrogen plasma, the surface of the graphite is etched in a hexagonal shape, each side of the hexagon is along the zigzag direction, so that the direction of the corrugation can be calibrated, fig. 3a and 3b are the corrugations along the zigzag and armchair directions, respectively, and fig. 3c is a height-length curve of the corrugation at the dotted line in fig. 3 b.
Detailed Description
The present invention is described in further detail below with reference to specific embodiments, which are given for the purpose of illustration only and are not intended to limit the scope of the invention.
Example 1
(1) At a distance of 4X 4cm2The PDMS film of (1) was used as the substrate.
(2) High-orientation pyrolytic graphite (HOPG) crystals purchased from Nanjing Xiancheng Nanocong are clamped by tweezers, adhered to the surface of a PDMS film, and repeatedly cleaved by a plurality of PDMS films with the same size, so that thin graphene layers are obtained on the PDMS film.
(3) And rapidly putting the PDMS membrane sample with the graphene into liquid nitrogen for quenching, staying for 5 seconds, rapidly taking out and placing in a room temperature environment, and thus obtaining the graphene corrugated structure on the surface of the PDMS membrane.
(4) Repeating the step (3) for multiple times can obtain more fold structures. The resulting wrinkles, which may be observed directly by optical microscopy, form a coherent network, typically with a pitch in the range of 1 to 20 microns. The height and width of the folds can be characterized by atomic force microscopy. The direction of the wrinkles can be determined from the hexagonal boundaries after hydrogen plasma etching, and it can be seen from the atomic force microscope photographs of fig. 3a, 3b that the direction of the wrinkles tends to be along the Zigzag and Armchair directions, which are highly symmetrical directions.
Fig. 1 is a multi-layer graphene wrinkle structure on a PDMS substrate prepared in example 1. As can be seen in fig. 1, the pleats are interlaced in a web-like structure and have a distinct orientation.
Example 2
(1) At a distance of 1X 1cm2The silica gel membrane of (2) as a substrate.
(2) Clamping MoS from Nanjing Xiapong Nanko with tweezers2Crystals adhered on the surface of the silica gel film and repeatedly cleaved by a plurality of silica gel films with the same size to obtain a thin MoS layer on the silica gel film2
(3) Will carry MoS2The silica gel membrane sample is quickly put into liquid nitrogen for quenching, stays for 10 seconds, is quickly taken out and placed in a room temperature environment, and MoS can be obtained on the surface of the silica gel membrane2And (4) a corrugated structure.
(4) Repeating the step (3) for multiple times can obtain more fold structures. The resulting wrinkles, which may be observed directly by optical microscopy, form a coherent network, typically with a pitch in the range of 1 to 20 microns. FIG. 2(b) is a multi-layered MoS on silica gel substrate prepared in example 22And (4) a corrugated structure. As can be seen in fig. 2(b), the pleats are interlaced in a web-like structure and have a significant orientation, with the angle between intersecting pleats being about 60 °.
Example 3
(1) At a distance of 1X 1cm2The silica gel membrane of (2) as a substrate.
(2) Grasping WSe from hq-graphene with tweezers2Crystals adhered on the surface of the silica gel film and repeatedly cleaved by a plurality of silica gel films with the same size to obtain a thin layer WSe on the silica gel film2
(3) Will carry WSe2The silica gel membrane sample is quickly put into liquid nitrogen for quenching, stays for 10 seconds, is quickly taken out and placed in a room temperature environment, and the WSe can be obtained on the surface of the silica gel membrane2And (4) a corrugated structure.
(4) Repeating the step (3) for multiple times can obtain more fold structures. The resulting wrinkles, which may be observed directly by optical microscopy, form a coherent network, typically with a pitch in the range of 1 to 20 microns. FIG. 2(c) is a drawing showing a preparation process of example 3Resulting multilayer WSe on silica gel substrate2And (4) a corrugated structure. As can be seen in fig. 2(c), the pleats are interlaced in a web-like structure and have a distinct orientation, with the angle between intersecting pleats being about 60 °. Under the same conditions, the thin layer has a high wrinkle density and the thick layer has a low density (lower right corner of fig. 2 (c)).
Example 4
(1) At a distance of 1X 1cm2The PDMS film of (1) was used as the substrate.
(2) GaS crystals from hq-graphene were picked up with tweezers, adhered to the surface of the silica gel film, and cleaved repeatedly using a plurality of PDMS films of the same size, to obtain a thin layer of GaS on the film.
(3) And rapidly putting the PDMS membrane sample with the GaS into liquid nitrogen for quenching, staying for 1 second, rapidly taking out and placing in a room temperature environment, and thus obtaining a GaS fold structure on the surface of the membrane.
(4) Repeating the step (3) for multiple times can obtain more fold structures. The resulting wrinkles, which may be observed directly by optical microscopy, form a coherent network, typically with a pitch in the range of 1 to 20 microns. Fig. 2a is a multi-layered GaS corrugated structure on a PDMS substrate prepared in example 1. As can be seen from fig. 2(a), the pleats are interlaced in a web-like structure and have a distinct orientation, with the angle between intersecting pleats being at most 60 ° and 90 °. Under the same conditions, the thin layer has high wrinkle density (as shown in the middle area of FIG. 2 (a)), and the thick layer has low density.

Claims (6)

1. A method of making a laminate pleat, comprising the steps of:
(1) taking the film as a substrate, and mechanically cleaving the layered material to obtain a substrate-layered material;
(2) putting the substrate-layered material obtained in the step (1) into liquid nitrogen for quenching, taking out and placing at room temperature; and
(3) optionally, repeating said step (2);
the layered material is graphite or a metal chalcogenide;
the metal chalcogenide is:
MX2wherein, in the step (A),m is Mo, W, Sn, Ta, Nb, Pt or Ga, X is S, Se or Te; or
GaS;
The film is a polydimethylsiloxane film or a silica gel film.
2. The method of claim 1, wherein when the layered material is graphite, the resulting substrate-layered material is a substrate-graphene thin film material.
3. The method of claim 1, wherein the graphite is highly oriented pyrolytic graphite crystals or natural graphite crystals.
4. A method according to any one of claims 1 to 3, wherein the quenching in step (2) is carried out for 1 to 10 seconds.
5. The method according to claim 4, wherein the quenching in the step (2) is performed for 5 to 10 seconds.
6. The method of any of claims 1-3, wherein the film has a thickness of 200 microns to 2 millimeters.
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Publication number Priority date Publication date Assignee Title
CN110745812A (en) * 2019-10-11 2020-02-04 中国科学院金属研究所 Method for preparing graphene or graphite film ultra-quickly
CN110835418B (en) * 2019-11-14 2022-04-22 哈尔滨工业大学 Construction method of flexible two-dimensional fold structure on surface of elastic base material
CN111497366B (en) * 2020-04-07 2021-06-15 上海交通大学 Interface-controllable non-layered multi-level graphene conformal folds and preparation method thereof
CN112694128B (en) * 2020-12-18 2022-02-22 北京科技大学 Method for regulating and controlling wrinkle strain of two-dimensional transition metal chalcogenide nanosheets
CN113092473B (en) * 2021-04-08 2022-10-28 中国科学院大学 Two-dimensional material lattice and electrical property calibration method and system based on fold direction
CN113174580B (en) * 2021-04-15 2022-09-09 清华大学 Humidity-based film wrinkle shape regulation and control method
CN114686845B (en) * 2022-03-16 2022-12-16 华南理工大学 GaS film and preparation method and application thereof

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102506693A (en) * 2011-11-04 2012-06-20 南京航空航天大学 Graphene-based strain measuring and motion sensing device and manufacturing method thereof
US8426120B2 (en) * 2009-09-29 2013-04-23 Northwestern University High-throughput imaging of graphene based sheets by fluorescence quenching microscopy and applications of same
CN103387223A (en) * 2012-05-07 2013-11-13 海洋王照明科技股份有限公司 Preparation method of graphite
CN103803532A (en) * 2012-11-15 2014-05-21 福建省辉锐材料科技有限公司 Preparation method of high thermal conductivity graphene thin film
CN104692364A (en) * 2013-12-06 2015-06-10 中国科学院兰州化学物理研究所 Method for preparing ultra-dispersible graphene through liquid nitrogen cold quenching
CN105482435A (en) * 2014-09-29 2016-04-13 中国科学院苏州纳米技术与纳米仿生研究所 Three-dimensional-corrugated-graphene heat dissipating slurry, preparation method therefor and application of three-dimensional-corrugated-graphene heat dissipating slurry
CN106340653A (en) * 2016-09-29 2017-01-18 成都新柯力化工科技有限公司 Wrinkle-like graphene composite conductive agent and preparation method
CN106409687A (en) * 2016-11-30 2017-02-15 中国科学院金属研究所 Method for putting pure ultrathin two-dimensional materials on stacking top layer

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2720772A2 (en) * 2011-06-17 2014-04-23 Battelle Memorial Institute Forward osmosis, reverse osmosis, and nano/micro filtration membrane structures

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8426120B2 (en) * 2009-09-29 2013-04-23 Northwestern University High-throughput imaging of graphene based sheets by fluorescence quenching microscopy and applications of same
CN102506693A (en) * 2011-11-04 2012-06-20 南京航空航天大学 Graphene-based strain measuring and motion sensing device and manufacturing method thereof
CN103387223A (en) * 2012-05-07 2013-11-13 海洋王照明科技股份有限公司 Preparation method of graphite
CN103803532A (en) * 2012-11-15 2014-05-21 福建省辉锐材料科技有限公司 Preparation method of high thermal conductivity graphene thin film
CN104692364A (en) * 2013-12-06 2015-06-10 中国科学院兰州化学物理研究所 Method for preparing ultra-dispersible graphene through liquid nitrogen cold quenching
CN105482435A (en) * 2014-09-29 2016-04-13 中国科学院苏州纳米技术与纳米仿生研究所 Three-dimensional-corrugated-graphene heat dissipating slurry, preparation method therefor and application of three-dimensional-corrugated-graphene heat dissipating slurry
CN106340653A (en) * 2016-09-29 2017-01-18 成都新柯力化工科技有限公司 Wrinkle-like graphene composite conductive agent and preparation method
CN106409687A (en) * 2016-11-30 2017-02-15 中国科学院金属研究所 Method for putting pure ultrathin two-dimensional materials on stacking top layer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
石墨烯与第二类超导体及铁磁绝缘体间的磁近邻效应研究;张小强;《中国博士学位论文全文数据库》;20171231;27-28 *

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